KR20100057442A - 내구성이 우수한 저방사 유리 - Google Patents
내구성이 우수한 저방사 유리 Download PDFInfo
- Publication number
- KR20100057442A KR20100057442A KR1020080116484A KR20080116484A KR20100057442A KR 20100057442 A KR20100057442 A KR 20100057442A KR 1020080116484 A KR1020080116484 A KR 1020080116484A KR 20080116484 A KR20080116484 A KR 20080116484A KR 20100057442 A KR20100057442 A KR 20100057442A
- Authority
- KR
- South Korea
- Prior art keywords
- low
- glass
- layer
- emissive
- dielectric layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000005344 low-emissivity glass Substances 0.000 title claims abstract description 15
- 229910052751 metal Inorganic materials 0.000 claims abstract description 51
- 239000002184 metal Substances 0.000 claims abstract description 51
- 239000011521 glass Substances 0.000 claims abstract description 49
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims abstract description 16
- 229910052709 silver Inorganic materials 0.000 claims abstract description 16
- 239000004332 silver Substances 0.000 claims abstract description 16
- 239000000758 substrate Substances 0.000 claims abstract description 13
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 11
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims abstract description 10
- 239000010931 gold Substances 0.000 claims abstract description 7
- 229910052737 gold Inorganic materials 0.000 claims abstract description 6
- 229910052697 platinum Inorganic materials 0.000 claims abstract description 6
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 5
- 239000000956 alloy Substances 0.000 claims abstract description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 5
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims abstract description 5
- 238000000034 method Methods 0.000 claims description 15
- 238000000151 deposition Methods 0.000 claims description 9
- -1 Si 3 N 4 Inorganic materials 0.000 claims description 6
- 238000004544 sputter deposition Methods 0.000 claims description 6
- 238000010521 absorption reaction Methods 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 4
- 229910002651 NO3 Inorganic materials 0.000 claims description 3
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 claims description 3
- 229910052787 antimony Inorganic materials 0.000 claims description 3
- 229910052797 bismuth Inorganic materials 0.000 claims description 3
- 229910052735 hafnium Inorganic materials 0.000 claims description 3
- 229910052738 indium Inorganic materials 0.000 claims description 3
- 229910052745 lead Inorganic materials 0.000 claims description 3
- 229910052758 niobium Inorganic materials 0.000 claims description 3
- 150000004767 nitrides Chemical class 0.000 claims description 3
- 229910052715 tantalum Inorganic materials 0.000 claims description 3
- 229910052716 thallium Inorganic materials 0.000 claims description 3
- 229910052718 tin Inorganic materials 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- 229910052720 vanadium Inorganic materials 0.000 claims description 3
- 229910052726 zirconium Inorganic materials 0.000 claims description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 2
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 claims description 2
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 2
- 229910006404 SnO 2 Inorganic materials 0.000 claims description 2
- 229910052802 copper Inorganic materials 0.000 claims description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N zinc oxide Inorganic materials [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 2
- 239000010949 copper Substances 0.000 claims 1
- 239000000203 mixture Substances 0.000 claims 1
- 229910052759 nickel Inorganic materials 0.000 claims 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims 1
- 238000010276 construction Methods 0.000 abstract description 2
- 230000005540 biological transmission Effects 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 90
- 238000002834 transmittance Methods 0.000 description 14
- 239000011247 coating layer Substances 0.000 description 12
- 230000008021 deposition Effects 0.000 description 8
- 239000007789 gas Substances 0.000 description 8
- 238000000576 coating method Methods 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 5
- 238000002474 experimental method Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 230000005855 radiation Effects 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 238000005299 abrasion Methods 0.000 description 3
- 239000011241 protective layer Substances 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000002243 precursor Substances 0.000 description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 239000005328 architectural glass Substances 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000005816 glass manufacturing process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/01—Layered products comprising a layer of metal all layers being exclusively metallic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B9/00—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
Description
층 | 전력(W) | 가스압력(mmTorr) | 압력(Torr) |
제1유전층(ZnO) | 60 | 3 | 5.0 ×10-5 |
금속층(Ag) | 16 | 3 | 5.0 ×10-5 |
제2유전층(ZnO) | 60 | 3 | 5.0 ×10-5 |
오버코트층(SiN4) | 16 | 3 | 5.0 ×10-5 |
실시예 1 | 실시예 2 | 실시예 3 | ||
ZnO층의 두께(nm) | 18 | 18 | 18 | |
Ag층의 두께(nm) | 10 | 10 | 10 | |
ZnO층의 두께(nm) | 22 | 22 | 22 | |
Si3N4의 두께(nm) | 11.6 | 24 | 36.4 | |
Taber abrasion 시험 전 후 가시광선투과율 변화(%) |
전 | 66 | 62 | 62 |
후 | 59 | 57 | 55 | |
가시광선투과율 변화(%) | 7 | 5 | 7 |
Claims (11)
- 저방사 금속층; 및 상기 저방사 금속층 상에 형성된 15 내지 3nm의 두께를 가진 오버코트층을 포함하는 저방사 유리.
- 제1항에 있어서,상기 저방사 유리가 유리기판상에 순차적으로 적층된 제1유전체층, 금속층, 제2유전체층, 및 오버코트층을 포함하는 것을 특징으로 하는 저방사 유리.
- 제1항에 있어서,상기 저방사 금속층이 은, 금, 알루미늄, 백금 또는 이들의 합금을 포함하는 것을 특징으로 하는 저방사 유리.
- 제3항에 있어서,상기 저방사 금속층을 구성하는 은, 금, 알루미늄, 백금 또는 이들의 합금에 Ni, Pt, Cu, Au 중에서 선택된 1종 이상의 원소가 첨가되는 것을 포함하는 저방사 유리.
