KR20100105058A - Apparatus for producing trichlorosilane by thermal reaction - Google Patents

Abstract

PURPOSE: An apparatus for preparing trichlorosilane by thermal transition is provided to prevent heating and to reduce powder consumption. CONSTITUTION: An apparatus for preparing trichlorosilane by thermal transition comprises: a base plate(110), a bezel(120) which forms air-tight hot zone(123) between the gap with the base plate; a heater(113) which is placed on the hot zone; an inlet hole and outlet hole(112) which supplies and discharges reaction gas; and a heat exchanger(130) which is formed inside the bezel. The heat exchanger comprises a circulation path(131) which connects the inlet hole and hot zone. The circulation path comprises: a partition(132) which divides a space near inside of the bezel and a space having the heater and outlet hole; and a through hole(132a) which is formed on the plate side of the partition.

Description

Trichlorosilane production apparatus by thermal conversion reaction {APPARATUS FOR PRODUCING TRICHLOROSILANE BY THERMAL REACTION}

The present invention relates to a trichlorosilane production apparatus by a heat conversion reaction, and more particularly, in the process of supplying the reaction gas to the hot zone through a heat exchanger provided inside the bezel, the heat transfer from the heater of the hot zone to the bezel is lost to the outside Since the reaction gas supplied to the hot zone absorbs the heat energy, the bezel is prevented from being heated above the limit temperature, and the reaction gas absorbing the heat energy lost to the outside of the bezel is heated to a temperature close to the reaction temperature and supplied to the hot zone. It relates to a trichlorosilane production apparatus by a thermal conversion reaction that can reduce the power consumption of the heater.

To date, solar grade silicon has been obtained primarily from the surplus of the semiconductor industry. However, some manufacturers of semiconductor grade silicon produce commercially available solar cell grade materials using conventional processes. One conventional process converts metallurgical silicon into silane or one of polysilane or chlorosilane compounds. The silane, polysilane or chlorosilane is pyrolyzed in a Siemens-type reactor to form polysilicon of high purity.

In this Siemens process, polysilicon rods are produced by thermal decomposition of a gaseous silicon compound, such as silane or polysilane or chlorosilane, on a filament substrate, also called a slim rod. Such slim rods are generally made of high purity polysilicon to ensure product purity levels.

As described above, in the reaction of trichlorosilane (TCS, trichlorosilane (SiHCl ₃ ), hereinafter referred to as 'TCS') with hydrogen in the reactor to produce polycrystalline silicon, a large amount of silicon tetra Chloride (Silicon Tetracloride (STC), silicon tetrachloride (SiCl ₄ ) hereinafter referred to as "STC") is obtained.

The STC is reused by reducing to TCS by thermal hydrogenation in the state of mixing with hydrogen (H ₂ ).

1 is a cross-sectional view of a converter (Converter) for converting the conventional STC to TCS by thermal conversion reaction, as shown in the conventional converter is a heater 13 is installed on the upper surface of the base plate 10, hot zone ( A vertical or bell-jar type vessel (Vessel) 20 for forming a hot zone 21 is assembled to the upper side of the base plate 10 and between the heater 13 and the bezel 20. In the heat zone 21 is transferred to the bezel 20 is a shield (shield, 40) is installed to reduce the loss to the outside of the bezel.

In the assembled state as described above, a gas (hereinafter referred to as a 'reaction gas') in which STC and hydrogen (H ₂ ) are mixed through the inlet hole 11 formed through the plate surface of the base plate 10 is referred to as a hot zone ( 21, while supplying power to the heater 13 to heat the internal temperature of the hot zone 21 to about 900 ℃ to 1500 ℃, the reaction gas inside the hot zone 21 by the hydrogenation reaction at a high temperature It is converted into TCS and hydrogen chloride (HCl) and discharged through the outlet hole (12).

The bezel 20 enclosing the hot zone 21 is a structural material made of metal, and carbon steel and stainless steel are usually made of a cladding structure. When the bezel 20 is heated to about 500 ° C. or more, the structural material Since the rigidity is lowered, the cooling jacket 31 in which the coolant circulates is disposed outside the bezel 20 to maintain the temperature of the bezel 20 at 300 ° C or lower.

