KR19990000269A - Method for producing polyhydroxy styrene derivative - Google Patents
Method for producing polyhydroxy styrene derivative Download PDFInfo
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- KR19990000269A KR19990000269A KR1019970023051A KR19970023051A KR19990000269A KR 19990000269 A KR19990000269 A KR 19990000269A KR 1019970023051 A KR1019970023051 A KR 1019970023051A KR 19970023051 A KR19970023051 A KR 19970023051A KR 19990000269 A KR19990000269 A KR 19990000269A
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- Prior art keywords
- polyhydroxystyrene
- group
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- carbon atoms
- ester
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 10
- 125000003011 styrenyl group Chemical class [H]\C(*)=C(/[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 title 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims abstract description 30
- 150000002148 esters Chemical class 0.000 claims abstract description 19
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 8
- 238000000034 method Methods 0.000 claims description 19
- 125000004432 carbon atom Chemical group C* 0.000 claims description 16
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 15
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 13
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims description 11
- 239000003153 chemical reaction reagent Substances 0.000 claims description 11
- 239000003513 alkali Substances 0.000 claims description 10
- 239000000203 mixture Substances 0.000 claims description 10
- 150000001875 compounds Chemical class 0.000 claims description 8
- DYHSDKLCOJIUFX-UHFFFAOYSA-N tert-butoxycarbonyl anhydride Chemical group CC(C)(C)OC(=O)OC(=O)OC(C)(C)C DYHSDKLCOJIUFX-UHFFFAOYSA-N 0.000 claims description 8
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 6
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 claims description 6
- 150000001339 alkali metal compounds Chemical class 0.000 claims description 6
- 125000000217 alkyl group Chemical group 0.000 claims description 6
- 239000002585 base Substances 0.000 claims description 6
- 229910052794 bromium Inorganic materials 0.000 claims description 6
- 229910052801 chlorine Inorganic materials 0.000 claims description 6
- 239000000460 chlorine Substances 0.000 claims description 6
- 229910052731 fluorine Inorganic materials 0.000 claims description 5
- 229910052757 nitrogen Inorganic materials 0.000 claims description 5
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 5
- 125000000547 substituted alkyl group Chemical group 0.000 claims description 5
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims description 4
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 claims description 4
- RIFGWPKJUGCATF-UHFFFAOYSA-N ethyl chloroformate Chemical group CCOC(Cl)=O RIFGWPKJUGCATF-UHFFFAOYSA-N 0.000 claims description 4
- 239000003112 inhibitor Substances 0.000 claims description 4
- AHWALFGBDFAJAI-UHFFFAOYSA-N phenyl carbonochloridate Chemical compound ClC(=O)OC1=CC=CC=C1 AHWALFGBDFAJAI-UHFFFAOYSA-N 0.000 claims description 4
- MFRIHAYPQRLWNB-UHFFFAOYSA-N sodium tert-butoxide Chemical compound [Na+].CC(C)(C)[O-] MFRIHAYPQRLWNB-UHFFFAOYSA-N 0.000 claims description 4
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical group CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 claims description 4
- 238000004090 dissolution Methods 0.000 claims description 3
- 238000002156 mixing Methods 0.000 claims description 3
- LPNYRYFBWFDTMA-UHFFFAOYSA-N potassium tert-butoxide Chemical compound [K+].CC(C)(C)[O-] LPNYRYFBWFDTMA-UHFFFAOYSA-N 0.000 claims description 3
- 229910052783 alkali metal Inorganic materials 0.000 claims description 2
- 150000001340 alkali metals Chemical class 0.000 claims description 2
- 150000004703 alkoxides Chemical class 0.000 claims description 2
- 229910052739 hydrogen Inorganic materials 0.000 claims description 2
- 229910052760 oxygen Inorganic materials 0.000 claims description 2
- RPDAUEIUDPHABB-UHFFFAOYSA-N potassium ethoxide Chemical compound [K+].CC[O-] RPDAUEIUDPHABB-UHFFFAOYSA-N 0.000 claims description 2
- BDAWXSQJJCIFIK-UHFFFAOYSA-N potassium methoxide Chemical compound [K+].[O-]C BDAWXSQJJCIFIK-UHFFFAOYSA-N 0.000 claims description 2
- QDRKDTQENPPHOJ-UHFFFAOYSA-N sodium ethoxide Chemical compound [Na+].CC[O-] QDRKDTQENPPHOJ-UHFFFAOYSA-N 0.000 claims description 2
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 3
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical group [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims 1
- 150000004679 hydroxides Chemical class 0.000 claims 1
- 229910052698 phosphorus Inorganic materials 0.000 claims 1
- 239000011574 phosphorus Substances 0.000 claims 1
- 239000011347 resin Substances 0.000 abstract description 6
