KR101526650B1 - Antireflection film with excellent optical characteristics - Google Patents

Abstract

The present invention provides an antireflection film which is a laminated structure of a transparent substrate, a high refractive index layer and a low refractive index layer. More specifically, the low refractive index layer is formed by reacting an organosilane having a fluoroalkyl group with an alkoxysilane, As a binder.

Description

BACKGROUND OF THE INVENTION 1. Field of the Invention [0001] The present invention relates to an antireflection film having excellent optical properties,

And an antireflection film excellent in optical characteristics.

When the display is exposed to external light such as various lighting and natural light, the contrast is deteriorated due to the invisibility of the image formed in the display due to the reflected light to the eyes, which makes view of the screen difficult and the eyes feel fatigue Or headache. For this reason, the demand for reflection prevention is becoming very strong.

With emphasis on the need for anti-reflection, antireflection films have been developed in which a high refractive index layer and a low refractive layer are repeated in order to find a film structure having an antireflection effect in the visible light region, and studies for reducing the number of layers have been continuously carried out come.
A prior art related to such an antireflection film is Korean Patent Application No. 10-2004-7019686 filed on December 3, 2004. Further, the anti-reflection film was developed in the form of a low refractive layer coated on the high refractive index layer, and it was found that the refractive index of the low refractive layer was superior to that of the high refractive index layer, There is still a difficulty in the design of the antireflection film that is included.

One embodiment of the present invention provides an antireflection film exhibiting excellent antireflection effect and improved adhesion and optical characteristics by using a high refractive index layer and a low refractive index layer.

In one embodiment of the present invention, a laminate structure of a transparent substrate, a high refractive index layer and a low refractive index layer, wherein the low refractive index layer is formed by polymerizing a silane compound represented by the following formula (1) and an organosilane compound represented by the following formula A binder; And an antireflection film comprising hollow silica particles.

[Chemical Formula 1]

R ¹ _x Si (OR ² ) _4-x

In Formula 1, R ¹ is an alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, or an alkenyl group having 3 to 10 carbon atoms, R ² Is an alkyl group having 1 to 6 carbon atoms, and x represents an integer of 0? X <4.

(2)

R ³ _y Si (OR ⁴ ) _4-y

R ³ is a fluoroalkyl group having 1 to 12 carbon atoms, R ⁴ is an alkyl group having 1 to 6 carbon atoms, and y represents an integer of 0? X <4.

The silane compound represented by the general formula (1) may be at least one selected from the group consisting of tetramethoxysilane, tetraethoxysilane, tetrapropoxysilane, tetraisopropoxysilane, tetra-n-butoxysilane, tetra- Butoxysilane, trimethoxysilane, trimethoxysilane, trimethoxysilane, methyltrimethoxysilane, methyltriethoxysilane, ethyltrimethoxysilane, ethyltriethoxysilane, propyltrimethoxysilane, propyltriethoxysilane, Vinyltrimethoxysilane, vinyltriethoxysilane, allyltrimethoxysilane allyltriethoxysilane, dimethyldimethoxysilane, phenyltrimethoxysilane, phenyltrimethoxysilane, phenyltrimethoxysilane, vinyltrimethoxysilane, vinyltriethoxysilane, allyltrimethoxysilane allyltriethoxysilane, Diphenyldimethoxysilane, diphenyldiethoxysilane, and combinations thereof. &Lt; Desc / Clms Page number 7 &gt;

The organosilane compound represented by the above-mentioned general formula (2) is preferably at least one selected from the group consisting of trifluoromethyltrimethoxysilane, trifluoromethyltriethoxysilane, trifluoropropyltrimethoxysilane, trifluoropropyltriethoxysilane, nonafluorobutylethyl But are not limited to, trimethoxysilane, trimethoxysilane, nonafluorobutylethyltriethoxysilane, nonafluorohexyltrimethoxysilane, nonafluorohexyltriethoxysilane, tridecafluorooctyltrimethoxysilane, tridecafluorooctyltri Heptadecafluorodecyltrimethoxysilane, heptadecafluorodecyltriethoxysilane, and combinations thereof. [0035] The term &quot; a &quot;

The hollow silica particles may have a number average diameter of from about 1 nm to about 1,000 nm.