By the way, in the hot zone 21 to maintain a high temperature suitable for the reaction to induce a thermal conversion reaction of the reaction gas, the bezel 20 surrounding the hot zone 21 is a separate cooling system 30 for structural stability Since it is built and cooled, since the heat energy lost through heat transfer through the bezel 20 is not only low, the efficiency of use of heat energy is low, and the heat energy lost by heat transfer from the hot zone to the bezel must be supplied again through the heater 13, thereby reducing power. There is a problem that the consumption increases.

In addition, the reaction gas (STC + H ₂ ) is supplied at a high pressure through the inlet hole 11 formed in the center and the outer periphery of the base plate 10 to cause the reaction evenly circulated in the hot zone 21, At this time, since the temperature of the reaction gas is supplied at the vaporization temperature of the STC according to the supply pressure, a large amount of thermal energy is required to maintain the hot zone 21 at about 900 ° C to 1500 ° C.

In addition, the cooling system 30 is a cooling water circulation unit 32 for circulating the cooling water to the cooling jacket 31 provided on the outside of the bezel 20 and the bezel 20 through the cooling jacket 31. In the cooling process, devices such as a cooling unit 33 for recooling the coolant having a raised temperature and a tank for storing the coolant must be installed around the converter, thus taking up a lot of space with complicated piping. Since equipment, such as a pump for circulating, must be driven, not only power consumption is increased, but also a huge investment cost for construction and operation of a cooling system increases.

Accordingly, an object of the present invention is to solve such a conventional problem, and in the process of supplying the reaction gas to the hot zone through a heat exchanger provided inside the bezel, heat energy transferred from the heater of the hot zone to the bezel is lost to the outside. Since the reaction gas supplied to the hot zone is absorbed, the bezel is prevented from being heated above the limit temperature, thereby eliminating the need for a separate cooling system for cooling the bezel, and absorbing the heat energy lost to the outside of the bezel. Since a reaction gas is heated to a temperature close to the reaction temperature and supplied to the hot zone, a trichlorosilane production apparatus using a thermal conversion reaction that prevents the temperature of the hot zone from dropping rapidly and reduces the power consumption by the heater is provided. In providing.

In addition, a plurality of partitions constituting the heat exchanger, and through the through-hole formed in one end or the other end of the partition through the circulating passage connecting the inlet hole and the hot zone in a zigzag form heat conversion reaction that can improve the heat exchange efficiency It is to provide a trichlorosilane production apparatus by.

The object is, according to the present invention, the base plate; and the bezel to form a closed hot zone between the base plate; and a heater disposed in the hot zone; and to supply and discharge the reaction gas to the hot zone Inlet and outlet holes; And a heat exchange part formed inside the bezel such that the reaction gas supplied to the hot zone through the inlet hole absorbs heat energy transferred to the bezel to cool the temperature of the bezel and is supplied to the hot zone in a heated state. It is achieved by a trichlorosilane production apparatus by a thermal conversion reaction comprising a.

Here, the heat exchange part is preferably made of a circulation passage circulating the space between the bezel and the hot zone and connecting the inlet hole and the hot zone.

In addition, the circulation passage partition wall separating the space adjacent to the inner surface of the bezel including the inlet hole and the space including the heater and the outlet hole, the reaction gas supplied through the inlet hole is the space between the partition wall and the bezel It is preferable to include a through hole formed on the plate surface of the partition spaced apart from the inlet hole to be supplied to the hot zone after heat exchange while moving.

In addition, the partition wall is provided in two or more tubular sizes having a size to each other to divide the space adjacent to the inner surface of the bezel including the inlet hole and the space including the heater and the outlet hole in a multi-layer, the inside of the large partition wall As a result, it is preferable that the barrier rib be small in size.

In addition, the two or more partition walls are preferably formed through the through-holes formed on the plate surface to be alternate with each other based on the inlet hole is to switch the movement path of the supply gas.

In addition, the partition wall is preferably made of a cylindrical shape, the upper side is closed, and further comprises a cover in which the outer periphery is in close contact with the inner surface of the bezel.

In addition, the partition wall is preferably made of a material having heat resistance with respect to the temperature heated by the heat energy transferred from the hot zone at the installed position.

