KR101409696B1 - Liquid crystal display device and method fabricating for the same - Google Patents

Abstract

Disclosed is a liquid crystal display device and a method of manufacturing the same that can reduce the manufacturing cost by reducing the manufacturing process.

A liquid crystal display device according to the present invention includes a substrate, a plurality of black matrices spaced apart from each other by a predetermined distance on the substrate, and a plurality of red, green, and blue color resins sequentially spaced apart from each other on the substrate on which the plurality of black matrices are formed And a common electrode formed on the red, green, and blue color filter layers and the column spacers, and a common electrode formed on the red, green and blue color filter layers and the column spacers.

Column spacer, color filter

Description

BACKGROUND OF THE INVENTION 1. Field of the Invention [0001] The present invention relates to a liquid crystal display device,

1 is a detailed view of a liquid crystal panel of a conventional liquid crystal display device.

Fig. 2 is a cross-sectional view of the liquid crystal panel of Fig. 1; Fig.

3A to 3F are diagrams showing a procedure of a conventional method for manufacturing an upper substrate.

4 is a sectional view of a liquid crystal panel according to the present invention.

FIGS. 5A to 5H are views showing the manufacturing steps of the upper substrate of FIG. 4;

BRIEF DESCRIPTION OF THE DRAWINGS FIG.

101: first substrate 102: liquid crystal panel

103: second substrate 105: upper substrate

106: black matrix 108a: red color filter

108b: green color filter 108c: blue color filter

114: liquid crystal 118: gate electrode

120: gate insulating layer 122: lower substrate

124: source electrode 126: drain electrode

128: protection layer 130: pixel electrode

132: active layer 132a: semiconductor layer

132b: ohmic contact layer 138: common electrode

140: first photosensitive color resin 142: column spacer

145, 155, 165: mask 150: second photosensitive color resin

160: Third photosensitive color resin

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display, and more particularly, to a liquid crystal display having a reduced manufacturing cost by reducing the number of manufacturing steps and a manufacturing method thereof.

A liquid crystal display device (Liquid Crystal Display device) displays an image with liquid crystal. In order to display an image, the liquid crystal display device includes a liquid crystal panel, a driving unit for driving the liquid crystal panel, and a backlight unit for irradiating light to the liquid crystal panel.

The liquid crystal panel is composed of first and second substrates and a liquid crystal, and the first and second substrates are arranged to face each other, and the liquid crystal is injected between the first and second substrates.

1 is a detailed view of a liquid crystal panel of a conventional liquid crystal display device.

1, a conventional liquid crystal panel 2 includes a color filter 7 including a black matrix 6 and sub color filters (R, G, B) 8, A pixel electrode 17 formed on the pixel region P and a lower substrate 22 on which an array wiring including the thin film transistor T is formed is formed on the upper substrate 5 on which the transparent common electrode 18 is formed, And a liquid crystal 14 is filled between the upper substrate 5 and the lower substrate 22.

Fig. 2 is a cross-sectional view of the liquid crystal panel of Fig. 1. Fig.

1 and 2, the liquid crystal panel 2 includes a lower substrate 22, an upper substrate 5, a liquid crystal 14 injected between the lower substrate 22 and the upper substrate 5, Lt; / RTI >

The lower substrate 22 includes a transparent first substrate 1 on which a gate electrode 18 formed in the same process as the gate line 13 is formed and a gate insulating layer 20 is formed on the gate electrode 18. [ An active layer 22 is formed on the gate insulating layer 20 and source and drain electrodes formed integrally with the data line 15 and spaced apart from each other by a predetermined distance are formed on the active layer 22 24 and 26 are formed on the source and drain electrodes 24 and 26, and a protective layer 28 is formed on the source and drain electrodes 24 and 26. A contact hole is formed to expose the drain electrode 26 on the protective layer 28, and a pixel electrode 30 is formed on the contact hole.

The upper substrate 5 includes a color filter 7 including a black matrix 6 and sub color filters R, G and B 8 on a transparent second substrate 3, A transparent common electrode 38 is formed.

The upper substrate 5 and the lower substrate 22 formed as described above are attached opposite to each other with a cell gap of a predetermined distance therebetween, and the liquid crystal 14 is injected therebetween. A column spacer 42 is formed on the upper substrate 5 to keep the cell gap constant and the upper surface of the upper substrate 5 and the lower substrate 22 And the seal member 44 is sewn to the edge portion.

