[go: up one dir, main page]
More Web Proxy on the site http://driver.im/

KR100967670B1 - The method for forming shall trench isolation in semiconductor device - Google Patents

The method for forming shall trench isolation in semiconductor device Download PDF

Info

Publication number
KR100967670B1
KR100967670B1 KR1020030032212A KR20030032212A KR100967670B1 KR 100967670 B1 KR100967670 B1 KR 100967670B1 KR 1020030032212 A KR1020030032212 A KR 1020030032212A KR 20030032212 A KR20030032212 A KR 20030032212A KR 100967670 B1 KR100967670 B1 KR 100967670B1
Authority
KR
South Korea
Prior art keywords
forming
nitride film
shallow trench
film
undoped polysilicon
Prior art date
Application number
KR1020030032212A
Other languages
Korean (ko)
Other versions
KR20040100017A (en
Inventor
이준현
Original Assignee
매그나칩 반도체 유한회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 매그나칩 반도체 유한회사 filed Critical 매그나칩 반도체 유한회사
Priority to KR1020030032212A priority Critical patent/KR100967670B1/en
Publication of KR20040100017A publication Critical patent/KR20040100017A/en
Application granted granted Critical
Publication of KR100967670B1 publication Critical patent/KR100967670B1/en

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76—Making of isolation regions between components
    • H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
    • H01L21/76224—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using trench refilling with dielectric materials
    • H01L21/76232—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using trench refilling with dielectric materials of trenches having a shape other than rectangular or V-shape, e.g. rounded corners, oblique or rounded trench walls
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/3065—Plasma etching; Reactive-ion etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/308—Chemical or electrical treatment, e.g. electrolytic etching using masks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3105—After-treatment
    • H01L21/311—Etching the insulating layers by chemical or physical means
    • H01L21/31105—Etching inorganic layers
    • H01L21/31111—Etching inorganic layers by chemical means
    • H01L21/31116—Etching inorganic layers by chemical means by dry-etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
    • H01L21/321—After treatment
    • H01L21/3213—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer
    • H01L21/32133—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer by chemical means only
    • H01L21/32135—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer by chemical means only by vapour etching only
    • H01L21/32136—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer by chemical means only by vapour etching only using plasmas
    • H01L21/32137—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer by chemical means only by vapour etching only using plasmas of silicon-containing layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
    • H01L21/321—After treatment
    • H01L21/3215—Doping the layers
    • H01L21/32155—Doping polycristalline - or amorphous silicon layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Element Separation (AREA)

Abstract

본 발명은 측벽스페이서를 이용하여 모트의 발생을 제거한 반도체 소자의 얕은 트랜치 소자분리막 형성방법을 개시한다. 개시된 본 발명은 반도체 기판상에 패드 산화막, 질화막, 포토레지스트막을 순차적으로 형성한 후 질화막 패턴을 형성하는 단계와, 상기 결과물의 표면에 언도프트 폴리 실리콘막을 형성한 후 상기 언도프트 폴리 실리콘막에 이온을 주입하는 단계와, 상기 이온주입된 언도프트 폴리 실리콘막을 식각하여 상기 질화막 패턴에 측벽스페이서를 형성하는 단계와, 상기 질화막 패턴 및 상기 이온주입된 언도프트 폴리 실리콘막을 마스크로 하여 얕은 트랜치를 형성하는 단계; 상기 얕은 트랜치 내에 산화막을 충진하는 단계와, 상기 질화막 패턴의 일부가 잔류하도록 상기 결과물을 연마하여 평탄화하는 단계와, 상기 측벽스페이서를 산화시키는 단계와, 상기 잔류 질화막 패턴 및 패드 산화막을 제거하는 단계를 구비하는 것을 특징으로 한다.The present invention discloses a method for forming a shallow trench isolation layer of a semiconductor device in which motts are eliminated by using sidewall spacers. According to the present invention, a pad oxide film, a nitride film, and a photoresist film are sequentially formed on a semiconductor substrate, followed by forming a nitride film pattern, and forming an undoped polysilicon film on the surface of the resultant. Forming a sidewall spacer in the nitride film pattern by etching the ion implanted undoped polysilicon film, and forming a shallow trench using the nitride film pattern and the ion implanted undoped polysilicon film as a mask. step; Filling an oxide film in the shallow trench, polishing and flattening the resultant so that a portion of the nitride film pattern remains, oxidizing the sidewall spacer, and removing the residual nitride film pattern and the pad oxide film. It is characterized by including.