According to the present invention, in the process of supplying the reaction gas to the hot zone through the heat exchanger provided inside the bezel, the bezel has a limit temperature because the reaction gas supplied to the hot zone absorbs the heat energy transferred from the heater of the hot zone to the bezel and is lost to the outside. The heating is prevented from occurring, and thus, it is not necessary to provide a separate cooling system for cooling the bezel, and the reaction gas that absorbs the heat energy lost to the outside of the bezel is heated to a temperature close to the reaction temperature, thereby providing a hot zone. Since it is supplied to the to prevent the temperature of the hot zone is sharply lowered, there is provided a trichlorosilane production apparatus by the heat conversion reaction that can reduce the power consumption by the heater.

In addition, by arranging a plurality of partition walls constituting the heat exchange portion and a circulation passage connecting the inflow hole and the hot zone through a through hole formed at one end or the other end of the partition wall in a zigzag form, the heat exchange area is increased to increase heat exchange efficiency. An apparatus for producing trichlorosilane by a thermal conversion reaction that can be improved is provided.

Prior to the description, in the various embodiments, components having the same configuration will be representatively described in the first embodiment using the same reference numerals, and in other embodiments, different configurations from the first embodiment will be described. do.

Hereinafter, an apparatus for producing trichlorosilane by a thermal conversion reaction according to a first embodiment of the present invention will be described in detail with reference to the accompanying drawings.

2 is a partially cutaway perspective view of the trichlorosilane production apparatus according to the thermal conversion reaction of the present invention, Figure 3 is an exploded perspective view of the trichlorosilane production apparatus according to the thermal conversion reaction of the present invention.

Trichlorosilane production apparatus according to the heat conversion reaction of the present invention as shown in the drawings includes a base plate 110, a bezel 120, and a heat exchanger 130 provided on the bezel 120 side It is composed.

The base plate 110 has an outlet hole 112 formed at the center thereof, and a plurality of inlet holes 111 are formed in the circumferential direction at the outer circumference thereof, and a heater 113 generating heat by application of power is installed on the upper surface. do.

The bezel 120 is assembled to the base plate 110 to form a hot zone 123 sealed from an external region. In this embodiment, the bezel 120 covers a side wall 121 and an upper side of the side wall 121. A description will be given taking an example composed of 122 as an example.

The heat exchange part 130 is a state in which the reaction gas (STC + H ₂ ) flowing through the inlet hole 111 of the base plate 110 absorbs heat energy from the side wall 121 of the bezel 120 and is heated. As formed on the inner side surface of the side wall 121 of the bezel 120 so as to be supplied to the hot zone 123, a circulation passage 131 connecting the inlet hole 111 into which the reaction gas flows and the hot zone 123. Is done.

In particular, in the present embodiment, the through-hole 132a formed at one end or the other end of each of the partitions 132 in the state in which the cylindrical partitions 132 having different diameters are arranged concentrically is formed in the inlet hole 111. The zigzag-shaped circulation passage 131 is configured by being formed at positions alternate with each other from one end or the other end based on the position.

That is, the reaction gas introduced into the circulation passage 131 through the inflow hole 111 located between the partition wall 132 disposed on the outside of the plurality of partition walls 132 and the side wall 121 of the bezel 120 is a partition wall. Through the through holes 132a of the 132, the space between the partition walls 132 is zigzag-circulated to absorb heat energy transferred to the bezel 120 and the partition wall 132, so that the bezel 120 is heated. Since the reaction gas supplied to the hot zone is heated by using the heat energy lost to the outside of the bezel 120, the utilization efficiency of the heat energy is improved.

Meanwhile, in the present embodiment, the through holes 132a of the partition wall 132 are staggered to extend the heat exchange area and the heat exchange time so that the circulation passage 131 forms a zigzag-shaped movement path and connects the inflow hole and the hot zone. As described above, it may be possible to increase the heat exchange area and the heat exchange time by dispersing or converting the movement path in various forms in the course of the reaction gas passing through the circulation passage.

In addition, when the partition wall 132 is configured as described above, the thermal energy transmitted to the partition wall 132 is different depending on the location of the partition wall 132, that is, the distance from the heater 113, and thus, each partition wall 132 is heated to different temperatures.

For example, when the temperature of the hot zone 123 is about 1200 ° C. and the temperature of the reaction gas supplied through the inlet hole 111 is 80 ° C., the side wall 121 maintains a temperature of about 200 ° C. or less, and the side wall is Since the partitions 132 contacting the hot zone 123 from the partition 132 facing the 121 are heated to a temperature of about 300 ° C., 500 ° C., and 700 ° C., respectively, the plurality of partitions 122 are disposed at the installed position. It consists of a material having heat resistance corresponding to the heating temperature of.

