KR101565091B1 - Wafer Transfer Apparatus for Monitoring Contamination of Semiconductor Processes - Google Patents
Wafer Transfer Apparatus for Monitoring Contamination of Semiconductor Processes Download PDFInfo
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- KR101565091B1 KR101565091B1 KR1020150089481A KR20150089481A KR101565091B1 KR 101565091 B1 KR101565091 B1 KR 101565091B1 KR 1020150089481 A KR1020150089481 A KR 1020150089481A KR 20150089481 A KR20150089481 A KR 20150089481A KR 101565091 B1 KR101565091 B1 KR 101565091B1
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- wafer
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- sensor
- wafer transfer
- transfer apparatus
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67769—Storage means
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67715—Changing the direction of the conveying path
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67772—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving removal of lid, door, cover
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67775—Docking arrangements
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/30—Structural arrangements specially adapted for testing or measuring during manufacture or treatment, or specially adapted for reliability measurements
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
The present invention relates to a wafer transfer apparatus for semiconductor wafer contamination monitoring, and more particularly, to a wafer transfer apparatus for semiconductor wafer contamination monitoring, which is capable of real-time monitoring of semiconductor process contamination, The present invention relates to a wafer transfer apparatus.
The semiconductor industry produces high value-added products based on advanced technology and continues to develop production technology to maintain its competitive edge. Major semiconductor products have already had a nanosize pattern for several years, and 300 mm of wafer size for product production has been mainstream, and mini-environment system has been introduced to ensure efficiency of manufacturing environment pollution management. There is a great need for the transition from the facility monitoring system (FMS) to the process monitoring system (PMS). Furthermore, in the process using a 300 mm wafer, a FOUP (Front Opening Unified Pod) (hereinafter referred to as a wafer transfer device) is used for transferring and storing wafers between processes. The wafer transfer apparatus has been introduced to prevent defects and to efficiently produce wafers by keeping the wafer exposure environment clean as the wafers are thickened and the pattern becomes finer. However, many of the chemicals and process gases used in the course of several tens of steps have flowed into the wafer transfer apparatus that remains on the wafer, causing contamination of the air in the wafer transfer apparatus and causing the wafer to be attracted to the wafer transfer apparatus. The necessity of managing the concentration of contaminants in the wafer transfer apparatus is absolutely emerging.
In addition, the importance of monitoring and preventing contamination due to molecular contaminants in the air, which affects the film quality characteristics of semiconductor devices, has been greatly increased. Although production is deteriorating due to the occurrence of unknown pollution and defects that are not identified, it is necessary to monitor the pollution of production facilities and bulk cleanroom, as well as the contamination between moving wafers. In case of pollution monitoring, it is impossible to limit the current FOUP structure. This is because the influence of the heat generation and the humidity change caused by the installation of the sensor and the sensor in the wafer transfer device may affect the production environment of the wafer.
[Prior Art Literature]
Korean Patent Publication No. 10-2004-0011995 (published Feb. 11, 2004) (200mm and 300mm wafer carrier together)
SUMMARY OF THE INVENTION It is an object of the present invention to overcome the above-described problems of the prior art and to provide a semiconductor wafer transfer apparatus and a semiconductor wafer transfer apparatus capable of realizing sampling and analysis in real time without affecting the production environment of a wafer, The present invention provides a new type of wafer transfer apparatus for semiconductor wafer contamination monitoring capable of transferring semiconductor wafers.
The object of the present invention is to provide a wafer transfer apparatus for semiconductor wafer contamination monitoring, which comprises a wafer transfer apparatus body in the form of a rectangular box, a space for sampling the internal space of the wafer transfer apparatus body, An AMC sensor installed in a space in which the sample analyzing facility can be installed, a battery, a sensor, and a data repeater, And a contamination sample is made possible during wafer process production, movement, and process progress.
Preferably, the space of the wafer is adjustable according to the type and size of the sensor.
Preferably, a chemical filter is provided to prevent contamination of air in the sensor area so that air, which is exhausted when the air inside the sensor area is exposed to the outside, does not affect the clean room.
Also preferably,
And the data of the sensor can be externally transmitted by wire or wireless.