- 229920005989 resin Polymers 0.000 abstract description 6
- 238000006243 chemical reaction Methods 0.000 description 18
- 239000000047 product Substances 0.000 description 18
- 150000002430 hydrocarbons Chemical group 0.000 description 9
- 239000002904 solvent Substances 0.000 description 9
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical group CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 7
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- 229920001577 copolymer Polymers 0.000 description 4
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 150000001298 alcohols Chemical class 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- 238000010992 reflux Methods 0.000 description 3
- 239000007858 starting material Substances 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 125000001424 substituent group Chemical group 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 238000005481 NMR spectroscopy Methods 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 238000007306 functionalization reaction Methods 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 239000000376 reactant Substances 0.000 description 2
- 231100000419 toxicity Toxicity 0.000 description 2
- 230000001988 toxicity Effects 0.000 description 2
- IHKAGESSVVOIIU-UHFFFAOYSA-N (3-ethoxy-3-methoxypropyl) hypofluorite Chemical compound CCOC(OC)CCOF IHKAGESSVVOIIU-UHFFFAOYSA-N 0.000 description 1
- 238000005160 1H NMR spectroscopy Methods 0.000 description 1
- LEJBBGNFPAFPKQ-UHFFFAOYSA-N 2-(2-prop-2-enoyloxyethoxy)ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOC(=O)C=C LEJBBGNFPAFPKQ-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 206010034972 Photosensitivity reaction Diseases 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000001476 alcoholic effect Effects 0.000 description 1
- 150000001344 alkene derivatives Chemical class 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 125000005520 diaryliodonium group Chemical group 0.000 description 1
- ZFTFAPZRGNKQPU-UHFFFAOYSA-N dicarbonic acid Chemical compound OC(=O)OC(O)=O ZFTFAPZRGNKQPU-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 231100000053 low toxicity Toxicity 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- JAYUDPKFDQGKFQ-UHFFFAOYSA-N n,n-diethylethanamine;ethanol Chemical compound CCO.CCN(CC)CC JAYUDPKFDQGKFQ-UHFFFAOYSA-N 0.000 description 1
- IJDIONYCFIJYLK-UHFFFAOYSA-N n,n-diethylethanamine;propan-2-ol Chemical compound CC(C)O.CCN(CC)CC IJDIONYCFIJYLK-UHFFFAOYSA-N 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- -1 photoacid generators Substances 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 1
- YLLIGHVCTUPGEH-UHFFFAOYSA-M potassium;ethanol;hydroxide Chemical compound [OH-].[K+].CCO YLLIGHVCTUPGEH-UHFFFAOYSA-M 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000008684 selective degradation Effects 0.000 description 1
- DIAOMFHSHXYYDC-UHFFFAOYSA-N sodium;ethanol;methanolate Chemical compound [Na+].[O-]C.CCO DIAOMFHSHXYYDC-UHFFFAOYSA-N 0.000 description 1
- SUBJHSREKVAVAR-UHFFFAOYSA-N sodium;methanol;methanolate Chemical compound [Na+].OC.[O-]C SUBJHSREKVAVAR-UHFFFAOYSA-N 0.000 description 1
- 238000004611 spectroscopical analysis Methods 0.000 description 1
- 150000003440 styrenes Chemical class 0.000 description 1
- 125000005409 triarylsulfonium group Chemical group 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F212/02—Monomers containing only one unsaturated aliphatic radical
- C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
- C08F212/14—Monomers containing only one unsaturated aliphatic radical containing one ring substituted by heteroatoms or groups containing heteroatoms
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/04—Polymerisation in solution
- C08F2/06—Organic solvent
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/14—Methyl esters, e.g. methyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/14—Esterification
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/10—Metal compounds
- C08K3/105—Compounds containing metals of Groups 1 to 3 or of Groups 11 to 13 of the Periodic Table
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/17—Amines; Quaternary ammonium compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
본 발명은 알칼리성 알코올 용액에 폴리히드록시스티렌을 첨가하여 균일 폴리히드록시스티렌 용액을 형성하고, 폴리히드록시스티렌 용액을 에스테르와 반응시켜 폴리히드록시스티렌 유도체를 얻는 것을 포함하는 폴리히드록시스티렌 유도체의 제조 방법을 제공한다. 수득한 폴리히드록시스티렌 유도체는 포토레지스트의 수지 성분으로서 사용하기에 적합하다.The present invention provides a polyhydroxystyrene derivative comprising adding polyhydroxystyrene to an alkaline alcohol solution to form a uniform polyhydroxystyrene solution, and reacting the polyhydroxystyrene solution with an ester to obtain a polyhydroxystyrene derivative. It provides a manufacturing method. The obtained polyhydroxystyrene derivative is suitable for use as the resin component of the photoresist.