In addition, the inflow hole 111 of the base plate 110 is adjacent to each other to supply the reaction gas at equal pressure with respect to the horizontal direction of the space between the bezel 120 and the partition wall 132 disposed in the outermost A large number is provided.

In addition, although the through hole 132a is formed to penetrate through the plate surface of the partition 132 in the drawing, one end of the partition 132 is fixed to the base plate 110 or the cover 122 side, and the other end is The through holes 132a are formed in various forms for connecting the spaces on both sides of the partition wall 132, such as to form the through holes 132a through spaces spaced apart from the cover 122 or the base plate 110 by a predetermined distance. It can be formed as.

In addition, in the present exemplary embodiment, the bezel 120 includes the side wall 121 and the cover 122 as an example. However, when the bell-shaped bezel 120 is applied, the bezel 120 is provided inside the bezel 120. The heat exchange part 130 may be formed in a shape corresponding to the inner surface of the bezel 120, that is, the same shape as the bezel 120, and may include a partition wall 132 spaced a predetermined distance from the inner surface of the bezel 120. In addition, it is possible to improve the heat exchange efficiency of the circulation passage 131 by arranging the partitions 132 as described above in multiples and through-holes 132a alternately formed.

The operation of the first embodiment of the trichlorosilane production apparatus by the above-described thermal conversion reaction will now be described.

Figure 4 is a front sectional view of the trichlorosilane production apparatus according to the thermal conversion reaction of the present invention, Figure 5 is a plan sectional view of the trichlorosilane production apparatus according to the thermal conversion reaction of the present invention.

First, as shown in FIG. 4, the side wall 121 of the bezel 120 is disposed above the outer edge of the base plate 110, and the cover 122 is disposed at the upper end of the side wall 121 while the airtight hot zone is airtight. 123 is formed, and the internal temperature of the hot zone 123 is heated to about 900 ° C. to 1500 ° C. suitable for reaction while power is applied to the heater 113 provided at the upper side of the base plate 110.

As described above, when STC and H ₂ are supplied together through the inlet hole 111 of the base plate 110 while the internal temperature of the hot zone 123 rises, it is heated to a temperature suitable for reaction and thermally hydrogenated in the hot zone 123. The reaction is converted into TCS and HCl and discharged through the outlet hole 112.

At this time, the heat exchanger 130 is provided on the inner surface of the side wall 121 of the bezel 120 to surround the hot zone 123 by a circulation passage 131 connecting the inlet 111 and the hot zone 123. Cooling the 121 and at the same time increasing the temperature of the reaction gas supplied to the hot zone 123.

In particular, the circulation passage 131 is fixed between the inlet hole 111 and the heater 113, the lower end is fixed to the base plate 110, the upper end is fixed to the cover 122 and the through hole 132a is formed on the plate surface And the barrier ribs 132 connecting the two side spaces, and the through holes 132a are alternately formed at one end or the other end of the barrier rib 132 with respect to the inlet hole 111. 111 and the hot zone 123 are connected in a zigzag form. That is, the reaction gas introduced into the circulation passage 131 through the inlet 111 at a temperature of about 80 ° C. is a space between the side wall 121 of the bezel 120 and the partition wall 132, that is, the zigzag-shaped circulation passage ( While passing through 131, the heat energy transmitted to the bezel 120 and the partition wall 132 by the heater 113 of the hot zone 123 is absorbed to cool the bezel 120, and at the same time, it is heated to the hot zone 123. Supplied.

Therefore, since the bezel 120 is cooled by the reaction gas flowing through the inlet hole 111, a separate cooling system for cooling the bezel 120 is not required, and at the same time, the bezel 20 Since the heat energy is prevented from being lost to the outside, the use efficiency of the heat energy is improved.

In addition, since the low-temperature reaction gas is heated and supplied to the hot zone 123 using the thermal energy transferred to the sidewall 121 of the bezel 120, the utilization efficiency of the thermal energy is improved, and the temperature of the hot zone 123 is increased. It is possible to reduce the power consumption of the heater 113 for maintaining at a high temperature suitable for the reaction.

In addition, as described above, a plurality of partitions 132 constituting the circulation passage 131 is provided, and the through hole 132a formed in the partition 132 is provided at one end or the other end based on the inflow hole 111. The heat exchange area between the bezel 120 and the partition wall 132 with the reactant gas introduced into the circulation passage 131 through the inlet hole 111 is increased by constituting the zigzag circulation passage 131. do.

