KR101006952B1 - A vacuum effusion cell for forming a thin film - Google Patents

Abstract

The present invention relates to a vacuum evaporation source device for producing a thin film, the quartz tube extending in the longitudinal direction; A first heating source including a graphite crucible surrounding one end of the quartz tube, a heating wire spaced apart from the outside of the graphite crucible, and an outer case supporting the heating wire and the graphite crucible; And a second case surrounding the other end of the quartz tube and spaced apart from the quartz tube, and a heating wire spaced apart from the quartz tube and the second case in a space between the quartz tube and the second case. It provides a vacuum evaporation source device for manufacturing a thin film comprising a second heating source.

Vacuum deposition, graphite crucible, heating wire, quartz tube

Description

Vacuum evaporation source device for thin film manufacturing {A VACUUM EFFUSION CELL FOR FORMING A THIN FILM}

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a vacuum evaporation source apparatus for manufacturing thin films, and more particularly, to an apparatus for forming a thin film made of a desired material on a surface of a substrate such as a wafer, and more particularly, to a target by heating a source material inside a chamber in a vacuum atmosphere. The present invention relates to a vacuum evaporation source device for manufacturing a thin film for spraying a vaporized source material onto a substrate to deposit vaporized source material on a substrate surface.

Vacuum deposition or vacuum evaporation is a relatively low temperature by evaporating the particles by putting the source material to be deposited in a chamber of high vacuum state and heating the source material by using a heating wire existing inside the evaporation source with an external power supply. As a deposition method of forming a thin film by condensing on a surface of a substrate or the like, a number of vacuum deposition apparatuses are currently used in this regard. Such a vacuum deposition apparatus is used to form a thin film made of a specific material on the surface of a wafer in a semiconductor manufacturing process or to form a thin film made of a material to be deposited on a surface of a glass substrate or the like during the manufacturing process of a large flat panel display device.

On the other hand, the vacuum evaporation source device for manufacturing a conventional thin film was configured to include one heating source. A conventional evaporation source device composed of one such evaporation source is suitable for a source material such as a metal, but has a problem in that it is not suitable when a polymer material pyrolyzed at a high temperature of two times or more than the evaporation temperature is used as the source material.

Specifically, since the polymer material is not uniform even in the vaporized state, the quality of the formed thin film is not uniform unless it is thermally decomposed into a monomer form. Therefore, the heating source included in the evaporation source can be sprayed in the monomer state when heated to the pyrolysis temperature, but in this case it is not easy to control the evaporation amount as well as the source material is not evenly sprayed because it is heated to a high temperature.

In addition, when the evaporation rapidly occurs inside of the source material, the source material located in the upper layer is splashed to the outside without being vaporized, causing defects and increasing material consumption.

For this reason, in the case of the polymer material, the chemical vapor deposition method should be used instead of the vacuum vapor deposition method. However, in the case of the chemical vapor deposition method, the amount of source material used is increased, and the uniformity of particles is low.

In addition, in the conventional evaporation source apparatus including one heating source, when the thin film formation is completed and the deposition is stopped, the internal temperature of the vacuum evaporation source does not cool rapidly even if the power supply of the heating source included in the evaporation source device is stopped. Since the source material is evaporated for a certain time even after the power supply is interrupted, there is a problem that unnecessary consumption of the source material occurs, and also affects the thickness of the thin film.

The present invention has been made to overcome the above-described problems, to provide a vacuum evaporation source device for manufacturing a thin film that can form a thin film by a vacuum deposition method for a polymer material or the like, which is not suitable as a source material in the conventional evaporation source device, etc. For the purpose of

In addition, another object of the present invention is to provide a vacuum evaporation source device for manufacturing a thin film that can control the source material injection quickly and accurately when the thin film forming process is completed.

In order to achieve the above object, according to an aspect of the present invention, a quartz tube extending in the longitudinal direction, a graphite crucible surrounding one end of the quartz tube; A first heating source including a heating wire spaced apart from the graphite crucible and an outer case supporting the heating wire and the graphite crucible; And a second case spaced apart from the one end of the quartz tube and surrounding the other end of the quartz tube and spaced apart from the quartz tube, and in the space between the quartz tube and the second case. It is possible to provide a vacuum evaporation source device for manufacturing a thin film including a second heating source including a heating wire spaced apart from two cases. Here, the first heating source is heated to the vaporization temperature of the source material stored in the quartz tube, the source material comprises a polymer material, the second heating source is a source evaporated by the first heating source Heated to the pyrolysis temperature of the material.

Here, the second heating source may be configured to further include a graphite crucible surrounding the outside of the quartz tube between the quartz tube and the heating wire.

In addition, the outer case may be configured to be provided with a heat radiation reflector for reflecting the heat radiation from the heat radiation to the graphite crucible side.

