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KR101387312B1 - 프록시미티 노광장치, 프록시미티 노광장치의 기판위치 결정방법, 및 표시용 패널기판의 제조방법 - Google Patents

프록시미티 노광장치, 프록시미티 노광장치의 기판위치 결정방법, 및 표시용 패널기판의 제조방법 Download PDF

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Publication number
KR101387312B1
KR101387312B1 KR1020120095971A KR20120095971A KR101387312B1 KR 101387312 B1 KR101387312 B1 KR 101387312B1 KR 1020120095971 A KR1020120095971 A KR 1020120095971A KR 20120095971 A KR20120095971 A KR 20120095971A KR 101387312 B1 KR101387312 B1 KR 101387312B1
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KR
South Korea
Prior art keywords
stage
substrate
laser
chuck
reflecting means
Prior art date
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KR1020120095971A
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English (en)
Korean (ko)
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KR20130030722A (ko
Inventor
류고 사토
히로시 히카와
사토시 타카하시
Original Assignee
가부시키가이샤 히다치 하이테크놀로지즈
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Publication of KR20130030722A publication Critical patent/KR20130030722A/ko
Application granted granted Critical
Publication of KR101387312B1 publication Critical patent/KR101387312B1/ko

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1326—Liquid crystal optical waveguides or liquid crystal cells specially adapted for gating or modulating between optical waveguides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
KR1020120095971A 2011-09-19 2012-08-30 프록시미티 노광장치, 프록시미티 노광장치의 기판위치 결정방법, 및 표시용 패널기판의 제조방법 KR101387312B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2011-203912 2011-09-19
JP2011203912A JP5687165B2 (ja) 2011-09-19 2011-09-19 プロキシミティ露光装置、プロキシミティ露光装置の基板位置決め方法、及び表示用パネル基板の製造方法

Publications (2)

Publication Number Publication Date
KR20130030722A KR20130030722A (ko) 2013-03-27
KR101387312B1 true KR101387312B1 (ko) 2014-04-18

Family

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Family Applications (1)

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KR1020120095971A KR101387312B1 (ko) 2011-09-19 2012-08-30 프록시미티 노광장치, 프록시미티 노광장치의 기판위치 결정방법, 및 표시용 패널기판의 제조방법

Country Status (4)

Country Link
JP (1) JP5687165B2 (ja)
KR (1) KR101387312B1 (ja)
CN (1) CN103064255A (ja)
TW (1) TW201314379A (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104238272B (zh) * 2013-06-18 2017-02-01 群创光电股份有限公司 曝光系统与曝光方法
CN104991424B (zh) * 2015-07-23 2018-01-12 合肥京东方光电科技有限公司 黑矩阵曝光图案的补正方法和装置以及曝光系统

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2646417B2 (ja) 1992-10-30 1997-08-27 キヤノン株式会社 露光装置
KR20100105425A (ko) * 2009-03-16 2010-09-29 가부시키가이샤 히다치 하이테크놀로지즈 프록시미티 노광 장치, 프록시미티 노광장치의 기판 위치 결정 방법 및 표시용 패널 기판의 제조 방법
JP2010276901A (ja) 2009-05-29 2010-12-09 Hitachi High-Technologies Corp 露光装置、露光装置のチャック位置検出方法、及び表示用パネル基板の製造方法
KR101057765B1 (ko) 2007-07-30 2011-08-19 가부시키가이샤 히다치 하이테크놀로지즈 노광 장치, 노광 방법 및 표시용 패널 기판의 제조 방법

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4522142B2 (ja) * 2004-05-18 2010-08-11 株式会社日立ハイテクノロジーズ 露光装置、露光方法、及び基板製造方法
JP2005340315A (ja) * 2004-05-25 2005-12-08 Nikon Corp 位置合わせ装置、露光装置、位置合わせ方法及び露光方法、並びにデバイス製造方法及び較正用（工具）レチクル
JP2008051988A (ja) * 2006-08-24 2008-03-06 Dainippon Screen Mfg Co Ltd 画像記録装置および画像記録方法
JP4808676B2 (ja) * 2007-05-30 2011-11-02 株式会社日立ハイテクノロジーズ 露光装置、露光方法、及び表示用パネル基板の製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2646417B2 (ja) 1992-10-30 1997-08-27 キヤノン株式会社 露光装置
KR101057765B1 (ko) 2007-07-30 2011-08-19 가부시키가이샤 히다치 하이테크놀로지즈 노광 장치, 노광 방법 및 표시용 패널 기판의 제조 방법
KR20100105425A (ko) * 2009-03-16 2010-09-29 가부시키가이샤 히다치 하이테크놀로지즈 프록시미티 노광 장치, 프록시미티 노광장치의 기판 위치 결정 방법 및 표시용 패널 기판의 제조 방법
JP2010276901A (ja) 2009-05-29 2010-12-09 Hitachi High-Technologies Corp 露光装置、露光装置のチャック位置検出方法、及び表示用パネル基板の製造方法

Also Published As

Publication number Publication date
JP2013065730A (ja) 2013-04-11
KR20130030722A (ko) 2013-03-27
TW201314379A (zh) 2013-04-01
JP5687165B2 (ja) 2015-03-18
CN103064255A (zh) 2013-04-24

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