KR101101742B1 - Method for depositing thin film of razor blade for razor - Google Patents

Abstract

The present invention relates to a method of depositing a thin film having two components simultaneously on a razor blade edge and a razor blade. The present invention is configured such that two components are released at one target. Here, the one target consists of two components, and the two kinds of metal and ceramic targets are joined in one single target form, and the joining form is an insertable or joinable form such as a circle or a polygon. In operation it is configured to emit the same components as the target. The present invention includes the step of alternately moving the razor blade near each target or including depositing in place.

Razor blades, Diamond Like Carbon (DLC), Cr, Physical Vapor Deposition (PVD), rigid thin films.

Description

Thin film deposition method of razor blades {METHOD FOR DEPOSITING THIN FILM OF RAZOR BLADE FOR RAZOR}

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a technique for depositing thin films of razor blades, and more particularly, to a method of thin film deposition of razor blades for increasing the life and quality of razor blades.

In addition, the present invention relates to a hard thin film, and more particularly, to a hard composite thin film having both metallic and ceramic properties for improving durability and hardness at the blade edge and the blade.

The razor blades of wet razors are generally formed using a base material such as stainless steel. In particular, a base material such as stainless steel is subjected to a heat treatment process to increase the hardness of the blade, and then a polishing process is performed to form the blade edge. Then, a process is performed in which various coating materials are deposited on the edges of the final razor blade.

In this case, in order to increase the strength and durability of the blade, a thin film of carbide, nitride, oxide, or the like of metal or ceramic, which is a general hard thin film material, may be used. In addition, after the hard thin film material is coated on the razor blade, organic materials such as PTFE (PolyTetraFluoroEthylene, hereinafter referred to as 'PTFE') are used to reduce the frictional force with the skin during shaving and improve shaving performance. It may also be deposited. However, there is a problem in that the adhesion between the hard thin film materials and the organic material such as PTFE is not good. Therefore, in order to increase the adhesion between the razor blade and the hard thin film and the organic material such as PTFE, a thin metal film such as Cr (Chromium), Ti (Titanium), W (Tungsten), or Nb (Niobium) may be used. It is also deposited between the hard thin film.

The hard thin film generally serves to improve the durability, corrosion resistance and strength of the razor blade, and generally deposits a material on the razor which provides a very good strength such as Cr (Chromium) -Pt (Platinium) alloy. That is, by coating a thin film, such as Cr-Pt, DLC, CrN, TiN, TiAlN on the razor blade edge and the razor blade to improve wear resistance and hardness to improve durability. In more detail, in order to deposit such a material on the razor blade, for example, physical vapor deposition using a target of Cr and Pt is used.

On the other hand, when the hard thin film is deposited on the razor blade edge and the razor blade by physical vapor deposition, a method of rotating the razor blade or the target using two targets and stacking the two materials in a laminated structure is used. In this case, sufficient space inside the deposition chamber (Chamber) is required, making it impossible to use in a narrow space. In this case, the properties of the two targets, i.e., the two materials, are not only difficult to appear at the same time, but also require sufficient time in time. That is, the existing target for depositing such a hard thin film, that is, a deposition method using two targets has a limitation.

It is also very difficult to control the characteristic component ratios of two materials when using a compound, mixture or crystallographically linked target. Accordingly, there is a limit in coating material deposition, that is, hard film deposition, because a case in which components different from the two materials are deposited occurs.

Accordingly, a first object of the present invention is to provide a method for depositing two-component thin films on a razor blade in a single target for increasing the life and improving the quality of the razor blade.

It is a second object of the present invention to provide a method for depositing two components of thin films on a single target when depositing a Cr-DLC hard thin film onto a single target by using physical vapor deposition.

The third object of the present invention is to deposit a Cr-DLC-based hard thin film having the characteristics of two components simultaneously using a physical vapor deposition method on a razor blade, and to deposit the hard thin film on the razor blade. The present invention provides a method for depositing a thin film in which the two components are present by using a single target that does not use a crystallographically coupled target and the Cr and DLC targets, respectively.

In the thin film deposition method according to the present invention, in the method of depositing a thin film on the edge and the blade of the razor blade, the release process in which a single target releases the first component and the second component, and the released first component and agent And depositing two components on the edge of the blade and the blade, wherein the single target includes the first component and the second component, and the first component and the second component are covalent or metal bonds. Or a metal or ceramic target that is not crystallographically bonded, such as ionic bonding, and the deposition process is characterized by depositing a hard film having crystalline or amorphous properties on the blade edge and the blade using physical vapor deposition (PVD).

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As described above, the present invention has the advantage of reducing the time required for depositing a thin film on the razor blade by simultaneously depositing thin films of two components on a single target. In addition, there is an advantage that can be used in a narrow space without rotating the target or the blade. And there is an advantage that the component ratio of the material deposited on the surface area of the two components in the target can be adjusted.

Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings. In the following description of the present invention, a detailed description of known functions and configurations incorporated herein will be omitted when it may make the subject matter of the present invention rather unclear. The present invention will now be described in detail with reference to the accompanying drawings.

