KR100987323B1 - Cleaner for wafer container - Google Patents

Abstract

PURPOSE: A device for cleaning a wafer container is provided to reduce the cleaning time of the wafer container by quickly cleaning the wafer container. CONSTITUTION: A plurality of container holders are installed in a rotor(22) to support a container body(1). A cleaning solution spraying nozzle(26) sprays the cleaning solutions to the container body supported by the container holder. A support tray rotates an opening unit of the container body in a direction away from the rotor. A locking unit locks the support tray to fix the container body.

Description

Wafer Storage Container Cleaner {CLEANER FOR WAFER CONTAINER}

The present invention relates to a wafer storage container cleaning apparatus, and more particularly, to a wafer storage container cleaning apparatus capable of cleaning the wafer storage container more quickly, conveniently and efficiently.

Since a wafer for manufacturing a semiconductor device is a high-precision article, care must be taken not to be contaminated or damaged from external contaminants and impacts during storage or transportation.

Therefore, when storing and transporting the wafer, it is common to store the wafer in a separate storage container (FOUP: Front Opening Unified Pod).

A storage container (hereinafter referred to as "wafer storage container") for storing and transporting a wafer is composed of a container body 1 and a container cover 3, as shown in FIG.

The container body 1 is provided with the storage chamber 1a, and many wafers W are accommodated at intervals in this storage chamber 1a.

The container cover 3 covers and seals the opening part 1b of the storage chamber 1a. Therefore, the foreign matter flowing into the storage chamber 1a is blocked. This protects the wafers W accommodated in the storage chamber 1a.

On the other hand, since such a wafer storage container stores wafers of high precision, it is necessary to maintain high cleanliness.

In order to maintain the wafer container with high cleanliness, the wafer container must be periodically cleaned. The cleaning of such a wafer storage container is performed through a separate cleaning device.

As an example of a wafer storage container cleaning apparatus, there is US Patent No. 6,797,076. This technique uses a cleaning liquid in an enclosure, a rotor rotatably installed inside the enclosure, a plurality of container holders arranged around the rotor to support the wafer storage container, and a wafer storage container supported by the container holder. And a spray nozzle for spraying.

This cleaning apparatus supports the wafer storage container that needs cleaning by the container holder, and then turns the apparatus ON. Then, the cleaning liquid is injected from the spray nozzle to clean the inner and outer surfaces of the wafer storage container.

At this time, the rotor supporting the wafer storage container is rotated. When the rotor rotates in this way, the cleaning liquid of the spray nozzle is evenly sprayed on the inner and outer surfaces of the wafer storage container which rotates together with the rotor. Therefore, the cleaning efficiency of a wafer storage container becomes high.

However, such a conventional cleaning apparatus has a disadvantage in that it is very inconvenient to support the wafer storage container in the container holder. Due to this disadvantage, the cleaning time of the wafer storage container is delayed, whereby the cleaning efficiency of the wafer storage container is remarkably increased. The problem of falling is pointed out.

That is, in the conventional cleaning apparatus, in order to support the wafer storage container to the container holder, the upper part of the wafer storage container should be supported by hanging on the upper hook and then the lower part of the wafer storage container should be supported on the lower hook by hand. There is a hassle.

In addition, there is a disadvantage that it takes a lot of time to support the wafer storage container because of this hassle, there is a problem that the cleaning time of the wafer storage container is delayed due to this disadvantage. In particular, since the cleaning time of the wafer storage container is delayed, it is pointed out that the cleaning efficiency of the wafer storage container is significantly reduced.

In addition, the conventional cleaning apparatus has a disadvantage in that the container cover must be separately cleaned because the container body of the wafer storage container can be cleaned, and the cleaning time of the wafer storage container is further delayed due to this disadvantage. .

In particular, since the cleaning time of the wafer storage container is further delayed, it is pointed out that the cleaning efficiency of the wafer storage container is further lowered.

In addition, the conventional cleaning apparatus has a disadvantage in that the external cleaning and the internal cleaning of the container body can not be performed at the same time, and because of this disadvantage, there is a problem that the internal cleaning must be performed separately after the external cleaning of the container body. As a result, there is a problem that the cleaning time of the wafer storage container is further delayed.

The present invention has been made to solve the conventional problems as described above, the object of the wafer is to configure the wafer storage container to be more convenient and faster, so that the wafer can be more convenient and faster cleaning wafer storage container To provide a storage container cleaning apparatus.