STI, 측벽스페이서, 모트, 언도프트 폴리 실리콘막STI, sidewall spacers, mort, undoped polysilicon film

Description

반도체 소자의 얕은 트랜치 소자분리막 형성방법{The method for forming shall trench isolation in semiconductor device}The method for forming shall trench isolation in semiconductor device

도 1a 내지 도 1e는 종래 기술에 따른 반도체 소자의 얕은 트랜치 소자분리막 형성방법을 설명하기 위한 공정단면도.1A through 1E are cross-sectional views illustrating a method of forming a shallow trench isolation layer in a semiconductor device according to the related art.

도 2a 내지 도 2h는 본 발명에 따른 반도체 소자의 얕은 트랜치 소자분리막 형성방법을 설명하기 위한 공정단면도.2A to 2H are cross-sectional views illustrating a method of forming a shallow trench isolation layer in a semiconductor device according to the present invention.

*도면의 주요부분에 대한 부호설명* Code descriptions for the main parts of the drawings

100: 반도체 기판 102: 패드 산화막100 semiconductor substrate 102 pad oxide film

104: 질화막 104a: 질호막 패턴104: nitride film 104a: nitride film pattern

104b: 잔류 질화막 패턴 106: 포토레지스트막104b: residual nitride film pattern 106: photoresist film

108: 언도프트 폴리 실리콘막 108a: 측벽스페이서108: undoped polysilicon film 108a: sidewall spacer

108b: 잔류 측벽스페이서 110: STI108b: Residual sidewall spacer 110: STI

112: 평탄화 산화막 114: 소자분리막
112: planarization oxide film 114: device isolation film

본 발명은 반도체 소자의 얕은 트랜치 소자분리막 형성방법에 관한 것으로, 특히, 얕은 트랜치 소자분리막(Shallow Trench Isolation: 이하, STI라 함.) 코너부의 엣지 모트(Edge Moat)를 방지하는 트랜치 소자분리막 형성방법에 관한 것이다. BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of forming a shallow trench isolation layer of a semiconductor device, and more particularly, a method of forming a trench isolation layer to prevent edge moat of a corner portion of a shallow trench isolation layer (hereinafter, referred to as STI). It is about.

일반적으로, 반도체 메모리와 같은 반도체 소자를 제조할 시 다수의 소자들이 집적되는 활성영역을 전기적으로 서로 절연시키기 위해 소자분리 기술이 사용되고 있다. 최근 반도체 소자의 집적도가 증가하면서 전기적으로 절연성이 우수하며 또한 버즈빅(bird's beak)과 같은 현상으로부터 자유로우면서도 소자분리를 위한 필드영역의 면적을 감소시킬 수 있는 얕은 트랜치 소자분리막이 개발되어 널리 이용되고 있다.In general, when fabricating a semiconductor device, such as a semiconductor memory, device isolation technology is used to electrically insulate an active region in which a plurality of devices are integrated. Recently, as the degree of integration of semiconductor devices increases, a shallow trench device isolation film has been developed and widely used, which is excellent in electrical insulation and free from phenomena such as bird's beak and can reduce the area of the field region for device isolation. have.

도 1a 내지 도 1e는 종래 기술에 따른 반도체 소자의 얕은 트랜치 소자분리막 형성방법을 설명하기 위한 공정단면도이다.1A to 1E are cross-sectional views illustrating a method of forming a shallow trench isolation layer in a semiconductor device according to the related art.

도 1a를 참조하면, 반도체 기판(10)상에 패드 산화막(12)와, 질화막과, 포토레지스트막를 순차적으로 형성한다. 이어, 포토레지스트막을 패터닝하여 필드영역을 정의한 후 패터닝된 포토레지스트막을 마스크로 하고 CHF3, CF4, O2 및 Ar가스의 조합으로 활성화된 플라즈마를 이용하여 질화막을 건식식각함으로써 질화막 패턴(14)을 형성한다. 예컨대, 상기 반응가스로서 C4F8, C2F6, C5F8 등과 같은 CXFY가 포함될 수 있다. Referring to FIG. 1A, a pad oxide film 12, a nitride film, and a photoresist film are sequentially formed on the semiconductor substrate 10. Subsequently, the photoresist layer is patterned to define a field region, and the patterned photoresist layer is used as a mask, and the nitride layer is dry-etched using a plasma activated by a combination of CHF 3 , CF 4 , O 2, and Ar gas. To form. For example, C X F Y such as C 4 F 8 , C 2 F 6 , C 5 F 8, and the like may be included as the reaction gas.