The binder may include about 10 parts by weight to about 120 parts by weight based on 100 parts by weight of the hollow silica particles.

The refractive index of the low refractive layer may be about 1.2 to about 1.25.

The thickness of the low refraction layer may be about 50 nm to about 150 nm.

The refractive index of the high refractive index layer may be from about 1.6 to about 1.7.

The thickness of the high refractive index layer may be from about 100 nm to about 500 nm.

The contact angle of the antireflection film with respect to water may be about 70 ° or less.

The reflectance of the antireflection film may be less than about 0.5% in the wavelength range of about 450 nm to about 650 nm.

When the white light is irradiated onto the antireflection film, the color a * value and the color b * value of the reflected light may be -1 <a * <2, -1 <b * <1.

The antireflection film may have excellent adhesion and excellent optical properties.

In addition, the antireflection film is excellent in antireflection effect and can be applied to various display devices such as a touch film.

FIG. 1 schematically shows an antireflection film as an embodiment of the present invention.

Hereinafter, embodiments of the present invention will be described in detail. However, the present invention is not limited thereto, and the present invention is only defined by the scope of the following claims.

In one embodiment of the present invention, a laminate structure of a transparent substrate, a high refractive index layer and a low refractive index layer, wherein the low refractive index layer is formed by polymerizing a silane compound represented by the following formula (1) and an organosilane compound represented by the following formula A binder; And an antireflection film comprising hollow silica particles.

[Chemical Formula 1]

R ¹ _x Si (OR ² ) _4-x

In Formula 1, R ¹ is an alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, or an alkenyl group having 3 to 10 carbon atoms, R ² Is an alkyl group having 1 to 6 carbon atoms, and x represents an integer of 0? X <4.

(2)

R ³ _y Si (OR ⁴ ) _4-y

R ³ is a fluoroalkyl group having 1 to 12 carbon atoms, R ⁴ is an alkyl group having 1 to 6 carbon atoms, and y represents an integer of 0? X <4.

In general, the larger the difference between the refractive index of the low refractive index layer and the refractive index of the high refractive index layer, the more excellent the antireflection effect. The development of low-refractive-index hollow silica particles has led to the development of low-refractive-index coatings with a very low refractive index. However, in the case of low-refractive coatings developed using conventional acrylic resins, But did not reach the theoretical optimum of about 1.22 to about 1.24.

However, when a coating solution containing a siloxane compound synthesized by reacting an organosilane having a fluoroalkyl group with a fluoroalkyl group in the low refraction layer as a binder is used, a high transmittance and a low reflectance can be realized, It is possible to provide an antireflection film having improved optical characteristics through optical design with a high refractive index layer.

The silane compound represented by the general formula (1) is a tetrafunctional alkoxysilane having four alkoxy groups when x is 0, a trifunctional alkoxysilane having three alkoxy groups when x is 1, and two alkoxy Lt; RTI ID = 0.0 &gt; alkoxy &lt; / RTI &gt; silane. When x is 3, there is only one alkoxy group which is a functional group, so that it is difficult to carry out the condensation reaction with the organosilane compound represented by the general formula (2).

Examples of the alkenyl group having 3 to 10 carbon atoms include an allyl group, a 1-propenyl group, a 1-butenyl group, a 2-butenyl group, a 3- Butenyl group and the like.

Examples of the silane compound include tetramethoxysilane, tetraethoxysilane, tetrapropoxysilane, tetraisopropoxysilane, tetra-n-butoxysilane, tetra-sec-butoxysilane, tetra- Trimethoxysilane, trimethoxysilane, triethoxysilane, methyltrimethoxysilane, methyltriethoxysilane, ethyltrimethoxysilane, ethyltriethoxysilane, propyltrimethoxysilane, propyltriethoxysilane, isobutyltriethoxy Silane, cyclohexyltrimethoxysilane, phenyltrimethoxysilane, phenyltriethoxysilane, vinyltrimethoxysilane, vinyltriethoxysilane, allyltrimethoxysilane allyltriethoxysilane, dimethyldimethoxysilane, dimethyl But is not limited to, at least one compound selected from the group consisting of diethoxysilane, diphenyldimethoxysilane, diphenyldiethoxysilane, and combinations thereof.