Another object of the present invention is to configure the wafer storage container so that it can be cleaned conveniently and quickly, thereby reducing the cleaning time of the wafer storage container, and thereby, the wafer storage that can greatly improve the cleaning efficiency of the wafer storage container. It is to provide a container cleaning apparatus.

Still another object of the present invention is to provide a wafer container cleaning device capable of simultaneously cleaning a container cover of a wafer container.

Still another object of the present invention is to provide a wafer storage container cleaning apparatus which can further improve the cleaning efficiency of the wafer storage container by being configured to simultaneously wash the container cover of the wafer storage container.

Still another object of the present invention is to provide a wafer storage container cleaning apparatus capable of simultaneously performing external and internal cleaning of the container body.

Wafer storage container cleaning apparatus of the present invention for achieving this object includes a container body cleaning unit for cleaning the container body of the wafer storage container, the container body cleaning unit, a rotatable rotor and the container body A wafer storage container cleaning apparatus comprising: a plurality of container holders installed in the rotor so as to be supported, and a cleaning liquid injection nozzle for injecting a cleaning liquid into the container body supported by the container holder, wherein the container holder is the container. A support tray installed on the rotor so as to support the main body and supporting the main body, the support tray being rotatably installed to rotate the open opening of the container body toward a cleaning position in the outward direction of the rotor from a lower ready position; And locking means for locking the support tray so as to fix the container body rotated toward the outer direction of the rotor.

Preferably, the cleaning liquid injection nozzle is installed in the support tray to spray the cleaning liquid into the container body; It characterized in that it comprises an air injection nozzle installed in the support tray to inject air into the container body.

According to the wafer storage container cleaning apparatus according to the present invention, since the container body is supported by simply supporting the container body on the container holder and then rotating the container holder, it is very easy and fast to support the container body. Therefore, the wafer storage container can be cleaned more conveniently and quickly.

In addition, since the wafer storage container can be cleaned conveniently and quickly, the cleaning time of the wafer storage container can be shortened, whereby the cleaning efficiency of the wafer storage container can be greatly improved.

In addition, the container cover of the wafer storage container can also be cleaned at the same time, there is an effect that does not need to separately clean the container cover.

In addition, since the container cover does not need to be cleaned separately, there is an effect of further improving the cleaning efficiency of the wafer storage container.

In addition, the external and internal cleaning of the container body can be performed at the same time. Therefore, there is an effect that the wafer storage container can be cleaned in a faster time.

1 is a perspective view showing the configuration of a wafer storage container;
Figure 2 is a perspective view showing the appearance of the wafer storage container cleaning apparatus according to the present invention,
3 is a plan sectional view showing a wafer storage container cleaning apparatus according to the present invention;
Figure 4 is a front sectional view showing a wafer storage container cleaning apparatus according to the present invention,
5 is a perspective view showing in detail the rotor, the container holder and the cover holder constituting the wafer storage container cleaning apparatus of the present invention;
6 is an enlarged perspective view showing a container holder constituting the cleaning device of the present invention;
FIG. 7 is a side cross-sectional view of FIG. 6, illustrating a state before the container body of the wafer storage container is supported by the container holder;
8 is a view showing a state in which a container body of a wafer storage container is supported by a container holder;
9 is a view showing a state in which a container holder supported by the container body rotated upwards;
10 is a cross-sectional view showing a locking means for locking the container holder;
11 is an enlarged front view of a cover holder constituting the cleaning device of the present invention;
12 is a side cross-sectional view of FIG.
13 is a cross-sectional view showing a lamp unit and a dry gas injection unit constituting the cleaning device of the present invention;
14 is a plan sectional view of FIG.

Hereinafter, a preferred embodiment of the wafer storage container cleaning apparatus according to the present invention will be described in detail with reference to the accompanying drawings.

First, before looking at the features of the wafer storage container cleaning apparatus according to the present invention, a brief description of the configuration of the wafer storage container cleaning apparatus with reference to FIGS.

As shown in FIG. 2, the wafer storage container cleaning apparatus includes a case 10, and a controller 12 is installed at one side of the case 10.

The controller 12 is for controlling the apparatus, and is provided with a control board (not shown), a plurality of operation buttons 12a, and a monitor 12b.

And the case 10 is equipped with the container main body cleaning chamber 14, as shown in FIGS.

The container body cleaning chamber 14 is opened and closed by a door 14a, and a container body cleaning unit 20 is installed therein.

