KR102317276B1 - Method for manufacturing electrode foil for surface mount aluminum electrolytic capacitors - Google Patents
Method for manufacturing electrode foil for surface mount aluminum electrolytic capacitors Download PDFInfo
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- KR102317276B1 KR102317276B1 KR1020207000788A KR20207000788A KR102317276B1 KR 102317276 B1 KR102317276 B1 KR 102317276B1 KR 1020207000788 A KR1020207000788 A KR 1020207000788A KR 20207000788 A KR20207000788 A KR 20207000788A KR 102317276 B1 KR102317276 B1 KR 102317276B1
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- aqueous solution
- phosphoric acid
- treatment
- mixed aqueous
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- 239000011888 foil Substances 0.000 title claims abstract description 63
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 title claims abstract description 47
- 229910052782 aluminium Inorganic materials 0.000 title claims abstract description 47
- 238000000034 method Methods 0.000 title claims abstract description 15
- 239000003990 capacitor Substances 0.000 title claims abstract description 14
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 9
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims abstract description 60
- 239000007864 aqueous solution Substances 0.000 claims abstract description 50
- 239000000126 substance Substances 0.000 claims abstract description 48
- 238000006243 chemical reaction Methods 0.000 claims abstract description 45
- 239000000243 solution Substances 0.000 claims abstract description 42
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims abstract description 30
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims abstract description 21
- 238000010438 heat treatment Methods 0.000 claims abstract description 19
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 8
- 239000011259 mixed solution Substances 0.000 claims abstract description 7
- 230000035484 reaction time Effects 0.000 claims description 30
- 238000004140 cleaning Methods 0.000 claims description 21
- 238000005260 corrosion Methods 0.000 claims description 20
- 230000007797 corrosion Effects 0.000 claims description 20
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 claims description 16
- 238000005868 electrolysis reaction Methods 0.000 claims description 16
- 239000011261 inert gas Substances 0.000 claims description 12
- 230000001681 protective effect Effects 0.000 claims description 12
- 235000011007 phosphoric acid Nutrition 0.000 claims description 11
- 239000003112 inhibitor Substances 0.000 claims description 10
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 8
- LFVGISIMTYGQHF-UHFFFAOYSA-N ammonium dihydrogen phosphate Chemical compound [NH4+].OP(O)([O-])=O LFVGISIMTYGQHF-UHFFFAOYSA-N 0.000 claims description 8
- 229910000387 ammonium dihydrogen phosphate Inorganic materials 0.000 claims description 8
- 235000019837 monoammonium phosphate Nutrition 0.000 claims description 8
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 6
- LNOPIUAQISRISI-UHFFFAOYSA-N n'-hydroxy-2-propan-2-ylsulfonylethanimidamide Chemical compound CC(C)S(=O)(=O)CC(N)=NO LNOPIUAQISRISI-UHFFFAOYSA-N 0.000 claims description 6
- FLDCSPABIQBYKP-UHFFFAOYSA-N 5-chloro-1,2-dimethylbenzimidazole Chemical compound ClC1=CC=C2N(C)C(C)=NC2=C1 FLDCSPABIQBYKP-UHFFFAOYSA-N 0.000 claims description 4
- 239000001741 Ammonium adipate Substances 0.000 claims description 4
- YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical compound C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 claims description 4
- 235000019293 ammonium adipate Nutrition 0.000 claims description 4
- BNGXYYYYKUGPPF-UHFFFAOYSA-M (3-methylphenyl)methyl-triphenylphosphanium;chloride Chemical compound [Cl-].CC1=CC=CC(C[P+](C=2C=CC=CC=2)(C=2C=CC=CC=2)C=2C=CC=CC=2)=C1 BNGXYYYYKUGPPF-UHFFFAOYSA-M 0.000 claims description 2
- KFFQABQEJATQAT-UHFFFAOYSA-N N,N'-dibutylthiourea Chemical compound CCCCNC(=S)NCCCC KFFQABQEJATQAT-UHFFFAOYSA-N 0.000 claims description 2
- 238000001035 drying Methods 0.000 claims 1
- 239000012535 impurity Substances 0.000 abstract description 5
- 239000002253 acid Substances 0.000 abstract 1
- 238000009713 electroplating Methods 0.000 abstract 1
- 238000007654 immersion Methods 0.000 abstract 1
- 238000005406 washing Methods 0.000 abstract 1
- 238000005452 bending Methods 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000006056 electrooxidation reaction Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/004—Details
- H01G9/04—Electrodes or formation of dielectric layers thereon
- H01G9/048—Electrodes or formation of dielectric layers thereon characterised by their structure
- H01G9/055—Etched foil electrodes
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/02—Etching
- C25F3/04—Etching of light metals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/004—Details
- H01G9/04—Electrodes or formation of dielectric layers thereon
- H01G9/042—Electrodes or formation of dielectric layers thereon characterised by the material
- H01G9/045—Electrodes or formation of dielectric layers thereon characterised by the material based on aluminium
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- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Chemical Treatment Of Metals (AREA)
Abstract
본 발명은 표면 실장 알루미늄 전해 커패시터용 전극박의 제조 방법을 개시하였으며, 알루미늄박을 인산 용액에 침지한 후 순간 대전류를 인가하고, 그 후 혼합 수용액에 넣어 여러 차례 전식을 진행하고, 알루미늄박을 술팜산과 시트르산이 함유된 혼합 용액에 넣어 후처리 세정을 진행하고, 40℃의 순수(pure water)에 침지하고, 알루미늄박을 오븐에 넣고 500℃에서 열처리를 진행하고, 70℃ 내지 90℃에서 4% 내지 15%를 함유한 화성액에서 필요한 전압을 인가하여 화성 처리를 진행하고, 마지막으로 건조한다. 본 발명은 수득한 전극박의 잔류 코어 일관성이 우수하고 강도가 높으며 저항이 낮은 장점이 있고, 동시에 전극박 불순물 이온 함량을 1ppm 이하로 효율적으로 제어할 수 있으며 전극박의 전류 누설을 크게 줄여 사용수명을 향상시킬 수 있고, 표면 실장 알루미늄 전해 커패시터의 사용 기준을 충족시킬 수 있다.The present invention discloses a method for manufacturing an electrode foil for a surface-mounted aluminum electrolytic capacitor, immersing the aluminum foil in a phosphoric acid solution, applying a high instantaneous current, and then putting it in a mixed aqueous solution to perform electroplating several times, and sulfam the aluminum foil Put in a mixed solution containing acid and citric acid to perform post-treatment washing, immersion in pure water at 40°C, put aluminum foil in an oven, and heat treatment at 500°C, 4% at 70°C to 90°C The chemical conversion treatment is performed by applying the required voltage in the chemical solution containing 15% to 15%, and finally dried. The present invention has the advantages of excellent residual core consistency, high strength, and low resistance of the obtained electrode foil, and at the same time, it is possible to efficiently control the impurity ion content of the electrode foil to 1 ppm or less, and greatly reduces the current leakage of the electrode foil, so that the service life of the electrode foil can be improved, and can meet the standards for use of surface mount aluminum electrolytic capacitors.
