KR101683780B1

KR101683780B1 - method and apparatus for changing physical properties of patterns

Info

Publication number: KR101683780B1
Application number: KR1020150145616A
Authority: KR
Inventors: 오승우; 이용준
Original assignee: (주)클로버추얼패션
Priority date: 2015-10-19
Filing date: 2015-10-19
Publication date: 2016-12-08

Abstract

The present invention relates to a computer simulation technique. More specifically, the present invention relates to a simulation technique that freely changes physical properties of a pattern. An objective of the present invention is to calculate a physical property of an overlapped area based on the physical property of each pattern without sewing two patterns when two patterns are overlapped with each other, and to apply the physical property. According to one aspect, a method for changing a pattern property that is executable by a computing device that includes a storage element to store a computing element and a draped digital costume object which is patterned and draped. The physical property changing method includes a property change area setting step of setting a property change area by inputting at least one predetermined area on the first pattern and a property change area setting step of causing the second pattern to be synthesized in the property change area set on the first pattern, and changing physical properties of the set physical property changing area by adjusting the thickness of the physical property changing area set in the physical property changing area.

Description

METHOD AND APPARATUS FOR CHANGING PATTERN PROPERTIES

Relates to a computer simulation technique, and more particularly, to a simulation technique that freely changes physical properties of a pattern.

Currently, costume simulation technology is used not only in the fashion industry, but also in games, animation, film special effects, and so on. In addition, the market of the costume item sales in the virtual world reaches to several trillion won. This technique is a technique for modeling cloth as a mesh with a mass and simulating movement of the cloth according to the movement of the avatar in clothes or the external movement of wind or light.

In the sewing simulation for creating a digital costume object from a pattern, in order to synthesize another pattern on one pattern, it was necessary to sew two different patterns. That is, it was necessary to set the area to be sewn on one of the patterns, to select the area to be sewn on the other pattern, to set the type of the sewing line, and to perform the draping process. In this case, it takes a long time to check the collision between the triangles constituting the two patterns and to process the reaction.

When two patterns are padded, it is necessary to apply the property of the contact area calculated from the physical properties of each pattern to the triangle in the area where the two patterns abut each other, and to perform quick simulation.

An object of the present invention is to calculate and apply physical properties of a padded region from the physical properties of each pattern without sewing two patterns when two or more patterns are padded.

It is an object of the present invention to adjust the thickness of one of the patterns to control the physical properties of the pattern according to the adjusted thickness.

A method for modifying a pattern property that is executable by a computing device that includes a computing element according to an aspect and a storage element that stores a pattern and a draped digital garment object, A property change area setting step of setting a property change area by inputting an area of the property changing area and a property changing area set on the first pattern or by adjusting the thickness of the property changing area set on the first pattern, And a physical property changing step of changing physical properties of the change area.

In another aspect, the predetermined area is a line or a face.

In another aspect, the property changing step includes a overwriting step of setting physical properties of one or more patterns to be synthesized in the property change area set on the first pattern.

The physical property changing step includes a cutting step of adjusting a percentage of the thickness of the property changing area set on the first pattern.

In the present invention, when two patterns are applied, the physical property value of the punched area due to the physical properties of each pattern can be quickly calculated and simulated.

The present invention can control the physical properties of the pattern according to the thickness variation by adjusting the thickness of the pattern.

1 shows a flow of a pattern property changing method according to an embodiment.
FIG. 2 shows a detailed flow of a pattern property changing method according to an embodiment.
FIG. 3 shows a detailed flow of a pattern physical property changing method according to an embodiment.
Figure 4 shows an example for illustrating the overwriting phase.
Fig. 5 shows an example for describing weft, warp, and bias strength
Fig. 6 shows an example for explaining the bending strength
Fig. 7 shows an example of explaining the buckling point and the buckling strength.
Fig. 8 shows an example for illustrating the cutting step.
Fig. 9 shows a configuration of a pattern property changing apparatus according to an embodiment.

The foregoing and further aspects are embodied through the embodiments described with reference to the accompanying drawings. It is to be understood that the components of each embodiment are capable of various combinations within an embodiment as long as no other mention or mutual contradiction exists. Furthermore, the present invention may be embodied in many different forms and is not limited to the embodiments described herein.

In order to clearly illustrate the present invention, parts not related to the description are omitted, and like parts are denoted by similar reference numerals throughout the specification. And, when a section is referred to as "including " an element, it does not exclude other elements unless specifically stated to the contrary.