The column spacer 42 may be formed on the upper substrate 5 or the lower substrate 22. For example, a method of forming the column spacer 42 on the upper substrate 5 using a photosensitive material will be described.

3A to 3F are diagrams showing a procedure of a conventional method of manufacturing an upper substrate.

3A, a photosensitive black organic material used as the black matrix material 16 is deposited on the second substrate 3, and the patterned mask 23 is placed. A mask 23 composed of a transmitting portion A and a blocking portion B is placed on the black matrix material 16. 3B, a black matrix material 16 corresponding to the transmissive portion A of the mask 23 is irradiated with light and developed to form a plurality of black matrices 6. Then, as shown in Fig.

Next, as shown in FIG. 3C, a color filter layer 8 using a color resin having red, green, and blue colors is formed on the second substrate 3 on which the black matrix 6 is formed. More specifically, a color resin having a red color among red (R), green (G) and blue (B) color resin is applied to the entire surface of the second substrate 3 on which the black matrix 6 is formed And selectively exposed to form a red color filter layer in a desired area. (The order in which the colors are applied is arbitrarily set in the color order of red (R), green (G), and blue (B).)

Next, green color resin is coated on the entire surface of the second substrate 3 on which the red color filter layer is formed, and then selectively exposed to form a green color filter layer. Subsequently, a blue color resin is coated on the entire surface of the second substrate 3 on which the red and green color filter layers are formed, and then selectively exposed to form a blue color filter layer. The red, green, and blue color filter layers are patterned using a mask and formed on the second substrate 3, respectively.

Then, as shown in FIG. 3D, ITO (Indium Tin Oxide) is deposited on the entire surface of the formed color filter layer 8 by sputtering. ITO as the common electrode 38 does not form a separate pattern. For the reference, before forming the common electrode 38, a planarizing film (overcoat layer) is formed by using an acrylic resin or a polyimide resin for protection and planarization of the patterned color filter layer 8 However, it may be omitted in order to reduce manufacturing process cost.

Next, as shown in FIG. 3E, a photosensitive organic material is coated on the entire surface of the second substrate 3 on which the common electrode 38 is formed to form a photosensitive organic film 42. Next, as shown in FIG. The photosensitive organic layer 42 generally uses a negative type.

A mask (not shown) composed of a transmissive portion and a blocking portion is placed on the second substrate 3 on which the photosensitive organic layer 42 is formed. The transmissive portion is positioned on the second substrate 3 in correspondence with a portion for forming a spacer pattern. Next, after the light is irradiated on the upper portion of the mask (not shown), the photosensitive organic layer 42 is developed. Finally, as a result of this, as shown in FIG. 3F, a column spacer 42 patterned in a predetermined shape can be formed. By this process, the column spacer 42 can be formed on the second substrate 3.

Meanwhile, as described in the above process, in forming the column spacer 42, the mask process is patterned through photo resist coating, exposure, development, and etching processes. Therefore, since the above process is repeatedly performed in order to form one pattern, a problem of increasing manufacturing cost arises.

An object of the present invention is to provide a liquid crystal display device and a method of manufacturing the same that can simplify a process and reduce manufacturing cost by simultaneously forming a color filter layer and a column spacer in a process of manufacturing an upper substrate.

According to an aspect of the present invention, there is provided a liquid crystal display comprising a substrate, a plurality of black matrices spaced apart from each other by a predetermined distance on the substrate, A color filter layer formed of a blue color resin and a column spacer formed through the same process using the same material as the blue color resin and a color filter layer formed on the red, green, and blue color filter layers and the common electrode .

According to an aspect of the present invention, there is provided a method of manufacturing a liquid crystal display device, comprising: forming a plurality of black matrices spaced apart from each other on a substrate by a predetermined distance; Forming a green color filter by applying a green color resin between the red color filter and the spacers on the substrate on which the plurality of black matrixes are formed and patterning the resultant to form a green color filter; A blue color resin is applied between the red and green color filters and the substrate on which the plurality of black matrices are formed, and then a mask composed of the first to third regions is positioned and light is irradiated to the blue color resin And exposing the exposed blue color resin to a first area of the mask, Forming a column spacer, and a step and forming a common electrode on the red, green, and blue color filter and the column spacer to form a blue color filter on a second region of the mask.