Description
본 발명은 표면 실장 알루미늄 전해 커패시터용 전극박의 제조 방법에 관한 것이다.The present invention relates to a method for manufacturing an electrode foil for a surface-mounted aluminum electrolytic capacitor.
일반적으로 저전압 알루미늄 전해 커패시터용 알루미늄박은 염산, 황산, 질산, 인산 등이 혼합된 수용액을 거쳐 화학적 또는 전기화학적 부식이 진행된 후 박 표면에 대량의 알루미늄 분말, 염화 이온 및 황산 이온 등의 불순물이 대량 부착되므로 후속적으로 일정한 세정 용액을 이용하여 제거해야 한다. 통상적인 세정 방법은 질산 또는 황산 용액으로 화학 세정을 진행한 다음 상온의 순수(pure water)로 헹구고 마지막으로 열처리하여 수화된 막을 형성하는 것이다.In general, aluminum foil for low voltage aluminum electrolytic capacitors is subjected to chemical or electrochemical corrosion through an aqueous solution containing hydrochloric acid, sulfuric acid, nitric acid, phosphoric acid, etc. Therefore, it must be subsequently removed using a regular cleaning solution. A typical cleaning method is to form a hydrated film by performing chemical cleaning with nitric acid or sulfuric acid solution, rinsing with pure water at room temperature, and finally heat-treating.
종래의 방법은 알루미늄박에 구멍을 만들기 전에 처리할 수 없으며, 이후 부식 과정에서는 박 표면에 균일하게 구멍을 만들 수 없고 구멍을 확대할 경우 박 부식이 균일하지 않게 되어 부식박 잔류 코어가 일치하지 않아 용량 분산차, 절곡 분산차가 커지게 되며, 이로 인해 전극박 재단에 대한 표면 실장용 커패시터의 기준을 충족시킬 수 없다. 종래의 세정 방법은 스펀지층을 포함하는 저압 부식박 심층의 불순물을 세정할 수 없으며, 그 함량은 약 3ppm 내지 10ppm이기 때문에 최종적인 화성박의 전류 누설이 비교적 커지고 저항이 비교적 높아져 전극박의 전류 누설이 적고 저항이 낮아야 하는 표면 실장용 커패시터의 기준을 충족시킬 수 없다. In the conventional method, it cannot be processed before making a hole in the aluminum foil, and in the subsequent corrosion process, the hole cannot be made uniformly on the surface of the foil. The capacity dispersion difference and the bending dispersion difference become large, and for this reason, it is not possible to meet the standards for surface mount capacitors for electrode foil cutting. The conventional cleaning method cannot clean the impurities in the deep low-pressure corrosion foil including the sponge layer, and since the content is about 3 ppm to 10 ppm, the current leakage of the final chemical foil is relatively large and the resistance is relatively high, so the current leakage of the electrode foil It cannot meet the criteria for surface mount capacitors, which must be small and have low resistance.
본 발명의 목적은 부식박의 전처리 방법을 개선하고 부식 균일성을 크게 향상시켜 전극박 용량의 일관성을 향상시키는 동시에 전극박의 강도 및 그 일관성을 향상시키고, 박 표면 세정 방식을 개선하여 박 표면 불순물 이온 제거율을 크게 향상시키며 전극박 전류 누설 및 저항을 크게 낮추어 전극박에 대한 표면 실장용 알루미늄 전해 커패시터의 기준을 충족시키는 데에 있다. An object of the present invention is to improve the pretreatment method of the corrosion foil and significantly improve the corrosion uniformity to improve the consistency of the capacity of the electrode foil, and at the same time improve the strength and consistency of the electrode foil, and improve the method of cleaning the surface of the foil to improve the foil surface impurities It greatly improves the ion removal rate and significantly lowers the current leakage and resistance of the electrode foil to meet the standards for surface mount aluminum electrolytic capacitors for the electrode foil.
본 발명의 목적은 이하의 기술방안을 통해 구현한다. 표면 실장 알루미늄 전해 커패시터용 전극박의 제조 방법은 이하 단계와 같다.The object of the present invention is realized through the following technical solutions. The manufacturing method of the electrode foil for surface mount aluminum electrolytic capacitors is as follows.
A. 순도 99.98%의 91μm 두께 알루미늄박을 0.5% 내지 1%의 인산 용액에 1분 동안 침지시킨 후, 전류 밀도 1A/cm2 내지 2A/cm2의 순간 고주파 전류를 통해 표면 전기 분해 처리를 진행하며, 반응 온도는 20℃ 내지 50℃이다.A. After immersing a 91 μm thick aluminum foil with a purity of 99.98% in a 0.5% to 1% phosphoric acid solution for 1 minute, surface electrolysis treatment is performed through an instantaneous high-frequency current with a current density of 1A/cm 2 to 2A/cm 2 and the reaction temperature is 20 °C to 50 °C.
