KR20030060319A - a method of purifying nitrogen trifluoride by zeolite mixing - Google Patents
a method of purifying nitrogen trifluoride by zeolite mixing Download PDFInfo
- Publication number
- KR20030060319A KR20030060319A KR1020020000972A KR20020000972A KR20030060319A KR 20030060319 A KR20030060319 A KR 20030060319A KR 1020020000972 A KR1020020000972 A KR 1020020000972A KR 20020000972 A KR20020000972 A KR 20020000972A KR 20030060319 A KR20030060319 A KR 20030060319A
- Authority
- KR
- South Korea
- Prior art keywords
- zeolite
- gas
- aeration
- nitrogen trifluoride
- molecular
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/082—Compounds containing nitrogen and non-metals and optionally metals
- C01B21/083—Compounds containing nitrogen and non-metals and optionally metals containing one or more halogen atoms
- C01B21/0832—Binary compounds of nitrogen with halogens
- C01B21/0835—Nitrogen trifluoride
- C01B21/0837—Purification
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2210/00—Purification or separation of specific gases
- C01B2210/0001—Separation or purification processing
- C01B2210/0009—Physical processing
- C01B2210/0014—Physical processing by adsorption in solids
- C01B2210/0015—Physical processing by adsorption in solids characterised by the adsorbent
- C01B2210/0018—Zeolites
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Separation Of Gases By Adsorption (AREA)
- Solid-Sorbent Or Filter-Aiding Compositions (AREA)
Abstract
Description
본 발명은 제올라이트 혼합을 이용하여 삼불화질소(NF3;nitrogen trifluoride) 제조과정에서의 다른 불순물을 제거할 수 있도록 삼불화질소 정제방법에 관한 것으로, 더 자세하게는 몰레큘러시브 5A 및 몰레큘러시브 13X를 하나의 컬럼에 혼합시켜 충진된 흡착층에 N2O, CO2등의 불순물을 함유한 NF3를 적당한 온도에서 통과시켜 NF3가스로부터 불순물을 분리할 수 있도록 한 것에 관한 것이다.The present invention relates to a method for purifying nitrogen trifluoride to remove other impurities in the manufacturing process of nitrogen trifluoride (NF 3 ) using zeolite mixture, more specifically, Molecular 5A and Molecular 13X was mixed in one column to allow NF 3 containing impurities such as N 2 O and CO 2 to pass through the adsorbed bed at an appropriate temperature so as to separate impurities from the NF 3 gas.
일반적으로 NF3가스는 반도체 제조의 드라이 에칭제와 CVD장비의 세정용 및 로켓트의 추진원료 등으로 사용되는데, 이들 용도에 사용되는 NF3가스는 고순도의 것이 요구된다.In general, NF 3 gas is used as a dry etchant for semiconductor manufacturing, CVD equipment cleaning, rocket propellant, and the like, and NF 3 gas used in these applications is required to have high purity.
한편 NF3가스는 각종 제조방법으로 제조되는데, 그 제조방법으로는 예를 들면 암모늄산 불화물의 용융염을 전해하는 방법, 암모늄산 불화물을 용융상태에서 기체상의 불소와 반응시키는 방법, 불화암모늄 또는 산성암모늄과 불화수소를 원료로 하는 NH4F-HF나 다시 여기에 불화칼륨 또는 산성 불화칼륨을 그 원료에 가한 KF-NH4F-HF계에서의 용융염 전해법 등이 있다.On the other hand, NF 3 gas is produced by various manufacturing methods, for example, a method of electrolysis of molten salt of ammonium fluoride, a method of reacting ammonium fluoride with gaseous fluorine in the molten state, ammonium fluoride or acidic NH 4 F-HF using ammonium and hydrogen fluoride as raw materials, or molten salt electrolysis in KF-NH 4 F-HF system in which potassium fluoride or acidic potassium fluoride is added thereto.
