KR101409406B1 - Manufacturing method of metallic pattern for water-repellent finishing of fabric and water-repellent finishing method of fabric using the same - Google Patents

Abstract

The present invention relates to a method of manufacturing a mold for water-repellent processing of fabrics and a method of water-repellent processing of fabrics using the same, and more particularly to a method of manufacturing a mold for water-repellent processing capable of forming a fine pattern having a water repellent function on the surface of a fabric, And a water-repellent processing method.
According to the present invention, it is possible to form a fine pattern having a water repellent function on the surface of a fabric by a direct transfer method. It is possible to improve the productivity and economical efficiency by using a simple process rather than a conventional coating method or a dipping method using a resin and applying the process to a large area process. Further, since it is not required to use a solvent which is harmful to the environment, work safety can be improved. In addition, there is no possibility that the water repellency is lowered by friction or washing, and the water repellent function can be maintained semi-permanently.

Description

BACKGROUND OF THE INVENTION 1. Field of the Invention [0001] The present invention relates to a method of manufacturing a metal mold for water-repellent processing of fabrics, and a method of water-repellent processing of fabrics using the same. BACKGROUND ART [0002]

The present invention relates to a method of manufacturing a metal mold for water-repellent processing of fabrics and a method of water-repellent processing of fabrics using the same, and more particularly to a method of manufacturing a metal mold for water-repellent processing capable of forming a fine pattern having a water repellent function on the surface of a fabric, And a water-repellent processing method.

The wetting phenomenon is an important interfacial phenomenon that occurs in everyday life and is closely related not only to surface science but also to industrial fields such as textile processing. Recently, many researches on water repellency have been proceeding as a functional modification of fiber surface. Water repellency refers to a property that water does not penetrate the surface of cloth or paper, or a property that is not wetted with water. Water repellent surface technology is a field of surface modification technology to control the wetting phenomenon of a surface. It physically or chemically modifies the surface of a solid surface to a certain level To maintain the contact angle.

Conventionally, a polyurethane microporous membrane method using a direct coating method has been used to fabricate a water repellent fabric. However, since it is necessary to use a solvent harmful to the environment such as DMF (Dimethylformamide) and MEK (Methyl ethyl ketone) . Korean Patent Application (10-2002-7004554) also mentions a method of processing a water repellent fabric by knife-over-coating and gravure-coating a solution of a specific composition containing crosslinked acrylic particles. However, this is complicated in processes such as preparing a solution of a specific composition, coating on a fabric, hot air drying and heat treatment, and the water repellent material is coated on the fiber surface, have.

The most representative example of superhydrophobic surfaces observed in nature is lotus leaf. The surface of the lotus leaf is covered with numerous bumps of 3 to 10 μm in size, and these waxes are coated with wax, a nano-sized water-repellent coating, exhibiting super-hydrophobic properties. In recent years, there has been a great deal of interest in research on producing a surface having improved water repellency by simulating micro- and nano-mixed structures existing in the natural world beyond the simple microstructure or nanostructure.

Korean Patent No. 10-0793188 Korean Patent No. 10-0930623

The present invention provides a method of manufacturing a metal mold for water-repellent processing of a fabric which can improve productivity, economical efficiency and work safety while improving physical properties, and a method of water-repellent processing of a fabric using the same.

According to an embodiment of the present invention, there is provided a method of manufacturing a metal mold for water repellent processing of a fabric, comprising: forming a photosensitive layer by coating a photosensitive agent on a metal substrate; Forming a pattern on the photosensitive layer; Forming a micro-sized pattern on the metal substrate by first etching in the pattern shape; Forming a mixed pattern structure in which a micro-sized pattern and a nano-sized pattern are mixed on the metal substrate by performing a second etching on the metal substrate having the micro-sized pattern formed thereon.

The metal may include at least one selected from the group consisting of stainless steel, iron, nickel, chromium, tungsten, and cobalt used as a mold material. The stainless steel may include SS301, SS304, SS316, SS410, SS430, and the like.

