KR20100072447A - Glass decorating matrial and method of manufactring the same - Google Patents

Abstract

PURPOSE: A glass decoration material having beauty three dimensional effect and gradation is provided. CONSTITUTION: A glass decoration material comprises: a glass member with plural first patterns(135) which is formed at a first area and has same width, depth, length, and formation direction and plural second patterns(145) which is formed at a second area and has at least one different width, depth, length, distance, and formation direction; and a protection layer for protecting rear side of the glass member.

Description

Glass decorative material and its manufacturing method {GLASS DECORATING MATRIAL AND METHOD OF MANUFACTRING THE SAME}

The embodiment relates to a glass decorative material and a method of manufacturing the same.

Decorative materials are used to beautifully decorate living spaces, and are used to beautifully decorate exteriors or interiors of buildings, furniture, home appliances, and electronics.

Among decorative materials of various materials, decorative materials using glass members are used in the form of stained glass colored in color or in the form of three-dimensional patterns on the surface.

When forming a three-dimensional pattern on the glass member, a sandblasting method of spraying a high-pressure fine sand breeze to form a pattern on the surface is used. However, the pattern formation method using the fine sand breeze has a problem that mass production is impossible and the processing cost is high, and the expression of the fine pattern is impossible.

Thus, although a chemical etching method of forming a three-dimensional pattern on the surface of the glass member using chemicals has been proposed, the conventional method of forming a pattern using chemicals can only express simple yin and emboss, and form a delicate pattern. There is a technical limitation in providing various stereoscopic effects.

The embodiment provides a glass decorative material and a method of manufacturing the same, which can be mass-produced at a low processing cost, can be delicately patterned, and have excellent aesthetic effects such as three-dimensional effect and gradation.

The glass decorative material according to the embodiment includes a plurality of first patterns formed in the first area and having the same width, depth, distance, and forming direction, and the widths, depths of the first pattern formed in the second area, A glass member including a plurality of second patterns formed at least one of a distance and a forming direction; A first protective layer protecting a surface on which the first pattern and the second pattern of the glass member are formed; And a second protective layer protecting a rear surface of the glass member on which the first pattern and the second pattern are not formed.

Glass decorative material manufacturing method according to the embodiment comprises the steps of coating a photoresist on the glass member; Exposing the photoresist of the glass member using a patterned mask; Developing a photoresist corresponding to the pattern of the mask; Etching the glass member having the photoresist corresponding to the mask pattern by using an etching solution; Forming a first protective layer of the glass member having an etching pattern corresponding to the mask pattern to protect a surface on which the pattern is formed; And forming a second protective layer protecting a rear surface of the glass member on which the pattern is not formed.

According to the embodiment, it is possible to provide not only mass production at low processing cost but also fine pattern formation and excellent glass aesthetics such as three-dimensional effect and gradation, and a method of manufacturing the same.

Hereinafter, with reference to the accompanying drawings will be described in detail with respect to the glass decorative material and the manufacturing method according to an embodiment of the present invention. In the description of the embodiments, each plate, film, member, mask or layer or the like is described as being formed "on" or "under" of each plate, member, film, mask or layer or the like. In the case, “on” and “under” include both being formed “directly” or “indirectly” through other components. In addition, the upper or lower reference of each component is described with reference to the drawings. The size of each component in the drawings may be exaggerated for the sake of explanation and does not mean the size actually applied.

1 is a state diagram showing the use of the glass decorative material according to the embodiment, which illustrates a case where the glass decorative material 15 is attached to the refrigerator case.

Referring to FIG. 1, the refrigerator includes a main body in which the refrigerating chamber and the freezing chamber are formed and a door 10 rotatably coupled to the front of the main body.

The door 10 is divided into a refrigerator compartment door 11 that shields the refrigerating compartment and a freezer compartment door 12 that shields the freezer compartment. It includes a door handle 21 to enable the opening and closing. In addition, the freezer compartment door 12 is provided with a display unit 41 for displaying the operation state of the refrigerator and an operation unit 42 for operating the operation of the refrigerator.

As such, the front surface of the refrigerator door 10 is always exposed to the user, and the glass decorative material 15 having various patterns may be used to provide a beautiful appearance.

Below, the structure and formation method of the glass decoration material 15 are demonstrated.

2 to 6 is a manufacturing state diagram of the glass decorative material according to an embodiment of the present invention.

As shown in FIG. 2, a photoresist 200 is coated on the glass member 100. The photoresist 200 is a mixture of a polymer and a photosensitizer. The chemical properties of the photoresist 200 are changed by light, and when exposed to light of a certain wavelength, the solubility in a specific solvent is greatly changed.

After the photoresist 200 is coated with a glass member 100 coated with a working film 300 or a working glass on which a pattern to be expressed is formed, as shown in FIG. Irradiate light or ultraviolet light.

The working film 300 is patterned into a transparent window region 35 through which light can pass through the pattern to be formed on the glass member 100 and a blocking region 310 that blocks light. As a result, light passes only through the window region 35 of the working film 300 to react with the photoresist 205 of the corresponding region.