As used herein, the term " block " refers to a block of hardware or software configured to be changed or pluggable, i.e., a unit or block that performs a function in hardware or software.

The proposed pattern property changing method and apparatus and the recording medium recording the computer program for executing the method can be applied to the field of 3D simulation technology.

Digital costumes are created through a computer simulation authoring program that reflects the process of the actual costume making process as a motif. For example, the author paints a 2D pattern of a costume, then drapes and simulates a 2D pattern on an avatar model to be dressed. The 3D image is displayed on the screen by rendering and displaying the draping result. The avatar model and the 2D costume pattern can be drawn directly by the user through a computer program or can be stored. If you draw yourself, you can enter it using a variety of graphics software or CAD programs, or use the provided 2D patterning tools.

The draping simulation method includes a step of meshing a pattern, a step of arranging a pattern around the avatar, a step of determining whether a pattern and an avatar collide with each other, and a step of generating a collision removing force And performing a draping simulation process. The patterning step may be performed by applying a Delaunay triangulation technique, and the draping simulation process may be performed as an example (Pascal Volino, Nadia MagnenatThalmann: Resolving surface collisions through intersection contour minimization.ACM Trans. Graph. 25 (3): 1154-1159 (2006).

1 shows a flow of a pattern property changing method according to an embodiment.

In one aspect, a method for modifying pattern properties that can be executed by a computing device that includes a computing element and a storage element that stores a pattern and a draped digital garment object includes a physical property altering region setting step (S10), a property changing step S20).

The computing device includes one or more processors and storage elements. The storage element includes one or more programs, for example, as memories. Each step such as a property changing area setting step (S10) and a property changing step (S20) are implemented by a computing instruction included in the above-mentioned program.

In one embodiment, the property changing region setting step S10 sets one or more predetermined regions on the first pattern to set the property changing region. The first pattern is a pattern to which the physical property is to be changed in an arbitrary pattern. The predetermined area on the first pattern can be the entire pattern and can be a part of the pattern. The physical property changing region on the first pattern may be one region, but is not limited thereto and may be a plurality of regions.

In one embodiment, the physical property modifying step S20 may be performed by combining at least one pattern in the physical property changing area set on the first pattern, or adjusting the thickness of the physical property changing area set on the first pattern, . In the physical property changing step S20, there are two methods of changing physical properties of the physical property changing region set on the first pattern, one of which is to synthesize two patterns, and the other is to control the thickness of one pattern.

In one embodiment, the predetermined area is a line or a face. The predetermined region is an area where physical properties are changed on the pattern as described above. The predetermined area may be a line on the pattern. More than one line can be selected. There is no limitation as long as the predetermined region inputted in the physical property changing region setting step S10 exists on the first pattern. For example, in the physical property changing area setting step (S10), a line at the edge of the first pattern is input as a predetermined area, and is set as the physical property changing area.

The predetermined area may be a surface existing on the pattern. One or more faces can be selected. If the selected face is present on the pattern, there is no restriction on the size and shape.

FIG. 2 shows a detailed flow of a pattern property changing method according to an embodiment.

A description overlapping with the description of FIG. 1 will be omitted.

In one embodiment, the property changing step S20 includes a waiting step S21. The overwriting step S21 sets physical properties of one or more patterns to be synthesized in the property change area set on the first pattern. The fact that the first pattern and one or more patterns are combined means that the first pattern and one or more patterns are combined to form one. The combination of the first pattern and the one or more patterns is not limited to this, and may mean that the first pattern and one or more patterns are superimposed.

When the first pattern and one or more patterns are synthesized in the property change area set on the first pattern, new properties of the property change area are calculated on the basis of the physical properties of the first pattern and the properties of the one or more patterns. How the new properties of the property changing region are calculated based on the physical properties of the first pattern and the physical properties of one or more patterns will be described later.

It is assumed that one pattern to be combined with the first pattern is a second pattern. At this time, not only the physical properties of the second pattern to be synthesized but also the physical properties of the first pattern can be set. The physical properties of the second pattern can be set after the property change area is set on the first pattern, but are not limited thereto. When the physical properties of the second pattern to be synthesized are set in the property changing area, new physical properties of the property changing area are calculated in consideration of the physical properties of the first pattern and the physical properties of the second pattern.

The physical properties of at least one of the first pattern and the second pattern can be changed even after new properties are calculated. When the physical properties of at least one of the first pattern and the second pattern are changed after the new physical properties of the property changing area are calculated, the physical properties of the property changing area are re-calculated.

