KR102065203B1 - Silicone composition for sealing optical semiconductor element, and optical semiconductor device - Google Patents
Silicone composition for sealing optical semiconductor element, and optical semiconductor device Download PDFInfo
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- KR102065203B1 KR102065203B1 KR1020157006295A KR20157006295A KR102065203B1 KR 102065203 B1 KR102065203 B1 KR 102065203B1 KR 1020157006295 A KR1020157006295 A KR 1020157006295A KR 20157006295 A KR20157006295 A KR 20157006295A KR 102065203 B1 KR102065203 B1 KR 102065203B1
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- component
- optical semiconductor
- semiconductor element
- sealing
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- 239000000203 mixture Substances 0.000 title claims abstract description 91
- 239000004065 semiconductor Substances 0.000 title claims abstract description 81
- 230000003287 optical effect Effects 0.000 title claims abstract description 78
- 229920001296 polysiloxane Polymers 0.000 title claims abstract description 69
- 238000007789 sealing Methods 0.000 title claims abstract description 53
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 74
- 125000003342 alkenyl group Chemical group 0.000 claims abstract description 50
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 35
- 239000000463 material Substances 0.000 claims abstract description 22
- 239000000843 powder Substances 0.000 claims abstract description 20
- 238000002834 transmittance Methods 0.000 claims abstract description 18
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 10
- 238000006459 hydrosilylation reaction Methods 0.000 claims abstract description 10
- 239000007809 chemical reaction catalyst Substances 0.000 claims abstract description 6
- 230000003197 catalytic effect Effects 0.000 claims abstract description 4
- -1 siloxane unit Chemical group 0.000 claims description 39
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 24
- 125000000217 alkyl group Chemical group 0.000 claims description 17
- 239000003795 chemical substances by application Substances 0.000 claims description 16
- 238000000034 method Methods 0.000 claims description 16
- 229910052710 silicon Inorganic materials 0.000 claims description 15
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 15
- 229910052736 halogen Inorganic materials 0.000 claims description 14
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 12
- 125000003118 aryl group Chemical group 0.000 claims description 11
- 239000007788 liquid Substances 0.000 claims description 11
- 125000005370 alkoxysilyl group Chemical group 0.000 claims description 8
- 125000003700 epoxy group Chemical group 0.000 claims description 8
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 4
- 150000002367 halogens Chemical class 0.000 claims description 4
- 125000000962 organic group Chemical group 0.000 claims description 3
- 239000003566 sealing material Substances 0.000 abstract description 10
- ZZUFCTLCJUWOSV-UHFFFAOYSA-N furosemide Chemical compound C1=C(Cl)C(S(=O)(=O)N)=CC(C(O)=O)=C1NCC1=CC=CO1 ZZUFCTLCJUWOSV-UHFFFAOYSA-N 0.000 abstract 1
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 description 16
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 14
- 239000000047 product Substances 0.000 description 14
- 125000005843 halogen group Chemical group 0.000 description 12
- 239000000758 substrate Substances 0.000 description 10
- 239000003054 catalyst Substances 0.000 description 9
- 125000004432 carbon atom Chemical group C* 0.000 description 8
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 8
- 239000006087 Silane Coupling Agent Substances 0.000 description 7
- 230000002349 favourable effect Effects 0.000 description 7
- 238000005259 measurement Methods 0.000 description 7
- 125000005375 organosiloxane group Chemical group 0.000 description 7
- 229910052697 platinum Inorganic materials 0.000 description 7
- 238000006116 polymerization reaction Methods 0.000 description 7
- 239000000443 aerosol Substances 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 229920001577 copolymer Polymers 0.000 description 5
- 238000011156 evaluation Methods 0.000 description 5
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 5
- 229920000642 polymer Polymers 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- 229920002050 silicone resin Polymers 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- 239000000853 adhesive Substances 0.000 description 4
- 230000000903 blocking effect Effects 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- 238000004132 cross linking Methods 0.000 description 4
- 150000007973 cyanuric acids Chemical class 0.000 description 4
- 235000013870 dimethyl polysiloxane Nutrition 0.000 description 4
- 125000005388 dimethylhydrogensiloxy group Chemical group 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 230000035699 permeability Effects 0.000 description 4
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 239000007795 chemical reaction product Substances 0.000 description 3
- 125000004122 cyclic group Chemical group 0.000 description 3
- 239000004205 dimethyl polysiloxane Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 239000010419 fine particle Substances 0.000 description 3
- 125000000524 functional group Chemical group 0.000 description 3
- 150000002430 hydrocarbons Chemical group 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 229920001843 polymethylhydrosiloxane Polymers 0.000 description 3
- 229920001451 polypropylene glycol Polymers 0.000 description 3
- 239000002683 reaction inhibitor Substances 0.000 description 3
- 238000004381 surface treatment Methods 0.000 description 3
- 239000008096 xylene Substances 0.000 description 3
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 239000004721 Polyphenylene oxide Substances 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 238000007259 addition reaction Methods 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- 229920005601 base polymer Polymers 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 125000004218 chloromethyl group Chemical group [H]C([H])(Cl)* 0.000 description 2
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 2
- 229910021485 fumed silica Inorganic materials 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical group OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 2
- 238000004898 kneading Methods 0.000 description 2
- 239000011859 microparticle Substances 0.000 description 2
- 125000001624 naphthyl group Chemical group 0.000 description 2
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229920000570 polyether Polymers 0.000 description 2
- 238000004382 potting Methods 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- 230000008719 thickening Effects 0.000 description 2
- 125000003944 tolyl group Chemical group 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- 125000005023 xylyl group Chemical group 0.000 description 2
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- CEBKHWWANWSNTI-UHFFFAOYSA-N 2-methylbut-3-yn-2-ol Chemical compound CC(C)(O)C#C CEBKHWWANWSNTI-UHFFFAOYSA-N 0.000 description 1
- OXYZDRAJMHGSMW-UHFFFAOYSA-N 3-chloropropyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCCl OXYZDRAJMHGSMW-UHFFFAOYSA-N 0.000 description 1
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 1
- 229910002018 Aerosil® 300 Inorganic materials 0.000 description 1
- 238000004438 BET method Methods 0.000 description 1
- 229920001342 Bakelite® Polymers 0.000 description 1
- HQLAGUDDYLICCN-UHFFFAOYSA-N C(=C)[Si](N[Si](N[Si](C=C)(C)C)(C)C)(C)C Chemical compound C(=C)[Si](N[Si](N[Si](C=C)(C)C)(C)C)(C)C HQLAGUDDYLICCN-UHFFFAOYSA-N 0.000 description 1
- 229920001875 Ebonite Polymers 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- KWYHDKDOAIKMQN-UHFFFAOYSA-N N,N,N',N'-tetramethylethylenediamine Chemical compound CN(C)CCN(C)C KWYHDKDOAIKMQN-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- SZKKRCSOSQAJDE-UHFFFAOYSA-N Schradan Chemical group CN(C)P(=O)(N(C)C)OP(=O)(N(C)C)N(C)C SZKKRCSOSQAJDE-UHFFFAOYSA-N 0.000 description 1
- 229910008051 Si-OH Inorganic materials 0.000 description 1
- 229910006358 Si—OH Inorganic materials 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- NCLNPSIKIBQDBM-UHFFFAOYSA-N [[[bis(ethenyl)-methylsilyl]amino]-ethenyl-methylsilyl]ethene Chemical compound C=C[Si](C=C)(C)N[Si](C)(C=C)C=C NCLNPSIKIBQDBM-UHFFFAOYSA-N 0.000 description 1
- WYUIWUCVZCRTRH-UHFFFAOYSA-N [[[ethenyl(dimethyl)silyl]amino]-dimethylsilyl]ethene Chemical compound C=C[Si](C)(C)N[Si](C)(C)C=C WYUIWUCVZCRTRH-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 125000003302 alkenyloxy group Chemical group 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 125000004104 aryloxy group Chemical group 0.000 description 1
- 239000004637 bakelite Substances 0.000 description 1
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 1
- 239000012964 benzotriazole Substances 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- CSXPRVTYIFRYPR-UHFFFAOYSA-N bis(ethenyl)-diethoxysilane Chemical compound CCO[Si](C=C)(C=C)OCC CSXPRVTYIFRYPR-UHFFFAOYSA-N 0.000 description 1
- ZPECUSGQPIKHLT-UHFFFAOYSA-N bis(ethenyl)-dimethoxysilane Chemical compound CO[Si](OC)(C=C)C=C ZPECUSGQPIKHLT-UHFFFAOYSA-N 0.000 description 1
- 229920001400 block copolymer Polymers 0.000 description 1
- 125000005998 bromoethyl group Chemical group 0.000 description 1
- 125000004369 butenyl group Chemical group C(=CCC)* 0.000 description 1
- SXPLZNMUBFBFIA-UHFFFAOYSA-N butyl(trimethoxy)silane Chemical compound CCCC[Si](OC)(OC)OC SXPLZNMUBFBFIA-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- NNKJLYMBVRDUEI-UHFFFAOYSA-N chloro-tris(ethenyl)silane Chemical compound C=C[Si](Cl)(C=C)C=C NNKJLYMBVRDUEI-UHFFFAOYSA-N 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 239000011231 conductive filler Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 125000006165 cyclic alkyl group Chemical group 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 239000000412 dendrimer Substances 0.000 description 1
- 229920000736 dendritic polymer Polymers 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- MAYIDWCWWMOISO-UHFFFAOYSA-N dichloro-bis(ethenyl)silane Chemical compound C=C[Si](Cl)(Cl)C=C MAYIDWCWWMOISO-UHFFFAOYSA-N 0.000 description 1
- ZMAPKOCENOWQRE-UHFFFAOYSA-N diethoxy(diethyl)silane Chemical compound CCO[Si](CC)(CC)OCC ZMAPKOCENOWQRE-UHFFFAOYSA-N 0.000 description 1
- VSYLGGHSEIWGJV-UHFFFAOYSA-N diethyl(dimethoxy)silane Chemical compound CC[Si](CC)(OC)OC VSYLGGHSEIWGJV-UHFFFAOYSA-N 0.000 description 1
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 1
- WJKVFIFBAASZJX-UHFFFAOYSA-N dimethyl(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](C)(C)C1=CC=CC=C1 WJKVFIFBAASZJX-UHFFFAOYSA-N 0.000 description 1
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 1
- YYLGKUPAFFKGRQ-UHFFFAOYSA-N dimethyldiethoxysilane Chemical compound CCO[Si](C)(C)OCC YYLGKUPAFFKGRQ-UHFFFAOYSA-N 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical group [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- WOXXJEVNDJOOLV-UHFFFAOYSA-N ethenyl-tris(2-methoxyethoxy)silane Chemical compound COCCO[Si](OCCOC)(OCCOC)C=C WOXXJEVNDJOOLV-UHFFFAOYSA-N 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- SBRXLTRZCJVAPH-UHFFFAOYSA-N ethyl(trimethoxy)silane Chemical compound CC[Si](OC)(OC)OC SBRXLTRZCJVAPH-UHFFFAOYSA-N 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 238000005227 gel permeation chromatography Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000006038 hexenyl group Chemical group 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 125000001867 hydroperoxy group Chemical group [*]OO[H] 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
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- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- POPACFLNWGUDSR-UHFFFAOYSA-N methoxy(trimethyl)silane Chemical compound CO[Si](C)(C)C POPACFLNWGUDSR-UHFFFAOYSA-N 0.000 description 1
- 239000005055 methyl trichlorosilane Substances 0.000 description 1
- JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- HMMGMWAXVFQUOA-UHFFFAOYSA-N octamethylcyclotetrasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 HMMGMWAXVFQUOA-UHFFFAOYSA-N 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 150000001367 organochlorosilanes Chemical class 0.000 description 1
- 229920006136 organohydrogenpolysiloxane Polymers 0.000 description 1
- 150000003961 organosilicon compounds Chemical class 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 125000002255 pentenyl group Chemical group C(=CCCC)* 0.000 description 1
- 125000000286 phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004344 phenylpropyl group Chemical group 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- CLSUSRZJUQMOHH-UHFFFAOYSA-L platinum dichloride Chemical class Cl[Pt]Cl CLSUSRZJUQMOHH-UHFFFAOYSA-L 0.000 description 1
- 230000008569 process Effects 0.000 description 1
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- 229920005604 random copolymer Polymers 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 230000002787 reinforcement Effects 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 125000005372 silanol group Chemical group 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 230000009974 thixotropic effect Effects 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- GQIUQDDJKHLHTB-UHFFFAOYSA-N trichloro(ethenyl)silane Chemical compound Cl[Si](Cl)(Cl)C=C GQIUQDDJKHLHTB-UHFFFAOYSA-N 0.000 description 1
- HUZZQXYTKNNCOU-UHFFFAOYSA-N triethyl(methoxy)silane Chemical compound CC[Si](CC)(CC)OC HUZZQXYTKNNCOU-UHFFFAOYSA-N 0.000 description 1
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- 239000005051 trimethylchlorosilane Substances 0.000 description 1
- FBGNFSBDYRZOSE-UHFFFAOYSA-N tris(ethenyl)-ethoxysilane Chemical compound CCO[Si](C=C)(C=C)C=C FBGNFSBDYRZOSE-UHFFFAOYSA-N 0.000 description 1
- JYTZMGROHNUACI-UHFFFAOYSA-N tris(ethenyl)-methoxysilane Chemical compound CO[Si](C=C)(C=C)C=C JYTZMGROHNUACI-UHFFFAOYSA-N 0.000 description 1
- 239000005050 vinyl trichlorosilane Substances 0.000 description 1
- 238000004383 yellowing Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/52—Encapsulations
- H01L33/56—Materials, e.g. epoxy or silicone resin
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/12—Polysiloxanes containing silicon bound to hydrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/20—Polysiloxanes containing silicon bound to unsaturated aliphatic groups
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/34—Silicon-containing compounds
- C08K3/36—Silica
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Organic Chemistry (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
- Led Device Packages (AREA)
Abstract
본 발명은 얻어지는 실리콘 경화물을 광반도체 소자의 밀봉재로 한 경우에, 충분한 광투과성과 기계적 강도를 양립할 수 있는 광반도체 소자 밀봉용 실리콘 조성물, 및 광반도체 장치를 제공한다. 본 발명은 분자 중에 2개 이상의 알케닐기를 갖는 직쇄상의 폴리오르가노실록산과, 분자 중에 1개 이상의 알케닐기를 갖는 수지상 구조의 폴리오르가노실록산을 합계로 100 중량부, 분자 중에 2개 이상의 히드로실릴기(Si-H기)를 갖는 폴리오르가노하이드로젠실록산을 알케닐기 1몰 당 수소원자 1~3몰이 되는 양, 실리카 분말의 5~20 질량부, 및 히드로실릴화 반응촉매의 촉매량을 각각 함유하고, 굴절률(25℃, D선)이 1.41~1.44인 것을 특징으로 하는 광반도체 소자 밀봉용 실리콘 조성물, 및 상기 조성물의 경화물에 의해 광반도체 소자가 밀봉되어 이루어진 광반도체 장치를 제공한다.This invention provides the silicone composition for optical-semiconductor element sealing which can satisfy both sufficient light transmittance and mechanical strength, when the obtained silicone hardened | cured material is used as the sealing material of an optical semiconductor element, and an optical semiconductor device. The present invention is 100 parts by weight of a linear polyorganosiloxane having at least two alkenyl groups in a molecule and a polyorganosiloxane having a dendritic structure having at least one alkenyl group in a molecule, and at least two hydro in the molecule. The amount of polyorganohydrogensiloxane having a silyl group (Si-H group) to 1 to 3 moles of hydrogen atoms per mole of alkenyl group, 5 to 20 parts by mass of silica powder, and a catalytic amount of the hydrosilylation reaction catalyst, respectively It contains, and the refractive index (25 degreeC, D line) is 1.41-1.44, The silicone composition for sealing an optical semiconductor element, and the optical semiconductor device by which the optical semiconductor element is sealed by the hardened | cured material of the said composition are provided.