The organosilane compound represented by the above-mentioned formula (2) may be at least one selected from the group consisting of trifluoromethyltrimethoxysilane, trifluoromethyltriethoxysilane, trifluoropropyltrimethoxysilane, trifluoropropyltriethoxysilane, nonafluorobutyl But are not limited to, ethyltrimethoxysilane, nonafluorobutylethyltriethoxysilane, nonafluorohexyltrimethoxysilane, nonafluorohexyltriethoxysilane, tridecafluorooctyltrimethoxysilane, tridecafluorooxytilane Heptadecafluorodecyltrimethoxysilane, heptadecafluorodecyltrimethoxysilane, heptadecafluorodecyltrimethoxysilane, heptadecafluorodecyltriethoxysilane, and combinations thereof. However, the present invention is not limited thereto, R ³ is advantageous in that the use of a fluoroalkyl group having 3 to 5 carbon atoms does not cause phase separation.

The silane compound represented by the formula (1) and the organosilane compound represented by the formula (2) are hydrolyzed and then subjected to dehydration condensation polymerization to form a siloxane compound. On the other hand, for the hydrolysis and dehydration condensation reaction, an acid catalyst may be used, and more specifically, nitric acid, hydrochloric acid, sulfuric acid or acetic acid may be used.

The organosilane compound represented by Formula 2 may be used in an amount of about 0.1 part by weight to about 50 parts by weight based on 100 parts by weight of the silane compound represented by Formula 1, More specifically about 5 parts by weight to about 20 parts by weight, of the total amount of the composition. When the organosilane compound is used in an amount less than about 0.1 part by weight, there is a problem that the effect of lowering the refractive index is insignificant. When the organosilane compound is used in an amount exceeding about 50 parts by weight, the refractive index is rather increased.

The formed siloxane compound functions as an organic hybrid binder and functions to treat the surface of the hollow silica particles.

The weight average molecular weight of the siloxane compound is preferably in the range of about 1,000 to about 100,000, specifically about 2,000 to about 50,000, more preferably about 5,000 to about 20,000. When the weight average molecular weight is less than about 1,000, it is difficult to form a desired coating layer having a low refractive index. When the weight average molecular weight is more than about 100,000, the light transmittance of the antireflection film is lowered.

On the other hand, hollow silica particles mean silica particles derived from a silicon compound or an organosilicon compound, in which voids are present on the surface and / or inside of the silica particles.

The hollow silica particles may be dispersed in a dispersion medium (water or an organic solvent) and may be in the form of a colloid having a solid content of about 5 wt% to about 40 wt%. Examples of the organic solvent that can be used as the dispersion medium include alcohols such as methanol, isopropyl alcohol (IPA), ethylene glycol, and butanol; Ketones such as methyl ethyl ketone and methyl iso butyl ketone (MIBK); Aromatic hydrocarbons such as toluene and xylene; Amides such as dimethyl formamide, dimethyl acetamide and N-methyl pyrrolidone; Esters such as ethyl acetate, butyl acetate and? -Butyrolactone; Ethers such as tetrahydrofuran and 1,4-dioxane; Or a mixture thereof. However, when used in the form of a colloid solution dispersed in the dispersion medium as described above, the content of the hollow silica particles may be adjusted to fall within the above-mentioned range in consideration of the solid content and the like.

The use of the hollow silica particles having a number average diameter in the range of about 1 nm to about 1,000 nm, specifically, about 5 nm to about 500 nm, and more specifically, about 10 nm to about 100 nm, It is advantageous to show the effect.

The binder of the siloxane compound is present in an amount of about 10 parts by weight to about 120 parts by weight, specifically about 20 parts by weight to about 100 parts by weight, more specifically about 40 parts by weight to about 80 parts by weight It is better to use it. When the binder is used in an amount of less than about 10 parts by weight, there is a problem that whitening occurs on the coated surface, and when the binder is used in an amount exceeding about 120 parts by weight, the antireflection effect is significantly reduced.

