KR20110042219A - Method for producing (meth)acrylosilanes - Google Patents
Method for producing (meth)acrylosilanes Download PDFInfo
- Publication number
- KR20110042219A KR20110042219A KR1020117005657A KR20117005657A KR20110042219A KR 20110042219 A KR20110042219 A KR 20110042219A KR 1020117005657 A KR1020117005657 A KR 1020117005657A KR 20117005657 A KR20117005657 A KR 20117005657A KR 20110042219 A KR20110042219 A KR 20110042219A
- Authority
- KR
- South Korea
- Prior art keywords
- component
- reaction
- general formula
- haloalkylsilane
- following general
- Prior art date
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- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 238000006243 chemical reaction Methods 0.000 claims abstract description 54
- 238000004821 distillation Methods 0.000 claims abstract description 30
- 238000009835 boiling Methods 0.000 claims abstract description 20
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims abstract description 19
- 150000003839 salts Chemical class 0.000 claims abstract description 17
- 229910000077 silane Inorganic materials 0.000 claims abstract description 15
- 239000011541 reaction mixture Substances 0.000 claims abstract description 14
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims abstract description 7
- 239000000203 mixture Substances 0.000 claims abstract description 5
- 239000000376 reactant Substances 0.000 claims abstract description 5
- 238000000034 method Methods 0.000 claims description 29
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 20
- -1 hydrocarbon radical Chemical class 0.000 claims description 18
- 239000003444 phase transfer catalyst Substances 0.000 claims description 12
- 239000002904 solvent Substances 0.000 claims description 12
- 125000004432 carbon atom Chemical group C* 0.000 claims description 11
- 239000004215 Carbon black (E152) Substances 0.000 claims description 7
- 229930195733 hydrocarbon Natural products 0.000 claims description 7
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical group [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 5
- 229910052760 oxygen Inorganic materials 0.000 claims description 5
- 239000001301 oxygen Chemical group 0.000 claims description 5
- 229910001413 alkali metal ion Inorganic materials 0.000 claims description 3
- 150000001340 alkali metals Chemical class 0.000 claims description 3
- 239000000460 chlorine Substances 0.000 claims description 3
- 229910052801 chlorine Inorganic materials 0.000 claims description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 3
- 229910052757 nitrogen Inorganic materials 0.000 claims description 3
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical group [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical group [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 2
- 229910001420 alkaline earth metal ion Inorganic materials 0.000 claims description 2
- 239000003795 chemical substances by application Substances 0.000 claims description 2
- 125000001309 chloro group Chemical group Cl* 0.000 claims description 2
- QUPDWYMUPZLYJZ-UHFFFAOYSA-N ethyl Chemical compound C[CH2] QUPDWYMUPZLYJZ-UHFFFAOYSA-N 0.000 claims description 2
- 125000005843 halogen group Chemical group 0.000 claims description 2
- 125000005842 heteroatom Chemical group 0.000 claims description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 2
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims description 2
- 229910052698 phosphorus Chemical group 0.000 claims description 2
- 239000011574 phosphorus Chemical group 0.000 claims description 2
- 229910052717 sulfur Inorganic materials 0.000 claims description 2
- 239000011593 sulfur Chemical group 0.000 claims description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical class CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 12
- 239000003381 stabilizer Substances 0.000 description 10
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- 239000000047 product Substances 0.000 description 9
- 230000035484 reaction time Effects 0.000 description 8
- 229940123457 Free radical scavenger Drugs 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
- 239000012535 impurity Substances 0.000 description 5
- 238000006116 polymerization reaction Methods 0.000 description 5
- LLLCSBYSPJHDJX-UHFFFAOYSA-M potassium;2-methylprop-2-enoate Chemical compound [K+].CC(=C)C([O-])=O LLLCSBYSPJHDJX-UHFFFAOYSA-M 0.000 description 5
- 239000002516 radical scavenger Substances 0.000 description 5
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 description 4
- 150000001298 alcohols Chemical class 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- 238000000746 purification Methods 0.000 description 4
- IBWGNZVCJVLSHB-UHFFFAOYSA-M tetrabutylphosphanium;chloride Chemical compound [Cl-].CCCC[P+](CCCC)(CCCC)CCCC IBWGNZVCJVLSHB-UHFFFAOYSA-M 0.000 description 4
- UZIAQVMNAXPCJQ-UHFFFAOYSA-N triethoxysilylmethyl 2-methylprop-2-enoate Chemical compound CCO[Si](OCC)(OCC)COC(=O)C(C)=C UZIAQVMNAXPCJQ-UHFFFAOYSA-N 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- WJFKNYWRSNBZNX-UHFFFAOYSA-N 10H-phenothiazine Chemical compound C1=CC=C2NC3=CC=CC=C3SC2=C1 WJFKNYWRSNBZNX-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- YBUIRAZOPRQNDE-UHFFFAOYSA-N [dimethoxy(methyl)silyl]methyl 2-methylprop-2-enoate Chemical compound CO[Si](C)(OC)COC(=O)C(C)=C YBUIRAZOPRQNDE-UHFFFAOYSA-N 0.000 description 3
- ZDOBWJOCPDIBRZ-UHFFFAOYSA-N chloromethyl(triethoxy)silane Chemical compound CCO[Si](CCl)(OCC)OCC ZDOBWJOCPDIBRZ-UHFFFAOYSA-N 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000003921 oil Substances 0.000 description 3
- 229950000688 phenothiazine Drugs 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 150000005208 1,4-dihydroxybenzenes Chemical class 0.000 description 2
- KVMAQXBSRFDBSI-UHFFFAOYSA-N 2-methoxyethoxy(dimethyl)silane Chemical compound COCCO[SiH](C)C KVMAQXBSRFDBSI-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 2
- NLZUEZXRPGMBCV-UHFFFAOYSA-N Butylhydroxytoluene Chemical compound CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 NLZUEZXRPGMBCV-UHFFFAOYSA-N 0.000 description 2
- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- GXDZOSLIAABYHM-UHFFFAOYSA-N [diethoxy(methyl)silyl]methyl 2-methylprop-2-enoate Chemical compound CCO[Si](C)(OCC)COC(=O)C(C)=C GXDZOSLIAABYHM-UHFFFAOYSA-N 0.000 description 2
- SOQDVGQHVVOWLF-UHFFFAOYSA-N [diethoxy(methyl)silyl]methyl prop-2-enoate Chemical compound CCO[Si](C)(OCC)COC(=O)C=C SOQDVGQHVVOWLF-UHFFFAOYSA-N 0.000 description 2
- UIJDAGBZCJCLNO-UHFFFAOYSA-N [dimethoxy(methyl)silyl]methyl prop-2-enoate Chemical compound CO[Si](C)(OC)COC(=O)C=C UIJDAGBZCJCLNO-UHFFFAOYSA-N 0.000 description 2
- GKHXHWJEIICKBV-UHFFFAOYSA-N [ethoxy(dimethyl)silyl]methyl prop-2-enoate Chemical compound CCO[Si](C)(C)COC(=O)C=C GKHXHWJEIICKBV-UHFFFAOYSA-N 0.000 description 2
- CDVLARZRMIEPMF-UHFFFAOYSA-N [methoxy(dimethyl)silyl]methyl prop-2-enoate Chemical compound CO[Si](C)(C)COC(=O)C=C CDVLARZRMIEPMF-UHFFFAOYSA-N 0.000 description 2
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 235000010354 butylated hydroxytoluene Nutrition 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- FYFRFHPHRQYQQR-UHFFFAOYSA-N methyl-di(propan-2-yloxy)silane Chemical compound CC(C)O[SiH](C)OC(C)C FYFRFHPHRQYQQR-UHFFFAOYSA-N 0.000 description 2
- 150000003003 phosphines Chemical group 0.000 description 2
- 239000001103 potassium chloride Substances 0.000 description 2
- 235000011164 potassium chloride Nutrition 0.000 description 2
- 238000010526 radical polymerization reaction Methods 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 150000004756 silanes Chemical class 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- WDUXKFKVDQRWJN-UHFFFAOYSA-N triethoxysilylmethyl prop-2-enoate Chemical compound CCO[Si](OCC)(OCC)COC(=O)C=C WDUXKFKVDQRWJN-UHFFFAOYSA-N 0.000 description 2
- JPPHEZSCZWYTOP-UHFFFAOYSA-N trimethoxysilylmethyl prop-2-enoate Chemical compound CO[Si](OC)(OC)COC(=O)C=C JPPHEZSCZWYTOP-UHFFFAOYSA-N 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- DKCPKDPYUFEZCP-UHFFFAOYSA-N 2,6-di-tert-butylphenol Chemical compound CC(C)(C)C1=CC=CC(C(C)(C)C)=C1O DKCPKDPYUFEZCP-UHFFFAOYSA-N 0.000 description 1
- JNQKFUFFVSIIOS-UHFFFAOYSA-N 2,6-ditert-butyl-4-(dimethylamino)-3-methylphenol Chemical compound CN(C)C1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1C JNQKFUFFVSIIOS-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- WUGOQZFPNUYUOO-UHFFFAOYSA-N 2-trimethylsilyloxyethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCO[Si](C)(C)C WUGOQZFPNUYUOO-UHFFFAOYSA-N 0.000 description 1
- CYLGLFRJQNBSSN-UHFFFAOYSA-N 3-[2-methoxyethoxy(dimethyl)silyl]propyl prop-2-enoate Chemical compound COCCO[Si](C)(C)CCCOC(=O)C=C CYLGLFRJQNBSSN-UHFFFAOYSA-N 0.000 description 1