Description
본 발명은 폴리히드록시스티렌 유도체의 제조 방법 및 보다 구체적으로는 균일계 중에서 폴리히드록시스티렌과 에스테르가 반응하게 하기 위하여 폴리히드록시스티렌을 용해시키는 용매로서 알칼리성 알코올 용액을 사용하는 폴리히드록시스티렌 유도체의 제조 방법에 관한 것이다.The present invention relates to a method for producing a polyhydroxystyrene derivative, and more particularly, to a polyhydroxystyrene derivative using an alkaline alcohol solution as a solvent for dissolving polyhydroxystyrene in order to allow the polyhydroxystyrene and the ester to react in a homogeneous system. It relates to a method for producing.
대표적인 포토레지스트 조성물은 수지, 광산 발생기, 억제제 및 다른 첨가제를 포함한다. 이상적인 포토레지스트 조성물은 우수한 분해능, 광감성, 내에칭성, 접착성, 열안정성, 필름 균질성 및 가공성 등의 요건을 만족시켜야 한다. 수지가 포토레지스트 중에서 주성분이므로, 수지는 전술한 특성에 중요한 영향을 미치며, 특히 내에칭 성능, 접착 성능 및 필름 균질 성능을 향상시키는데 핵심 요소이다.Representative photoresist compositions include resins, photoacid generators, inhibitors and other additives. An ideal photoresist composition should satisfy the requirements of excellent resolution, photosensitivity, etch resistance, adhesion, thermal stability, film homogeneity and processability. Since the resin is the main component in the photoresist, the resin has a significant influence on the above-described properties, and is particularly a key factor in improving the etching resistance, adhesion performance and film homogeneity performance.
일반적으로 말하면, 폴리히드록시스티렌 공중합체는 248nm의 파장에서 흡수가 낮고 열안정이 우수하므로, 이들은 종종 포토레지스트의 수지 성분으로서 사용된다. 일반적으로, 폴리히드록시스티렌의 공중합체 (또는 유도체)를 제조하는 두가지 방법이 있다. 하나는 2개의 서로 다른 단량체의 직접 중합이다. 예를 들면, 미국 특허 제4,775,730호에는 스티렌 유도체와 또다른 알켄 유도체와의 직접 중합을 기술하고 있으며, 이어서 생성된 공중합체를 연속적으로 가수분해하여 목적 생성물을 얻었다. 이 반응은 하기 반응식 1에 도시되어 있다.Generally speaking, polyhydroxystyrene copolymers have low absorption and excellent thermal stability at a wavelength of 248 nm, so they are often used as the resin component of the photoresist. In general, there are two ways to prepare copolymers (or derivatives) of polyhydroxystyrene. One is the direct polymerization of two different monomers. For example, US Pat. No. 4,775,730 describes the direct polymerization of styrene derivatives with another alkene derivatives, followed by continuous hydrolysis of the resulting copolymer to give the desired product. This reaction is shown in Scheme 1 below.
[반응식 1]Scheme 1
그러나, 문헌 [J. Polym. Sci.: Part A; Polym. Chem. Ed. 1986, 24, 2971]에는 2개의 상이한 스티렌 단량체가 중합되고 이어 관능기가 선택적으로 분해되는 것을 기술하고 있다. 이 반응은 반응식 2에 도시되어 있다.However, J. J. Polym. Sci .: Part A; Polym. Chem. Ed. 1986, 24, 2971 describe the polymerization of two different styrene monomers followed by the selective degradation of functional groups. This reaction is shown in Scheme 2.
[반응식 2]Scheme 2
폴리히드록시스티렌 공중합체를 제조하는 또다른 방법은 출발 물질로서 폴리히드록시스티렌을 사용하여 에스테르 시약과 폴리히드록시스티렌이 반응하게 하는 것을 포함한다. 예를 들면, 유럽 특허 제0634696호에서는 폴리히드록시스티렌을 테트라히드로푸란 (THF) 중에 용해시킨후 칼륨 t-부톡시드 [KOC(CH3)3]을 첨가하고, 그 다음 혼합물을 디(t-부틸)디카르보네이트와 반응시켜 폴리히드록시스티렌 유도체를 얻는다. 그러나, 상기 조건하에서는 폴리히드록시스티렌의 칼륨염은 THF에는 용해되지 않는다. 따라서, 폴리히드록시스티렌과 디(t-부틸)디카르보네이트의 연속 반응은 비균일계에서 수행된다. 전체 반응은 하기 반응식 3에 도시되어 있다.Another method of preparing polyhydroxystyrene copolymers involves allowing the ester reagent and polyhydroxystyrene to react using polyhydroxystyrene as starting material. For example, European Patent No. 0634696 discloses dissolving polyhydroxystyrene in tetrahydrofuran (THF) followed by the addition of potassium t-butoxide [KOC (CH 3 ) 3 ] and then the mixture being di (t- React with butyl) dicarbonate to obtain polyhydroxystyrene derivatives. However, under the above conditions, potassium salt of polyhydroxystyrene is not dissolved in THF. Thus, the continuous reaction of polyhydroxystyrene and di (t-butyl) dicarbonate is carried out in a heterogeneous system. The overall reaction is shown in Scheme 3 below.