The step of forming a pattern on the photosensitive layer may be performed by covering the upper part of the photosensitive layer with a mask having a pattern and exposing the photosensitive layer with ultraviolet rays.

The pattern size formed on the photosensitive layer may be 10 to 500 mu m.

The pattern shape formed on the photosensitive layer may include at least one selected from the group consisting of circular, triangular, square, pentagonal, hexagonal, and grid patterns.

The ultraviolet ray exposure may use an ultraviolet ray exposure apparatus which emits a wavelength of 365 to 436 nm.

The ultraviolet ray exposure apparatus may use a mercury (Hg) lamp.

The first etching may be an electrochemical process.

The electrochemical process may be a process of etching for 10 to 90 minutes at a current in the range of 0.1 to 50 A in an electrolyte prepared by mixing sulfuric acid (H ₂ SO _{4 )} , phosphoric acid (H ₃ PO _{4 ),} and ultrapure water.

The electrolytic solution can be used by mixing sulfuric acid (H ₂ SO ₄ ), phosphoric acid (H ₃ PO ₄ ) and ultrapure water in a volume ratio of 3: 5: 2.

According to an embodiment of the present invention, the step of forming the micro-sized pattern may further include removing the photosensitive layer.

Removal of the photosensitive layer may be performed using acetone.

The second etch may be a wet process.

The wet process may be performed by immersing the substrate in a solution of ferric chloride (FeCl ₃ ) at room temperature to 80 ° C.

According to an embodiment of the present invention, there is provided a mold manufactured by the method for manufacturing a fabric for water repellent processing of a fabric, wherein the mold includes a mixed pattern structure in which micro and nano sizes are mixed on a metal substrate, And the pattern shape of the nano-sized pattern is irregular. The present invention also provides a mold for water-repellent processing of a fabric.

The metal may include at least one selected from the group consisting of stainless steel, iron, nickel, chromium, tungsten, and cobalt used as a mold material. The stainless steel may include SS301, SS304, SS316, SS410, SS430, and the like.

The micro-sized pattern may have a size of 10 to 500 mu m.

The micro-sized pattern shape may include at least one shape selected from the group consisting of circular, triangular, square, pentagonal, hexagonal, and lattice patterns.

A method of water-repellent processing a fabric according to an embodiment of the present invention includes the steps of: fabricating a water-repellent metal mold for a fabric by the method for manufacturing a water-repellent metal of the fabric; And transferring the micro- and nano-sized mixed pattern structure formed on the mold manufactured by the above step to a fabric by a hot embossing process.

The hot embossing may be performed by applying a pressure of 10 to 500 kg at room temperature to 300 DEG C for 5 to 30 minutes.

A water repellent fabric according to an embodiment of the present invention may be used in umbrella, raincoat, tent, or functional garment as a water repellent fabric processed by the water repellent method.

According to the present invention, it is possible to form a fine pattern having a water repellent function on the surface of a fabric by a direct transfer method. It is possible to improve the productivity and economical efficiency by using a simple process rather than a conventional coating method or a dipping method using a resin and applying the process to a large area process. In addition, since the use of solvents and the like which are harmful to the environment is not required, work safety can be improved. In addition, there is no possibility that the water repellency is lowered by friction or washing, and the water repellent function can be maintained semi-permanently.

FIG. 1 is a view illustrating a process for manufacturing a metal mold for water repellent processing of a fabric according to an embodiment of the present invention and a water repellent processing process using the same.
2 is an SEM image of a mold according to Examples 1-1 and 1-2.
Fig. 3 is an optical microscope image of a fabric before and after the hot embossing process according to Example 2. Fig.
4 is an SEM image of the fabric before and after the hot embossing process according to Example 2. Fig.
5 is a surface roughness image of the fabric before and after the hot embossing process according to Example 2. Fig.
6 is a result of measuring the contact angle of the fabric before and after the hot embossing process according to the second embodiment.
7 is an optical microscope image of a nickel mold having an engraved pattern according to Example 3. Fig.
8 is an optical microscope image of the fabric after the hot embossing process according to Example 4. Fig.
9 is a SEM image of the fabric after the hot embossing process according to Example 4. Fig.
10 is a surface roughness image of a fabric after the hot embossing process according to Example 4. Fig.