- IQNCMVGYSANBSP-UHFFFAOYSA-N 3-[bis(2-methoxyethoxy)-methylsilyl]propyl 2-methylprop-2-enoate Chemical compound COCCO[Si](C)(OCCOC)CCCOC(=O)C(C)=C IQNCMVGYSANBSP-UHFFFAOYSA-N 0.000 description 1
- RQUOFKHZTLRYSK-UHFFFAOYSA-N 3-[bis(2-methoxyethoxy)-methylsilyl]propyl prop-2-enoate Chemical compound COCCO[Si](C)(OCCOC)CCCOC(=O)C=C RQUOFKHZTLRYSK-UHFFFAOYSA-N 0.000 description 1
- DOYKFSOCSXVQAN-UHFFFAOYSA-N 3-[diethoxy(methyl)silyl]propyl 2-methylprop-2-enoate Chemical compound CCO[Si](C)(OCC)CCCOC(=O)C(C)=C DOYKFSOCSXVQAN-UHFFFAOYSA-N 0.000 description 1
- UDWIZRDPCQAYRF-UHFFFAOYSA-N 3-[diethoxy(methyl)silyl]propyl prop-2-enoate Chemical compound CCO[Si](C)(OCC)CCCOC(=O)C=C UDWIZRDPCQAYRF-UHFFFAOYSA-N 0.000 description 1
- LZMNXXQIQIHFGC-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propyl 2-methylprop-2-enoate Chemical compound CO[Si](C)(OC)CCCOC(=O)C(C)=C LZMNXXQIQIHFGC-UHFFFAOYSA-N 0.000 description 1
- MCDBEBOBROAQSH-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propyl prop-2-enoate Chemical compound CO[Si](C)(OC)CCCOC(=O)C=C MCDBEBOBROAQSH-UHFFFAOYSA-N 0.000 description 1
- YCEISWVMMAPNSR-UHFFFAOYSA-N 3-[dimethyl(phenoxy)silyl]propyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCC[Si](C)(C)OC1=CC=CC=C1 YCEISWVMMAPNSR-UHFFFAOYSA-N 0.000 description 1
- XIWKWGKHZFFEEA-UHFFFAOYSA-N 3-[dimethyl(phenoxy)silyl]propyl prop-2-enoate Chemical compound C=CC(=O)OCCC[Si](C)(C)OC1=CC=CC=C1 XIWKWGKHZFFEEA-UHFFFAOYSA-N 0.000 description 1
- HIKAXIZBPOCKKQ-UHFFFAOYSA-N 3-[dimethyl(propan-2-yloxy)silyl]propyl 2-methylprop-2-enoate Chemical compound CC(C)O[Si](C)(C)CCCOC(=O)C(C)=C HIKAXIZBPOCKKQ-UHFFFAOYSA-N 0.000 description 1
- HWMSQFUYMBPRHY-UHFFFAOYSA-N 3-[dimethyl(propan-2-yloxy)silyl]propyl prop-2-enoate Chemical compound CC(C)O[Si](C)(C)CCCOC(=O)C=C HWMSQFUYMBPRHY-UHFFFAOYSA-N 0.000 description 1
- JSOZORWBKQSQCJ-UHFFFAOYSA-N 3-[ethoxy(dimethyl)silyl]propyl 2-methylprop-2-enoate Chemical compound CCO[Si](C)(C)CCCOC(=O)C(C)=C JSOZORWBKQSQCJ-UHFFFAOYSA-N 0.000 description 1
- DGBFOBNYTYHFPN-UHFFFAOYSA-N 3-[ethoxy(dimethyl)silyl]propyl prop-2-enoate Chemical compound CCO[Si](C)(C)CCCOC(=O)C=C DGBFOBNYTYHFPN-UHFFFAOYSA-N 0.000 description 1
- JBDMKOVTOUIKFI-UHFFFAOYSA-N 3-[methoxy(dimethyl)silyl]propyl 2-methylprop-2-enoate Chemical compound CO[Si](C)(C)CCCOC(=O)C(C)=C JBDMKOVTOUIKFI-UHFFFAOYSA-N 0.000 description 1
- ZCRUJAKCJLCJCP-UHFFFAOYSA-N 3-[methoxy(dimethyl)silyl]propyl prop-2-enoate Chemical compound CO[Si](C)(C)CCCOC(=O)C=C ZCRUJAKCJLCJCP-UHFFFAOYSA-N 0.000 description 1
- OXZYWQFVRMKXGX-UHFFFAOYSA-N 3-[methyl(diphenoxy)silyl]propyl 2-methylprop-2-enoate Chemical compound C=1C=CC=CC=1O[Si](C)(CCCOC(=O)C(=C)C)OC1=CC=CC=C1 OXZYWQFVRMKXGX-UHFFFAOYSA-N 0.000 description 1
- MLPTYZFTHPIKAZ-UHFFFAOYSA-N 3-[methyl(diphenoxy)silyl]propyl prop-2-enoate Chemical compound C=1C=CC=CC=1O[Si](CCCOC(=O)C=C)(C)OC1=CC=CC=C1 MLPTYZFTHPIKAZ-UHFFFAOYSA-N 0.000 description 1
- DKJUNSCWORCQSY-UHFFFAOYSA-N 3-[methyl-di(propan-2-yloxy)silyl]propyl prop-2-enoate Chemical compound CC(C)O[Si](C)(OC(C)C)CCCOC(=O)C=C DKJUNSCWORCQSY-UHFFFAOYSA-N 0.000 description 1
- DMZPTAFGSRVFIA-UHFFFAOYSA-N 3-[tris(2-methoxyethoxy)silyl]propyl 2-methylprop-2-enoate Chemical compound COCCO[Si](OCCOC)(OCCOC)CCCOC(=O)C(C)=C DMZPTAFGSRVFIA-UHFFFAOYSA-N 0.000 description 1
- PNZVYZIRTOVNKZ-UHFFFAOYSA-N 3-[tris(2-methoxyethoxy)silyl]propyl prop-2-enoate Chemical compound COCCO[Si](OCCOC)(OCCOC)CCCOC(=O)C=C PNZVYZIRTOVNKZ-UHFFFAOYSA-N 0.000 description 1
- CHPNMYQJQQGAJS-UHFFFAOYSA-N 3-tri(propan-2-yloxy)silylpropyl 2-methylprop-2-enoate Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)CCCOC(=O)C(C)=C CHPNMYQJQQGAJS-UHFFFAOYSA-N 0.000 description 1
- JMGZKPMMFXFSGK-UHFFFAOYSA-N 3-tri(propan-2-yloxy)silylpropyl prop-2-enoate Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)CCCOC(=O)C=C JMGZKPMMFXFSGK-UHFFFAOYSA-N 0.000 description 1
- XDQWJFXZTAWJST-UHFFFAOYSA-N 3-triethoxysilylpropyl prop-2-enoate Chemical compound CCO[Si](OCC)(OCC)CCCOC(=O)C=C XDQWJFXZTAWJST-UHFFFAOYSA-N 0.000 description 1
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 1
- QEZWLMITWQYZPJ-UHFFFAOYSA-N 3-triphenoxysilylpropyl 2-methylprop-2-enoate Chemical compound C=1C=CC=CC=1O[Si](OC=1C=CC=CC=1)(CCCOC(=O)C(=C)C)OC1=CC=CC=C1 QEZWLMITWQYZPJ-UHFFFAOYSA-N 0.000 description 1
- SALHVONPYZUNHU-UHFFFAOYSA-N 3-triphenoxysilylpropyl prop-2-enoate Chemical compound C=1C=CC=CC=1O[Si](OC=1C=CC=CC=1)(CCCOC(=O)C=C)OC1=CC=CC=C1 SALHVONPYZUNHU-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- KMLTUQLZFGALMK-UHFFFAOYSA-N CCO[SiH2]CCCOC(=O)C(C)=C Chemical compound CCO[SiH2]CCCOC(=O)C(C)=C KMLTUQLZFGALMK-UHFFFAOYSA-N 0.000 description 1
- HNUALPPJLMYHDK-UHFFFAOYSA-N C[CH]C Chemical compound C[CH]C HNUALPPJLMYHDK-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 239000005046 Chlorosilane Substances 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- UTGQNNCQYDRXCH-UHFFFAOYSA-N N,N'-diphenyl-1,4-phenylenediamine Chemical class C=1C=C(NC=2C=CC=CC=2)C=CC=1NC1=CC=CC=C1 UTGQNNCQYDRXCH-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- YSVZGWAJIHWNQK-UHFFFAOYSA-N [3-(hydroxymethyl)-2-bicyclo[2.2.1]heptanyl]methanol Chemical compound C1CC2C(CO)C(CO)C1C2 YSVZGWAJIHWNQK-UHFFFAOYSA-N 0.000 description 1
- UOCBMYDMAHPHLR-UHFFFAOYSA-N [bis(2-methoxyethoxy)-methylsilyl]methyl 2-methylprop-2-enoate Chemical compound COCCO[Si](C)(COC(=O)C(C)=C)OCCOC UOCBMYDMAHPHLR-UHFFFAOYSA-N 0.000 description 1
- AWTZPZVMJBRESD-UHFFFAOYSA-N [bis(2-methoxyethoxy)-methylsilyl]methyl prop-2-enoate Chemical compound COCCO[Si](C)(COC(=O)C=C)OCCOC AWTZPZVMJBRESD-UHFFFAOYSA-N 0.000 description 1
- PCBMVQBBBGFXLZ-UHFFFAOYSA-N [dimethoxy(methyl)silyl]oxymethyl 2-methylprop-2-enoate Chemical compound CO[Si](C)(OC)OCOC(=O)C(C)=C PCBMVQBBBGFXLZ-UHFFFAOYSA-N 0.000 description 1
- NTMABOLVCNSMLV-UHFFFAOYSA-N [dimethyl(phenoxy)silyl]methyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC[Si](C)(C)OC1=CC=CC=C1 NTMABOLVCNSMLV-UHFFFAOYSA-N 0.000 description 1
- XRDFUBPFPAIYEM-UHFFFAOYSA-N [dimethyl(phenoxy)silyl]methyl prop-2-enoate Chemical compound C=CC(=O)OC[Si](C)(C)OC1=CC=CC=C1 XRDFUBPFPAIYEM-UHFFFAOYSA-N 0.000 description 1
- ZOCNRFDDGCYAMK-UHFFFAOYSA-N [dimethyl(propan-2-yloxy)silyl]methyl 2-methylprop-2-enoate Chemical compound CC(C)O[Si](C)(C)COC(=O)C(C)=C ZOCNRFDDGCYAMK-UHFFFAOYSA-N 0.000 description 1
- KBCCEVVODHCMCV-UHFFFAOYSA-N [dimethyl(propan-2-yloxy)silyl]methyl prop-2-enoate Chemical compound CC(C)O[Si](C)(C)COC(=O)C=C KBCCEVVODHCMCV-UHFFFAOYSA-N 0.000 description 1
- DNQFCBLYUTWWCH-UHFFFAOYSA-N [ethoxy(dimethyl)silyl]methyl 2-methylprop-2-enoate Chemical compound CCO[Si](C)(C)COC(=O)C(C)=C DNQFCBLYUTWWCH-UHFFFAOYSA-N 0.000 description 1
- HZIABGAGAIMOQZ-UHFFFAOYSA-N [methoxy(dimethyl)silyl]methyl 2-methylprop-2-enoate Chemical compound CO[Si](C)(C)COC(=O)C(C)=C HZIABGAGAIMOQZ-UHFFFAOYSA-N 0.000 description 1
- DRWLOUSCVHTXDD-UHFFFAOYSA-N [methyl(diphenoxy)silyl]methyl 2-methylprop-2-enoate Chemical compound C=1C=CC=CC=1O[Si](C)(COC(=O)C(=C)C)OC1=CC=CC=C1 DRWLOUSCVHTXDD-UHFFFAOYSA-N 0.000 description 1
- QHGGEMFYFBRDNK-UHFFFAOYSA-N [methyl(diphenoxy)silyl]methyl prop-2-enoate Chemical compound C=1C=CC=CC=1O[Si](COC(=O)C=C)(C)OC1=CC=CC=C1 QHGGEMFYFBRDNK-UHFFFAOYSA-N 0.000 description 1
- FAGCGEALFHYRRM-UHFFFAOYSA-N [methyl-di(propan-2-yloxy)silyl]methyl prop-2-enoate Chemical compound CC(C)O[Si](C)(OC(C)C)COC(=O)C=C FAGCGEALFHYRRM-UHFFFAOYSA-N 0.000 description 1
- 239000002318 adhesion promoter Substances 0.000 description 1
- 150000001335 aliphatic alkanes Chemical class 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 150000004982 aromatic amines Chemical class 0.000 description 1
- 150000001491 aromatic compounds Chemical class 0.000 description 1
- 239000002928 artificial marble Substances 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Chemical group BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Chemical group 0.000 description 1
- NXXRXPHOTKKBCZ-UHFFFAOYSA-N butyl(chloro)phosphane Chemical compound CCCCPCl NXXRXPHOTKKBCZ-UHFFFAOYSA-N 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 229910001417 caesium ion Inorganic materials 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- ZXZMFKUGAPMMCJ-UHFFFAOYSA-N chloromethyl-dimethoxy-methylsilane Chemical compound CO[Si](C)(CCl)OC ZXZMFKUGAPMMCJ-UHFFFAOYSA-N 0.000 description 1