[반응식 3]Scheme 3
요약하면, 폴리히드록시스티렌 유도체를 제조하는 종래의 방법은 복잡한 합성 과정을 포함하거나 시간 소모형이며, 반응이 비균일계에서 수행되므로 각 폴리히드록시스티렌 분자의 관능화도는 크게 상이하며, 따라서 생성물의 품질이 쉽게 조절되지 않는다.In summary, conventional methods of preparing polyhydroxystyrene derivatives include complex synthetic processes or are time consuming and the functionality of each polyhydroxystyrene molecule differs greatly because the reaction is carried out in a heterogeneous system, thus the product Quality is not easily adjusted.
따라서, 본 발명의 목적은 전술한 문제점을 해결하는 것이며, 폴리히드록시스티렌 유도체를 제조하기 쉬운 방법을 제공하는 것이다.It is therefore an object of the present invention to solve the above problems and to provide a method which is easy to prepare polyhydroxystyrene derivatives.
본 발명은 특별한 용매계를 사용하여 반응이 균일 방법으로 수행되게 하며, 따라서 출발 물질인 폴리히드록시스티렌이 완전하게 반응계 중에 용해되고, 각 폴리히드록시스티렌 분자의 관능화도가 서로 크게 상이하지 않아 생성물의 품질이 효과적으로 조절될 수 있게 하는 것이다. 또한, 사용된 용매는 매우 낮은 독성을 가지며, 반응은 실온에서 수행되고, 가열과 환류가 없거나 또는 저온 장치가 본 종류의 반응에 필요하다. 따라서, 본 발명의 반응은 보다 단순하며, 시간 절약형이고, 안전성 및 상업적인 가치가 높다.The present invention allows the reaction to be carried out in a uniform manner using a special solvent system, so that the starting material polyhydroxystyrene is completely dissolved in the reaction system, and the functionalities of the respective polyhydroxystyrene molecules are not significantly different from each other. This allows the quality of the product to be effectively controlled. In addition, the solvents used have very low toxicity, the reaction is carried out at room temperature, no heating and reflux or low temperature equipment is required for this kind of reaction. Thus, the reaction of the present invention is simpler, time-saving, safe and of high commercial value.
본 발명에 따르면, 전술한 목적을 달성하기 위하여 폴리히드록시스티렌 유도체의 제조 방법은According to the present invention, a method for producing a polyhydroxystyrene derivative in order to achieve the above object
(a) 알칼리성 알코올 용액 (이때, 알칼리성 알코올 용액은 알칼리 시약과 알코올을 혼합하여 얻음)에 폴리히드록시스티렌을 첨가하여 균일 폴리히드록시스티렌 용액을 형성하고,(a) polyhydroxystyrene is added to an alkaline alcohol solution, wherein the alkaline alcohol solution is obtained by mixing an alkali reagent and an alcohol to form a homogeneous polyhydroxystyrene solution,
(b) 폴리히드록시스티렌 용액을 하기 화학식 1의 에스테르와 반응시켜 폴리히드록시스티렌 유도체를 얻는 것을 포함한다.(b) reacting the polyhydroxystyrene solution with an ester of the formula (1) to obtain a polyhydroxystyrene derivative.
[화학식 1][Formula 1]
상기 식에서,Where
R1은 F, Cl, Br 및(여기에서, R3은 탄소 원자 수 1 내지 8인 탄화수소기임)으로 이루어진 군으로부터 선택되고,R 1 is F, Cl, Br and Wherein R 3 is a hydrocarbon group having 1 to 8 carbon atoms,
R2는 탄소 원자 수 1 내지 8인 탄화수소기이다.R 2 is a hydrocarbon group having 1 to 8 carbon atoms.
본 발명에 따르면, 폴리히드록시스티렌 유도체를 제조하는데 사용된 출발 물질은 상업적으로 구입가능한 폴리히드록시스티렌이다. 폴리히드록시스티렌을 알칼리성 알코올 용액에 첨가하고, 이어 철저히 교반하여 균일 폴리히드록시스티렌 용액을 형성한다. 이른바 알칼리성 알코올 용액은 알칼리 시약과 알코올을 혼합함으로써 얻는다. 폴리히드록시스티렌을 용해시킬 수 있는 모든 알칼리/알코올 혼합물이 본 발명에서 사용하기에 적합하다.According to the present invention, the starting material used to prepare the polyhydroxystyrene derivatives is commercially available polyhydroxystyrene. Polyhydroxystyrene is added to the alkaline alcohol solution and then thoroughly stirred to form a homogeneous polyhydroxystyrene solution. So-called alkaline alcohol solutions are obtained by mixing alkali reagents with alcohols. All alkali / alcohol mixtures capable of dissolving polyhydroxystyrene are suitable for use in the present invention.