The container body cleaning unit 20 includes a rotor 22. The rotor 22 is rotatably installed about a vertical axis, and a plurality of container holders 24 that can support the container body 1 of the wafer storage container are installed around the rotor 22.

The container body cleaning unit 20 includes a plurality of cleaning liquid injection nozzles 26 and a plurality of lamp units 28.

The cleaning liquid jet nozzle 26 is arranged close to the container holder 24. The cleaning liquid jet nozzle 26 thus arranged is the container body 1 of the wafer storage container supported by the container holder 24 (hereinafter, " The cleaning liquid is injected into the container body ". Thus, the container body 1 is cleaned.

The lamp unit 28 is provided around the periphery of the rotor 22. In particular, it is provided at the four corners of the cleaning chamber 14, irradiating the inside of the cleaning chamber 14 with infrared rays. Therefore, when drying the container body 1, the temperature of the cleaning chamber 14 is raised, and the injection temperature of the gas for drying the container body 1 is raised. This increases the drying efficiency of the container body 1.

The detailed configuration of the lamp unit 28 is the same as the lamp unit 60 provided in the container cover cleaning chamber 16. Therefore, a detailed configuration thereof will be described through the lamp unit 60 of the container cover cleaning chamber 16 to be described later.

Next, the features of the wafer storage container cleaning apparatus according to the present invention will be described in detail with reference to FIGS. 2 to 12.

6 to 9, the cleaning apparatus of the present invention includes a container holder 24, and the container holder 24 is provided on both sides of the rotor 22, as shown in FIG. 6. A support arm 29 is provided.

Both support arms 29 are provided at intervals, and a support tray 30 is rotatably provided therebetween.

The support tray 30 is for supporting and supporting the container body 1, and the bottom surface portion 30a is open, and as long as the container body 1 can be supported on the open bottom surface portion 30a. A pair of lower support bars 32 are provided.

And the support tray 30 is provided with both side plates 34. Both side plates 34 are configured to support both sides of the container body 1.

On the other hand, both side plates 34 are rotatably installed on the support arms 29, respectively. The side plates 34 installed as described above rotatably support the support tray 30.

In particular, as shown in Figs. 8 and 9, from the "preparation position" A of the substantially flat state where the open bottom surface portion 30a faces downward, the open bottom surface portion 30a is formed from the rotor 22. It is rotatably supported in the "cleaning position" B in an approximately vertical state facing outward.

Therefore, the container body 1 supported in an upright state on the support tray 30 can be vertically erected toward the outer direction of the rotor 22. As a result, the inside of the container body 1 can be directed toward the outside of the rotor 22.

Thus, the reason for the interior of the container body 1 to face the outer direction of the rotor 22 is to increase the cleaning and drying efficiency of the container body (1).

In particular, the centrifugal force generated during the rotation of the rotor 22 is to act on the cleaning liquid injected into the interior of the container body 1, whereby the cleaning liquid injected into the interior of the container body 1 is discharged efficiently To be possible.

On the other hand, the support tray 30 rotated to the "preparation position" (A), preferably forms an angle in the range of -10 ° to 0 ° with respect to the ground. Therefore, it is preferable to support the container body 1 at -10 ° to 0 ° with respect to the ground in the "preparation position" (A).

More preferably, it is preferably configured to be -10 degrees to the ground. Therefore, it is good to make the container main body 1 incline downward. This is to allow the water remaining inside the container body 1 to be naturally drained after cleaning.

The support tray 30 rotated to the "cleaning position" B is preferably rotated at an angle of 90 degrees or less with respect to the "preparation position" (A). Therefore, it is preferable to support the container body 1 at an angle within 90 degrees with respect to the ground in the "cleaning position" (B).

More preferably, the support tray 30 rotated to the "cleaning position" (B) is preferably rotated at an angle of 80 degrees with respect to the ground. Accordingly, as shown in FIG. 9, in the "cleaning position" (B), the container body 1 is supported at an angle of 80 ° with respect to the ground, whereby the container body 1 is inclined downward. good.

The reason for this configuration is to allow the water inside the container body 1 to be naturally drained during washing or drying.

And when the container body 1 is supported by the support tray 30, the center of gravity is preferably configured to be aligned with the center of rotation shaft 31 of the support tray (30).

This is because the support tray 30 can be smoothly rotated only when the center of gravity of the container body 1 coincides with the rotation center axis 31 of the support tray 30.