As described above, according to the wafer transfer apparatus for monitoring semiconductor contamination contamination according to the present invention, in order to monitor contamination of the conventional wafer transfer apparatus, sensors and the like must be installed in the same space as the wafer, The present invention can separate the space between the wafer and the sensor inside the wafer transfer device so that the influence generated by the sensor or the like is not transferred to the wafer, So that it is possible to produce a wafer of good quality.
1 is a perspective view showing a wafer transfer apparatus for monitoring semiconductor process contamination according to an embodiment of the present invention.
Fig. 2 is a side sectional view of Fig. 1
Figure 3 is a schematic perspective view of Figure 1;
According to an aspect of the present invention, there is provided a wafer transfer apparatus for monitoring contamination of a semiconductor process,
A wafer transfer apparatus for semiconductor process contamination monitoring,
A wafer transfer device body in the form of a rectangular box,
A separation plate for separating the space inside the wafer transfer apparatus body into a space for a sample and a space into which a wafer can be inserted for proceeding;
A multi-port,
(AMC) sensor, a temperature / humidity sensor, a battery, a sensor, and a data repeater installed in a space in which the sample analysis facility can be installed. And a sample is possible.
The separation plate is made of a synthetic resin.
The
Also, the space of the wafer can be adjusted according to the type and size of the sensor.
A chemical filter (21) is provided to prevent contamination of air in the sensor area so that the air exhausted when the air inside the sensor room is exposed to the outside does not affect the clean room.
Further, the data of the sensor can be externally transmitted by wire or wireless.
In other words, the wafer space and the space in which the sample and sensor are placed are separated.
Also, the air exhaust inside the sensor area is characterized by a space inside the clean room and a space in which the flow of air does not flow artificially.
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, a semiconductor wafer process contamination monitoring wafer transfer apparatus according to a preferred embodiment of the present invention will be described in detail with reference to the accompanying drawings.
FIG. 1 is a perspective view showing a wafer transfer apparatus for semiconductor process contamination monitoring according to an embodiment of the present invention, FIG. 2 is a side sectional view of FIG. 1, and FIG. 3 is a schematic perspective view of FIG.
Referring to FIG. 1, the interior of the wafer transfer apparatus is divided into a space S2 for a sample and a space space S1 in which a wafer can be inserted to carry out a process.
The two spaces S1 and S2 are formed as separate independent spaces except for the
In addition to the wafer space S1 in which the process is performed, a space S2 through which a sample analysis facility can be installed in the lower part is secured through a separation plate.
In addition to the above, the conventional wafer transfer apparatus is maintained in the same manner as the conventional wafer transfer apparatus.
The sample space S2 may affect the contamination prevention and process of the Equipment Front End Module (EFEM) (a standard interface device that supplies the
During the sampling, the internal exhaust is discharged only through the exhaust port. In order to prevent contamination of the cleanroom by exhaust, a removable chemical filter with an exhaust fan (13) on the opposite side of the door (toward the cleanroom when loading EFEM) 21) was installed to minimize the environmental impact when the contamination source inside the wafer transfer apparatus was discharged to the outside. Air exhaust is possible through exhaust fan and chemical filter.
The wafer space S1 selects a space according to the type of the lower sensor and equipment.
The sample port is installed as multi-port (31) to allow multiple samples.
The data analyzed through the sensor is stored in the data storage device 17-1, and a device capable of real-time transmission is provided through the data wireless transmission device 17-2 to prevent a defect caused by contamination in advance.
According to the present invention, air is passed from the wafer space to the sample space through the multi-port 31, the particles are measured by the organic / inorganic
According to the present invention, the space between the wafer and the sensor is separated from the space inside the wafer transfer device so that the influence generated by the sensor or the like is not transferred to the wafer, so that the production environment of the wafer is not affected and a wafer of good quality can be produced.
While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is to be understood that the invention is not limited to the disclosed exemplary embodiments. In addition, it will be understood by those of ordinary skill in the art that various embodiments are possible within the scope of the technical idea of the present invention.