그러나 상기 방법의 대부분의 경우에 있어서 얻어진 NF3가스에는 아산화질소(N2O), 이산화탄소(CO2), 이불화이질소(N2F2) 등의 불순물을 다량으로 함유하고 있어서 99.99% 이상의 고순도를 요하는 제품 생산에는 반드시 정제공정이 필요하게 된다.However, in most cases of the above method, the obtained NF 3 gas contains a large amount of impurities such as nitrous oxide (N 2 O), carbon dioxide (CO 2 ), dinitrogen difluoride (N 2 F 2 ), and has a high purity of 99.99% or more. To produce a product that requires a refining process is required.
일반적으로 NF3가스중의 불순물을 제거하는 방법으로는 멤브레인(Membrane)을 이용한 분리막 적용 방법과 흡착제 이용방법이 있으며, 이중 전자의 방법은 재생기술과 제조기술이 난해하여 아직은 공정 적용에 많은 비용이 소모되므로 이러한 면을 비추어 볼 때 경제적이라 할 수 있는 후자의 방법을 현재 주로 사용하고 있는 실정이다.In general, there are two methods for removing impurities in NF 3 gas: membrane application using membrane and adsorbent use. The double electron method is difficult to apply due to the difficult regeneration and manufacturing techniques. In view of these aspects, the latter method, which can be economically used, is currently used mainly.
상기 흡착제 이용방법은 합성 제올라이트, 활성탄, 활성 알루미나 등의 흡착제 등을 이용하여 이들 불순물을 흡착 후 제거하는 방법이 일반적으로 널리 알려져 있으며, 특히 미국특허 제4,156,598호에서 제시하고 있는 합성 제올라이트는 상기 불순물을 비교적 효율적으로 흡착하는 것으로 알려져 있다.As the method of using the adsorbent, a method of adsorbing and removing these impurities using an adsorbent such as synthetic zeolite, activated carbon, activated alumina, and the like is generally known. In particular, the synthetic zeolite disclosed in US Pat. No. 4,156,598 provides the impurities. It is known to adsorb relatively efficiently.
그러나 상기 미국특허의 합성 제올라이트의 경우 예를 들면 몰레큘러시브 5A(Molecular Sieve 5A)는 N2O의 흡착능력은 크나 CO2의 흡착능력이 작다는 문제점이 있고, 반대로 몰레큘러시브 13X(Molecular Sieve 13X)는 CO2의 흡착능력은 크나N2O의 흡착능력이 작다는 문제점이 있다.However, in the case of the synthetic zeolite of the US patent, for example, Molecular Sieve 5A has a problem that the adsorption capacity of N 2 O is high but the adsorption capacity of CO 2 is small. Molecular Sieve 13X) has a problem that the adsorption capacity of CO 2 is large but the adsorption capacity of N 2 O is small.
따라서 NF3가스중의 N2O 및 CO2를 효과적으로 제거하기 위해서는 각각의 제거능력이 큰 흡착제를 순차적으로 설치하여 각 불순물을 순차적으로 제거하는 방법이 사용되어 왔다.Therefore, in order to effectively remove N 2 O and CO 2 in the NF 3 gas, a method of sequentially removing each impurity by sequentially installing adsorbents having a large removal capability has been used.
본 발명은 상기와 같은 종래의 실정을 감안하여 안출한 것이며, 그 목적이 제올라이트를 이용하여 NF3가스에 포함된 N2O나 CO2등의 불순물을 효과적으로 제거함으로써 순도 높은 NF3가스를 제조할 수 있도록 하는 제올라이트 혼합을 이용한 삼불화질소 정제방법을 제공하는 데에 있는 것이다.The present invention is directed towards a devised in view of the conventional actual circumstances, such as the above, and an object is by using a zeolite to produce a high-purity NF 3 gas by removing impurities such as the N 2 O or CO 2 contained in the NF 3 gas effectively It is to provide a nitrogen trifluoride purification method using a zeolite mixture.
상기의 목적을 달성하기 위하여 본 발명은 N2O, CO2등의 불순물을 함유한 NF3를 적당한 온도에서 N2O 및 CO2에 대해 뛰어난 흡착성능을 가진 몰레큘러시브 5A 및 몰레큘러시브 13X를 하나의 컬럼에 혼합시켜 충진된 흡착층에 통과시켜 NF3가스로부터 불순물을 분리할 수 있도록 한 것을 특징으로 하며, 이하 그 구체적인 기술내용을 더욱 자세히 설명하면 다음과 같다.The present invention in order to attain the object of the N 2 O, CO 2 a NF 3 containing impurities such as with excellent adsorption performance for the N 2 O and CO 2 at a suitable temperature molecular sieve 5A and molecular particulate rush 13X is mixed in one column to pass through the packed adsorption layer to separate impurities from the NF 3 gas, which will be described in more detail below.