Hereinafter, the present invention will be described in more detail with reference to Examples and Experimental Examples. The objects and features of the present invention will be readily understood through the following examples and experimental examples. However, the present invention is not limited to these examples and may be embodied in other forms. The embodiments and experimental examples disclosed herein are provided to enable those skilled in the art to make and use the inventive concepts of the present invention. Therefore, the present invention should not be limited by the following examples and experimental examples.

A method of manufacturing a metal mold for water repellent processing of a fabric according to an embodiment of the present invention includes: forming a photosensitive layer by coating a photosensitive agent on a metal substrate; Forming a pattern on the photosensitive layer; Forming a micro-sized pattern on the metal substrate by first etching in the pattern shape; Forming a mixed pattern structure in which a micro-sized pattern and a nano-sized pattern are mixed on the metal substrate by performing a second etching on the metal substrate having the micro-sized pattern formed thereon.

Forming a photosensitive layer on the substrate

The metal may include at least one selected from the group consisting of stainless steel, iron, nickel, chromium, tungsten, and cobalt used as a mold material. The stainless steel may include SS301, SS304, SS316, SS410, SS430, and the like.

The metal substrate may be a large-area substrate having a diameter of 6 inches (diameter: 150 mm) or more.

In order to form the photosensitive layer, the photosensitive agent applied on the substrate has the same role as the photo paper so that the pattern shape on the original plate is directly displayed on the substrate. And can serve as a resistive film in a subsequent etching process.

The photosensitizer may be composed of three components: a polymer, a sensitizer (Photo Active Compound, PAC), and a solvent. Examples are AZ 1512, AZ 4620, AZ 9260 Photoresist (AZ Electronic Materials, USA), THB-126N, THB-151N Photoresist (JSR Corporation, Japan) and SU-8 (MicroChem Corporation, USA).

Forming a pattern on the photosensitive layer

The step of forming a pattern on the photosensitive layer may be performed by covering the upper part of the photosensitive layer with a mask having a pattern and exposing the photosensitive layer with ultraviolet rays.

The pattern size formed on the photosensitive layer is preferably 10 to 500 mu m. If the pattern size is less than 10 [mu] m or more than 500 [mu] m, water repellency is hardly realized when the pattern is transferred to the fabric.

The pattern shape formed on the photosensitive layer may be selected from the group consisting of circular, triangular, square, pentagonal, hexagonal, and grid patterns. However, the pattern shape is not limited thereto.

The ultraviolet ray exposure may use an ultraviolet ray exposure apparatus which emits a wavelength of 365 to 436 nm. If the wavelength is less than 365 nm or exceeds 436 nm, a desired pattern can not be obtained beyond the range of the wavelength at which the photosensitizer can react.

The ultraviolet ray exposure apparatus may use a mercury (Hg) lamp.

My 1 etching  step

The first etching may be performed by an electrochemical process.

The electrochemical process may be performed in an electrolytic solution prepared by mixing sulfuric acid (H ₂ SO ₄ ), phosphoric acid (H ₃ PO ₄ ), and ultrapure water at a current of 0.1 to 50 A for 10 to 90 minutes. When the etching process is performed within the above range, a metal substrate having a sophisticated structure and a smooth surface can be obtained.

The electrolytic solution can be used by mixing sulfuric acid (H ₂ SO ₄ ), phosphoric acid (H ₃ PO ₄ ) and ultrapure water in a volume ratio of 3: 5: 2. When mixed in the volume ratio described above, uniform surface roughness and high etching rate are exhibited.