Description
본 발명은 광반도체 소자 밀봉용 실리콘 조성물에 관한 것으로, 특히 이의 얻어지는 경화물이 우수한 광투과성과 기계적 강도를 함께 갖는 광반도체 소자 밀봉용 실리콘 조성물, 및 그 경화물에 의해 광반도체 소자를 밀봉한 광반도체 장치에 관한 것이다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a silicone composition for sealing an optical semiconductor element, and in particular, a silicone composition for sealing an optical semiconductor element having excellent light transmittance and mechanical strength thereof, and a light for sealing the optical semiconductor element with the cured product. A semiconductor device.
광반도체 장치, 예를 들어 LED 발광장치로서, 지지기판 상에 탑재된 LED 칩을 투명수지로 밀봉한 것이 알려져 있다. 밀봉용 투명 수지로서는 종래부터 에폭시 수지가 사용되어 왔지만, 최근의 LED의 고휘도화에 따른 발열량의 증대나 광의 단파장화에 의해, 크랙킹이나 황변 등에 의한 신뢰성의 저하가 문제였다.BACKGROUND OF THE INVENTION An optical semiconductor device, for example, an LED light emitting device, is known in which an LED chip mounted on a support substrate is sealed with a transparent resin. Epoxy resins have conventionally been used as sealing transparent resins, but the increase in the amount of heat generated due to the high brightness of LEDs and the shortening of light have caused a problem of lowering reliability due to cracking and yellowing.
그래서, 내열성이 우수한 실리콘 수지가 광반도체 장치의 밀봉재로서 사용 되게 되었다. 그러나, 사용되는 실리콘 수지가 틱소트로피성이 떨어지므로, 이것을 지지기판 상의 LED 칩에 디스펜서를 이용하여 직접 적정량을 적용하여 성형·경화시키고자 해도 흘러버려서, 목적의 형상을 갖는 성형·경화물이 얻어지지 않는다는 문제가 있었다. 또한, 실리콘 수지의 틱소트로피성이 불충분한 결과, 이를 사용하는 제조장치도 고가의 것이 되지 않을 수 없다는 문제도 있었다.Therefore, the silicone resin excellent in heat resistance became used as a sealing material of an optical semiconductor device. However, since the silicone resin used is inferior in thixotropy, it flows even if an appropriate amount is applied to the LED chip on the support substrate by using a dispenser to form and harden it, thereby forming a molded and hardened product having the desired shape. There was a problem of not losing. Moreover, as a result of insufficient thixotropy of a silicone resin, there also existed a problem that the manufacturing apparatus using this also became expensive.
실리콘 수지에 틱소트로피성을 부여하는 것으로서 실리카 미립자가 알려져 있지만, 실리카 미립자를 첨가함으로써 백탁이 발생하는 등, 투명성이 저하되는 것이 문제였다. 또한, 광학특성을 향상시키기 위해 디페닐디메틸실리콘을 사용하는 것도 검토되고 있지만, 투명성의 측면에서 문제가 있었다. 틱소트로피성과 투명성의 양립을 도모하는 시도로서, 특허문헌 1에는 굴절률이 실리카와 동등해지도록 조정한 실리콘 수지 조성물에 실리카 미립자를 배합하는 기술이 기재되어 있다. 이에 의해 틱소트로피성과 투명성은 일정한 레벨 이상으로 유지되지만, 광반도체 장치의 밀봉재로서는 기계 특성의 저하를 일으키는 문제가 있었다. Although silica microparticles | fine-particles are known as providing thixotropy to a silicone resin, it was a problem that transparency fell, for example, cloudiness generate | occur | produced by adding silica microparticles | fine-particles. In addition, the use of diphenyl dimethylsilicon for improving the optical properties has been examined, but there has been a problem in terms of transparency. As an attempt to achieve both thixotropy and transparency, Patent Literature 1 describes a technique of blending silica fine particles with a silicone resin composition adjusted so that the refractive index is equivalent to silica. Thereby, although thixotropy and transparency are maintained more than a predetermined level, there existed a problem of causing a fall of a mechanical characteristic as a sealing material of an optical semiconductor device.
본 발명은 이와 같은 문제를 해결하기 위해 이루어진 것으로, 얻어지는 실리콘 경화물을 광반도체 소자의 밀봉재로 한 경우에, 충분한 광투과성과 기계적 강도를 양립할 수 있는 광반도체 소자 밀봉용 실리콘 조성물 및 그 경화물에 의해 광반도체 소자가 밀봉된 광반도체 장치를 제공하는 것을 목적으로 한다.SUMMARY OF THE INVENTION The present invention has been made to solve such a problem, and when the silicone cured product obtained is used as a sealing material for an optical semiconductor element, a silicone composition for sealing an optical semiconductor element and a cured product thereof capable of achieving both sufficient light transmittance and mechanical strength An object of the present invention is to provide an optical semiconductor device in which an optical semiconductor element is sealed.
본 발명의 광반도체 소자 밀봉용 실리콘 조성물은,Silicone composition for optical semiconductor element sealing of this invention,
(A) 하기 화학식 1로 표시되는 폴리오르가노실록산;(A) a polyorganosiloxane represented by the following formula (1);
(단, 상기 화학식 1에서 R1은 각각 독립적으로 알케닐기 또는 할로겐 치환되어 있어도 좋은 알킬기를, R2는 각각 독립적으로 아릴기를 나타내고, R1 중 적어도 2개는 알케닐기이고, 0.01<m/(m+n)<0.10임),(However, in the formula (1), each R 1 independently represents an alkyl group which may be optionally substituted with an alkenyl group or halogen, R 2 each independently represents an aryl group, at least two of R 1 is an alkenyl group, and 0.01 <m / ( m + n) <0.10),
(B) 1분자중에 적어도 1개의 알케닐기를 갖고, x개의 R1 3SiO1 /2 단위, y개의 R1 2SiO 단위, 및 z개의 SiO2 단위를 함유하고(단, 각 실록산 단위 중, R1은 각각 독립적으로 알케닐기 또는 할로겐 치환되어 있어도 좋은 알킬기를 나타냄), x, y, z의 합계를 1로 환산했을 때의 x, y, z가 각각 0.3≤x≤0.5, 0<y≤0.1, 0.4≤z<0.7인 수지상 구조의 폴리오르가노실록산을, (A)성분과 (B)성분의 합계로 100 질량부, 또한 (A)성분과 (B)성분의 합계량 100 질량부에 대해서 (B)성분이 10~40 질량부가 되는 양;Of (B) at least one having an alkenyl group, x of R 1 3 SiO 1/2 units, y of R 1 2 SiO units, and z of SiO contain 2 units (where each siloxane unit in the molecule, R 1 each independently represents an alkenyl group or an alkyl group which may be substituted by halogen), and x, y, and z when converting the sum of x, y, and z into 1 are 0.3 ≦ x ≦ 0.5 and 0 <y ≦, respectively. 0.1, 0.4 <z <0.7, The polyorganosiloxane of the dendritic structure is 100 mass parts in total of (A) component and (B) component, and 100 mass parts of total amounts of (A) component and (B) component (B) the amount which a component becomes 10-40 mass parts;
(C) 1분자 중에 적어도 2개의 규소 원자에 결합된 수소 원자를 갖는 폴리오르가노하이드로젠실록산을, 상기 (A)성분 및 (B)성분이 각각 갖는 알케닐기의 합계량 1몰에 대해서 규소 원자에 결합된 수소 원자가 1~3 몰이 되는 양;(C) A polyorganohydrogensiloxane having a hydrogen atom bonded to at least two silicon atoms in one molecule is added to the silicon atom with respect to 1 mole of the total amount of the alkenyl groups each of the above-mentioned (A) component and (B) component. The amount of bonded hydrogen atoms of 1 to 3 moles;
(D) 실리카 분말 5~20 질량부; 및(D) 5 to 20 parts by mass of silica powder; And
(E) 히드로실릴화 반응촉매의 촉매량;(E) catalytic amount of hydrosilylation reaction catalyst;
을 각각 함유하고, 굴절률(25℃, D선)이 1.41~1.44인 것을 특징으로 한다.It contains respectively, and refractive index (25 degreeC, D line) is 1.41-1.44, It is characterized by the above-mentioned.
또한, 본 발명의 광반도체 장치는 상기 본 발명의 광반도체 소자 밀봉용 실리콘 조성물의 경화물에 의해 광반도체 소자가 밀봉되어 이루어진 것을 특징으로 한다.In addition, the optical semiconductor device of the present invention is characterized in that the optical semiconductor element is sealed by a cured product of the silicone composition for sealing an optical semiconductor element of the present invention.
본 발명에 따르면, 이를 사용하여 얻어지는 실리콘 경화물을 광반도체 소자의 밀봉재로 한 경우에, 충분한 광투과성과 기계적 강도를 양립할 수 있는 광반도체 소자 밀봉용 실리콘 조성물, 및 충분한 광투과성과 기계적 강도를 갖는 실리콘 경화물로 밀봉된 광반도체 장치를 제공할 수 있다.According to the present invention, when the silicone cured product obtained using the same is used as a sealing material for an optical semiconductor element, the silicone composition for sealing an optical semiconductor element capable of achieving both sufficient light transmittance and mechanical strength, and sufficient light transmittance and mechanical strength The optical semiconductor device sealed by the silicone hardened | cured material which has is provided.
이하, 본 발명의 실시형태에 대해서 설명한다.EMBODIMENT OF THE INVENTION Hereinafter, embodiment of this invention is described.
본 발명의 광반도체 소자 밀봉용 실리콘 조성물은, Silicone composition for optical semiconductor element sealing of this invention,
(A)상기 화학식 1로 표시되는 1분자 중에 적어도 2개의 알케닐기를 갖는 직쇄상 폴리오르가노실록산; (A) linear polyorganosiloxane having at least two alkenyl groups in one molecule represented by Formula 1;
(B) 1분자 중에 적어도 1개의 알케닐기를 갖고, x개의 R1 3SiO1 /2 단위, y개의 R1 2SiO 단위, 및 z개의 SiO2 단위를 함유하고(단, 각 실록산 단위 중, R1은 각각 독립적으로 알케닐기 또는 할로겐 치환되어 있어도 좋은 알킬기를 나타냄), x, y, z의 합계를 1로 환산했을 때의 x, y, z가 각각 0.3≤x≤0.5, 0<y≤0.1, 0.4≤z<0.7인 수지상 구조의 폴리오르가노실록산을, (A)성분과 (B)성분의 합계로 100 질량부, 또한 (A)성분과 (B)성분의 합계량 100 질량부에 대해서 (B)성분이 10~40 질량부가 되는 양;Of (B) at least one having an alkenyl group, x of R 1 3 SiO 1/2 units, y of R 1 2 SiO units, and z of SiO contain 2 units (where each siloxane unit in the molecule, R 1 each independently represents an alkenyl group or an alkyl group which may be substituted by halogen), and x, y, and z when converting the sum of x, y, and z into 1 are 0.3 ≦ x ≦ 0.5, and 0 <y ≦, respectively. 0.1, 0.4 <z <0.7, The polyorganosiloxane of the dendritic structure is 100 mass parts in total of (A) component and (B) component, and 100 mass parts of total amounts of (A) component and (B) component (B) the amount which a component becomes 10-40 mass parts;
(C) 1분자 중에 적어도 2개의 규소 원자에 결합된 수소 원자를 갖는 폴리오르가노하이드로젠실록산을, 상기 (A)성분 및 (B)성분이 각각 갖는 알케닐기의 합계량 1몰에 대하여, 규소원자에 결합된 수소 원자가 1~3몰이 되는 양;(C) Silicon atom with respect to 1 mol of total amounts of the alkenyl group which the said (A) component and (B) component have the polyorganohydrogensiloxane which has a hydrogen atom couple | bonded with at least 2 silicon atoms in 1 molecule, respectively An amount of hydrogen atoms bonded to 1 to 3 mol;
(D) 실리카 분말의 5~20 질량부; 및 (D) 5-20 mass parts of silica powder; And
(E) 히드로실릴화 반응촉매의 촉매량;(E) catalytic amount of hydrosilylation reaction catalyst;
을 각각 함유하고, 굴절률(25℃, D선)이 1.4~1.44인 것을 특징으로 한다.It contains respectively, and refractive index (25 degreeC, D line) is 1.4-1.44, It is characterized by the above-mentioned.
이하, 각 성분에 대해서 설명한다.Hereinafter, each component is demonstrated.
[(A)성분][(A) component]
(A)성분은, 다음에 설명하는 (B)성분과 함께, 본 발명 조성물의 베이스폴리머가 되는 알케닐기 함유의 폴리오르가노실록산이다.(A) component is an alkenyl group containing polyorganosiloxane used as a base polymer of this invention with (B) component demonstrated next.
(A)성분은 하기 화학식 1로 표시되는 1분자 중에 적어도 2개의 알케닐기를 갖는 직쇄상의 폴리오르가노실록산이다. 이하, 화학식 1로 표시되는 폴리오르가노실록산을, 폴리오르가노실록산(1)이라고도 한다:The component (A) is a linear polyorganosiloxane having at least two alkenyl groups in one molecule represented by the following formula (1). Hereinafter, the polyorganosiloxane represented by General formula (1) is also called polyorganosiloxane (1):
(화학식 1)(Formula 1)
(단, 상기 화학식 1에서, R1은 각각 독립적으로 알케닐기, 또는 할로겐 치환되어 있어도 좋은 알킬기를, R2는 각각 독립적으로 아릴기를 나타내고, R1 중 적어도 2개는 알케닐기이고, 0.01<m/(m+n)<0.10임).(However, in the general formula (1), each R 1 is independently an alkenyl group or an alkyl group which may be halogen substituted, R 2 each independently represents an aryl group, at least two of R 1 is an alkenyl group, 0.01 <m /(m+n)<0.10).
또한, 상기 화학식 1은 반드시 블럭 공중합체를 의미하는 것은 아니다. 즉, 중간 단위의 -R2 2SiO-의 수를 나타내는 m, 및 -R1 2SiO-의 수를 나타내는 n은 블럭에서의 수를 나타내는 것은 아니고, 분자 전체에 상기 각 중간 단위가 존재하는 수를 합계로 각각 나타내는 것이다. 즉, 폴리오르가노실록산(1)은 랜덤 공중합체이어도 좋다.In addition, Formula 1 does not necessarily mean a block copolymer. That is, m representing the number of -R 2 2 SiO- in the middle unit and n representing the number of -R 1 2 SiO- do not represent the number in the block, but the number of the respective intermediate units present in the entire molecule. Are represented by the sum. In other words, the polyorganosiloxane (1) may be a random copolymer.
폴리오르가노실록산(1)의 평균중합도, 즉 실록산 단위의 수는, 상기 화학식 1에서 n 및 m에 말단기의 수 2를 더한 n+m+2로 표시되고, 100~500의 범위에 있는 것이 바람직하다. 평균중합도는 150~450이 더욱 바람직하고, 200~400이 특히 바람직하다. 폴리오르가노실록산(1)의 평균중합도가 상기 범위내에 있으면, 합성(중합) 상의 문제도 없고, 작업성도 양호하다.The average degree of polymerization of the polyorganosiloxane (1), that is, the number of siloxane units, is represented by n + m + 2 in which n and m plus the number of terminal groups in Formula 1 are in the range of 100 to 500. desirable. As for average polymerization degree, 150-450 are more preferable, and 200-400 are especially preferable. If the average degree of polymerization of the polyorganosiloxane (1) is in the above range, there is no problem in the synthesis (polymerization) and the workability is also good.