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006459 hydrosilylation reaction Methods 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- QRPRIOOKPZSVFN-UHFFFAOYSA-M methyl(triphenyl)phosphanium;chloride Chemical compound [Cl-].C=1C=CC=CC=1[P+](C=1C=CC=CC=1)(C)C1=CC=CC=C1 QRPRIOOKPZSVFN-UHFFFAOYSA-M 0.000 description 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 150000003961 organosilicon compounds Chemical class 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical class COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 150000002990 phenothiazines Chemical class 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 229910001414 potassium ion Inorganic materials 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000004053 quinones Chemical class 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 229910001419 rubidium ion Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 238000004513 sizing Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910001415 sodium ion Inorganic materials 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 238000010189 synthetic method Methods 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 238000005809 transesterification reaction Methods 0.000 description 1
- ZPWJACAGXBYLDA-UHFFFAOYSA-N tri(propan-2-yloxy)silylmethyl 2-methylprop-2-enoate Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)COC(=O)C(C)=C ZPWJACAGXBYLDA-UHFFFAOYSA-N 0.000 description 1
- RRUHAKPKYAFGNA-UHFFFAOYSA-N tri(propan-2-yloxy)silylmethyl prop-2-enoate Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)COC(=O)C=C RRUHAKPKYAFGNA-UHFFFAOYSA-N 0.000 description 1
- JQLOJTZPFXKUIM-UHFFFAOYSA-M tributyl(methyl)phosphanium;chloride Chemical compound [Cl-].CCCC[P+](C)(CCCC)CCCC JQLOJTZPFXKUIM-UHFFFAOYSA-M 0.000 description 1
- TUQOTMZNTHZOKS-UHFFFAOYSA-N tributylphosphine Chemical compound CCCCP(CCCC)CCCC TUQOTMZNTHZOKS-UHFFFAOYSA-N 0.000 description 1
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 1
- 239000005052 trichlorosilane Substances 0.000 description 1
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 1
- UOKUUKOEIMCYAI-UHFFFAOYSA-N trimethoxysilylmethyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)COC(=O)C(C)=C UOKUUKOEIMCYAI-UHFFFAOYSA-N 0.000 description 1
- OXEYFZVWENQADS-UHFFFAOYSA-N trimethylsilyloxymethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCO[Si](C)(C)C OXEYFZVWENQADS-UHFFFAOYSA-N 0.000 description 1
- RMZAYIKUYWXQPB-UHFFFAOYSA-N trioctylphosphane Chemical compound CCCCCCCCP(CCCCCCCC)CCCCCCCC RMZAYIKUYWXQPB-UHFFFAOYSA-N 0.000 description 1
- WBGBRBHQBNQOIO-UHFFFAOYSA-N triphenoxysilylmethyl 2-methylprop-2-enoate Chemical compound C=1C=CC=CC=1O[Si](OC=1C=CC=CC=1)(COC(=O)C(=C)C)OC1=CC=CC=C1 WBGBRBHQBNQOIO-UHFFFAOYSA-N 0.000 description 1
- HYRPJVGICBMBID-UHFFFAOYSA-N triphenoxysilylmethyl prop-2-enoate Chemical compound C=1C=CC=CC=1O[Si](OC=1C=CC=CC=1)(COC(=O)C=C)OC1=CC=CC=C1 HYRPJVGICBMBID-UHFFFAOYSA-N 0.000 description 1
- VMTSKHJFESDQNC-UHFFFAOYSA-N tris(2-methoxyethoxy)silylmethyl 2-methylprop-2-enoate Chemical compound COCCO[Si](COC(=O)C(C)=C)(OCCOC)OCCOC VMTSKHJFESDQNC-UHFFFAOYSA-N 0.000 description 1
- QYZHPAOUJMOBOU-UHFFFAOYSA-N tris(2-methoxyethoxy)silylmethyl prop-2-enoate Chemical compound COCCO[Si](COC(=O)C=C)(OCCOC)OCCOC QYZHPAOUJMOBOU-UHFFFAOYSA-N 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
- C07F7/1872—Preparation; Treatments not provided for in C07F7/20
- C07F7/1892—Preparation; Treatments not provided for in C07F7/20 by reactions not provided for in C07F7/1876 - C07F7/1888
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/20—Purification, separation
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
Abstract
본 발명은 하기 일반식 (2)의 할로알킬실란(S1) 및 하기 일반식 (3)의 불포화 유기 카복실산의 염(S2)으로부터 출발하여 하기 일반식 (1)의 실란(S)을 제조하는 방법으로서, 성분(S1)과 성분(S2)의 반응 전 또는 중에, 할로알킬실란(S1)의 비점보다 낮은 비점을 갖는 1종 이상의 성분(L)을 반응 혼합물, 부분 혼합물 또는 개별 반응물 성분으로부터 증류에 의해 적어도 부분적으로 제거하는 것인 제조 방법에 관한 것이다:
(R1')2C=C(R1)C(O)O-(R2)-Si(R3)z(OR4)3-z (1)
X-(R2)-Si(R3)z(OR4)3-z (2)
Mw+[(R1')2C=C(R1)C(O)O-]w (3)
상기 식에서, R1, R1', R2, R3, R4, X, Mw +, w 및 z는 제1항에 제시된 의미를 갖는다.The present invention starts from haloalkylsilane (S1) of the following general formula (2) and salt (S2) of unsaturated organic carboxylic acid of the following general formula (3) to produce silane (S) of the following general formula (1) As one or more components (L) having a boiling point lower than that of haloalkylsilane (S1), before or during the reaction of component (S1) with component (S2), distillation from the reaction mixture, partial mixture or individual reactant components To at least partially remove by means of:
(R 1 ′ ) 2 C═C (R 1 ) C (O) O— (R 2 ) —Si (R 3 ) z (OR 4 ) 3-z (1)
X- (R 2 ) -Si (R 3 ) z (OR 4 ) 3-z (2)
M w + [(R 1 ' ) 2 C = C (R 1) C (O) O -] w (3)
Wherein R 1 , R 1 ′ , R 2 , R 3 , R 4 , X, M w + , w and z have the meanings given in claim 1.
Description
본 발명은 빠른 반응 속도와 높은 공간-시간 수율로 아크릴로실란 및 메타크릴로실란을 제조하는 방법에 관한 것이다.The present invention relates to a process for preparing acrylosilanes and methacrylosilanes with fast reaction rates and high space-time yields.
아크릴로실란 및 메타크릴로실란은, 예를 들어, 유리 섬유용 사이즈제, 또는 인공 대리석 제조에서, 무기 물질과 유기 물질 간의 접착 촉진제로서, 또는 예를 들어 도료와 같은 유기 중합체의 가교제로서, 또는 충전제의 처리 등에 다용되고 있다.Acrylosilanes and methacrylosilanes are, for example, sizing agents for glass fibers or in the manufacture of artificial marble, as adhesion promoters between inorganic and organic materials, or as crosslinking agents of organic polymers, for example paints, or It is used abundantly in the process of a filler.
이러한 화합물의 제조를 위한 다양한 방법들이 공지되어 있다. 예를 들어, DE 2851456 또는 DE 3832621에는, Si-H 함유 화합물을 알릴(메트)아크릴레이트와 첨가 반응시키는, 귀금속 촉매를 이용한 하이드로실릴화에 대해 기재되어 있다. 그러나 이들 방법의 단점은, 일부 경우, 예를 들어 트리메톡시실란과 같은 고독성 알콕시실란이 사용되어야 하거나, 예를 들어 트리클로로실란과 같은 상응하는 클로로실란이 사용될 경우 추가적인 알코올 분해 단계가 필요하다는 사실이다. 후자는, 특히, 중합 경향을 갖는 (메트)아크릴로실란에 대한 수반되는 부가적인 온도 부하로 인하여 매우 바람직하지 않다. 게다가, 이 합성 경로에 의하면, 실릴기와 (메트)아크릴기 사이의 스페이서가 3개 이상의 탄소 원자를 갖는 (메트)아크릴로실란만을 제조할 수 있다. 가수분해에 있어서의 높은 반응성으로 인하여 특히 유용한 α-(메트)아크릴로일옥시메틸알콕시실란은 이 경로를 통해 얻을 수 없다.Various methods are known for the preparation of such compounds. For example, DE # 2851456 or DE # 3832621 describes hydrosilylation using a noble metal catalyst in which a Si-H-containing compound is added and reacted with allyl (meth) acrylate. However, a disadvantage of these methods is the fact that in some cases a highly toxic alkoxysilane, such as for example trimethoxysilane, must be used, or an additional alcohol decomposition step is required if the corresponding chlorosilane, for example trichlorosilane, is used. to be. The latter is very undesirable, in particular due to the accompanying additional temperature load on (meth) acrylosilanes which have a tendency to polymerize. Moreover, according to this synthetic route, only the (meth) acrylosilane whose spacer between a silyl group and a (meth) acryl group has 3 or more carbon atoms can be manufactured. Particularly useful α- (meth) acryloyloxymethylalkoxysilanes cannot be obtained via this route due to the high reactivity in hydrolysis.
따라서, 더 선호되고 더 보편적인 제조 방법은, (메트)아크릴로실란을 클로로알킬실란과 알칼리 금속 (메트)아크릴레이트의 반응에 의해 제조하는 방법이다. 불균질 반응을 촉진하기 위해, 종종 반응 혼합물을 상 이동 촉매와 혼합한다. 이러한 유형의 방법은, 예를 들어, EP 0437653, EP 1249454 또는 WO 2007/063011에 기재되어 있다.Thus, a more preferred and more common method of preparation is the process of preparing (meth) acrylosilanes by reaction of chloroalkylsilanes with alkali metal (meth) acrylates. To promote heterogeneous reactions, the reaction mixture is often mixed with a phase transfer catalyst. Methods of this type are described, for example, in EP # 0437653, EP # 1249454 or WO # 2007/063011.
그러나, 이러한 불균질 반응의 반응 속도는, 상 이동 촉매가 첨가되는 경우에도, 대체로 중간 정도에 불과하다. 다시 말해서, 거의 완전한 전환을 달성하기 위해서는 몇 시간의 반응 시간과 일반적으로 70℃∼120℃의 높은 반응 온도가 필요하다.However, the reaction rate of such a heterogeneous reaction is generally only moderate when the phase transfer catalyst is added. In other words, several hours of reaction time and a high reaction temperature of generally 70 ° C. to 120 ° C. are required to achieve near complete conversion.
이는, 반응 생성물이 중합, 특히 자유 라디칼 중합에 민감한 한에 있어서는 문제가 된다. (메트)아크릴레이트의 중합은 고발열 반응이고 그 속도는 온도가 증가함에 따라 급격히 증가하기 때문에, "폭주(runaway)" 중합의 위험은 매우 심각하게 고려되어야 하는 안전 리스크이다. 게다가, 단지 적은 비율의 생성물의 중합도 수율 감소를 초래할 수 있고, (가능하게는, 형성된 중합체가 증류 바닥 생성물에 축적되는 증류 정제 시에만) 제거하기가 어렵고 제조 공정을 예민하게 교란시킬 수 있는 중합체 퇴적물의 형성을 초래할 수 있다.This is a problem as long as the reaction product is sensitive to polymerization, in particular free radical polymerization. Since the polymerization of (meth) acrylate is a high exothermic reaction and its rate increases rapidly with increasing temperature, the risk of "runaway" polymerization is a safety risk that must be taken very seriously. In addition, polymer deposits of only a small proportion of the product can also lead to reduced yields and are difficult to remove (possibly only during distillation purification in which the formed polymer accumulates in the distillation bottom product) and can disrupt the manufacturing process sharply. May result in the formation of.