A micro-sized pattern may be formed on the metal substrate by the first etching.

Photosensitive layer removal step

According to an embodiment of the present invention, the step of forming the micro-sized pattern may further include removing the photosensitive layer.

The photosensitive layer may be removed using acetone. However, it is not limited to acetone and other known materials can be used. The removal of the photosensitive layer can be performed by immersing the metal substrate in an ultrasonic beaker containing acetone for a predetermined time.

My 2 etching  step

The second etching may be performed by a wet process.

The wet process may be performed by immersing the substrate in a solution of ferric chloride (FeCl ₃ ) at room temperature to 80 ° C. If the temperature is lower than room temperature, the etching is insufficient. If the temperature is higher than 80 ° C, the etching is excessively performed, and it is difficult to form an expected nano-sized pattern. Room temperature refers to the temperature of the laboratory or laboratory. Especially when the experiment is conducted without specifying or controlling the temperature, it is expressed as the temperature condition used when the sample and the material are left indoors. ~ 20 ℃.

The nano-sized pattern may be formed in an irregular shape.

According to an embodiment of the present invention, a micro-sized pattern is formed in the first etching process, and a nano-sized pattern is formed in the second etching process, resulting in providing a mold having a mixed pattern structure in which micro and nano- can do.

The mold can be made into a roll-shaped mold and thus can be applied to a roll-to-roll manufacturing process. The water-repellent fabric can be mass-produced in large quantities through the large-area water-repellent processing.

According to an embodiment of the present invention, there is provided a mold manufactured by the method for manufacturing a fabric for water repellent processing of a fabric, wherein the mold includes a mixed pattern structure in which micro and nano sizes are mixed on a metal substrate, Wherein the pattern is regular and the nano-sized pattern shape is irregular.

The metal may include at least one selected from the group consisting of stainless steel, iron, nickel, chromium, tungsten, and cobalt used as a mold material. The stainless steel may include SS301, SS304, SS316, SS410, SS430, and the like.

The micro-sized pattern shape may have a size of 10 to 500 mu m.

The micro-sized pattern shape may include at least one shape selected from the group consisting of a circle, a triangle, a square, a pentagon, a hexagon, and a grid pattern.

A method for water-repellent processing of fabric according to another embodiment of the present invention comprises the steps of: (S1) preparing a mold by the method for manufacturing a water-repellent metal of the fabric; And a step (S2) of transferring the mixed pattern structure of micro and nano size formed in the mold manufactured in the step (S1) to a fabric by a hot embossing process.

The hot embossing is also called a thermal imprint. The hot embossing process can generally be performed by heating the plate, preheating the material (such as a fabric), and then pressing the pattern. This simplifies the process and enables mass production at low cost. In addition, according to this method, very fine and precise microstructures can be produced in a short time by replication. The method of transferring the fine pattern onto the surface of the fabric by the hot embossing process can be performed by heating the polymer (fabric) to a temperature higher than the glass transition temperature of the polymer (fabric), and applying a constant pressure using a mold. This makes it possible to replicate fine patterns in micrometers or nanometer units that match the molds in the polymer (fabric). At this time, cooling below the glass transition temperature results in the formation of fine patterns imprinted on the surface of the polymer (fabric). The degree of transfer of such a pattern can be controlled by changing the temperature and pressure conditions of the hot embossing process.

The hot embossing process may be performed by applying a pressure of 10 to 500 kg at room temperature to 300 ° C for 5 to 30 minutes. The fabric can exhibit the water repellent effect expected by the fabric in the above range.

According to an embodiment of the present invention, a mixed pattern structure of micro and nano size can be transferred to the surface of a fabric to be processed by using the water repellent processing mold of the fabric and the hot embossing process manufactured by the above method. Thus, a pattern can be formed directly on the fabric to be processed. The pattern structure is formed on the fabric surface may be a reverse phase (逆像) of the pattern formed on the mold. The micro- and nano-sized mixed pattern structure thus formed further improves the water repellency inherent in the fabric.