In an embodiment of the present invention, a Cr-DLC-based hard thin film, ie, crystalline or amorphous, is coated on the razor blade edge and the razor blade using physical vapor deposition (hereinafter, referred to as 'PVD' method). A method of depositing a Cr-DLC-based hard thin film having a thin film structure having characteristics and having a thickness T of 0 <T ≦ 200 nm will be described.

Prior to describing the present invention, the PVD method includes a DC sputter, a DC magnetron sputter, a DC unbalanced magnetron sputter, and a pulse DC unbalanced magnetron sputter. ), RF Sputter, Arc Ion Plating, Electron-Beam Evaporation, Ion-Beam Deposition, Ion-Beam Assisted Deposition) can be any one of the group of methods.

1 is a conceptual diagram illustrating a sputter target of a sputtering apparatus, which is a kind of physical vapor deposition method used to implement the method according to the present invention.

Referring to FIG. 1, the sputter target 100 is divided into a plurality of regions, and the plurality of regions include two components to be deposited on the razor blade.

The first region of the sputter target 100 includes a first component, for example, a metal-based material (hereinafter referred to as a 'metal material') 102, and the second region includes a second component, for example. Ceramic-based material (hereinafter referred to as "ceramic material") 104 is included. In addition, the metal material 102 improves the strength of the razor blade and improves the adhesion of the organic material to the razor blade and the blade edge. The ceramic material 104 increases durability by increasing corrosion resistance and hardness. For example, the metal material 102 of the first region includes Cr, Ti, W, Nb, and the like, and the ceramic material 104 of the second region includes carbon. The shape of the metal material 102 and the ceramic material 104, which are the respective materials inside the sputter target 100, may be, for example, any one of a polygon such as a circle, a triangle, a rectangle, and the like. Of course.
On the other hand, the shape of the material refers to the shape of the second component target to be inserted or bonded to each area of the sputter target 100, for example, the sputter target 100 of the first component.
In addition, the second component may be included in the first region, and the first component may be included in the second region.

Next, a sputtering apparatus according to the present invention will be described with reference to FIG. 2.

2 is a plan view showing a top view of a sputtering apparatus for performing a hard thin film deposition on the blade and the blade edge using a sputter target according to the present invention.

Referring to FIG. 2, the sputtering apparatus 200 is equipped with a sputter target 208 and a blade 206. The sputtering device 200 is formed in a hexahedral shape, or a cylindrical shape, and of course, can be modified in other forms as necessary. In addition, a vacuum is formed in the sputtering apparatus 200, and an atmosphere by the injection gas 204 and a plasma 202 may be formed. The blade 206 and the sputter target 208 are disposed to face each other, the sputter target 208 is fixed or movable. In addition, the blade 206 is also of course fixed or movable.

First, the sputter target 208 is mounted on the sputtering apparatus 200. The razor blade is mounted to the sputtering apparatus 200 for depositing a thin film by the sputter target 208 on the razor blade 206. When the razor blade 206 is mounted on the sputtering apparatus 200, the sputtering apparatus 200 is in a high vacuum state.

Next, argon (Ar) gas is injected into the sputtering apparatus 200 and DC power is applied. As a result, the Ar gas in the sputtering apparatus 200 is converted into plasma and Ar ions are generated. The generated Ar ions collide with the sputter target 208, and the sputter target 208 collided with the Ar ions is atomized to emit the two components.

At this time, a direct current power of a cathode ('-') is applied to the razor blade 206, and atoms of the released sputter target 208, that is, the two components, are deposited on the razor blade 206.

Meanwhile, an ion gun may be additionally installed in the stuffing device. In addition, the thin film deposition process through the sputter target may be performed using the stuttering apparatus and the arc ion plating method together.

Next, a cross-sectional view of the blade edge will be described with reference to FIG. 3.

Figure 3 is a deposition principle diagram showing the blade edge during the deposition process according to the present invention.

Referring to FIG. 3, the razor blade 300 is formed using a base material such as stainless steel, performs a heat treatment process to increase the hardness of the razor blade 300, and then a grinding process for forming the razor blade edge. Do this.

 According to the deposition principle of the sputtering apparatus shown in FIG. 2, first, an injection gas, for example, an Ar gas, is converted into plasma to become Ar ions. When the Ar ions collide with the sputter target, the target material is atomized (302 ′, 304 ′) by the energy, and the atomized target materials stick to the razor blade 300. The same material as) is deposited on the blade 300 at the same time to be able to deposit a thin film mixed in atomic form.

By the same principle as described above, the thin film may be deposited to have the characteristics of the two targets 302 and 304 by rotating or fixing either the blade 300 or the sputter target. Also, in this case, a thin film having crystalline or amorphous characteristics can be deposited in a small space in a shorter time, and a thin film deposited with a mixture of metallic and ceramic materials having a non-laminated single structure can be formed. .