6 to 9 again, either of the support arms 29 is provided with locking means 36 for fixing the support tray 30 rotated to the "cleaning position" (B). .

As shown in FIG. 10, the locking means 36 includes a locking hole 36a formed in the side plate 34 of the support tray 30, and a support arm to be locked by being fitted into the locking hole 36a. Locking pin (36b) is provided in (29), and Index Plungers (38) that can be coupled to or separated from the locking pin (36b) according to the user's operation.

The locking pin 36b is fitted into the locking hole 36a of the support tray 30 rotated to the "cleaning position" (B). Therefore, the support tray 30 rotated to the "cleaning position" B is locked. Thereby, as shown in FIG. 9, the support tray 30 rotated to the "cleaning position" B is fixed. As a result, the container body 1 supported by the support tray 30 can be kept in a substantially vertical state while facing outward.

The index plunger 38, as in FIG. 10, is a lever type, and usually presses the locking pin 36b in a direction in which the locking pin 36b is fitted into the locking hole 36a. Therefore, when the support tray 30 rotates to the "cleaning position" (B), the locking pin 36b is automatically inserted into the locking hole 36a of the support tray 30 to be locked.

On the contrary, when the user rotates the operation lever 38a on one side, the locking pin 36b is moved in the direction away from the locking hole 36a. Therefore, the locking pin 36b locked in the locking hole 36a can be released.

As a result, the user can release the support tray 30 locked in the "cleaning position" (B). This makes it possible to return the support tray 30 of the "cleaning position" B to the "preparation position" A. FIG. Since the index plunger 38 is a known technique, a description thereof will be omitted.

6 to 9, the rear support bar 39 is provided in the support tray 30.

The rear support bar 39 is installed to cross the rear sides of the side plates 34 and is configured to support the rear side of the container body 1 supported by the lower support bar 32. Therefore, as shown in Figure 9, when the support tray 30 is rotated to the "cleaning position" (B), it is configured to support the lower portion of the container body (1) standing vertically. This allows the container body 1 standing upright to maintain a stable state.

In addition, the support tray 30 includes a plurality of front pads 40 for supporting the front portion of the container body 1 and a plurality of side pads 42 for supporting both side portions of the container body 1. ) Is installed.

The front pad 40 is fixed to the support bracket 34a extending from the side plate 34 and is configured to directly support the front portion of the container body 1.

The side pads 42 are fixed to the side plates 34 and are configured to directly support both side portions of the container body 1.

These front and side pads (40, 42), by directly supporting the front and both side portions of the container body 1, to prevent the flow of the container body (1). In particular, when the support tray 30 is rotated to the "cleaning position" (B), it supports the peripheral portion of the container body (1) standing vertically. Therefore, the container body 1 standing upright can maintain a stable posture.

6 to 9, the support tray 30 includes a cleaning liquid spray nozzle 44 capable of spraying the cleaning liquid into the container body 1, and a filter 1c of the container body 1. It is further provided with an air injection nozzle 46 capable of injecting air to the portion.

The cleaning liquid jet nozzle 44 is a hemispherical nozzle provided in the open bottom surface portion 30a of the support tray 30 and has a plurality of nozzle holes 45.

The cleaning liquid jet nozzle 44 thus installed is accommodated inside the container body 1 when the container body 1 is supported on the support tray 30 by falling. Therefore, the cleaning liquid supplied from the fluid pump 45a is sprayed on the inner surface part of the container body 1. As a result, the inner surface of the container body 1 is cleaned efficiently.

On the other hand, a bracket 44a for attaching the cleaning liquid jet nozzle 44 is assembled to the open bottom surface portion 30a of the support tray 30.

The nozzle holes 45 of the cleaning liquid jet nozzle 44 are radially formed toward the inside of the container body 1. Therefore, the cleaning liquid is uniformly sprayed into the container body 1.

And the cleaning liquid injection nozzle 44 can also inject an inert gas as needed. To this end, the cleaning liquid injection nozzle 44 is connected to an inert gas supply means 45b, for example, an inert gas supply tank.

Thus, the cleaning liquid injection nozzle 44 which can also inject the inert gas injects the inert gas when the container body 1 is dried. Therefore, the drying efficiency of the container main body 1 is improved.

On the other hand, the inert gas is preferably heated to a predetermined temperature by a separate heater (not shown). This is to increase the temperature of the inert gas, which is to dry the fine moisture present in the internal flow path of the cleaning liquid injection nozzle 44.