자유 라디칼 중합은, 예를 들어 EP 0 520 477과 같은 다수의 특허에 기재된 유형의 자유 라디칼 스캐빈저의 첨가를 통해 억제할 수 있다. 그러나, 이러한 수단의 유효성은 시간 측면에서 제한되는데, 왜냐하면 자유 라디칼 스캐빈저는 그 효과를 발현할 때 소모되기 때문이다.Free radical polymerization can be inhibited through the addition of free radical scavengers of the type described in many patents, for example EP'0'520'477. However, the effectiveness of such means is limited in terms of time, since free radical scavengers are consumed when expressing the effect.
이와 함께, 자유 라디칼 스캐빈저의 사용량을 최소로 제한하는 것이 목적이다. 그 이유는, 이 물질이 고가일 뿐만 아니라, 특히 심지어 자유 라디칼 스캐빈저와 그 분해 생성물이 결국 불순물이 되고, 따라서 바람직하지 않은 특성이 발현될 수도 있다는 사실 때문이다. 예를 들어, 다수의 안정화제와, EP 0 520 477에 기재된 자유 라디칼 스캐빈저는 예를 들어 변색 현상을 초래한다. 결국, 이들 물질은, (메트)아크릴로실란이 최종적으로 의도대로 중합 또는 공중합되어야 하는 경우에도, 중합 거동에 영향을 준다. 중합체 최종 생성물의 특성(예를 들어, 평균 사슬 길이 또는 사슬 길이 분포)에 영향을 줄 수도 있는 이러한 영향은 일반적으로 바람직하지 않다.In addition, it is an object to limit the amount of free radical scavenger used to a minimum. The reason is not only that this material is expensive, but also in particular due to the fact that even free radical scavengers and their decomposition products eventually become impurities, and thus undesirable properties may be expressed. For example, many stabilizers and the free radical scavengers described in EP '0'520 477 cause discoloration phenomena, for example. In turn, these materials affect the polymerization behavior even when the (meth) acrylosilanes must finally polymerize or copolymerize as intended. Such effects that may affect the properties of the polymer end product (eg, average chain length or chain length distribution) are generally undesirable.
따라서, 가능한 한 낮은 온도에서 가능한 한 짧은 시간 내에 반응이 진행되는 합성 방법이 바람직하다. 이는, (메트)아크릴로실란이 그 합성 과정뿐만 아니라 정제 과정(통상적으로 증류 정제)에서도 열 부하에 노출되기 때문에 더욱 더 그러하다. 따라서, 전체 부하는 절대 불가피한 최소 수준으로 한정되어야 한다.Therefore, a synthetic method is preferred in which the reaction proceeds at the lowest possible temperature at the shortest possible time. This is even more so because the (meth) acrylosilanes are exposed to heat load not only in their synthesis but also in the purification process (usually distillation purification). Therefore, the overall load should be limited to the absolute unavoidable minimum level.
따라서, 본 발명의 목적은 종래의 아크릴로실란 또는 메타크릴로실란의 제조 방법을 개선시킴으로써, 해당 생성물을 일관된 품질로, 그러나 더 낮은 온도 및/또는 더 짧은 반응 시간에 제조할 수 있도록 하는 것이었다.Therefore, it was an object of the present invention to improve the conventional process for preparing acrylosilanes or methacrylosilanes, so that the product can be produced in consistent quality but at lower temperatures and / or shorter reaction times.
본 발명은 하기 일반식 (2)의 할로알킬실란(S1) 및 하기 일반식 (3)의 불포화 유기 카복실산의 염(S2)으로부터 출발하여 하기 일반식 (1)의 실란(S)을 제조하는 방법으로서, 성분(S1)과 성분(S2)의 반응 전 또는 중에, 할로알킬실란(S1)의 비점보다 낮은 비점을 갖는 1종 이상의 성분(L)을 반응 혼합물, 부분 혼합물 또는 개별 반응물 성분으로부터 증류에 의해 적어도 부분적으로 제거하는 것인 제조 방법을 제공한다:The present invention starts from haloalkylsilane (S1) of the following general formula (2) and salt (S2) of unsaturated organic carboxylic acid of the following general formula (3) to produce silane (S) of the following general formula (1) As one or more components (L) having a boiling point lower than that of haloalkylsilane (S1), before or during the reaction of component (S1) with component (S2), distillation from the reaction mixture, partial mixture or individual reactant components It provides a method of preparation, which is at least partially removed by:
(R1')2C=C(R1)C(O)O-(R2)-Si(R3)z(OR4)3-z (1)(R 1 ′ ) 2 C═C (R 1 ) C (O) O— (R 2 ) —Si (R 3 ) z (OR 4 ) 3-z (1)
X-(R2)-Si(R3)z(OR4)3-z (2)X- (R 2 ) -Si (R 3 ) z (OR 4 ) 3-z (2)
Mw+[(R1')2C=C(R1)C(O)O-]w (3) M w + [(R 1 ' ) 2 C = C (R 1) C (O) O -] w (3)
(상기 식에서, (Wherein
R1 및 R1'은 서로 독립적으로 각각 수소 원자, 또는 탄소 원자수 1∼10의 직쇄 또는 분지쇄 탄화수소 라디칼이고,R 1 and R 1 ′ are each independently a hydrogen atom or a straight or branched chain hydrocarbon radical having 1 to 10 carbon atoms,
R2는, 질소, 산소, 황 또는 인 원소로부터 선택되는 하나 이상의 이종 원자를 포함할 수 있는, 탄소 원자수 1∼40의 직쇄 또는 분지쇄 탄화수소 라디칼이며, R 2 is a straight or branched chain hydrocarbon radical of 1 to 40 carbon atoms, which may include one or more heteroatoms selected from nitrogen, oxygen, sulfur or phosphorus elements,
R3 및 R4는 서로 독립적으로 탄소 원자수 1∼10의 직쇄 또는 분지쇄 탄화수소 라디칼이고,R 3 and R 4 are each independently a straight or branched chain hydrocarbon radical having 1 to 10 carbon atoms,
X는 할로겐 원자이며,X is a halogen atom,
Mw+는 알칼리 금속 또는 알칼리 토금속 이온이고,M w + is an alkali metal or alkaline earth metal ion,
Mw+의 원자가에 해당하는 w는 1 또는 2의 값을 가질 수 있으며, W corresponding to the valence of M w + may have a value of 1 or 2,
z는 0, 1 또는 2의 값을 가질 수 있다.z may have a value of 0, 1 or 2.
본 발명은 반응 혼합물로부터 저비점 성분(L)을 증류에 의해 제거함으로써 성분(S1)과 성분(S2)의 반응 속도를 현저히 촉진할 수 있다는 놀라운 발견에 기초한 것이다. 이로써 공간-시간 수율이 높아진다.The present invention is based on the surprising discovery that by removing distillation of the low boiling point component (L) from the reaction mixture, it is possible to significantly promote the reaction rate of the component (S1) and the component (S2). This increases the space-time yield.
일반식 (1)∼(3)에서, R1 및 R1'은 바람직하게는 수소, 또는 탄소 원자수 1∼3의 알킬 라디칼, 더 구체적으로 CH3이며; R2는 바람직하게는 탄소 원자수 1∼6의 알킬 라디칼, 더 구체적으로 CH2 또는 (CH2)3 기이고; R3은 바람직하게는 CH3 또는 에틸 라디칼이며; R4는 바람직하게는 메틸, 에틸, 프로필 또는 이소프로필 라디칼이고, 이때 메틸 및 에틸 라디칼이 특히 바람직하다. X는 바람직하게는 염소 또는 브롬이고, 더 바람직하게는 염소이다. Mw+는 바람직하게는 Li, Na, K, Rb 및 Cs 이온으로부터 선택되는 알칼리 금속 이온이고, 이때 나트륨 이온과, 특히 칼륨 이온이 특히 바람직하다.In general formulas (1) to (3), R 1 and R 1 ′ are preferably hydrogen or an alkyl radical having 1 to 3 carbon atoms, more specifically CH 3 ; R 2 is preferably an alkyl radical of 1 to 6 carbon atoms, more specifically a CH 2 or (CH 2 ) 3 group; R 3 is preferably a CH 3 or ethyl radical; R 4 is preferably a methyl, ethyl, propyl or isopropyl radical, with methyl and ethyl radicals being particularly preferred. X is preferably chlorine or bromine, more preferably chlorine. M w + is preferably an alkali metal ion selected from Li, Na, K, Rb and Cs ions, with sodium ions and especially potassium ions being particularly preferred.
특히 바람직하게는 본 발명의 방법은 메타크릴로일옥시 또는 아크릴로일옥시 작용기를 갖는 실란(S)을 제조하는 데 이용된다.Particularly preferably the process of the invention is used to prepare silanes (S) having methacryloyloxy or acryloyloxy functional groups.
성분(S1)과 성분(S2)의 반응 전 또는 중에 반응 혼합물로부터 증류에 의해 제거되고 할로알킬실란(S1)의 비점보다 낮은 비점을 갖는 성분(L)은 바람직하게는 알코올, 물 및/또는 미량의 (메트)아크릴산이다. 알코올, 더 구체적으로 하기 일반식 (4)의 알코올(A)이 특히 바람직하다:Component (L) which is removed by distillation from the reaction mixture before or during the reaction of component (S1) with component (S2) and which has a boiling point lower than that of haloalkylsilane (S1) is preferably alcohol, water and / or trace (Meth) acrylic acid. Alcohols, more particularly alcohols (A) of the general formula (4):
R4OH (4)R 4 OH (4)
상기 식에서, R4는 일반식 (2) 및 (3)에 대해 기재된 것과 동일한 정의를 갖는다. 상기 일반식 (4)의 알코올(A)은 실란(S1)과 염(S2) 둘 다의 불순물로서 반응 혼합물로 도입될 수 있다. 이것은 또한 실란 (S) 또는 (S1)의 실란 작용기 상의 OR4 기가 염(S2) 내에 존재하는 다른 양성자성 불순물(예를 들어, 물, (메트)아크릴산 또는 다른 알코올)로 치환되는 에스테르 교환반응에 의해 형성될 수도 있다.Wherein R 4 has the same definition as described for General Formulas (2) and (3). Alcohol (A) of formula (4) may be introduced into the reaction mixture as impurities of both silane (S1) and salt (S2). It is also subject to transesterification in which the OR 4 groups on the silane functional groups of silane (S) or (S1) are replaced by other protic impurities (eg water, (meth) acrylic acid or other alcohols) present in the salt (S2). It may be formed by.