On the other hand, the ratio of the metal-based material and the ceramic-based material included in the sputter target, that is, the ratio of the metal-based material and the ceramic-based material which is a component of the thin film deposited by adjusting the ratio of the surface area in which the materials are included. Easy to adjust In addition, according to this ratio, the thin film can be obtained with crystalline or amorphous properties. In addition, it is possible to easily control the thickness of the thin film required through the amount of power applied to the sputter target and the deposition time.

1. After the razor blade is mounted on the sputtering device, the chamber is maintained at an initial vacuum of 10 ^-6 torr.

2. An etching process using an Ar plasma is performed to remove the foreign matter and the oxide film of the razor blade.

3. Perform the deposition process using Cr and C targets. To clean the target, presputtering is performed for 5 to 20 seconds in an Ar atmosphere.

4. A voltage of -300V to -600V is applied to the razor blade so that the materials to be deposited off the target adhere to the razor blade.

5. The sputter target is applied with a DC power of about 3 kW to 6 kW. The thickness of the thin film to be deposited is about 100 nm to about 300 nm.

Then, the cutting force of the blade according to the thin film will be described with reference to Table 1 below.

Table 1 compares the razor blades on which Cr-DLC thin films are deposited with the razor blades on which Cr and CrN thin films are deposited.

First, the cutting performance and cutting performance, which are considered to be most important when shaving, were measured using a cutting base metal. Next, the corrosion resistance characteristics were compared, and wear resistance and durability were compared using the cutting base material. As a result of the overall comparison, the use of the razor blade deposited with the Cr-DLC thin film showed superior performance in the durability and corrosion resistance than the razor blade deposited with the conventional Cr and CrN thin films. In addition, it was found that cutting performance and cutting performance were also increased when compared to the blades on which CrN thin films were deposited.

Meanwhile, in order to compare the razor blades on which the Cr-DLC thin film is deposited with the razor blades on which Cr or CrN thin films are deposited, the razor blades are applied to an actual razor cartridge to evaluate the shaving performance without informing the user of the type of the razor blade. . As a result, it was evaluated that the razor blades deposited with the Cr-DLC thin film were superior to the conventional razor blades, ie, the blades with the Cr and CrN thin films deposited, in terms of comfort, adhesion, wound presence, safety, and feeling after shaving.

1 is a conceptual diagram illustrating a sputter target of a sputtering apparatus, which is a kind of physical vapor deposition method used to implement the method according to the present invention.

Figure 2 is a plan view showing a plan view of a sputtering apparatus for performing a hard thin film deposition on the blade and the blade edge using a sputter target according to the present invention.

Figure 3 is a deposition principle diagram showing the blade edge during the deposition process according to the present invention.

Claims (34)

In the method of depositing a thin film on the edge of the razor blade and the razor blade, A release process in which a single target emits a first component and a second component, And depositing the emitted first and second components on the edge and the blade of the blade, The single target includes the first component and the second component, the first component and the second component is a metal or ceramic target that is not crystallographically bonded, such as covalent bonds, metal bonds or ionic bonds, The deposition process is a thin film deposition method of a razor razor blade, characterized in that to deposit a hard thin film of the crystalline or amorphous characteristics by using physical vapor deposition (PVD) on the razor blade edge and the razor blade. The method according to claim 1,  Thin film deposition method of a razor blade characterized in that it further comprises the step of bonding the first component and the second component in the form of a single target. The method according to claim 2, Bonding in the form of one target, the thin film deposition method of the razor blade, characterized in that comprising the step of inserting or bonding in the shape of any one of a circle or polygon. The method according to claim 1,  The metal target is a thin film deposition method of a razor blade, characterized in that any one of Cr, W, Ti, Nb. delete The method according to claim 1, The ceramic target is a thin film deposition method of the razor blade, characterized in that comprises a carbon. The method according to claim 1, The physical vapor deposition method (PVD) is a DC Sputter, DC Magnetron Sputter, DC Unbalanced Magnetron Sputter, Pulse DC Unbalanced Magnetron Sputter, Radio Frequency RF Sputter, Arc Ion Plating, Electron-Beam Evaporation, Ion-Beam Deposition, Ion-Beam Assisted Deposition Thin film deposition method of the razor blade, characterized in that any one of the group. The method according to claim 1, The deposition process, the first component contained in the single target, and the same component as the second component is released to the thin film deposition method of the razor razor blade, characterized in that comprising the step of depositing on the blade edge and the blade. The method according to claim 1, The razor blade and the single target are arranged parallel to each other, the thin film deposition method of the razor razor blade, characterized in that the razor blade is moved or fixed fixed near the single target. The method of claim 7, The deposition process may include controlling a deposition time and a deposition power when depositing a thin film mixed with chromium as a first component and a diamond like carbon (DLC) as a second component in an atomic form; Thin film deposition method of the razor blade comprising the step of depositing on the razor blade. The method according to claim 10, Adjusting the deposition time and the deposition power, thin film deposition method of the razor blade, characterized in that the thickness of the blade edge and the blade thin film is between 1nm to 300nm. delete delete delete delete delete delete delete delete delete delete delete delete delete delete delete delete delete delete delete delete delete delete delete

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