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KR100780615B1 - Yaw guide deflection monitoring apparatus and method of exposure equipment - Google Patents

Yaw guide deflection monitoring apparatus and method of exposure equipment Download PDF

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KR100780615B1
KR100780615B1 KR1020010088744A KR20010088744A KR100780615B1 KR 100780615 B1 KR100780615 B1 KR 100780615B1 KR 1020010088744 A KR1020010088744 A KR 1020010088744A KR 20010088744 A KR20010088744 A KR 20010088744A KR 100780615 B1 KR100780615 B1 KR 100780615B1
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guide
yoga
stage
motor
abnormality
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KR20030058328A (en
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이창준
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엘지.필립스 엘시디 주식회사
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10—Measuring as part of the manufacturing process
    • H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Public Health (AREA)
  • Epidemiology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

본 발명은 노광장비의 요가이드의 휨 정도를 모니터링하는 장치 및 방법에 관한 것으로, 요가이드를 따라 이동하는 스테이지의 θ방향의 이상을 감지하는 단계와; 상기 θ방향의 이상이 감지된 경우 θ모터에 구동전류를 보내는 단계와; 상기 θ모터의 구동전류를 감지하여 요가이드의 휨 정도를 판정하는 단계를 포함하는 노광장치의 요가이드 휨 모니터링 방법 또는 이에 따른 장치를 제공한다.The present invention relates to a device and a method for monitoring the degree of bending of the yoga guide of the exposure equipment, comprising: detecting an abnormality in the θ direction of the stage moving along the yoga guide; Sending a driving current to the θ motor when the abnormality in the θ direction is detected; According to the present invention, there is provided a method for monitoring yoga warpage or an apparatus according to the exposure apparatus including sensing the driving current of the θ motor and determining the degree of warpage of the yoga guide.

이에 따라, 노광불량이 발생했을 때 오토콜리메이터(autocollimator)로 요가이드의 휨 정도를 측정하기 위해 노광장비를 세우고 생산을 중단하는 등의 생산손실을 줄일 수 있다.
As a result, when the exposure failure occurs, the production loss such as stopping the production by setting up the exposure equipment to measure the degree of bending of the yoga guide with the autocollimator (autocollimator).

Description

노광장비의 요 가이드 휨 모니터링장치 및 방법{Method and apparatus of monitoring bending of a yaw guide of a light-exposure apparatus} Method and apparatus of monitoring bending of a yaw guide of a light-exposure apparatus             

도 1은 통상의 노광장비의 개략 평면도이다.       1 is a schematic plan view of a conventional exposure apparatus.

도 2는 도 1의 스테이지의 개략 단면도이다.       2 is a schematic cross-sectional view of the stage of FIG. 1.

도 3은 노광장비의 요가이드가 휘었을 경우 간섭계가 이를 감지하는 상태를 도시한 개념도이다.3 is a conceptual diagram illustrating a state in which an interferometer detects the bending of the exposure equipment of the exposure apparatus.

도 4는 도 3의 노광장비의 요가이드가 휘었을 경우 스테이지를 보정하는 것을 도시한 개념도이다.4 is a conceptual diagram illustrating correcting a stage when the yoga guide of the exposure apparatus of FIG. 3 is bent.

도 5는 본 발명에 따른 모니터링 장치의 블록도이다.5 is a block diagram of a monitoring apparatus according to the present invention.

도 6은 도 5의 판정부에서 에러로 판정하는 기준을 나타낸 그래프이다.6 is a graph illustrating a criterion for determining that an error is determined by the determination unit of FIG. 5.

(도면의 부호에 대한 간단한 설명)(Short description of the signs in the drawings)

51, 52: θ간섭계 100: 스테이지51, 52: θ interferometer 100: stage

112: θ척 114: θ모터112: θ chuck 114: θ motor

210: 드라이브부 300: 판정부
210: drive unit 300: determination unit

본 발명은 노광장비에 관한 것으로, 보다 상세하게는 노광장비의 요가이드(yaw guide)의 휨에 대하여 감지할 수 있는 장치에 관한 것이다.The present invention relates to an exposure apparatus, and more particularly, to an apparatus capable of detecting the bending of the yaw guide of the exposure apparatus.