본 발명은 많은 흡착제중 제올라이트의 선택적 흡착 능력과 성향 즉, 광물의 세공구조 특성 및 분자들의 형태, 크기 및 극성 정도에 따라서 특정 분자만을 선택적으로 흡착하는 두 가지의 흡착제를 혼합하여 각 흡착제가 가지고 있는 흡착 특성을 극대화할 수 있도록 한 것이다.The present invention is a mixture of two adsorbents that selectively adsorb only specific molecules according to the selective adsorption capacity and tendency of zeolite among many adsorbents, that is, the pore structure characteristics of minerals and the shape, size and polarity of molecules. It is to maximize the adsorption characteristics.
즉, 본 발명의 삼불화질소 정제방법은 아산화질소(N2O)와 이산화탄소(CO2)를 함유한 삼불화질소(NF3)를 온도 -100~50℃에서 몰레큘러시브 5A와 몰레큘러시브 13X의 두 제올라이트가 일정비율로 혼합 충진된 흡착제층에 통과시켜 N2O와 CO2를 제거하는 것이다.In other words, the nitrogen trifluoride purification method of the present invention is a nitrogen trifluoride (N 2 O) and nitrogen trifluoride (NF 3 ) containing carbon dioxide (CO 2 ) at a temperature of -100 ~ 50 ℃ Molecular 5A and Molecular Two zeolites of Rive 13X are passed through the adsorbent bed mixed and filled at a constant rate to remove N 2 O and CO 2 .
본 발명에서 사용하는 제올라이트는 수분이 완전히 제거된 몰레큘러시브 5A와 몰레큘러시브 13X이며, 흡착제로 사용되기 위한 적당한 입도는 1~100메시, 바람직하게는 8~40메시 정도의 것이 좋다.The zeolites used in the present invention are Molecular 5A and Molecular 13X in which water is completely removed, and the suitable particle size for use as the adsorbent is 1 to 100 mesh, preferably 8 to 40 mesh.
본 발명은 몰레큘러시브 5A와 몰레큘러시브 13X의 두 제올라이트가 일정비율로 혼합 충진된 흡착제층에 불순물 가스를 함유하는 삼불화질소가스를 -100~50℃의 온도에서 통기하여 불순물을 제거하는 것인 바, 본 발명의 가장 바람직한 실시양태는 수분제거와 NF3가스의 흡착 정제를 동일한 용기에서 행하는 것이다.The present invention removes impurities by ventilating a nitrogen trifluoride gas containing an impurity gas in an adsorbent layer in which two zeolites of molecular 5A and molecular 13X are mixed and filled at a constant ratio at a temperature of -100 to 50 ° C. The most preferred embodiment of the present invention is to perform water removal and adsorption purification of NF 3 gas in the same vessel.
즉, 적당한 용기 또는 컬럼에 원하는 입도 분포로 제올라이트를 충진하여 흡착제층을 형성한 다음에 불활성가스를 그 흡착제층에 통기하면서 가열 처리하며, 가열 처리 후에 제올라이트를 용기밖으로 꺼내지 않고 그대로의 상태에서 냉각시키고, 이어서 제올라이트 흡착제층에 NF3가스를 -100~50℃의 온도에서 통기하는 방법이 바람직하다.That is, the zeolite is filled in a suitable container or column with a desired particle size distribution to form an adsorbent layer, followed by heat treatment while inert gas is blown through the adsorbent layer, and after the heat treatment, the zeolite is cooled out without leaving the vessel. followed by a method of venting the NF 3 gas to the zeolite adsorbent layer at a temperature of -100 ~ 50 ℃ is preferred.