B. 상기 전처리를 거친 알루미늄박을 혼합 수용액에서 1회 전식을 진행하며, 전기 주파수는 55Hz 내지 80Hz이고, 반응 온도는 20℃ 내지 40℃이고, 반응 시간은 1분이다. 그 후 혼합 수용액에서 화학적 부식을 진행하며, 반응 온도는 40℃ 내지 60℃이고, 반응 시간은 30초이다. 이어서, 혼합 수용액에서 2차 전식을 진행하며 전기 주파수는 40Hz 내지 70Hz이고, 반응 온도는 20℃ 내지 40℃이고, 반응 시간은 2분 30초이다. 다시 혼합 수용액에서 3차 전식을 진행하며, 전기 주파수는 30Hz 내지 60Hz이고, 반응 온도는 20℃ 내지 40℃이고, 반응 시간은 3분 30초이다.B. The aluminum foil that has undergone the pretreatment is etched once in a mixed aqueous solution, the electrical frequency is 55 Hz to 80 Hz, the reaction temperature is 20° C. to 40° C., and the reaction time is 1 minute. Thereafter, chemical corrosion is performed in a mixed aqueous solution, the reaction temperature is 40° C. to 60° C., and the reaction time is 30 seconds. Then, the secondary electrolysis is performed in the mixed aqueous solution, the electrical frequency is 40 Hz to 70 Hz, the reaction temperature is 20° C. to 40° C., and the reaction time is 2 minutes and 30 seconds. The third electrolysis is performed again in the mixed aqueous solution, the electrical frequency is 30 Hz to 60 Hz, the reaction temperature is 20° C. to 40° C., and the reaction time is 3 minutes and 30 seconds.
C. 알루미늄박을 화학 세정액에 넣고 후치리 세정을 진행하며, 후처리 세정액 온도는 40℃ 내지 75℃이고, 반응 시간은 3분 내지 5분이다.C. Put the aluminum foil in the chemical cleaning solution and perform post-treatment cleaning, the temperature of the post-treatment cleaning solution is 40° C. to 75° C., and the reaction time is 3 minutes to 5 minutes.
D. 40℃ 순수에서 6분 내지 10분 동안 헹군다.D. Rinse in pure water at 40°C for 6 to 10 minutes.
E. 알루미늄박을 오븐에 넣고 500℃에서 열처리를 진행하며, 열처리 과정은 불활성 가스 보호 분위기 또는 진공 상태에서 진행하고, 처리 시간은 30초 내지 50초이다.E. Put the aluminum foil in an oven and heat treatment at 500° C., and the heat treatment process is performed in an inert gas protective atmosphere or vacuum, and the treatment time is 30 to 50 seconds.
F. 알루미늄 박을 70℃ 내지 90℃에서 7% 내지 15%를 함유하는 화성액에서 10의 전압을 인가해 화성 처리를 3분 내지 5분 동안 진행한다. 그 후 70℃ 내지 90℃에서 6% 내지 12%를 함유하는 화성액에서 25V의 전압을 인가하여 4분 내지 7분 동안 화성처리를 진행한다. 다시 70℃ 내지 90℃에서 4% 내지 10%를 함유하는 화성액에서 35V의 전압을 인가하여 7분 내지 14분 동안 화성처리를 진행한다. 이어서 30℃ 내지 60℃에서 인산과 아디프산암모늄(ammonium adipate)의 하나 이상을 함유하는 혼합 수용액에서 2분 내지 5분간 처리한다. 그 후 오븐에서 450℃ 내지 500℃로 불활성 기체 보호 분위기 또는 진공 상태에서 열처리를 진행하며 처리 시간은 60초 내지 120초이다. 다시 70℃ 내지 90℃에서 인산, 아디프산암모늄 및 ADP(ammonium dihydrogen phosphate)의 하나 이상을 함유하는 혼합 수용액에서 4분 내지 10분간 처리하며, 마지막으로 건조시킨다.F. The aluminum foil is subjected to chemical conversion treatment at 70° C. to 90° C. in a chemical solution containing 7% to 15% by applying a voltage of 10 for 3 minutes to 5 minutes. Thereafter, a voltage of 25V is applied in a chemical solution containing 6% to 12% at 70°C to 90°C to perform chemical conversion treatment for 4 to 7 minutes. Again, a voltage of 35V is applied in a chemical solution containing 4% to 10% at 70°C to 90°C to perform chemical conversion treatment for 7 minutes to 14 minutes. Subsequently, the mixture is treated at 30° C. to 60° C. in a mixed aqueous solution containing at least one of phosphoric acid and ammonium adipate for 2 minutes to 5 minutes. Thereafter, heat treatment is performed in an oven at 450° C. to 500° C. in an inert gas protective atmosphere or vacuum, and the treatment time is 60 seconds to 120 seconds. Again, it is treated in a mixed aqueous solution containing at least one of phosphoric acid, ammonium adipate, and ammonium dihydrogen phosphate (ADP) at 70° C. to 90° C. for 4 to 10 minutes, and finally dried.
바람직하게는, 1차, 2차 및 3차 전식 수용액은 모두 염산, 황산, 인산 및 부식 억제제의 혼합 수용액이다.Preferably, the primary, secondary and tertiary aqueous solutions are all mixed aqueous solutions of hydrochloric acid, sulfuric acid, phosphoric acid and a corrosion inhibitor.
바람직하게는, 화학 세정액은 8% 내지 13% 술팜산, 0.6% 내지 1% 시트르산 및 적절한 양의 부식 억제제의 혼합 용액이다.Preferably, the chemical cleaning solution is a mixed solution of 8% to 13% sulfamic acid, 0.6% to 1% citric acid and an appropriate amount of a corrosion inhibitor.