폴리오르가노실록산(1)의 점도(25℃)는, 500~10000 mPa·s인 것이 바람직하고, 특히 1000~5000 mPa·s의 범위인 것이 바람직하다. 폴리오르가노실록산(1)의 점도가 이 범위 내에 있는 경우에는, 얻어지는 조성물의 작업성이 양호하고, 이 조성물로부터 얻어지는 실리콘 경화물의 물리적 특성이 양호하다.It is preferable that the viscosity (25 degreeC) of the polyorganosiloxane (1) is 500-10000 mPa * s, and it is especially preferable that it is the range of 1000-5000 mPa * s. When the viscosity of the polyorganosiloxane (1) is in this range, the workability of the composition obtained is favorable and the physical characteristic of the silicone hardened | cured material obtained from this composition is favorable.
또한, 본 명세서에서 점도는 특별히 언급하지 않는 한, 회전점도계에 의해 25℃에서 측정된 점도를 말한다. 또한, 측정시의 회전수 등의 조건은, 검체의 점도나 사용하는 측정장치에 따라서 적절하게 조정된다.In addition, in this specification, a viscosity refers to the viscosity measured at 25 degreeC with the rotational viscometer unless there is particular notice. In addition, conditions, such as rotation speed at the time of a measurement, are suitably adjusted according to the viscosity of a sample and the measuring apparatus to be used.
상기 화학식 1에서, R1은 각각 독립적으로 알케닐기, 또는 할로겐 치환되어 있어도 좋은 알킬기를 나타낸다. 폴리오르가노실록산(1)이 갖는 알케닐기로서는, 비닐기, 알릴기, 부테닐기, 펜테닐기, 헥세닐기, 헵테닐기 등의, 탄소원자수가 2~8개, 더욱 바람직하게는 2~4개인 것을 들 수 있다. 폴리오르가노실록산(1)이 갖는 알케닐기는, 2종 이상을 포함해도 좋지만 1종만으로 구성되는 것이 바람직하다. 알케닐기로서는, 비닐기, 알릴기가 더욱 바람직하고, 특히 비닐기가 바람직하다.In said Formula (1), R <1> represents an alkenyl group or the alkyl group which may be substituted by halogen each independently. As an alkenyl group which the polyorganosiloxane (1) has, 2-8 carbon atoms, More preferably, 2-4 carbon atoms, such as a vinyl group, an allyl group, butenyl group, pentenyl group, hexenyl group, and heptenyl group, etc. It can be mentioned. Although the alkenyl group which the polyorganosiloxane (1) has may contain 2 or more types, it is preferable that it is comprised only 1 type. As an alkenyl group, a vinyl group and an allyl group are more preferable, and a vinyl group is especially preferable.
상기 화학식 1에서의 알케닐기의 함유수는 2개 이상이다. 또한, 상기 화학식 1에서의 알케닐기의 함유수는 40개 이하인 것이 바람직하다.The number of containing of the alkenyl group in the said General formula (1) is two or more. Moreover, it is preferable that the number of containing of the alkenyl group in the said General formula (1) is 40 or less.
상기 화학식 1에서, R1 중 적어도 2개는 알케닐기이고, 상기 알케닐기는 (R1 3SiO1/2)로 표시되는 R1과 같이 분자사슬 말단에서 규소 원자에 결합되어 있어도 좋고, (R1 2SiO)로 표시되는 R1과 같이 분자사슬의 중간부분에서 규소원자에 결합되어 있어도 좋다. 또한, (R1 2SiO)의 2개의 R1의 양쪽이 알케닐기이어도 좋고, 어느 한쪽이 알케닐기이어도 좋다. 알케닐기는 분자사슬의 말단과 중간부분 중 어느 한쪽에서만 규소원자에 결합되어 있어도 좋지만, 분자사슬의 말단과 중간부분의 양쪽에서 규소원자에 결합되어 있어도 좋다.In Formula 1, at least two of R 1 is an alkenyl group, and the alkenyl group may be bonded to a silicon atom at the terminal of the molecular chain, such as R 1 represented by (R 1 3 SiO 1/2 ), (R 1 2 SiO) may be bonded to the silicon atom in the middle of the molecular chain, such as R 1 . Furthermore, (R 1 2 SiO) may be either the alkenyl group R 1 in both of the two, either one may be an alkenyl group. The alkenyl group may be bonded to the silicon atom only at one of the terminal and the middle part of the molecular chain, but may be bonded to the silicon atom at both the terminal and the middle part of the molecular chain.
상기 화학식 1에서, 알케닐기가 아닌 R1은 할로겐 치환되어 있어도 좋은 알킬기를 나타낸다. 알킬기로서는, 탄소원자수 1~10의 직쇄, 분지쇄, 또는 환상의 알킬기를 들 수 있다. 더욱 바람직한 탄소원자수는 1~6이다. 구체적으로는, 메틸기, 에틸기, 프로필기, 부틸기, 펜틸기, 헥실기, 시클로헥실기, 헵틸기 등을 들 수 있다. 할로겐 치환에서의 할로겐 원자로서는, 염소원자, 불소원자가 바람직하다. 할로겐 치환된 알킬기로서, 구체적으로는 클로로메틸기, 3-클로로프로필기, 3,3,3-트리플루오로프로필기 등을 들 수 있다. 폴리오르가노실록산(1)이 갖는 할로겐 치환되어 있어도 좋은 알킬기는, 2종 이상을 포함해도 좋지만 1종만으로 구성되는 것이 바람직하다. 알케닐기가 아닌 R1, 즉 할로겐 치환되어 있어도 좋은 알킬기로서는, 메틸기, 에틸기, 3,3,3-트리플루오로프로필기가 더욱 바람직하고, 특히 메틸기가 바람직하다.In the above formula (1), R 1 which is not an alkenyl group represents an alkyl group which may be halogen substituted. As an alkyl group, a C1-C10 linear, branched, or cyclic alkyl group is mentioned. More preferable carbon atoms are 1-6. Specifically, methyl group, ethyl group, propyl group, butyl group, pentyl group, hexyl group, cyclohexyl group, heptyl group, etc. are mentioned. As a halogen atom in halogen substitution, a chlorine atom and a fluorine atom are preferable. Specific examples of the halogen-substituted alkyl group include chloromethyl group, 3-chloropropyl group, 3,3,3-trifluoropropyl group, and the like. Although the halogen-substituted alkyl group which the polyorganosiloxane (1) may have may contain 2 or more types, it is preferable that it is comprised only 1 type. As an alkyl group which may be substituted by R <1> , ie, halogen which is not an alkenyl group, a methyl group, an ethyl group, a 3,3, 3- trifluoropropyl group is more preferable, and a methyl group is especially preferable.
상기 화학식 1에서, R2는 아릴기를 나타낸다. 아릴기로서는, 탄소원자수 6~14의 아릴기를 들 수 있다. 구체적으로는, 페닐기, 톨릴기, 자일릴기, 나프틸기 등을 들 수 있다. 폴리오르가노실록산(1)이 갖는 아릴기는, 2종 이상을 포함해도 좋지만 1종만으로 구성되는 것이 바람직하다. 아릴기로서는, 특히 페닐기가 바람직하다.In Formula 1, R 2 represents an aryl group. Examples of the aryl group include an aryl group having 6 to 14 carbon atoms. Specifically, a phenyl group, tolyl group, xylyl group, naphthyl group, etc. are mentioned. Although the aryl group which the polyorganosiloxane (1) has may contain 2 or more types, it is preferable that it is comprised only 1 type. As an aryl group, a phenyl group is especially preferable.
상기 화학식 1에서의, (R2 2SiO)로 표시되는 규소 원자에 아릴기가 2개 결합된 D단위의 수 m과, (R1 2SiO)로 표시되는 규소원자에 알케닐기 또는 할로겐 치환되어 있어도 좋은 알킬기가 2개 결합된 D단위의 수 n의 관계는, 0.01<m/(m+n)<0.10을 만족하는 관계이고, 바람직하게는 0.04<m/(m+n)<0.07의 관계이다. m/(m+n)이 상기 범위내이면, 얻어지는 실리콘 경화물에서 충분한 광투과성과 기계적 강도의 양립이 가능해진다. m/(m+n)이 0.01 이하에서는 조성물의 투명성이 저하되고, 0.1 이상에서는 인장강도나 신장 등의 기계적 강도가 저하된다.In the above formula 1, (R 2 2 SiO) the number of D units of the aryl group of two bonded to silicon atoms represented by m and, (R 1 2 SiO) alkenyl group or a halogen substituted on the silicon atom represented by The relationship of the number n of D units which two good alkyl groups couple | bonded is a relationship which satisfy | fills 0.01 <m / (m + n) <0.10, Preferably it is a relationship of 0.04 <m / (m + n) <0.07 . When m / (m + n) is in the said range, both light transmittance and mechanical strength compatible with the silicone hardened | cured material obtained are attained. When m / (m + n) is 0.01 or less, transparency of a composition falls, and when 0.1 or more, mechanical strength, such as tensile strength and elongation, falls.
(A)성분으로서는, 폴리오르가노실록산(1)의 1종을 단독으로 사용해도 좋고, 2종 이상을 병용해도 좋다. 또한, 2종 이상을 병용하는 경우에는, 각 폴리오르가노실록산(1)의 점도(25℃)에 대해서는 반드시 상기 범위에 있을 필요는 없고, 이들을 혼합한 (A)성분으로서 점도(25℃)가 상기 범위에 있는 것이 바람직하다. 또한, 평균중합도에 대해서도 동일하다. 단, 폴리오르가노실록산(1)의 2종 이상을 병용하는 경우에 있어서도, (A)성분을 구성하는 각 폴리오르가노실록산(1)에 대해서, 평균중합도 및 점도(25℃)가 상기 범위에 있는 것이 보다 바람직하다. (A)성분으로서, 폴리오르가노실록산(1)의 2종 이상을 조합하여 사용하면, 점도 조정에서 유리하다.As (A) component, 1 type of polyorganosiloxane (1) may be used independently, and 2 or more types may be used together. In addition, when using 2 or more types together, it is not necessary to necessarily exist in the said range about the viscosity (25 degreeC) of each polyorganosiloxane (1), and viscosity (25 degreeC) as (A) component which mixed these is It is preferable to exist in the said range. The same applies to the average degree of polymerization. However, even when using 2 or more types of polyorganosiloxane (1) together, average degree of polymerization and a viscosity (25 degreeC) are the said range about each polyorganosiloxane (1) which comprises (A) component. It is more preferable that there is. As (A) component, when using combining 2 or more types of polyorganosiloxane (1), it is advantageous in viscosity adjustment.
[(B)성분][(B) component]
(B)성분은 1분자 중에 적어도 1개의 알케닐기를 갖고, x개의 R1 3SiO1 /2 단위, y개의 R1 2SiO 단위, 및 z개의 SiO2 단위를 함유하고(단, 각 실록산 단위 중, R1은 각각 독립적으로 알케닐기, 또는 할로겐 치환되어 있어도 좋은 알킬기를 나타낸다), x, y, z의 합계를 1로 환산했을 때의 x, y, z가 각각 0.3≤x≤0.5, 0<y≤0.1, 0.4≤z<0.7인 수지상 구조, 다시 말하면 3차원 그물형상 구조의 폴리오르가노실록산이다. 이하, 상기 구성의 폴리오르가노실록산을 폴리오르가노실록산(2)이라고 한다.(B) component is at least one having an alkenyl group, x of R 1 3 SiO 1/2 units, y of R 1 2 SiO units, and z of SiO containing 2 units (where each siloxane unit in the molecule In which each R 1 independently represents an alkenyl group or an alkyl group which may be substituted by halogen), and x, y and z when converting the total of x, y and z into 1 are 0.3 ≦ x ≦ 0.5 and 0, respectively. A dendritic structure of <y ≦ 0.1, 0.4 ≦ z <0.7, that is, a polyorganosiloxane of a three-dimensional network structure. Hereinafter, the polyorganosiloxane of the said structure is called polyorganosiloxane (2).
폴리오르가노실록산(2)은 상기 실록산 단위 이외에, 필요에 따라서 본 발명의 효과를 손상시키지 않는 범위에서, R1SiO3 /2 단위(단, R1은 상기 다른 실록산 단위의 경우와 동일함)를 분자 중에 포함하고 있어도 좋다. 폴리오르가노실록산(2)의, 겔 투과 크로마토그래피법으로 측정되는 질량평균분자량은, 1000~10000의 범위에 있는 것이 바람직하고, 3000~6000이 더욱 바람직하다. 폴리오르가노실록산(2)의 질량평균 분자량이 상기 범위 내에 있으면, 조성물의 현저한 고점도화에 의한 작업상의 문제도 없고, 경화 후의 기계적 강도도 양호하다.Polyorganosiloxane (2) is (the same as in the case of single, R 1 is the other siloxane units) within the range not impairing the effects of the present invention as necessary in addition to the siloxane units,, R 1 SiO 3/2 units May be contained in the molecule. It is preferable that the mass mean molecular weight of the polyorganosiloxane (2) measured by the gel permeation chromatography method exists in the range of 1000-10000, and 3000-6000 are more preferable. If the mass average molecular weight of the polyorganosiloxane (2) is in the said range, there will be no operational problem by remarkable high viscosity of a composition, and the mechanical strength after hardening will also be favorable.
또한, 폴리오르가노실록산(2)은 실록산 단위의 조성이 상기 범위에 있으면, 성상은 관계없이, 상온(25℃)에서 고체상이어도, 비교적 점도가 높은, 예를 들어 200Pa·s 이상의 액상이어도 좋다.In addition, as long as the polyorganosiloxane (2) has the composition of a siloxane unit in the said range, regardless of property, it may be solid at normal temperature (25 degreeC), or may be a liquid with a relatively high viscosity, for example, 200 Pa * s or more.
폴리오르가노실록산(2)이 함유하는 각 실록산 단위에서, R1이 나타내는 알케닐기 또는 할로겐 치환되어 있어도 좋은 알킬기의 종류나 바람직한 태양에 대해서는, 상기 화학식 1에서의 R1이 나타내는 알케닐기 또는 할로겐 치환되어 있어도 좋은 알킬기와 동일하다.In each of the siloxane units which the polyorganosiloxane (2) contains, about the kind and preferable aspect of the alkenyl group which R <1> represents, or the alkyl group which may be substituted by halogen, the alkenyl group or halogen substitution which R <1> in General formula (1) represents It is the same as the alkyl group which may be provided.
폴리오르가노실록산(2)은 1분자 중에 적어도 1개의 알케닐기를 갖는다. 폴리오르가노실록산(2)은 바람직하게는 2개 이상의 알케닐기를 갖는다. 또한, 폴리오르가노실록산(2)에서의 알케닐기의 함유수는, 10개 이하가 바람직하다.The polyorganosiloxane (2) has at least 1 alkenyl group in 1 molecule. The polyorganosiloxane (2) preferably has two or more alkenyl groups. Moreover, as for the number of containing of the alkenyl group in the polyorganosiloxane (2), 10 or less are preferable.