본 발명에 있어서 NF3가스의 정제는 상기와 같이 컬럼 등에 충진된 제올라이트 흡착제층에 통기하는 방법으로 실시되는데, 이 때의 통기온도는 50℃이하의 온도가 바람직하며, 50℃이상의 온도로 통기하면 통기 후의 NF3가스중의 N2O의 함유량이 충분히 감소하지 않게 될 뿐 아니라 제올라이트 단위 체적당의 NF3가스중의 N2O의 흡착량이 크게 감소하므로 좋지 않게 된다.In the present invention, the purification of the NF 3 gas is carried out by aeration through a zeolite adsorbent layer filled in a column or the like as described above, wherein the aeration temperature at this time is preferably 50 ° C. or lower, and aeration at 50 ° C. or higher. Not only does the content of N 2 O in the NF 3 gas after aeration not sufficiently decrease, but the adsorption amount of N 2 O in the NF 3 gas per unit volume of zeolite greatly decreases, which is not good.
따라서 통기온도는 저온일수록 바람직하지만 NF3의 비점은 -129℃이므로 이 온도 이하에서는 사실상 조작이 곤란하므로 -100℃ 이상의 범위에서 실시되어야 한다.Therefore, the lower the aeration temperature is preferable, but the boiling point of the NF 3 is -129 ℃, since it is practically difficult to operate below this temperature should be carried out in the range of -100 ℃ or more.
본 발명에서 제올라이트 흡착제층이 충진되는 용기나 유리의 재질로서는 스테인레스 스틸, 구리, 니켈, 철 등의 통상적인 재료를 사용할 수 있다.As the material of the container or glass in which the zeolite adsorbent layer is filled in the present invention, conventional materials such as stainless steel, copper, nickel and iron can be used.
한편 본 발명에 있어서 제올라이트 흡착제층의 통기조건에 관하여 더욱 자세히 설명하면 다음과 같다.Meanwhile, in the present invention, the aeration conditions of the zeolite adsorbent layer will be described in more detail as follows.
즉, 제올라이트 흡착제층의 지름은 1~50cm 정도가 바람직하고, 흡착제층의 높이는 5cm~2m정도, 가스 유량은 5~500ml/min 정도가 바람직하며, 통기시의 NF3가스의 압력에 대한 특별한 한정은 없으나 0~10kg/cm2-G 정도의 압력이 조작하기 쉬우므로 바람직하다.That is, the diameter of the zeolite adsorbent layer is preferably about 1 to 50 cm, the height of the adsorbent layer is preferably about 5 cm to 2 m, the gas flow rate is about 5 to 500 ml / min, and the special limitation on the pressure of the NF 3 gas at the time of aeration. It is preferable because the pressure of 0 ~ 10kg / cm 2 -G is easy to operate.
본 발명이 대상으로 하는 NF3가스를 정제처리하면 가스중의 불순물 함유량은 N2O 0~5ppm, CO2 0~5ppm으로 할 수가 있으며, 이러한 분석 수치는 가스크로마토그래피(DID)에 의해 행한 수치이다.When the NF 3 gas intended for the present invention is purified, the impurity content in the gas can be 0 to 5 ppm of N 2 O and 0 to 5 ppm of CO 2, and these analytical values are numerical values performed by gas chromatography (DID).
<실시예1>Example 1
내경 10cm의 스테인레스제 컬럼에 수분이 완전히 제거된 입도가 8~12메시의 구형 제올라이트 몰레큘러시브 5A와 몰레큘러시브 13X를 각각 50 중량%씩 골고루 혼합하여 충진높이 400mm로 충진한 후 상압에서 통기온도 10℃에서 N2O 2%, CO22%를 함유하는 NF3를 150ml/mim의 유속으로 파과시간까지 통기시켰다.A 10 cm diameter stainless steel column is filled with 400 mm by filling a 50 mm by weight mixture of spherical zeolite molecular 5A and molecular sieve 13X each having a particle size of 8 to 12 mesh with water completely removed. At aeration temperature of 10 ° C., NF 3 containing 2% N 2 O and 2% CO 2 was aerated at breakthrough time at a flow rate of 150 ml / mim.