도 1b를 참조하면, 상기 질화막 패턴(14)을 마스크로 하고 Cl2, O2, Ar가스 의 조합으로 활성화된 플라즈마를 이용하여 패드 산화막(12)과 반도체 기판(10)을 건식식각함으로써 STI(16)를 형성한다. 이어 SAC 산화공정을 진행하면, A부분에 나타낸 바와 같이, 반도체 기판(10)과 패드 산화막(12)의 경계면의 실리콘이 산화되어 패드산화막(12)에 라운딩(rounding)이 형성된다. Referring to FIG. 1B, the pad oxide film 12 and the semiconductor substrate 10 are dry-etched using the plasma activated by the combination of the nitride film pattern 14 as a mask and Cl 2, O 2, and Ar gas, thereby forming the STI 16. To form. Subsequently, as the SAC oxidation process proceeds, as shown in part A, silicon at the interface between the semiconductor substrate 10 and the pad oxide film 12 is oxidized to form a rounding on the pad oxide film 12.

도 1c를 참조하면, 상기 결과물 전면에 평탄화 산화막(18)을 증착한다. 이 때, STI가 평탄화 산화막(18)으로 충분히 채워질 수 있도록 평탄화 산화막(18)을 높게 증착한다.Referring to FIG. 1C, a planarization oxide film 18 is deposited on the entire surface of the resultant product. At this time, the planarization oxide film 18 is deposited high so that the STI can be sufficiently filled with the planarization oxide film 18.

도 1d를 참조하면, 화학기계적연마(CMP) 공정을 진행하여 상기 결과물을 평탄화시킨다. 이에 따라 질화막 패턴(14)의 일부가 남게 되고, 소자분리막(18a)이 형성된다.Referring to FIG. 1D, the chemical mechanical polishing (CMP) process is performed to planarize the resultant product. As a result, a part of the nitride film pattern 14 remains, and the device isolation film 18a is formed.

도 1e를 참조하면, 소자분리막(18a)과의 선택비가 우수한 특성을 갖는 H3PO4와 같은 식각용액을 이용하여 남아 있는 질화막 패턴(14a)을 제거한다. 이에 따라 패드 산화막(12)와 소자분리막(18a)는 거의 식각되지 않으면서 질화막 패턴(14a)이 제거된다.Referring to FIG. 1E, the remaining nitride layer pattern 14a is removed by using an etching solution such as H 3 PO 4 having excellent selectivity with respect to the device isolation layer 18a. As a result, the nitride layer pattern 14a is removed while the pad oxide layer 12 and the device isolation layer 18a are hardly etched.

이 후, 게이트 산화막을 증착하기 전에 HF, HF/H2O, BOE 등의 세정액을 이용하여 상기 결과물에 잔류하는 이물질을 제거하는 세정공정이 진행된다.Thereafter, before the gate oxide film is deposited, a cleaning process of removing foreign matter remaining in the resultant is performed using a cleaning solution such as HF, HF / H 2 O, or BOE.

그러나, 종래 기술에 따른 얕은 트랜치 소자분리막에서는 코너부의 라운딩이 약하게 되어 있고 소자분리막(18a)이 반도체 기판상에 형성되지 않기 때문에 상기 세정공정을 진행할 시 상기 세정액으로 인해 코너부에 엣지 모트가 발생된다. 이러 한 엣지 모트는 험프(Hump) 및 역협폭효과(INWE: Inverse Narrow Width Effect)와 같은 현상을 유발시켜서 소자의 비정상적인 동작을 초래한다.
However, in the shallow trench isolation layer according to the related art, the corner portion is weakly rounded and the isolation layer 18a is not formed on the semiconductor substrate. . These edge morts cause phenomena such as the Hump and Inverse Narrow Width Effect (INWE), resulting in abnormal behavior of the device.

따라서, 본 발명의 목적은 상기 문제점을 해결하기 위해 측벽스페이서를 이용하여 소자분리막을 형성시킴으로써, 코너부의 엣지 모트를 방지하는 반도체 소자의 얕은 트랜치 소자분리막 형성방법을 제공하는 데 있다.
Accordingly, an object of the present invention is to provide a method for forming a shallow trench isolation layer of a semiconductor device to prevent the edge mott corner of the corner portion by forming the isolation layer using a sidewall spacer to solve the above problems.

