KR102315301B1 - 반송 패드 및 웨이퍼의 반송 방법 - Google Patents
반송 패드 및 웨이퍼의 반송 방법 Download PDFInfo
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- KR102315301B1 KR102315301B1 KR1020170123523A KR20170123523A KR102315301B1 KR 102315301 B1 KR102315301 B1 KR 102315301B1 KR 1020170123523 A KR1020170123523 A KR 1020170123523A KR 20170123523 A KR20170123523 A KR 20170123523A KR 102315301 B1 KR102315301 B1 KR 102315301B1
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- 238000000034 method Methods 0.000 title claims description 11
- 238000012546 transfer Methods 0.000 claims abstract description 72
- 235000012431 wafers Nutrition 0.000 description 98
- 238000012545 processing Methods 0.000 description 9
- 230000000694 effects Effects 0.000 description 4
- 238000001179 sorption measurement Methods 0.000 description 4
- 238000012423 maintenance Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 238000007664 blowing Methods 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 229920006351 engineering plastic Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/6773—Conveying cassettes, containers or carriers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67784—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations using air tracks
- H01L21/6779—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations using air tracks the workpieces being stored in a carrier, involving loading and unloading
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
- H01L21/682—Mask-wafer alignment
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Manipulator (AREA)
Abstract
유지면(10b)에 형성되어 유지면(10b)을 따라 에어를 분출하는 에어 분출구(100)와, 에어 분출구(100)로부터 분출된 에어를 유지면(10b)의 바깥 둘레 가장자리를 향하여 직선형으로 흐르게 하는 홈(101)을 구비하고, 홈(101)에 에어를 흐르게 함으로써 홈(101)의 주위에 발생되는 부압의 강약을 홈(101)에 흐르게 하는 에어의 유량으로 조정하여 유지면(10b)에서 웨이퍼를 유지하는 반송 패드(1)이다.
Description
도 2는 반송 패드로 웨이퍼를 반송하는 상태의 일례를 나타내는 사시도이다.
100: 에어 분출구 101: 홈 101a: 한쪽의 단부 101b: 홈의 다른쪽의 단부
102: 접속구 109: 가이드부
20: 아암부 21: 연결 부재 21a: 유로
23: 에어 공급로 24: 에어 공급원 25: 유량 조절부
3: 이동 수단
W: 웨이퍼 Wa: 웨이퍼의 표면 Wb: 웨이퍼의 이면
T: 유지 테이블 T1: 흡착부 T1a: 유지면 T2: 프레임
Claims (2)
- 유지면에서 웨이퍼를 유지하는 판형의 반송 패드를 이용한 웨이퍼의 반송 방법으로서,
상기 반송 패드는, 상기 유지면에 형성되어 상기 유지면을 따라 에어를 분출하는 에어 분출구와, 상기 에어 분출구로부터 분출된 에어를 상기 유지면의 바깥 둘레 가장자리를 향하여 직선형으로 흐르게 하는 홈을 구비하고,
상기 홈에 에어를 흐르게 함으로써 상기 홈의 주위에 발생되는 부압의 강약을 상기 홈에 흐르게 하는 에어의 유량으로 조정하여 상기 유지면에서 웨이퍼를 유지 가능하고,
상기 반송 패드에는, 상기 에어 분출구로부터 분출시켜 상기 홈에 흐르게 하는 에어의 유량을 제1 에어 유량과 상기 제1 에어 유량보다 많은 유량의 제2 에어 유량으로 조절 가능한 유량 조절부가 접속되고, 상기 유량 조절부는 스로틀 밸브로서, 밸브 내부의 에어의 통과 유량을 파악 가능하게 하는 유량계를 구비하며,
상기 반송 패드는, 상기 유지면에 의해 웨이퍼를 비접촉으로 유지할 때에는, 상기 제1 에어 유량의 에어를 상기 홈에 흐르게 하고, 상기 유지면에 웨이퍼를 접촉시켜 상기 유지면에 의해 웨이퍼를 유지할 때에는, 상기 제2 에어 유량의 에어를 상기 홈에 흐르게 함으로써, 웨이퍼의 비접촉 유지와 접촉 유지를 선택적으로 행하는 웨이퍼의 반송 방법. - 삭제
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016196281A JP6814009B2 (ja) | 2016-10-04 | 2016-10-04 | 搬送パッド及びウエーハの搬送方法 |
JPJP-P-2016-196281 | 2016-10-04 |
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KR20180037576A KR20180037576A (ko) | 2018-04-12 |
KR102315301B1 true KR102315301B1 (ko) | 2021-10-19 |