<실시예2>Example 2
실시예1과 같은 흡착제층 충진 조건하에서 통기온도를 0℃로 변화시키고 실시예1과 같은 통기 조건으로 NF3를 흡착제층에 파과시간까지 통기시켰다.Under the same adsorbent bed filling conditions as in Example 1, the aeration temperature was changed to 0 ° C., and NF 3 was vented to the adsorbent layer until the breakthrough time under the same aeration conditions as in Example 1.
<실시예3>Example 3
실시예1과 같은 흡착제층 충진 조건하에서 통기온도를 -10℃로 변화시키고 실시예1과 같은 통기 조건으로 NF3를 흡착제층에 파과시간까지 통기시켰다.Under the same adsorbent bed filling conditions as in Example 1, the aeration temperature was changed to −10 ° C., and NF 3 was vented to the adsorbent layer until the breakthrough time under the same aeration conditions as in Example 1.
<실시예4>Example 4
실시예1과 같은 흡착제층 충진 조건하에서 통기온도를 -20℃로 변화시키고 실시예 1과 같은 통기 조건으로 NF3를 흡착제층에 파과시간까지 통기시켰다.Under the same adsorbent bed filling conditions as in Example 1, the aeration temperature was changed to −20 ° C., and NF 3 was vented to the adsorbent layer until the breakthrough time under the same aeration conditions as in Example 1.
상기에서 파과시간이란 불순물을 함유하는 가스를 흡착제층에 통기해서 불순물을 흡착 제거할 때에 흡착제의 흡착능력이 우수하면 경우 가스의 통기에서 곧바로 얻어지는 가스중의 불순물 함유량은 적고, 또한 일정 함유량이거나 조금씩 서서히 증가하는 상태가 계속되지만 흡착제가 흡착능력을 상실할 때쯤 되면 불순물의함유량이 급격히 증가하기 시작하는 바, 이처럼 흡착제가 흡착능력을 상실하여 불순물의 함유량이 급격히 증가하기 시작하기까지의 통기시간을 말한다.The breakthrough time described above means that if the adsorbent has good adsorption ability when the gas containing impurities is adsorbed and removed by adsorbing the adsorbent layer, the impurity content in the gas immediately obtained through the gas passage is small, and is constant or gradually gradually. Although the state of increase continues, when the adsorbent loses the adsorption capacity, the impurity content starts to increase rapidly. As such, the aeration time until the adsorbent loses the adsorption capacity and the content of impurities starts to increase rapidly.
전술한 각 실시예 및 후술할 각 비교예에서는 불순물 중 어느 하나가 20ppm을 넘는 시간까지의 통기시간을 파과시간으로 하였으며, 전술한 각 실시예에 의한 파과시간까지의 N2O, CO2, NF3의 흡착량을 표1에 나타내었다.The above-described respective examples and the respective comparative examples to be described later which one was the aeration time to more than 20ppm time as the breakthrough time, N 2 O, to the breakthrough time by the respective embodiments described above CO 2, NF of the impurity The adsorption amount of 3 is shown in Table 1.
상기 표1과 같이 각 실시예에 의한 정제 결과 NF3중의 N2O 및 CO2가 매우 양호하게 제거되었고, 파과시간도 비교적 길었으며, 통기온도가 낮을수록 불순물의 흡착능력이 향상되었다.As a result of purification according to each example as shown in Table 1, N 2 O and CO 2 in NF 3 was removed very well, the breakthrough time was also relatively long, and the lower the aeration temperature, the better the adsorption capacity of impurities.
<비교예1>Comparative Example 1
실시예1과 같은 흡착제층 충진 조건하에서 통기온도를 60℃로 변화시키고 실시예1과 같은 통기 조건으로 NF3를 흡착제층에 파과시간까지 통기시켰다.Under the same adsorbent bed filling conditions as in Example 1, the aeration temperature was changed to 60 ° C., and NF 3 was vented to the adsorbent layer until the breakthrough time under the same aeration conditions as in Example 1.
<비교예2>Comparative Example 2
실시예1과 같은 흡착제층 충진 조건중 제올라이트 혼합비율을 몰레큘러시브 5A 100 중량%로 변화시키고, 통기온도를 0℃로 변화시킨 상태에서 실시예1과 같은통기 조건으로 NF3를 흡착제층에 파과시간까지 통기시켰다.Embodiment and first absorbent layer changes the zeolite blend ratio of the filling conditions molecular particulates to rush probe 5A 100% by weight, such as, the NF 3 by aeration under the same conditions as in Example 1 in a state in which change in the aeration temperature was 0 ℃ the absorbent layer Aerated until breakthrough time.
