KR100928330B1 - Transparent substrate and manufacturing method thereof - Google Patents

Abstract

In the transparent substrate according to the present invention is disposed adjacent to the light source so as to improve the light efficiency and clear contrast, the transparent substrate made of a light transmissive material, the transparent substrate includes a main substrate facing the light source, The main substrate includes a first surface facing the light source and a second surface disposed opposite to the first surface, and on the first surface and the second surface, a nano pattern is disposed to prevent reflection of light. May be composed of a plurality of protrusions.

Transparent substrate, antireflection, nanopattern, light transmissive, imprint

Description

Transparent substrate and its manufacturing method {TRANSPARANT SUBSTRATE AND FABRICATING METHOD THEREOF}

The present invention relates to a transparent substrate and a method of manufacturing the same, and more particularly, to a transparent substrate and a method of manufacturing the anti-reflective nano-pattern that can minimize the reflection of light.

Nano Technology (NT), along with Information Technology (IT) and Biotechnology (BT), is attracting attention as a new paradigm that will lead industrial development in the 21st century.

In addition, nanotechnology is a convergence of various scientific and technological fields such as physics, chemistry, biology, electronics, and materials engineering, overcoming the limitations of existing technologies, and innovating technology in various industries to dramatically improve the quality of human life. It is expected to improve.

Patterns ranging in size from a few nanometers to hundreds of nanometers are being applied to many applications such as nanomemory, biosensors, biotechnology, cell growth, etc., high-efficiency displays using photonic crystals, solar cells, and various optoelectronic devices. have.

For example, a few nano to several hundred nano dots or cylinder structures can be applied to nano memory, and a few hundred nano photonic crystal structures can be applied as a structure for increasing external light efficiency in OLED (LED).

In recent years, researches that mimic natural creatures are also actively studying the structural applications of moth-eye, gecko feet, and lotus leaves.

All of these structures have nanostructures ranging from tens to hundreds of nanometers, each with unique behaviors that can be applied to devices. For example, the lizard's paw has a long pillar structure that adheres well to slippery walls. Lotus leaf also has a water-repellent function to effectively remove water droplets and dust. By artificially imitating these natural structures, you can create products that are useful for real life.

For example, the artificial lizard sole structure can be used as a new surface adhesive that can be easily attached and detached, and the artificial lotus leaf structure can be used as a separator such as automobile glass and selective wastewater separation.

As the conventional antireflection film, a continuous thin film coating method of a low refractive index material has been mainly used. However, this method has a disadvantage in that the selection of materials is limited, the production of uniform thin films is not easy, and the number of processes is large.

The present invention has been made to solve the above problems, and an object of the present invention is to provide a transparent substrate having an antireflective nanopattern capable of preventing external light reflection and improving the light efficiency and a method of manufacturing the same.

In order to achieve the above object, a transparent substrate according to an embodiment of the present invention is disposed adjacent to a light source and made of a light transmissive material, wherein the transparent substrate includes a main substrate facing the light source. The main substrate includes a first surface facing a light source and a second surface facing the first surface, and a nanopattern is disposed on the first surface and the second surface to prevent reflection of light. The nanopattern may be composed of a plurality of protrusions.

The transparent substrate may be attached to the first surface of the external substrate and include an ITO substrate made of ITO. The ITO substrate may include an antireflective nanopattern for preventing reflection of light on a surface facing the light source.

The nanopattern may have a pitch of 20 nm to 500 nm. The external substrate may include an antireflection film disposed to contact the first surface, the nanopattern may be formed on the antireflection film, and the external substrate may be antireflective disposed to contact the second surface. Including a film, the nanopattern may be formed on the anti-reflection film.

In the method of manufacturing a transparent substrate according to an embodiment of the present invention, the method of manufacturing a transparent substrate disposed adjacent to a light source and made of a light transmissive material, the first surface facing the light source and the second surface facing the first surface Preparing a main substrate having a surface, applying a resist layer on the first surface, forming a nanopattern on a resist layer formed on the first surface, and etching the first surface. Forming an antireflective nanopattern, applying a resist layer on the second surface, forming a nanopattern on the resist layer formed on the second surface, and etching the second surface to prevent antireflection The method may include forming a nanopattern.