According to another embodiment of the present invention, a water repellent fabric used in an umbrella, a tent, or a functional garment may be provided as a water repellent fabric processed by the method of water repellent processing of the fabric.

The water repellent fabric can be used in umbrellas, raincoats and tents because it prevents the absorption of rainwater during rain, and can be used in functional clothes such as sportswear if it is processed with a fabric having water absorption and drying function. Currently, most water repellent fabrics are manufactured by coating a water repellent material and a powder having a size of several tens of micrometers. However, according to the present invention, a hot embossing process can be applied to manufacture a water repellent fabric including a fine pattern with high accuracy and accuracy in a short time There is an advantage.

The water repellent fabric is non-wetting and can be used to prevent absorption of water in an environment exposed to water and can be used in umbrellas, raincoats, tents, and functional garments as described above. In addition, it can be applied to sports leisure wear such as mountaineering products, and can be applied to industrial clothes when it is processed with a fabric of high humidity.

Hereinafter, the present invention will be described in more detail by way of Examples and Test Examples, but the present invention is not limited thereto.

Example 1 for water-repellent fabrics  Mold making

Example  1-1

Washing the stainless steel (stainless steel, SS304) substrate with acetone and 10% hydrochloric acid to remove organic impurities and the metal oxide layer. Then, a photoresist was coated on the stainless steel substrate to form a photosensitive layer (see FIG. 1-a). The photoresist layer was covered with a mask having a circular array pattern of 150 μm in size, (See Figs. 1-b and c). Next, using an electrochemical etching apparatus, the electrolyte was mixed with sulfuric acid, phosphoric acid, and ultrapure water in a volume ratio of 3: 5: (See Fig. 1-d). Next, the substrate was immersed in an ultrasonic beaker containing acetone for 3 minutes to remove the photosensitive layer (see Fig. 1-e) The substrate was immersed in a ferric chloride (FeCl ₃ ) solution for 60 seconds (second etching) to prepare a mold (pattern diameter 150 μm / height 50 μm / pattern spacing 100 μm / embossing) in which micro- and nano-sized patterns were mixed. (See Fig. 1-f)

Example  1-2

Using a circular array pattern having a diameter of 100 탆, a mold (100 탆 in diameter / 50 탆 in height / 100 탆 in pattern spacing / embossing) in which micro- and nano-sized patterns were mixed was produced through the same steps as in Example 1-1 .

Example  2 fabric (polyester) Water-repellent processing method  (Preparation of water repellent fabric)

Hot embossing was carried out using the mold produced in Example 1. [ After the plate was heated to 150 ° C and the polyester was preheated to 150 ° C, the mold prepared in Example 1 was pressurized with a pressure of 200kg for 5 minutes to obtain a mixed pattern (micro-nano pattern) A water repellent fabric was prepared by transferring the structure (see Figures 1-g and h)

Example  3 Manufacture of nickel mold with engraved pattern

Example  3-1

A nickel mold having a concave pattern of an engraved pattern was prepared by electroforming a stainless steel mold having a diameter of 20 mu m, a pattern interval of 10 mu m, and a height of 10 mu m prepared in the same manner as in Example 1-1. The above electroform casting was performed as follows. In order to increase the conductivity, a metal seed layer having a thickness of 100 Å was formed by sputtering a nickel metal having a deposition rate of 193 Å / min at a pressure of 2 mTorr and an electric power of 30 sccm and 300 W DC on a stainless steel mold, / L, 45 g / L of nickel chloride, 30 g / L of boric acid and 2 g / L of saccharin. After that, a current density of 40 mA / cm ² was applied for 5 hours, The steel mold was plated with nickel. A stainless steel mold was separated to obtain a nickel mold having a circular pattern of a concave shape.