When the glass member 100 is developed after the exposure is completed, as shown in FIG. 4, only the photoresist 205 exposed to the light during the exposure is left in the glass member 100 and is not exposed to the remaining light. Photoresist 210 that was not removed is removed. The photoresist 205 that is exposed to light is generally modified with a polymer material, and the structure of the polymer chain is changed in response to light, or the photoresist 200 is formed by the action of a photosensitive material included in the photoresist 200. It has solubility different from solubility. Therefore, when the photoresist 205 that receives the light or the photoresist 210 that does not receive the light is treated with a solution capable of selectively dissolving, the pattern on the working film 300 is patterned as it is on the glass member 100. do.

After development, as shown in FIG. 5, an etching solution is applied to the surface of the glass member 100 on which the exposed photoresist 205 is left to form a pattern on the glass member 100 by chemical etching. In etching the glass member 100, a hydrofluoric acid-based etching solution such as hydrofluoric acid may be used. When the hydrofluoric acid-based etching solution is applied to the glass member 100, the glass member of the portion where the exposed photoresist 205 remains is left, and the glass member of the remaining portion is etched to form an intaglio pattern.

Thus, a three-dimensional pattern is formed by the relief pattern 105 and the etched intaglio pattern 110 protected by the exposed photoresist 205. Here, the shape and width of the intaglio pattern 110 may be variously designed according to the design method of the working film 300, and the depth of the intaglio pattern may also be variously adjusted according to the etching method.

When the three-dimensional pattern is formed on the glass member 100, as shown in FIG. 6, the first protective layer 400 is formed on the back surface where the pattern of the glass member 100 is not formed, and the first protective layer 400 is formed. ) Is formed on the surface on which the second protective layer 500 is formed.

The first protective layer 400 and the second protective layer 500 are to protect the back surface of the glass member 100 to supplement durability, and to enhance the beauty of the patterned glass member 100. Accordingly, the materials of the first protective layer 400 and the second protective layer 500 are not particularly limited, but may be formed by a film lamination, a deposition, a coating, a spray, or the like. In addition, the protective layers 400 and 500 may be colored in a predetermined color, and only one layer may be formed, or a transparent layer such as glass, acrylic or a transparent plastic panel, or the like may be bonded, or another glass decorative material may be bonded. . The protective layers 400 and 500 may be formed by depositing a metal-based material such as silicon, Al, Ni, and Ti, and materials such as UV ink, paint, dye, and the like may be used as a material for printing, spraying, and coating. Can be.

The first protective layer 400 and the second protective layer 500 formed on the rear surface of the glass member 100 not only protect the rear surface of the glass member 100, but also have an effect of making the pattern formation surface more beautiful. .

On the other hand, if the patterned surface of the glass member 100 can express the surface properties of the glass itself as it is, it can save the process cost. In addition, in the case of a glass member having excellent hardness and durability, such as tempered glass, hardness, durability, stain resistance, scratch resistance, etc., than surface treatment processes such as deposition, PTN printing, film lamination, coating, and spray are applied. Properties can be measured rather well.

As described above, the glass decorative material according to the embodiment forms a pattern on the glass member 100 by combining the photo etching method and the chemical etching method using the photoresist 200. Thus, mass production at low cost is possible, and fine line widths can be realized. In addition, the pattern can be formed without limiting the type or thickness of the glass member 100, it is possible to easily form a desired pattern.

7 is a plan view of a pattern image of the glass decorative material according to the embodiment.

As shown in FIG. 7, the glass decorative material according to the embodiment divides the pattern forming area of the image into a plurality of sectors and improves the sectors 130, 140, and 150 in order to improve the gradation effect and the diffuse reflection effect of the image. The structures of the formed patterns 135, 145, and 155 may be formed differently.

For example, when the pattern formation region is divided into the first sector 130, the second sector 140, and the third sector 150, the first pattern 135 and the first pattern 135 formed in each sector 130, 140, and 150 are formed. The two patterns 145 and the third pattern 155 may be formed in different directions. In addition, the distance between the first patterns 135, the distance between the second patterns 145, and the distance between the third patterns 155 may be set differently according to the sectors 130, 140, and 150.

Accordingly, light incident on the sectors 130, 140, and 150 may be reflected in different directions according to the directions of the patterns 135, 145, and 155 to obtain a diffuse reflection effect.

In addition, since the patterns 135, 145, and 155 reflect light in different directions, the sectors 130, 140, and 150 have different brightnesses. Accordingly, it is possible to obtain a gradation effect by adjusting the formation direction of each pattern 135, 145, 155 constituting the entire image.

The patterns 135, 145, and 155 of the sectors 130, 140, and 150 may be formed to have widths and heights, respectively.

8 is a cross-sectional view of the image of the pattern 135, 145, 155 of the glass decorative material according to the embodiment, A-A 'of the first sector 130, B-B' of the second sector 140, the third sector The cross section of each pattern 135, 145, and 155 cut | disconnected along C-C 'of 150 is shown.