FIG. 5 is a cross-sectional view taken along the line A-A 'of FIG. 4, and is formed through the outer periphery of the base plate 110 as shown in the drawing, and is located between the side wall 121 and the outer partition 132. Balls 111 are formed in plural at equal intervals along the circumferential direction, the reaction gas is supplied through each inlet hole 111 is supplied to the hot zone 123 through the circulation passage 131.

At this time, since the inlet hole 111 is densely formed at equal intervals, the reaction gas is supplied at an equal pressure to all the inflow side regions of the circulation passage 131, and thus the reaction gas is supplied to the circulation passage 131. Since it moves at an equal pressure with respect to the horizontal direction in each region of the to prevent the temperature of the side wall 121 and the partition walls 132 to rise intensively in some regions.

Next, a trichlorosilane production apparatus by a thermal conversion reaction according to another embodiment of the present invention will be described.

6 is a partially cutaway perspective view of another embodiment of the trichlorosilane production apparatus according to the thermal conversion reaction of the present invention, Figure 7 is an exploded perspective view according to another embodiment of the trichlorosilane production apparatus according to the thermal conversion reaction of the present invention to be.

In another embodiment of the trichlorosilane production apparatus according to the thermal conversion reaction of the present invention as shown in the drawings, the bezel 120 is formed in a bell-jar type (bell-jar type), one side of the opening side of the base plate ( While assembled to 110 to form a hot zone inside.

In addition, the circulation passage 131 of the heat exchanger 130 which is provided inside the bezel 120 and connects the inlet hole 111 and the hot zone 121 is the inlet hole 111 of the base plate 110 and At least one cylindrical partition wall 132 provided between the heaters 113, a through hole 132a formed at an end of the partition wall 132 opposite to the inflow hole 111, and an outer peripheral portion thereof. It is formed to be in close contact with the inner surface of the bezel is configured to include a cover 133 for closing the upper side of the cylindrical partition 132.

In addition, in order to increase the heat exchange efficiency of the circulation passage as in the above-described embodiment, as shown in FIG. 6, a plurality of cylindrical partitions having different diameters are provided, and the through-holes formed in each of the partition walls are based on the inlet hole. It is also possible to achieve a zigzag-shaped movement path by being staggered.

On the other hand, components other than the bezel and the heat exchanger have the same configuration as the above-described embodiment, and a detailed description thereof will be omitted.

8 is a cross-sectional view according to another embodiment of the trichlorosilane production apparatus according to the thermal conversion reaction of the present invention.

As shown in FIG. 8, a cylindrical partition 132 having an upper side formed between the inlet hole 111 of the base plate 110 and the bell-shaped bezel 120 is opened, and the plate surface of the partition 132 is formed on the plate surface. A through hole 132a formed at a position spaced apart from the inflow hole 111 to connect the two side spaces, and the upper side of the partition 132 closes the opening side, and an outer circumferential portion closely adheres to the inner surface of the bezel 120. A circulation passage 131 is formed between the inlet hole 111 and the hot zone 123 by the heat exchange part 130 including the cover 133.

In addition, the partition wall 132 is provided with a plurality of different sizes and the both ends of the cover 133 and the base plate 110 while supporting the space adjacent to the inner surface of the bezel 120 including the inlet hole 111 and The space between the outlet hole 112 and the space including the heater 113 is divided into a plurality of layers, wherein the plurality of partition walls 132 are through holes at different positions based on the inlet hole 111. As the 132a is formed, the circulation passage 131 connecting the inflow hole 111 and the hot zone 123 forms a zigzag movement path.

That is, the reaction gas is the temperature of the hot zone through the inlet hole 111 while the heat exchanger 130 is disposed inside the bezel 120 surrounding the hot zone 123 maintaining the temperature of about 900 ° C to 1500 ° C. It is supplied at a much lower STC vaporization temperature, and the reaction gas passes through the zigzag circulation passage 131 connecting the inlet hole 111 and the hot zone 123 to the bezel 120 and the partition wall 132. Since the heat energy is absorbed, it is not necessary to provide a separate cooling system as in the prior art to cool the bezel 120.

