KR101424025B1 - 감광성 수지조성물 - Google Patents
감광성 수지조성물 Download PDFInfo
- Publication number
- KR101424025B1 KR101424025B1 KR1020070108888A KR20070108888A KR101424025B1 KR 101424025 B1 KR101424025 B1 KR 101424025B1 KR 1020070108888 A KR1020070108888 A KR 1020070108888A KR 20070108888 A KR20070108888 A KR 20070108888A KR 101424025 B1 KR101424025 B1 KR 101424025B1
- Authority
- KR
- South Korea
- Prior art keywords
- group
- photosensitive resin
- resin composition
- liquid crystal
- polysiloxane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000011342 resin composition Substances 0.000 title claims abstract description 60
- -1 polysiloxane Polymers 0.000 claims abstract description 113
- 239000004973 liquid crystal related substance Substances 0.000 claims abstract description 73
- 229920001296 polysiloxane Polymers 0.000 claims abstract description 34
- 125000003545 alkoxy group Chemical group 0.000 claims abstract description 30
- 229920005989 resin Polymers 0.000 claims abstract description 24
- 239000011347 resin Substances 0.000 claims abstract description 24
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 claims abstract description 23
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims abstract description 16
- 239000003513 alkali Substances 0.000 claims abstract description 11
- 239000007870 radical polymerization initiator Substances 0.000 claims abstract description 7
- 238000000034 method Methods 0.000 claims description 33
- 229910000077 silane Inorganic materials 0.000 claims description 30
- 239000007787 solid Substances 0.000 claims description 17
- 125000000217 alkyl group Chemical group 0.000 claims description 14
- 125000004432 carbon atom Chemical group C* 0.000 claims description 11
- 125000001931 aliphatic group Chemical group 0.000 claims description 6
- 238000011161 development Methods 0.000 claims description 6
- 229930195734 saturated hydrocarbon Natural products 0.000 claims description 6
- 239000000178 monomer Substances 0.000 claims description 5
- 125000005417 glycidoxyalkyl group Chemical group 0.000 claims description 4
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 claims description 3
- 125000004103 aminoalkyl group Chemical group 0.000 claims description 2
- 239000000470 constituent Substances 0.000 claims description 2
- 125000005358 mercaptoalkyl group Chemical group 0.000 claims description 2
- 125000000962 organic group Chemical group 0.000 claims description 2
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 1
- 230000001678 irradiating effect Effects 0.000 claims 1
- 239000003505 polymerization initiator Substances 0.000 abstract 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 37
- 239000000243 solution Substances 0.000 description 31
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 21
- 239000000758 substrate Substances 0.000 description 18
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 17
- 239000002253 acid Substances 0.000 description 16
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 16
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 15
- 239000010408 film Substances 0.000 description 14
- 238000004519 manufacturing process Methods 0.000 description 14
- 239000002904 solvent Substances 0.000 description 14
- 239000000203 mixture Substances 0.000 description 13
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 13
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 12
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- 238000006243 chemical reaction Methods 0.000 description 10
- 230000000052 comparative effect Effects 0.000 description 10
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 10
- 238000004448 titration Methods 0.000 description 10
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- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 9
- 125000003118 aryl group Chemical group 0.000 description 9
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 9
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- 239000000047 product Substances 0.000 description 8
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 8
- 239000007864 aqueous solution Substances 0.000 description 7
- 239000003054 catalyst Substances 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 7
- DNIAPMSPPWPWGF-UHFFFAOYSA-N monopropylene glycol Natural products CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 7
- 230000009257 reactivity Effects 0.000 description 7
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 6
- 125000003277 amino group Chemical group 0.000 description 6
- 150000008064 anhydrides Chemical class 0.000 description 6
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 6
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 6
- 238000003780 insertion Methods 0.000 description 6
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- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 6
- 238000002360 preparation method Methods 0.000 description 6
- 235000011054 acetic acid Nutrition 0.000 description 5
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 5
- 230000018109 developmental process Effects 0.000 description 5
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 5
- 150000002430 hydrocarbons Chemical group 0.000 description 5
- 239000003112 inhibitor Substances 0.000 description 5
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 5
- 238000000016 photochemical curing Methods 0.000 description 5
- 125000003396 thiol group Chemical group [H]S* 0.000 description 5