(메트)아크릴산 염(S2)은 일반적으로 소량의 양성자성 불순물, 더 구체적으로 (메트)아크릴산, 물 및/또는 알코올을 함유하기 때문에, 실란 (S) 또는 (S1)의 실릴기 상의 상기에 언급된 치환 반응은, 선행 기술에 기재된 반응 방식에서는 일반적으로 반응 혼합물 중에 특정량의 알코올(A)이 존재한다는 것을 의미하는데, 그 수치는 본 발명에 의한 저비점 성분(L)의 제거를 통해 저감할 수 있으며, 이것이 놀랍게도 상기에 언급한 본 발명의 효과로 이어진다.Since the (meth) acrylic acid salt (S2) generally contains a small amount of protic impurities, more specifically (meth) acrylic acid, water and / or alcohol, it is mentioned above on the silyl group of silane (S) or (S1). The substitution reaction thus indicated generally means that a certain amount of alcohol (A) is present in the reaction mixture in the reaction modes described in the prior art, the value of which can be reduced through the removal of the low boiling point component (L) according to the invention. This surprisingly leads to the effects of the invention mentioned above.
성분(S1)과 성분(S2)의 반응에서는, 또한, 바람직하게는 1종 이상의 상 이동 촉매(P) 및 1종 이상의 안정화제(St)가 사용된다. 상 이동 촉매(P)의 예로는 EP 0437653, EP 1249454 또는 WO 2007/063011에 기재된 화합물, 더 구체적으로 테트라유기암모늄염 또는 테트라유기포스포늄염, 예를 들어, 테트라부틸포스포늄 클로라이드 또는 브로마이드, 부틸트리부틸포스포늄 클로라이드 또는 브로마이드, 메틸트리부틸포스포늄 클로라이드 또는 브로마이드 및 메틸트리페닐포스포늄 클로라이드가 있다. 하기 일반식 (5)의 3차 포스핀도 상 이동 촉매(P)로서 사용될 수 있다.In the reaction of the component (S1) and the component (S2), preferably, at least one phase transfer catalyst (P) and at least one stabilizer (St) are used. Examples of phase transfer catalysts (P) include compounds described in EP # 0437653, EP # 1249454 or WO # 2007/063011, more specifically tetraorganoammonium salts or tetraorganophosphonium salts, for example tetrabutylphosphonium chloride or bromide, butyltree Butylphosphonium chloride or bromide, methyltributylphosphonium chloride or bromide and methyltriphenylphosphonium chloride. Tertiary phosphines of the general formula (5) below can also be used as phase transfer catalyst (P).
R5 3P (5)R 5 3 P (5)
상기 식에서, R5는 각각의 경우에 동일하거나 상이할 수 있고, 산소 원자 및/또는 질소 원자가 개재할 수 있는, 탄소 원자수 1∼20의 임의로 치환된 1가의 탄화수소 라디칼이다.Wherein R 5 is an optionally substituted monovalent hydrocarbon radical of 1 to 20 carbon atoms, which in each case may be the same or different and may be interrupted by an oxygen atom and / or a nitrogen atom.
바람직한 포스핀은, 예를 들어, 트리부틸포스핀, 트리옥틸포스핀 또는 트리페닐포스핀이다. 상 이동 촉매(P)는 각각의 경우에 사용된 실란(S1)의 양을 기준으로 바람직하게는 0.1∼20 중량%, 더 바람직하게는 1∼10 중량%의 양으로 사용된다.Preferred phosphines are, for example, tributylphosphine, trioctylphosphine or triphenylphosphine. The phase transfer catalyst (P) is preferably used in an amount of 0.1 to 20% by weight, more preferably 1 to 10% by weight, based on the amount of silane (S1) used in each case.
안정화제(St)는, 예를 들어 EP 0 520 477에 기재된 유형의 시판되는 화합물이다. 이 안정화제는 방향족 아민, 퀴논, 하이드로퀴논, 입체 장해 페놀 또는 안정한 자유 라디칼, 예컨대 페노티아진, 하이드로퀴논, 하이드로퀴논 모노메틸 에테르, N,N'-디페닐-p-페닐렌디아민, 2,6-디-tert-부틸페놀, 2,6-디-tert-부틸-4-메틸페놀, 2,6-디-tert-부틸-4(N,N-디메틸아미노)메틸페놀, 2,2,6,6-테트라메틸피페리딜 N-옥시드 또는 3,5-디-tert-부틸-4-하이드록시톨루엔일 수 있다. 안정화제(St)는 각각의 경우에 사용된 실란(S1)의 양을 기준으로 0.01∼1 중량%, 더 바람직하게는 0.05∼0.4 중량%의 양으로 사용된다.Stabilizers (St) are commercially available compounds of the type described, for example, in EP 0 520 477. These stabilizers include aromatic amines, quinones, hydroquinones, steric hindrance phenols or stable free radicals such as phenothiazines, hydroquinones, hydroquinone monomethyl ethers, N, N'-diphenyl-p-phenylenediamines, 2, 6-di-tert-butylphenol, 2,6-di-tert-butyl-4-methylphenol, 2,6-di-tert-butyl-4 (N, N-dimethylamino) methylphenol, 2,2, 6,6-tetramethylpiperidyl N-oxide or 3,5-di-tert-butyl-4-hydroxytoluene. Stabilizer (St) is used in an amount of 0.01 to 1% by weight, more preferably 0.05 to 0.4% by weight, based on the amount of silane (S1) used in each case.
산소는 보조 안정화제로서 작용할 수 있다. 이러한 이유로, 본 발명의 반응은 희박 공기 중에서, 즉 0.1∼2%의 산소를 함유하는 산소 중에서 수행될 수 있다.Oxygen may act as an auxiliary stabilizer. For this reason, the reaction of the present invention can be carried out in lean air, that is, in oxygen containing 0.1 to 2% oxygen.
상 이동 촉매(P) 및 안정화제(St)는 경우에 따라 1종 이상의 용매(L1) 중의 용액으로서 첨가될 수도 있다. 용매(L1)로서는 모든 용매를 사용할 수 있으나, 통상의 휘발성 용매를 사용하는 것이 바람직하고, 그 예로는 케톤, 예컨대 아세톤, 메틸 에틸 케톤 및 메틸 이소부틸 케톤, 에스테르, 예컨대 에틸 아세테이트, 알코올, 예컨대 메탄올, 에탄올, 프로판올 및 부탄올, 에테르, 예컨대 THF, 디옥산, 디에틸 에테르 및 메틸 tert-부틸 에테르, 방향족 화합물, 예컨대 톨루엔 및 크실렌, 또는 알칸, 예컨대 펜탄, 헥산, 사이클로헥산 및 헵탄이 있다.Phase transfer catalyst (P) and stabilizer (St) may optionally be added as a solution in one or more solvents (L1). Any solvent may be used as the solvent (L1), but a conventional volatile solvent is preferably used, and examples thereof include ketones such as acetone, methyl ethyl ketone and methyl isobutyl ketone, esters such as ethyl acetate, alcohols such as methanol , Ethanol, propanol and butanol, ethers such as THF, dioxane, diethyl ether and methyl tert-butyl ether, aromatic compounds such as toluene and xylene, or alkanes such as pentane, hexane, cyclohexane and heptane.
본 발명의 방법에서는, 용매(L1)를 휘발성 성분(L)과 함께 제거하는 것이 바람직하다.In the method of the present invention, it is preferable to remove the solvent (L1) together with the volatile component (L).
일반식 (1)의 실란(S)을 제조하기 위한 본 발명 방법의 바람직한 일 실시형태에서, 이 방법은In one preferred embodiment of the process of the invention for preparing the silane (S) of formula (1), the process is
ㆍ 먼저 일반식 (2)의 할로알킬실란(S1)을 공급하는 단계,First feeding a haloalkylsilane (S1) of formula (2),
ㆍ 할로알킬실란(S1)의 비점보다 낮은 비점을 갖는 1종 이상의 성분(L)을증류에 의해 적어도 부분적으로 제거하는 단계,At least partially removing by distillation at least one component (L) having a boiling point lower than that of haloalkylsilane (S1),
ㆍ 일반식 (3)의 불포화 유기 카복실산의 염(S2)을 첨가하는 단계Adding a salt of unsaturated organic carboxylic acid of formula (3) (S2)
를 특징으로 한다.It is characterized by.
이들 공정 단계는 기재된 순서대로 수행되는 것이 바람직하다.These process steps are preferably performed in the order described.
추가의 공정 단계에서, 1종 이상의 상 이동 촉매(P) 및/또는 1종 이상의 안정화제(St), 또는 용매(L1) 중의 이들 성분 1종 이상의 용액을 또한 첨가하는 것이 바람직하다. 이러한 첨가는 실란(S1)의 초기 공급 전, 중 또는 후에 수행할 수 있다. 또한, 성분 (P), (St) 및/또는 (L1)을 할로실란(S1)과 함께 사전 혼합하여 이들을 함께 공급하는 것도 가능하다.In a further process step, it is also preferred to add at least one phase transfer catalyst (P) and / or at least one stabilizer (St), or a solution of at least one of these components in solvent (L1). This addition can be carried out before, during or after the initial feed of silane (S1). It is also possible to premix the components (P), (St) and / or (L1) with halosilanes (S1) and feed them together.
용매(L1) 중의 1종 이상의 상 이동 촉매(P) 및 임의적인 1종 이상의 안정화제(St)의 용액을 휘발성이 더 큰 성분(들)(L)의 (부분) 제거 전에 첨가하는 것이 특히 바람직하며, 따라서 이 제거 공정 단계에서는 용매(들)(L1) 역시 완전히 또는 적어도 부분적으로 제거된다.Particular preference is given to adding a solution of at least one phase transfer catalyst (P) and optionally at least one stabilizer (St) in solvent (L1) before (part) removal of the more volatile component (s) (L). Thus, in this removal process step, the solvent (s) L1 are also completely or at least partially removed.
또한, 상기 반응 혼합물은 1종 이상의 용매를 포함할 수 있다. 그러나, 반응을 용매 없이 수행하는 것이 바람직하다.In addition, the reaction mixture may comprise one or more solvents. However, it is preferred to carry out the reaction without solvent.
본 발명 방법의 공정을 수행함에 있어서, 저비점 성분(L)은, 반응 성분 중 일부 또는 전부를 반응 용기에 공급한 후, 해당 혼합물이 비등하는 정도까지 압력을 낮춤으로써 제거하는 것이 바람직하다. 그 후, 바람직하게는 전체 반응 혼합물의 0.1∼5 중량%를 증류에 의해 제거한다.In carrying out the process of the method of the present invention, the low boiling point component (L) is preferably removed by supplying some or all of the reaction components to the reaction vessel and lowering the pressure to the extent that the mixture is boiling. Thereafter, preferably, 0.1 to 5% by weight of the total reaction mixture is removed by distillation.
