KR19990040283U - Layer alignment mark - Google Patents

Abstract

The present invention relates to a layer alignment mark for aligning an upper layer with a pattern of lower layers having different horizontal and vertical directions in one layer alignment inspection.

The alignment mark of the present invention is formed on the first layer in a state in which an upper layer is formed on a pattern having a structure in which a first layer and a second layer are stacked, and a first mark having two bars in one direction and the second layer. And a second mark formed at two bars in a vertical direction with the first mark, and a third mark formed at the upper layer and having an inner box shape compared to the first and second marks. It is done.

Description

Layer alignment mark

The present invention relates to a layer alignment mark, and more particularly to a layer alignment mark to improve the economic efficiency.

1A is a plan view showing a first mark of a conventional layer alignment mark, FIG. 1B is a plan view showing a second mark of a conventional layer alignment mark, and FIG. 1C is a plan view showing a third mark of a conventional layer alignment mark. .

2A is a plan view showing first and third marks when the first layer of the conventional layer alignment mark and the photosensitive film are aligned, and FIG. 2B is a second planar measure of the alignment between the second layer and the photosensitive film of the conventional layer alignment mark. 2, a plan view showing a third mark.

Layer alignment mark of a conventional box-in-box in a state in which the first photosensitive film 15 is formed on a pattern having a structure in which the first layer 11 and the second layer 13 are stacked. 1A, the first mark 12 in the form of an outer box formed on the first layer 11, as in the first mark 12, as shown in FIG. 1B, the second layer 13. The second mark 14 in the form of an outer box formed in the first photosensitive film 15, as shown in Figure 1c, and compared to the first and second marks 12, 14 in the form of an inner box The third mark 16 is formed.

The alignment method of the first photosensitive film 15 for the pattern using the layer alignment mark of the conventional box-in-box configured as described above is as follows.

As shown in FIG. 2A, the first and third marks 12 and 16 are formed in a state in which the first photosensitive film 15 is formed on a pattern having a structure in which the first layer 11 and the second layer 13 are stacked. Edges of the first and third marks 12 and 16 are compared by an alignment checker (not shown), that is, the first and third marks 12 and 16 are compared. Since the relative position difference between the first layer 11 and the first photosensitive film 15 is found, the relative position difference between the first layer 11 and the first photosensitive film 15 is found.

As shown in FIG. 2B, the edges of the second and third marks 14 and 16 are detected, and each of the second and third marks 14 and 16 is detected by an alignment checker (not shown). By comparing the center position, that is, by measuring the relative position difference between the second and third marks 14 and 16, the difference between the alignment positions of the second layer 13 and the first photosensitive film 15 is found.

At this time, if the first photoresist film 15 is not aligned with the pattern, the first photoresist film 15 is removed and a second photoresist film (not shown) aligned with the pattern is again formed on the pattern by the measurement result. Form.

However, the layer alignment mark of the conventional box-in-box has the following problems because the alignment mark of the box shape is formed in each layer so that the degree of layer alignment is measured only in one direction.

First, since the horizontal and vertical directions should be measured when the first and second layers having different horizontal and vertical directions are stacked and the photosensitive film is aligned, that is, the first and second layers and the second and Two layer alignment checks are required.

Second, since the first and second layers and the photoresist may not be aligned at the same time, the degree of alignment between the first and second layers in one direction may not be known.

An object of the present invention is to provide a layer alignment mark for aligning a pattern and an upper layer of lower layers having different horizontal and vertical directions by one layer alignment inspection.

1A is a plan view showing a first mark of a conventional layer alignment mark

1B is a plan view showing a second mark of a conventional layer alignment mark

1C is a plan view showing a third mark of a conventional layer alignment mark

2A is a plan view showing first and third marks when measuring alignment of a first layer and a photosensitive film of a conventional layer alignment mark;

FIG. 2B is a plan view illustrating second and third marks when measuring alignment of a second layer and a photosensitive film of a conventional layer alignment mark; FIG.

3A and 3B are plan views showing first marks of alignment marks according to an embodiment of the present invention.

3C and 3D are plan views illustrating second marks of alignment marks according to an embodiment of the present invention.

Figure 3e is a plan view showing a third mark of the alignment mark in accordance with an embodiment of the present invention

4A is a plan view illustrating first, second, and third marks when measuring alignment of the first and second layers of the alignment mark and the photosensitive film according to an embodiment of the present invention;

4B is a plan view illustrating first, second, and third marks in the alignment measurement of the first and second layers and the photosensitive film in the horizontal direction of the alignment mark according to an embodiment of the present invention;

Explanation of symbols for main parts of the drawings

31: first layer 32: first mark

33: second layer 34: second mark

35: first photosensitive film 36: third mark

The alignment mark of the present invention is formed on the first layer in a state in which an upper layer is formed on a pattern having a structure in which a first layer and a second layer are stacked, and a first mark having two bars in one direction and the second layer. And a second mark formed at two bars in a vertical direction with the first mark, and a third mark formed at the upper layer and having an inner box shape compared to the first and second marks. It is done.

Referring to the accompanying drawings, preferred embodiments of the layer alignment mark according to the present invention as described above in detail as follows.

3A and 3B are plan views illustrating first marks of alignment marks according to embodiments of the present invention, and FIGS. 3C and 3D are plan views illustrating second marks of alignment marks according to embodiments of the present invention and FIG. 3E. Is a plan view showing a third mark of the alignment mark according to an embodiment of the present invention.