바람직하게는, 화성액은 인산 수용액 또는 아프디산암모늄 수용액 또는 인산과 아프디산암모늄의 혼합 수용액이다.Preferably, the chemical conversion solution is an aqueous solution of phosphoric acid, an aqueous solution of ammonium aphdiate, or a mixed aqueous solution of phosphoric acid and ammonium aphdiate.
바람직하게는, 부식 억제제는 디부틸 티오우레아(dibutylthiourea), 질산 알루미늄, 푸란 및 Lna-826 중 하나 이상의 혼합 수용액이다.Preferably, the corrosion inhibitor is a mixed aqueous solution of at least one of dibutylthiourea, aluminum nitrate, furan and Lna-826.
상기 내용을 종합하면, 본 발명의 장점은 이하와 같다. 즉, 수득한 전극박의 잔류 코어 일관성이 우수하고 강도가 높으며 저항이 낮은 장점이 있고, 동시에 전극박 불순물 이온 함량을 1ppm 이하로 효율적으로 제어할 수 있으며 전극박의 전류 누설을 크게 줄여 사용수명을 향상시킬 수 있고, 표면 실장 알루미늄 전해 커패시터의 사용 기준을 충족시킬 수 있다.Summarizing the above, the advantages of the present invention are as follows. That is, the obtained electrode foil has advantages of excellent residual core consistency, high strength, and low resistance. At the same time, the impurity ion content of the electrode foil can be efficiently controlled to 1ppm or less, and the current leakage of the electrode foil is greatly reduced to shorten the service life. can be improved, and can meet the usage standards of surface mount aluminum electrolytic capacitors.
본 발명에 대한 이해를 돕기 위하여 이하에서는 실시예를 통해 본 발명을 더욱 상세하게 설명하며, 상기 실시예는 본 발명을 해석하기 위한 것으로 본 발명의 보호범위를 제한하지 않는다.In order to help the understanding of the present invention, the present invention will be described in more detail below by way of Examples, which are intended to interpret the present invention and do not limit the scope of protection of the present invention.
실시예 1Example 1
순도 99.98%의 91μm 두께 알루미늄박을 0.5%의 인산 용액에 1분 동안 침지시킨 후, 전류 밀도 1A/cm2의 순간 고주파 전류를 통해 표면 전해 처리를 진행하며, 반응 온도는 50℃이다. 상기 전처리를 거친 알루미늄박을 혼합 수용액에서 1차 전식을 진행하며, 전기 주파수는 80Hz이고 반응 온도는 20℃이고, 반응 시간은 1분이다. 다시 혼합 수용액에서 화학 부식을 진행하며 반응 온도는 40℃이고 반응 시간은 30초이다. 이어서 혼합 수용액에서 2차 전식을 진행하며 전기 주파수는 70Hz이고, 반응 온도는 20℃이고, 반응 시간은 2분 30초이다. 다시 혼합 수용액에서 3차 전식을 진행하며 전기 주파수는 60Hz이고, 반응 온도는 20℃이고, 반응 시간은 3분 30초이다. 알루미늄박을 5% 술팜산, 0.5% 시트르산 및 적절한 양의 부식 억제제를 함유하는 혼합 용액에서 후처리 세정을 진행하고, 후처리 세정액 온도는 75℃이고, 반응 시간은 3분이다. 40℃ 순수에서 6분간 헹군다. 알루미늄박을 오븐에 넣고 500℃에서 열처리를 진행하며, 열처리 과정은 불활성 가스 보호 분위기 또는 진공 상태에서 진행하고, 처리 시간은 30초이다. 알루미늄 박은 70℃에서 15%를 함유하는 화성액에서 10V의 전압을 인가하여 3분 동안 화성 처리를 진행한 후, 70℃에서 12%를 함유하는 화성액에서 25V의 전압을 인가하여 4분 동안 화성 처리를 진행한다. 다시 70℃에서 10%를 함유하는 화성액에서 35V의 전압을 인가하여 14분간 화성 처리를 진행한다. 이어서 60℃에서 인산과 아프디산암모늄의 하나 이상을 함유하는 혼합 수용액에서 2분간 처리한다. 그 후 오븐에서 450℃로 불활성 기체 보호 분위기 또는 진공 상태에서 열처리를 진행하며, 처리 시간은 120초이다. 다시 90℃에서 인산, 아프디산암모늄 및 ADP의 하나 이상을 함유하는 혼합 수용액에서 4분간 처리하며, 마지막으로 건조시켜 제품을 수득한다.After immersing a 91 μm thick aluminum foil with a purity of 99.98% in a 0.5% phosphoric acid solution for 1 minute, the surface electrolytic treatment is performed through an instantaneous high-frequency current with a current density of 1A/cm 2 , and the reaction temperature is 50°C. The aluminum foil that has undergone the pretreatment is subjected to a primary etch in a mixed aqueous solution, the electric frequency is 80 Hz, the reaction temperature is 20° C., and the reaction time is 1 minute. Chemical corrosion is performed again in the mixed aqueous solution, the reaction temperature is 40°C, and the reaction time is 30 seconds. Then, the secondary electrolysis is performed in the mixed aqueous solution, the electrical frequency is 70 Hz, the reaction temperature is 20 °C, and the reaction time is 2 minutes and 30 seconds. The third electrolysis is performed again in the mixed aqueous solution, the electric frequency is 60 Hz, the reaction temperature is 20 °C, and the reaction time is 3 minutes and 30 seconds. The aluminum foil was subjected to post-treatment cleaning in a mixed solution containing 5% sulfamic acid, 0.5% citric acid and an appropriate amount of corrosion inhibitor, the temperature of the post-treatment cleaning solution was 75° C., and the reaction time was 3 minutes. Rinse in pure water at 40°C for 6 minutes. The aluminum foil is put in an oven and heat treatment is performed at 500° C., and the heat treatment process is performed in an inert gas protective atmosphere or in a vacuum state, and the treatment time is 30 seconds. Aluminum foil was chemically treated for 3 minutes by applying a voltage of 10V in a chemical solution containing 15% at 70°C, and then chemical conversion by applying a voltage of 25V in a chemical solution containing 12% at 70°C for 4 minutes. proceed with processing. Again, a voltage of 35V is applied in a chemical solution containing 10% at 70° C. and chemical conversion treatment is performed for 14 minutes. Then, it is treated for 2 minutes in a mixed aqueous solution containing at least one of phosphoric acid and ammonium aphdiate at 60°C. Thereafter, heat treatment is performed in an oven at 450° C. in an inert gas protective atmosphere or vacuum, and the treatment time is 120 seconds. Again, it is treated in a mixed aqueous solution containing at least one of phosphoric acid, ammonium aphdiate and ADP at 90° C. for 4 minutes, and finally dried to obtain a product.