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 4
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 4
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 4
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 4
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000001723 curing Methods 0.000 description 4
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 4
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 4
- 235000006408 oxalic acid Nutrition 0.000 description 4
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 4
- 229920001225 polyester resin Polymers 0.000 description 4
- 239000004645 polyester resin Substances 0.000 description 4
- 238000006116 polymerization reaction Methods 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- 239000004094 surface-active agent Substances 0.000 description 4
- 229920001187 thermosetting polymer Polymers 0.000 description 4
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 230000002159 abnormal effect Effects 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
- 239000012670 alkaline solution Substances 0.000 description 3
- 150000004703 alkoxides Chemical class 0.000 description 3
- 230000001588 bifunctional effect Effects 0.000 description 3
- 150000001244 carboxylic acid anhydrides Chemical class 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 238000009833 condensation Methods 0.000 description 3
- 230000005494 condensation Effects 0.000 description 3
- AHUXYBVKTIBBJW-UHFFFAOYSA-N dimethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OC)(OC)C1=CC=CC=C1 AHUXYBVKTIBBJW-UHFFFAOYSA-N 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
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- 239000010419 fine particle Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000011261 inert gas Substances 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 3
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- 229910044991 metal oxide Inorganic materials 0.000 description 3
- 150000004706 metal oxides Chemical class 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 229920003986 novolac Polymers 0.000 description 3
- 150000007524 organic acids Chemical class 0.000 description 3
- 235000005985 organic acids Nutrition 0.000 description 3
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 3
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- 235000013772 propylene glycol Nutrition 0.000 description 3
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 3
- 230000035484 reaction time Effects 0.000 description 3
- 229920006395 saturated elastomer Polymers 0.000 description 3
- 150000004756 silanes Chemical class 0.000 description 3
- 229910052814 silicon oxide Inorganic materials 0.000 description 3
- 229910000029 sodium carbonate Inorganic materials 0.000 description 3
- 125000006850 spacer group Chemical group 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 3
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- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical group CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 3
- OKRLWHAZMUFONP-UHFFFAOYSA-N (2,5-dioxopyrrolidin-1-yl) trifluoromethanesulfonate Chemical compound FC(F)(F)S(=O)(=O)ON1C(=O)CCC1=O OKRLWHAZMUFONP-UHFFFAOYSA-N 0.000 description 2
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 2
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- FDSUVTROAWLVJA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OCC(CO)(CO)COCC(CO)(CO)CO FDSUVTROAWLVJA-UHFFFAOYSA-N 0.000 description 2
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- 230000007062 hydrolysis Effects 0.000 description 2
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Classifications
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
- G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
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- G—PHYSICS
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Optics & Photonics (AREA)
- Materials For Photolithography (AREA)
Abstract
Description
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품명 | 배합(중량부) | (A)의 SP치- (B)의 SP치 |
현 상 성 |
|||||||||
(A)용액 | (B)용액 | 비교용액 | (C) | (D) | ||||||||||
A-1 용액 |
A-2 용액 |
B-1 용액 |
B-2 용액 |
B-3 | A-1' 용액 |
A-2' 용액 |
C-1 | D-6 | 추가 용제 |
|||||
실 시 예 |
1 | Q1 | 340(81) | - | 60(14) | - | - | - | 5(5) | - | 50 | 1.9 | ◎ | |
2 | Q2 | - | 340(81) | - | 60(14) | - | - | - | 5(5) | - | 50 | 3.22 | ◎ | |
3 | Q3 | 300(71) | - | 100(24) | - | - | - | - | 5(5) | - | 50 | 1.9 | ○ | |
4 | Q4 | - | 340(81) | - | - | 15 (14) |
- | - | 5(5) | - | 50 | 3.96 | ○ | |
5 | Q5 | 380(86) | - | - | 40(9) | - | - | - | 5(5) | - | 50 | 2.57 | ◎ | |
6 | Q6 | - | 340(81) | 60(14) | - | - | - | - | 5(5) | 10 | 50 | 2.55 | ◎ | |
비 교 예 |
1 | Y1 | - | - | 60(14) | - | - | 340 (81) |
- | 5(5) | - | 50 | 4.10 | △ |
2 | Y2 | - | - | 60(14) | - | - | - | 340(81) | 5(5) | - | 50 | 2.50 | ◎ | |
3 | Y3 | 400(95) | - | - | - | - | - | - | 5(5) | 10 | 50 | - | ◎ | |
4 | Y4 | - | - | - | 60(14) | - | - | 340(81) | 5(6) | - | 50 | 3.17 | ○ |
사용한 감광성 수지조성물 | 액정배향성 | 전압유지특성 | ||
실 시 예 |
1 | Q1 | 양호 | 99% |
2 | Q2 | 양호 | 98% | |
3 | Q3 | 양호 | 100% | |
4 | Q4 | 양호 | 98% | |
5 | Q5 | 양호 | 98% | |
6 | Q6 | 양호 | 99% | |
비 교 예 |
1 | Y1 | 양호 | 69% |
2 | Y2 | 불량 | 85% | |
3 | Y3 | 불량 | 94% | |
4 | Y4 | 불량 | 85% |
Claims (9)
- (메타)아크릴로일기 및 카르복실기를 함유하는 친수성수지(A), 폴리실록산(B), 및 광라디칼 중합개시제(C)를 함유하며, 상기 친수성 수지(A)가 에폭시수지를 변성하여 이루어지는 친수성수지인,알카리 현상 가능한 액정표시소자용 돌기형성에 이용되는 감광성 수지조성물(Q).
- 청구항 1에 있어서, 폴리실록산(B)이 2개 이상의 가수분해성 알콕시기를 가지는 감광성 수지조성물(Q).