상기 목적을 달성하기 위한 본 발명에 따른 얕은 트랜치 소자분리막 형성 방법은 반도체 기판상에 패드 산화막, 질화막, 포토레지스트막을 순차적으로 형성한 후 질화막 패턴을 형성하는 단계; 상기 결과물의 표면에 언도프트 폴리 실리콘막을 형성한 후 상기 언도프트 폴리 실리콘막에 이온을 주입하는 단계; 상기 이온주입된 언도프트 폴리 실리콘막을 식각하여 상기 질화막 패턴에 측벽스페이서를 형성하는 단계; 상기 질화막 패턴 및 상기 이온주입된 언도프트 폴리 실리콘막을 마스크로 하여 얕은 트랜치를 형성하는 단계; 상기 얕은 트랜치 내에 산화막을 충진하는 단계; 상기 질화막 패턴의 일부가 잔류하도록 상기 결과물을 연마하여 평탄화하는 단계; 상기 측벽스페이서를 산화시키는 단계; 및 상기 잔류 질화막 패턴 및 패드 산화막을 제거하는 단계를 구비하는 것을 특징으로 한다.The shallow trench isolation layer forming method according to the present invention for achieving the above object comprises the steps of sequentially forming a pad oxide film, a nitride film, a photoresist film on the semiconductor substrate and then forming a nitride film pattern; Forming an undoped polysilicon film on the surface of the resultant and implanting ions into the undoped polysilicon film; Etching side of the ion implanted undoped polysilicon layer to form a sidewall spacer on the nitride layer pattern; Forming a shallow trench using the nitride film pattern and the ion implanted undoped polysilicon film as a mask; Filling an oxide film into the shallow trench; Polishing and flattening the resultant portion so that a part of the nitride film pattern remains; Oxidizing the sidewall spacers; And removing the residual nitride film pattern and the pad oxide film.

상기 이온주입단계는 5가 및 3가의 이온 중 하나를 선택적으로 주입하는 것 이 바람직하다.In the ion implantation step, it is preferable to selectively inject one of the pentavalent and trivalent ions.

상기 질화막은 CHF3, CF4, O2 및 Ar가스의 조합으로 활성화된 플라즈마를 이용하여 건식식각되는 것이 바람직하다.The nitride film is preferably dry-etched using a plasma activated by a combination of CHF 3 , CF 4 , O 2 and Ar gas.

상기 이온주입된 언도프트 폴리 실리콘막은 Cl2, HBr, He-O2 및 Ar 가스의 조합으로 활성화된 플라즈마를 이용하여 건식식각되는 것이 바람직하다.The ion-implanted undoped polysilicon film is preferably dry etched using a plasma activated by a combination of Cl 2 , HBr, He-O 2, and Ar gas.

상기 이온주입된 언도프트 폴리 실리콘막은 Cl2, O2 및 Ar 가스로 활성화된 플라즈마를 이용하여 건식식각되는 것이 바람직하다.The ion-implanted undoped polysilicon film is preferably dry etched using plasma activated with Cl 2 , O 2 and Ar gas.

상기 얕은 트랜치를 형성할 시 Cl2, HBr, He-O2 및 Ar 가스의 조합으로 활성화된 플라즈마를 이용하여 건식식각되는 것이 바람직하다.When forming the shallow trench, dry etching is preferably performed using a plasma activated by a combination of Cl 2 , HBr, He—O 2 and Ar gas.

또한, 상기 얕은 트랜치를 형성할 시 Cl2, O2 및 Ar 가스로 활성화된 플라즈마를 이용하는 것이 바람직하다.In addition, it is preferable to use a plasma activated with Cl 2 , O 2 and Ar gas when forming the shallow trench.

(실시예)(Example)

이하, 첨부된 도면에 의거하여 본 발명의 바람직한 실시예를 보다 상세하게 설명하도록 한다.Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.

도 2a 내지 도 2h는 본 발명에 따른 반도체 소자의 얕은 트랜치 소자분리막 형성방법을 설명하기 위한 공정단면도이다.2A to 2H are cross-sectional views illustrating a method of forming a shallow trench isolation layer in a semiconductor device according to the present invention.

도 2a를 참조하면, 반도체 기판(100)상에 패드 산화막(102)와, 질화막(104)과, 포토레지스트막를 순차적으로 형성한다. 이어, 포토레지스트막을 패터닝하여 필드영역을 정의한 후 패터닝된 포토레지스트막(106)을 마스크로 하고 CHF3, CF4, O2 및 Ar가스의 조합으로 활성화된 플라즈마를 이용하여 질화막(104)과 패드산화막(102)을 건식식각함으로써 질화막 패턴(104a)을 형성한다. 예컨대, 상기 반응가스로서 C4F8, C2F6, C5F8 등과 같은 CXFY가 포함될 수 있으며, 또한 N2가스가 추가될 수 있다.Referring to FIG. 2A, a pad oxide film 102, a nitride film 104, and a photoresist film are sequentially formed on the semiconductor substrate 100. Subsequently, the photoresist layer is patterned to define field regions, and the patterned photoresist layer 106 is used as a mask, and the nitride layer 104 and the pads are activated using a plasma activated by a combination of CHF 3 , CF 4 , O 2, and Ar gas. The nitride film pattern 104a is formed by dry etching the oxide film 102. For example, as the reaction gas C 4 F 8, C 2 F 6, C 5 F 8 C X F and Y may contain such as, there is also a N2 gas can be added.

