KR20010049554A - 양면점착시트에 고정된 물품의 박리방법 및 박리장치 - Google Patents
양면점착시트에 고정된 물품의 박리방법 및 박리장치 Download PDFInfo
- Publication number
- KR20010049554A KR20010049554A KR1020000033052A KR20000033052A KR20010049554A KR 20010049554 A KR20010049554 A KR 20010049554A KR 1020000033052 A KR1020000033052 A KR 1020000033052A KR 20000033052 A KR20000033052 A KR 20000033052A KR 20010049554 A KR20010049554 A KR 20010049554A
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- KR
- South Korea
- Prior art keywords
- double
- adhesive sheet
- sided adhesive
- article
- peeling
- Prior art date
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- 238000000034 method Methods 0.000 title claims abstract description 24
- 239000004820 Pressure-sensitive adhesive Substances 0.000 title claims description 15
- 239000000853 adhesive Substances 0.000 claims abstract description 92
- 230000001070 adhesive effect Effects 0.000 claims abstract description 92
- 238000010438 heat treatment Methods 0.000 claims abstract description 22
- 238000003475 lamination Methods 0.000 claims abstract description 19
- 230000000694 effects Effects 0.000 claims abstract description 5
- 230000001678 irradiating effect Effects 0.000 claims description 2
- 235000012431 wafers Nutrition 0.000 description 24
- 239000004065 semiconductor Substances 0.000 description 16
- 239000011521 glass Substances 0.000 description 14
- 238000003860 storage Methods 0.000 description 9
- 238000001179 sorption measurement Methods 0.000 description 8
- 230000005484 gravity Effects 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 239000010410 layer Substances 0.000 description 5
- 239000000758 substrate Substances 0.000 description 4
- 239000012790 adhesive layer Substances 0.000 description 3
- 239000002390 adhesive tape Substances 0.000 description 3
- 230000008602 contraction Effects 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 239000000428 dust Substances 0.000 description 2
- 230000001788 irregular Effects 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000005187 foaming Methods 0.000 description 1
- 239000004088 foaming agent Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 230000032258 transport Effects 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67132—Apparatus for placing on an insulating substrate, e.g. tape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/11—Methods of delaminating, per se; i.e., separating at bonding face
- Y10T156/1153—Temperature change for delamination [e.g., heating during delaminating, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/11—Methods of delaminating, per se; i.e., separating at bonding face
- Y10T156/1153—Temperature change for delamination [e.g., heating during delaminating, etc.]
- Y10T156/1158—Electromagnetic radiation applied to work for delamination [e.g., microwave, uv, ir, etc.]
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Folding Of Thin Sheet-Like Materials, Special Discharging Devices, And Others (AREA)
- Laminated Bodies (AREA)
Abstract
Description
Claims (9)
- 가열에 의해 변형되어 박리효과를 발휘하는 양면점착시트에 의해 물품을 지지판에 고정해서 얻어진 적층유닛을 개재 가능하게 배치된 한쌍의 개재수단사이에 적층유닛을 개재하고;가열수단에 의해 적층유닛을 가열하여 상기 양면점착시트가 변형되며,이에 따라 상기 양면점착시트와 상기 물품사이의 접촉면적을 작게 하여 상기 물품을 양면점착시트로부터 분리되도록 하는;단계를 포함하는 양면점착시트에 고정된 물품의 박리방법.
- 제 1 항에 있어서, 상기 한쌍의 개재수단이 제 1 테이블과 제 2 테이블을 포함하는 방법.
- 제 1 항에 있어서, 상기 한쌍의 개재수단이 상기 양면점착시트의 변형을 방해하는 일이 없도록 이간 가능하게 개재되어 있는 것을 특징으로 하는 방법.
- 제 1 항에 있어서, 상기 양면점착시트의 적어도 1면의 점착제가 자외선경화형 점착제를 구성하고, 상기 지지판이 자외선투과성이며;상기 적층유닛을 상기 개재수단으로 개재하기 전에, 자외선을 상기 지지판을 지나게 하여 상기 양면점착시트에 조사해서 자외선경화형 점착제의 점착력을 저하시키는 것을 특징으로 하는 박리방법.
- 가열에 의해 변형되어 박리효과를 발휘하는 양면점착시트로 지지판에 고정된 물품을 박리하기 위한 박리장치이며;개재 가능하게 배치된 한쌍의 개재수단, 및상기 양면점착시트를 변형시키기 위한 가열수단을 포함하는 것을 특징으로 하는 양면점착시트에 고정된 물품의 박리장치.
