KR20000034461A - 펄스발생장치 - Google Patents
펄스발생장치 Download PDFInfo
- Publication number
- KR20000034461A KR20000034461A KR1019980051797A KR19980051797A KR20000034461A KR 20000034461 A KR20000034461 A KR 20000034461A KR 1019980051797 A KR1019980051797 A KR 1019980051797A KR 19980051797 A KR19980051797 A KR 19980051797A KR 20000034461 A KR20000034461 A KR 20000034461A
- Authority
- KR
- South Korea
- Prior art keywords
- pulse
- pulse wave
- mirror
- beam splitter
- generator
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 230000003287 optical effect Effects 0.000 claims abstract description 8
- 238000010298 pulverizing process Methods 0.000 claims abstract description 3
- 238000009416 shuttering Methods 0.000 claims abstract description 3
- 238000001093 holography Methods 0.000 abstract description 3
- 238000010586 diagram Methods 0.000 description 5
- 230000000903 blocking effect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
- G01B9/02007—Two or more frequencies or sources used for interferometric measurement
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/10038—Amplitude control
- H01S3/10046—Pulse repetition rate control
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
Abstract
Description
Claims (2)
- 펄스발생장치에 있어서,연속적인 파형을 갖는 레이져 빔을 발생하는 레이져 발생장치(100);상기 레이져 발생장치(100)로부터 인가된 연속적인 레이져 빔을 소정의 시간간격을 두고 계속해서 셔터링(shuttering)시켜 펄스 스트림(pulse stream)을 생성하는 음향광변조장치(Acousto Optic Modulator : AOM)(102);상기 음향광변조장치(102)로부터 인가되는 펄스 스트림에 있어서 각각의 펄스파에 대해 일부는 투과시키고 일부는 소정의 각도로 반사시켜 2 개의 경로를 갖도록 각각의 펄스파를 분쇄하는 제1빔 스플리터(104);상기 제1빔 스플리터(104)로부터 일부의 반사된 펄스파를 소정의 각도로 전반사시키는 제1미러(106);상기 제1미러(106)로부터 인가된 펄스파를 소정의 광경로차를 갖도록 하는 페브리 페롯(pebri-perot) 간섭계(110);상기 페브리 페롯(pebri-perot) 간섭계(110)로부터 인가된 펄스파를 소정의 각도로 전반사시키는 제2미러(112); 및상기 제1빔 스플리터(104)로부터 인가된 펄스파(Ps)를 통과시키며 그리고 상기 제2미러(112)로부터 인가된 펄스파를 상기 펄스파(Ps)와 동일한 경로로 전반사시키는 제2빔 스플리터(108)를 포함하는 펄스발생장치.
- 제1항에 있어서, 상기 제1빔 스플리터(104), 제1미러(106), 제2미러(112) 및 제2빔 스플리터(108)에서의 각각의 반사각도는 90°임을 특징으로 하는 펄스발생장치.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019980051797A KR20000034461A (ko) | 1998-11-30 | 1998-11-30 | 펄스발생장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019980051797A KR20000034461A (ko) | 1998-11-30 | 1998-11-30 | 펄스발생장치 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR20000034461A true KR20000034461A (ko) | 2000-06-26 |
Family
ID=19560414
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019980051797A Ceased KR20000034461A (ko) | 1998-11-30 | 1998-11-30 | 펄스발생장치 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR20000034461A (ko) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2014089020A1 (en) * | 2012-12-05 | 2014-06-12 | Kla-Tencor Corporation | Semiconductor inspection and metrology system using laser pulse multiplier |
US9525265B2 (en) | 2014-06-20 | 2016-12-20 | Kla-Tencor Corporation | Laser repetition rate multiplier and flat-top beam profile generators using mirrors and/or prisms |
US9793673B2 (en) | 2011-06-13 | 2017-10-17 | Kla-Tencor Corporation | Semiconductor inspection and metrology system using laser pulse multiplier |
US9804101B2 (en) | 2014-03-20 | 2017-10-31 | Kla-Tencor Corporation | System and method for reducing the bandwidth of a laser and an inspection system and method using a laser |
-
1998
- 1998-11-30 KR KR1019980051797A patent/KR20000034461A/ko not_active Ceased
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9793673B2 (en) | 2011-06-13 | 2017-10-17 | Kla-Tencor Corporation | Semiconductor inspection and metrology system using laser pulse multiplier |
US9972959B2 (en) | 2011-06-13 | 2018-05-15 | Kla-Tencor Corporation | Semiconductor inspection and metrology system using laser pulse multiplier |
US10193293B2 (en) | 2011-06-13 | 2019-01-29 | Kla-Tencor Corporation | Semiconductor inspection and metrology system using laser pulse multiplier |
WO2014089020A1 (en) * | 2012-12-05 | 2014-06-12 | Kla-Tencor Corporation | Semiconductor inspection and metrology system using laser pulse multiplier |
US9151940B2 (en) | 2012-12-05 | 2015-10-06 | Kla-Tencor Corporation | Semiconductor inspection and metrology system using laser pulse multiplier |
US9768577B2 (en) | 2012-12-05 | 2017-09-19 | Kla-Tencor Corporation | Semiconductor inspection and metrology system using laser pulse multiplier |
US9804101B2 (en) | 2014-03-20 | 2017-10-31 | Kla-Tencor Corporation | System and method for reducing the bandwidth of a laser and an inspection system and method using a laser |
US10495582B2 (en) | 2014-03-20 | 2019-12-03 | Kla-Tencor Corporation | System and method for reducing the bandwidth of a laser and an inspection system and method using a laser |
US9525265B2 (en) | 2014-06-20 | 2016-12-20 | Kla-Tencor Corporation | Laser repetition rate multiplier and flat-top beam profile generators using mirrors and/or prisms |
US10044164B2 (en) | 2014-06-20 | 2018-08-07 | Kla-Tencor Corporation | Laser repetition rate multiplier and flat-top beam profile generators using mirrors and/or prisms |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 19981130 |
|
PA0201 | Request for examination |
Patent event code: PA02012R01D Patent event date: 19981130 Comment text: Request for Examination of Application |
|
PG1501 | Laying open of application | ||
E902 | Notification of reason for refusal | ||
PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20001031 Patent event code: PE09021S01D |
|
E601 | Decision to refuse application | ||
PE0601 | Decision on rejection of patent |
Patent event date: 20010131 Comment text: Decision to Refuse Application Patent event code: PE06012S01D Patent event date: 20001031 Comment text: Notification of reason for refusal Patent event code: PE06011S01I |