The air jet nozzle 46 is provided in the bottom surface portion 30a of the support tray 30. In particular, it is fixedly installed on the lower support bar 32 of the open bottom surface portion (30a).

The air jet nozzle 46 provided in this way is accommodated inside the container body 1 when the container body 1 is supported on the support tray 30 by falling.

In particular, the air injection nozzles 46 installed in the container body 1 toward the outside direction correspond to the filter (not shown) portion of the container body 1. Therefore, the air supplied from the air pump (not shown) is injected into the filter portion of the container body 1. Thereby, the filter of the container main body 1 is dried efficiently.

3 to 5 and FIGS. 11 and 12, the cleaning apparatus of the present invention further includes a container cover cleaning chamber 16 formed inside the case 10.

The container cover cleaning chamber 16 is opened and closed by a door 16a, and a container cover cleaning unit 50 is installed therein.

The container cover cleaning unit 50 includes a rotor 52. The rotor 52 is rotatably installed about a vertical axis, and one side thereof has a plurality of stages capable of supporting the container cover 3 (hereinafter, abbreviated as "container cover") of the wafer storage container in multiple stages. Cover holders 54 are provided in multiple stages.

The cover holders 54 are constituted by a pair of support rails 56, as shown in Figs. 11 and 12, and these support rails 56 support both sides of the container cover 3 to support them. So that they are installed facing each other at intervals.

Here, the cover holders 54 are configured in the same number as the container holders 24. In particular, it is configured to correspond 1: 1 with the container holder (24). The reason for this configuration is that the paired container body 1 and the container cover 3 can be always cleaned together.

The container holder 24 and the cover holder 54 corresponding to 1: 1 correspond to whether the container body 1 and the container cover 3 which are paired are supported or drawn out as shown in FIG. 4. Detecting sensors 59a and 59b are installed.

The detection sensors 59a and 59b detect whether the paired container body 1 and the container cover 3 are supported or withdrawn, thereby simultaneously cleaning the paired container body 1 and the container cover 3. And whether it is dried or withdrawn from the container body cleaning chamber 14 and the container cover cleaning chamber 16 at the same time. Thus, the container body 1 and the container cover 3 to be paired can be simultaneously cleaned.

On the other hand, the controller 12 processes the signal input from the detection sensors (59a, 59b), if it is determined that the paired container body 1 and the container cover (3) is supported at the same time or not drawn out at the same time And output a warning signal.

3 to 5 and FIGS. 11 and 12, the rotor 52 is provided with a plurality of cleaning liquid jet nozzles 58.

The cleaning liquid injection nozzle 58 is provided between the cover holders 54 to inject the cleaning liquid onto the surface of the container cover 3 supported by the cover holder 54. Therefore, the surface of the container cover 3 is cleaned efficiently.

The rotor 52 is provided with support brackets 58a for supporting the cleaning liquid jet nozzles 58, and the cleaning liquid jet nozzles 58 are provided on the upper and lower surfaces of the supporting brackets 58a.

3 to 5 and FIGS. 13 and 14, the lamp unit 60 is installed around the periphery of the rotor 52.

As shown in FIGS. 13 and 14, the lamp unit 60 is installed around the lamp support 62, the lamp 64 installed perpendicular to the lamp support 62, and the outer circumferential surface of the lamp 64. It comprises a transparent tube 65, and a lamp cover 66 to cover and protect the entire transparent tube (65).

The lamp 64 is constituted by a near infrared lamp, and both ends thereof are supported by the lamp support 62. The lamp 64 thus supported is irradiated with infrared rays to the inside of the container cover cleaning chamber 16 while being operated by the applied electricity. Therefore, when drying the container cover 3, the temperature of the cleaning chamber 16 is raised, and the injection temperature of the gas for drying the container cover 3 is raised (to be described later). As a result, the drying efficiency of the container cover 3 is increased.

The transparent tube 65 is provided at intervals around the outer circumferential surface of the lamp 64. The transparent tube 65 provided in this way protects the lamp 64. In particular, the cleaning liquid scattered during cleaning is blocked. Thus, damage to the lamp 64 by the cleaning liquid is reduced and the service life is extended.

Meanwhile, as shown in FIG. 14, the lamp support 62 of the lamp unit 60 is fixed to the case 10 by the bolt 62a, and the lamp support 62 fixed in this way is the case 10. It is configured to be separated from the outside of the.