메모리 분야의 집적회로와 디스플레이분야의 스위칭소자에서는 박막을 이용하여 다수의 막을 형성하는 공정이 진행되고 있다. 이러한 박막형태의 구성소자들은 포토리소그라피(photolithography, "사진식각"이라고도 함)공정을 통해 원하는 패턴(pattern)을 형성하는 바, 이 공정은 증착과 마스크를 사용한 노광 및 식각공정으로 크게 이루어진다. 따라서 반드시 노광장비를 필요로 하게 되고, 이러한 포토리소그라피공정의 적용 범위는 점차 넓어지고 있다. BACKGROUND OF THE INVENTION In an integrated circuit in a memory field and a switching element in a display field, a process of forming a plurality of films using a thin film is in progress. These thin film elements form a desired pattern through a photolithography (also referred to as "photolithography") process, and the process is largely made of an exposure and an etching process using deposition and a mask. Therefore, the exposure equipment is necessarily required, and the application range of the photolithography process is gradually widening.

도 1은 이러한 포토리소그라피공정에 사용되는 노광장비의 개략평면도로서, 도시한 바와 같이, 기판(미도시)을 고정하여 움직이는 스테이지(stage)(100)와; Y-스테이지(Y-stage)(20), 상기 스테이지(100)의 이동을 가이드하는 요가이드(yaw guide)(10)가 있고, 스테이지(100)는 정반(30)위에서 이동하고 하고 있다.1 is a schematic plan view of an exposure apparatus used in such a photolithography process, as shown in the drawing, a stage 100 moving by fixing a substrate (not shown); There is a Y-stage 20 and a yaw guide 10 for guiding the movement of the stage 100, and the stage 100 is moving on the surface plate 30.

한편, 스테이지(100)에는 복수개의 바미러(bar mirror)(102)(104)가 설치되어 있으며, 이들은 스테이지(100)가 제대로 움직이고 있는지를 모니터링하는 역할을 한다. 즉, Y축 방향을 향하는 제 1 바미러(102)는 정반(30) 외부의 Y레이저간섭계(40)와 두 개의 θ레이저간섭계(51)(52)에 의해 스테이지(100)의 Y축방향의 움직임과 θ방향의 움직임을 모니터링하는 데 사용되며, X축방향을 향하는 제 2 바미러(104)는 X레이저간섭계(60)에 사용된다. 이러한 각 간섭계(40, 51, 52, 60)에 의해 모니터링된 스테이지(100)의 움직임에 이상이 있는 경우, 미도시된 각 모터에 의해 움직임이 보정된다. On the other hand, the stage 100 is provided with a plurality of bar mirrors (102, 104), which serves to monitor whether the stage 100 is moving properly. That is, the first bar mirror 102 facing the Y-axis direction is the Y-axis direction of the stage 100 by the Y laser interferometer 40 and the two laser interferometers 51 and 52 outside the surface plate 30. It is used to monitor the movement and the movement in the θ direction, and the second bar mirror 104 facing the X axis direction is used for the X laser interferometer 60. If there is an error in the movement of the stage 100 monitored by each of the interferometers 40, 51, 52, 60, the movement is corrected by each motor not shown.

한편, 도 2는 스테이지의 단면도로서, 본 발명에서 관심있는 θ방향의 보정과 관련된 부분만 설명하면, 기판(200)은 척(112)(chuck)에 의해 지지되고, 척(112)은 θ모터(114)에 의해 θ방향의 보정이 실시된다. 스테이지(도 1의 100)는 정반(도 1의 30)에 대하여 비 접촉식으로 이동하고 있으며, 이는 스테이지(도 1의 100)로부터 분출되는 공기압과 스테이지(도 1의 100)와 정반(도 1의 30) 사이의 자력으로 조절되고 있다. 도면 하부의 120, 130은 각각 에어분출구와 마그네틱을 지칭한다. On the other hand, Figure 2 is a cross-sectional view of the stage, when only the portion related to the correction of the θ direction of interest in the present invention, the substrate 200 is supported by the chuck 112 (chuck), the chuck 112 is the θ motor By 114, correction in the θ direction is performed. The stage (100 in FIG. 1) is moving in a non-contact manner with respect to the surface plate (30 in FIG. 1), which is the air pressure ejected from the stage (100 in FIG. 1) and the stage (100 in FIG. 1) and the surface plate (FIG. 1). Is controlled by magnetic force between 30 and 30). 120 and 130 in the lower part of the drawing refer to the air outlet and the magnetic, respectively.