In the overwriting step S21, two patterns may be synthesized, but not limited thereto, three or more patterns may be synthesized. When three or more patterns are synthesized, new physical properties of the property changing region are calculated in consideration of the physical properties of each pattern.

The physical properties are as follows: Stretch Weft, Stretch Warp, Bias Shear, Bending, Bending, Buckling Ratio, Buckling Ratio Strength, Damping, density, friction coefficient, and the like. A description of each property will be given later.

FIG. 3 shows a detailed flow of a pattern physical property changing method according to an embodiment.

1 and 2 will not be described.

In one embodiment, the property changing step S20 includes a cutting step S21. The cutting step S21 adjusts the percentage of the thickness of the property changing area set on the first pattern. Stretch Weft, Stretch Warp, Bending, Buckling Ratio, Buckling Ratio Strength, Internal Damping, Density, Friction Coefficient, etc. May be changed linearly according to the adjusted percentage. For example, if the thickness of the pattern is adjusted to 50 percent, the above-mentioned property value becomes 0.5 times the existing property value.

In case of Bias Stretch (Shear), it can be changed in proportion to the cube of the changed percentage. For example, if you adjust the pattern thickness to 50 percent, the bias shear will be 0.5 ^ 3 times the original value.

Fig. 4 shows an example for explaining overwriting step S21.

The property changing area is set in the property changing area setting step S10 and the property of the property changing area is changed in the property changing step S20. In this case, the physical properties are the weft strength, Stretch warp, bias shear, bending strength, bending strength, buckling strength, buckling strength, Internal damping, density, friction coefficient, and the like. In the embodiment shown in Fig. 4, each property is adjusted to the left and right movement of the scroll bar. The present invention is not limited to this, and it is also possible to directly input numerical values of physical properties. Each property can interact with each other, and all physical properties are mixed and expressed in a pattern.

The internal damping represents the degree of repulsive force on the speed at which the garment stretches or shrinks. If the internal damping value is high, the pattern moves slowly as if it were in water. If the internal damping value is low, the pattern moves quickly.

Density represents the weight of the pattern per unit area. The larger the density, the heavier the pattern becomes.

Friction Coefficient is used to control the frictional force of the pattern. The frictional force affects both the friction between the pattern of the avatar as well as the friction between the pattern and the pattern.

Fig. 5 shows an example for describing weft, warp, and bias strength.

The pattern is woven with weft yarns and warp yarns, the longitudinal direction is closed, the lateral direction is pulled, and the diagonal direction is called the bias direction.

Stretch Weft means the degree of stretching of the pattern in the direction of the spreader. Stretch Weft, in other words, means the strength of the repulsive force against stretching in the transverse direction. The smaller the set value of the weft strength (Stretch Weft), the better the stretch in the horizontal direction.

Stretch warp means the degree of elongation in the longitudinal direction of the pattern. In other words, Stretch Warp means the strength of the repulsive force against stretching in the longitudinal direction. The smaller the set value of the warp strength (Stretch Warp), the more it stretches in the vertical direction.

Bias Elasticity (Shear) means the bias of the pattern, i.e., the diagonal extent of the pattern. In other words, the bias elasticity (shear) means the strength of the repulsive force against the expansion and contraction in the diagonal direction. The smaller the set value of the bias strength is, the more it extends in the diagonal direction.

When the bias elasticity (Shear) is set at a ratio such as the Stretch Weft and the Stretch Warp, it is possible to express a wrinkle-like material such as cotton or denim. If the bias strength is set lower than the weft strength (Stretch Weft) and the warp strength (Stretch Warp), it is possible to express a stretchable material such as a jersey or silk.

When the first pattern and the second pattern are synthesized, the slope strength (Stretch Warp) of the synthesized region is the sum of the slope strength (Stretch Warp) of the first pattern and the slope strength (Stretch Warp) (Stretch Warp) is calculated. When three or more patterns are synthesized, the slope strength (Stretch Warp) of the area synthesized by the sum of the slope strengths (Stretch Warp) of each pattern is calculated.

When the first pattern and the second pattern are synthesized, the weft intensity of the synthesized region is calculated as the sum of the weft intensity of the first pattern and the weft intensity of the second pattern, (Stretch Weft) is calculated. When three or more patterns are synthesized, the weft strength of the synthesized region is calculated by summing the weft intensities of the respective patterns.