Therefore, when the lamp unit 60 is broken and damaged, the lamp support 62 is detached from the outside of the case 10, and then the lamp 64 installed inside the lamp support 62 and various electric devices are repaired. And replaceable. As a result, repair and replacement of the lamp unit 60 are very easy.

Referring again to FIGS. 13 and 14, the cleaning apparatus of the present invention includes a dry gas injection unit 70 for injecting a dry gas, for example, an inert gas, into the container cover cleaning chamber 16. .

The dry gas injection unit 70 transfers a dry gas supply source 72 for supplying dry gas, for example, an air pump, and dry gas from the dry gas supply source 72 to the inside of the container cover cleaning chamber 16. And a spray nozzle 76 for spraying the dry gas transferred to the transfer line 74 into the cleaning chamber 16.

The injection nozzle 76 includes a plurality of injection holes 76a and is installed in the lamp support 62 of the lamp unit 60. In particular, it is provided along the rear part of the transparent tube 65, and the injection nozzle 76 provided in this way injects dry gas into the inside of the container cover cleaning chamber 16. As shown in FIG.

On the other hand, the dry gas injection unit 70 further includes a heating means 80 for heating the dry gas injected from the injection nozzle 76.

The heating means 80 includes introduction holes 82 for introducing dry gas discharged from the injection nozzle 76 between the lamp 64 and the transparent tube 65 of the lamp unit 60, the lamp 64, and the lamp 64. And discharge holes 84 for discharging the dry gas introduced between the transparent tubes 65 into the inside of the container cover cleaning chamber 16.

The introduction holes 82 are formed in the transparent tube 65 so as to correspond to the injection holes 76a of the injection nozzle 76, and the plurality of introduction holes 82 thus formed are discharged from the injection nozzle 76. Dry gas is introduced between the lamp 64 and the transparent tube 65. Thus, the introduced dry gas can be heated to a high temperature by the lamp 64.

The discharge holes 84 are formed in the transparent tube 65 and discharge the high temperature dry gas heated by the lamp 64 into the cleaning chamber 16. Therefore, the high temperature dry gas discharged to the cleaning chamber 16 can raise the inside of the cleaning chamber 16 efficiently. As a result, the drying efficiency of the container cover 3 is raised.

Here, the discharge holes 84 are formed in two rows along the longitudinal direction of the transparent tube 65. The circumferential discharge holes 84 formed in two rows are formed in a range of about 60 to 120 degrees with respect to each other.

On the other hand, the dry gas heated by the lamp 64 also serves to take heat from the lamp 64. Thus, the lamp 64 may be cooled. This also serves to prevent failure of the lamp 64 and extend its life.

In addition, the dry gas discharged from the discharge hole 84 of the transparent tube 65 may block moisture introduced into the discharge hole 84 from the cleaning chamber 16. Accordingly, the transparent tube 65 and the lamp 64 may be prevented from being damaged due to the inflow of moisture.

On the other hand, the lamp unit 28 provided in the container body cleaning chamber 14 has the same structure as the lamp unit 60 provided in the container cover cleaning chamber 16. Therefore, detailed description thereof will be omitted.

At this time, the lamp unit 28 of the container body cleaning chamber 14, the dry gas injection unit for injecting dry gas is of course installed integrally. The dry gas injection unit has the same structure as the dry gas injection unit 70 of the container cover cleaning chamber 16. Therefore, detailed description thereof will be omitted.

Next, an operation example of the present invention having such a configuration will be described with reference to FIGS. 2 to 12.

First, as shown in Figures 2 and 3, the container body cleaning chamber 14 of the case 10 is opened. Then, the container body 1 is supported by the container holder 24, respectively.

At this time, as shown in Fig. 7 and 8, the open opening (1b) of the container body (1) is directed downward, and then supported on the support tray 30 of the container holder (24).

When the support of the container body 1 is completed, as shown in FIG. 9, the support tray 30 on which the container body 1 is supported is rotated approximately 90 ° in the outward direction of the rotor 22. Then, the support tray 30 is erected vertically while being rotated from the "preparation position" (A) to the "cleaning position" (B).

At this time, as the support tray 30 is erected vertically, the container body 1 supported by the support tray 30 is also rotated vertically to face the outer direction of the rotor 22. As a result, the inside of the container body 1 is prepared for cleaning while facing outward.