Example  3-2

A nickel mold having an intaglio pattern with a diameter of 20 mu m, a pattern interval of 20 mu m and a height of 10 mu m was obtained through the same method as in Example 3-1.

Example  3-3

A nickel mold having an intaglio pattern with a diameter of 20 mu m, a pattern interval of 40 mu m and a height of 10 mu m was obtained in the same manner as in Example 3-1.

Example  4 Fabrication of Water Repellent Fabric Using Nickel Mold with Embossed Pattern

Hot embossing was carried out using the mold produced in Example 3. [ The plate was heated to 150 DEG C and the polyester was preheated to 150 DEG C, and then the mold prepared in Example 3 was pressurized at a pressure of 200 kg for 5 minutes to transfer micro- and nano-sized pattern structures to the fabric (polyester) Fabrics were prepared.

Experimental Example  One SEM  Image analysis

The molds prepared according to Example 1 were analyzed by field emission scanning electron microscopy (FE-SEM) and the results are shown in Fig. (a) and 3 (b) are SEM images of a mold (Example 1-1) in which a convex circular array pattern with a diameter of 150 m and a height of 50 m was formed, SEM image of a mold (Example 1-2) in which a circular array pattern is formed.

Experimental Example 2 Hot embossing process  Comparative analysis of post-war fabric condition

Experimental Example  2-1 Analysis using optical microscope

The state of the polyester fabric before and after the hot embossing process according to Example 2 was analyzed using an optical microscope, and the results are shown in Fig. (a) is a state before the hot embossing step and (b) is a state after the hot embossing step.

Experimental Example  2-2 SEM  Image analysis

The state of the polyester fabric before and after the hot embossing process according to Example 2 was analyzed by a field emission scanning electron microscope (FE-SEM) and the results are shown in Fig. (a) is a state before the hot embossing step and (b) is a state after the hot embossing step.

Experimental Example  2-3 contactless Surface roughness  Measuring equipment (3D- profiler Image analysis

The state of the polyester fabric before and after the hot embossing process according to Example 2 was analyzed by a non-contact type surface roughness measuring equipment (3D-profiler), and the results are shown in FIG.

As a result of the above experiment, it is confirmed that the polyester fabric before the hot embossing process is woven with the warp and weft yarns crossing each other, but the polyester fabric after the hot embossing process has the circular pattern transferred to the warp and weft yarns have. The depth of the pattern was 31 탆. However, the degree of transfer of the pattern can be controlled by changing the temperature and pressure conditions of the hot embossing process.

As a result of the surface roughness measurement, the fabric before the hot embossing step showed a smooth surface, but the fabric after the hot embossing step had a rough uneven surface. Such a rugged structure may result in the water-repellent effect being increased because the water drops on the surface of the fabric can not permeate into the fabric and flow down.

Experimental Example 3 Contact angle  Measure

The contact angle of ultrapure water was measured using a contact angle analyzer to confirm the water repellency of the fabric fabricated according to Example 2. The results are shown in FIG. The contact angles of (a) and (b) before the hot embossing process were measured as 117 ° and 138 °, respectively. The contact angle was increased through the hot embossing process, so that the fabric was subjected to water-repellent processing.

Experimental Example 4  Optical microscope image of nickel mold

An optical microscope image of the nickel mold produced according to Example 3 was analyzed and the results are shown in FIG.

Experimental Example 5 Example  Image analysis of water repellent fabrics made according to

Experimental Example 5 -1 Optical microscope analysis

The state of the polyester fabric after the hot embossing process according to Example 4 was analyzed using an optical microscope and the results are shown in FIG.

Experimental Example 5 -2 SEM  Image analysis

The state of the polyester fabric after the hot embossing process according to Example 4 was analyzed by a field emission scanning electron microscope (FE-SEM) and the results are shown in Fig.