여기서, 질화막(104)을 증착하기 전에 패드 산화막(102)을 증착하는 이유는 질화막(104)를 직접 반도체 기판(100) 상에 형성할 경우 기판이 스트레스를 받아 휘게 되므로, 이를 방지하기 위함이다.The reason for depositing the pad oxide film 102 before depositing the nitride film 104 is to prevent the substrate from being stressed and bent when the nitride film 104 is directly formed on the semiconductor substrate 100.

그 다음, 상기 결과물의 표면에 언도프트 폴리 실리콘막(108)을 균일하게 형성한 후 5가 및 3가의 이온 중 하나를 선택적으로 주입하여 이온주입된 언도프트 폴리 실리콘막을 형성한다. 본 발명의 실시예에 따라 상기 5가의 이온으로서 인(P)이 사용되는 것이 바람직하며, 상기 3가의 이온으로서 붕소(B)가 사용되는 것이 바람직하다.Thereafter, the undoped polysilicon film 108 is uniformly formed on the surface of the resultant, and then one of the pentavalent and trivalent ions is selectively implanted to form an ion implanted undoped polysilicon film. According to an embodiment of the present invention, phosphorus (P) is preferably used as the pentavalent ion, and boron (B) is preferably used as the trivalent ion.

이와 같이 이온을 주입하는 것은 후속되는 산화공정에서 상기 언도프트 폴리 실리콘막(108)이 하부의 반도체 기판(100)보다 상대적으로 더 빠르게 산화시킴으로써 질화막 패턴(104a)의 하부로 버즈빅(Bird's Beak)을 최소화하기 위함이다. 본 발명의 실시에에 따라 상기 이온주입된 언도프트 폴리 실리콘막의 산화속도는 반도체 기판(100)에 비해 3배정도 빠르게 산화되는 것이 바람직하다.The implantation of ions as described above causes the undoped polysilicon layer 108 to oxidize relatively faster than the lower semiconductor substrate 100 in the subsequent oxidation process, thereby causing a bird's beak below the nitride layer pattern 104a. To minimize this. According to the embodiment of the present invention, the oxidation rate of the ion implanted undoped polysilicon film is preferably oxidized about three times faster than the semiconductor substrate 100.

한편, 상기 5가의 인(P)은 상기 3가의 붕소(B)에 비해 산화속도를 더 빠르게 진행시키므로, 본 발명의 실시에에서는 이온주입시 상기 5가의 인(P)을 사용하는 것이 선호되지만, 상기 3가의 붕소(B)를 사용해도 무방하다.On the other hand, since the pentavalent phosphorus (P) advances the oxidation rate faster than the trivalent boron (B), in the practice of the present invention, it is preferable to use the pentavalent phosphorus (P) during ion implantation. You may use the said trivalent boron (B).

도 2c를 참조하면, 상기 이온주입된 언도프트 폴리 실리콘막을 블랭킷(blanket) 식각하여 질화막 패턴(104a)에 측벽스페이서(108a)을 형성한다. 이 때, 상기 이온주입된 언도프트 폴리 실리콘막은 Cl2, HBr, He-O2 및 Ar 가스의 조합으로 활성화된 플라즈마를 이용하여 건식식각되는 것이 바람직하다. 여기서, 반응가스로서 N2가 추가될 수 있으며, He-O2대신 O2가 사용될 수 있고, 또한 Cl2, O2 및 Ar만이 사용될 수 있다.Referring to FIG. 2C, the ion implanted undoped polysilicon layer is blanket etched to form sidewall spacers 108a on the nitride layer pattern 104a. At this time, the ion-implanted undoped polysilicon film is preferably dry-etched using a plasma activated by a combination of Cl 2 , HBr, He-O 2 and Ar gas. Here, a reactive gas may be N 2 is added, He-O 2 may be used instead of the O 2, may also be used, only Cl 2, O 2 and Ar.