As shown in FIG. 8, the first pattern 135, the second pattern 145, and the third pattern 155 have widths set to W1, W2, and W3, and depths set to h1, h2, and h3, respectively. Can be. Here, the widths of the patterns 135, 145, and 155 are W1> W2> W3, and the depths are h1 <h2 <h3, and their widths and depths may be different from each other.

Depending on the width and depth of each of the patterns 135, 145, and 155, the path and the amount of reflection of the reflected light vary. It is possible to adjust.

For example, when the first patterns 135 of the first sector 130 are all formed to have the same width W1 and the same depth h1, and the distance between the first patterns 135 is also the same, the first sector 135 is formed. The brightness of the region 130 is constantly implemented. In the second sector 140 adjacent to the first sector 130, only one or more of design conditions such as the width W2, the depth h2, the formation direction, and the distance between the patterns of the second pattern 145 are provided. It is possible to adjust the brightness even if you change it. Therefore, each design condition can be set by the designer, but the width (W1, W2, W3) of each pattern and the distance between the patterns are designed to be 0 to 2000 µm or less, and the depths (h1, h2, h3) are 0. When designing to ˜5000 μm or less, the listener may appreciate the image formed through the pattern without being aware of the pattern itself. This means that the viewer can recognize the pattern itself when the width (W1, W2, W3) of each pattern and the distance between the patterns are larger than 0 to 2000 mu m or the depths (h1, h2, h3) are larger than 0 to 5000 mu m. Because there is.

Thus, the pattern which comprises the image of a glass decorative material can adjust reflection efficiency, diffuse reflection efficiency, a reflection direction, etc. according to design conditions, such as width, depth, a formation direction, and the distance between patterns. Accordingly, by dividing the entire image into a plurality of sectors and adjusting the design conditions of the pattern according to each sector, various aesthetic effects can be obtained.

As described above, the glass decorative material according to the embodiment and the method of manufacturing the same by using a photo etching method and a chemical etching method for processing the glass member, it is possible to easily form a fine pattern at a low cost. Thus, by adjusting the reflection efficiency, diffuse reflection efficiency, reflection direction, etc. using a fine pattern, it is possible to give a shadow effect or diffuse reflection effect, etc. to the image formed on the glass decorative material to provide a delicate and beautiful appearance.

Although described above with reference to the embodiment is only an example and is not intended to limit the invention, those of ordinary skill in the art to which the present invention does not exemplify the above within the scope not departing from the essential characteristics of this embodiment It will be appreciated that many variations and applications are possible. For example, each component specifically shown in the embodiment can be modified. And differences relating to such modifications and applications will have to be construed as being included in the scope of the invention defined in the appended claims.

1 is a state of use of the glass decorative material according to the embodiment,

2 to 6 is a manufacturing state of the glass decorative material according to the embodiment.

7 is a plan view of a pattern image of the glass decorative material according to the embodiment.

8 is a cross-sectional view of the pattern image of the glass decorative material according to the embodiment.

Claims (10)

At least one of a plurality of first patterns formed in the first area and having the same width, depth, distance, and forming direction, and at least one of the width, depth, distance, and forming direction of the first pattern; A glass member including a plurality of second patterns formed differently from each other; Glass decorative material comprising a protective layer for protecting the back of the glass member. The method of claim 1, The first patterns and the second patterns, a glass decoration material having a width of 0 ~ 2000㎛ or less, a distance between the pattern of 0 ~ 2000㎛ or less, and a depth of 0 ~ 5000㎛ or less. The method of claim 1, The protective layer, A glass decorative material comprising the first protective layer and the second protective layer formed by at least one of a film laminate, PTN printing, deposition, coating, spray method. The method of claim 1, The protective layer is a glass decorative material colored in a predetermined color. The method of claim 1, The protective layer is a glass decorative material comprising at least one of glass, transparent plastic panel, transparent sheet. Coating a photoresist on the glass member; Exposing the photoresist of the glass member using a patterned mask; Developing a photoresist corresponding to the pattern of the mask; Etching the glass member having the photoresist corresponding to the mask pattern by using an etching solution; Forming a protective layer for protecting the back surface is not formed pattern of the glass member. The method of claim 6, Exposing the photoresist of the glass member using a mask having a pattern, And exposing the photoresist of the glass member using a working film. The method of claim 6, Etching the glass member having the photoresist corresponding to the mask pattern using an etching solution, Etching a plurality of first patterns formed in the first region and having the same width, depth, distance, and direction of formation; And etching a plurality of second patterns formed in a second region, wherein at least one of the width, depth, distance, and formation direction of the first pattern is different. The method of claim 8, The first patterns and the second patterns, a width of 0 ~ 2000㎛ less, a distance between the pattern of 0 ~ 2000㎛ or less, and a glass decoration material manufacturing method having a depth of 0 ~ 5000㎛ or less. The method of claim 6, Etching the glass member having the photoresist corresponding to the mask pattern, using an etching solution, etching using a hydrofluoric acid-based etching solution.

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