When n patterns having the same physical properties are synthesized, the bias elongation (Shear) of the synthesized region is calculated as a bias elasticity (shear) of the n ³ * pattern.

Fig. 6 shows an example for explaining the bending strength (Bending).

Bending refers to the stiffness of the pattern, that is, the degree of firmness and stiffness. The higher the bending strength, the less the pattern will bend. The bending strength (Bending) includes a transverse bending strength (Bending Weft) and a longitudinal bending strength (Bending Warp). The transverse bending strength (Bending Weft) means the degree of firmness and firmness in the transverse direction. The longitudinal bending strength (Bending Warp) means firmness and firmness in the longitudinal direction.

A higher value of bending can represent stiff material such as denim or leather. The lower the value of bending strength, the better the material can be expressed as silk-like drape. Referring to FIG. 6, it can be seen that a pattern having a bending strength of 70 is less bent than a pattern having a bending strength (Bending) of 10.

When n patterns are synthesized, the bending strength (Bending) of the region to be synthesized can be calculated as the bending strength (Bending) of n * each pattern.

FIG. 7 shows an example of explaining the buckling point and the buckling stiffness.

The buckling ratio is such that if the force does not exceed a certain level, the fabric will not bend and maintain its original state, and if the force exceeds a certain level, the fabric will easily bend from that moment. The larger the buckling ratio, the better the material will bend even with less force, such as silk jersey. As the buckling ratio becomes smaller, it becomes a bending material when a certain amount of force is applied, such as denim or wool. The buckling ratio includes a buckling ratio Weft in the horizontal direction and a buckling ratio warp in the vertical direction.

When n patterns are synthesized, the buckling ratio of the area to be synthesized can be calculated as the sum of buckling points of each pattern.

Buckling stiffness is the degree to which a percentage of the external force is applied to the actual bend by force. For example, when a buckling stiffness of 80 is entered at a bending strength of 60, the actual strength of the actual bent portion of the pattern is 48, which is 80 percent of the bending strength (Bending). The greater the buckling stiffness, the smaller the degree of bending of the bent portion of the pattern due to the external force. The smaller the buckling strength (buckling stiffness), the greater the degree of bending of the curved portion of the pattern due to the external force.

When n patterns are synthesized, the buckling stiffness of the synthesized region can be calculated as the sum of buckling stiffness of each pattern. Buckling stiffness includes Buckling stiffness Weft and Buckling stiffness Warp in the longitudinal direction.

Referring to FIG. 7, it can be seen that the degree of bending of the right pattern having a large buckling strength is smaller than the degree of bending of the left pattern.

Fig. 8 shows an example for illustrating the cutting step S21.

As shown in Fig. 8, in the cutting step S21, the percentage of the pattern thickness can be adjusted by a scroll bar. The thickness of the current pattern can be adjusted to a value of 100 or less with a thickness of 100. The present invention is not limited to this and can be adjusted to a value of 100 or more when the thickness of the current pattern is 100. When the thickness is adjusted, each property value is adjusted in proportion to the ratio of the adjusted thickness. For example, if the thickness is 0.5 times, or half, all property values are half.

Fig. 9 shows a configuration of a pattern property changing apparatus according to an embodiment.

A pattern property changing apparatus comprising a computing element and a storage element for storing a pattern and a draped digital garment object, wherein the pattern property changing apparatus includes a property changing area setting unit (110) and a property changing unit (120).

The storage element that stores the computing elements and the pattern and the draped digital garment object is the storage 140 shown in FIG.

In one embodiment, the property changing area setting unit 110 receives at least one predetermined area on the first pattern, and sets the property changing area. Although not shown in FIG. 9, the user interface unit may include a physical property change area setting unit 110. FIG. The user can set a predetermined area on the first pattern to change physical properties through the user interface unit. The user interface unit 100 may include an input device such as a keyboard, a mouse, and a touch pen in terms of hardware. The user interface unit 100 may be a computer program in which a method of creating a digital costume object is implemented in terms of software.

The first pattern is a pattern to which the physical property is to be changed in an arbitrary pattern. The predetermined area on the first pattern can be the entire pattern and can be a part of the pattern. The physical property changing region on the first pattern may be one region, but is not limited thereto and may be a plurality of regions.