The method of manufacturing a transparent substrate according to an embodiment of the present invention may further include forming an ITO substrate disposed to contact the first surface and having an antireflective nanopattern formed on a surface facing the light source.

In the step of forming a nanopattern on the resist layer formed on the first substrate, the nanopattern may be formed by imprint lithography, In the step of forming a nanopattern on the resist layer formed on the second substrate The nanopattern may be formed by imprint lithography.

In forming the antireflective nanopattern on the first surface and forming the antireflective nanopattern on the second surface, the antireflective nanopattern may be formed to have a pitch of 20 nm to 500 nm.

In the step of forming a nanopattern on the resist layer formed on the first surface and the nanopattern on the resist layer formed on the second surface, the nanopattern is injection molding, soft lithography, dry etching, wet etching, It may be formed by any one method selected from deposition and laser interference lithography.

The transparent substrate according to the present invention can improve the light efficiency by preventing reflection of the emitted light by forming anti-reflective nanopatterns on both sides of the main substrate, and also improve the clear room contrast by preventing the reflection of incident light.

In addition, by forming an anti-reflection nanopattern on the ITO substrate to prevent reflection of the emitted light can further improve the light efficiency.

In the present invention, the nanopattern refers to a pattern having a nano size. Patterns include irregular patterns as well as regular patterns.

In addition, in the present invention, the pitch refers to the distance from the center of one projection forming the nanopattern to the center of the neighboring projection. In addition, in this invention, the opposing surface is defined as including not only the surface which faces each other, but all the surfaces including the surface which opposes each other. In the present invention, the light source is defined as a concept including not only spherical light sources such as light bulbs but also surface light sources such as OLEDs.

Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings so that those skilled in the art may easily implement the present invention. As those skilled in the art would realize, the described embodiments may be modified in various different ways, all without departing from the spirit or scope of the present invention. In the drawings, parts irrelevant to the description are omitted in order to clearly describe the present invention, and like reference numerals designate like elements throughout the specification.

1A to 1I are views for explaining a process of manufacturing a transparent substrate according to a first embodiment of the present invention.

Referring to the drawings described above, first, as shown in FIG. 1A, a substrate 112 is prepared.

The substrate 112 is made of a light transmissive material, and may be made of glass, indium tin oxide (ITO), or the like. The substrate 112 includes a first surface 112a and a second surface 112b opposite to the first surface 112a.

As shown in FIG. 1B, a resist layer 121 is formed on the first surface 112a. The resist layer 121 may be made of a photoresist, and may be made of other conventional resists.

As shown in FIG. 1C, the nanopattern 125 is formed on the resist layer 121 using the stamp 123. As such, when the nanopattern 125 is formed by the imprint lithography method using the stamp 123, the nanopattern 125 may be formed on the resist layer 121 more easily and quickly.

In the present embodiment, the nanopattern 125 is formed by imprint lithography using the stamp 123 as an example, but the present invention is not limited thereto. The nanopattern 125 may be formed by various methods such as injection molding, soft lithography, dry etching, wet etching, deposition, and laser interference lithography.

As illustrated in FIG. 1D, when the nanopattern 125 is formed in the resist layer 121, the substrate is etched by a method such as dry or wet etching.

When the antireflective nanopattern 115 is transferred onto the substrate 112 by etching, the resist layer 121 remaining on the substrate 112 is removed as shown in FIG. 1E.

As shown in FIG. 1F, a resist layer 124 is formed on the second surface 112b of the substrate 112. The resist layer 124 may be made of a photoresist, and may be made of other conventional resists.

As shown in FIG. 1G, the nanopattern 128 is formed on the resist layer 124 using the stamp 126. Forming a nanopattern by an imprint lithography method makes it easier and faster to form the nanopattern on the resist layer.

In the present exemplary embodiment, the nanopattern is formed by imprint lithography using the stamp 126 as an example, but the present invention is not limited thereto. The nanopattern may be formed by various methods such as injection molding, soft lithography, dry etching, wet etching, deposition, and laser interference lithography.

As shown in FIG. 1H, when the nanopattern 128 is formed in the resist layer 124, the substrate 112 is etched by a method such as dry or wet etching.