폴리오르가노실록산(2)이 분자 중에 함유하는 R1 3SiO1 /2 단위는, 규소 원자에 R1이 3개 결합한 M단위의 실록산 단위(이하, 「Mb단위」라고도 함)이고, R1 2SiO 단위는 규소 원자에 R1이 2개 결합된 D단위의 실록산 단위(이하, 「Db단위」라고도 함)이며, SiO2 단위는 규소 원자에 R1이 결합되어 있지 않은 Q단위의 실록산 단위이다. 폴리오르가노실록산(2)이 1분자 중에 1개 이상 갖는 알케닐기는, 상기 Mb단위 중에 있어도 좋고, Db단위 중에 있어도 좋다. 알케닐기는 또한 Mb단위 중에 복수 존재하고 있어도 좋고, Db단위 중에 복수 존재하고 있어도 좋으며, Mb단위와 Db단위의 각각에 존재하고 있어도 좋다.Polyorganosiloxane (2) R 1 3 SiO 1 /2 units, and siloxane units (hereinafter also referred to as "Mb unit") of the M unit combines three two R 1 on the silicon atom, R 1, which is contained in the molecule 2 SiO units and siloxane units (hereinafter also referred to as "Db unit") of the R 1 2-deployed bond D unit to the silicon atom, SiO 2 units are siloxane units of the Q unit it is not binding R 1 to the silicon atom to be. The alkenyl group which one or more polyorganosiloxane (2) has in 1 molecule may be in the said Mb unit, and may be in the Db unit. In addition, a plurality of alkenyl groups may be present in Mb units, a plurality of alkenyl groups may be present, or may be present in each of Mb units and Db units.
폴리오르가노실록산(2)이 1분자 중에 갖는 Mb단위의 갯수 x, Db단위의 갯수 y, Q단위의 갯수 z의 관계는, x, y, z의 합계를 1로 환산했을 때의 x, y, z가 각각 0.3≤x≤0.5, 0<y≤0.1, 0.4≤z<0.7의 관계에 있다. 이 관계에서, y는 0.04~ 0.09가 더욱 바람직하다. 또한, x는 0.36 ~ 0.44가 더욱 바람직하고, z는 0.45~ 0.60이 더욱 바람직하다.The relationship between the number x of Mb units, the number y of Db units, and the number z of Q units that the polyorganosiloxane (2) has in one molecule is x, y when the sum of x, y, z is converted to 1; , z are in a relationship of 0.3 ≦ x ≦ 0.5, 0 <y ≦ 0.1, and 0.4 ≦ z <0.7, respectively. In this relation, y is more preferably 0.04 to 0.09. In addition, x is more preferably 0.36 to 0.44, and z is more preferably 0.45 to 0.60.
x+y+z=1로서 산출되는 x, y, z의 관계가 상기 관계이면, 얻어지는 실리콘 경화물에 있어서 충분한 광투과성과 기계적 강도의 양립이 가능해진다. 또한, 광반도체 소자 밀봉용 실리콘 조성물을 사용하여 밀봉을 실시할 때, 상기 조성물이 공급되었을 때의 형상을 유지할 수 있도록, 경화속도를 적절히 조절할 수 있다. 예를 들어, 광반도체 소자를 돔 형상의 밀봉재로 덮도록 밀봉하고자 한 경우에도, x, y, z의 관계가 상기 관계이면, 조성물이 공급되었을 때의 돔 형상을 유지하면서 경화를 완료시킬 수 있다.When the relationship of x, y, z calculated as x + y + z = 1 is the said relationship, both of sufficient light transmittance and mechanical strength in the silicone hardened | cured material obtained are attained. Moreover, when sealing is performed using the silicone composition for optical semiconductor element sealing, a cure rate can be suitably adjusted so that the shape at the time of supplying the said composition can be maintained. For example, even when the optical semiconductor element is to be sealed so as to be covered with a dome-shaped sealing material, curing can be completed while maintaining the dome shape when the composition is supplied when the relationship of x, y, and z is the above relationship. .
(B)성분으로서는, 폴리오르가노실록산(2)의 1종을 단독으로 사용해도 좋고, 2종 이상을 병용해도 좋다.As (B) component, 1 type of polyorganosiloxane (2) may be used independently, and 2 or more types may be used together.
본 발명의 광반도체 소자 밀봉용 실리콘 조성물에 있어서, (A)성분과 (B)성분은 베이스폴리머가 되는 알케닐기 함유의 폴리오르가노실록산이고, 합계로 100 질량부를 함유한다. (A)성분과 (B)성분의 함유량의 비율로서는, (A)성분과 (B)성분의 합계량 100 질량부에 대해서, (B)성분이 10~40 질량부가 되는 양이고, 바람직하게는 15~35 질량부이다. (A)성분과 (B)성분의 함유량의 비율이 상기 범위이면, 경화물에 최적인 경도와 충분한 기계적 강도를 부여한다.In the silicone composition for sealing optical semiconductor elements of the present invention, component (A) and component (B) are alkenyl group-containing polyorganosiloxanes serving as base polymers and contain 100 parts by mass in total. As a ratio of content of (A) component and (B) component, it is the quantity which (B) component becomes 10-40 mass parts with respect to 100 mass parts of total amounts of (A) component and (B) component, Preferably it is 15 It is -35 mass parts. If the ratio of content of (A) component and (B) component is the said range, the optimal hardness and sufficient mechanical strength will be provided to hardened | cured material.
[(C)성분][(C) component]
(C)성분인 1분자 중에 규소 원자에 결합된 적어도 2개의 수소 원자를 갖는 폴리오르가노하이드로젠실록산은, 상기 (A)성분 및 (B)성분과 반응하는 가교 성분으로서 작용한다. (C)성분의 분자구조에 특별히 제한은 없고, 예를 들어 직쇄상, 환상, 분지쇄상, 3차원 그물형상 구조(수지상 구조) 등의 각종 폴리오르가노하이드로젠실록산을 사용할 수 있다.The polyorganohydrogensiloxane which has at least 2 hydrogen atoms couple | bonded with the silicon atom in 1 molecule which is (C) component acts as a crosslinking component which reacts with the said (A) component and (B) component. There is no restriction | limiting in particular in the molecular structure of (C) component, For example, various polyorganohydrogensiloxanes, such as a linear, cyclic, branched, three-dimensional network structure (resin structure), can be used.
(C)성분의 폴리오르가노하이드로젠실록산은, 1분자 중에 2개 이상, 바람직하게는 3개 이상의 규소 원자에 결합된 수소원자, 즉 히드록실릴기(Si-H기)를 갖는다. (C)성분인 폴리오르가노하이드로젠실록산이 직쇄 형상인 경우, 이들 Si-H기는 분자사슬의 말단 및 중간 부분 중 어느 한쪽에만 위치하고 있어도 좋고, 그 양쪽에 위치하고 있어도 좋다. (C)성분의 1분자 중의 규소원자의 평균수(평균중합도)는, 바람직하게는 2~1,000, 더욱 바람직하게는 3~100 정도이다. (C)성분의 점도(25℃)는, 500mPa·s 이하인 것이 바람직하고, 특히 10~100 mPa·s의 범위인 것이 바람직하다. (C)성분의 점도가 이 범위 내에 있는 경우에는, 얻어지는 조성물의 작업성이 양호하고, 또한 이 조성물로부터 얻어지는 실리콘 경화물의 물리적 특성이 양호하다.The polyorganohydrogensiloxane of (C) component has a hydrogen atom couple | bonded with 2 or more, preferably 3 or more silicon atoms in 1 molecule, ie, a hydroxylyl group (Si-H group). When the polyorganohydrogensiloxane which is (C) component is linear, these Si-H groups may be located only in either one of the terminal and the middle part of a molecular chain, and may be located in both. The average number (average degree of polymerization) of the silicon atoms in one molecule of the component (C) is preferably 2 to 1,000, and more preferably about 3 to 100. It is preferable that the viscosity (25 degreeC) of (C) component is 500 mPa * s or less, and it is especially preferable that it is the range of 10-100 mPa * s. When the viscosity of (C) component exists in this range, the workability of the composition obtained is favorable and the physical characteristic of the silicone hardened | cured material obtained from this composition is favorable.
(C)성분으로서는, 예를 들어 하기 평균조성식인 화학식 3으로 표시되는 폴리오르가노하이드로젠실록산이 사용된다.As (C) component, the polyorganohydrogensiloxane represented by General formula (3) which is the following average composition formula is used, for example.
(화학식 3)(Formula 3)
(상기 화학식 3에서, R3는 지방족 불포화기를 갖지 않는, 탄소원자수가 1~14, 더욱 바람직하게는 1~10의 비치환 또는 치환의 1가의 탄화수소기이다. a 및 b는 0.7≤a≤2.1, 0.001≤b≤1.0이고, 또한 0.8≤a+b≤3.0, 보다 바람직하게는 1.0≤a+b≤2.5를 만족하는 정수임)(In the formula (3), R 3 is an unsubstituted or substituted monovalent hydrocarbon group having 1 to 14 carbon atoms, more preferably 1 to 10 carbon atoms, having no aliphatic unsaturated group. A and b are 0.7 ≦ a ≦ 2.1). , 0.001≤b≤1.0, and 0.8≤a + b≤3.0, more preferably 1.0≤a + b≤2.5
상기 R3로서는, 예를 들어 메틸기, 에틸기, 프로필기, 이소프로필기, 부틸기, 이소부틸기, t-부틸기, 펜틸기, 네오펜틸기, 헥실기, 시클로헥실기, 옥틸기, 노닐기, 데실기 등의 알킬기; 페닐기, 톨릴기, 자일릴기, 나프틸기 등의 아릴기; 벤질기, 페닐에틸기, 페닐프로필기 등의 아랄킬기; 이들 탄화수소기 중의 수소원자의 일부 또는 전부를 할로겐 원자로 치환한 기, 예를 들어 클로로메틸기, 3-클로로프로필기, 브로모에틸기, 3,3,3-트리플루오로프로필기 등을 들 수 있다. R3는 알킬기 또는 아릴기인 것이 바람직하고, 보다 바람직하게는 메틸기 또는 페닐기이고, 특히 바람직하게는 메틸기이다.As said R <3> , a methyl group, an ethyl group, a propyl group, isopropyl group, a butyl group, isobutyl group, t-butyl group, a pentyl group, neopentyl group, hexyl group, cyclohexyl group, octyl group, nonyl group, for example Alkyl groups, such as a decyl group; Aryl groups such as phenyl group, tolyl group, xylyl group and naphthyl group; Aralkyl groups such as benzyl, phenylethyl and phenylpropyl groups; Groups in which some or all of the hydrogen atoms in these hydrocarbon groups are substituted with halogen atoms, for example, chloromethyl group, 3-chloropropyl group, bromoethyl group, 3,3,3-trifluoropropyl group, and the like. It is preferable that R <3> is an alkyl group or an aryl group, More preferably, it is a methyl group or a phenyl group, Especially preferably, it is a methyl group.
(C)성분의 구체예로서는, 분자사슬 양말단 트리메틸실록시기 봉쇄 메틸하이드로젠폴리실록산; 분자사슬 양말단 트리메틸실록시기 봉쇄 디메틸실록산/메틸하이드로젠실록산 공중합체; 분자사슬 양말단 트리메틸실록시기 봉쇄 디메틸실록산/메틸하이드로젠실록산/디페닐실록산 공중합체; 분자 사슬 양말단 디메틸하이드로젠실록시기 봉쇄 디메틸폴리실록산; 분자사슬 양말단 디메틸하이드로젠실록시기 봉쇄 디메틸폴리실록산/메틸하이드로젠실록산 공중합체; 분자사슬 양말단 디메틸하이드로젠실록시기 봉쇄 디메틸실록산/디페닐실록산 공중합체; 분자사슬 양말단 디메틸하이드로젠실록시기 봉쇄 디페닐폴리실록산; R3 3SiO1 /2(R3는 상기와 같고, 이하의 R3도 동일하다) 단위와 R3 2HSiO1 /2 단위와 SiO2 단위로 이루어진 폴리오르가노실록산 공중합체; R3 2HSiO1 /2 단위와 SiO2 단위로 이루어진 폴리오르가노실록산 공중합체; R3HSiO 단위와, R3SiO3 /2 단위 또는 HSiO3 /2 단위로 이루어진 폴리오르가노실록산 공중합체 등을 들 수 있다. 이들은 1종을 단독으로 또는 2종 이상을 조합하여 사용할 수 있다. As a specific example of (C) component, Molecular-chain sock end trimethylsiloxy group blocking methylhydrogen polysiloxane; Molecular chain sock end trimethylsiloxy group blocking dimethylsiloxane / methylhydrogensiloxane copolymer; Molecular chain sock end trimethylsiloxy group blockade dimethylsiloxane / methylhydrogensiloxane / diphenylsiloxane copolymer; Molecular chain sock end dimethylhydrogensiloxy group blockade dimethylpolysiloxane; Molecular chain sock end dimethylhydrogensiloxy group blockade dimethylpolysiloxane / methylhydrogensiloxane copolymer; Molecular chain sock end dimethylhydrogensiloxy group blocking dimethylsiloxane / diphenylsiloxane copolymer; Molecular chain sock end dimethylhydrogensiloxy group blocking diphenylpolysiloxane; R 3 3 SiO 1/2 ( R 3 are as defined above, R 3 is the same or less) a polyorganosiloxane copolymer consisting of units and R 3 2 HSiO 1/2 units and SiO 2 units; R 3 polyorganosiloxane copolymer consisting of 2 HSiO 1/2 units and SiO 2 units; R 3 HSiO units, and the like polyorganosiloxane copolymer composed of R 3 SiO 3/2 units or HSiO 3/2 units. These can be used individually by 1 type or in combination of 2 or more type.
(C)성분으로서는, 상기 폴리오르가노하이드로젠실록산 중에서도, 특히, 규소원자에 결합되는 유기기로서 메틸기만을 갖는 폴리메틸하이드로젠실록산, 구체적으로는 상기 평균조성식인 화학식 3의 R3가 모두 메틸기인 폴리메틸하이드로젠실록산이 바람직하다.As the component (C), among the above polyorganohydrogensiloxanes, in particular, a polymethylhydrogensiloxane having only a methyl group as an organic group bonded to a silicon atom, specifically R 3 in the above formula ( 3) is a methyl group. Preference is given to polymethylhydrogensiloxanes.
(C)성분인 폴리오르가노하이드로젠실록산의 함유량은, 상기 (A)성분과 (B)성분의 경화 유효량이며, 특히 (C)성분이 갖는 Si-H기가, (A)성분 및 (B)성분이 각각 갖는 알케닐기(예를 들어, 비닐기)의 합계량 1 몰에 대해서 1~3 몰이 되는 양이며, 바람직하게는 1.2~2.5 몰이 되는 양이다. (C)성분을 상기 함유량으로 함유함으로써, 경화 반응이 충분히 진행되고, 또한 미반응의 Si-H기가 실리콘 경화물 중에 다량으로 잔존하는 일도 없으므로, 얻어지는 실리콘 경화물의 물성이 경시적으로 변화되는 일도 거의 없다.Content of the polyorganohydrogensiloxane which is (C) component is hardening effective amount of the said (A) component and (B) component, The Si-H group which especially (C) component has, (A) component and (B) It is an amount which will be 1-3 mol with respect to 1 mol of total amounts of the alkenyl group (for example, vinyl group) which a component has, respectively, Preferably it is an amount which will be 1.2-2.5 mol. By containing (C) component in the said content, hardening reaction fully advances and unreacted Si-H group does not remain in a large amount in hardened | cured silicone, and the physical property of the silicone hardened | cured material obtained changes with time, none.