Experimental Example  5-3 contactless type Surface roughness  Measuring equipment (3D- profiler Image analysis

The state of the polyester fabric after the hot embossing process according to Example 4 was analyzed by a non-contact type surface roughness measuring equipment (3D-profiler), and the results are shown in FIG.

In the above experiment, it can be confirmed that a small-sized pattern can be transferred to the fabric by the hot embossing process, and a relief structure protruding outward from the fabric surface through transfer of the engraved pattern can be obtained. As a result of measurement of the surface roughness, the rugged fine irregular shape appeared most prominently on the surface of the fabric transferred with the mold according to Example 3-1. Such a rugged structure may result in the water-repellent effect being increased because the water drops on the surface of the fabric can not permeate into the fabric and flow down. Therefore, when the pattern size is the same, the narrower the pattern interval, the better the water repellent effect.

Hereinafter, specific examples and experimental examples of the present invention have been described. It will be understood by those skilled in the art that the present invention may be embodied in various other forms without departing from the spirit or essential characteristics thereof. Therefore, the disclosed embodiments and experimental examples should be considered from the point of view of explanation. The scope of the present invention being indicated by the appended claims and all such equivalents falling within the scope of the same shall be construed as being included in the present invention.

Claims (18)

Forming a photosensitive layer by applying a photosensitive agent on a metal substrate;
Forming a pattern on the photosensitive layer;
Forming a micro-sized pattern on the metal substrate by first etching in the pattern shape;
And forming a mixed pattern structure in which a micro-sized pattern and a nano-sized pattern are mixed on the metal substrate by performing a second etching on the metal substrate having the micro-sized pattern formed thereon. The method according to claim 1,
Wherein the metal comprises at least one selected from the group consisting of stainless steel, iron, nickel, chromium, tungsten, and cobalt used as a mold material. The method according to claim 1,
Wherein the step of forming a pattern on the photosensitive layer is performed by covering an upper portion of the photosensitive layer with a mask having a pattern and exposing the photosensitive layer with ultraviolet rays. The method according to claim 1,
Wherein the photosensitive layer has a pattern size of 10 to 500 占 퐉. The method according to claim 1,
Wherein the pattern formed on the photosensitive layer includes at least one selected from the group consisting of circular, triangular, square, pentagonal, hexagonal, and grid patterns. The method of claim 3,
Wherein the ultraviolet ray exposure uses an ultraviolet ray exposing device which emits a wavelength of 365 to 436 nm. The method according to claim 6,
Wherein the ultraviolet exposure device uses a mercury (Hg) lamp. The method according to claim 1,
Wherein the first etching is an electrochemical process. 9. The method of claim 8,
Wherein the electrochemical process is performed in an electrolyte solution prepared by mixing sulfuric acid (H ₂ SO ₄ ), phosphoric acid (H ₃ PO ₄ ) and ultrapure water at a current of 0.1 to 50 A for 10 to 90 minutes. Method of manufacturing mold for processing. 10. The method of claim 9,
Wherein the electrolytic solution is prepared by mixing sulfuric acid (H ₂ SO ₄ ), phosphoric acid (H ₃ PO ₄ ), and ultrapure water in a volume ratio of 3: 5: 2. The method according to claim 1,
Further comprising the step of removing the photosensitive layer after the step of forming the micro-sized pattern. 12. The method of claim 11,
Wherein the photosensitive layer is removed using acetone. The method according to claim 1,
Wherein the second etching is a wet process. 14. The method of claim 13,
Wherein the wet process is performed by immersing the substrate in a solution of FeCl ₃ in a temperature range of from room temperature to 80 ° C. A water-repellent mold for a fabric produced by any one of claims 1 to 14. delete A method for water-repellent processing of fabrics, comprising the step of transferring micro-sized and nano-sized mixed pattern structures formed on a fabric for water-repellent processing of a fabric according to claim 15 onto a fabric by a hot embossing process. delete

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