또한 도 1에 도시한 바, 스테이지(100)는 X-스테이지(X-stage)(70)에 의해 비고정식으로 지지되고 있으며, X-스테이지(70) 역시 공기압과 자력을 이용하여 요가이드(10)와 비 접촉하고 있다. In addition, as shown in FIG. 1, the stage 100 is unfixedly supported by an X-stage 70, and the X-stage 70 also uses the air pressure and magnetic force to form the yoga guide 10. ) Is not in contact with

그런데 이러한 노광장비 중 요가이드(10)는 휘어지는 상황이 발생하는 바, 예를 들어 θ값의 원점복귀를 위한 초기화(initial)과정에서 에어패드의 공기압을 정지시키고 상기 X-스테이지(70)와 스테이지(100)을 요가이드(10)에 접촉하게 되고, 이때 150kg에 달하는 X-스테이지(70)와 스테이지(100)의 충격으로 요가이드(10)는 휘게되는 것이다. However, the yoga guide 10 of the exposure equipment is bent, for example, in the initialization (initial) process for returning to the origin of the θ value, the air pressure of the air pad is stopped and the X-stage 70 and the stage The yoga guide 10 is in contact with the yoga guide 10, and the yoga guide 10 is bent due to the impact of the X-stage 70 and the stage 100 that amounts to 150 kg.

종래의 이러한 요가이드(10)의 휨은 노광불량을 유발하고, 측정장비인 오토클리메이터(autocollimator)로 요가이드(10)의 휨 정도를 측정하기 위해 생산을 중단하고 측정하는 상황이 발생하고 있다. 또한, 요가이드(10)가 휘었을 경우 상기 θ간섭계(51)(52)를 통해 틀어진 양을 계산하여 상기 θ모터(114)가 구동됨으로써 상기 척(112)의 θ방향 보정을 실시하게 된다. Conventional warpage of the yoga guide 10 causes exposure failure, and a situation in which production is stopped and measured in order to measure the degree of bending of the yoga guide 10 with an autocollimator as a measuring device has occurred. . In addition, when the yoga guide 10 is bent, the θ motor 114 is driven by calculating a distorted amount through the θ interferometers 51 and 52 to perform the θ direction correction of the chuck 112.

도 3은 요가이드(10)가 휘었을 경우 θ레이저간섭계(51)(52)에 의해 휨이 감지되는 상태를 도시한 것이고, 거리가 일정치 이상 벗어나게 된 경우 θ가 발생되지 않도록 θ모터(114)를 구동하여 스테이지(100)를 구동하게 된다. 도 4는 이를 θ척(112)에 의해 보정된 상태를 나타낸 것이고, 이 때는 제 1 바미러((102)에 반사된 레이저는 간섭계(51)(52)로 수직 입사되는 것이다. 3 illustrates a state in which bending is sensed by the θ laser interferometers 51 and 52 when the yoga guide 10 is bent, and θ motor 114 so that θ does not occur when the distance is out of a predetermined value. ) To drive the stage 100. 4 shows the state corrected by the θ chuck 112, in which the laser reflected by the first bar mirror 102 is incident vertically into the interferometers 51 and 52.

그런데 이러한 종래의 요가이드(10) 휨 측정은, 요가이드(10)의 휨 정도를 정확히 예상할 수 없으며 결국엔 노광불량이 야기되었을 때, 생산을 중단하고 노광기를 세워야하는 문제점이 있다. 즉, 작업도중에 노광기를 세워서 조치하는 등 작업능률에 저하를 초래하는 문제점이 있다. By the way, the conventional yoga guide 10 warpage measurement, the degree of warpage of the yoga guide 10 can not be accurately predicted, there is a problem that stops the production and stop the exposure machine when the exposure failure is eventually caused. That is, there is a problem in that the work efficiency is lowered, for example, by standing and exposing the exposure machine during the work.

본 발명은 상기와 같은 종래기술의 문제점을 해결하기 위하여 안출된 것으로, 본 발명의 목적은 노광장비에서 요가이드의 휨을 예견하고 방지할 수 있는 모니터링방법 및 장치를 제공하는 것이다.      The present invention has been made to solve the problems of the prior art, it is an object of the present invention to provide a monitoring method and apparatus that can predict and prevent the bending of the yoga guide in the exposure equipment.

본 발명의 기타 장점이나 목적은 추후 설명하는 실시예를 통해 이해할 수 있을 것이다.
Other advantages or objects of the present invention will be understood through the embodiments described later.