바람직한 방법의 일례에서는, 일반식 (1)의 실란을 이미 포함하고 있고 경우에 따라 상 이동 촉매(P) 및/또는 안정화제(St)를 이미 포함하고 있으나 염(S2)은 아직 포함하고 있지 않은 혼합물로부터 저비점 성분을 제거한다. 또 다른 바람직한 변법에서는, (메트)아크릴레이트 염(S2) 역시 전부 또는 일부 첨가한 후 저비점 성분(L)을 제거한다. 특히 바람직한 것은, 저비점 성분(들)(L)을 제거하기 위한 증류 단계를 반응 시작 전 또는 시작 시에 수행하고, 반응 중에도 하나 이상의 추가적인 증류 단계를 수행하는 것이다. 이는, 반응 중에, 실란 (S) 및/또는 (S1)의 실릴기 상에서의 상기에 언급된 치환으로 인해 소량의 알코올(A)이 새로이 형성되고, 예를 들어, 염(S2)이 용해됨에 따라 염(S2)으로부터 미량의 물이 발생됨으로 인해 실란 (S) 또는 (S1)의 가수분해 반응이 초래되는 경우에 특히 알맞다. 그 후, 이 미량의 알코올은 추가적인 증류 단계로 제거한다.In one example of the preferred process, the silane of formula (1) is already included and optionally already contains a phase transfer catalyst (P) and / or stabilizer (St) but no salt (S2) yet. The low boiling point component is removed from the mixture. In another preferred variant, the low boiling point component (L) is removed after all or part of the (meth) acrylate salt (S2) is also added. Particular preference is given to carrying out the distillation step to remove the low boiling point component (s) (L) before or at the beginning of the reaction and at least one further distillation step during the reaction. This is because during the reaction, a small amount of alcohol (A) is newly formed due to the abovementioned substitution on the silyl groups of silane (S) and / or (S1), for example as the salt (S2) is dissolved. Particularly suitable when the traces of water from salt (S2) result in the hydrolysis reaction of silane (S) or (S1). This trace of alcohol is then removed by an additional distillation step.
성분(S1) 및 성분(S2) 중의 일반식 (4)의 유리 알코올(A)의 양은 각각의 경우에 전체 반응 혼합물을 기준으로 바람직하게는 4 중량% 이하, 더 구체적으로 2 중량% 이하이며, 1.5 중량% 이하 또는 1 중량% 이하의 값이 특히 바람직하다.The amount of free alcohol (A) of formula (4) in components (S1) and (S2) is preferably in each case preferably 4% by weight or less, more specifically 2% by weight or less, based on the total reaction mixture, Particular preference is given to values up to 1.5% by weight or up to 1% by weight.
바람직한 실시형태 중 하나의 경우, 저비점 성분(L)의 증류 제거는 반응 온도에서 및/또는 가온 단계 중에 수행되며, 냉각기의 압력 및/또는 환류비에 의해서만 제어된다. 이는, 장시간의 가온 및 냉각 단계로 인한 시간 손실이 없다는 장점이 있다.In one of the preferred embodiments, the distillation off of the low boiling point component (L) is carried out at the reaction temperature and / or during the warming step and is only controlled by the pressure and / or reflux ratio of the cooler. This has the advantage that there is no time loss due to long heating and cooling steps.
휘발성 성분(L)의 증류 제거 중 및/또는 일반식 (2)의 할로알킬실란(S1)과 일반식 (3)의 불포화 유기 카복실산의 염(S2)의 반응 중의 온도는 바람직하게는 60℃ 이상, 더 바람직하게는 70℃ 이상, 바람직하게는 150℃ 이하, 더 바람직하게는 120℃ 이하이다. 부산물로서 형성된 할로겐 염과, 경우에 따라 일반식 (4)의 음이온을 갖는 (메트)아크릴산 염의 임의의 잔류물은 바람직하게는 여과로 제거한다. 그 후, 생성물을 바람직하게는 증류에 의해 정제하며, 이때 하나 이상의 정제 단계를 수행한다. 먼저 저비점 불순물을 증류에 의해 분리하는 것이 바람직하다. 이는 바람직하게는 감압 하에 20℃ 이상, 더 바람직하게는 40℃ 이상, 바람직하게는 120℃ 이하, 더 바람직하게는 80℃ 이하의 온도에서 수행한다.The temperature during the distillation of the volatile component (L) and / or during the reaction of the haloalkylsilane (S1) of the general formula (2) and the salt (S2) of the unsaturated organic carboxylic acid of the general formula (3) is preferably 60 ° C. or higher. More preferably, it is 70 degreeC or more, Preferably it is 150 degrees C or less, More preferably, it is 120 degrees C or less. Any residues of halogen salts formed as by-products and optionally (meth) acrylic acid salts with anions of the general formula (4) are preferably removed by filtration. The product is then purified, preferably by distillation, with one or more purification steps carried out. It is preferable to first separate the low boiling point impurities by distillation. This is preferably carried out under reduced pressure at a temperature of at least 20 ° C, more preferably at least 40 ° C, preferably at most 120 ° C, more preferably at most 80 ° C.
그 후, 필요에 따라, 일반식 (1)의 실란(S) 자체를 증류시키는데, 이 증류 단계 역시 감압 하에 수행하는 것이 바람직하며, 따라서 증류 중의 액상 온도는 200℃ 이하, 바람직하게는 150℃ 이하, 더 바람직하게는 130℃ 이하이다.Thereafter, if necessary, the silane (S) of general formula (1) itself is distilled, and this distillation step is also preferably performed under reduced pressure, so that the liquidus temperature during distillation is 200 ° C or lower, preferably 150 ° C or lower. More preferably, it is 130 degrees C or less.
일반식 (1)의 불포화 규소 화합물(S)의 예로는 아크릴로실란, 예를 들어, 아크릴로일옥시메틸트리메톡시실란, 아크릴로일옥시메틸트리에톡시실란, 아크릴로일옥시메틸트리페닐옥시실란, 아크릴로일옥시메틸트리이소프로폭시실란, 아크릴로일옥시메틸트리스(2-메톡시에톡시)실란, 아크릴로일옥시메틸(메틸)디메톡시실란, 아크릴로일옥시메틸(메틸)디에톡시실란, 아크릴로일옥시메틸(메틸)디페닐옥시실란, 아크릴로일옥시메틸(메틸)디이소프로폭시실란, 아크릴로일옥시메틸(메틸)비스(2-메톡시에톡시)실란, 아크릴로일옥시메틸(디메틸)메톡시실란, 아크릴로일옥시메틸(디메틸)에톡시실란, 아크릴로일옥시메틸(디메틸)페닐옥시실란, 아크릴로일옥시메틸(디메틸)이소프로폭시실란, 아크릴로일옥시메틸(디메틸)(2-메톡시에톡시)실란, 3-아크릴로일옥시프로필트리메톡시실란, 3-아크릴로일옥시프로필트리에톡시실란, 3-아크릴로일옥시프로필트리페닐옥시실란, 3-아크릴로일옥시프로필트리이소프로폭시실란, 3-아크릴로일옥시프로필트리스(2-메톡시에톡시)실란, 3-아크릴로일옥시프로필(메틸)디메톡시실란, 3-아크릴로일옥시프로필(메틸)디에톡시실란, 3-아크릴로일옥시프로필(메틸)디페닐옥시실란, 3-아크릴로일옥시프로필(메틸)디이소프로폭시실란, 3-아크릴로일옥시프로필(메틸)비스(2-메톡시에톡시)실란, 3-아크릴로일옥시프로필(디메틸)메톡시실란, 3-아크릴로일옥시프로필(디메틸)에톡시실란, 3-아크릴로일옥시프로필(디메틸)페닐옥시실란, 3-아크릴로일옥시프로필(디메틸)이소프로폭시실란, 3-아크릴로일옥시프로필(디메틸)(2-메톡시에톡시)실란 또는 메타크릴로실란, 예를 들어, 메타크릴로일옥시메틸트리메톡시실란, 메타크릴로일옥시메틸트리에톡시실란, 메타크릴로일옥시메틸트리페닐옥시실란, 메타크릴로일옥시메틸트리이소프로폭시실란, 메타크릴로일옥시메틸트리스(2-메톡시에톡시)실란, 메타크릴로일옥시메틸(메틸)디메톡시실란, 메타크릴로일옥시메틸(메틸)디에톡시실란, 메타크릴로일옥시메틸(메틸)디페닐옥시실란, 메타크릴로일옥시메틸(메틸)디이소프로폭시실란, 메타크릴로일옥시메틸(메틸)비스(2-메톡시에톡시)실란, 메타크릴로일옥시메틸(디메틸)메톡시실란, 메타크릴로일옥시메틸(디메틸)에톡시실란, 메타크릴로일옥시메틸(디메틸)페닐옥시실란, 메타크릴로일옥시메틸(디메틸)이소프로폭시실란, 메타크릴로일옥시메틸(디메틸)(2-메톡시에톡시)실란, 3-메타크릴로일옥시프로필트리메톡시실란, 3-메타크릴로일옥시프로필트리에톡시실란, 3-메타크릴로일옥시프로필트리페닐옥시실란, 3-메타크릴로일옥시프로필트리이소프로폭시실란, 3-메타크릴로일옥시프로필트리스(2-메톡시에톡시)실란, 3-메타크릴로일옥시프로필(메틸)디메톡시실란, 3-메타크릴로일옥시프로필(메틸)디에톡시실란, 3-메타크릴로일옥시프로필(메틸)디페닐옥시실란, 3-메타크릴로일옥시프로필(메틸)디이소프로폭시실란, 3-메타크릴로일옥시프로필(메틸)비스(2-메톡시에톡시)실란, 3-메타크릴로일옥시프로필(디메틸)메톡시실란, 3-메타크릴로일옥시프로필(디메틸)에톡시실란, 3-메타크릴로일옥시프로필(디메틸)페닐옥시실란, 3-메타크릴로일옥시프로필(디메틸)이소프로폭시실란, 3-메타크릴로일옥시프로필(디메틸)(2-메톡시에톡시)실란이 있다.Examples of the unsaturated silicon compound (S) of the general formula (1) include acrylosilanes such as acryloyloxymethyltrimethoxysilane, acryloyloxymethyltriethoxysilane and acryloyloxymethyltriphenyl Oxysilane, acryloyloxymethyltriisopropoxysilane, acryloyloxymethyltris (2-methoxyethoxy) silane, acryloyloxymethyl (methyl) dimethoxysilane, acryloyloxymethyl (methyl) Diethoxysilane, acryloyloxymethyl (methyl) diphenyloxysilane, acryloyloxymethyl (methyl) diisopropoxysilane, acryloyloxymethyl (methyl) bis (2-methoxyethoxy) silane, Acryloyloxymethyl (dimethyl) methoxysilane, acryloyloxymethyl (dimethyl) ethoxysilane, acryloyloxymethyl (dimethyl) phenyloxysilane, acryloyloxymethyl (dimethyl) isopropoxysilane, acryl Royloxymethyl (dimethyl) (2-methoxyethoxy) silane, 3-acryloyloxy Lofiltrimethoxysilane, 3-acryloyloxypropyltriethoxysilane, 3-acryloyloxypropyltriphenyloxysilane, 3-acryloyloxypropyltriisopropoxysilane, 3-acryloyloxypropyl Tris (2-methoxyethoxy) silane, 3-acryloyloxypropyl (methyl) dimethoxysilane, 3-acryloyloxypropyl (methyl) diethoxysilane, 3-acryloyloxypropyl (methyl) di Phenyloxysilane, 3-acryloyloxypropyl (methyl) diisopropoxysilane, 3-acryloyloxypropyl (methyl) bis (2-methoxyethoxy) silane, 3-acryloyloxypropyl (dimethyl ) Methoxysilane, 3-acryloyloxypropyl (dimethyl) ethoxysilane, 3-acryloyloxypropyl (dimethyl) phenyloxysilane, 3-acryloyloxypropyl (dimethyl) isopropoxy silane, 3- Acryloyloxypropyl (dimethyl) (2-methoxyethoxy) silane or methacrylosilane, for example methacryloyloxy Methyl trimethoxysilane, methacryloyloxymethyltriethoxysilane, methacryloyloxymethyltriphenyloxysilane, methacryloyloxymethyltriisopropoxysilane, methacryloyloxymethyltris (2- Methoxyethoxy) silane, methacryloyloxymethyl (methyl) dimethoxysilane, methacryloyloxymethyl (methyl) diethoxysilane, methacryloyloxymethyl (methyl) diphenyloxysilane, methacrylo Iloxymethyl (methyl) diisopropoxysilane, methacryloyloxymethyl (methyl) bis (2-methoxyethoxy) silane, methacryloyloxy methyl (dimethyl) methoxysilane, methacryloyloxy Methyl (dimethyl) ethoxysilane, methacryloyloxymethyl (dimethyl) phenyloxysilane, methacryloyloxymethyl (dimethyl) isopropoxysilane, methacryloyloxymethyl (dimethyl) (2-methoxy to Methoxy) silane, 3-methacryloyloxypropyltrimethoxysilane, 3-methacryloyloxypropyl Ethoxysilane, 3-methacryloyloxypropyltriphenyloxysilane, 3-methacryloyloxypropyltriisopropoxysilane, 3-methacryloyloxypropyltris (2-methoxyethoxy) silane, 3-methacryloyloxypropyl (methyl) dimethoxysilane, 3-methacryloyloxypropyl (methyl) diethoxysilane, 3-methacryloyloxypropyl (methyl) diphenyloxysilane, 3-methacryl Loyloxypropyl (methyl) diisopropoxysilane, 3-methacryloyloxypropyl (methyl) bis (2-methoxyethoxy) silane, 3-methacryloyloxypropyl (dimethyl) methoxysilane, 3-methacryloyloxypropyl (dimethyl) ethoxysilane, 3-methacryloyloxypropyl (dimethyl) phenyloxysilane, 3-methacryloyloxypropyl (dimethyl) isopropoxysilane, 3-methacryl Royloxypropyl (dimethyl) (2-methoxyethoxy) silane.