On the other hand, when the support tray 30 is rotated from the "preparation position" (A) to the "cleaning position" (B), as shown in Figure 10, the locking hole (36a) of the support tray 30 in the locking pin ( 36b) is automatically fitted and locked. As a result, the support tray 30 is locked at the "cleaning position" B. FIG. Thus, the container body 1 supported by the support tray 30 also completes the cleaning preparation while maintaining a stable posture.

When the support of the container body 1 is completed, as shown in FIGS. 3, 4, 11, and 12, the container cover cleaning chamber 16 of the case 10 is opened, and the container cover 3 is then opened. ) Are respectively supported on the cover holder 54. 11 and 12, both portions of the container cover 3 are supported by the support rails 56 of the cover holder 54, respectively.

When the support of the container cover 3 is completed, as shown in FIGS. 2 and 3, the doors 14a and 16a are closed to completely seal the container body cleaning chamber 14 and the container cover cleaning chamber 16.

Then, the controller 12 is operated to turn on the device. Then, as shown in Figs. 4, 5 and 12, the cleaning liquid is injected from the respective cleaning liquid injection nozzles (26, 44, 58), whereby the surface of the container body (1) and the container cover (3) It starts to be cleaned.

At this time, each of the rotors 22 and 52 supporting the container body 1 and the container cover 3 rotates. When the rotors 22 and 52 rotate in this manner, the container rotates together with the rotors 22 and 52. On the surfaces of the main body 1 and the container cover 3, the cleaning liquids of the cleaning liquid injection nozzles 26, 44, and 58 are evenly sprayed. As a result, the cleaning efficiency of the container body 1 and the container cover 3 is increased.

On the other hand, when the cleaning of the container body 1 and the container cover 3 is completed, the injection of the cleaning liquid is stopped, and the lamps 28 and 60 are operated. As the lamps 28 and 60 are operated, the surfaces of the container body 1 and the container cover 3 are dried.

When the container body 1 and the container cover 3 are completely dried, the doors 14a and 16a are opened to open the container body 1 and the container cover 3 from the container holder 24 and the cover holder 54. Take out. The extraction method at this time is the opposite of the above-described support method.

When the container body 1 and the container cover 3 are taken out, the container body 1 and the container cover 3 are completely removed from the case 10 to complete the cleaning.

According to the present invention having such a configuration, since the container body 1 is supported on the container holder 24 by turning it upside down, the container body 1 is supported only by rotating the container holder 24. It is very easy and fast to support the main body 1. Therefore, the wafer storage container can be cleaned more conveniently and quickly.

In addition, since the wafer storage container can be cleaned conveniently and quickly, the cleaning time of the wafer storage container can be shortened, whereby the cleaning efficiency of the wafer storage container can be greatly improved.

In addition, since the container cover 3 of the wafer storage container can also be cleaned at the same time, the container cover does not need to be cleaned separately.

In addition, since the container cover 3 does not need to be cleaned separately, the cleaning efficiency of the wafer storage container can be further improved.

Although the preferred embodiment of the present invention has been described above by way of example, the scope of the present invention is not limited only to such specific embodiments, but may be appropriately changed within the scope described in the claims.

1: container body of wafer container 3: container cover of wafer container
10: Case 12: Controller
14: container body cleaning chamber (Chamber) 16: container cover cleaning chamber (Chamber)
20: container body cleaning unit (Unit) 22: rotor
24: container holder 26: cleaning liquid injection nozzle
28: Lamp Unit 29: Support Arm
30: Tray 30a: Bottom portion of the support tray
32: lower support bar 34: side plate
36: locking means 36a: locking hole
36b: Locking Pin 38: Index Plungers
39: rear support bar 40: front pad
42: side pad 44: cleaning liquid jet nozzle
46: air injection nozzle 50: container cover cleaning unit
52: Rotor 54: Cover Holder
56: Support Rail 58: Cleaning Liquid Spray Nozzle
60: Lamp Unit 62: Lamp Support
64: Lamp 65: Transparent Tube
66: Lamp Cover 70: Dry Gas Injection Unit
72: dry gas source 74: transfer line
76: nozzle 80: heating means
82: introduction hole 84: discharge hole

Claims (16)