이어서, 폴리히드록시스티렌 용액을 소정 시간 동안 에스테르와 반응시킨다. 물을 첨가하여 생성물을 침전시키고, 이어서 여과 및 건조에 의해 폴리히드록시스티렌 유도체를 얻는다.The polyhydroxystyrene solution is then reacted with the ester for a predetermined time. Water is added to precipitate the product, followed by filtration and drying to give a polyhydroxystyrene derivative.
OH기가 특정 비율로 관능화될때, 폴리히드록시스티렌 유도체를 합성하기 위하여 전술한 알칼리/알코올 용액계를 사용하여 생성물은 침전될 수 있다. 따라서, 보다 높은 관능화도 비를 갖는 폴리히드록시스티렌 유도체를 얻기 위하여, 폴리히드록시스티렌 용액과 에스테르와의 반응 후에 유기 용매가 첨가되어 생성물을 용해할 수 있으며, 에스테르 시약을 재첨가하여 적당한 반응물을 제공하여 폴리히드록시스티렌의 미반응된 OH기가 추가로 관능화되도록 할 수 있다. 따라서 최종 생성물의 관능화도는 증가될 수 있다. 적합한 유기 용매는 폴리히드록시스티렌 유도체를 용해할 수 있는 모든 종류의 용매를 포함한다. 대표적인 예는 N,N-디메틸포름아미드 (DMF)이다.When the OH groups are functionalized in a certain proportion, the product can be precipitated using the alkali / alcohol solution system described above to synthesize the polyhydroxystyrene derivatives. Therefore, in order to obtain a polyhydroxystyrene derivative having a higher functionalization ratio, an organic solvent can be added after the reaction of the polyhydroxystyrene solution with the ester to dissolve the product, and the ester reagent is added again to obtain a suitable reactant. May be provided to further functionalize the unreacted OH groups of the polyhydroxystyrene. Thus, the degree of functionality of the final product can be increased. Suitable organic solvents include all kinds of solvents capable of dissolving polyhydroxystyrene derivatives. A representative example is N, N-dimethylformamide (DMF).
본 발명에서 사용하기에 적합한 알칼리 시약은 알칼리 금속 화합물 또는 질소 원자를 포함하는 염기 화합물이다. 알칼리 금속 화합물은 알칼리 금속의 수산화물 또는 알콕시드일 수 있다. 대표적인 예는 수산화나트륨, 나트륨 메톡시드, 나트륨 에톡시드, 나트륨 t-부톡시드, 수산화칼륨, 칼륨 메톡시드, 칼륨 에톡시드 및 칼륨 t-부톡시드를 포함한다.Suitable alkali reagents for use in the present invention are alkali metal compounds or base compounds comprising nitrogen atoms. The alkali metal compound may be a hydroxide or alkoxide of alkali metal. Representative examples include sodium hydroxide, sodium methoxide, sodium ethoxide, sodium t-butoxide, potassium hydroxide, potassium methoxide, potassium ethoxide and potassium t-butoxide.
본 발명에서 사용하기에 적합한 질소 원자를 포함하는 염기 화합물은,,,,,,및으로 이루어진 군으로부터 선택된다.Base compounds containing nitrogen atoms suitable for use in the present invention , , , , , , And It is selected from the group consisting of.
식 중, R4, R5, R6은 H 및 탄소 원자 수 1 내지 4인 탄화수소기로 이루어진 군으로부터 선택되고, X는 O 또는 N이다. 이러한 질소 포함 염기 화합물의 대표적인 예는 트리메틸아민 및 트리에틸아민을 포함한다.Wherein R 4 , R 5 , R 6 are selected from the group consisting of H and a hydrocarbon group having 1 to 4 carbon atoms, and X is O or N. Representative examples of such nitrogen containing base compounds include trimethylamine and triethylamine.
본 발명에서 사용하기에 적합한 알코올은 탄소 원자 수 1 내지 6인 알코올일 수 있다. 대표적인 예는 메탄올, 에탄올 및 이소프로판올을 포함한다.Alcohols suitable for use in the present invention may be alcohols having 1 to 6 carbon atoms. Representative examples include methanol, ethanol and isopropanol.
본 발명에서 사용하기에 적합한 에스테르 시약은 하기 화학식 1에 의해 도시된 구조를 포함한다.Suitable ester reagents for use in the present invention include the structure shown by formula (1).