The second casing may be configured to include a heat radiation reflector for reflecting heat radiation from the heat ray to the graphite crucible.

According to the present invention, in the case of a source material used for manufacturing a thin film is a material having a very large difference in evaporation temperature and pyrolysis temperature, such as a polymer material, by heating at a different heating temperature by a dual heating source, the existing evaporation source device The present invention can provide a vacuum evaporation source device for manufacturing a thin film that can be applied to a polymer material which is not suitable as a source material.

Further, according to the present invention, the heating source of the vacuum evaporation source device for thin film production is constituted by two, and the heating temperature of each of these heating sources is different, whereby the external supply power to be transmitted to the vacuum evaporation source device for thin film production is cut off. 1 The internal temperature of the heating source is gradually cooled so that even if the source material moves to the second evaporation source, it does not evaporate from the second heating source with a higher heating temperature, thereby reducing the consumption of unnecessary source material compared to the conventional evaporation source device, thereby making it more efficient. A vacuum evaporation source device for manufacturing a thin film can be provided.

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.

1 is a view for schematically explaining the process of using the vacuum evaporation source device 10 for manufacturing a thin film according to an embodiment of the present invention.

Referring to FIG. 1, a vacuum evaporation source device 10 for manufacturing a thin film of the present invention is used to form a thin film on a substrate 25 in a vacuum chamber 26. The vacuum evaporation source device 10 for thin film production is inserted into the vacuum chamber 26 through an opening existing on one surface of the vacuum chamber 26 as shown in FIG. Here, the vacuum chamber 26 in the present invention means all the devices to keep the interior in a vacuum state, it will be obvious that not limited to the structure as shown in FIG. On the other hand, the substrate 25 is located near the inlet of the vacuum chamber 26 to the center portion when the reference to the longitudinal direction of the interior of the vacuum chamber 26 as a reference. As shown in FIG. 1, the vacuum evaporation source device 10 for manufacturing a thin film forms a uniform thin film on the substrate 25 by spraying a source material in the vacuum chamber 26.

FIG. 2 is a view for explaining the vacuum evaporation source device for manufacturing the thin film of FIG. 1 and the configuration added to the present device.

Figure 2 shows the vacuum evaporation source device 10 for producing a thin film of the present invention and the configuration added to operate the same. First, the vacuum evaporation source device 10 for thin film production will be described in detail with reference to FIGS. 3 to 4, and the configuration added to the vacuum evaporation source device 10 for thin film production will be described in FIG. 2.

Since the vacuum evaporation source device 10 for manufacturing a thin film has a process of heating a source material to a high temperature, it is configured to receive power from the outside. Thus, there is an internal power supply port 21 for supplying power therein. The internal power supply port 21 serves to supply power to the heating wire to be described with reference to FIGS. 3 to 4. Meanwhile, the power line electrode 22 is connected to the internal power supply port 21, and the inner support 23 for supporting the vacuum evaporation source device 10 for manufacturing the thin film and the thermocouple fixing tube 24 for temperature sensing are the present invention thin film. It is added to the vacuum evaporation source apparatus 10 for manufacture.

3 is a view for explaining in detail the vacuum evaporation source device for producing a thin film of FIG.

Referring to FIG. 3, the vacuum evaporation source device 10 for manufacturing a thin film includes a quartz tube 13 extending in a longitudinal direction and a first heating source 11 and a second heating source 12 disposed near both ends of the quartz tube, respectively. )

The quartz tube 11 is a circular tube made of quartz, and may be manufactured in the form of a square pillar and other polygonal pillars. However, the quartz tube 11 is most preferably made of a circular tube to uniformly heat the source material therein. Do. The quartz tube 11 passes through the source material and the inside stored in the crucible so as to transmit heat radiation generated by the heating means when the first heating source 11 is operated in the vacuum evaporation source device 10 for manufacturing a thin film. It serves to transfer heat to the material.

The first heating source 11 is composed of a graphite crucible 14, a heating wire 15, an outer case 16, a heat radiation reflecting plate 18, a support plate 19, and a heating wire fixing screw 20. The graphite crucible 14 is configured to surround the quartz tube, and serves to contain the source material therein and to absorb the heat radiation emitted from the heat ray 15 first and then re-emit it so that the heat radiation wave is uniformly emitted. . The heating wire 15 receives power from an external power supply device connected to the vacuum evaporation source device 10 for manufacturing a thin film to generate heat to heat the source material, and the heating wire 15 is outside the graphite crucible 14. Since it is spaced apart from the heat generated by the heat wire 15 is transferred to the graphite crucible 14 in the form of radiant heat rather than conduction. The outer case 16 serves to protect the hot wire 15 and the graphite crucible 14 from external forces and to support each of them. Since the heat radiation line reflecting plate 18 generates heat radiation lines in all directions, the heat radiation line reflector 18 reflects heat transferred in the opposite direction of the graphite crucible 14 to maximize the heat transferred to the graphite crucible 14. It serves, and the heat radiation reflector 18 may be configured to be attached to the inside of the outer case 16. The support plate 19 serves to support the first heating source 11, and the heating wire fixing screw 20 serves to fix the heating wire to maintain a fixed state.