And, Figure 4a is a plan view showing the first, second, third marks in the alignment measurement of the first, second layer and the photosensitive film of the alignment mark according to an embodiment of the present invention, Figure 4b is an embodiment of the present invention Fig. 1 is a plan view showing first, second and third marks in the alignment measurement of the first and second layers in the transverse direction of the alignment mark and the photosensitive film.

In the state in which the first photosensitive film 35 is formed on a pattern having a structure in which the first layer 31 and the second layer 33 are stacked, the layer alignment mark according to the embodiment of the present invention is as shown in FIG. A first mark 32 formed in one layer 31 and having two bars on the left and right sides, as shown in FIG. 3C, a second mark formed in the second layer 33 and having two bars on the top and bottom. 3, and as shown in FIG. 3E, it is formed in the first photosensitive film 35 and is formed of a third mark 36 in the form of an inner box compared with the first and second marks 32 and 34. FIG.

Here, the first and second marks 32 and 34 have a width of 1 to 5 μm.

Even if the first and second marks 32 and 34 are formed in a lozenge instead of a bar, the same result is obtained. The same result is obtained even if the third mark 36 is formed in a bar shape instead of a box shape. The first layer 31, the first mark 32, the second layer 33, the second mark 34, and the first photoresist film 35 are obtained. The third mark (36)

The alignment method of the first photosensitive film 35 with respect to the pattern using the layer alignment mark according to the embodiment of the present invention configured as described above is as follows.

In the state where the first photosensitive film 35 is formed on a pattern having a structure in which the first layer 31 and the second layer 33 are stacked, as shown in FIG. 4A, the left and right sides of the first mark 32 are formed. Two bars, two bars above and below the second mark 34, and an edge of the third mark 36 to detect the edges of the first, second and third by an alignment checker (not shown). Since the central positions of the marks 32, 34 and 36 are compared at the same time, that is, the relative position difference between the first, second and third marks 32, 34 and 36 is simultaneously measured. 31, 33 and the alignment position difference between the first photosensitive film 35 is found.

At this time, if the first photoresist film 35 is not aligned with the pattern, the first photoresist film 35 is removed and a second photoresist film (not shown) aligned with the pattern is again formed on the pattern by the measurement result. Form.

In addition, the first mark 32 is formed in the first layer 31 in the form of two bars on the left side and the upper side as in FIG. 3B, and the second mark 34 is formed in FIG. 3D. The first and second layers 31 and 33 and the photoresist film 35 are simultaneously aligned and inspected in the horizontal direction in the form of two bars on the right and the bottom thereof. same.

As shown in FIG. 4B, the bar on the left side of the first mark 32 and the bar on the right side of the second mark 34 and the edge of the third mark 36 are detected and placed in an alignment checker (not shown). By comparing the horizontal position of the first, second, third marks (32, 34, 36) at the same time, that is, the relative position difference of the first, second, third marks (32, 34, 36) at the same time As a result of the measurement, a difference in the alignment position of the first and second layers 31 and 33 and the first photosensitive layer 35 in the horizontal direction is found.

In the layer alignment mark of the present invention, a first mark having two bars in the form of left and right or left and top is formed on a first layer in a state in which a photosensitive film is formed on a pattern having a structure in which a first layer and a second layer are stacked. And a second mark in the form of two bars on the second layer above and below or to the right and below are formed as follows.

First, two bars on the left and right sides of the first mark, two bars on the top and bottom of the second mark, and the photoresist layer when the first and second layers having different horizontal and vertical directions are stacked and the photoresist layer is aligned. Since edges of the third mark are detected and the relative positional differences of the first, second and third marks are simultaneously measured, the first, second layer and the photoresist are simultaneously aligned by one layer alignment inspection to improve economic efficiency.

Second, when aligning in one direction, the bars of the first mark corresponding to the one direction and the bars of the second mark and the edges of the third mark are detected to compare the position of each one direction of the first, second, and third marks simultaneously. The degree of alignment between the first and second layers can be known.

Claims (9)

In a state where an upper layer is formed on a pattern having a structure in which a first layer and a second layer are stacked A first mark formed on the first layer and having two bar shapes in one direction; A second mark formed in the second layer and having two bar shapes perpendicular to the first mark; And a third mark formed on the upper layer and including a third mark in an inner box form compared to the first and second marks. The method of claim 1, Layer alignment mark, characterized in that the width of the first and second marks 1 ~ 5㎛. The method of claim 1, And the first and second marks are rhombic. The method of claim 1, And the third mark is bar-shaped. In a state where an upper layer is formed on a pattern having a structure in which a first layer and a second layer are stacked A first mark formed in the first layer in a bar shape in a horizontal direction and a vertical direction, respectively; A second mark formed in the second layer in the form of two bars parallel to each bar of the first mark; And a third mark formed on the upper layer and including a third mark in an inner box form compared to the first and second marks. The method of claim 5, And the first mark is formed on the first layer in the form of two bars on the left side and the top, and the second mark is formed on the second layer in the form of two bars on the right side and on the bottom. The method of claim 5, Layer alignment mark, characterized in that the width of the first and second marks 1 ~ 5㎛. The method of claim 5, And the first and second marks are rhombic. The method of claim 5, And the third mark is bar-shaped.