도 2d를 참조하면, 질화막 패턴(104a)을 마스크로 하고 Cl2, HBr, He-O2 및 Ar 가스의 조합으로 활성화된 플라즈마를 이용하여 반도체 기판(100)을 건식식각함으로써 STI(110)를 형성한다. 또한, 여기서, 반응가스로서 N2가 추가될 수 있으며, He-O2대신 O2가 사용될 수 있고, 또한 Cl2, O2 및 Ar만이 사용될 수 있다.Referring to FIG. 2D, the STI 110 is formed by dry etching the semiconductor substrate 100 using a plasma activated by a combination of the nitride film pattern 104a and Cl 2 , HBr, He-O 2, and Ar gas. Form. Further, here, as the reaction gas may be N 2 is added, He-O 2 may be used instead of the O 2, may also be used, only Cl 2, O 2 and Ar.

도 2e를 참조하면, 상기 결과물 전면에 평탄화 산화막(112)을 증착한다. 이 때, STI(110)가 평탄화 산화막(112)으로 충분히 채워질 수 있도록 평탄화 산화막(112)을 높게 증착한다.Referring to FIG. 2E, a planarization oxide film 112 is deposited on the entire surface of the resultant product. At this time, the planarization oxide film 112 is deposited high so that the STI 110 may be sufficiently filled with the planarization oxide film 112.

도 2f를 참조하면, 화학기계적연마(CMP) 공정을 진행하여 상기 결과물을 평탄화시킨다. 이에 따라 질화막 패턴(104a)과 측벽스페이서(108a)의 일부가 남게 되고, 소자분리막(114)이 형성된다. Referring to FIG. 2F, a chemical mechanical polishing (CMP) process is performed to planarize the resultant product. As a result, a portion of the nitride film pattern 104a and the sidewall spacers 108a remain, and the device isolation layer 114 is formed.                     

통상적으로, 질화막 패턴(104a)의 두께는 측정될 수 있는 바, 본 발명의 실시에에서는 측정된 질화막 패턴(104a)의 두께를 기초로 측벽스페이서(108a)의 두께의 조절이 가능하게 된다.In general, the thickness of the nitride film pattern 104a may be measured. In the embodiment of the present invention, the thickness of the sidewall spacers 108a may be adjusted based on the measured thickness of the nitride film pattern 104a.

도 2g를 참조하면, 잔류 측벽스페이서(108b)를 산화시키는 산화공정을 진행한다. 이 경우 잔류 측벽스페이서(108b)는 소자분리막(114)과 동일한 산화막의 특성을 갖게되며, 소자분리막(114)의 코너부위에 약간의 라운딩이 발생된다. Referring to FIG. 2G, an oxidation process for oxidizing the remaining sidewall spacers 108b is performed. In this case, the remaining sidewall spacers 108b have the same oxide film characteristics as those of the device isolation film 114, and some rounding occurs at the corners of the device isolation film 114.

따라서, 본 발명의 실시예에 따른 잔류 측벽스페이서(108b)는 소자분리막(114)과 동일한 기능을 수행할 수 있게 된다.Therefore, the remaining sidewall spacers 108b according to the embodiment of the present invention can perform the same function as the device isolation layer 114.

상술한 바와 같이, 산화공정을 진행하면 상기 이온주입된 언도프트 폴리 실리콘막의 산화속도는 반도체 기판(100)에 비해 3배정도 빠르게 되는 데, 이는 언도프트 폴리 실리콘막에 불순물이 첨가되어 있어서 단일 실리콘-실리콘 결합구조 보다 결합구조가 불안정한 상태가 되기 때문이다. As described above, when the oxidation process is performed, the oxidation rate of the ion implanted undoped polysilicon film is about three times faster than that of the semiconductor substrate 100. This is because a single silicon- This is because the bonding structure becomes more unstable than the silicon bonding structure.

도 2h를 참조하면, 소자분리막(114)과의 선택비가 우수한 특성을 갖는 H3PO4와 같은 식각용액을 이용하여 잔류 질화막 패턴(104b)과 패드 산화막(112)을 제거한다. 이에 따라 패드 산화막(12)와 소자분리막(18a)는 거의 식각되지 않으면서 잔류 질화막 패턴(104b)과 패드 산화막(112)이 제거된다. 이로써, 얕은 트랜치 소자분리막 형성공정이 완료된다.Referring to FIG. 2H, the residual nitride film pattern 104b and the pad oxide film 112 are removed using an etching solution such as H 3 PO 4 having excellent selectivity with respect to the device isolation film 114. As a result, the remaining nitride film pattern 104b and the pad oxide film 112 are removed while the pad oxide film 12 and the device isolation film 18a are hardly etched. As a result, the shallow trench isolation layer forming process is completed.

