KR19990015037A - 클로로하이드로실란 유도체 및 이의 제조방법 - Google Patents
클로로하이드로실란 유도체 및 이의 제조방법 Download PDFInfo
- Publication number
- KR19990015037A KR19990015037A KR1019970036920A KR19970036920A KR19990015037A KR 19990015037 A KR19990015037 A KR 19990015037A KR 1019970036920 A KR1019970036920 A KR 1019970036920A KR 19970036920 A KR19970036920 A KR 19970036920A KR 19990015037 A KR19990015037 A KR 19990015037A
- Authority
- KR
- South Korea
- Prior art keywords
- alkyl group
- chlorophenyl
- bonds
- silahexane
- sich
- Prior art date
Links
- 238000002360 preparation method Methods 0.000 title abstract 2
- -1 lithium aluminum hydride Chemical compound 0.000 claims abstract description 40
- 239000012280 lithium aluminium hydride Substances 0.000 claims abstract description 27
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 18
- 150000001875 compounds Chemical class 0.000 claims abstract description 14
- 239000005046 Chlorosilane Substances 0.000 claims abstract description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 6
- 125000003118 aryl group Chemical group 0.000 claims abstract description 6
- 125000005842 heteroatom Chemical group 0.000 claims abstract description 6
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 5
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 5
- 125000001309 chloro group Chemical group Cl* 0.000 claims abstract description 4
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical class Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 claims abstract description 4
- SLLGVCUQYRMELA-UHFFFAOYSA-N chlorosilicon Chemical compound Cl[Si] SLLGVCUQYRMELA-UHFFFAOYSA-N 0.000 claims abstract description 4
- 125000000319 biphenyl-4-yl group Chemical group [H]C1=C([H])C([H])=C([H])C([H])=C1C1=C([H])C([H])=C([*])C([H])=C1[H] 0.000 claims description 24
- 238000000034 method Methods 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 2
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 claims 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 claims 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 claims 1
- 229910052739 hydrogen Inorganic materials 0.000 abstract description 7
- 150000003961 organosilicon compounds Chemical class 0.000 abstract description 6
- 150000002894 organic compounds Chemical class 0.000 abstract description 3
- 230000007062 hydrolysis Effects 0.000 abstract description 2
- 238000006460 hydrolysis reaction Methods 0.000 abstract description 2
- GVNVAWHJIKLAGL-UHFFFAOYSA-N 2-(cyclohexen-1-yl)cyclohexan-1-one Chemical compound O=C1CCCCC1C1=CCCCC1 GVNVAWHJIKLAGL-UHFFFAOYSA-N 0.000 description 32
- 101150065749 Churc1 gene Proteins 0.000 description 32