[화학식 1][Formula 1]
식 중,In the formula,
R1은 F, Cl, Br 및(여기에서, R3은 탄소원자 수 1 내지 8인 탄화수소기이며, 바람직하게는 알킬, 페닐, 벤질, 치환 알킬, 치환 페닐 및 탄소 원자 수 1 내지 8인 치환 벤질로 이루어진 군으로부터 선택된 탄화수소기임)으로 이루어진 군으로부터 선택되고,R 1 is F, Cl, Br and Wherein R 3 is a hydrocarbon group having 1 to 8 carbon atoms, preferably a hydrocarbon group selected from the group consisting of alkyl, phenyl, benzyl, substituted alkyl, substituted phenyl and substituted benzyl having 1 to 8 carbon atoms. Selected from the group consisting of
R2는 탄소 원자 수 1 내지 8인 탄화수소기, 바람직하게는 알킬, 페닐, 벤질, 치환 알킬, 치환 페닐, 및 탄소 원자 수 1 내지 8인 치환 벤질로 이루어진 군으로부터 선택된 탄화수소기이다.R 2 is a hydrocarbon group selected from the group consisting of a hydrocarbon group having 1 to 8 carbon atoms, preferably alkyl, phenyl, benzyl, substituted alkyl, substituted phenyl, and substituted benzyl having 1 to 8 carbon atoms.
에스테르의 R1이 F, Cl 또는 Br일때, 에스테르의 바람직한 예는 에틸클로로포르메이트 또는 페닐클로로포르메이트이다. 에스테르의 R1이일때, 에스테르의 바람직한 예는 디(t-부틸)디카르보네이트이다.When R 1 of the ester is F, Cl or Br, preferred examples of the ester are ethylchloroformate or phenylchloroformate. R 1 of the ester When, the preferred example of ester is di (t-butyl) dicarbonate.
본 발명의 전술한 방법에 따라, 수득한 폴리히드록시스티렌 유도체는 하기 화학식 2에 도시된 구조를 갖는다.According to the aforementioned method of the present invention, the obtained polyhydroxystyrene derivative has the structure shown in the following formula (2).
[화학식 2][Formula 2]
식 중,In the formula,
R2는 탄소 원자 수 1 내지 8인 탄화수소기, 바람직하게는 알킬, 페닐, 벤질, 치환 알킬, 치환 페닐, 및 탄소 원자 수 1 내지 8인 치환 벤질로 이루어진 군으로부터 선택된 탄화수소기이다.R 2 is a hydrocarbon group selected from the group consisting of a hydrocarbon group having 1 to 8 carbon atoms, preferably alkyl, phenyl, benzyl, substituted alkyl, substituted phenyl, and substituted benzyl having 1 to 8 carbon atoms.
치환 페닐은 1 또는 2개의 치환기를 포함할 수 있다. 유사하게, 치환 벤질은 또한 1 또는 2개의 치환기를 포함할 수 있다. 치환기는 알킬, 알콕시 또는 할로겐, 예를 들면 메틸, 에틸, 프로필, 메톡시, 에톡시, 프로폭시, 불소, 염소 또는 브롬일 수 있다.Substituted phenyl may comprise one or two substituents. Similarly, substituted benzyl may also include one or two substituents. Substituents may be alkyl, alkoxy or halogen such as methyl, ethyl, propyl, methoxy, ethoxy, propoxy, fluorine, chlorine or bromine.
본 발명의 하기 실시예에 따라, R2는 에틸, t-부틸 또는 페닐일 수 있다.According to the following examples of the invention, R 2 may be ethyl, t-butyl or phenyl.
화학식 2에서, m/m+n의 비율은 0과 1 사이이고, 바람직하게는 0.05 내지 0.95 사이이고, 이것은 폴리히드록시스티렌의 부분 관능화도가 5% 내지 95% 사이라는 것을 나타낸다.In formula (2), the ratio of m / m + n is between 0 and 1, preferably between 0.05 and 0.95, which indicates that the partial functionalization degree of polyhydroxystyrene is between 5% and 95%.
본 발명의 한 면에 따르면, 본 발명은 반응이 균일 방법으로 수행되게 하는 특별한 용매계를 사용하여 각 폴리히드록시스티렌 분자의 결과 (예컨대, 관능화도)가 서로 상당히 상이하지 않게 할 것이다. 또한, 사용된 용매는 독성이 매우 낮으며, 반응은 실온에서 수행되고, 가열과 환류가 없거나 또는 저온 장치가 본 종류의 반응에 필요하다. 따라서, 본 발명의 방법은 간단하고, 안전성 및 상업적 가치가 높다.According to one aspect of the invention, the present invention will use a special solvent system that allows the reaction to be carried out in a homogeneous manner so that the results (eg degree of functionality) of each polyhydroxystyrene molecule are not significantly different from each other. In addition, the solvents used are very low in toxicity and the reactions are carried out at room temperature, with no heating and reflux or low temperature equipment required for this kind of reaction. Thus, the method of the present invention is simple, high in safety and commercial value.