Hereinafter, embodiments according to the present invention will be described with reference to the accompanying drawings.

4 is a sectional view of a liquid crystal panel according to the present invention.

4, the liquid crystal panel 102 according to the present invention includes an upper substrate 105 and a lower substrate 122, and a liquid crystal 114 (see FIG. 4) injected between the upper substrate 105 and the lower substrate 122, ).

The lower substrate 122 has a gate electrode 118 formed on a transparent first substrate 101 and a gate insulating layer 120 formed on the gate electrode 118. An active layer 122 composed of a semiconductor layer 122a and an ohmic contact layer 122b is formed on the gate insulating layer 120 at a position corresponding to the gate electrode 118, A source electrode 124 and a drain electrode 126 are formed.

A protective layer 128 is formed on the first substrate 101 on which the source electrode 124 and the drain electrode 126 are formed and the drain electrode 126 is exposed on the protective layer 128. [ And a pixel electrode 130 made of a transparent ITO electrode is formed on the contact hole. The gate electrode 118, the active layer 122, and the source and drain electrodes 124 and 126 constitute a thin film transistor (TFT).

The upper substrate 105 includes a plurality of black matrices 106 formed on a transparent second substrate 103 and color filters 108a and 108b made of red, 108b, and 108c are formed. A column spacer 142 is formed integrally with the blue color resin 108c and the column spacer 142 is formed through the same process as the blue color resin 108c. The column spacer 142 is formed at a position corresponding to the black matrix 106 and is formed at a position corresponding to the TFT of the lower substrate 122.

Figs. 5A to 5H are views showing the order of manufacturing the upper substrate of Fig. 4. Fig.

As shown in FIG. 5A, a plurality of black matrices 106 are formed on a transparent second substrate 103 through a photo process. The black matrix 106 is formed on the second substrate 103 at predetermined intervals. As the material of the black matrix 106, a metal thin film such as chromium (Cr) or chromium (Cr) / chromium oxide (CrOx) or an organic material of photosensitive resin BM is mainly used. Therefore, the plurality of black matrices 106 are formed using any of the above-mentioned materials according to purposes.

At this time, the black matrix 106 is formed using any of the above-mentioned materials according to the object. The patterning method according to the material used for the black matrix 106 can be selectively applied.

The first photosensitive color resin 140 is applied onto the second substrate 103 formed with the plurality of black matrices 106 spaced apart from each other by a predetermined distance, as shown in FIG. 5B. The main component of the first photosensitive color resin 140 is a photopolymerizable photosensitive composition such as a photopolymerization initiator, a monomer and a binder, and an organic pigment having a red color.

The mask 145 composed of the blocking portion C and the transmissive portion D is placed on the second substrate 103 on which the first photosensitive color resin 140 is formed. When the mask 145 is irradiated with light and developed, the first photosensitive color resin 140 corresponding to the transmissive portion D remains, thereby forming a red color filter 108a as shown in FIG. 3C. The coloring order is arbitrarily set in the color order of red (R), green (G), and blue (B).)

Subsequently, the second photosensitive color resin 150 is applied onto the second substrate 103 on which the red color filter 108a is formed, as shown in Fig. 5D. The main component of the second photosensitive color resin 150 is a photopolymerizable photosensitive composition such as a photopolymerization initiator, a monomer and a binder, and an organic pigment having a green color.

A mask 155 composed of a blocking portion E and a transmissive portion F is placed on the second substrate 103 on which the second photosensitive color resin 150 is formed. When the mask 155 is irradiated with light and then developed, the second photosensitive color resin 150 corresponding to the transmissive portion F remains to form a green color filter 108b as shown in FIG. 5E.

Next, a third photosensitive color resin 160 is applied onto the second substrate 103 on which the green color filter 108b is formed, as shown in Fig. 5F. The main component of the third photosensitive color resin 160 is a photopolymerizable photosensitive composition such as a photopolymerization initiator, a monomer and a binder, and an organic pigment having a blue color.

When the third photosensitive color resin 160 is coated on the second substrate 103, the third photosensitive color resin 160 may be coated on the first and second photosensitive color resins 140 and 150, And is applied to the second substrate 103 thicker. The thickness of the third photosensitive color resin 160 is at least twice that of the first and second photosensitive color resins 140 and 150 and is applied on the second substrate 103.