- 102100038239 Protein Churchill Human genes 0.000 description 32
- 239000000203 mixture Substances 0.000 description 25
- 238000005160 1H NMR spectroscopy Methods 0.000 description 17
- 238000006243 chemical reaction Methods 0.000 description 15
- 238000001577 simple distillation Methods 0.000 description 11
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 10
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 7
- 238000003756 stirring Methods 0.000 description 6
- 125000004182 2-chlorophenyl group Chemical group [H]C1=C([H])C(Cl)=C(*)C([H])=C1[H] 0.000 description 4
- 239000003054 catalyst Substances 0.000 description 4
- 238000004817 gas chromatography Methods 0.000 description 4
- 239000001257 hydrogen Substances 0.000 description 4
- 125000003854 p-chlorophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1Cl 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- FORVAAWGASBSLO-UHFFFAOYSA-N C1=CC=C2C([SiH2]C(Cl)Cl)C3=CC=CC=C3C2=C1 Chemical compound C1=CC=C2C([SiH2]C(Cl)Cl)C3=CC=CC=C3C2=C1 FORVAAWGASBSLO-UHFFFAOYSA-N 0.000 description 3
- LHZVRVVFJAPHFY-UHFFFAOYSA-N CCCCCCC(Cl)(Cl)[SiH2]C(C)c1ccccc1Cl Chemical compound CCCCCCC(Cl)(Cl)[SiH2]C(C)c1ccccc1Cl LHZVRVVFJAPHFY-UHFFFAOYSA-N 0.000 description 3
- 125000000068 chlorophenyl group Chemical group 0.000 description 3
- FWWSSSOCTWGHSF-UHFFFAOYSA-N dichloro-(2-phenylethyl)-(2-phenylpropyl)silane Chemical compound C=1C=CC=CC=1C(C)C[Si](Cl)(Cl)CCC1=CC=CC=C1 FWWSSSOCTWGHSF-UHFFFAOYSA-N 0.000 description 3
- IAQJEEQKAMPCOT-UHFFFAOYSA-N dichloro-hexyl-(2-phenylpropyl)silane Chemical compound CCCCCC[Si](Cl)(Cl)CC(C)C1=CC=CC=C1 IAQJEEQKAMPCOT-UHFFFAOYSA-N 0.000 description 3
- 150000002431 hydrogen Chemical class 0.000 description 3
- 239000011541 reaction mixture Substances 0.000 description 3
- 229910000077 silane Inorganic materials 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
- 239000010935 stainless steel Substances 0.000 description 3
- SIPHWXREAZVVNS-UHFFFAOYSA-N trichloro(cyclohexyl)silane Chemical compound Cl[Si](Cl)(Cl)C1CCCCC1 SIPHWXREAZVVNS-UHFFFAOYSA-N 0.000 description 3
- ZOYFEXPFPVDYIS-UHFFFAOYSA-N trichloro(ethyl)silane Chemical compound CC[Si](Cl)(Cl)Cl ZOYFEXPFPVDYIS-UHFFFAOYSA-N 0.000 description 3
- 125000004179 3-chlorophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C(Cl)=C1[H] 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- GZMOUGPEZGUZCB-UHFFFAOYSA-N C=1C=CC=C(Cl)C=1C(C)C[SiH](Cl)C1CCCC1 Chemical compound C=1C=CC=C(Cl)C=1C(C)C[SiH](Cl)C1CCCC1 GZMOUGPEZGUZCB-UHFFFAOYSA-N 0.000 description 2