When the antireflective nanopattern 128 is transferred onto the substrate by etching, the resist layer 124 remaining on the substrate 112 is removed as shown in FIG. 1I, so that the antireflective nanopatterns 115 and 117 are formed on both surfaces thereof. The formed substrate is completed. In this case, the antireflective nanopattern may be formed to have a pitch of 20 nm to 500 nm.

By depositing ITO on such a substrate, the transparent substrate may be completed by attaching an ITO substrate on which an antireflective nanopattern is formed, to the substrate.

The transparent substrate according to the first embodiment will be described in more detail with reference to FIG. 2.

The transparent substrate 200 according to the present exemplary embodiment includes a main substrate 210 and an ITO substrate 230 disposed below the main substrate 210. The main substrate 210 and the ITO substrate 230 are disposed adjacent to the light source 240 to serve to transmit the light formed in the light source 240 to the outside.

The main substrate 210 is a substrate which is in direct contact with air and may be made of a light transmissive material. The main substrate of the present embodiment is made of glass. On the other hand, the ITO substrate 230 is made of ITO.

The main substrate 210 includes a first surface facing the light source 240 and a second surface facing the first surface and facing outward.

Antireflection nanopatterns 213 and 215 are formed on the first and second surfaces. The antireflective nanopatterns 213 and 215 are formed of spaced apart protrusions, and the pitch between the protrusions is 20 nm to 500 nm. If the pitch is formed smaller than 20nm, not only the process is complicated but also diffuse reflection occurs. If the pitch is formed larger than 500nm, there is a problem that the light efficiency is not improved because the reflection of light is not stably suppressed.

The anti-reflective nanopattern 215 formed on the surface facing the light source improves light efficiency by allowing the light generated from the light source 240 to be emitted from the main substrate 210 without being reflected.

The light emitted from the light source 240 is incident on the main substrate 210. The refractive index of the ITO substrate 230 is 1.8, the refractive index of the main substrate 210 made of glass is 1.55, and the refractive index of air is 1.0. Accordingly, when light is incident from the ITO substrate 230 to the main substrate 210, reflection occurs when the incident angle is greater than the critical angle. The nano-sized antireflective nanopattern 215 serves to reduce the incident angle.

This is because the incident angle is smaller when the light is incident on the outer circumference of the anti-reflective nanopattern 215 than when the light is incident on the surface parallel to the first surface of the main substrate 210. As the antireflective nanopattern 215 is formed, a large amount of light is incident on the outer circumference of the antireflective nanopattern 215, and thus the amount of reflected light is reduced to reduce the amount of light emitted to the main substrate 210. As the amount is increased, the light efficiency is improved.

In addition, the anti-reflective nanopattern 213 formed on the second surface facing away from the main substrate 210 reduces the reflection of light incident on the main substrate 210 in the same manner, thereby suppressing external light reflections Contrast can be improved.

In particular, when the transparent substrate 200 according to the present embodiment is applied to a monitor including an OLED and an LCD, not only the glare caused by the reflection of external light can be reduced but also the amount of light reflected when the light comes out By reducing the light efficiency can be improved to achieve a clearer picture quality.

In addition, the transparent substrate 200 is applicable to industrial household glass, including automotive instrument panel. In addition, the transparent substrate 200 may be applied to a high efficiency solar cell that increases the light efficiency in applying a solar cell, and may be applied to high efficiency lighting including LED lighting.

3 is a cross-sectional view showing a transparent substrate according to another embodiment of the present invention.

Referring to FIG. 3, the transparent substrate 300 according to the present exemplary embodiment includes a main substrate 310 and an ITO substrate 320 disposed under the main substrate 310. The main substrate 310 and the ITO substrate 320 are disposed adjacent to a light source (not shown), and serve to transmit the light formed by the light source to the outside.

The main substrate 310 is a substrate which is in direct contact with air and is made of a light transmissive material, and in particular, may be made of glass. On the other hand, the ITO substrate 320 is made of ITO.

Anti-reflective nanopatterns 313 and 315 formed of protrusions are formed on both sides of the main substrate 310, and anti-reflective nanopatterns 325 are formed on the ITO substrate 320. The anti-reflective nanopattern 325 is formed on the surface of the ITO substrate 320 facing the light source, which is the opposite surface of the main substrate 310. As a result, when the light emitted from the light source is incident on the ITO substrate 320, the ITO substrate 320 is formed. It is possible to prevent the light from being reflected from the substrate 320. Therefore, the light efficiency of the transparent substrate 300 is further improved.