본 발명으로부터 수득한 폴리히드록시스티렌 유도체는 248nm의 파장에서 낮은 흡수값을 갖고 열안정성이 월등하므로, 248nm 포토레지스트의 수지 성분으로서 사용하기에 적합하다. 따라서 본 발명에 따르면, 본 발명의 방법으로부터 합성된 폴리히드록시스티렌 유도체, 및 폴리히드록시스티렌 유도체의 중량 기준으로, 1-10 중량%의 광산 발생기 및 5-30 중량%의 용해 억제제를 포함하는 포토레지스트 조성물이 제공된다.The polyhydroxystyrene derivative obtained from the present invention has a low absorption value at a wavelength of 248 nm and excellent thermal stability, and thus is suitable for use as a resin component of a 248 nm photoresist. Thus, according to the present invention, a polyhydroxystyrene derivative synthesized from the method of the present invention, and, based on the weight of the polyhydroxystyrene derivative, comprises 1-10% by weight of a photoacid generator and 5-30% by weight of a dissolution inhibitor. A photoresist composition is provided.
본 발명에서 사용하기에 적합한 산 발생기는 디아릴 요오도늄염, 트리아릴 술포늄염, 술포닐히드록시이미드 또는 그의 유도체일 수 있다. 다른 적합한 산 발생기는 유럽 특허 제0634696호에서 사용된 것일 수 있다. 용해 억제제는 분자량이 1000 이하인 산의 불안정한 관능기를 포함하는 임의 화합물일 수 있다.Acid generators suitable for use in the present invention may be diaryl iodonium salts, triaryl sulfonium salts, sulfonylhydroxyimide or derivatives thereof. Another suitable acid generator may be that used in European Patent No. 0634696. The dissolution inhibitor may be any compound comprising an labile functional group of an acid having a molecular weight of 1000 or less.
수많은 변형과 변이가 당분야의 기술자에게는 명백하므로, 본 발명의 범위를 제한하지 않고 보다 충분히 본 발명의 방법 및 잇점을 설명하기 위하여 하기 실시예가 제공된다.Numerous variations and variations are apparent to those skilled in the art, and the following examples are provided to more fully illustrate the methods and advantages of the present invention without limiting the scope thereof.
실시예 1-5Example 1-5
알코올 중의 폴리히드록시스티렌 용액의 제조Preparation of Polyhydroxystyrene Solution in Alcohol
수산화칼륨 2.8g을 에탄올 300ml를 포함하는 플라스크에 첨가하였다. 완전히 교반한 후, 폴리히드록시스티렌 6.0g을 첨가하고, 추가로 약 1시간 동안 실온에서 교반하여 용액이 투명하게 하였다. 수산화칼륨 및 에탄올 이외에, 다른 알칼리/알코올계가 또한 사용되어 폴리히드록시스티렌을 용해할 수 있다. 표 1은 폴리히드록시스티렌을 용해할 수 있는 적합한 알칼리/알코올계를 열거한다.2.8 g of potassium hydroxide was added to a flask containing 300 ml of ethanol. After complete stirring, 6.0 g of polyhydroxystyrene was added and stirred for another 1 hour at room temperature to make the solution clear. In addition to potassium hydroxide and ethanol, other alkali / alcoholic systems may also be used to dissolve polyhydroxystyrene. Table 1 lists suitable alkali / alcohol systems capable of dissolving polyhydroxystyrene.
[표 1]TABLE 1
실시예 6-9Example 6-9
폴리히드록시스티렌 유도체의 제조Preparation of Polyhydroxystyrene Derivatives
0.4 내지 1.0당량의 디(t-부틸)디카르보네이트, 에틸클로로포르메이트 또는 페닐클로로포르메이트를 실시예 1-5의 하나로부터 얻은 알코올 용액계 중의 폴리히드록시스티렌 용액에 첨가하였다. 6시간 동안 교반 후, 혼합물을 감압하에서 농축하여 용매의 일부를 제거하였다. 생성된 혼합물을 물 100-500 ml을 첨가하여 처리하고, 이어서 아세트산 미량으로 산성화시키고, 그 다음 이를 여과하고, 건조하여 목적하는 생성물 1-4를 얻었다. 반응 규모, 얻어진 생성물의 중량 및 에스테르 시약의 당량비는 표 2에 나타나 있다.0.4-1.0 equivalents of di (t-butyl) dicarbonate, ethylchloroformate or phenylchloroformate were added to the polyhydroxystyrene solution in the alcohol solution system obtained from one of Examples 1-5. After stirring for 6 hours, the mixture was concentrated under reduced pressure to remove some of the solvent. The resulting mixture was treated by addition of 100-500 ml of water, then acidified with traces of acetic acid, then filtered and dried to afford the desired product 1-4. The reaction scale, the weight of the product obtained and the equivalence ratio of the ester reagents are shown in Table 2.