실시예 2Example 2
순도 99.98%의 91μm 두께 알루미늄박을 0.7%의 인산 용액에 1분 동안 침지시킨 후, 전류 밀도 1.5A/cm2의 순간 고주파 전류를 통해 표면 전해 처리를 진행하며, 반응 온도는 40℃이다. 상기 전처리를 거친 알루미늄박을 혼합 수용액에서 1차 전식을 진행하며, 전기 주파수는 70Hz이고 반응 온도는 30℃이고, 반응 시간은 1분이다. 다시 혼합 수용액에서 화학 부식을 진행하며 반응 온도는 50℃이고 반응 시간은 30초이다. 이어서 혼합 수용액에서 2차 전식을 진행하며 전기 주파수는 60Hz이고, 반응 온도는 30℃이고, 반응 시간은 2분 30초이다. 다시 혼합 수용액에서 3차 전식을 진행하며 전기 주파수는 50Hz이고, 반응 온도는 30℃이고, 반응 시간은 3분 30초이다. 알루미늄박을 10% 술팜산, 0.8% 시트르산 및 적절한 양의 부식 억제제를 함유하는 혼합 용액에서 후처리 세정을 진행하고, 후처리 세정액 온도는 65℃이고, 반응 시간은 4분이다. 40℃ 순수에서 8분간 헹군다. 알루미늄박을 오븐에 넣고 500℃에서 열처리를 진행하며, 열처리 과정은 불활성 가스 보호 분위기 또는 진공 상태에서 진행하고, 처리 시간은 40초이다. 알루미늄 박은 80℃에서 10%를 함유하는 화성액에서 10V의 전압을 인가하여 4분 동안 화성 처리를 진행한 후, 80℃에서 9%를 함유하는 화성액에서 25V의 전압을 인가하여 6분 동안 화성 처리를 진행한다. 다시 80℃에서 7%를 함유하는 화성액에서 35V의 전압을 인가하여 10분간 화성 처리를 진행한다. 이어서 50℃에서 인산과 아프디산암모늄의 하나 이상을 함유하는 혼합 수용액에서 4분간 처리한다. 그 후 오븐에서 470℃로 불활성 기체 보호 분위기 또는 진공 상태에서 열처리를 진행하며, 처리 시간은 90초이다. 다시 80℃에서 인산, 아프디산암모늄 및 ADP의 하나 이상을 함유하는 혼합 수용액에서 7분간 처리하며, 마지막으로 건조시킨다.After immersing a 91 μm thick aluminum foil with a purity of 99.98% in a 0.7% phosphoric acid solution for 1 minute, surface electrolytic treatment is performed through an instantaneous high-frequency current with a current density of 1.5A/cm 2 , and the reaction temperature is 40°C. The aluminum foil that has been subjected to the pretreatment is subjected to a primary transfer in a mixed aqueous solution, and the electric frequency is 70 Hz, the reaction temperature is 30° C., and the reaction time is 1 minute. Chemical corrosion is performed again in the mixed aqueous solution, the reaction temperature is 50°C, and the reaction time is 30 seconds. Then, the secondary electrolysis is performed in the mixed aqueous solution, the electric frequency is 60 Hz, the reaction temperature is 30° C., and the reaction time is 2 minutes and 30 seconds. The third electrolysis is performed again in the mixed aqueous solution, the electrical frequency is 50 Hz, the reaction temperature is 30 °C, and the reaction time is 3 minutes and 30 seconds. The aluminum foil was subjected to post-treatment cleaning in a mixed solution containing 10% sulfamic acid, 0.8% citric acid and an appropriate amount of corrosion inhibitor, the post-treatment cleaning liquid temperature was 65° C., and the reaction time was 4 minutes. Rinse in pure water at 40°C for 8 minutes. The aluminum foil is put in an oven and heat treatment is performed at 500° C., and the heat treatment process is performed in an inert gas protective atmosphere or vacuum state, and the treatment time is 40 seconds. The aluminum foil was chemically treated for 4 minutes by applying a voltage of 10V in a chemical solution containing 10% at 80°C, and then chemical conversion by applying a voltage of 25V in a chemical solution containing 9% at 80°C for 6 minutes. proceed with processing. Again, a voltage of 35V is applied in a chemical solution containing 7% at 80°C, and chemical conversion treatment is performed for 10 minutes. Then, it is treated in a mixed aqueous solution containing at least one of phosphoric acid and ammonium aphdiate at 50° C. for 4 minutes. After that, heat treatment is performed in an inert gas protective atmosphere or vacuum at 470° C. in an oven, and the treatment time is 90 seconds. Again, it is treated at 80° C. in a mixed aqueous solution containing at least one of phosphoric acid, ammonium aphdiate and ADP for 7 minutes, and finally dried.