And a container body cleaning unit 20 for cleaning the container body 1 of the wafer storage container, wherein the container body cleaning unit 20 supports the rotatable rotor 22 and the container body 1. A wafer including a plurality of container holders 24 installed in the rotor 22 and a cleaning liquid injection nozzle 26 for injecting a cleaning liquid into the container body 1 supported by the container holder 24 so as to be able to make it possible. In the storage container cleaning apparatus,
The container holder 24,
The rotor body 22 is installed on the rotor 22 so as to support the container body 1, and the open part 1b of the container body 1 is opened at a lower preparation position A of the rotor 22. A support tray 30 rotatably installed to rotate toward the cleaning position B in an outward direction;
And a locking means (36) for locking the support tray (30) to fix the container body (1) rotated to the cleaning position (B). The method of claim 1,
A cleaning liquid spray nozzle (44) installed in the support tray (30) to spray the cleaning liquid into the container body (1);
And an air injection nozzle (46) installed in the support tray (30) to inject air into the filter (1c) portion of the container body (1). The method of claim 2,
The cleaning liquid injection nozzle 44,
Wafer storage container cleaning apparatus, characterized in that the drying gas can be injected after cleaning the container body (1). The method of claim 1,
Wafer storage container cleaning device, characterized in that the bottom surface portion (30a) of the support tray 30 for supporting the container body (1) upside down. The method of claim 1,
The support tray (30) returned to the preparation position (A), the wafer storage container cleaning apparatus, characterized in that to form an angle in the range of -10 ° to 0 ° with respect to the ground. The method according to claim 1 or 5,
The support tray (30) rotated to the cleaning position (B), the wafer storage container cleaning apparatus, characterized in that to form an angle within 90 ° with respect to the ready position (A). The method of claim 1,
When the container body 1 is supported by the support tray 30, the center of gravity of the container body 1 and the rotation center axis 31 of the support tray 30 is characterized in that the alignment with each other Wafer Storage Container Cleaner. The method of claim 1,
Further comprising a container cover cleaning unit (50) for cleaning the container cover (3) for sealing the open opening (1b) of the container body (1),
The rotatable rotor (52);
A plurality of cover holders 54 installed on the rotor 52 to support the container cover 3;
And a cleaning liquid spray nozzle (58) for injecting a cleaning liquid into the container cover (3) supported by the cover holder (54). The method of claim 8,
The cover holder 54,
Consists of a pair of support rails 56 which are installed facing each other at intervals so as to support both parts of the container cover (3),
The pair of support rails (56), the wafer storage container cleaning apparatus, characterized in that installed in the rotor (52) in multiple stages to support the container cover (3) in multiple stages. The method according to claim 1 or 8,
The container body (1) is cleaned inside the container body cleaning chamber (14);
The container cover 3 is cleaned inside the container cover cleaning chamber 16;
And a lamp unit (28, 60) for irradiating light into the container body cleaning chamber (14) and the container cover cleaning chamber (16), respectively. The method of claim 10,
The lamp unit 28, 60,
Lamp support 62, the lamp 64 is installed on the lamp support 62, and the transparent tube is provided at intervals around the outer peripheral surface of the lamp 64 so as to protect the lamp ( Wafer storage container cleaning apparatus comprising a 65). 12. The method of claim 11,
The lamp support 62,
It is configured to be separated from the outside of the case (10), the wafer storage container cleaning device, characterized in that configured to withdraw the lamp unit (60) from the outside of the case (10) to repair and replace parts. 12. The method of claim 11,
And a dry gas injection unit (70) for injecting dry gas into the container body and the container cover cleaning chamber (14, 16), respectively. The method of claim 13,
The dry gas injection unit 70,
A dry gas supply source 72 for supplying dry gas;
Injection nozzles (76) for injecting the dry gas of the dry gas source (72) into the cleaning chambers (14, 16);
And a heating means (80) for heating the dry gas injected from the injection nozzle (76). The method of claim 14,
The heating means 80,
Multiple introduction holes 82 formed in the transparent tube 65 to introduce the dry gas discharged from the injection nozzle 76 between the lamp 64 and the transparent tube 65 of the lamp unit 60. );
It includes a plurality of discharge holes 84 formed in the transparent tube 65 to discharge the dry gas introduced between the lamp 64 and the transparent tube 65 into the container cover cleaning chamber 16. Wafer storage container cleaning device, characterized in that. 16. The method of claim 15,
The discharge holes 84,
The wafer is characterized in that formed in two rows along the longitudinal direction of the transparent tube 65, the discharge holes 84 in the circumferential direction formed in two rows are arranged in a range of about 60 to 120 ° angle to each other Storage container cleaning device.

Images