- APFNRTGPAURHFZ-UHFFFAOYSA-N C=1C=CC=C(Cl)C=1C(C)C[SiH](Cl)CCC1CCCCC1 Chemical compound C=1C=CC=C(Cl)C=1C(C)C[SiH](Cl)CCC1CCCCC1 APFNRTGPAURHFZ-UHFFFAOYSA-N 0.000 description 2
- BNBMSHKPWDQTFU-UHFFFAOYSA-N C=1C=CC=CC=1C(C)C[SiH](Cl)CCC1=CC=CC=C1Cl Chemical compound C=1C=CC=CC=1C(C)C[SiH](Cl)CCC1=CC=CC=C1Cl BNBMSHKPWDQTFU-UHFFFAOYSA-N 0.000 description 2
- FMGUGHCMJQTLTJ-UHFFFAOYSA-N CCCCCCC(Cl)[SiH2]C(C)C1=CC=CC=C1Cl Chemical compound CCCCCCC(Cl)[SiH2]C(C)C1=CC=CC=C1Cl FMGUGHCMJQTLTJ-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 229910010082 LiAlH Inorganic materials 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 150000001343 alkyl silanes Chemical class 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- YLZHFSNCIAIRBC-UHFFFAOYSA-N chloro-(2-cyclohexylethyl)-(2-phenylpropyl)silane Chemical compound C=1C=CC=CC=1C(C)C[SiH](Cl)CCC1CCCCC1 YLZHFSNCIAIRBC-UHFFFAOYSA-N 0.000 description 2
- CFVMSUGXLJABLI-UHFFFAOYSA-N chloro-(2-phenylethyl)-(2-phenylpropyl)silane Chemical compound C=1C=CC=CC=1C(C)C[SiH](Cl)CCC1=CC=CC=C1 CFVMSUGXLJABLI-UHFFFAOYSA-N 0.000 description 2
- WWLYQHHQUZWPND-UHFFFAOYSA-N chloro-cyclopentyl-(2-phenylpropyl)silane Chemical compound C=1C=CC=CC=1C(C)C[SiH](Cl)C1CCCC1 WWLYQHHQUZWPND-UHFFFAOYSA-N 0.000 description 2
- HYKJMXIBBJHONN-UHFFFAOYSA-N chloro-hexyl-(2-phenylpropyl)silane Chemical compound CCCCCC[SiH](Cl)CC(C)C1=CC=CC=C1 HYKJMXIBBJHONN-UHFFFAOYSA-N 0.000 description 2
- BYLOHCRAPOSXLY-UHFFFAOYSA-N dichloro(diethyl)silane Chemical compound CC[Si](Cl)(Cl)CC BYLOHCRAPOSXLY-UHFFFAOYSA-N 0.000 description 2
- DEGYAQVKVIRYDP-UHFFFAOYSA-N dichloro-(2-cyclohexylethyl)-(2-phenylpropyl)silane Chemical compound C=1C=CC=CC=1C(C)C[Si](Cl)(Cl)CCC1CCCCC1 DEGYAQVKVIRYDP-UHFFFAOYSA-N 0.000 description 2
- QDIZRKXWPNDXBS-UHFFFAOYSA-N dichloro-[2-(2-chlorophenyl)ethyl]-(2-phenylpropyl)silane Chemical compound C=1C=CC=CC=1C(C)C[Si](Cl)(Cl)CCC1=CC=CC=C1Cl QDIZRKXWPNDXBS-UHFFFAOYSA-N 0.000 description 2
- SDRYRRMWVPUGGQ-UHFFFAOYSA-N dichloro-[2-(2-chlorophenyl)propyl]-(2-cyclohexylethyl)silane Chemical compound C=1C=CC=C(Cl)C=1C(C)C[Si](Cl)(Cl)CCC1CCCCC1 SDRYRRMWVPUGGQ-UHFFFAOYSA-N 0.000 description 2
- BLKUDAYGWBFNKR-UHFFFAOYSA-N dichloro-[2-(2-chlorophenyl)propyl]-cyclopentylsilane Chemical compound C=1C=CC=C(Cl)C=1C(C)C[Si](Cl)(Cl)C1CCCC1 BLKUDAYGWBFNKR-UHFFFAOYSA-N 0.000 description 2
- QCZGOQUZEWRMAV-UHFFFAOYSA-N dichloro-cyclopentyl-(2-phenylpropyl)silane Chemical compound C=1C=CC=CC=1C(C)C[Si](Cl)(Cl)C1CCCC1 QCZGOQUZEWRMAV-UHFFFAOYSA-N 0.000 description 2
- 239000000706 filtrate Substances 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 150000003377 silicon compounds Chemical class 0.000 description 2