4 is a cross-sectional view showing a transparent substrate according to another embodiment of the present invention.

Referring to FIG. 4, the transparent substrate 400 according to the present exemplary embodiment includes a main substrate 410 made of glass, an ITO substrate 420 attached to one surface of the main substrate 410, and a main substrate 420. Antireflection films 430 and 450 attached thereto.

The antireflective films 430 and 450 are disposed on both sides of the main substrate 410, respectively, and the antireflective nanopatterns 435 and 456 are formed on the surface thereof. The anti-reflective nanopatterns 435 and 456 are formed of spaced apart protrusions, and serve to reduce reflection of light incident toward the transparent substrate 400 and light emitted through the transparent substrate 400.

In the above description of the preferred embodiment of the present invention, the present invention is not limited thereto, and various modifications and changes can be made within the scope of the claims and the detailed description of the invention and the accompanying drawings. Naturally, it belongs to the range of.

1A to 1I illustrate a process of manufacturing a transparent substrate according to an embodiment of the present invention.

2 is a cross-sectional view showing a transparent substrate according to an embodiment of the present invention.

3 is a cross-sectional view showing a transparent substrate according to a second embodiment of the present invention.

4 is a cross-sectional view showing a transparent substrate according to a third embodiment of the present invention.

<Description of the symbols for the main parts of the drawings>

200: transparent substrate 210: main substrate

213 and 215: antireflective nanopattern 230: ITO substrate

240: light source 430, 450: antireflection film

Claims (12)

In the transparent substrate is disposed adjacent to the light source and made of a transparent material, The transparent substrate includes a main substrate disposed to face the light source, The main substrate includes a first surface facing the light source and a second surface disposed opposite to the first surface, Nano patterns are disposed on the first and second surfaces to prevent reflection of light. The nanopattern is composed of a plurality of protrusions, An ITO substrate attached to the first surface of the main substrate and composed of ITO; Transparent substrate. delete The method of claim 1, The ITO substrate is a transparent substrate having an anti-reflective nano-pattern for preventing the reflection of light on the surface facing the light source. The method of claim 1, The nanopattern is a transparent substrate having a pitch of 20nm to 500nm. The method of claim 1, The main substrate includes an antireflective film disposed to contact the first surface, The nano pattern is a transparent substrate formed on the anti-reflection film. The method of claim 5, The main substrate includes an antireflective film disposed to contact the second surface, The nano pattern is a transparent substrate formed on the anti-reflection film. In the method of manufacturing a transparent substrate disposed adjacent to the light source and made of a light transmissive material, Preparing a main substrate having a first surface facing the light source and a second surface facing the first surface; Applying a resist layer on the first surface; Forming a nanopattern on the resist layer formed on the first surface; Etching the first surface to form an antireflective nanopattern; Applying a resist layer to the second surface; Forming a nanopattern on the resist layer formed on the second surface; Etching the second surface to form an antireflective nanopattern; And Forming an ITO substrate disposed in contact with the first surface and having an anti-reflective nanopattern formed on a surface facing the light source; Method for producing a transparent substrate comprising a. delete The method of claim 7, wherein In the step of forming a nano-pattern on the resist layer formed on the first surface, A method for manufacturing a transparent substrate, wherein the nanopattern is formed by imprint lithography. The method of claim 7, wherein In the step of forming a nano-pattern on the resist layer formed on the second surface, A method for manufacturing a transparent substrate, wherein the nanopattern is formed by imprint lithography. The method of claim 7, wherein In the step of forming the antireflective nanopattern on the first surface and the step of forming the antireflective nanopattern on the second surface, the antireflective nanopattern is formed to have a pitch of 20nm to 500nm . The method of claim 7, wherein In the step of forming a nanopattern on the resist layer formed on the first surface and the step of forming a nanopattern on the resist layer formed on the second surface, The nanopattern is a method of manufacturing a transparent substrate is formed by any one method selected from injection molding, soft lithography, dry etching, wet etching, deposition, laser interference lithography.

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