일반식 (1)의 특히 바람직한 불포화 유기 규소 화합물(S)의 예는 R2가 메틸렌기인 화합물이다. 이러한 실란은 대체로 특히 높은 중합 경향과 함께 특히 높은 반응성을 갖는 것이 특징이다. 특히 바람직한 것은 아크릴로일옥시메틸트리메톡시실란, 아크릴로일옥시메틸트리에톡시실란, 아크릴로일옥시메틸(메틸)디메톡시실란, 아크릴로일옥시메틸(메틸)디에톡시실란, 아크릴로일옥시메틸(디메틸)메톡시실란, 아크릴로일옥시메틸(디메틸)에톡시실란, 메타크릴로일옥시메틸트리메톡시실란, 메타크릴로일옥시메틸트리에톡시실란, 메타크릴로일옥시메틸(메틸)디메톡시실란, 메타크릴로일옥시메틸(메틸)디에톡시실란, 메타크릴로일옥시메틸(디메틸)메톡시실란 및 메타크릴로일옥시메틸(디메틸)에톡시실란이다.An example of especially preferable unsaturated organosilicon compound (S) of General formula (1) is a compound whose R <2> is a methylene group. Such silanes are generally characterized by having particularly high reactivity with an especially high tendency for polymerization. Particularly preferred are acryloyloxymethyltrimethoxysilane, acryloyloxymethyltriethoxysilane, acryloyloxymethyl (methyl) dimethoxysilane, acryloyloxymethyl (methyl) diethoxysilane, acryloyl Oxymethyl (dimethyl) methoxysilane, acryloyloxymethyl (dimethyl) ethoxysilane, methacryloyloxymethyltrimethoxysilane, methacryloyloxymethyltriethoxysilane, methacryloyloxymethyl ( Methyl) dimethoxysilane, methacryloyloxymethyl (methyl) diethoxysilane, methacryloyloxymethyl (dimethyl) methoxysilane and methacryloyloxymethyl (dimethyl) ethoxysilane.
상기 식들의 상기 부호 모두는 각각의 경우에 서로 독립적으로 그 정의를 갖는다. 모든 식에서 규소 원자는 4가이다.All of the above signs of the above formulas have their definitions independently of one another in each case. In all formulas the silicon atom is tetravalent.
후술하는 본 발명예와 비교예에서, 달리 명시하지 않는다면, 모든 양(量)의 값과 백분율 값은 중량 기준으로 나타낸 것이며, 모든 반응은 0.10 MPa의 압력(절대압력) 및 20℃의 온도에서 수행된다.In the following examples and comparative examples, unless otherwise specified, all positive values and percentage values are expressed by weight, and all reactions are carried out at a pressure of 0.10 MPa (absolute pressure) and a temperature of 20 ° C. do.
본 발명예 1:Inventive Example 1:
KPG 교반기, 냉각기 및 온도계가 구비된 500 ml 용량의 플라스크에, 먼저 319.12 g(1.50 mol)의 클로로메틸트리에톡시실란을 투입하고, 8.85 g의 테트라부틸포스포늄 클로라이드 및 0.15 g의 페노티아진을 첨가한다. 이 투입물을 오일조에서 110℃까지 가열한 후, 195.6 g(1.575 mol)의 칼륨 메타크릴레이트를 첨가한다. 첨가 종료 시, 반응 용기의 압력을 100 mbar까지 낮추고, 증류에 의해 총 약 15 g의 저비점 성분을 제거한다. 그 후, 압력을 다시 대기압까지 올린다. 증류 중과 후속 반응 전체 동안에, 반응 온도를 108℃∼112℃로 일정하게 유지한다. 1시간의 전체 반응 시간(반응 시작 시의 증류를 포함함) 후, GC에 의해 측정된 메타크릴로일옥시메틸트리에톡시실란으로의 전환율은 약 82 몰%이다. 2시간 후, 전환율은 약 92 몰%이다. 4시간 후, 반응은 거의 완료된다(즉, 미반응 클로로메틸트리에톡시실란의 양이 0.5 몰% 미만). 모든 샘플에서, 에탄올 함량은 1.2∼1.5 몰%이며, 반응 진행 중에 약간 상승하는 경향이 있다.Into a 500 ml flask equipped with a KPG stirrer, cooler and thermometer, 319.12 μg (1.50 μmol) of chloromethyltriethoxysilane was first added, followed by 8.85 μg of tetrabutylphosphonium chloride and 0.15 μg of phenothiazine. Add. This charge is heated to 110 ° C. in an oil bath and 195.6 g (1.575 mol) of potassium methacrylate is added. At the end of the addition, the pressure in the reaction vessel is lowered to 100 kmbar and the total boiling point of low boiling point component is removed by distillation. Thereafter, the pressure is raised to atmospheric pressure again. During distillation and throughout the subsequent reaction, the reaction temperature is kept constant at 108 ° C to 112 ° C. After 1 hour of total reaction time (including distillation at the start of the reaction), the conversion to methacryloyloxymethyltriethoxysilane, as measured by GC, is about 82 mmol%. After 2 hours the conversion is about 92 mol%. After 4 hours, the reaction is almost complete (ie, the amount of unreacted chloromethyltriethoxysilane is less than 0.5 mol%). In all samples, the ethanol content is 1.2-1.5 mmol% and tends to rise slightly during the reaction.
형성된 염화칼륨을 여과한 후, 실험실용 단형(short-path) 증발기를 사용하여 생성물을 증류시킨다. 이로써 수율 약 94%, 순도 약 98.5%의 생성물이 수득된다.The potassium chloride formed is filtered and then the product is distilled off using a laboratory short-path evaporator. This gave a product of about 94% yield and about 98.5% purity.
본 발명예 2:Inventive Example 2:
KPG 교반기, 냉각기 및 온도계가 구비된 500 ml 용량의 플라스크에, 먼저 319.12 g(1.50 mol)의 클로로메틸트리에톡시실란을 투입하고, 8.85 g의 테트라부틸포스포늄 클로라이드 및 0.15 g의 페노티아진을 첨가한다. 이 투입물을 오일조에서 110℃까지 가열한 후, 195.6 g(1.575 mol)의 칼륨 메타크릴레이트를 첨가한다. 첨가 종료 시, 반응 용기의 압력을 100 mbar까지 낮추고, 증류에 의해 총 약 14 g의 저비점 성분을 제거한다. 그 후, 압력을 다시 대기압까지 올린다. 증류 중과 후속 반응 전체 동안에, 반응 온도를 108℃∼111℃로 일정하게 유지한다. 1시간의 전체 반응 시간(반응 시작 시의 증류를 포함함) 후, GC에 의해 측정된 메타크릴로일옥시메틸트리에톡시실란으로의 전환율은 약 83 몰%이다. 계속해서, 압력을 추가로 낮춘 결과, 약 6 g의 증류물이 추가로 증류된다. 2시간 후, 반응 혼합물 중에 0.2 몰% 미만의 반응물이 존재한다. 1시간 후 1차 샘플 중의 에탄올 함량은 1.3 몰%이며, 2시간 후 2차 샘플 중의 에탄올 함량은 0.9 몰%이다.Into a 500 ml flask equipped with a KPG stirrer, cooler and thermometer, 319.12 μg (1.50 μmol) of chloromethyltriethoxysilane was first added, followed by 8.85 μg of tetrabutylphosphonium chloride and 0.15 μg of phenothiazine. Add. This charge is heated to 110 ° C. in an oil bath and 195.6 g (1.575 mol) of potassium methacrylate is added. At the end of the addition, the pressure in the reaction vessel is lowered to 100 kmbar and the total boiling point components of about 14 g are removed by distillation. Thereafter, the pressure is raised to atmospheric pressure again. During distillation and throughout the subsequent reaction, the reaction temperature is kept constant at 108 ° C to 111 ° C. After 1 hour of total reaction time (including distillation at the start of the reaction), the conversion to methacryloyloxymethyltriethoxysilane, as measured by GC, is about 83 mmol%. Subsequently, as a further lowering of the pressure, about 6 g of distillate is further distilled off. After 2 hours, less than 0.2 mol% of reactant is present in the reaction mixture. After 1 hour the ethanol content in the primary sample is 1.3 mol% and after 2 hours the ethanol content in the secondary sample is 0.9 mol%.
비교예 1:Comparative Example 1:
칼륨 메타크릴레이트 첨가 후 증류 단계를 생략한 것을 제외하고는 본 발명예 1의 절차를 반복한다. 1시간 후, GC에 의해 측정된 전환율은 약 40 몰%이다. 2시간 후 전환율은 약 59 몰%이다. 마지막으로 4시간 후에야 약 81 몰%의 전환율을 얻을 수 있다. 모든 샘플에서 에탄올 함량은 2.0∼2.1 몰%로 비교적 일정하게 유지된다.The procedure of Example 1 is repeated except that the distillation step after the addition of potassium methacrylate is omitted. After 1 hour, the conversion measured by GC is about 40 mmol%. After 2 hours the conversion is about 59 mol%. Finally, after 4 hours, a conversion rate of about 81 mmol% is obtained. The ethanol content in all samples remained relatively constant at 2.0-2.1 mmol%.