- AQRLNPVMDITEJU-UHFFFAOYSA-N triethylsilane Chemical compound CC[SiH](CC)CC AQRLNPVMDITEJU-UHFFFAOYSA-N 0.000 description 2
- XPRFJTXTBVDXAM-UHFFFAOYSA-N 1-chloroheptyl-[1-(4-chlorophenyl)ethyl]silane Chemical compound CCCCCCC(Cl)[SiH2]C(C)C1=CC=C(Cl)C=C1 XPRFJTXTBVDXAM-UHFFFAOYSA-N 0.000 description 1
- MAYUMUDTQDNZBD-UHFFFAOYSA-N 2-chloroethylsilane Chemical compound [SiH3]CCCl MAYUMUDTQDNZBD-UHFFFAOYSA-N 0.000 description 1
- VIYRPMHYMNETSQ-UHFFFAOYSA-N 2-cyclohexylethyl(2-phenylpropyl)silane Chemical compound C=1C=CC=CC=1C(C)C[SiH2]CCC1CCCCC1 VIYRPMHYMNETSQ-UHFFFAOYSA-N 0.000 description 1
- JIQICEBBZGLDTN-UHFFFAOYSA-N 2-phenylethyl(2-phenylpropyl)silane Chemical compound C=1C=CC=CC=1C(C)C[SiH2]CCC1=CC=CC=C1 JIQICEBBZGLDTN-UHFFFAOYSA-N 0.000 description 1
- CSDQQAQKBAQLLE-UHFFFAOYSA-N 4-(4-chlorophenyl)-4,5,6,7-tetrahydrothieno[3,2-c]pyridine Chemical compound C1=CC(Cl)=CC=C1C1C(C=CS2)=C2CCN1 CSDQQAQKBAQLLE-UHFFFAOYSA-N 0.000 description 1
- QBJFVRSNAVWIHS-UHFFFAOYSA-N C1=CC=C2C([SiH2]C)C3=CC=CC=C3C2=C1 Chemical compound C1=CC=C2C([SiH2]C)C3=CC=CC=C3C2=C1 QBJFVRSNAVWIHS-UHFFFAOYSA-N 0.000 description 1
- GJZRFNIDDNJWPJ-UHFFFAOYSA-N C=1C=C(Cl)C=CC=1C(C)C[SiH](Cl)C1CCCC1 Chemical compound C=1C=C(Cl)C=CC=1C(C)C[SiH](Cl)C1CCCC1 GJZRFNIDDNJWPJ-UHFFFAOYSA-N 0.000 description 1
- OVNNMVWJXMYCOJ-UHFFFAOYSA-N CC(C[SiH2]CCC1CCCCC1)c1ccccc1Cl Chemical compound CC(C[SiH2]CCC1CCCCC1)c1ccccc1Cl OVNNMVWJXMYCOJ-UHFFFAOYSA-N 0.000 description 1
- JFMPLCVKRAWBEX-UHFFFAOYSA-N CC(C[SiH2]CCc1ccccc1Cl)c1ccccc1 Chemical compound CC(C[SiH2]CCc1ccccc1Cl)c1ccccc1 JFMPLCVKRAWBEX-UHFFFAOYSA-N 0.000 description 1
- CUHJMAAPPUFPQH-UHFFFAOYSA-N CCC[SiH2]CCC1=CC=CC=C1 Chemical compound CCC[SiH2]CCC1=CC=CC=C1 CUHJMAAPPUFPQH-UHFFFAOYSA-N 0.000 description 1
- LCEKKYDTJGEEQM-UHFFFAOYSA-N ClC1=C(C=CC=C1)C(C)[SiH2]CCCCCCC Chemical compound ClC1=C(C=CC=C1)C(C)[SiH2]CCCCCCC LCEKKYDTJGEEQM-UHFFFAOYSA-N 0.000 description 1
- LMLYZYSLIAYMPG-UHFFFAOYSA-N ClC1=C(C=CC=C1)C(C[SiH2]C1CCCC1)C Chemical compound ClC1=C(C=CC=C1)C(C[SiH2]C1CCCC1)C LMLYZYSLIAYMPG-UHFFFAOYSA-N 0.000 description 1
- CCCJMBYLSGASJV-UHFFFAOYSA-N Cl[SiH2]C1CCCCC1 Chemical compound Cl[SiH2]C1CCCCC1 CCCJMBYLSGASJV-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical group [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910010238 LiAlCl 4 Inorganic materials 0.000 description 1
- 238000005481 NMR spectroscopy Methods 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 239000007809 chemical reaction catalyst Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- SOYVLBDERBHIME-UHFFFAOYSA-N chloro(diethyl)silicon Chemical compound CC[Si](Cl)CC SOYVLBDERBHIME-UHFFFAOYSA-N 0.000 description 1