- 삭제
- 청구항 1에 있어서,친수성수지(A)와 폴리실록산(B)의 용해도 파라미터의 차가 -4.0~4.0인 감광성 수지조성물(Q).
- 청구항 1 내지 청구항 3 및 청구항 5 중 어느 한 항에 있어서,감광성 수지조성물의 고형분의 합계중량에 기초하여, 친수성수지(A)를 50~98중량%, 폴리실록산(B)를 1.5~45중량%, 및 광라디칼 중합개시제(C)를 0.01~8중량% 함유하는 감광성 수지조성물.
- 청구항 1 내지 청구항 3 및 청구항 5 중 어느 한 항에 기재된 감광성 수지조성물을 광조사를 포함하는 공정에 의해 경화시켜 형성된 액정표시소자용 돌기.
- 청구항 7에 있어서,광조사를 포함하는 공정이 광조사후, 알카리 현상하여 패턴형성하고, 나아가 포스트베이킹을 실시하는 것을 특징으로 하는 공정인 액정표시소자용 돌기.
- 청구항 6에 기재된 감광성 수지조성물을 광조사를 포함하는 공정에 의해 경화시켜 형성된 액정표시소자용 돌기.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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JP2006296913 | 2006-10-31 | ||
JPJP-P-2006-00296913 | 2006-10-31 |
Publications (2)
Publication Number | Publication Date |
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KR20080039273A KR20080039273A (ko) | 2008-05-07 |
KR101424025B1 true KR101424025B1 (ko) | 2014-07-28 |
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KR1020070108888A Expired - Fee Related KR101424025B1 (ko) | 2006-10-31 | 2007-10-29 | 감광성 수지조성물 |
Country Status (3)
Country | Link |
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KR (1) | KR101424025B1 (ko) |
CN (1) | CN101178541B (ko) |
TW (1) | TWI380132B (ko) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
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JP5311054B2 (ja) * | 2009-02-19 | 2013-10-09 | Jsr株式会社 | 液晶配向剤、液晶表示素子およびその製造方法 |
WO2012161185A1 (ja) * | 2011-05-25 | 2012-11-29 | 三菱レイヨン株式会社 | シロキサンオリゴマーの製造方法 |
JP6233310B2 (ja) * | 2012-08-30 | 2017-11-22 | 日産化学工業株式会社 | 液晶配向処理剤及びそれを用いた液晶表示素子 |
TWI597574B (zh) * | 2015-08-19 | 2017-09-01 | 奇美實業股份有限公司 | 感光性樹脂組成物及其應用 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000028816A (ja) * | 1998-07-14 | 2000-01-28 | Toray Ind Inc | カラーフィルター用感光性着色樹脂組成物、カラーフィルターおよび液晶表示素子 |
KR20050040103A (ko) * | 2003-10-27 | 2005-05-03 | 스미또모 가가꾸 가부시끼가이샤 | 착색 감광성 수지 조성물 |
KR20060041813A (ko) * | 2004-02-09 | 2006-05-12 | 제이에스알 가부시끼가이샤 | 돌기부 및 스페이서의 형성 및 이를 위한 감방사선성 수지조성물 |
KR20060058026A (ko) * | 2004-11-24 | 2006-05-29 | 도레이 가부시끼가이샤 | 감광성 수지 조성물 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
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TW200540565A (en) * | 2004-06-08 | 2005-12-16 | Sumitomo Chemical Co | Photosensitive resin composition |
KR101119818B1 (ko) * | 2004-12-07 | 2012-03-06 | 주식회사 동진쎄미켐 | 컬러필터용 감광성 수지 조성물 및 이를 이용한액정디스플레이 컬러필터의 제조방법 |
-
2007
- 2007-10-29 TW TW096140539A patent/TWI380132B/zh not_active IP Right Cessation
- 2007-10-29 KR KR1020070108888A patent/KR101424025B1/ko not_active Expired - Fee Related
- 2007-10-29 CN CN2007101669200A patent/CN101178541B/zh not_active Expired - Fee Related
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000028816A (ja) * | 1998-07-14 | 2000-01-28 | Toray Ind Inc | カラーフィルター用感光性着色樹脂組成物、カラーフィルターおよび液晶表示素子 |
KR20050040103A (ko) * | 2003-10-27 | 2005-05-03 | 스미또모 가가꾸 가부시끼가이샤 | 착색 감광성 수지 조성물 |
KR20060041813A (ko) * | 2004-02-09 | 2006-05-12 | 제이에스알 가부시끼가이샤 | 돌기부 및 스페이서의 형성 및 이를 위한 감방사선성 수지조성물 |
KR20060058026A (ko) * | 2004-11-24 | 2006-05-29 | 도레이 가부시끼가이샤 | 감광성 수지 조성물 |
Also Published As
Publication number | Publication date |
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CN101178541A (zh) | 2008-05-14 |
TWI380132B (en) | 2012-12-21 |
TW200846829A (en) | 2008-12-01 |
CN101178541B (zh) | 2012-04-25 |
KR20080039273A (ko) | 2008-05-07 |
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