본 발명은 상기 목적을 달성하기 위하여, θ간섭계와, 기판을 고정하여 이동 하는 스테이지와, 상기 스테이지를 가이드하는 요가이드와, θ간섭계의 의해 감지된 θ방향의 이상에 따라 전류를 공급하는 드라이버부와, 상기 드라이브부에서 전류를 공급받아 상기 스테이지의 θ방향의 이상을 보정하는 θ모터를 포함하는 노광장비의 상기 요가이드의 휨을 모니터링하기 위한 장치로서, 상기 드라이브부에서 상기 θ모터에 공급하는 θ모터 구동전류를 감지하여 전류값이 설정치 이상일 경우 이를 에러로 판정하는 제어부를 포함하는 모니터링 장치를 제공한다.In order to achieve the above object, the present invention provides a driver unit for supplying a current according to an θ interferometer, a stage for fixing and moving a substrate, a guide for guiding the stage, and an θ direction detected by the θ interferometer. And a device for monitoring the deflection of the yoga guide of the exposure apparatus including a motor which corrects an abnormality in the direction of the stage by receiving a current from the drive unit, wherein the drive unit supplies the motor to the motor. It provides a monitoring device including a control unit for detecting the motor drive current and determining that the current value is greater than or equal to the set value as an error.

상기 설정된 전류값은 상기 요가이드가 3초(1초=1/3600°)인 경우에 나타나는 전류값으로 정할 수 있다. The set current value may be determined as a current value that appears when the yaw is 3 seconds (1 second = 1/3600 °).

본 발명의 다른 측면에 따르면, 요가이드를 따라 이동하는 스테이지의 θ방향의 이상을 감지하는 단계와; 상기 θ방향의 이상이 감지된 경우 θ모터에 구동전류를 보내는 단계와; 상기 θ모터의 구동전류를 감지하여 요가이드의 휨 정도를 판정하는 단계를 포함하는 노광장치의 요가이드 휨 모니터링 방법을 제공한다.
According to another aspect of the invention, the step of detecting the abnormality of the θ direction of the stage moving along the yoga guide; Sending a driving current to the θ motor when the abnormality in the θ direction is detected; The present invention provides a method for monitoring the warpage of the yaw of the exposure apparatus, including the step of sensing the drive current of the motor to determine the degree of warpage of the yaw.

이하, 본 발명에 따른 바람직한 실시예를 첨부한 도면을 참조하여 상세히 설명한다.Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings.

도 5는 본 발명에 따른 모니터링 장치의 블록도이다. 도 1, 2에 도시된 요소와 동일, 유사한 것은 동일, 유사한 부호를 부여하였다. 도시한 바와 같이, 바미러(102)를 통해 θ레이저간섭계(51)(52)가 드라이브부(210)에 구동량을 지정하게 된다. 이때 실제로 θ레이저간섭계(51)(52)의 감지값은 장비의 CPU(300)에 의해 구동량이 정해진다. 이에 따라 드라이브부(210)는 결정된 전류값을 θ모터(114)에 인가하게 되는 바, 이때 이 값이 CPU(300)에서 설정치를 벗어나는 지를 판단하여 요가이드의 휨정도를 판단한다. 이 CPU(300)를 이 발명에서는 에러판정에 이용되므로, 판정부(300)라 칭한다.5 is a block diagram of a monitoring apparatus according to the present invention. The same, similar elements as those shown in Figs. 1 and 2 are given the same and similar reference numerals. As shown in the drawing, the? Laser interferometers 51 and 52 designate a driving amount to the drive unit 210 through the bar mirror 102. At this time, the detection value of the θ laser interferometers 51 and 52 is determined by the CPU 300 of the equipment. Accordingly, the drive unit 210 applies the determined current value to the θ motor 114. At this time, it is determined whether the value deviates from the set value in the CPU 300 to determine the degree of bending of the yoga guide. Since this CPU 300 is used for error determination in this invention, it is called the determination part 300. FIG.

통상적으로 요가이드를 휨이 3초(1초=1/3600°) 이상인 경우에는 에러로 판정하므로, 이에 해당되는 전류치를 설정치로 한다.In general, if the bending is more than 3 seconds (1 second = 1/3600 °), it is determined as an error, so the current value corresponding thereto is set.

도 6은 판정부(300)에서 감지된 전류값을 나타낸 그래프로서, 도시한 바와 같이, θ방향으로 (+)(-)를 구동하는 전류값이 변하고 있는 데 이 값이 설정치(310)(320) 이상으로 변하게 되면 에러로 판정하는 것이다.FIG. 6 is a graph showing the current value sensed by the determination unit 300. As shown in the figure, the current value for driving (+) (-) in the θ direction is changed, which is the set value 310 (320). If more than), it is determined as an error.