- YGZSVWMBUCGDCV-UHFFFAOYSA-N chloro(methyl)silane Chemical compound C[SiH2]Cl YGZSVWMBUCGDCV-UHFFFAOYSA-N 0.000 description 1
- GTPDFCLBTFKHNH-UHFFFAOYSA-N chloro(phenyl)silicon Chemical compound Cl[Si]C1=CC=CC=C1 GTPDFCLBTFKHNH-UHFFFAOYSA-N 0.000 description 1
- LQQXBDCOSBDLOH-UHFFFAOYSA-N chloro-[2-(4-chlorophenyl)ethyl]-(2-phenylpropyl)silane Chemical compound C=1C=CC=CC=1C(C)C[SiH](Cl)CCC1=CC=C(Cl)C=C1 LQQXBDCOSBDLOH-UHFFFAOYSA-N 0.000 description 1
- FNTORCORUUTQFM-UHFFFAOYSA-N chloro-[2-(4-chlorophenyl)propyl]-(2-cyclohexylethyl)silane Chemical compound C=1C=C(Cl)C=CC=1C(C)C[SiH](Cl)CCC1CCCCC1 FNTORCORUUTQFM-UHFFFAOYSA-N 0.000 description 1
- LHJVQWVCXSQJFW-UHFFFAOYSA-N cyclopentyl(2-phenylpropyl)silane Chemical compound C=1C=CC=CC=1C(C)C[SiH2]C1CCCC1 LHJVQWVCXSQJFW-UHFFFAOYSA-N 0.000 description 1
- YUKZTICWNSSDIL-UHFFFAOYSA-N dichloro(cyclohexyl)silane Chemical compound Cl[SiH](Cl)C1CCCCC1 YUKZTICWNSSDIL-UHFFFAOYSA-N 0.000 description 1
- PFMKUUJQLUQKHT-UHFFFAOYSA-N dichloro(ethyl)silicon Chemical compound CC[Si](Cl)Cl PFMKUUJQLUQKHT-UHFFFAOYSA-N 0.000 description 1
- WWIYQMSHBIFAJB-UHFFFAOYSA-N dichloro-(2-phenylethyl)-propylsilane Chemical compound CCC[Si](Cl)(Cl)CCC1=CC=CC=C1 WWIYQMSHBIFAJB-UHFFFAOYSA-N 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- KCWYOFZQRFCIIE-UHFFFAOYSA-N ethylsilane Chemical compound CC[SiH3] KCWYOFZQRFCIIE-UHFFFAOYSA-N 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000002290 gas chromatography-mass spectrometry Methods 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical group 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000005984 hydrogenation reaction Methods 0.000 description 1
- 239000000543 intermediate Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 239000012454 non-polar solvent Substances 0.000 description 1
- 230000000269 nucleophilic effect Effects 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- XHXFXVLFKHQFAL-UHFFFAOYSA-N phosphoryl trichloride Chemical compound ClP(Cl)(Cl)=O XHXFXVLFKHQFAL-UHFFFAOYSA-N 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 description 1
- 238000005475 siliconizing Methods 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- KVENDAGPVNAYLY-UHFFFAOYSA-N tribromo(ethyl)silane Chemical compound CC[Si](Br)(Br)Br KVENDAGPVNAYLY-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/12—Organo silicon halides
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
Abstract
Description
Claims (3)
- 다음 일반식(Ⅰ)로 표시되는 클로로하이드로실란 유도체.R1R2SiHCl(Ⅰ)일반식(Ⅰ)에서 R1이 2-페닐프로필, 2-(클로로페닐)프로필, 2-(4-비페닐)프로필 또는 (9-플루오렌)이며, R2가 노르말헥실, 시클로펜틸, 2-페닐에틸, 2-시클로헥실에틸 또는 메틸을 표시한다.