On the other hand, the antireflective coating composition may include an acid catalyst to promote the surface treatment of the hollow silica particles by the binder, and the acid catalyst is not particularly limited as long as it is generally used in the art, but nitric acid or hydrochloric acid is used It is good. The acid catalyst may be used in an amount of about 0.1 part by weight to about 20 parts by weight based on 100 parts by weight of the hollow silica particles. It is advantageous that the pH of the coating composition is adjusted to a range of from about 2 to about 4 using the acid catalyst.

Referring to FIG. 1, the anti-reflection film 100 may include a transparent substrate 10, a high refractive index layer 20, and a low refractive index layer 30.

The transparent substrate 10 may be formed of any of various types of substrates used in conventional liquid crystal displays such as transparent polymeric resins. Examples of the substrate include PET (polyethylene terephthalate), PEN (polyethylenenaphthalate), PES (polyethersulfone) carbonate, polypropylene (PP), norbornene resin, and the like.

When PET is used as the material of the base material, the thickness of the PET film is about 10 탆 to about 200 탆, specifically about 20 탆 to about 100 탆. When the thickness of the transparent base material is less than about 10 탆, there is a problem in the mechanical strength of the base material, and when the thickness exceeds about 200 탆, improvement of the rubbing property for the touch panel may not be achieved.

The thickness of the high refractive index layer 20 may be from about 100 nm to about 500 nm, specifically from about 150 nm to about 450 nm. By maintaining the thickness of the high refractive index layer within the above range, it is possible to easily realize the effect of improving the reflectance and visibility and to minimize the occurrence of cracks and curls due to stress increase. Further, it is possible to provide an antireflection film in which the value of the reflectivity optical characteristic is optimized in relation to the low refractive index layer.

The refractive index of the high refractive index layer 20 may be about 1.6 to about 1.7. The greater the difference in refractive index between the high refractive index layer and the low refractive index layer, the more excellent the antireflection effect of the antireflection film. The high refractive index layer maintains the refractive index within the above range, thereby improving the optical characteristics of the antireflection film.

The thickness of the low refractive layer 30 may be about 50 nm to about 150 nm. By maintaining the thickness of the low refraction layer within the above range, an improved anti-reflection effect can be exhibited, and excellent adhesion of the low refraction layer can be maintained. Also, the refractive index of the low refractive index layer 30 may be about 1.2 to about 1.25, and the optical characteristics of the antireflection film may be improved due to a large refractive index difference with the high refractive index layer.

When the light travels through a certain medium and the refractive index reaches the interface with the other medium, a part or all of the light returns to the original medium. Reflection means that the amount of light transmitted as much as the amount of reflection And the output acting on the light source can be made unstable. Thus, a film for preventing such reflection can be referred to as an anti-reflection film.

Therefore, it is important to ensure the optical characteristics such that the reflectance of the antireflection film is small and the chromaticity difference does not change upon transmission of light. The antireflection film 100 may be formed, for example, Reflectivity and optical characteristics can be optimized by forming a low refractive index layer having a refractive index of about 1.70 and a thickness of about 200 nm to about 450 nm, a refractive index of about 1.22 to about 1.25, and a thickness of about 90 nm to about 130 nm.

The contact angle of the antireflection film with respect to water may be about 70 ° or less. When the water is placed on a horizontal solid surface, it can be a droplet that maintains a constant lens shape. At this time, the surface of the water becomes a curved surface. The solid surface and the surface of the water can maintain a constant angle. Contact angle. Specifically, the contact angle means a certain angle formed between the antireflection film and the surface of water.

When the contact angle of the antireflection film with respect to water is about 70 ° or less, the antireflection film has an advantageous effect in that the surface adhesion is excellent. The contact angle to water is not limited, but may be about 40 ° to about 70 ° have.

The reflectance of the antireflection film may be less than about 0.5% in the wavelength range of about 450 nm to about 650 nm. The wavelength range of about 450 nm to about 650 nm may be a visible light region and may have an optical characteristic value of less than about 0.5% through the optical design by adjusting the refractive index and thickness of the high refractive index layer and the refractive index and thickness of the low refractive index layer .