[(D)성분][(D) component]
(D)성분의 실리카 분말은, 일반적으로 실리콘 경화물에 배합되어 있는 공지의 것이어도 좋다. (D)성분은 가교전의 조성물에 적절한 유동성, 틱소트로피성을 부여하고, 또한 가교하여 얻어지는 폴리오르가노실록산의 가교체에 그 용도에 따라서 요구되는 높은 기계적 강도를 부여하는 작용을 갖는다.The silica powder of (D) component may be a well-known thing generally mix | blended with a silicone hardened | cured material. (D) component has the effect | action which gives a suitable fluidity | liquidity and thixotropy property to the composition before bridge | crosslinking, and gives the high mechanical strength required according to the use to the crosslinked body of the polyorganosiloxane obtained by bridge | crosslinking.
(D)성분의 실리카 분말은 본 발명의 조성물에 첨가하여 상기 기능을 수행하기 위해, BET 법에 의한 비표면적(이하, BET 비표면적이라고 함)이, 50㎡/g 이상인 것이 바람직하고, 50~600㎡/g이 보다 바람직하며, 100~400㎡/g이 특히 바람직하다. 실리카의 종류에 특별히 한정은 없지만, 침전 실리카, 연무질 실리카(흄드 실리카), 소성 실리카 등이 적절하게 사용된다. 보강성, 틱소트로피성 부여의 측면에서, 연무질 실리카가 바람직하다.In order to perform the above functions by adding the silica powder of component (D) to the composition of the present invention, the specific surface area (hereinafter referred to as BET specific surface area) by the BET method is preferably 50 m 2 / g or more, and 50 to 600 m <2> / g is more preferable, and 100-400 m <2> / g is especially preferable. Although there is no limitation in particular in the kind of silica, Precipitated silica, aerosol silica (fumed silica), calcined silica, etc. are used suitably. In view of reinforcement and thixotropy provision, fumed silica is preferred.
(D)성분의 실리카 분말은 본 발명의 조성물에서 필수성분이지만, 미처리의 실리카 표면에는 다수의 실라놀기(Si-OH기)가 존재하므로, 실리카 분말을 그대로 첨가하면, 증점, 현저한 가소화 복귀 등의 문제를 발생하기 쉽다. 그 때문에, 실리카 분말의 표면을 소수화 처리하는 것이 바람직하다. 표면처리량은 실리카 표면의 카본량을 2.0 질량% 이상, 보다 바람직하게는 3.0 질량% 이상으로 하는 양인 것이 바람직하다. 2.0 질량% 미만에서는, 조성물의 증점, 포트 라이프(pot life)의 향상에 효과가 적다. 또한, 카본량의 상한은 특별히 제한되지 않지만, 통상 20 질량% 이하, 바람직하게는 12 질량% 이하, 특히 8 질량% 이하이다. (D)성분의 실리카 분말로서는, 미리 분체의 상태에서 표면 처리된 것을 사용해도, 혼련 프로세스에서 표면 처리를 실시해도 상관없다.Although the silica powder of (D) component is an essential component in the composition of this invention, since many silanol groups (Si-OH group) exist in the untreated silica surface, when a silica powder is added as it is, thickening and remarkable plasticization return etc. Is prone to problems. Therefore, it is preferable to hydrophobize the surface of the silica powder. It is preferable that surface treatment amount is an amount which makes carbon amount of a silica surface 2.0 mass% or more, More preferably, it is 3.0 mass% or more. If it is less than 2.0 mass%, there is little effect on the thickening of a composition and the improvement of pot life. The upper limit of the amount of carbon is not particularly limited, but is usually 20% by mass or less, preferably 12% by mass or less, particularly 8% by mass or less. As silica powder of (D) component, what was surface-treated previously in the state of powder may be used, or you may surface-treat in a kneading process.
실리카 분말의 표면처리방법으로서는, 일반에 주지된 표면처리기술을 채용할 수 있다. 표면처리제로서 사용되는 유기규소 화합물로서는, 1,3-디비닐테트라메틸디실라잔, 1,3-디메틸테트라비닐디실라잔, 헥사메틸디실라잔 등의 헥사오르가노디실라잔, 및 옥타메틸트리실라잔, 1,5-디비닐헥사메틸트리실라잔 등의 옥타오르가노트리실라잔 등의 오르가노실라잔류; 메틸트리메톡시실란, 에틸트리메톡시실란, 프로필트리메톡시실란, 부틸트리메톡시실란 등의 알킬트리알콕시실란; 디메틸디메톡시실란, 디에틸디메톡시실란, 디메틸디에톡시실란, 디에틸디에톡시실란 등의 디알킬디알콕시실란; 비닐트리에톡시실란, 비닐트리메톡시실란, 비닐트리스(메톡시에톡시)실란 등의 알케닐트리알콕시실란; 디비닐디메톡시실란, 디비닐디에톡시실란 등의 디알케닐디알콕시실란; 트리메틸메톡시실란, 트리에틸메톡시실란 등의 트리알킬알콕시실란; 트리비닐메톡시실란, 트리비닐에톡시실란 등의 트리알케닐알콕시실란; 트리메틸클로로실란, 디메틸디클로로실란, 메틸트리클로로실란, 비닐트리클로로실란, 디비닐디클로로실란, 트리비닐클로로실란 등의 오르가노클로로실란; 및 클로로프로필트리메톡시실란 등의 실란커플링제; 디메틸폴리실록산(환상 구조를 포함), 오르가노하이드로젠폴리실록산 등을 들 수 있고, 이들의 부분가수분해 반응물이어도 좋다. 또한, 이들 중에서는, 가수분해성기 이외의 규소원자에 결합되는 치환기가 메틸기인 실란계 커플링제, 고리형 디메틸폴리실록산 및 오르가노실라잔류가 바람직하다.As the surface treatment method of the silica powder, a surface treatment technique well-known in general can be adopted. As an organosilicon compound used as a surface treating agent, hexaorgano disilazane, such as 1, 3- divinyl tetramethyl disilazane, 1, 3- dimethyl tetravinyl disilazane, hexamethyl disilazane, and octamethyl tri Organosilazanes such as octaorganotrisilazane such as silazane and 1,5-divinylhexamethyltrisilazane; Alkyltrialkoxysilanes such as methyltrimethoxysilane, ethyltrimethoxysilane, propyltrimethoxysilane and butyltrimethoxysilane; Dialkyl dialkoxysilanes such as dimethyldimethoxysilane, diethyldimethoxysilane, dimethyldiethoxysilane and diethyldiethoxysilane; Alkenyltrialkoxysilanes such as vinyltriethoxysilane, vinyltrimethoxysilane and vinyltris (methoxyethoxy) silane; Diallkenyl dialkoxysilanes, such as divinyl dimethoxysilane and divinyl diethoxysilane; Trialkylalkoxysilanes such as trimethylmethoxysilane and triethylmethoxysilane; Trialkenyl alkoxysilane, such as trivinyl methoxysilane and trivinyl ethoxysilane; Organochlorosilanes such as trimethylchlorosilane, dimethyldichlorosilane, methyltrichlorosilane, vinyltrichlorosilane, divinyldichlorosilane and trivinylchlorosilane; And silane coupling agents such as chloropropyltrimethoxysilane; Dimethyl polysiloxane (including a cyclic structure), organohydrogen polysiloxane, etc. are mentioned, These partial hydrolysis reactants may be sufficient. Among these, silane coupling agents, cyclic dimethylpolysiloxanes, and organosilazanes in which substituents bonded to silicon atoms other than hydrolyzable groups are methyl groups are preferable.
(D)성분의 실리카 분말로서는, 시판품을 사용해도 좋다. 시판품으로서는 표면 미처리의 연무질 실리카로서, 아에로질200(상품명, EVONIC제, BET비표면적: 200㎡/g), 아에로질300(상품명, EVONIC제, BET비표면적: 300㎡/g) 등을 들 수 있다. 또한, 본 발명에서는 이와 같은 시판품을 옥타메틸시클로테트라실록산이나 헥사메틸디실라잔 등으로 표면 처리한 실리카 분말을 사용하는 것이 바람직하다. (D)성분은 1종을 사용해도, 2종 이상을 병용해도 좋다.As a silica powder of (D) component, you may use a commercial item. Commercially available aerosol silica is a surface untreated aerosol 200 (trade name, product of EVONIC, BET specific surface area: 200 m 2 / g), aerosil 300 (product name, product of EVONIC, BET specific surface area: 300 m 2 / g) Etc. can be mentioned. Moreover, in this invention, it is preferable to use the silica powder which surface-treated these commercial items with octamethylcyclo tetrasiloxane, hexamethyldisilazane, etc. (D) A component may use 1 type or may use 2 or more types together.
본 발명의 조성물에서의 (D)성분의 함유량은, (A)성분과 (B)성분의 합계량 100 질량부에 대해서 5~20 질량부이고, 10~15 질량부가 바람직하다. (D)성분인 실리카 분말의 함유량이 상기 범위에 있으면, 조성물의 점도는 적정한 것이 되고 성형시의 작업성이 양호하게 유지되며, 또한 얻어지는 실리콘 경화물의 기계적 강도 등의 특성도 충분히 유지된다.Content of (D) component in the composition of this invention is 5-20 mass parts with respect to 100 mass parts of total amounts of (A) component and (B) component, and 10-15 mass parts is preferable. When content of the silica powder which is (D) component exists in the said range, the viscosity of a composition will become suitable, the workability at the time of shaping | molding will be maintained favorable, and the characteristics, such as mechanical strength of the silicone hardened | cured material obtained, are also fully maintained.
[(E)성분][(E) component]
(E)성분인 히드로실릴화 반응촉매는, (A)성분 및 (B)성분에 각각 포함되는 알케닐기와 (C)성분 중의 Si-H기와의 부가반응(히드로실릴화 반응)을 촉진하는 촉매이다. (E)성분으로서는, 백금계 촉매, 팔라듐계 촉매, 로듐계 촉매 등을 들 수 있지만, 경제성의 측면에서 백금계 촉매가 바람직하다. 백금계 촉매로서는, 예를 들어 염화백금산, 알콜변성 염화백금산, 염화백금산과 올레핀류, 비닐실록산 또는 아세틸렌 화합물과의 배위화합물 등을 사용할 수 있다. 이들은 1종을 단독으로도 2종 이상을 조합하여 사용할 수 있다.The hydrosilylation reaction catalyst as the component (E) is a catalyst that promotes the addition reaction (hydrosilylation reaction) of the alkenyl group contained in the component (A) and the component (B) to the Si—H group in the component (C). to be. Examples of the component (E) include a platinum catalyst, a palladium catalyst, a rhodium catalyst, and the like, but from the viewpoint of economical efficiency, a platinum catalyst is preferable. As the platinum-based catalyst, for example, a chloroplatinic acid, an alcohol-modified platinum chloride, a chloroplatinic acid and a coordination compound of olefins, vinylsiloxane, or acetylene compound can be used. These can be used individually by 1 type or in combination of 2 or more type.
(E)성분의 함유량은, 히드로실릴화 반응의 촉매로서 유효한 양이면 특별히 한정되지 않지만, (A)성분, (B)성분 및 (C)성분의 합계량(질량)에 대해서, 백금원소로 환산하여 0.1~1,000ppm, 보다 바람직하게는 1~500ppm, 더욱 바람직하게는 1~20 ppm의 범위로 한다. 함유량이 이 범위에 있는 경우에는, 부가반응이 충분히 촉진되는 결과 충분한 경화가 얻어지고, 또한 경제적으로 유리하다.The content of the component (E) is not particularly limited as long as it is an amount effective as a catalyst for the hydrosilylation reaction, but is converted into platinum element based on the total amount (mass) of the component (A), the component (B) and the component (C). 0.1-1,000 ppm, More preferably, it is 1-500 ppm, More preferably, it is the range of 1-20 ppm. When the content is in this range, the addition reaction is sufficiently promoted, and as a result, sufficient curing is obtained and economically advantageous.
[임의성분-(F)성분][Arbitrary component- (F) component]
본 발명의 광반도체 소자 밀봉용 실리콘 조성물에는, 또한 (F)성분으로서 에폭시기, 히드로실릴기(Si-H기), 가교성 비닐기 및 알콕시실릴기로부터 선택되는 적어도 2종을 포함하는 접착성 부여제를 함유하는 것이 바람직하다.The silicone composition for encapsulating the optical semiconductor element of the present invention further provides adhesiveness comprising at least two selected from epoxy groups, hydrosilyl groups (Si-H groups), crosslinkable vinyl groups, and alkoxysilyl groups as (F) components. It is preferable to contain an agent.
(F)성분의 접착성 부여제로서는, 예를 들어 하기 화학식 4로 표시되는 실란커플링제(F1)를 들 수 있다.As an adhesive imparting agent of (F) component, the silane coupling agent (F1) represented by following General formula (4) is mentioned, for example.
(화학식 4)(Formula 4)
(단, 화학식 4에서 R11은 탄소원자수 1~5의 알킬기를, X는 탄소원자수 1~5의 알콕시기를, Y는 에폭시기 또는 치환되어 있어도 좋은 비닐기를, Q는 단결합, -O-, -C(=O)-O- 결합을 가져도 좋은 탄소수 1~10의 2가의 탄화수소기를 각각 나타내고, p는 0 또는 1이고, 복수의 X는 동일해도 달라도 좋다)(Wherein R 11 is an alkyl group having 1 to 5 carbon atoms, X is an alkoxy group having 1 to 5 carbon atoms, Y is an epoxy group or a vinyl group which may be substituted, and Q is a single bond, -O-,- Each C1-C10 divalent hydrocarbon group which may have a C (= O) -O- bond, p is 0 or 1, and some X may be same or different)
Y-Q-로서, 구제적으로는 비닐기, 비닐페닐기, 3-아크릴옥시프로필기, 3-메타크릴옥시프로필기, 2-(3,4-에폭시시클로헥실)에틸기, 3-글리시독시프로필기 등을 들 수 있다. R11으로서는, 메틸기가 바람직하다. X로서는, 메톡시기, 에톡시기가 바람직하다.As YQ-, specifically, a vinyl group, a vinylphenyl group, 3-acryloxypropyl group, 3-methacryloxypropyl group, 2- (3, 4- epoxycyclohexyl) ethyl group, 3-glycidoxy propyl group, etc. Can be mentioned. As R 11 , a methyl group is preferable. As X, a methoxy group and an ethoxy group are preferable.
(F)성분의 접착성 부여제로서는, 예를 들어 1분자 중에 적어도 Si-H기를 2개 이상 갖고 있는 오르가노실록산 올리고머와, Si-H기와 반응할 수 있는 관능기와 에폭시기, 가교성 비닐기 및 알콕시실릴기로부터 선택되는 적어도 1종을 갖는 화합물을 반응시켜 얻어지는 화합물(F2)도 바람직하게 사용된다.As an adhesive imparting agent of (F) component, for example, the organosiloxane oligomer which has at least 2 Si-H groups in 1 molecule, the functional group and epoxy group which can react with a Si-H group, a crosslinkable vinyl group, The compound (F2) obtained by making the compound which has at least 1 sort (s) chosen from an alkoxy silyl group react is also used preferably.
Si-H기를 갖는 오르가노실록산 올리고머는, 규소원자수가 바람직하게는 2~10개이고, 더욱 바람직하게는 2~6개이다. Si-H기를 갖는 오르가노실록산 올리고머로서는, 예를 들어 하기 화학식의 (S1)~(S4)로 각각 표시되는 오르가노실록산 올리고머를 들 수 있다. 이들 중에서도, (S1)으로 표시되는 오르가노실록산 올리고머가 바람직하다.The organosiloxane oligomer having a Si—H group is preferably 2 to 10 silicon atoms, more preferably 2 to 6 silicon atoms. As an organosiloxane oligomer which has a Si-H group, the organosiloxane oligomer represented by (S1)-(S4) of the following general formula is mentioned, for example. Among these, the organosiloxane oligomer represented by (S1) is preferable.