- 일반식(Ⅱ)의 클로로실란을 리튬알루미늄하이드라이드와 반응시켜 일반식(Ⅰ)의 클로로하이드로실란으로 부분환원시키는 것을 특징으로하는 제조방법.R1R2SiCl2R1R2SiHCl(Ⅱ)(Ⅰ)일반식(Ⅰ) 또는 일반식(Ⅱ)에 있어서, R1은 탄소가 1에서 30까지의 알킬기, 가지 달린 알킬기, 고리를 포함한 알킬기로서, 방향족기 또는 탄소가 아닌 헤테로 원자를 포함할 수 있으며, R2는 클로로, 탄소가 1에서 30까지의 알킬기, 가지 달린 알킬기, 고리를 포함한 알킬기로서, 방향족기 또는 탄소가 아닌 헤테로 원자를 포함할 수 있다.
- 제 2 항에 있어서, 리튬알루미늄하이드라이드를 일반식(Ⅱ)의 화합물에 대하여 20 ~ 80 몰%를 사용하는 것이 특징인 제조방법.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019970036920A KR100236609B1 (ko) | 1997-08-01 | 1997-08-01 | 클로로하이드로실란 유도체 및 이의 제조방법 |
US09/112,590 US5965762A (en) | 1997-08-01 | 1998-07-09 | Chlorohydrosilane derivatives and their preparation method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019970036920A KR100236609B1 (ko) | 1997-08-01 | 1997-08-01 | 클로로하이드로실란 유도체 및 이의 제조방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR19990015037A true KR19990015037A (ko) | 1999-03-05 |
KR100236609B1 KR100236609B1 (ko) | 2000-02-01 |
Family
ID=19516705
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019970036920A KR100236609B1 (ko) | 1997-08-01 | 1997-08-01 | 클로로하이드로실란 유도체 및 이의 제조방법 |
Country Status (2)
Country | Link |
---|---|
US (1) | US5965762A (ko) |
KR (1) | KR100236609B1 (ko) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103864934A (zh) * | 2003-03-24 | 2014-06-18 | 津莫吉尼蒂克斯公司 | 抗il-22ra抗体和结合伴侣以及在炎症中的使用方法 |
ATE508985T1 (de) | 2007-03-30 | 2011-05-15 | Spawnt Private Sarl | Katalytische hydrierung |
CN102174188B (zh) * | 2008-07-08 | 2014-11-26 | 株式会社钟化 | 含反应性硅基团的聚合物 |
US11261202B2 (en) | 2017-04-07 | 2022-03-01 | L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude | Catalytic reduction of halogenated carbosilanes and halogenated carbodisilanes |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4097511A (en) * | 1967-12-20 | 1978-06-27 | General Electric Company | Organofunctional-silicon materials |
US5386050A (en) * | 1994-01-03 | 1995-01-31 | Korea Institute Of Science And Technology | (2-arylpropyl)alkylsilanes and their preparation methods |
US5527938A (en) * | 1994-07-19 | 1996-06-18 | Korea Institute Of Science And Technology | (2-arylpropyl)silanes and preparation methods thereof |
KR0139089B1 (ko) * | 1994-12-08 | 1998-05-01 | 김은영 | 올레핀의 중합반응용 촉매계 |
DE4442753C2 (de) * | 1994-12-01 | 2002-04-25 | Degussa | Verfahren zur Herstellung von Alkylhydrogenchlorsilane |
-
1997
- 1997-08-01 KR KR1019970036920A patent/KR100236609B1/ko not_active IP Right Cessation
-
1998
- 1998-07-09 US US09/112,590 patent/US5965762A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US5965762A (en) | 1999-10-12 |
KR100236609B1 (ko) | 2000-02-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4276424A (en) | Methods for the production of organic polysilanes | |
US5233071A (en) | Hydrosilation of fluorinated olefins with cobalt catalysts | |
JP3651572B2 (ja) | 部分付加環状オルガノハイドロジェンシロキサンの製造方法 | |