The second heating source 12 has the same shape as the first heating source 11 and has a structure surrounding the other end of the quartz tube 13, and the second case 17 spaced apart from the quartz tube 13. ) And a heating wire 15 spaced apart from the quartz tube 13 and the second case 17 in the space between the quartz tube 13 and the second case 17. Each configuration of the second heating source 12 overlaps with the description of the first heating source 12 described above, and thus a detailed description thereof will be omitted.

As shown in FIG. 3, the vacuum evaporation source device 10 for manufacturing a thin film is composed of a first heating source 11 and a second heating source 12, and the first heating source 11 includes a vaporization temperature of a source material, For example, it is heated to about 100 degrees Celsius, and the second heating source 12 is heated to a temperature at which the evaporated source material is pyrolyzed, for example, 700 to 800 degrees Celsius. As a result, in the first heating source, the source material is evaporated to move the vaporized source material through the quartz tube, and the source material vaporized by the second heating source may be pyrolyzed, so that the source material such as the polymer material may be vacuumed. It is possible to form a thin film by a deposition method.

In addition, when the thin film is formed to a desired thickness and stops the operation of the vacuum evaporation source, when the power supply to the two heating sources is cut off, the evaporated material remains inside the quartz tube even though residual heat remains in the first heating source 11. It remains and is not emitted outside the quartz tube. Therefore, the discharge of the evaporation material can be stopped immediately when the power is turned off, so that the spray control of the evaporation material can be controlled quickly and accurately, and the part of the vaporized source material remaining inside the quartz tube is cooled, and some of it is brought back into the crucible. By returning, it is possible to reduce unnecessary consumption of the source material.

4 is a view for explaining the overall configuration of the vacuum evaporation source device for producing a thin film according to another embodiment of the present invention.

The vacuum evaporation source device for manufacturing a thin film shown in FIG. 4 has the same basic configuration as the vacuum evaporation source device for manufacturing a thin film described with reference to FIG. 3. However, in the vacuum evaporation source device for manufacturing a thin film of FIG. 4, there may be a difference in that the graphite crucible 14 surrounding the quartz tube 13 in the second heating source 12 is included in the same manner as the first heating source 11. Only, as described above, the graphite crucible 14 serves to uniformly emit the heat radiation wave when heated by the radiation wave from the heating wire 15. Since other configurations have been described in detail with reference to FIG. 3, they will be omitted.

Although the preferred embodiments of the present invention have been described above with reference to the accompanying drawings, the present invention is not limited to the above embodiments. It will be apparent to those skilled in the art that variations, modifications, and improvements can be made.

1 is a view for schematically explaining a process of using a vacuum evaporation source device for manufacturing a thin film according to an embodiment of the present invention.

FIG. 2 is a view for explaining a vacuum evaporation source device for manufacturing a thin film of FIG. 1 and a configuration added to the present device; FIG.

3 is a view for explaining in detail the vacuum evaporation source device for producing a thin film of FIG.

4 is a view for explaining the overall configuration of the vacuum evaporation source device for producing a thin film according to another embodiment of the present invention.

<Explanation of symbols for the main parts of the drawings>

10: vacuum evaporation source device for thin film production

11: first heating source

12: second heating source

13: quartz tube

14: graphite crucible

15: heating wire

16: outer case

17: second case

18: heat radiation reflector

19: support plate

20: heating wire fixing screw

21: internal power supply port

22: power line electrode

23: internal support

24: thermocouple fixing tube for temperature detection

25: substrate

26 chamber

Claims (4)

A quartz tube extending in the longitudinal direction; A first heating source including a graphite crucible surrounding one end of the quartz tube, a heating wire spaced apart from the outside of the graphite crucible, and an outer case supporting the heating wire and the graphite crucible; And A second case spaced apart from the one end of the quartz tube and surrounding the other end of the quartz tube and spaced apart from the quartz tube, and the quartz tube and the second case in a space between the quartz tube and the second case; A second heating source comprising a heating wire spaced from the case Including, The first heating source is heated to the vaporization temperature of the source material stored in the quartz tube, the source material comprises a polymer material, And the second heating source is heated to the pyrolysis temperature of the source material evaporated by the first heating source. The method of claim 1, And the second heating source further comprises a graphite crucible surrounding the outside of the quartz tube between the quartz tube and the heating wire. The method of claim 1, And a heat radiation reflector for reflecting heat radiation from the heat ray to the graphite crucible to the outer case. The method of claim 1, And a second heat radiation reflector for reflecting heat radiation from the heat ray to the graphite crucible.

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