- 제1항에 있어서,상기 저방사 금속층의 두께가 5 내지 30nm인 것을 특징으로 하는 저방사 유 리.
- 제2항에 있어서,상기 제1유전체층 및 제2유전체층이 TiO2, SnO2, ZnO, Bi2O3, Si3N4, ZrO2, Ta2O3, AlN, In2O3, Nb2O5 또는 이들의 혼합물인 것을 포함하는 저방사 유리.
- 제2항에 있어서,상기 제1유전체층 및 제2유전체층이 흡수계수가 0.1이하이고, 굴절율이 1.8이상인 것을 포함하는 저방사 유리.
- 제2항에 있어서,상기 제1유전체층 및 제2유전체층의 두께가 18 내지 22nm인 것을 특징으로 하는 저방사 유리.
- 제1항에 있어서,상기 오버코트층이 Al, In, Sn, Tl, Pb, Sb, Bi, Ti, Zr, Hf, V, Nb 및 Ta 중에서 선택된 1종 이상의 원소가 도핑된 Si 또는 Al의 산화물, 질화물 또는 질산화물을 포함하는 것을 특징으로 하는 저방사 유리.
- 제9항에 있어서,상기 Al, In, Sn, Tl, Pb, Sb, Bi, Ti, Zr, Hf, V, Nb 및 Ta 중에서 선택된 1종 이상의 원소가 도핑된 Si 또는 Al의 산화물, 질화물 또는 질산화물이 Si3N4, Al-ZnO, TiO2, Zr3, SiO2, Al2O3, N4 또는 이들의 합금을 포함하는 것을 특징으로 하는 저방사 유리.
- 진공 스퍼터링 방법을 이용하여 저방사 금속층 상에 15 내지 3nm의 두께를 가진 오버코트층을 증착하는 단계를 포함하는 저방사 유리의 제조방법.
Priority Applications (1)
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KR1020080116484A KR101302259B1 (ko) | 2008-11-21 | 2008-11-21 | 내구성이 우수한 저방사 유리 |
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KR1020080116484A KR101302259B1 (ko) | 2008-11-21 | 2008-11-21 | 내구성이 우수한 저방사 유리 |
Publications (2)
Publication Number | Publication Date |
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KR20100057442A true KR20100057442A (ko) | 2010-05-31 |
KR101302259B1 KR101302259B1 (ko) | 2013-09-02 |
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Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101408787B1 (ko) * | 2012-08-31 | 2014-06-18 | 세메스 주식회사 | 기판 처리 장치 |
KR20190011384A (ko) * | 2017-07-25 | 2019-02-07 | 주식회사 케이씨씨 | 저방사 유리 |
WO2019022484A3 (ko) * | 2017-07-25 | 2019-03-21 | 주식회사 케이씨씨 | 저방사 유리 |
WO2019119271A1 (zh) * | 2017-12-19 | 2019-06-27 | 华为技术有限公司 | 一种玻璃和贴附于低辐射Low-E玻璃的材料 |
US11161779B2 (en) | 2016-08-23 | 2021-11-02 | Lg Hausys, Ltd. | Functional building material for windows |
KR20220067806A (ko) * | 2020-11-18 | 2022-05-25 | 주식회사 케이씨씨글라스 | 유리 적층체 |
US11685688B2 (en) | 2018-10-22 | 2023-06-27 | Mimsi Materials Ab | Glazing and method of its production |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20160015513A (ko) * | 2014-07-30 | 2016-02-15 | (주)엘지하우시스 | 저방사 코팅, 및 저방사 코팅을 포함하는 창호용 기능성 건축 자재 |
KR102064881B1 (ko) * | 2019-02-20 | 2020-01-10 | (주)엘지하우시스 | 저방사 코팅, 및 저방사 코팅을 포함하는 창호용 기능성 건축 자재 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101047177B1 (ko) * | 2004-12-31 | 2011-07-07 | 주식회사 케이씨씨 | 내구성이 향상된 저방사 유리 |
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2008
- 2008-11-21 KR KR1020080116484A patent/KR101302259B1/ko active Active
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101408787B1 (ko) * | 2012-08-31 | 2014-06-18 | 세메스 주식회사 | 기판 처리 장치 |
US11161779B2 (en) | 2016-08-23 | 2021-11-02 | Lg Hausys, Ltd. | Functional building material for windows |
KR20190011384A (ko) * | 2017-07-25 | 2019-02-07 | 주식회사 케이씨씨 | 저방사 유리 |
WO2019022484A3 (ko) * | 2017-07-25 | 2019-03-21 | 주식회사 케이씨씨 | 저방사 유리 |
WO2019022383A3 (ko) * | 2017-07-25 | 2019-04-11 | 주식회사 케이씨씨 | 저방사 유리 |
CN110719898A (zh) * | 2017-07-25 | 2020-01-21 | Kcc公司 | 低发射率玻璃 |
WO2019119271A1 (zh) * | 2017-12-19 | 2019-06-27 | 华为技术有限公司 | 一种玻璃和贴附于低辐射Low-E玻璃的材料 |
US11685688B2 (en) | 2018-10-22 | 2023-06-27 | Mimsi Materials Ab | Glazing and method of its production |
US12006250B2 (en) | 2018-10-22 | 2024-06-11 | Mimsi Materials Ab | Glazing and method of its production |
KR20220067806A (ko) * | 2020-11-18 | 2022-05-25 | 주식회사 케이씨씨글라스 | 유리 적층체 |
Also Published As
Publication number | Publication date |
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KR101302259B1 (ko) | 2013-09-02 |
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