(단, 상기 화학식 중 (S4)에서, q는 0~8의 정수이다.)(However, in the above formula (S4), q is an integer of 0-8.)
상기 Si-H기를 갖는 오르가노실록산 올리고머의 Si-H기와 반응할 수 있는 관능기와 에폭시기, 가교성 비닐기 및 알콕시실릴기로부터 선택되는 적어도 1종을 갖는 화합물로서는, 예를 들어 상기 (화학식 4)로 표시되는 실란 커플링제 중, Y-Q-로서 비닐기, 비닐페닐기, 3-아크릴옥시프로필기, 3-메타크릴옥시프로필기 등을 갖는, 비닐기를 갖는 실란커플링제(F1)를 들 수 있다.As a compound which has a functional group which can react with the Si-H group of the organosiloxane oligomer which has the said Si-H group, and at least 1 sort (s) chosen from an epoxy group, a crosslinkable vinyl group, and an alkoxy silyl group, For example, (Formula 4) The silane coupling agent (F1) which has a vinyl group which has a vinyl group, a vinylphenyl group, 3-acryloxypropyl group, 3-methacryloxypropyl group, etc. as YQ- is mentioned among the silane coupling agents represented by these.
보다 구체적으로는, (S1)으로 표시되는 오르가노실록산 올리고머와 3-메타크릴옥시 프로필기를 갖는 실란커플링제(F1)와의, 몰비로 1:1 반응생성물을 들 수 있다. 얻어지는 반응생성물은, 알콕시실릴기와 Si-H기를 갖는 화합물(F2)이다.More specifically, 1: 1 reaction product is mentioned by molar ratio of the organosiloxane oligomer represented by (S1) and the silane coupling agent (F1) which has 3-methacryloxy propyl group. The obtained reaction product is a compound (F2) which has an alkoxysilyl group and Si-H group.
(F)성분의 접착성 부여제로서는, 또한 이소시아누르산의 1,3,5 위치의 수소를, 각각 독립적으로 에폭시기, Si-H기, 가교성 비닐기 및 알콕시실릴기로부터 선택되는 1종을 갖는 1가의 유기기로 치환한 이소시아누르산 유도체(F3)를 사용해도 좋다. 이소시아누르산 유도체(F3)로서는, 알콕시실릴기를 갖는 이소시아누르산 유도체가 바람직하다.As an adhesive imparting agent of (F) component, 1 type of hydrogen of the 1,3,5 position of isocyanuric acid is respectively independently chosen from an epoxy group, a Si-H group, a crosslinkable vinyl group, and an alkoxysilyl group. You may use the isocyanuric acid derivative (F3) substituted by the monovalent organic group which has these. As the isocyanuric acid derivative (F3), an isocyanuric acid derivative having an alkoxysilyl group is preferable.
(F)성분은 1종을 사용해도, 2종 이상을 병용해도 좋다. 바람직한 조합은 에폭시기를 갖는 실란커플링제(F1)의 적어도 1종과, 알콕시실릴기와 Si-H기를 갖는 화합물(F2) 중 적어도 1종의 조합이다. 또한, (F)성분은 (A)성분 및 (B)성분의 합계 100 질량에 대해서, 0.1~10 질량부의 비율로 함유하는 것이 바람직하고, 1~5 질량부가 더욱 바람직하다.(F) A component may use 1 type or may use 2 or more types together. Preferable combination is a combination of at least one of the silane coupling agents (F1) having an epoxy group and at least one of the compounds (F2) having an alkoxysilyl group and a Si—H group. Moreover, it is preferable to contain (F) component in the ratio of 0.1-10 mass parts with respect to a total of 100 mass of (A) component and (B) component, and 1-5 mass parts is more preferable.
[임의성분-(G)성분][Arbitrary component- (G) component]
본 발명의 광반도체 소자 밀봉용 실리콘 조성물에는, (G)성분으로서, 액상의 틱소트로피성 부여제를 추가로 함유하는 것이 바람직하다. (G)성분은 (D)성분의 실리카 분말이 갖는 수산기와 함께 수소결합이나 의사(擬似)가교를 형성함으로써 틱소트로피성을 발현시키는 것으로, 액상의 화합물이다. 또한, 본 명세서에서 액상이라는 것은, 적어도 실온(25℃)에서 액상, 즉 유동성을 갖는 상태, 예를 들어 점도가 1000mPa·s 이하의 상태인 것을 말한다.It is preferable that the silicone composition for optical semiconductor element sealing of this invention further contains a liquid thixotropic imparting agent as (G) component. (G) A component is a liquid compound which expresses thixotropy by forming a hydrogen bond and pseudo crosslinking with the hydroxyl group which the silica powder of (D) component has. In addition, in this specification, a liquid state means a liquid state, ie, the state which has fluidity, for example, a state whose viscosity is 1000 mPa * s or less at least at room temperature (25 degreeC).
액상의 틱소트로피성 부여제로서는, 히드록시기(-OH기), 알콕시기, 알케닐옥시기, 아릴옥시기 등의 오르가노옥시기 등의 극성기, 및 에폭시기 중 어느 한쪽을 갖는 실란, 실리콘 화합물(오르가노폴리실록산)이나 폴리에테르 등의 유기수지 성분을 사용할 수 있다. 구체적으로는, 폴리옥시프로필렌글리콜, 알콕시실란류, 상기 관능기를 함유하는 고리형 실록산 등을 들 수 있다.As a liquid thixotropy-imparting agent, the silane and silicone compound (organopolysiloxane) which has either polar groups, such as organooxy groups, such as a hydroxyl group (-OH group), an alkoxy group, an alkenyloxy group, and an aryloxy group, and an epoxy group And organic resin components such as polyether. Specifically, polyoxypropylene glycol, alkoxysilanes, cyclic siloxane containing the said functional group, etc. are mentioned.
(G)성분은 1종을 사용해도, 2종 이상을 병용해도 좋다. 또한, (G)성분은 (A)성분 및 (B)성분의 합계 100 질량부에 대해서, 0.005~5 질량부의 비율로 함유하는 것이 바람직하고, 0.01~3 질량부가 더욱 바람직하다.(G) A component may use 1 type or may use 2 or more types together. Moreover, it is preferable to contain (G) component in the ratio of 0.005-5 mass parts with respect to a total of 100 mass parts of (A) component and (B) component, and 0.01-3 mass parts is more preferable.
또한, 상기 (F)성분의 화합물 중에는, 접착성 부여의 기능을 갖고, 또한 액상이며 틱소트로피성 부여의 기능을 갖는 화합물이 많이 존재한다. 본 발명의 광반도체 소자 밀봉용 실리콘 조성물에서는, 임의성분인 (F)성분이 배합되지 않은 경우나, 배합되어도 (F)성분이 틱소트로피성 부여의 기능을 갖지 않는 경우에는, (G)성분을 상기의 범위내에서 조정함으로써, 틱소트로피성을, 예를 들어 후술하는 지표(η2/η20)에서 충분한 레벨로 하는 것이 바람직하다.Moreover, in the compound of the said (F) component, there exist many compounds which have a function of providing adhesiveness, and are liquid and have a function of providing thixotropy. In the silicone composition for optical semiconductor element sealing of this invention, when (F) component which is an arbitrary component is not mix | blended, or even if it mix | blends, (F) component does not have the function of providing thixotropy, (G) component is used. By adjusting within said range, it is preferable to make thixotropy into sufficient level, for example in the index ((eta) 2 / (eta) 20 ) mentioned later.
또한, 상기와 같이 접착성 부여를 위해 (F)성분으로서 사용한 화합물을, (F)성분(접착성 부여제)로서 기능하는 충분한 양으로 본 발명의 조성물에 배합했을 때, 그에 의해 틱소트로피성이 예를 들어 후술하는 지표로 충분한 레벨에 도달하지 않은 경우에는, 이와 별도로 (G)성분, 바람직하게는 접착성 부여제로서는 기능하지 않는 (G)성분을, 틱소트로피성이 충분한 레벨에 도달하는 양으로 배합하는 것이 바람직하다. 예를 들어, (F)성분으로서 (F1), (F2), (F3)와 같은 성분을 상기 바람직한 양으로 배합한 경우, (G)성분의 배합량으로서는 (G)성분의 종류에도 따르지만, (A)성분 및 (B)성분의 합계 100 질량에 대해서, 0.005~1 질량부의 비율이 바람직하고, 0.01~0.5 질량부가 더욱 바람직하다. 또한, 이 경우의 (G)성분으로서는, 폴리옥시프로필렌글리콜과 같은 폴리에테르가 바람직하게 사용된다.Further, when the compound used as the component (F) for imparting adhesion as described above is blended into the composition of the present invention in a sufficient amount functioning as the component (F) (adhesiveness), thixotropy is thereby achieved. For example, when sufficient level is not reached by the below-mentioned index, the amount which reaches the level with sufficient thixotropy for (G) component which does not function as a component (G) component, Preferably an adhesive agent is provided separately. It is preferable to mix | blend with. For example, when the component like (F1), (F2), (F3) is mix | blended in the said preferable quantity as (F) component, As a compounding quantity of (G) component, it depends also on the kind of (G) component, (A The ratio of 0.005-1 mass part is preferable with respect to 100 mass of the sum total of a component and (B) component, and 0.01-0.5 mass part is more preferable. In addition, as (G) component in this case, polyether like polyoxypropylene glycol is used preferably.
또한, 접착성 부여를 위해 (F)성분으로서 사용한 화합물을, (F)성분(접착성 부여제)으로서 기능하는 충분한 양으로 본 발명의 조성물에 배합했을 때, 그에 의해 틱소트로피성이 예를 들어 후술하는 지표에서 충분한 레벨에 도달한 경우에는, 그와 별도로 추가로 (G)성분을 배합할 필요는 없다. 이와 같이, 본 발명의 광반도체 소자 밀봉용 실리콘 조성물에서는, (F)성분과 (G)성분을 조합하여 사용했을 때, 접착성과 틱소트로피성의 양쪽이, 요구되는 레벨, 예를 들어 접착성에 대해서는 얻어지는 경화물에서 광반도체 소자나 지지기판과의 밀착성이 충분히 확보되는 레벨에, 그리고 틱소트로피성에 대해서는 후술하는 지표에서 충분한 레벨에 합치되도록 배합하면 좋다.Moreover, when mix | blending the compound used as (F) component for the provision of adhesiveness with the composition of this invention in sufficient quantity which functions as (F) component (adhesiveness-imparting agent), thixotropy property is given by this, for example. When sufficient level is reached by the below-mentioned index, it is not necessary to mix | blend (G) component further separately. Thus, in the silicone composition for optical semiconductor element sealing of this invention, when using combining (F) component and (G) component, both adhesiveness and thixotropy are obtained about a required level, for example adhesiveness, is obtained. It is good to mix | blend so that the hardened | cured material may correspond to the level which ensures sufficient adhesiveness with an optical semiconductor element or a support substrate, and thixotropy is sufficient level with the index mentioned later.
[기타 임의성분][Other Optional Ingredients]
본 발명의 광반도체 소자 밀봉용 실리콘 조성물은, 상기 (A)~(E)의 각 성분을 필수성분으로서 상기 함유량으로 함유하고, 이들에 임의성분으로서 필요에 따라서 상기 (F)성분, (G)성분을 상기의 함유량으로 함유한다. 또한, 임의성분으로서, 히드로실릴화 반응을 억제하는 반응억제제를 첨가해도 좋다.The silicone composition for optical semiconductor element sealing of this invention contains each component of said (A)-(E) as an essential component in the said content, and as these optional components to these (F) component, (G) A component is contained in said content. Moreover, you may add the reaction inhibitor which suppresses a hydrosilylation reaction as an optional component.
반응억제제로서는, 예를 들어 트리페닐포스핀 등의 인 함유 화합물; 트리부틸아민, 테트라메틸에틸렌디아민, 벤조트리아졸 등의 질소함유 화합물; 유황 함유 화합물, 아세틸렌계 화합물, 알케닐기를 2개 이상 포함하는 화합물, 하이드로퍼옥시 화합물, 말레산 유도체 등을 들 수 있고, 바람직하게는 3-메틸-1-부틴-3-올, 1-에티닐-1-시클로헥산올 등의 수산기를 갖는 아세틸렌계 화합물이다.As a reaction inhibitor, For example, phosphorus containing compounds, such as triphenylphosphine; Nitrogen-containing compounds such as tributylamine, tetramethylethylenediamine and benzotriazole; Sulfur-containing compounds, acetylene compounds, compounds containing two or more alkenyl groups, hydroperoxy compounds, maleic acid derivatives, and the like, and the like, and preferably 3-methyl-1-butyn-3-ol and 1- It is an acetylene type compound which has hydroxyl groups, such as a thynyl- 1-cyclohexanol.
또한, 본 발명의 광반도체 소자 밀봉용 실리콘 조성물에는, 상기 이외의 폴리오르가노실록산, 분쇄 실리카(석영 미세분말), 산화알루미늄 등의 상기 (D)성분의 실리카 분말 이외의 무기충전제, 은분 등의 도전성 충전제, 사용되는 광반도체 장치에서 목적으로 하는 발광색을 얻기 위한 형광체, 톨루엔, 자일렌, 헥산, 헵탄, 에탄올, 이소프로필알콜, 아세톤, 메틸에틸케톤 등의 유기용제, 염료, 안료, 난연성 부여제, 내열성 향상제, 내산화열화제(耐酸化劣化劑), 파장조정제 등을, 이하에 설명하는 본 발명의 조성물 및 그 경화물에서의 특성을 손상시키지 않는 범위 및 본 발명의 목적을 손상시키지 않는 범위에서 첨가해도 좋다.In addition, the silicone composition for optical semiconductor element sealing of the present invention includes inorganic fillers other than the silica powder of the above-mentioned (D) component, such as polyorganosiloxane, crushed silica (quartz micropowder), aluminum oxide, etc. other than the above-mentioned. Conductive fillers, phosphors for obtaining the desired emission color in the optical semiconductor device used, organic solvents such as toluene, xylene, hexane, heptane, ethanol, isopropyl alcohol, acetone, methyl ethyl ketone, dyes, pigments, flame retardant Ranges that do not impair the properties of the composition of the present invention and the cured product described below, the heat resistance improver, the oxidation deteriorating agent, the wavelength adjusting agent and the like, and the range which does not impair the object of the present invention. You may add from.
본 발명의 광반도체 소자 밀봉용 실리콘 조성물의 제조방법으로서는, 각 성분의 첨가순서는 특별히 한정되는 것은 아니고, (A)~(E)의 필수성분과, 바람직하게 첨가되는 임의 성분으로서의 (F)성분, (G)성분 및 상술한 그 밖의 임의성분을, 주지의 혼련기로 혼련하는 방법 등을 들 수 있다. 혼련기로서는, 필요에 따라서 가열 수단 및 냉각 수단을 구비한, 예를 들어 플라네터리 믹서, 3본롤, 니더, 시나가와 믹서 등을 들 수 있고, 단독 또는 이를 조합하여 사용할 수 있다.As a manufacturing method of the silicone composition for optical semiconductor element sealing of this invention, the addition order of each component is not specifically limited, The (F) component as an essential component of (A)-(E) and the arbitrary component added preferably And (G) component and the method of kneading the other arbitrary components mentioned above with a well-known kneader. As the kneader, for example, a planetary mixer, a three roll, a kneader, a Shinagawa mixer, etc., provided with heating means and cooling means, may be used.