상기에서 본 발명의 특정 실시예가 설명 및 도시되었지만, 본 발명이 당업자에 의해 다양하게 변형되어 실시될 가능성이 있는 것은 자명한 일이다. 이와 같은 변형된 실시예들은 본 발명의 기술적 사상이나 전망으로부터 개별적으로 이해되어져서는 안되며, 본 발명에 첨부된 특허청구범위 안에 속한다 해야 할 것이다.
While specific embodiments of the present invention have been described and illustrated above, it will be apparent that the present invention may be modified and practiced by those skilled in the art. Such modified embodiments should not be individually understood from the technical spirit or the prospect of the present invention, but should fall within the claims appended to the present invention.

이상에서와 같이, 본 발명은 측벽스페이서를 이용하여 소자분리막이 반도체 기판 상부도 형성되도록 함으로써, 얕은 트랜치 코너부에서 엣지 모트의 발생이 억제되고, 이로 인해 험프 및 역협폭효과와 같은 현상의 발생되지 않으므로 소자 신뢰성의 향상에 기여할 수 있다. As described above, according to the present invention, the device isolation film is also formed on the semiconductor substrate by using the sidewall spacers, thereby suppressing the generation of edge motts at the shallow trench corners, thereby preventing occurrence of phenomena such as the hump and inverse narrowing effects. Therefore, it can contribute to the improvement of device reliability.

Claims (7)

반도체 기판상에 패드 산화막을 개재하여 질화막 패턴을 형성하는 단계;Forming a nitride film pattern on the semiconductor substrate through the pad oxide film; 상기 질화막 패턴을 포함한 전면에 언도프트 폴리 실리콘막을 형성한 후 상기 언도프트 폴리 실리콘막에 이온을 주입하는 단계;Forming an undoped polysilicon film on the entire surface including the nitride film pattern and implanting ions into the undoped polysilicon film; 상기 이온주입된 언도프트 폴리 실리콘막을 블랭킷 식각하여 상기 질화막 패턴의 측벽에 측벽스페이서를 형성하는 단계;Blanket-etching the ion implanted undoped polysilicon layer to form sidewall spacers on sidewalls of the nitride layer pattern; 상기 질화막 패턴 및 상기 측벽스페이서를 마스크로 상기 반도체 기판을 식각하여 얕은 트랜치를 형성하는 단계;Etching the semiconductor substrate using the nitride layer pattern and the sidewall spacers to form a shallow trench; 상기 얕은 트랜치를 포함한 전면에 산화막을 형성하는 단계;Forming an oxide film on the entire surface including the shallow trench; 상기 질화막 패턴의 일부가 잔류하도록 상기 산화막과 상기 질화막 패턴 및 상기 측벽스페이서를 연마하는 단계;Polishing the oxide film, the nitride film pattern, and the sidewall spacer so that a part of the nitride film pattern remains; 상기 측벽스페이서를 산화시키는 단계; 및Oxidizing the sidewall spacers; And 상기 잔류된 질화막 패턴 및 상기 패드 산화막을 제거하는 단계를 구비하는 것을 특징으로 하는 반도체 소자의 얕은 트랜치 소자분리막 형성방법.And removing the remaining nitride film pattern and the pad oxide film. 제 1 항에 있어서,The method of claim 1, 상기 이온주입단계는 5가 및 3가의 이온 중 하나를 선택적으로 주입하는 것을 특징으로 하는 반도체 소자의 얕은 트랜치 소자분리막 형성방법. Wherein the ion implantation step selectively implants one of pentavalent and trivalent ions. 제 1 항에 있어서,The method of claim 1, 상기 질화막은 CHF3, CF4, O2 및 Ar가스의 조합으로 활성화된 플라즈마를 이용하여 건식식각되는 것을 특징으로 하는 반도체 소자의 얕은 트랜치 소자분리막 형성방법.The nitride film is a method of forming a shallow trench isolation layer of a semiconductor device, characterized in that the dry etching using a plasma activated by the combination of CHF 3 , CF 4 , O 2 and Ar gas. 제 1 항에 있어서,The method of claim 1, 상기 이온주입된 언도프트 폴리 실리콘막은 Cl2, HBr, He-O2 및 Ar 가스의 조합으로 활성화된 플라즈마를 이용하여 건식식각되는 것을 특징으로 하는 반도체 소자의 얕은 트랜치 소자분리막 형성방법.And the ion implanted undoped polysilicon layer is dry etched using a plasma activated by a combination of Cl 2 , HBr, He-O 2 and Ar gas. 제 1 항에 있어서,The method of claim 1, 상기 이온주입된 언도프트 폴리 실리콘막은 Cl2, O2 및 Ar 가스로 활성화된 플라즈마를 이용하여 건식식각되는 것을 특징으로 하는 반도체 소자의 얕은 트랜치 형성방법.And the ion implanted undoped polysilicon layer is dry etched using plasma activated with Cl 2 , O 2, and Ar gas. 제 1 항에 있어서,The method of claim 1, 상기 얕은 트랜치를 형성할 시 Cl2, HBr, He-O2 및 Ar 가스의 조합으로 활성 화된 플라즈마를 이용하여 건식식각되는 것을 특징으로 반도체 소자의 얕은 트랜치 형성방법.Forming a shallow trench by using a plasma activated by a combination of Cl 2 , HBr, He-O 2, and Ar gas to dry-etch the shallow trench. 제 1 항에 있어서,The method of claim 1, 상기 얕은 트랜치를 형성할 시 Cl2, O2 및 Ar 가스 로 활성화된 플라즈마를 이용하는 것을 특징으로 하는 반도체 소자의 얕은 트랜치 형성방법. Forming a shallow trench using a plasma activated with Cl 2 , O 2 and Ar gas.
KR1020030032212A 2003-05-21 2003-05-21 The method for forming shall trench isolation in semiconductor device KR100967670B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020030032212A KR100967670B1 (en) 2003-05-21 2003-05-21 The method for forming shall trench isolation in semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020030032212A KR100967670B1 (en) 2003-05-21 2003-05-21 The method for forming shall trench isolation in semiconductor device