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KR1020170123523A KR102315301B1 (ko) | 2016-10-04 | 2017-09-25 | 반송 패드 및 웨이퍼의 반송 방법 |
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JP (1) | JP6814009B2 (ko) |
KR (1) | KR102315301B1 (ko) |
CN (1) | CN107895708B (ko) |
TW (1) | TWI723212B (ko) |
Families Citing this family (3)
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JP2020032476A (ja) * | 2018-08-28 | 2020-03-05 | リンク・パワー株式会社 | 非接触保持装置、非接触保持システム、非接触搬送システム、及び非接触保持方法 |
CN109300832A (zh) * | 2018-08-28 | 2019-02-01 | 湖州景盛新能源有限公司 | 一种太阳能电池片生产用吸取装置 |
KR102594542B1 (ko) * | 2018-10-31 | 2023-10-26 | 세메스 주식회사 | 다이 이젝팅 장치 |
Citations (3)
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KR100859835B1 (ko) * | 2008-05-13 | 2008-09-23 | 한국뉴매틱(주) | 비접촉식 진공패드 |
KR101289973B1 (ko) | 2012-01-26 | 2013-07-26 | 금오공과대학교 산학협력단 | 공압을 이용한 이송용 부상장치 |
US20150306774A1 (en) | 2014-04-25 | 2015-10-29 | Toyota Jidosha Kabushiki Kaisha | Non-contact transfer hand |
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US5067762A (en) * | 1985-06-18 | 1991-11-26 | Hiroshi Akashi | Non-contact conveying device |
JPH08203984A (ja) * | 1995-01-25 | 1996-08-09 | Oki Electric Ind Co Ltd | ベルヌーイチャック及びそれを用いたウエハの搬送方法 |
JP4342331B2 (ja) * | 2004-02-09 | 2009-10-14 | 株式会社コガネイ | 非接触搬送装置 |
JP2009032744A (ja) * | 2007-07-24 | 2009-02-12 | Fluoro Mechanic Kk | ベルヌーイチャック |
JP2009032981A (ja) * | 2007-07-27 | 2009-02-12 | Ihi Corp | 非接触搬送装置 |
JP2010253567A (ja) * | 2009-04-21 | 2010-11-11 | Seiko Epson Corp | 吸引保持ハンド、吸引保持方法、及び搬送装置 |
JP5877005B2 (ja) * | 2011-07-29 | 2016-03-02 | 株式会社Screenホールディングス | 基板処理装置、基板保持装置、および、基板保持方法 |
JP2014204089A (ja) | 2013-04-09 | 2014-10-27 | 株式会社ディスコ | ウェーハ搬送機構及びウェーハの加工方法 |
JP6250435B2 (ja) * | 2014-02-26 | 2017-12-20 | 光洋機械工業株式会社 | 両頭平面研削法 |
JP5908136B1 (ja) * | 2015-03-03 | 2016-04-26 | 株式会社ハーモテック | 吸引装置 |
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- 2016-10-04 JP JP2016196281A patent/JP6814009B2/ja active Active
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- 2017-09-05 TW TW106130305A patent/TWI723212B/zh active
- 2017-09-22 CN CN201710864989.4A patent/CN107895708B/zh active Active
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Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
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KR100859835B1 (ko) * | 2008-05-13 | 2008-09-23 | 한국뉴매틱(주) | 비접촉식 진공패드 |
KR101289973B1 (ko) | 2012-01-26 | 2013-07-26 | 금오공과대학교 산학협력단 | 공압을 이용한 이송용 부상장치 |
US20150306774A1 (en) | 2014-04-25 | 2015-10-29 | Toyota Jidosha Kabushiki Kaisha | Non-contact transfer hand |
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Publication number | Publication date |
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TW201816919A (zh) | 2018-05-01 |
KR20180037576A (ko) | 2018-04-12 |
CN107895708B (zh) | 2023-07-25 |
JP6814009B2 (ja) | 2021-01-13 |
CN107895708A (zh) | 2018-04-10 |
JP2018060881A (ja) | 2018-04-12 |
TWI723212B (zh) | 2021-04-01 |
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