<비교예3>Comparative Example 3
실시예1과 같은 흡착제층 충진 조건중 제올라이트 혼합비율을 몰레큘러시브 5A 80 중량%, 몰레큘러시브 13X 20 중량%로 변화시키고, 통기온도를 0℃로 변화시킨 상태에서 실시예1과 같은 통기 조건으로 NF3를 흡착제층에 파과시간까지 통기시켰다.The zeolite mixing ratio in the adsorbent layer filling conditions as in Example 1 was changed to 80% by weight of molecular 5A, 20% by weight of 13X in molecular weight, and the aeration temperature was changed to 0 ° C as in Example 1. Under aeration conditions, NF 3 was allowed to air through the adsorbent layer until the breakthrough time.
<비교예4>Comparative Example 4
실시예1과 같은 흡착제층 충진 조건중 제올라이트 혼합비율을 몰레큘러시브 5A 20 중량%, 몰레큘러시브 13X 80 중량%로 변화시키고, 통기온도를 0℃로 변화시킨 상태에서 실시예1과 같은 통기 조건으로 NF3를 흡착제층에 파과시간까지 통기시켰다.The zeolite mixing ratio of the adsorbent layer filling conditions as in Example 1 was changed to 20% by weight of Molecular 5A, 13X 80% by weight, and the aeration temperature was changed to 0 ° C. Under aeration conditions, NF 3 was allowed to air through the adsorbent layer until the breakthrough time.
<비교예5>Comparative Example 5
실시예1과 같은 흡착제층 충진 조건중 제올라이트 혼합비율을 몰레큘러시브 13X 100 중량%로 변화시키고, 통기온도를 0℃로 변화시킨 상태에서 실시예1과 같은 통기 조건으로 NF3를 흡착제층에 파과시간까지 통기시켰다.Embodiment and first absorbent layer changes the zeolite blend ratio of the filling conditions molecular particulates to rush probe 13X 100% by weight, such as, the NF 3 by aeration under the same conditions as in Example 1 in a state in which change in the aeration temperature was 0 ℃ the absorbent layer Aerated until breakthrough time.
상기 각 비교예에 의한 파과시간까지의 N2O, CO2, NF3의 흡착량을 표2에 나타내었다.Table 2 shows the adsorption amounts of N 2 O, CO 2 , and NF 3 up to the breakthrough time according to the comparative examples.
상기 표2와 같이 각 비교예에 의한 정제 결과 NF3가스의 통기온도를 적정한 통기온도인 50℃ 이하를 초과한 60℃로 변경한 비교예1의 경우 파과시간이 매우 짧고 파과시간까지의 흡착량이 극히 적어 산업적인 이용가능성을 거의 상실하였다.As shown in Table 2 above, in Comparative Example 1 in which the aeration temperature of NF 3 gas was changed to 60 ° C. exceeding 50 ° C. or lower, which is a proper aeration temperature, the breakthrough time was very short and the adsorption amount up to the breakthrough time was as follows. Very few lost industrial applicability.
또한 비교예2 및 비교예5와 같이 몰레큘러시브 5A와 몰레큘러시브 13X를 혼합 없이 단독으로 사용할 경우에는 각각 한 가지의 불순물에만 뛰어난 성능을 보이는 것을 관찰할 수 있었던 바, 이와 같이 한 제올라이트 흡착제를 단독으로 사용할 경우에는 새로운 흡착베드 등의 새로운 투자비가 필요하게 되므로 상업적인 측면에서 손실이 야기된다.In addition, when using Molecular 5A and Molecular 13X alone without mixing, as in Comparative Example 2 and Comparative Example 5, it was observed that only one impurity was superior to each other. If the adsorbent is used alone, a new investment cost, such as a new adsorption bed is required, causing a loss in commercial terms.