본 발명예 3:Inventive Example 3:
KPG 교반기, 냉각기 및 온도계가 구비된 500 ml 용량의 플라스크에, 먼저 231.98 g(1.50 mol)의 클로로메틸메틸디메톡시실란을 투입하고, 8.85 g의 테트라부틸포스포늄 클로라이드 및 0.15 g의 페노티아진을 첨가한다. 이 투입물을 오일조에서 90℃까지 가열한 후, 195.6 g(1.575 mol)의 칼륨 메타크릴레이트를 첨가한다. 첨가 종료 시, 반응 용기의 압력을 약 700 mbar까지 낮추고, 증류에 의해 총 약 7.8 g의 저비점 성분을 제거한다. 그 후, 압력을 다시 대기압까지 올린다. 증류 중과 후속 반응 전체 동안, 반응 온도를 88℃∼90℃로 일정하게 유지한다. 1시간의 전체 반응 시간(반응 시작 시의 증류를 포함함) 후, GC에 의해 측정된 메타크릴로일옥시메틸메틸디메톡시실란으로의 전환율은 약 93 몰%이다. 계속해서, 압력을 추가로 낮춘 결과, 약 4.1 g의 증류물이 추가로 증류된다. 2시간 후, 전환율은 99 몰%이며, 3시간 후, 반응 혼합물 중에 0.2 몰% 미만의 반응물이 존재한다. 1시간 후 1차 샘플 중의 메탄올 함량은 1.0 몰%이고, 2시간 후 및 3시간 후 2차 및 3차 샘플 중의 메탄올 함량은 0.8 몰%이다.Into a 500 ml flask equipped with a KPG stirrer, a cooler and a thermometer, 231.98 μg (1.50 μmol) of chloromethylmethyldimethoxysilane was first added, followed by 8.85 μg of tetrabutylphosphonium chloride and 0.15 μg of phenothiazine. Add. This charge is heated to 90 ° C. in an oil bath and 195.6 g (1.575 mol) of potassium methacrylate is added. At the end of the addition, the pressure in the reaction vessel is lowered to about 700 mbar and the total boiling point of about 7.8 g of the low boiling point component is removed. Thereafter, the pressure is raised to atmospheric pressure again. During the distillation and throughout the subsequent reaction, the reaction temperature is kept constant at 88 ° C to 90 ° C. After 1 hour of total reaction time (including distillation at the start of the reaction), the conversion to methacryloyloxymethylmethyldimethoxysilane, as measured by GC, is about 93 mol%. Subsequently, as the pressure is further lowered, about 4.1 g of distillate is further distilled off. After 2 hours, the conversion is 99 mol% and after 3 hours less than 0.2 mol% of reactant is present in the reaction mixture. After 1 hour the methanol content in the primary sample is 1.0 mol% and after 2 hours and 3 hours the methanol content in the secondary and tertiary samples is 0.8 mol%.
형성된 염화칼륨을 여과한 후, 실험실용 단형 증발기를 사용하여 생성물을 증류시킨다. 이로써 수율 약 92%, 순도 약 98.2%의 생성물이 수득된다.After the potassium chloride formed is filtered, the product is distilled off using a laboratory single evaporator. This yields a product of about 92% yield and about 98.2% purity.
비교예 2:Comparative Example 2:
칼륨 메타크릴레이트 첨가 후와 1시간의 반응 시간 후의 증류 단계를 생략한 것을 제외하고는 본 발명예 2의 절차를 반복한다. 1시간의 반응 시간 후, GC에 의해 측정된 전환율은 약 75 몰%이다. 2시간 후, 전환율은 약 85 몰%이다. 마지막으로 3시간 후 약 93 몰%의 전환율이 얻어진다. 4시간 후에야 만족스러운 수준인 약 97%의 전환율이 얻어진다. 모든 샘플에서 메탄올 함량은 1.6∼1.7 몰%로 비교적 일정하게 유지된다.The procedure of Example 2 was repeated except that the distillation step after addition of potassium methacrylate and after 1 hour of reaction time was omitted. After the reaction time of 1 hour, the conversion measured by GC is about 75 mmol mol%. After 2 hours, the conversion is about 85 mol%. Finally after 3 hours a conversion of about 93 mol% is obtained. After 4 hours, a satisfactory level of conversion of about 97% is obtained. The methanol content in all samples remained relatively constant at 1.6-1.7 mmol%.
[발명의 효과][Effects of the Invention]
본 발명에 의하면, 아크릴로실란 또는 메타크릴로실란을 종래의 제조 방법에 비해 더 낮은 온도 및/또는 더 짧은 반응 시간으로 일관된 품질로 제조할 수 있다.According to the present invention, acrylosilanes or methacrylosilanes can be produced in consistent quality at lower temperatures and / or shorter reaction times compared to conventional preparation methods.
Claims (11)
(R1')2C=C(R1)C(O)O-(R2)-Si(R3)z(OR4)3-z (1)
X-(R2)-Si(R3)z(OR4)3-z (2)
Mw+[(R1')2C=C(R1)C(O)O-]w (3)
(상기 식에서,
R1 및 R1'은 서로 독립적으로 각각 수소 원자, 또는 탄소 원자수 1∼10의 직쇄 또는 분지쇄 탄화수소 라디칼이고,
R2는, 질소, 산소, 황 또는 인 원소로부터 선택되는 하나 이상의 이종 원자를 포함할 수 있는, 탄소 원자수 1∼40의 직쇄 또는 분지쇄 탄화수소 라디칼이며,
R3 및 R4는 서로 독립적으로 탄소 원자수 1∼10의 직쇄 또는 분지쇄 탄화수소 라디칼이고,
X는 할로겐 원자이며,
Mw+는 알칼리 금속 또는 알칼리 토금속 이온이고,
Mw+의 원자가에 해당하는 w는 1 또는 2의 값을 가질 수 있으며,
z는 0, 1 또는 2의 값을 가질 수 있다.As a method of producing the silane (S) of the following general formula (1) starting from the haloalkylsilane (S1) of the following general formula (2), and the salt (S2) of the unsaturated organic carboxylic acid of the following general formula (3), A component At least in part by distilling from the reaction mixture, the partial mixture or the individual reactant components one or more components (L) having a boiling point lower than that of the haloalkylsilane (S1) before or during the reaction of (S1) with component (S2). Method to remove by:
(R 1 ′ ) 2 C═C (R 1 ) C (O) O— (R 2 ) —Si (R 3 ) z (OR 4 ) 3-z (1)
X- (R 2 ) -Si (R 3 ) z (OR 4 ) 3-z (2)
M w + [(R 1 ' ) 2 C = C (R 1) C (O) O -] w (3)
(Wherein
R 1 and R 1 ′ are each independently a hydrogen atom or a straight or branched chain hydrocarbon radical having 1 to 10 carbon atoms,
R 2 is a straight or branched chain hydrocarbon radical of 1 to 40 carbon atoms, which may include one or more heteroatoms selected from nitrogen, oxygen, sulfur or phosphorus elements,
R 3 and R 4 are each independently a straight or branched chain hydrocarbon radical having 1 to 10 carbon atoms,
X is a halogen atom,
M w + is an alkali metal or alkaline earth metal ion,
W corresponding to the valence of M w + may have a value of 1 or 2,
z may have a value of 0, 1 or 2.
R4OH (4)
상기 식에서, R4는 일반식 (2) 및 (3)에 대해 제1항에 기재된 것과 동일한 정의를 갖는다.The process according to any one of claims 1 to 4, wherein component (L) comprises an alcohol (A) of the following general formula (4):
R 4 OH (4)
In the formula, R 4 has the same definition as described in claim 1 for general formulas (2) and (3).
ㆍ 먼저 일반식 (2)의 할로알킬실란(S1)을 공급하는 단계,
ㆍ 할로알킬실란(S1)의 비점보다 낮은 비점을 갖는 1종 이상의 성분(L)을 증류에 의해 적어도 부분적으로 제거하는 단계,
ㆍ 일반식 (3)의 불포화 유기 카복실산의 염(S2)을 첨가하는 단계
를 포함하는 제조 방법.The method of claim 1, wherein at least
First feeding a haloalkylsilane (S1) of formula (2),
At least partially removing by distillation at least one component (L) having a boiling point lower than that of haloalkylsilane (S1),
Adding a salt of unsaturated organic carboxylic acid of formula (3) (S2)
≪ / RTI >
R4OH (4)
상기 식에서, R4는 일반식 (2) 및 (3)에 대해 기재된 것과 동일한 정의를 갖는다.The method according to any one of claims 1 to 10, wherein, in the reaction of component (S1) with component (S2), the amount of free alcohol (A) of the following general formula (4) is 4 weights based on the total reaction mixture. Manufacturing method that is% or less:
R 4 OH (4)
Wherein R 4 has the same definition as described for General Formulas (2) and (3).
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JP5856176B2 (en) * | 2010-09-30 | 2016-02-09 | ダウ コーニング コーポレーションDow Corning Corporation | Method for preparing acryloyloxysilane |
US8580886B2 (en) | 2011-09-20 | 2013-11-12 | Dow Corning Corporation | Method for the preparation and use of bis (alkoxysilylorgano)-dicarboxylates |
WO2013081820A2 (en) | 2011-12-02 | 2013-06-06 | Dow Corning Corporation | Ester-functional silanes and the preparation and use thereof;and use of iminium compounds as phase transfer catalysts |
US9986140B2 (en) * | 2013-11-21 | 2018-05-29 | International Business Machines Corporation | Utilizing metadata for automated photographic setup |
CN104497034B (en) * | 2014-12-09 | 2018-04-13 | 山东大学 | A kind of preparation method of α substitutions acryloyloxymethyl trialkoxy silane |
US10246473B2 (en) | 2015-06-19 | 2019-04-02 | Dow Corning Corporation | Process for preparing an acryloyloxysilane |
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DE2851456C2 (en) | 1978-11-28 | 1982-09-23 | Wacker-Chemie GmbH, 8000 München | Process for the preparation of organosilicon compounds |
US4946977A (en) | 1987-09-25 | 1990-08-07 | Huels Troisdorf Ag | Method for the preparation of organosilanes containing methacryloxy or acryloxy groups |
DE3832621C1 (en) | 1988-09-26 | 1989-09-21 | Huels Ag, 4370 Marl, De | |
US5103032A (en) | 1991-06-27 | 1992-04-07 | Union Carbide Chemicals & Plastics Technology Corporation | Inhibited acryloxysilanes and methacryloxysilanes |
JP4009340B2 (en) * | 1996-11-28 | 2007-11-14 | 東レ・ダウコーニング株式会社 | Method for producing organosilicon compound containing acryloxy group or methacryloxy group |
JPH10158276A (en) * | 1996-11-28 | 1998-06-16 | Toray Dow Corning Silicone Co Ltd | Production of acryloxy group-or methacryloxy group-containing organosilicon compound |
JP4025384B2 (en) * | 1996-12-02 | 2007-12-19 | 東レ・ダウコーニング株式会社 | Method for purifying 3-methacryloxypropyldimethylhalosilane or 3-methacryloxypropylmethyldihalosilane |
JP4688311B2 (en) * | 2001-02-22 | 2011-05-25 | 東レ・ダウコーニング株式会社 | Method for producing (meth) acrylic functional group-containing organosilicon compound |
DE10118489C1 (en) * | 2001-04-12 | 2002-07-25 | Wacker Chemie Gmbh | Production of organosilane with unsaturated, organic carbonyloxy group, used as adhesion promoters, comprises reacting halosilane with an unsaturated carboxylic acid in the presence of phosphonium salt as phase transfer catalyst |
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