The reflectance refers to the energy of the reflected light and the energy ratio of the incident light. The lower the reflectance of the antireflection film, the less the amount of the reflected light, and the less the influence of the light, the less the reflected light. Therefore, it is possible to sufficiently exhibit the antireflection function by keeping the reflectance less than about 0.5%, and the reflectance may be low, so that the color tone of the reflected light may not be blue or red. In addition, it has a flat reflective spectrum and has a colorless color value.

When the white light is irradiated onto the antireflection film, the color a * value and the color b * value of the reflected light may be -1 <a * <2, -1 <b * <1. When the white light (D65) is irradiated to the antireflection film by the colorimetric system established by the International Lighting Commission (CIE), the color value due to the reflected light is measured in a CIE 10 ° standard observer (CIE 1964) The distance between two colors can be expressed as CIE L *, a *, b * defined to match the degree of color difference seen by a person. In this case, the L * represents the brightness, the a * represents the value between Red-Green and the b * represents the value between Yellow-blue. When the white light source D65 is irradiated to the antireflection film in the wavelength region of about 380 nm to about 780 nm The outgoing values can be represented by the values of a * and b *.

The smaller the absolute value of the color value is, the less the color difference is caused by the light source. The sensible difference between the two colors is referred to as a color difference, and the color difference can be measured by the color difference meter. Both are possible.

The antireflection film is a laminated structure of a transparent substrate, a high refractive index layer and a low refractive index layer. By designing the antireflection film by controlling the thickness and the refractive index of each layer, the absolute value of the color value of the reflected light is maintained within a certain range . By maintaining the range of the color a * value and the color b * value, it is possible to realize the effect that the anti-reflection film has no color of blue light or red color and a colorless color.

Specifically, when the refractive indexes of the high refractive index layer and the low refractive index layer are confirmed through a prism coupler and each layer is simulated by using an optical design tool using a PET film as a base material, the reflectance in the visible light region is less than about 0.5% , The structure and thickness of each layer included in the antireflection film having the color values of the reflected light of -1 < a * < 2, -1 < b * <

Therefore, through the simulation, it can be seen that when the PET film is coated with a high refractive index layer having a thickness of about 200 nm to about 450 nm and a low refractive index layer having a thickness of about 50 nm to about 150 nm, the reflectance is less than about 0.5% It is possible to design an antireflection film having a value of -1 <a * <2, -1 <b * <1.

Hereinafter, specific embodiments of the present invention will be described. However, the embodiments described below are only intended to illustrate or explain the present invention, and thus the present invention should not be limited thereto.

< Manufacturing example >

Manufacturing example  1-1 - Siloxane  Preparation of compound binders

100 parts by weight of water, 433 parts by weight of isopropanol (IPA) and 36 parts by weight of 0.1M HNO ₃ were added to the reactor and stirred for 10 minutes. Then, 372 parts by weight of tetraethoxysilane (tetraethylorthosilicate, TEOS) and 29 parts by weight of (3,3,3-trifluoropropyl) triethoxysilane were slowly added thereto through a funnel for 30 minutes. Thereafter, the mixture was stirred at 50 DEG C for 2 hours, cooled to room temperature, and then stirred at 200 rpm for 24 hours to obtain a transparent binder solution. The solids content of the solution was found to be 13 wt% and the pH was found to be 2.2. The clear solution was used in the next step of the preparation of the coating composition without further purification.

Manufacturing example  1-2 - Siloxane  Preparation of compound binders

(3,3,3-trifluoropropyl) triethoxysilane was not added, a binder solution was prepared in the same manner as in Production Example 1-1.

Manufacturing example  2-1 - Antireflection Low refractive  Preparation of coating compositions

65 parts by weight of the binder solution prepared in Preparation Example 1-1, 100 parts by weight of isopropanol and 65 parts by weight of hollow silica particle-isopropanol dispersion sol (20% w / w, JGC C & C, Thrylya 4110) And the mixture was stirred at room temperature for 24 hours to prepare an antireflective coating composition. The solid content of the coating composition for anti-reflection and anti-refraction was 10 wt%, and the pH was 2.5.