본 발명의 광반도체 소자 밀봉용 실리콘 조성물은 액상이고, 회전점도계에 의한 25℃에서의 20rpm의 점도 η20은, 10~50㎩·s인 것이 바람직하다. 점도가 50㎩·s를 초과하면, 예를 들어 LED에 포팅할 때 디스펜서의 막힘(clogging)을 발생시키기 쉽다. 한편, 10㎩·s미만이면, 포팅할 때 액의 맺힘(liquid dripping)을 일으키기 쉽다.It is preferable that the silicone composition for optical semiconductor element sealing of this invention is liquid, and the viscosity (eta) 20 of 20 rpm in 25 degreeC by a rotational viscometer is 10-50 Pa.s. When the viscosity exceeds 50 Pa · s, clogging of the dispenser is likely to occur, for example, when potting to LEDs. On the other hand, if it is less than 10 Pa.s, liquid dripping is likely to occur when potting.
본 발명의 광반도체 소자 밀봉용 실리콘 조성물은, 회전점도계에 의한 25℃에서의 2rpm의 점도 η2와 20rpm의 점도 η20와의 비 η2/η20이, 1.8~6.0인 것이 바람직하고, η2/η20은 2.0~5.0이 더욱 바람직하다. η2/η20의 값은, 본 발명의 광반도체 소자 밀봉용 실리콘 조성물의 틱소트로피성을 평가하는 지표로서 사용할 수 있다. η2/η20이 상기 범위에 있음으로써, 토출된 조성물은 적절한 돔 형상을 유지할 수 있다. 적절한 돔 형상이라는 것은, 높이/직경의 비가 0.2~0.5인 것을 가리킨다. 또한, 회전점도계로서는 예를 들어 비스메트론 VDH형(시바우라 시스템사제)등이 바람직하다.As for the silicone composition for optical semiconductor element sealing of this invention, it is preferable that ratio (eta) 2 / (eta) 20 of the viscosity (eta) 2 of 2 rpm at 25 degreeC and the viscosity (eta) 20 of 20 rpm by 25 degreeC with a rotational viscometer is 1.8-6.0, and (eta) 2. / η 20, it is more preferably 2.0 ~ 5.0. The value of (eta) 2 / (eta) 20 can be used as an index which evaluates the thixotropy of the silicone composition for optical semiconductor element sealing of this invention. By having? 2 / η 20 in the above range, the discharged composition can maintain an appropriate dome shape. The appropriate dome shape indicates that the ratio of height / diameter is 0.2 to 0.5. As the rotational viscometer, for example, bismetrone VDH type (manufactured by Shibaura Systems Co., Ltd.) is preferable.
본 발명의 광반도체 소자 밀봉용 실리콘 조성물은 굴절률(25℃, D선)이 1.41~1.44이고, 굴절률(25℃, D선)은 1.42~1.43이 바람직하다. 또한, 조성물의 굴절률은 예를 들어 아베 굴절률계(Abbe refractometer)를 사용하여 측정할 수 있다. 또한, 본 명세서에서 굴절률이라는 것은, 특별히 언급하지 않는 한 25℃, D선에 의해 측정되는 굴절률이다. 본 조성물에서의 굴절률이 상기 범위에 있음으로써, 얻어지는 실리콘 경화물은 광, 예를 들어 파장 400㎚에서의 광의 투과성이 높고, 인장강도나 신장(elongation) 등의 기계적 강도가 우수하다.As for the silicone composition for optical semiconductor element sealing of this invention, refractive index (25 degreeC, D line) is 1.41-1.44, and refractive index (25 degreeC, D line) has preferable 1.42-1.43. In addition, the refractive index of the composition can be measured using, for example, an Abbe refractometer. In addition, in this specification, a refractive index is the refractive index measured by 25 degreeC and D line | wire unless there is particular notice. Since the refractive index in this composition exists in the said range, the silicone hardened | cured material obtained is high in light, for example, light of wavelength 400nm, and is excellent in mechanical strength, such as tensile strength and elongation.
본 발명의 광반도체 소자 밀봉용 실리콘 조성물은, 이를 경화하여 얻어지는 실리콘 경화물을 두께 2㎜의 시트로서 측정했을 때, 25℃에서의 파장 400㎚의 광의 투과율이 90% 이상인 것이 바람직하고, 93% 이상인 것이 더욱 바람직하다. 파장 400㎚의 광의 투과율이 상기 범위이면, 광도전체 소자를 밀봉했을 때의 밀봉재로서 충분한 광투과성을 갖는다고 할 수 있다. 또한, 광의 투과율은 예를 들어 자외·가시·근적외 분광 광도계에 의해 측정할 수 있다.As for the silicone composition for optical semiconductor element sealing of this invention, when the silicone hardened | cured material obtained by hardening this is measured as a sheet of thickness 2mm, it is preferable that the transmittance | permeability of the light of wavelength 400nm at 25 degreeC is 90% or more, 93% It is more preferable that it is above. If the transmittance | permeability of the light of wavelength 400nm is the said range, it can be said that it has sufficient light transmittance as a sealing material at the time of sealing the photoconductor element. In addition, the transmittance | permeability of light can be measured, for example with an ultraviolet-visible, near-infrared spectrophotometer.
본 발명의 광반도체 소자 밀봉용 실리콘 조성물은, 또한 이를 경화하여 얻어지는 실리콘 경화물에서, JIS K6249에 기초하여 TYPE A형 경도계로 측정되는 25℃에서의 경도가 30~80인 것이 바람직하고, 50~70인 것이 더욱 바람직하다. TYPE A형 경도계로 측정되는 25℃에서의 경도가 상기 범위이면, 광반도체 소자를 밀봉했을 때의 밀봉재로서 충분한 기계적 강도를 갖는다고 할 수 있다.In the silicone cured product obtained by curing the silicone composition for optical semiconductor element sealing according to the present invention, the hardness at 25 ° C. measured by a TYPE A type hardness tester based on JIS K6249 is preferably 30 to 80, and is 50 to 50 It is more preferable that it is 70. If the hardness in 25 degreeC measured with a TYPE A-type hardness meter is the said range, it can be said that it has sufficient mechanical strength as a sealing material at the time of sealing an optical semiconductor element.
본 발명의 광반도체 소자 밀봉용 실리콘 조성물은, 또한 이를 경화하여 얻어지는 실리콘 경화물에서, 상기 경도를 갖고 또한 JIS K6249에 기초하여 인장시험기로 측정되는 25℃에서의 인장강도가 4㎫ 이상인 것이 바람직하고, 6㎫이상인 것이 더욱 바람직하다. 또한, 인장강도와 동시에 측정되는 신장이 70% 이상인 것이 바람직하고, 100% 이상인 것이 더욱 바람직하다. 상기 인장강도 및 신장이 상기 범위이면, 광반도체 소자를 밀봉했을 때의 밀봉재로서 충분한 기계적 강도를 갖는다고 할 수 있다.The silicone composition for sealing an optical semiconductor element of the present invention is also preferably a silicone cured product obtained by curing the same, and the tensile strength at 25 ° C. measured by a tensile tester based on JIS K6249 and measured by a tensile tester is preferably 4 MPa or more. It is more preferable that it is 6 Mpa or more. In addition, the elongation measured at the same time as the tensile strength is preferably 70% or more, more preferably 100% or more. When the tensile strength and the elongation are within the above ranges, it can be said to have sufficient mechanical strength as a sealing material when the optical semiconductor element is sealed.
본 발명의 광반도체 소자 밀봉용 실리콘 조성물을 경화시키는 데에는, 주로 (A)성분, (B)성분 및 (C)성분에 히드로실릴화 반응을 시킴으로써 경화를 실시한다. 이 때, 경화반응은 상기 반응억제제의 종류나 그 첨가량에 따라서 적절하게 조정할 수 있다. 바람직한 경화의 조건으로서, 50~200℃에서 60~300분간 가열하는 조건 등을 들 수 있다. 이와 같이 하여 얻어지는 실리콘 경화물은, 경질의 고무형상 또는 가요성을 갖는 레진 형상이고, 상기와 같이 양호한 광투과성과 기계적 강도를 갖는 것이다.In hardening the silicone composition for optical semiconductor element sealing of this invention, hardening is mainly performed by making a hydrosilylation reaction to (A) component, (B) component, and (C) component. At this time, the curing reaction can be appropriately adjusted according to the type of the reaction inhibitor and the amount thereof added. As conditions for preferable hardening, the conditions etc. which heat for 60 to 300 minutes at 50-200 degreeC are mentioned. The silicone hardened | cured material obtained in this way is a hard rubber shape or the resin shape which has flexibility, and has favorable light transmittance and mechanical strength as mentioned above.
본 발명의 광반도체 소자 밀봉용 실리콘 조성물의 경화물은, 기판상에 장착된 LED 등의 광반도체 소자를 밀봉하는 밀봉재로서 사용된다. 본 발명의 광반도체 소자 밀봉용 실리콘 조성물을, 예를 들어 COB(칩 온 보드, chip on board)용으로서 사용한 경우, 우선 광반도체 소자 밀봉용 실리콘 조성물은, 기판상에 장착된 광반도체 소자 상에 그 전체가 덮히도록 소정량이 공급된다. 이어서, 상기 조성물을 경화시킴으로서 밀봉이 실시된다. 본 발명의 광반도체 소자 밀봉용 실리콘 조성물은, 광반도체 소자 상에 공급되고부터 경화가 완료될 때까지 동안, 소정의 형상, 예를 들어 돔 형상을 유지하는 것이 가능한 점에서, 특히 COB(칩 온 보드)용으로서 바람직하다.The hardened | cured material of the silicone composition for optical semiconductor element sealing of this invention is used as a sealing material which seals optical semiconductor elements, such as LED mounted on the board | substrate. When the silicone composition for sealing an optical semiconductor element of the present invention is used, for example, for COB (chip on board), first, the silicone composition for sealing an optical semiconductor element is formed on an optical semiconductor element mounted on a substrate. The predetermined amount is supplied so that the whole may be covered. Sealing is then effected by curing the composition. The silicone composition for sealing an optical semiconductor element of the present invention is particularly capable of maintaining a predetermined shape, for example, a dome shape, from supplying on the optical semiconductor element until the completion of curing, and particularly COB (chip on Board).
본 발명의 광반도체 장치는 상기 본 발명의 광반도체 소자 밀봉용 실리콘 조성물을 사용하여 광반도체 소자를 밀봉하여 이루어진다. 본 발명의 광반도체 장치에서, 밀봉되는 광반도체 소자는 특별히 제한되지 않는다. 또한, 광반도체 소자를 장착시키는 지지구조체는, 특별히 한정되지 않고 패키지이어도 좋고, 패키지리스(package-less)의 지지기판, 예를 들어 세라믹 기판, 실리콘 기판, 유리에폭시 기판, 베이클라이트(bakelite, 에폭시 수지) 기판, 금속 기판 등이어도 좋다. 밀봉의 방법에 대해서도 특별히 한정되는 것은 아니고, 각종 밀봉방법에 따라서 상기 본 발명의 광반도체 소자 밀봉용 실리콘 조성물의 소정량을 광반도체 소자가 밀봉되도록 공급하고, 소정의 조건으로 경화시킴으로써 광반도체 장치를 제조할 수 있다. 또한, 밀봉 방법으로서는, 상기와 같이 COB가 바람직하다. 또한, 본 발명의 광반도체 장치로서는, 포토 다이오드, CCD, CMOS 등의 범용의 광반도체 장치를 들 수 있다.The optical semiconductor device of this invention is made by sealing an optical semiconductor element using the silicone composition for optical semiconductor element sealing of the said invention. In the optical semiconductor device of the present invention, the optical semiconductor element to be sealed is not particularly limited. The support structure on which the optical semiconductor element is mounted is not particularly limited and may be a package, and may be a package-less support substrate such as a ceramic substrate, a silicon substrate, a glass epoxy substrate, a bakelite (epoxy resin), or a package. ), A metal substrate, or the like. The method of sealing is not particularly limited, and according to various sealing methods, a predetermined amount of the silicone composition for sealing an optical semiconductor element of the present invention is supplied so that the optical semiconductor element is sealed, and the optical semiconductor device is cured under predetermined conditions. It can manufacture. Moreover, as a sealing method, COB is preferable as mentioned above. Moreover, as an optical semiconductor device of this invention, general-purpose optical semiconductor devices, such as a photodiode, CCD, CMOS, are mentioned.
실시예Example
이하, 본 발명의 실시예에 대해서 기재하지만, 본 발명은 이들 실시예에 한정되는 것은 아니다.Hereinafter, although the Example of this invention is described, this invention is not limited to these Examples.
또한, 이하의 실시예에서 각 성분의 점도 측정에는, 회전점도계로서 회전수가 20rpm 및 2rpm에서의 측정에 대해서는 비스메트론 VDH형(시바우라 시스템사제)을 사용하고, 회전수가 60rpm에서의 측정에 대해서는 비스메트론 VDA형(시바우라 시스템사제)를 사용했다.In addition, in the following Examples, for the measurement of the viscosity of each component, Bismetron VDH type (manufactured by Shibaura Systems Co., Ltd.) was used as the rotational viscometer for the measurement at the rotational speeds of 20 rpm and 2 rpm, and for the measurement at the rotational speed of 60 rpm Bismetron VDA type (made by Shibaura Systems Co., Ltd.) was used.
이하의 실시예 및 비교예에서, (A)성분, (B)성분, (C)성분으로서, 이하의 표 1에 표시한 폴리오르가노실록산을 사용했다. 표 1에는 각 성분별로, 폴리오르가노실록산의 약호, 평균분자식 또는 평균단위식(평균단위식의 경우에만 단위식으로 표기), 회전점도계에 의한 25℃에서의 점도[mPa·s] 또는 질량평균 분자량(Mw)을 나타낸다. 또한, 표 1에서 (B)성분 이외에는, 점도를 나타낸다. 또한, 점도는 (A)성분 및 이하의 (Ac)성분에 대해서는 No.4 로터에 의해 60rpm 회전조건으로 측정하고, (C)성분에 대해서는 No.1 로터에 의해 60rpm의 회전조건으로 측정했다.In the following examples and comparative examples, the polyorganosiloxane shown in the following Table 1 was used as (A) component, (B) component, and (C) component. Table 1 shows the polyorganosiloxane abbreviation, average molecular formula or average unit formula (expressed in unit formula only for average unit formula), viscosity [mPa · s] or mass average for each component in Table 1. The molecular weight (Mw) is shown. In addition, in Table 1, except a component (B), a viscosity is shown. In addition, about the (A) component and the following (Ac) components, the viscosity was measured on 60 rpm rotation conditions by the No. 4 rotor, and about (C) component was measured on the rotation conditions of 60 rpm by No. 1 rotor.
또한, 표 1에서 선형 폴리머(A1), (A2)는 본 발명의 조성물에 사용하는 (A)성분으로 분류되는 직쇄상의 폴리오르가노실록산이고, 선형 폴리머 (Ac1)~(Ac4)는 본 발명의 조성물에 사용하는 (A)성분으로 분류되지 않는 비교예에 사용하는 직쇄상의 폴리오르가노실록산이다. 선형 폴리머 (Ac1)~(Ac4)를 (Ac)성분이라고 한다.In addition, in Table 1, linear polymer (A1) and (A2) are linear polyorganosiloxane classified into (A) component used for the composition of this invention, and linear polymer (Ac1)-(Ac4) are this invention. It is a linear polyorganosiloxane used for the comparative example which is not classified into (A) component used for the composition of this. Linear polymers (Ac1) to (Ac4) are called (Ac) components.