US6984747B2 (en) | Method for preparing styryl-functionalized silanes | |
EP0459499B1 (en) | Process for preparing silacycloalkanes | |
Stork et al. | An efficient synthesis of alkenyl and alkynyl silyl ethers | |
JPH11508561A (ja) | 網状組織材料の前駆体である分子状およびオリゴマー状のシラン | |
JPH06199874A (ja) | メチルクロルシラン合成時に生じる生成混合物から珪素に直接結合した水素原子を有するシランを除去する方法 | |
KR19990015037A (ko) | 클로로하이드로실란 유도체 및 이의 제조방법 | |
JP2530391B2 (ja) | 立体的に遮蔽されたアミノヒドロカルビルシラン類および製造方法 | |
JP2003532734A (ja) | 第二級アミノイソブチルアルコキシシラン類の調製 | |
JP3555646B2 (ja) | アクリロキシ基又はメタクリロキシ基含有クロロシランの製造方法 | |
Ishikawa et al. | Silicon-carbon unsaturated compounds. 33. Regiochemistry in the photochemical formation of silenes from 1, 2, 2, 2-tetramethyl-, 1, 1, 2, 2-tetramethyl-, and 2-ethyl-1, 2, 2-trimethylphenylvinyldisilane | |
KR20050062774A (ko) | 유기 관능성 실란의 제조방법 | |
JP2000044581A (ja) | 第3級ヒドロカルビルシリル化合物の製造方法 | |
JPH0786117B2 (ja) | アルコキシシラン | |
JP2793008B2 (ja) | ヘキサメチルシクロトリシラザンの製造方法 | |
FR2569701A1 (fr) | Procede de silylation | |
JP2002193976A (ja) | N−置換−3−シリルプロピルアミン類及びその誘導体の製造方法 | |
JP2541060B2 (ja) | 有機ケイ素化合物の製造方法 | |
JP2012107011A (ja) | アルコキシ置換された1,2−ビス−シリル−エタンの製造法 | |
JP2864985B2 (ja) | トリ(第2級アルキル)シラン化合物の製造方法 | |
JP2610519B2 (ja) | α,ω‐ジクロロオルガノポリシロキサンの製造法 | |
JPH0625263A (ja) | 1−アザ−2−シラシクロブタン化合物及びその製造法 | |
Poeschl et al. | Synthesis and Isomerism of Monofunctional Arylated Cyclotetrasilanes |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 19970801 |
|
PA0201 | Request for examination |
Patent event code: PA02012R01D Patent event date: 19970801 Comment text: Request for Examination of Application |
|
PG1501 | Laying open of application | ||
E701 | Decision to grant or registration of patent right | ||
PE0701 | Decision of registration |
Patent event code: PE07011S01D Comment text: Decision to Grant Registration Patent event date: 19990630 |
|
N231 | Notification of change of applicant | ||
PN2301 | Change of applicant |
Patent event date: 19991001 Comment text: Notification of Change of Applicant Patent event code: PN23011R01D |
|
GRNT | Written decision to grant | ||
PR0701 | Registration of establishment |
Comment text: Registration of Establishment Patent event date: 19991002 Patent event code: PR07011E01D |
|
PR1002 | Payment of registration fee |
Payment date: 19991002 End annual number: 3 Start annual number: 1 |
|
PG1601 | Publication of registration | ||
PR1001 | Payment of annual fee |
Payment date: 20020813 Start annual number: 4 End annual number: 4 |
|
PR1001 | Payment of annual fee |
Payment date: 20030730 Start annual number: 5 End annual number: 5 |
|
FPAY | Annual fee payment |
Payment date: 20040910 Year of fee payment: 6 |
|
PR1001 | Payment of annual fee |
Payment date: 20040910 Start annual number: 6 End annual number: 6 |
|
LAPS | Lapse due to unpaid annual fee | ||
PC1903 | Unpaid annual fee |