Manufacturing example  2-2 - Antireflection Low refractive  Preparation of coating compositions

A coating composition for antireflective low refractive index was prepared in the same manner as in Preparation Example 2-1, except that the binder solution prepared in Preparation Example 1-2 was used.

< Example  And Comparative Example >

Example 1

We implemented an antireflection film using optical design software. A high refractive index layer having a refractive index of 1.64 is formed on the PET film, and a low refractive layer having a refractive index of 1.24 is formed on the high refractive layer. At this time, the low refraction layer was formed by coating the coating composition for antireflection low refractive index produced in Production Example 2-1, and the refractive index of the low refraction layer formed was measured through a prism coupler.

Example  2 to 9

An antireflection film was formed in the same manner as in Example 1, except that the thicknesses of the high refractive index layer and the low refractive index layer were differently controlled.

Comparative Example

We implemented an antireflection film using optical design software. A high refractive index layer having a refractive index of 1.64 is formed on the PET film, and a low refractive layer having a refractive index of 1.26 is formed on the high refractive layer. At this time, the low refraction layer was formed by coating the coating composition for antireflection low refractive index produced in Production Example 2-2, and the refractive index of the low refraction layer formed was measured through a prism coupler.

< Experimental Example > - Optical properties of antireflection film

The transmittance of the antireflection films of Examples and Comparative Examples was measured using a CM-5 Spectrophotometer manufactured by Konica Minolta, and the reflectance of the antireflection film was measured after blackening the backside of the antireflection film. Further, CIE L *, a *, b * values, specifically transmission a *, transmission b * and reflection a *, and reflection b * values according to the antireflection film structures of the examples and comparative examples were determined by designating white light source D65 and CIE1964 observer. * The results are shown in Table 1.

High-refraction layer Low refraction layer Transmittance (%) reflectivity(%) CIE Lab Thickness (nm) Refractive index Thickness (nm) Refractive index Example 1 150 1.64 90 1.24 99.59 0.31 Permeation a * -0.1804 b * 0.0868 reflect a * 1.56 b * -0.85 Example 2 150 1.64 100 1.24 99.81 0.08 Permeation a * -0.1780 b * 0.0809 reflect a * 1.97 b * -0.97 Example 3 170 1.64 100 1.24 99.73 0.15 Permeation a * -0.0764 b * 0.3719 reflect a * 1.45 b * -0.9710 Example 4 170 1.64 110 1.24 99.44 0.45 Permeation a * -0.0839 b * 0.1270 reflect a * 1.3410 b * -0.8967 Example 5 250 1.64 110 1.24 99.42 0.40 Permeation a * -0.2475 b * 0.6241 reflect a * 1.8838 b * -0.9978 Example 6 300 1.64 110 1.24 99.61 0.18 Permeation a * -0.4006 b * 0.8605 reflect a * 1.45 b * -0.97 Example 7 350 1.64 100 1.24 99.64 0.12 Permeation a * -0.3179 b * 0.9672 reflect a * 1.9253 b * -0.9866 Example 8 400 1.64 110 1.24 99.40 0.33 Permeation a * -0.1476 b * 0.0768 reflect a * 1.9021 b * -0.9154 Example 9 450 1.64 110 1.24 99.41 0.29 Permeation a * -0.4168 b * 0.5191 reflect a * 1.8915 b * -0.9673 Comparative Example 300 1.64 100 1.26 97.66 1.28 Permeation a * -0.2465 b * 1.2322 reflect a * 3.2751 b * -6.7582

As shown in Table 1, it was confirmed that the antireflection film of the Example exhibited excellent antireflection characteristics with a transmittance of 99% or more and a reflectance of 0.5% or less. Also, When the color a * value of the reflected light of the antireflection film of the example was measured between -1 and 2 and the color b * value was between -1 and 1, it was found that the color difference due to the reflected light was negligible. Respectively.