In one embodiment, the physical property changing unit 120 may change the physical property of the physical property changing region by setting the second pattern in the physical property changing region set on the first pattern, or adjusting the thickness of the physical property changing region set on the first pattern, Change the properties. The physical property changing unit 120 changes physical properties of the physical property changing region set on the first pattern in two ways. One is to synthesize two patterns, and the other is to control the thickness of the property changing region.

In one embodiment, the property changing unit 120 includes a padding 121. The padding section 121 sets the physical properties of the second pattern to be synthesized in the property change area set on the first pattern. Not only the physical properties of the second pattern but also the physical properties of the first pattern can be set. The physical properties of the second pattern can be set after the property change area is set on the first pattern, but the present invention is not limited thereto. When the physical properties of the second pattern to be synthesized are set in the property changing area, new physical properties of the property changing area are calculated in consideration of the physical properties of the first pattern and the physical properties of the second pattern.

The padding section 121 may synthesize two patterns to calculate physical properties, but the present invention is not limited thereto, and three or more patterns may be synthesized to calculate physical properties. When three or more patterns are synthesized, new physical properties of the property changing region are calculated in consideration of the physical properties of each pattern.

The physical properties are as follows: Stretch Weft, Stretch Warp, Bias Shear, Bending, Bending, Buckling Ratio, Buckling Ratio Strength, Damping, density, friction coefficient, and the like. Individual descriptions of each property have been described above. The method of calculating the property value of the synthesized region when the pattern is synthesized has been described above.

In one embodiment, the property changing unit 120 includes a cutting unit 122. The cutter 122 adjusts the percentage of the thickness of the property change area set on the first pattern. Stretch Weft, Stretch Warp, Bending, Bending, Buckling Ratio, Buckling Ratio Strength, Internal Damping, Density, Friction The property values including the Friction Coefficient and the like can be changed linearly according to the adjusted percentage. For example, if the thickness of the pattern is adjusted to 50 percent, the above-mentioned property value becomes 0.5 times the existing property value.

In case of Bias Stretch (Shear), it can be changed in proportion to the cube of the changed percentage. For example, if you adjust the pattern thickness to 50 percent, the bias shear will be 0.5 times the original value.

While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is to be understood that the invention is not limited to the disclosed embodiments, but, on the contrary, is intended to cover various modifications and similarities that may occur to those skilled in the art. The claims are intended to cover such modifications.

110: Property changing area setting unit
120: Property changing section
121: Pad donation
122:
140:

Claims

CLAIMS What is claimed is: 1. A method for changing pattern properties that is executable by a computing device comprising a computing element and a storage element storing a pattern and a draped digital garment object,
A property change area setting step of setting a property change area by receiving at least one predetermined area on the first pattern; And
The physical property modifying step of synthesizing one or more patterns, or to change the physical properties of the first property set by adjusting the thickness of the changing property are set on the pattern region to change the area on the physical properties change area set on the first pattern; , &Lt; / RTI &
The physical property changing step
A physical property calculating step of calculating a new physical property of the property changing area set in consideration of physical properties of the first pattern and the one or more patterns to be synthesized ;
How to change the pattern properties to include.

The method of claim 1, wherein the predetermined region is
Line or face
How to change pattern properties.

The method of claim 1, wherein the physical property modifying step
An overwriting step of setting a physical property of at least one pattern to be synthesized in a property change area set on the first pattern; To
How to change the pattern properties to include.

The method of claim 1, wherein the physical property modifying step
A shaving step of adjusting a percentage of the thickness of the property changing area set on the first pattern; To
How to change the pattern properties to include.

1. A pattern property altering device comprising a computing element and a storage element for storing a pattern and a draped digital costume object,
A property changing area setting unit configured to set a property changing area by receiving at least one predetermined area on the first pattern; And
Part 1 Physical Properties of synthesizing one or more patterns in the physical properties change area set on the pattern, or change the physical properties of the change area set properties by controlling the thickness of the physical property change area set on the first pattern change; , &Lt; / RTI &
The physical property changing unit
And a physical property calculating unit for calculating a new physical property of the property changing region set in consideration of the physical properties of the first pattern and the one or more patterns to be synthesized.

6. The method of claim 5,
Line or plane pattern property changing device.

The method according to claim 5, wherein the property changing unit
A padding unit for setting physical properties of one or more patterns to be synthesized in a property change area set on a first pattern; To
Comprising pattern property changing devices.

The method according to claim 5, wherein the property changing unit
A cutter for adjusting a percentage of the thickness of the property changing area set on the first pattern ; To
Comprising pattern property changing devices.