이상에서 본 발명에 따른 바람직한 실시예를 설명하였으나, 이는 예시이며, 본 발명의 정신을 벗어나지 않고 다양한 변화와 변형이 가능할 것이나, 이러한 다양한 변화와 변형이 본 발명의 권리범위를 벗어나지 않는다는 것은 첨부된 청구범위를 통해 이해할 수 있을 것이다.
Although the preferred embodiments according to the present invention have been described above, these are only examples, and various changes and modifications may be made without departing from the spirit of the present invention, but the various changes and modifications do not depart from the scope of the present invention. You can understand it through the scope.

본 발명으로 인하여 노광장비의 요가이드의 휨정도를 신속하게 파악하여 보정할 수 있음으로, 노광장비 사용중 정지하여 교체하는 등의 작업중단사태를 예방할 수 있다.Due to the present invention, it is possible to quickly grasp and correct the degree of bending of the yoga guide of the exposure equipment, thereby preventing work interruption such as stopping and replacing the exposure equipment during use.

또한, 본 발명은 요가이드의 휨 정도를 미리 예측하고 방지함으로써 작업중 요가이드의 휨에 의한 조치시간(약 3일정도)을 절약하여 가동률 향상에 기여할 수 있다. In addition, the present invention can contribute to improving the operation rate by saving the action time (about 3 days) due to the bending of the yoga guide during operation by predicting and preventing the bending degree of the yoga guide in advance.

Claims (3)

θ간섭계와, 기판을 고정하여 이동하는 스테이지와, 상기 스테이지를 가이드하는 요가이드와, θ간섭계의 의해 감지된 θ방향의 이상에 따라 전류를 공급하는 드라이버부와, 상기 드라이브부에서 전류를 공급받아 상기 스테이지의 θ방향의 이상을 보정하는 θ모터를 포함하는 노광장비의 상기 요가이드의 휨을 모니터링하기 위한 장치로서, a θ interferometer, a stage for fixing and moving the substrate, a guide for guiding the stage, a driver unit for supplying current according to an abnormality in the θ direction sensed by the θ interferometer, and a current supplied from the drive unit An apparatus for monitoring the deflection of the yoga guide of the exposure equipment comprising a θ motor for correcting the abnormality in the θ direction of the stage, 상기 드라이브부에서 상기 θ모터에 공급하는 θ모터 구동전류를 감지하여 전류값이 설정치 이상일 경우 이를 에러로 판정하는 판정부를 포함하는 모니터링 장치A monitoring device including a determination unit which detects the θ motor driving current supplied from the drive unit to the θ motor and determines it as an error when the current value is greater than or equal to a set value 제 1 항에 있어서,The method of claim 1, 설정된 전류값은 상기 요가이드가 3초(1초=1/3600°)인 경우에 나타나는 전류값인 모니터링 장치The set current value is a monitoring device which is a current value that appears when the yoga guide is 3 seconds (1 second = 1/3600 °). 요가이드를 따라 이동하는 스테이지의 θ방향의 이상을 감지하는 단계와; Detecting an abnormality in the θ direction of the stage moving along the yayoid; 상기 θ방향의 이상이 감지된 경우 θ모터에 구동전류를 보내는 단계와; Sending a driving current to the θ motor when the abnormality in the θ direction is detected; 상기 θ모터의 구동전류를 감지하여 요가이드의 휨 정도를 판정하는 단계Determining the deflection degree of the yoke by sensing the drive current of the θ motor 를 포함하는 노광장치의 요가이드 휨 모니터링 방법 Yoga guide bending monitoring method of exposure apparatus including a
KR1020010088744A 2001-12-31 2001-12-31 Yaw guide deflection monitoring apparatus and method of exposure equipment Expired - Fee Related KR100780615B1 (en)

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10207551A (en) * 1997-01-20 1998-08-07 Canon Inc Precise xytheta stage
JPH11207559A (en) * 1998-01-26 1999-08-03 Canon Inc Linear stage device
JP2001143984A (en) * 1999-11-16 2001-05-25 Canon Inc Positioning apparatus

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10207551A (en) * 1997-01-20 1998-08-07 Canon Inc Precise xytheta stage
JPH11207559A (en) * 1998-01-26 1999-08-03 Canon Inc Linear stage device
JP2001143984A (en) * 1999-11-16 2001-05-25 Canon Inc Positioning apparatus

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