A blocking portion I and a mask 165 composed of a transmissive portion H and a transflective portion G are positioned on the second substrate 103 on which the third photosensitive color resin 160 is formed. When the mask 155 is irradiated with light and developed, 100% of the third photosensitive color resin 150 corresponding to the transmissive portion H remains and the third photosensitive color resin 150 corresponding to the transflective portion G 160) is about 20%.

When the light is irradiated to the transflective portion G, the third photosensitive color resin 150 corresponding to the transflective portion G generally remains at about 50% or less.

The transmissive portion H is located at a portion corresponding to the black matrix 106 and the blocking portion I is positioned at a portion where the red color filter 108a and the green color filter 108b are formed, And the transflective portion G is located in the remaining portion.

The third photosensitive color resin 160 corresponding to the transflective portion G is left to be a blue color filter 108c and the third photosensitive color resin 160 corresponding to the transmissive portion H is formed by a column spacer (142). The third photosensitive color resin 160 is applied on the second substrate 102 to be thicker than the first and second photosensitive color resins 140 and 150 to form the column spacer 142. [

The column spacer 142 has a certain height since it functions to maintain a cell gap between the upper substrate (105 in FIG. 4) and the lower substrate 122. To this end, the third photoresist color resin 160 is coated on the second substrate 103 thicker than the first and second photosensitive color resins 140 and 150.

Accordingly, the blue color filter 108c and the column spacer 142 can be simultaneously formed through a single photo process.

ITO (Indium Tin Oxide), which is a transparent electrode material having good transparency and conductivity and excellent chemical and thermal stability, is formed on the entire surface of the second substrate 103 on which the blue color filter 108c and the column spacer 142 are formed by sputtering After the deposition, a common electrode 138 is formed.

The column spacer 142 is formed at a position corresponding to the black matrix 106 and is positioned so as to correspond to the protective layer 128 of the lower substrate 122 (FIG. 4).

Since the column spacer 142 is formed at the same time when the blue color filter 108c is formed, a separate mask may not be used to form the column spacer 142.

In the above-described embodiments, the first to third photosensitive color resins are described as negative photosensitive color resins, but positive photosensitive color resins may also be used.

As described above, in the liquid crystal display according to the present invention, a color filter and a column spacer formed on an upper substrate are simultaneously formed through a single mask process, and a separate mask process is required to form the column spacer The number of masks is reduced as compared with the conventional liquid crystal display device, and the manufacturing cost can be reduced.

As described above, since the color filter and the column spacer are formed by the same process using the same material, the liquid crystal display according to the present invention can simplify the process, reduce the number of masks, and reduce manufacturing cost accordingly .

Claims (11)

delete delete delete delete delete Forming a plurality of black matrices spaced a predetermined distance on a substrate; Applying a red color resin between the spaced apart portions of the substrate on which the plurality of black matrices are formed; Placing a first mask composed of blocking portions and transmissive portions on the substrate coated with the red color resin and irradiating light to the first mask to form a red color filter in a region corresponding to the transmissive portion; Applying green color resin between the red color filter and spaced apart on the substrate on which the plurality of black matrices are formed; Placing a second mask composed of a shielding portion and a transmissive portion on the substrate coated with the green color resin and irradiating light to the second mask to form a green color filter in an area corresponding to the transmissive portion of the second mask ; Applying a blue color resin having a thickness of at least two times greater than the red and green color resin on the substrate on which the red and green color filters and the plurality of black matrices are formed; A third mask composed of a blocking portion, a transmitting portion, and a transflective portion is formed on the substrate coated with the blue color resin, and the shielding portion of the third mask has a region where the red color filter and the green color filter are formed, Wherein the second mask is disposed in a region corresponding to the transmissive portion of the third mask so that the transflective portion of the third mask corresponds to the remaining region on the substrate coated with the blue color resin, A color filter having a thickness equal to or less than half the thickness of the column spacer is formed integrally with the column spacer in a region corresponding to the transflective portion of the third mask, ; Forming a common electrode on the red, green, and blue color filters and the column spacers, Wherein the column spacer is formed in the same process as the blue color filter and extends from the blue color filter and is positioned to correspond to the black matrix. delete The method according to claim 6, Wherein the blue color filter has a thickness corresponding to 20% of the thickness of the color spacer. delete The method according to claim 6, Wherein the red, green, and blue color resin is a negative photosensitive organic material or a positive photosensitive organic material. delete

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