그러나 전술한 각 실시예 및 비교예3, 비교예4와 같이 두 제올라이트 흡착제를 일정비율이상 사용할 경우 두 가지 불순물에 대하여 모두 작용하기 때문에 각 불순물을 손쉽게 제거할 수 있게 된다.However, when the two zeolite adsorbents are used over a certain ratio as in each of the above-described Examples, Comparative Examples 3 and 4, each impurity can be easily removed because it acts on both impurities.
이상에서와 같이 본 발명은 몰레큘러시브 5A 및 몰레큘러시브 13X를 혼합하여 제올라이트 흡착층을 구성하고, 이 제올라이트 흡착층에 N2O, CO2등의 불순물을 함유한 NF3를 적당한 온도에서 통과시켜 NF3가스로부터 불순물을 분리할 수 있도록한 것으로, 본 발명에 의하면 하나의 컬럼에 충전한 제올라이트 혼합 흡착층을 통해 N2O, CO2등의 불순물을 동시에 제거할 수 있게 되므로 간편하고도 저렴하게 고품질의 NF3가스를 정제할 수 있게 되는 등의 효과를 얻을 수 있게 된다.As described above, the present invention comprises a zeolite adsorption layer by mixing the molecular 5A and the molecular 13X, the NF 3 containing impurities such as N 2 O, CO 2 in the zeolite adsorption layer at a suitable temperature Impurities can be separated from the NF 3 gas by passing through the present invention. According to the present invention, impurities such as N 2 O and CO 2 can be simultaneously removed through a zeolite mixed adsorption layer packed in one column. In addition, it is possible to obtain an effect such as being able to purify a high quality NF 3 gas at low cost.
Claims (1)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020020000972A KR20030060319A (en) | 2002-01-08 | 2002-01-08 | a method of purifying nitrogen trifluoride by zeolite mixing |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020020000972A KR20030060319A (en) | 2002-01-08 | 2002-01-08 | a method of purifying nitrogen trifluoride by zeolite mixing |
Publications (1)
Publication Number | Publication Date |
---|---|
KR20030060319A true KR20030060319A (en) | 2003-07-16 |
Family
ID=32217298
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020020000972A KR20030060319A (en) | 2002-01-08 | 2002-01-08 | a method of purifying nitrogen trifluoride by zeolite mixing |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR20030060319A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100474965B1 (en) * | 2002-02-14 | 2005-03-08 | 주식회사 효성 | Synthetic Zeolites Prepared By Metal Ion Exchange, Preparation Method Of The Same And Purification Method Of Nitrogen Trifluoride Using The Same |
KR100479165B1 (en) * | 2002-10-01 | 2005-03-25 | 주식회사 효성 | Method for NF3 Purification using Copper-impregnated Zeolite absorbent |
KR20050054560A (en) * | 2003-12-05 | 2005-06-10 | 주식회사 효성 | Method for refining nitrogen trifluoride gas using synthetic zeolite |
KR100841183B1 (en) * | 2003-09-23 | 2008-06-24 | 주식회사 효성 | Method for NF3 Purification using Zeolite absorbent impregnated with Nickel and Copper |
KR101245497B1 (en) * | 2011-10-27 | 2013-03-25 | 오씨아이머티리얼즈 주식회사 | Apparatus and method for recovering nitrogen trifluoride gas from high boiling point material |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4156598A (en) * | 1978-06-08 | 1979-05-29 | Air Products And Chemicals, Inc. | Purification of nitrogen trifluoride atmospheres |
JPH03208806A (en) * | 1990-01-10 | 1991-09-12 | Central Glass Co Ltd | Method for refining gaseous nf3 |
KR920000797A (en) * | 1990-06-25 | 1992-01-29 | 수잔 제인 젠틀 | catalyst |
KR960024340A (en) * | 1994-12-30 | 1996-07-20 | 김만제 | Concentration and quantitative analysis method of hydrogen sulfide in the atmosphere |
KR20010046325A (en) * | 1999-11-11 | 2001-06-15 | 이정국 | Method for purifying paraffin |
KR20020023966A (en) * | 2000-04-28 | 2002-03-29 | 오하시 미츠오 | Method for purification of tetrafluoromethane and use thereof |
-
2002
- 2002-01-08 KR KR1020020000972A patent/KR20030060319A/en not_active Application Discontinuation