Publications (2)

Publication Number Publication Date
KR20040100017A KR20040100017A (en) 2004-12-02
KR100967670B1 true KR100967670B1 (en) 2010-07-08

Family

ID=37377462

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020030032212A KR100967670B1 (en) 2003-05-21 2003-05-21 The method for forming shall trench isolation in semiconductor device

Country Status (1)

Country Link
KR (1) KR100967670B1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100577306B1 (en) * 2004-12-21 2006-05-10 동부일렉트로닉스 주식회사 Method for forming isolation film of semiconductor device

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19990086523A (en) * 1998-05-28 1999-12-15 윤종용 Semiconductor device manufacturing method
US6248641B1 (en) 1999-02-05 2001-06-19 United Microelectronics Corp. Method of fabricating shallow trench isolation

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19990086523A (en) * 1998-05-28 1999-12-15 윤종용 Semiconductor device manufacturing method
US6248641B1 (en) 1999-02-05 2001-06-19 United Microelectronics Corp. Method of fabricating shallow trench isolation

Also Published As

Publication number Publication date
KR20040100017A (en) 2004-12-02

Similar Documents

Publication Publication Date Title
KR20040050789A (en) Method for manufacturing STI of semiconductor device
JP4037597B2 (en) Trench element isolation method
US6271147B1 (en) Methods of forming trench isolation regions using spin-on material
KR100967670B1 (en) The method for forming shall trench isolation in semiconductor device
KR100979233B1 (en) Method for forming element isolation layer of semiconductor device
KR100967667B1 (en) Method for forming STI of semiconductor device
KR100967666B1 (en) Method for manufacturing STI of semiconductor device
KR100566305B1 (en) A method for forming trench type isolation layer in semiconductor device
KR100567026B1 (en) Method for improving edge moat of sti corner
KR100967672B1 (en) The method for forming shall trench isolation in semiconductor device
KR100779398B1 (en) Method of forming a device isolation film in a semiconductor device
KR100552852B1 (en) Method for fabricating shallow trench isolation
KR100979228B1 (en) Method for forming element isolating film of semiconductor device
KR100451519B1 (en) Method for manufacturing STI of semiconductor device
KR100733692B1 (en) Method of forming a isolation layer in semiconductor device
KR100984854B1 (en) Method for forming element isolation layer of semiconductor device
KR100587607B1 (en) Method for manufacturing semiconductor device
KR100480896B1 (en) Method for manufacturing STI of semiconductor device
KR100750047B1 (en) Method for manufacturing an isolation layer in a semiconductor device
KR20020010806A (en) Method of forming isolation in semiconductor device
JP2003037161A (en) Semiconductor device and its manufacturing method
KR100587597B1 (en) Method for forming isolation layer of semiconductor device
KR100829369B1 (en) Formation method of shallow trench isolation in semiconductor device
KR100561974B1 (en) A Manufacturing Method of Semiconductor Element
KR20020003031A (en) Method for forming isolation in semiconductor device

Legal Events

Date Code Title Description
N231 Notification of change of applicant
A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20130524

Year of fee payment: 4

FPAY Annual fee payment

Payment date: 20140519

Year of fee payment: 5

FPAY Annual fee payment

Payment date: 20150518

Year of fee payment: 6

LAPS Lapse due to unpaid annual fee