실시예 3Example 3
순도 99.98%의 91μm 두께 알루미늄박을 1%의 인산 용액에 1분 동안 침지시킨 후, 전류 밀도 1A/cm2의 순간 고주파 전류를 통해 표면 전해 처리를 진행하며, 반응 온도는 30℃이다. 상기 전처리를 거친 알루미늄박을 혼합 수용액에서 1차 전식을 진행하며, 전기 주파수는 60Hz이고 반응 온도는 40℃이고, 반응 시간은 1분이다. 다시 혼합 수용액에서 화학 부식을 진행하며 반응 온도는 60℃이고 반응 시간은 30초이다. 이어서 혼합 수용액에서 2차 전식을 진행하며 전기 주파수는 50Hz이고, 반응 온도는 40℃이고, 반응 시간은 2분 30초이다. 다시 혼합 수용액에서 3차 전식을 진행하며 전기 주파수는 40Hz이고, 반응 온도는 30℃이고, 반응 시간은 3분 30초이다. 알루미늄박을 15% 술팜산, 1.5% 시트르산 및 적절한 양의 부식 억제제를 함유하는 혼합 용액에서 후처리 세정을 진행하고, 후처리 세정액 온도는 40℃이고, 반응 시간은 5분이다. 40℃ 순수에서 10분간 헹군다. 알루미늄박을 오븐에 넣고 500℃에서 열처리를 진행하며, 열처리 과정은 불활성 가스 보호 분위기 또는 진공 상태에서 진행하고, 처리 시간은 50초이다. 알루미늄 박은 90℃에서 8%를 함유하는 화성액에서 10V의 전압을 인가하여 5분 동안 화성 처리를 진행한 후, 90℃에서 7%를 함유하는 화성액에서 25V의 전압을 인가하여 7분 동안 화성 처리를 진행한다. 다시 90℃에서 5%를 함유하는 화성액에서 35V의 전압을 인가하여 14분간 화성 처리를 진행한다. 이어서 40℃에서 인산과 아프디산암모늄의 하나 이상을 함유하는 혼합 수용액에서 5분간 처리한다. 그 후 오븐에서 450℃로 불활성 기체 보호 분위기 또는 진공 상태에서 열처리를 진행하며, 처리 시간은 120초이다. 다시 90℃에서 인산, 아프디산암모늄 및 ADP의 하나 이상을 함유하는 혼합 수용액에서 10분간 처리하며, 마지막으로 건조시킨다.After immersing a 91 μm thick aluminum foil with a purity of 99.98% in a 1% phosphoric acid solution for 1 minute, surface electrolytic treatment is performed through an instantaneous high-frequency current with a current density of 1A/cm 2 , and the reaction temperature is 30°C. The aluminum foil that has undergone the pretreatment is subjected to a primary electrolysis in a mixed aqueous solution, the electric frequency is 60 Hz, the reaction temperature is 40° C., and the reaction time is 1 minute. Chemical corrosion is performed again in the mixed aqueous solution, the reaction temperature is 60°C, and the reaction time is 30 seconds. Then, the secondary electrolysis is performed in the mixed aqueous solution, the electrical frequency is 50 Hz, the reaction temperature is 40 °C, and the reaction time is 2 minutes and 30 seconds. The third electrolysis is performed again in the mixed aqueous solution, the electric frequency is 40 Hz, the reaction temperature is 30 °C, and the reaction time is 3 minutes and 30 seconds. The aluminum foil is subjected to post-treatment cleaning in a mixed solution containing 15% sulfamic acid, 1.5% citric acid and an appropriate amount of corrosion inhibitor, the temperature of the post-treatment cleaning solution is 40° C., and the reaction time is 5 minutes. Rinse in pure water at 40°C for 10 minutes. The aluminum foil is put in an oven and heat treatment is performed at 500° C., and the heat treatment process is performed in an inert gas protective atmosphere or vacuum state, and the treatment time is 50 seconds. Aluminum foil was chemically treated for 5 minutes by applying a voltage of 10V in a chemical solution containing 8% at 90°C, and then chemical conversion by applying a voltage of 25V in a chemical solution containing 7% at 90°C for 7 minutes. proceed with processing. Again, a voltage of 35V is applied in a chemical solution containing 5% at 90° C., and chemical conversion treatment is performed for 14 minutes. Then, it is treated in a mixed aqueous solution containing at least one of phosphoric acid and ammonium aphdiate at 40° C. for 5 minutes. Thereafter, heat treatment is performed in an oven at 450° C. in an inert gas protective atmosphere or vacuum, and the treatment time is 120 seconds. It is again treated in a mixed aqueous solution containing at least one of phosphoric acid, ammonium aphdiate and ADP at 90° C. for 10 minutes, and finally dried.
실시예 4Example 4
순도 99.98%의 91μm 두께 알루미늄박을 0.8%의 인산 용액에 1분 동안 침지시킨 후, 전류 밀도 1A/cm2의 순간 고주파 전류를 통해 표면 전해 처리를 진행하며, 반응 온도는 30℃이다. 상기 전처리를 거친 알루미늄박을 혼합 수용액에서 1차 전식을 진행하며, 전기 주파수는 55Hz이고 반응 온도는 40℃이고, 반응 시간은 1분이다. 다시 혼합 수용액에서 화학 부식을 진행하며 반응 온도는 60℃이고 반응 시간은 30초이다. 이어서 혼합 수용액에서 2차 전식을 진행하며 전기 주파수는 40Hz이고, 반응 온도는 40℃이고, 반응 시간은 2분 30초이다. 다시 혼합 수용액에서 3차 전식을 진행하며 전기 주파수는 40Hz이고, 반응 온도는 40℃이고, 반응 시간은 3분 30초이다. 알루미늄박을 15% 술팜산, 1.5% 시트르산 및 적절한 양의 부식 억제제를 함유하는 혼합 용액에서 후처리 세정을 진행하고, 후처리 세정액 온도는 55℃이고, 반응 시간은 5분이다. 40℃ 순수에서 9분간 헹군다. 알루미늄박을 오븐에 넣고 500℃에서 열처리를 진행하며, 열처리 과정은 불활성 가스 보호 분위기 또는 진공 상태에서 진행하고, 처리 시간은 50초이다. 알루미늄 박은 90℃에서 7%를 함유하는 화성액에서 10V의 전압을 인가하여 5분 동안 화성 처리를 진행한 후, 90℃에서 6%를 함유하는 화성액에서 25V의 전압을 인가하여 7분 동안 화성 처리를 진행한다. 다시 90℃에서 4%를 함유하는 화성액에서 35V의 전압을 인가하여 7분간 화성 처리를 진행한다. 이어서 30℃에서 인산과 아프디산암모늄의 하나 이상을 함유하는 혼합 수용액에서 3분간 처리한다. 그 후 오븐에서 500℃로 불활성 기체 보호 분위기 또는 진공 상태에서 열처리를 진행하며, 처리 시간은 60초이다. 