10. Wafer transfer device
11. Wafer transfer device body
14. Oil / Inorganic Compounds (AMC Sensor)
16. Battery
17-1. Data storage device
17-2. Data wireless transmission device
18. Temperature / humidity sensor
31. Multiport
32. Check valve
42. Separator plate
Claims (4)
A wafer transfer device body in the form of a rectangular box,
A separation plate for separating the internal space of the wafer transfer apparatus body into a space for a sample and a wafer space which is a space into which a wafer can be inserted to carry out a process;
And a multi-port connected to the check valve for preventing backflow from the space for the sample to the wafer space,
An organic / inorganic compound measuring device installed in a space in which the sample analyzing facility can be installed, a battery, a sensor, and a data repeater,
And a chemical filter for preventing air from being exhausted when the air inside the sensor area is exposed to the outside does not affect the clean room. The present invention is characterized in that contamination samples are possible during wafer process production, Wafer transfer device for semiconductor process contamination monitoring.
And the sensor data can be transferred to the outside by wire or wireless.
Priority Applications (1)
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KR1020150089481A KR101565091B1 (en) | 2015-06-24 | 2015-06-24 | Wafer Transfer Apparatus for Monitoring Contamination of Semiconductor Processes |
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KR1020150089481A KR101565091B1 (en) | 2015-06-24 | 2015-06-24 | Wafer Transfer Apparatus for Monitoring Contamination of Semiconductor Processes |
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Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2018102055A1 (en) * | 2016-12-02 | 2018-06-07 | Applied Materials, Inc. | Advanced in-situ particle detection system for semiconductor substrate processing systems |
US10790176B2 (en) | 2017-10-30 | 2020-09-29 | Samsung Electronics Co., Ltd. | Substrate carrier |
KR20210015270A (en) | 2019-08-01 | 2021-02-10 | 주식회사 유타렉스 | Foup management system |
KR102256132B1 (en) | 2020-02-18 | 2021-05-25 | (주)캔탑스 | Automated Material Handling System for Managing Carrier Internal Pollution |
KR102333314B1 (en) | 2020-11-19 | 2021-12-02 | 주식회사 하이퓨리티 | Apparatus for monitoring contamination of semiconductor processes using open path structure |
KR102333316B1 (en) | 2020-11-19 | 2021-12-02 | 주식회사 하이퓨리티 | Apparatus with open path structure for monitoring contamination of semiconductor processes |
US11733077B2 (en) | 2021-03-29 | 2023-08-22 | Samsung Electronics Co., Ltd. | Carrier for measurement and wafer transfer system including the same |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
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KR101507436B1 (en) * | 2014-05-14 | 2015-04-07 | 주식회사 위드텍 | Apparatus for monitoring contaminants in air |
-
2015
- 2015-06-24 KR KR1020150089481A patent/KR101565091B1/en active IP Right Grant
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101507436B1 (en) * | 2014-05-14 | 2015-04-07 | 주식회사 위드텍 | Apparatus for monitoring contaminants in air |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2018102055A1 (en) * | 2016-12-02 | 2018-06-07 | Applied Materials, Inc. | Advanced in-situ particle detection system for semiconductor substrate processing systems |
US10365216B2 (en) | 2016-12-02 | 2019-07-30 | Applied Materials, Inc. | Advanced in-situ particle detection system for semiconductor substrate processing systems |
US10883932B2 (en) | 2016-12-02 | 2021-01-05 | Applied Materials, Inc. | Advanced in-situ particle detection system for semiconductor substrate processing systems |
US10790176B2 (en) | 2017-10-30 | 2020-09-29 | Samsung Electronics Co., Ltd. | Substrate carrier |
KR20210015270A (en) | 2019-08-01 | 2021-02-10 | 주식회사 유타렉스 | Foup management system |
KR102256132B1 (en) | 2020-02-18 | 2021-05-25 | (주)캔탑스 | Automated Material Handling System for Managing Carrier Internal Pollution |
US11597607B2 (en) | 2020-02-18 | 2023-03-07 | Cantops Co., Ltd. | Automated material handling system having carrier pollution management function |
KR102333314B1 (en) | 2020-11-19 | 2021-12-02 | 주식회사 하이퓨리티 | Apparatus for monitoring contamination of semiconductor processes using open path structure |
KR102333316B1 (en) | 2020-11-19 | 2021-12-02 | 주식회사 하이퓨리티 | Apparatus with open path structure for monitoring contamination of semiconductor processes |
US11733077B2 (en) | 2021-03-29 | 2023-08-22 | Samsung Electronics Co., Ltd. | Carrier for measurement and wafer transfer system including the same |
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