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4156598A (en) * | 1978-06-08 | 1979-05-29 | Air Products And Chemicals, Inc. | Purification of nitrogen trifluoride atmospheres |
JPH03208806A (en) * | 1990-01-10 | 1991-09-12 | Central Glass Co Ltd | Method for refining gaseous nf3 |
KR920000797A (en) * | 1990-06-25 | 1992-01-29 | 수잔 제인 젠틀 | catalyst |
KR960024340A (en) * | 1994-12-30 | 1996-07-20 | 김만제 | Concentration and quantitative analysis method of hydrogen sulfide in the atmosphere |
KR20010046325A (en) * | 1999-11-11 | 2001-06-15 | 이정국 | Method for purifying paraffin |
KR20020023966A (en) * | 2000-04-28 | 2002-03-29 | 오하시 미츠오 | Method for purification of tetrafluoromethane and use thereof |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100474965B1 (en) * | 2002-02-14 | 2005-03-08 | 주식회사 효성 | Synthetic Zeolites Prepared By Metal Ion Exchange, Preparation Method Of The Same And Purification Method Of Nitrogen Trifluoride Using The Same |
KR100479165B1 (en) * | 2002-10-01 | 2005-03-25 | 주식회사 효성 | Method for NF3 Purification using Copper-impregnated Zeolite absorbent |
KR100841183B1 (en) * | 2003-09-23 | 2008-06-24 | 주식회사 효성 | Method for NF3 Purification using Zeolite absorbent impregnated with Nickel and Copper |
KR20050054560A (en) * | 2003-12-05 | 2005-06-10 | 주식회사 효성 | Method for refining nitrogen trifluoride gas using synthetic zeolite |
KR101245497B1 (en) * | 2011-10-27 | 2013-03-25 | 오씨아이머티리얼즈 주식회사 | Apparatus and method for recovering nitrogen trifluoride gas from high boiling point material |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US6270557B1 (en) | Process for purifying air by adsorption before cryogenic distillation | |
US6379430B1 (en) | Use of an activated alumina for removing the CO2 from a gas | |
EP2961688B1 (en) | Adsorbent composition for argon purification | |
KR20070116258A (en) | Purification of nitrogen trifluoride | |
ZA200203049B (en) | Zeolite adsorbents, method for obtaining them and their use for removing carbonates from a gas stream. | |
US7022160B2 (en) | Method of purifying gaseous nitrogen trifluoride | |
EP0946410B1 (en) | Process for recovering sulfur hexafluoride | |
EP0284850B1 (en) | Improved adsorptive purification process | |
US6391092B1 (en) | Thermal swing adsorption process for the removal of dinitrogen oxide, hydrocarbons and other trace impurities from air | |
KR20030060319A (en) | a method of purifying nitrogen trifluoride by zeolite mixing | |
JPH02188414A (en) | Method for purifying gaseous nitrogen trifluoride | |
US6406520B1 (en) | Adsorbent having improved selectivity for the separation of gases | |
KR100526337B1 (en) | Method for Refining Nitrogen Trifluoride Gas | |
JP3516716B2 (en) | Purification method of trifluoromethane | |
JPH0340902A (en) | Method for refining gaseous hydride | |
JP2916249B2 (en) | Purification method of nitrogen trifluoride gas | |
KR100841183B1 (en) | Method for NF3 Purification using Zeolite absorbent impregnated with Nickel and Copper | |
JP2931662B2 (en) | Purification method of nitrogen trifluoride gas | |
JP4157328B2 (en) | Membrane separator | |
KR20040060302A (en) | Purification of NF3 Gas using multicomponent adsorbent | |
KR100479165B1 (en) | Method for NF3 Purification using Copper-impregnated Zeolite absorbent | |
JPH0891812A (en) | Purifying method of gaseous nitrogen trifluoride | |
KR100788301B1 (en) | Process for refining nitrogen trifluoride gas using zeolite 3A | |
JP3051185B2 (en) | Purification method of nitrogen trifluoride gas | |
JPH04363109A (en) | Method for concentrating gaseous chlorine |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E601 | Decision to refuse application |