다시 70℃에서 인산, 아프디산암모늄 및 ADP의 하나 이상을 함유하는 혼합 수용액에서 10분간 처리하며, 마지막으로 건조시킨다.After immersing a 91 μm thick aluminum foil with a purity of 99.98% in a 0.8% phosphoric acid solution for 1 minute, the surface electrolytic treatment is performed through an instantaneous high-frequency current with a current density of 1A/cm 2 , and the reaction temperature is 30°C. The aluminum foil that has been subjected to the pretreatment is subjected to a primary transfer in a mixed aqueous solution, the electric frequency is 55 Hz, the reaction temperature is 40° C., and the reaction time is 1 minute. Chemical corrosion is performed again in the mixed aqueous solution, the reaction temperature is 60°C, and the reaction time is 30 seconds. Then, the secondary electrolysis is performed in the mixed aqueous solution, the electric frequency is 40 Hz, the reaction temperature is 40 °C, and the reaction time is 2 minutes and 30 seconds. The third electrolysis is performed again in the mixed aqueous solution, the electric frequency is 40 Hz, the reaction temperature is 40 °C, and the reaction time is 3 minutes and 30 seconds. The aluminum foil was subjected to post-treatment cleaning in a mixed solution containing 15% sulfamic acid, 1.5% citric acid and an appropriate amount of corrosion inhibitor, the post-treatment cleaning liquid temperature was 55° C., and the reaction time was 5 minutes. Rinse in pure water at 40°C for 9 minutes. The aluminum foil is put in an oven and heat treatment is performed at 500° C., and the heat treatment process is performed in an inert gas protective atmosphere or vacuum state, and the treatment time is 50 seconds. The aluminum foil was chemically treated for 5 minutes by applying a voltage of 10V in a chemical solution containing 7% at 90°C, and then chemical conversion by applying a voltage of 25V in a chemical solution containing 6% at 90°C for 7 minutes. proceed with processing. Again, a voltage of 35V is applied in a chemical solution containing 4% at 90° C. and the chemical conversion treatment is performed for 7 minutes. Then, it is treated in a mixed aqueous solution containing at least one of phosphoric acid and ammonium aphdiate at 30° C. for 3 minutes. Thereafter, heat treatment is performed in an oven at 500° C. in an inert gas protective atmosphere or in a vacuum state, and the treatment time is 60 seconds. Again, it is treated in a mixed aqueous solution containing at least one of phosphoric acid, ammonium aphdiate and ADP at 70° C. for 10 minutes, and finally dried.
표 1은 실시예 1 내지 4에서 수득한 화성박 5스팟 용량 분산차, 절곡, 접촉 저항 및 대표적 불순물 이온 함량과 종래 방법의 비교표이다.Table 1 is a comparison table of the 5 spot capacity dispersion difference, bending, contact resistance and typical impurity ion content obtained in Examples 1 to 4 and the conventional method.
종래 방법에서 전극박 표면 각 스팟의 비정전용량 차이가 비교적 크며 각 스팟 절곡 횟수가 비교적 적고 저항이 크며 염화 이온 함량이 높다. 본 출원의 제조 방법은 상기 각 매개변수를 모두 최적화하였다.In the conventional method, the difference in specific capacitance of each spot on the surface of the electrode foil is relatively large, the number of bending of each spot is relatively small, the resistance is large, and the chloride ion content is high. In the manufacturing method of the present application, all of the above parameters were optimized.
Claims (5)
A. 순도 99.98%의 91μm 두께 알루미늄박을 0.5% 내지 1%의 인산 용액에 1분 동안 침지시킨 후, 전류 밀도 1A/cm2 내지 2A/cm2의 순간 고주파 전류를 통해 표면 전기 분해 처리를 진행하며, 반응 온도는 20℃ 내지 50℃인 단계;
B. 상기 전기 분해 처리를 거친 알루미늄박을 염산, 황산, 인산 및 부식 억제제의 혼합 수용액에서 1차 전식을 진행하며, 전기 주파수는 55Hz 내지 80Hz이고, 반응 온도는 20℃ 내지 40℃이고, 반응 시간은 1분이고; 그 후 혼합 수용액에서 화학적 부식을 진행하며, 반응 온도는 40℃ 내지 60℃이고, 반응 시간은 30초이고; 이어서, 혼합 수용액에서 2차 전식을 진행하며 전기 주파수는 40Hz 내지 70Hz이고, 반응 온도는 20℃ 내지 40℃이고, 반응 시간은 2분 30초이고; 다시 혼합 수용액에서 3차 전식을 진행하며, 전기 주파수는 30Hz 내지 60Hz이고, 반응 온도는 20℃ 내지 40℃이고, 반응 시간은 3분 30초인 단계;
C. 알루미늄박을 화학 세정액에 넣고 후처리 세정을 진행하며, 화학 세정액 온도는 40℃ 내지 75℃이고, 반응 시간은 3분 내지 5분인 단계;
D. 40℃ 순수한 물에서 6분 내지 10분 동안 헹구는 단계;
E. 알루미늄박을 오븐에 넣고 500℃에서 열처리를 진행하며, 열처리 과정은 불활성 가스 보호 분위기 또는 진공 상태에서 진행하고, 처리 시간은 30초 내지 50초인 단계;
F. 알루미늄 박을 70℃ 내지 90℃에서 인산 수용액 또는 아프디산암모늄 수용액 또는 인산과 아프디산암모늄의 혼합 수용액 7% 내지 15%를 함유하는 화성액에서 10V의 전압을 인가해 화성 처리를 3분 내지 5분 동안 진행하고; 그 후 70℃ 내지 90℃에서 인산 수용액 또는 아프디산암모늄 수용액 또는 인산과 아프디산암모늄의 혼합 수용액 6% 내지 12%를 함유하는 화성액에서 25V의 전압을 인가하여 4분 내지 7분 동안 화성처리를 진행하고; 다시 70℃ 내지 90℃에서 인산 수용액 또는 아프디산암모늄 수용액 또는 인산과 아프디산암모늄의 혼합 수용액 4% 내지 10%를 함유하는 화성액에서 35V의 전압을 인가하여 7분 내지 14분 동안 화성처리를 진행하고; 이어서 30℃ 내지 60℃에서 인산과 아디프산암모늄(ammonium adipate)의 하나 이상을 함유하는 혼합 수용액에서 2분 내지 5분간 처리하고; 그 후 오븐에서 450℃ 내지 500℃로 불활성 기체 보호 분위기 또는 진공 상태에서 열처리를 진행하며 처리 시간은 60초 내지 120초이고; 다시 70℃ 내지 90℃에서 인산, 아디프산암모늄 및 ADP(ammonium dihydrogen phosphate)의 하나 이상을 함유하는 혼합 수용액에서 4분 내지 10분간 처리하며; 마지막으로 건조시키는 단계;를 포함하는 것을 특징으로 하는 표면 실장 알루미늄 전해 커패시터용 전극박의 제조 방법.A method for manufacturing an electrode foil for a surface-mounted aluminum electrolytic capacitor, the method comprising:
A. After immersing a 91 μm thick aluminum foil with a purity of 99.98% in a 0.5% to 1% phosphoric acid solution for 1 minute, surface electrolysis treatment is performed through an instantaneous high-frequency current with a current density of 1A/cm 2 to 2A/cm 2 and the reaction temperature is 20° C. to 50° C.;
B. The aluminum foil that has undergone the electrolysis treatment is first etched in a mixed aqueous solution of hydrochloric acid, sulfuric acid, phosphoric acid and a corrosion inhibitor, the electrical frequency is 55 Hz to 80 Hz, the reaction temperature is 20 ° C to 40 ° C, and the reaction time is 1 minute; After that, chemical corrosion is performed in a mixed aqueous solution, the reaction temperature is 40° C. to 60° C., and the reaction time is 30 seconds; Then, the secondary electrolysis is performed in the mixed aqueous solution, the electric frequency is 40 Hz to 70 Hz, the reaction temperature is 20 ° C to 40 ° C, and the reaction time is 2 minutes and 30 seconds; The third electrolysis is performed again in a mixed aqueous solution, the electric frequency is 30 Hz to 60 Hz, the reaction temperature is 20° C. to 40° C., and the reaction time is 3 minutes and 30 seconds;
C. Putting the aluminum foil in a chemical cleaning solution and performing post-treatment cleaning, the chemical cleaning solution temperature is 40° C. to 75° C., and the reaction time is 3 minutes to 5 minutes;
D. rinsing in pure water at 40° C. for 6 to 10 minutes;
E. Put the aluminum foil in an oven and perform heat treatment at 500° C., the heat treatment process is performed in an inert gas protective atmosphere or vacuum, and the treatment time is 30 seconds to 50 seconds;
F. The aluminum foil is chemically treated by applying a voltage of 10V in a chemical solution containing 7% to 15% of an aqueous solution of phosphoric acid or an aqueous solution of ammonium aphdiate or a mixed aqueous solution of phosphoric acid and ammonium aphdiate at 70° C. to 90° C. for 3 minutes to run for 5 minutes; After that, chemical conversion treatment is performed for 4 to 7 minutes by applying a voltage of 25V to a chemical solution containing 6% to 12% of an aqueous phosphoric acid solution or an aqueous ammonium aphdiate solution or a mixed aqueous solution of phosphoric acid and ammonium aphdiate at 70° C. to 90° C. proceed; Again, chemical conversion treatment is performed for 7 to 14 minutes by applying a voltage of 35V to a chemical solution containing 4% to 10% of an aqueous phosphoric acid solution or an aqueous ammonium aphdiate solution or a mixed aqueous solution of phosphoric acid and ammonium aphdiate at 70° C. to 90° C. do; followed by treatment in a mixed aqueous solution containing at least one of phosphoric acid and ammonium adipate at 30° C. to 60° C. for 2 minutes to 5 minutes; After that, heat treatment is performed in an oven at 450° C. to 500° C. in an inert gas protective atmosphere or vacuum, and the treatment time is 60 seconds to 120 seconds; again at 70° C. to 90° C. in a mixed aqueous solution containing at least one of phosphoric acid, ammonium adipate and ammonium dihydrogen phosphate (ADP) for 4 to 10 minutes; Finally, drying; a method of manufacturing an electrode foil for a surface mount aluminum electrolytic capacitor comprising:
상기 화학 세정액은 8% 내지 13% 술팜산, 0.6% 내지 1% 시트르산 및 부식 억제제의 혼합 용액인 것을 특징으로 하는 표면 실장 알루미늄 전해 커패시터용 전극박의 제조 방법.According to claim 1,
The chemical cleaning solution is a method of manufacturing an electrode foil for a surface mount aluminum electrolytic capacitor, characterized in that the mixed solution of 8% to 13% sulfamic acid, 0.6% to 1% citric acid and a corrosion inhibitor.
상기 부식 억제제는 디부틸 티오우레아(dibutylthiourea), 질산 알루미늄, 푸란 및 Lna-826 중 하나 이상의 혼합 수용액인 것을 특징으로 하는 표면 실장 알루미늄 전해 커패시터용 전극박의 제조 방법.According to claim 1,
The method of manufacturing an electrode foil for a surface mount aluminum electrolytic capacitor, characterized in that the corrosion inhibitor is a mixed aqueous solution of at least one of dibutylthiourea, aluminum nitrate, furan and Lna-826.
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