10: transparent substrate
20: High-refraction layer
30: low refraction layer
100: Antireflection film

Claims (12)

An antireflection film having a laminated structure of a transparent substrate, a high refractive index layer and a low refractive index layer,
A binder in which the low refraction layer is formed by polymerizing a silane compound represented by the following formula (1) and an organosilane compound represented by the following formula (2); Hollow silica particles; &Lt; / RTI &gt; and an acid catalyst;
The binder is formed by polymerizing 0.1 part by weight to 50 parts by weight of the silane compound represented by Formula 1 based on 100 parts by weight of the organosilane compound represented by Formula 2,
Wherein the anti-reflection film has a contact angle with water of 40 DEG to 70 DEG
Antireflection film:
[Chemical Formula 1]
R ¹ _x Si (OR ² ) _4-x
Wherein R ¹ is an alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms or an alkenyl group having 3 to 10 carbon atoms, R ² is an alkyl group having 1 to 6 carbon atoms, x is 0? X <4 Lt; / RTI &gt;
(2)
R ³ _y Si (OR ⁴ ) _4-y
R ³ is a fluoroalkyl group having 1 to 12 carbon atoms, R ⁴ is an alkyl group having 1 to 6 carbon atoms, and y represents an integer of 0? X <4.
The method according to claim 1,
The silane compound represented by the general formula (1) may be at least one selected from the group consisting of tetramethoxysilane, tetraethoxysilane, tetrapropoxysilane, tetraisopropoxysilane, tetra-n-butoxysilane, tetra- Butoxysilane, trimethoxysilane, trimethoxysilane, trimethoxysilane, methyltrimethoxysilane, methyltriethoxysilane, ethyltrimethoxysilane, ethyltriethoxysilane, propyltrimethoxysilane, propyltriethoxysilane, Vinyltrimethoxysilane, vinyltriethoxysilane, allyltrimethoxysilane allyltriethoxysilane, dimethyldimethoxysilane, phenyltrimethoxysilane, phenyltrimethoxysilane, phenyltrimethoxysilane, vinyltrimethoxysilane, vinyltriethoxysilane, allyltrimethoxysilane allyltriethoxysilane, At least one compound selected from the group consisting of a silane coupling agent, a silane coupling agent, a silane coupling agent, a silane coupling agent, a silane coupling agent,
Antireflection film.
The method according to claim 1,
The organosilane compound represented by the above-mentioned general formula (2) is preferably at least one selected from the group consisting of trifluoromethyltrimethoxysilane, trifluoromethyltriethoxysilane, trifluoropropyltrimethoxysilane, trifluoropropyltriethoxysilane, nonafluorobutylethyl But are not limited to, trimethoxysilane, trimethoxysilane, nonafluorobutylethyltriethoxysilane, nonafluorohexyltrimethoxysilane, nonafluorohexyltriethoxysilane, tridecafluorooctyltrimethoxysilane, tridecafluorooctyltri Heptadecafluorodecyltrimethoxysilane, heptadecafluorodecyltriethoxysilane, and a combination of these. In the present invention, there is provided a process for producing
Antireflection film.
The method according to claim 1,
The hollow silica particles preferably have a number average diameter of 1 nm to 1,000 nm
Antireflection film.
The method according to claim 1,
The binder is contained in an amount of 10 to 120 parts by weight based on 100 parts by weight of the hollow silica particles
Antireflection film.
The method according to claim 1,
The refractive index of the low refractive layer is 1.2 to 1.25
Antireflection film.
The method according to claim 1,
The thickness of the low refraction layer is preferably from 50 nm to 150 nm
Antireflection film.
The method according to claim 1,
The refractive index of the high refractive index layer is 1.6 to 1.7
Antireflection film.
The method according to claim 1,
The thickness of the high refractive index layer ranges from 100 nm to 500 nm
Antireflection film.
delete The method according to claim 1,
The reflectance of the antireflection film is less than 0.5% in the wavelength range of 450 nm to 650 nm
Antireflection film.
The method according to claim 1,
When the color a * value and the color b * value of the reflected light are -1 <a * <2, -1 <b * <1 when the white light is irradiated to the antireflection film
Antireflection film.

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