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KR102169506B1 - 빔 주사 장치, 빔 주사 방법, 및 패턴 묘화 장치 - Google Patents

빔 주사 장치, 빔 주사 방법, 및 패턴 묘화 장치 Download PDF

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Publication number
KR102169506B1
KR102169506B1 KR1020177025837A KR20177025837A KR102169506B1 KR 102169506 B1 KR102169506 B1 KR 102169506B1 KR 1020177025837 A KR1020177025837 A KR 1020177025837A KR 20177025837 A KR20177025837 A KR 20177025837A KR 102169506 B1 KR102169506 B1 KR 102169506B1
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KR
South Korea
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incident
central axis
scanning
substrate
irradiated surface
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Korean (ko)
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KR20170127460A (ko
Inventor
도모나리 스즈키
마사키 가토
히로키 고미야마
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가부시키가이샤 니콘
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G03F7/70366—Rotary scanning
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G02B26/12—Scanning systems using multifaceted mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G02B26/12—Scanning systems using multifaceted mirrors
    • G02B26/124—Details of the optical system between the light source and the polygonal mirror
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mechanical Optical Scanning Systems (AREA)
KR1020177025837A 2015-03-20 2016-03-18 빔 주사 장치, 빔 주사 방법, 및 패턴 묘화 장치 Active KR102169506B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2015057906 2015-03-20
JPJP-P-2015-057906 2015-03-20
PCT/JP2016/058644 WO2016152758A1 (ja) 2015-03-20 2016-03-18 ビーム走査装置、ビーム走査方法、および描画装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020207005939A Division KR102195908B1 (ko) 2015-03-20 2016-03-18 패턴 묘화 장치 및 패턴 묘화 방법

Publications (2)

Publication Number Publication Date
KR20170127460A KR20170127460A (ko) 2017-11-21
KR102169506B1 true KR102169506B1 (ko) 2020-10-23

Family

ID=56979222

Family Applications (2)

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KR1020207005939A Active KR102195908B1 (ko) 2015-03-20 2016-03-18 패턴 묘화 장치 및 패턴 묘화 방법
KR1020177025837A Active KR102169506B1 (ko) 2015-03-20 2016-03-18 빔 주사 장치, 빔 주사 방법, 및 패턴 묘화 장치

Family Applications Before (1)

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KR1020207005939A Active KR102195908B1 (ko) 2015-03-20 2016-03-18 패턴 묘화 장치 및 패턴 묘화 방법

Country Status (5)

Country Link
JP (2) JP6740999B2 (ja)
KR (2) KR102195908B1 (ja)
CN (5) CN110596888B (ja)
TW (3) TWI698662B (ja)
WO (1) WO2016152758A1 (ja)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110596888B (zh) * 2015-03-20 2022-04-01 株式会社尼康 图案描绘装置
WO2018066286A1 (ja) * 2016-10-04 2018-04-12 株式会社ニコン ビーム走査装置およびパターン描画装置
TWI736621B (zh) * 2016-10-04 2021-08-21 日商尼康股份有限公司 圖案描繪裝置及圖案描繪方法
WO2019065224A1 (ja) * 2017-09-26 2019-04-04 株式会社ニコン パターン描画装置
WO2019082850A1 (ja) 2017-10-25 2019-05-02 株式会社ニコン パターン描画装置
CN114740630B (zh) * 2022-06-15 2022-09-16 西安炬光科技股份有限公司 一种扫描光学系统及激光应用终端

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JP2001033899A (ja) 1999-06-29 2001-02-09 Eastman Kodak Co 書込み用レーザビームとレンチキュラー材料内のレンチキュラーとの間のスキューの検出方法とレンチキュラーイメージ生成物の形成方法
JP2005309336A (ja) * 2004-04-26 2005-11-04 Ricoh Co Ltd 光走査方法・光走査装置および画像形成方法および画像形成装置
JP2010066402A (ja) * 2008-09-09 2010-03-25 Sharp Corp 光走査装置及び画像形成装置

Also Published As

Publication number Publication date
CN110596886B (zh) 2021-12-07
CN110596887B (zh) 2022-04-01
KR20170127460A (ko) 2017-11-21
TWI718030B (zh) 2021-02-01
TW201704889A (zh) 2017-02-01
JPWO2016152758A1 (ja) 2017-12-28
WO2016152758A1 (ja) 2016-09-29
TW202028887A (zh) 2020-08-01
CN110596888B (zh) 2022-04-01
JP7074160B2 (ja) 2022-05-24
CN111638631B (zh) 2023-03-10
KR102195908B1 (ko) 2020-12-29
JP6740999B2 (ja) 2020-08-19
TW202024716A (zh) 2020-07-01
JP2020194167A (ja) 2020-12-03
CN107430272B (zh) 2020-05-29
CN111638631A (zh) 2020-09-08
CN110596886A (zh) 2019-12-20
TWI698662B (zh) 2020-07-11
CN107430272A (zh) 2017-12-01
CN110596887A (zh) 2019-12-20
CN110596888A (zh) 2019-12-20
KR20200024956A (ko) 2020-03-09
TWI691799B (zh) 2020-04-21

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