In addition, as described above, the reaction gas supplied at the vaporization temperature of the STC, which is much lower than the temperature of the hot zone, is heated to a temperature of about 500 ° C. to 900 ° C. while passing through the circulation passage 131 of the heat exchange unit 130. Since it is supplied to 123, the temperature of the hot zone 123 can be prevented from being rapidly lowered due to the inflow of the reaction gas, so that the driving amount of the heater 113 can be further reduced.

On the other hand, as described above, the plurality of partitions 132 constituting the circulation passage 131 has a supply temperature of the reaction gas supplied to the hot zone, the amount of heat lost to the outside of the bezel 120, and the partition 132 Considering the heat exchange efficiency according to the material of the number will be able to be adjusted.

The scope of the present invention is not limited to the above-described embodiment, but may be embodied in various forms of embodiments within the scope of the appended claims. Without departing from the gist of the invention claimed in the claims, it is intended that any person skilled in the art to which the present invention pertains falls within the scope of the claims described herein to various extents that can be modified.

1 is a cross-sectional view of a conventional trichlorosilane conversion apparatus by thermal conversion reaction of silicon tetrachloride,

2 is a perspective view of a trichlorosilane production apparatus according to the thermal conversion reaction of the present invention,

3 is an exploded perspective view of a trichlorosilane production apparatus according to the thermal conversion reaction of the present invention,

4 is a front sectional view of a trichlorosilane production apparatus by a thermal conversion reaction,

5 is a plan sectional view of an apparatus for producing trichlorosilane by thermal conversion reaction,

Figure 6 is a partial cutaway perspective view of another embodiment of the trichlorosilane production apparatus according to the thermal conversion reaction of the present invention,

Figure 7 is an exploded perspective view according to another embodiment of the trichlorosilane production apparatus according to the thermal conversion reaction of the present invention

8 is a front sectional view of another embodiment of an apparatus for producing trichlorosilane by thermal conversion reaction.

<Explanation of symbols for the main parts of the drawings>

110: base plate, 111: inlet hole, 112: outlet hole, 113: heater, 120: bezel,

121: side wall, 122: cover, 123: hot zone, 130: heat exchanger, 131: circulation passage, 132: bulkhead,

132a: through-hole, 140: shield, 141: compartment wall, 142: cover

Claims (7)

Base plate; A bezel forming a sealed hot zone between the base plate and the base plate; A heater disposed in the hot zone; Inlet and outlet holes for supplying and discharging reaction gas to the hot zone; And, A heat exchanger formed inside the bezel such that the reaction gas supplied to the hot zone through the inlet hole absorbs the heat energy transferred to the bezel to cool the temperature of the bezel and is supplied to the hot zone in a heated state. Trichlorosilane production apparatus by a thermal conversion reaction, characterized in that. The method of claim 1, The heat exchange unit is a trichlorosilane production apparatus by the heat conversion reaction, characterized in that consisting of a circulation passage connecting the inlet hole and the hot zone circulating the space between the bezel and the hot zone. 3. The method of claim 2, The circulation passage partitions a partition separating a space adjacent to an inner surface of the bezel including an inlet hole and a space including a heater and an outlet hole, and the reaction gas supplied through the inlet hole moves between the partition wall and the bezel. And a through hole spaced apart from the inlet hole so as to be supplied to the hot zone after heat exchange, and formed on the plate surface of the partition wall. The method of claim 3, wherein The partition wall is provided in two or more tubular sizes having a size to each other to divide the space adjacent to the inner surface of the bezel including the inlet hole and the space including the heater and the outlet hole in a multi-layer, and the size of the partition wall inside the large partition wall Trichlorosilane production apparatus by a thermal conversion reaction characterized in that the small partition is arranged in the form of being inserted. The method of claim 4, wherein The two or more partitions are trichlorosilane production apparatus by the heat conversion reaction, characterized in that the through-holes formed on the plate surface are formed to be staggered with each other based on the inlet hole to switch the movement path of the feed gas. The method of claim 5, The partition wall is formed in a cylindrical shape of the upper side, the upper end of the partition wall trichlorosilane production apparatus by a heat conversion reaction characterized in that it further comprises a cover that the outer periphery is in close contact with the inner surface of the bezel. The method of claim 6, The partition wall is trichlorosilane production apparatus by a heat conversion reaction, characterized in that made of a material having a heat resistance with respect to the temperature heated by the heat energy transferred from the hot zone at the installed position.

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