[표 2]TABLE 2
실시예 10Example 10
수산화칼륨 5.6g을 에탄올 800ml를 포함하는 플라스크에 첨가하였다. 완전히 교반한 후, 폴리히드록시스티렌 12.0g을 첨가하고, 용액이 투명하게 될때까지 약 1시간 동안 실온에서 교반하였다. 디(t-부틸)디카르보네이트 0.8 당량을 용액에 첨가하고, 추가로 약 6 시간 동안 교반하였다. 이어서, N,N-디메틸포름아미드 100ml를 첨가하여 생성된 혼합물의 용해도를 증가시키고, 디(t-부틸)디카르보네이트 0.4 당량을 첨가하여 반응물의 적정양을 제공하였다. 혼합물을 6시간 동안 교반시키고, 이어 물 100ml를 첨가하고, 여과하고, 진공하에서 건조하여 생성물 5 (20.3g)을 얻었다.5.6 g of potassium hydroxide was added to a flask containing 800 ml of ethanol. After complete stirring, 12.0 g of polyhydroxystyrene was added and stirred at room temperature for about 1 hour until the solution became clear. 0.8 equivalent of di (t-butyl) dicarbonate was added to the solution and stirred for a further about 6 hours. Then, 100 ml of N, N-dimethylformamide was added to increase the solubility of the resulting mixture and 0.4 equivalents of di (t-butyl) dicarbonate was added to provide the appropriate amount of reactant. The mixture was stirred for 6 hours, then 100 ml of water was added, filtered and dried under vacuum to give product 5 (20.3 g).
상기 실시예로부터 얻은 생성물 (폴리히드록시스티렌 유도체)는 하기 화학식 2를 갖는다.The product (polyhydroxystyrene derivative) obtained from the above example has the following formula (2).
화학식 2Formula 2
각 생성물의 R2및 m/m+n 비는 표 3에서 나타나 있다.The R 2 and m / m + n ratios of each product are shown in Table 3.
[표 3]TABLE 3
생성물 1-5의 분광 데이타는1H-NMR에 의해 분석하고 하기에서 열거한다:Spectroscopic data of product 1-5 are analyzed by 1 H-NMR and listed below:
생성물 1, 2 및 5:Products 1, 2 and 5:
(CDCl3, 200 MHz): 1.55 (9H, s, 3Me), 6.50 (2H, s, b, Ar), 6.85 (2H, s, b, Ar).(CDCl 3 , 200 MHz): 1.55 (9H, s, 3Me), 6.50 (2H, s, b, Ar), 6.85 (2H, s, b, Ar).
생성물 3:Product 3:
(CDCl3, 200 MHz): 1.38 (3H, s, b, Me), 4.31 (2H, s, b, CH2), 6.53 (2H, s, b, Ar), 6.88 (2H, s, b, Ar).(CDCl 3 , 200 MHz): 1.38 (3H, s, b, Me), 4.31 (2H, s, b, CH 2 ), 6.53 (2H, s, b, Ar), 6.88 (2H, s, b, Ar).
생성물 4:Product 4:
(CDCl3, 200 MHz): 6.48 (2H, s, b, Ar), 6.96 (2H, s, b, Ar), 7.15-7.41 (5H, m, Ph).(CDCl 3 , 200 MHz): 6.48 (2H, s, b, Ar), 6.96 (2H, s, b, Ar), 7.15-7.41 (5H, m, Ph).
상기 기술된 바에 의하면, 본 발명은 폴리히드록시스티렌 유도체의 제조 반응이 균일 방법으로 수행되게 하는 특별한 용매계를 사용하여 각 폴리히드록시스티렌 분자의 관능화도가 서로 상당히 상이하지 않아 생성물의 품질이 효과적으로 조절될 수 있으며, 사용된 용매는 독성이 매우 낮고, 반응은 실온에서 수행되고, 가열과 환류가 없거나 또는 저온 장치가 본 종류의 반응에 필요하다. 따라서, 본 발명의 방법은 간단하고, 안전성 및 상업적 가치가 높다.As described above, the present invention uses a special solvent system that allows the production reaction of polyhydroxystyrene derivatives to be carried out in a uniform manner, so that the functionalities of the respective polyhydroxystyrene molecules are not significantly different from each other, so that the quality of the product is effectively The solvent used is very low in toxicity, the reaction is carried out at room temperature and there is no heating and reflux or low temperature equipment is required for this kind of reaction. Thus, the method of the present invention is simple, high in safety and commercial value.
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