- 제 5 항에 있어서, 상기 한쌍의 개재수단이 지지판측을 흡착고정하는 제 1 테이블과 물품측을 흡착고정하는 제 2 테이블로 이루어지는 것을 특징으로 하는 물품의 박리장치.
- 제 5 항에 있어서, 상기 한쌍의 개재수단이 상기 양면점착시트의 변형을 방해하는 일이 없도록 이간 가능하게 개재되어 있는 것을 특징으로 하는 물품의 박리장치.
- 제 5 항에 있어서, 상기 양면점착시트에 자외선을 조사하여 상기 양면점착시트의 점착력을 저하시키는 자외선조사장치를 포함하는 것을 특징으로 하는 박리장치.
- 제 5 항에 있어서, 상기 양면점착시트의 잔류물을 제거하는 수단을 포함하는 것을 특징으로 하는 박리장치.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP170925/1999 | 1999-06-17 | ||
JP17092599A JP4275254B2 (ja) | 1999-06-17 | 1999-06-17 | 両面粘着シートに固定された物品の剥離方法および剥離装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20010049554A true KR20010049554A (ko) | 2001-06-15 |
KR100681838B1 KR100681838B1 (ko) | 2007-02-12 |
Family
ID=15913912
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020000033052A KR100681838B1 (ko) | 1999-06-17 | 2000-06-15 | 양면점착시트에 고정된 물품의 박리방법 및 박리장치 |
Country Status (7)
Country | Link |
---|---|
US (1) | US6627037B1 (ko) |
EP (1) | EP1061559B1 (ko) |
JP (1) | JP4275254B2 (ko) |
KR (1) | KR100681838B1 (ko) |
DE (1) | DE60038265T2 (ko) |
MY (1) | MY124017A (ko) |
SG (1) | SG98407A1 (ko) |
Cited By (2)
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---|---|---|---|---|
KR100830111B1 (ko) * | 2001-10-19 | 2008-05-20 | 후지쯔 가부시끼가이샤 | 반도체 기판용 지그 및 그를 이용한 반도체 장치의 제조방법 |
KR100988520B1 (ko) * | 2010-05-06 | 2010-10-20 | 주식회사 세미라인 | 확장장치 및 이를 구비한 칩 분류장치 |
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JP2003218063A (ja) * | 2002-01-24 | 2003-07-31 | Canon Inc | ウエハ貼着用粘着シート及び該シートを利用する加工方法 |
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JP3784202B2 (ja) | 1998-08-26 | 2006-06-07 | リンテック株式会社 | 両面粘着シートおよびその使用方法 |
US6263941B1 (en) * | 1999-08-10 | 2001-07-24 | Silicon Genesis Corporation | Nozzle for cleaving substrates |
-
1999
- 1999-06-17 JP JP17092599A patent/JP4275254B2/ja not_active Expired - Lifetime
-
2000
- 2000-06-15 KR KR1020000033052A patent/KR100681838B1/ko not_active IP Right Cessation
- 2000-06-15 DE DE60038265T patent/DE60038265T2/de not_active Expired - Fee Related
- 2000-06-15 EP EP00305074A patent/EP1061559B1/en not_active Expired - Lifetime
- 2000-06-16 SG SG200003403A patent/SG98407A1/en unknown
- 2000-06-16 MY MYPI20002748 patent/MY124017A/en unknown
- 2000-06-16 US US09/595,809 patent/US6627037B1/en not_active Expired - Fee Related
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100830111B1 (ko) * | 2001-10-19 | 2008-05-20 | 후지쯔 가부시끼가이샤 | 반도체 기판용 지그 및 그를 이용한 반도체 장치의 제조방법 |
US7395847B2 (en) | 2001-10-19 | 2008-07-08 | Fujitsu Limited | Jig for a semiconductor substrate |
US7571538B2 (en) | 2001-10-19 | 2009-08-11 | Fujitsu Microelectronics Limited | Vacuum fixing jig for semiconductor device |
KR100988520B1 (ko) * | 2010-05-06 | 2010-10-20 | 주식회사 세미라인 | 확장장치 및 이를 구비한 칩 분류장치 |
Also Published As
Publication number | Publication date |
---|---|
JP4275254B2 (ja) | 2009-06-10 |
KR100681838B1 (ko) | 2007-02-12 |
EP1061559B1 (en) | 2008-03-12 |
SG98407A1 (en) | 2003-09-19 |
EP1061559A2 (en) | 2000-12-20 |
MY124017A (en) | 2006-06-30 |
US6627037B1 (en) | 2003-09-30 |
DE60038265D1 (de) | 2008-04-24 |
DE60038265T2 (de) | 2009-03-26 |
EP1061559A3 (en) | 2003-01-22 |
JP2001007179A (ja) | 2001-01-12 |
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