또한, (A)성분, (Ac)성분에 있어서는, Ph2SiO 단위수를 m, Me2SiO 단위수를 n으로 하여, m/(m+n)을 산출했다. 결과를 표 1에 함께 나타낸다. 선형 폴리머 (A1), (A2)는, 본 발명의 조성물의 (A)성분의 범위인 0.01<m/(m+n)<0.10의 범위내이고, 선형 폴리머 (Ac1)~(Ac4)는 상기 범위 밖이다.Further, (A) in the component, (Ac) component, and the number of Ph 2 SiO units to the number n m, Me 2 SiO units, was calculated m / (m + n). The results are shown in Table 1 together. Linear polymer (A1) and (A2) are in the range of 0.01 <m / (m + n) <0.10 which is the range of (A) component of the composition of this invention, and linear polymer (Ac1)-(Ac4) are the said Out of range
또한, (B)성분의 수지상 폴리머(B1)에서의, 각 실록산 단위의 비율을 상기 x, y, z로 표시하면, x=0.40, y=0.07, z=0.53이다.Moreover, when the ratio of each siloxane unit in the dendritic polymer (B1) of (B) component is represented by said x, y, z, it is x = 0.40, y = 0.07, z = 0.53.
표 1 중, Vi는 비닐기를, Me는 메틸기를, Ph는 페닐기를 나타낸다. In Table 1, Vi represents a vinyl group, Me represents a methyl group, and Ph represents a phenyl group.
또한, (D)성분 ~ (G)성분으로서 이하의 화합물 등을 사용했다.In addition, the following compounds etc. were used as (D) component-(G) component.
(D)성분: 실리카 분말(D) component: silica powder
실리카 분말(D1): 표면을 헥사메틸디실라잔으로 처리된, 비표면적 약 140㎡/g의 연무질 실리카. 실리카 표면의 카본량 4 질량%.Silica powder (D1): Aerosol silica with a specific surface area of about 140 m 2 / g, with the surface treated with hexamethyldisilazane. 4 mass% of carbon on a silica surface.
실리카 분말(D2): 표면을 헥사메틸디실라잔으로 처리된, 비표면적 약 200㎡/g의 연무질 실리카. 실리카 표면의 카본량 3.5 질량%.Silica powder (D2): Aerosol silica having a specific surface area of about 200 m 2 / g, with the surface treated with hexamethyldisilazane. 3.5 mass% of carbon on silica surface.
(E)성분: 히드로실릴화 반응촉매(E) Component: Hydrosilylation Reaction Catalyst
비닐다이머 배위백금촉매(간단히 「백금촉매」라고 함)Vinyl dimer coordination platinum catalyst (simply called "platinum catalyst")
(F)성분: 접착성 부여제(F) Component: Adhesion Imparting Agent
접착성 부여제 1: 상기 식(S1)에 나타내는 (HMeSiO)3(Me2SiO)의 1몰에 대해서, 3-메타크릴옥시프로필트리메톡시실란의 1몰을 반응시켜 얻어진 반응생성물.Adhesion imparting agent 1: the formula (S1) (HMeSiO), based on 1 mol of 3 (Me 2 SiO) shown in Fig., 3-methacryloxypropyl trimethoxysilane reaction product obtained by reacting one mole of the silane.
접착성 부여제 2: 3-글리시독시프로필트리메톡시실란Adhesion Imparting Agent 2: 3-glycidoxypropyltrimethoxysilane
(G)성분: 액상의 틱소트로피성 부여제(G) Component: Liquid Thixotropy Imparting Agent
폴리옥시프로필렌글리콜(Mw: 2000, 점도(25℃, No.3 로터, 60rpm) 300[mPa·s])Polyoxypropylene glycol (Mw: 2000, viscosity (25 degreeC, No. 3 rotor, 60 rpm) 300 [mPa * s])
[실시예 1~6, 비교예 1~3][Examples 1-6, Comparative Examples 1-3]
표 2에 도시한 조성으로 각 성분을 혼합하고, 실시예 1~6 및 비교예 1~3의 광반도체 소자 밀봉용 실리콘 조성물을 제조했다. 또한, 고체성분인 (B)성분을 조성물 중에 균일하게 함유시키기 위해, 이하의 방법을 사용했다. 우선, (B)성분을 적절한 농도의 자일렌 용액으로서 (A)성분과 혼합한 후, 가열 및/또는 감압에 의해 자일렌을 제거함으로써, (A)성분과 (B)성분의 혼합물을 제작했다. 상기 혼합물을 다른 성분과 혼합함으로써 각 예의 조성물을 제작했다.Each component was mixed by the composition shown in Table 2, and the silicone composition for optical semiconductor element sealing of Examples 1-6 and Comparative Examples 1-3 was manufactured. In addition, the following method was used in order to contain (B) component which is a solid component uniformly in a composition. First, after mixing (B) component with (A) component as a xylene solution of a suitable density | concentration, the mixture of (A) component and (B) component was produced by removing xylene by heating and / or reduced pressure. . The composition of each example was produced by mixing the said mixture with another component.
또한, 표 2 중 (E)성분의 함유량은, (A)성분, (B)성분 및 (C)성분의 합계 질량에 대한 백금원소 환산의 함유량(ppm)이다.In addition, in Table 2, content of (E) component is content (ppm) of platinum element conversion with respect to the total mass of (A) component, (B) component, and (C) component.
[평가][evaluation]
상기에서 얻어진 광반도체 소자 밀봉용 실리콘 조성물, 및 이를 경화하여 얻어진 실리콘 경화물을, 이하의 평가항목에 대해서 평가했다. 결과를 표 2에 함께 나타낸다.The silicone composition for optical semiconductor element sealing obtained above and the silicone hardened | cured material obtained by hardening this were evaluated about the following evaluation items. The results are shown in Table 2 together.
(1)조성물의 평가(1) Evaluation of composition
(굴절률)Refractive index
각 조성물에 대해서, 25℃에서 D선의 굴절률을, 아베 굴절률계를 사용하여 측정했다.About each composition, the refractive index of D line | wire was measured at 25 degreeC using the Abbe refractometer.
(점도, 틱소트로피성 평가(점도비 η2/η20))(Viscosity, thixotropy evaluation (viscosity ratio η 2 / η 20 ))
각 조성물에 대해서, 회전점도계를 사용하여, No.6 로터에 의한 2rpm의 점도 η2와 20rpm의 점도 η20을 측정하고, 그 점도비 η2/η20을 산출함으로써 틱소트로피성을 평가했다.For each composition, using a rotational viscometer, and measured the 2rpm viscosity η 2 and 20rpm Viscosity η 20 of the rotor according to No.6, and the viscosity rating the trophy thixo property by calculating the ratio η 2 / η 20.
(2) 경화물의 평가(2) Evaluation of the Cured Product
(경화물에 의한 시험편의 제작)(Production of test piece by hardened material)
상기에서 얻어진 각 조성물을 150℃, 60분간의 조건으로 경화시키고, 투과률 측정용의 두께 2㎜의 시트상 시험편을 얻었다. 또한, 동일하게 경화시킨 시트형상 경화물로부터 JIS K6249에 준거한 기계특성측정용 시험편으로서, 덤벨상 2호형을 제작했다.Each composition obtained above was hardened on conditions of 150 degreeC and 60 minutes, and the sheet-like test piece of thickness 2mm for transmissivity measurement was obtained. Moreover, the dumbbell type No. 2 was produced as the test piece for mechanical characteristics measurement based on JISK6249 from the sheet-like hardened | cured material hardened | cured similarly.
(투과율)Transmittance
투과율 측정용의 두께 2㎜의 시트상 시험편을 사용하여, 파장 400㎚의 광에 대한 광투과율 [%]을 25℃에서 분광광도계에 의해 측정했다.Using the sheet-shaped test piece of thickness 2mm for transmittance measurement, the light transmittance [%] with respect to the light of wavelength 400nm was measured with the spectrophotometer at 25 degreeC.
(기계적 강도)(Mechanical strength)
기계특성 측정용 시험편을 사용하여, JIS K6249에 따라서, 25℃에서의 경도 (TYPE A), 인장강도 [㎫], 신장 [%]을 측정했다.Using the test piece for measuring mechanical properties, hardness (TYPE A), tensile strength [MPa], and elongation [%] at 25 ° C. were measured according to JIS K6249.
표 2로부터 밝혀진 바와 같이, 본 발명의 광반도체 소자 밀봉용 실리콘 조성물은, 얻어지는 실리콘 경화물에서, 광반도체 장치에 요구되는 파장 400㎚광의 투과성이 높고, 또한 기계적 강도도 우수하다. 또한, 본 발명의 조성의 범위밖의 비교예 1~3의 조성물에서는, 얻어지는 실리콘 경화물에서 파장 400㎚ 광의 투과성 및/또는 기계적 강도가 충분하지 않다.As is clear from Table 2, the silicone composition for optical semiconductor element sealing of the present invention has a high transmittance of 400 nm light required for the optical semiconductor device in the cured silicone product, and is also excellent in mechanical strength. Moreover, in the composition of Comparative Examples 1-3 which are outside the range of the composition of this invention, the transmittance | permeability and / or mechanical strength of wavelength 400nm light are not enough in the silicone hardened | cured material obtained.
Claims (8)
(화학식 1)
(단, 상기 화학식 1에서 R1은 각각 독립적으로 알케닐기 또는 할로겐 치환되어 있어도 좋은 알킬기를, R2는 각각 독립적으로 아릴기를 나타내고, R1 중 적어도 2개는 알케닐기이고, 0.01<m/(m+n)<0.10임),
(B) 1분자 중에 적어도 1개의 알케닐기를 갖고, x개의 R1 3SiO1/2 단위, y개의 R1 2SiO 단위, 및 z개의 SiO2 단위를 함유하고(단, 각 실록산 단위 중, R1은 각각 독립적으로 알케닐기 또는 할로겐 치환되어 있어도 좋은 알킬기를 나타내고, R1 2SiO 단위에서 R1의 적어도 1개는 알케닐기이다.), x,y,z의 합계를 1로 환산했을 때의 x, y, z가 각각, 0.3≤x≤0.5, 0<y≤0.1, 0.4≤z<0.7인 수지상 구조의 폴리오르가노실록산을, (A)성분과 (B)성분의 합계로 100 질량부, 또한 (A)성분과 (B)성분의 합계량 100 질량부에 대해서 (B)성분이 10~40 질량부가 되는 양;
(C) 1 분자 중에 적어도 2개의 규소원자에 결합된 수소원자를 갖는 폴리오르가노하이드로젠실록산을, 상기 (A)성분 및 (B)성분이 각각 갖는 알케닐기의 합계량 1몰에 대해서, 규소원자에 결합된 수소원자가 1~3몰이 되는 양;
(D) 실리카 분말의 5~20 질량부; 및
(E) 히드로실릴화 반응촉매의 촉매량;
을 각각 함유하고, 굴절률(25℃, D선)이 1.41~1.44인 것을 특징으로 하는 광반도체 소자 밀봉용 실리콘 조성물.(A) a polyorganosiloxane represented by the following formula (1);
(Formula 1)
(However, in the formula (1), each R 1 independently represents an alkyl group which may be optionally substituted with an alkenyl group or halogen, R 2 each independently represents an aryl group, at least two of R 1 is an alkenyl group, and 0.01 <m / ( m + n) <0.10),
(B) has at least one alkenyl group in one molecule, and contains x R 1 3 SiO 1/2 units, y R 1 2 SiO units, and z SiO 2 units (but, in each siloxane unit, R 1 is each independently an alkenyl group, or a halogen may be substituted represents an alkyl group, and at least one of R 1 in R 1 2 SiO units is an alkenyl group.), x, y, when converting the sum of z to 1, 100 mass of the polyorganosiloxane of dendritic structure whose x, y, and z are 0.3 <= x <0.5, 0 <y <0.1, and 0.4 <z <0.7, respectively, in the sum total of (A) component and (B) component In addition, the amount which (B) component becomes 10-40 mass parts with respect to 100 mass parts of total amounts of (A) component and (B) component further;
(C) Silicon atom with respect to 1 mol of total amounts of the polyorganohydrogensiloxane which has a hydrogen atom couple | bonded with at least 2 silicon atoms in 1 molecule, respectively with the said alkenyl group which (A) component and (B) component have, respectively The amount of hydrogen atoms bonded to 1 to 3 mol;
(D) 5-20 mass parts of silica powder; And
(E) catalytic amount of hydrosilylation reaction catalyst;
And a refractive index (25 degreeC, D line) are respectively 1.41-1.44, The silicone composition for optical semiconductor element sealing characterized by the above-mentioned.
추가로, (F)에폭시기, 히드로실릴기(Si-H기), 가교성 비닐기 및 알콕시실릴기로부터 선택되는 적어도 2종을 포함하는 접착성 부여제를, 0.1~10 질량부 포함하는 광반도체 소자 밀봉용 실리콘 조성물.The method of claim 1,
Furthermore, the optical semiconductor containing 0.1-10 mass parts of adhesion | attachment imparting agents containing at least 2 sort (s) chosen from (F) an epoxy group, a hydrosilyl group (Si-H group), a crosslinkable vinyl group, and an alkoxy silyl group. Silicone composition for sealing the device.
추가로, (G)액상의 틱소트로피성 부여제를 0.005~5 질량부 포함하는 광반도체 소자 밀봉용 실리콘 조성물.The method of claim 1,
Furthermore, (G) Silicone composition for optical semiconductor element sealing containing 0.005-5 mass parts of liquid thixotropy-imparting agents.
두께 2㎜의 시트로 했을 때 25℃에서의 파장 400㎚의 광의 투과율이 90% 이상인 실리콘 경화물을 부여하는 것을 특징으로 하는 광반도체 소자 밀봉용 실리콘 조성물.The method of claim 1,
A silicone composition for sealing an optical semiconductor element, wherein a silicone cured product having a transmittance of light having a wavelength of 400 nm at 25 ° C. of 90% or more at 25 ° C. is provided.
회전점도계에 의한 25℃에서의 2rpm의 점도 η2와 20rpm의 점도 η20의 비 η2/η20이, 1.8~6.0인 광반도체 소자 밀봉용 실리콘 조성물.The method of claim 1,
Silicone composition for optical-semiconductor element sealing whose ratio (eta) 2 / (eta) 20 of the viscosity (eta) 2 of 2 rpm at 25 degreeC, and the viscosity (eta) 20 of 20 rpm by a rotational viscometer are 1.8-6.0.
JIS K6249에 기초하여 25℃에서 측정되는, TYPE A형 경도계에 의한 경도가 30~80이고, 인장강도가 4㎫ 이상인 실리콘 경화물을 부여하는 것을 특징으로 하는 광반도체 소자 밀봉용 실리콘 조성물.The method of claim 1,
The silicone composition for optical-semiconductor element sealing provided with the silicone hardened | cured material whose hardness by a TYPE A-type hardness tester measured at 25 degreeC based on JISK6249 is 30-80, and tensile strength is 4 Mpa or more.
상기 (C)성분의 폴리오르가노하이드로젠실록산이, 규소원자에 결합되는 유기기로서 메틸기만을 갖는 폴리메틸하이드로젠실록산인 광반도체 소자 밀봉용 실리콘 조성물.The method of claim 1,
The silicone composition for optical semiconductor element sealing whose polyorganohydrogensiloxane of the said (C) component is polymethylhydrogensiloxane which has only a methyl group as an organic group couple | bonded with a silicon atom.
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