KR100631116B1 - Organic Electro Luminescence Device and Method Fabricating Thereof - Google Patents

Abstract

The present invention relates to an organic electroluminescent device capable of simplifying the process and a method of manufacturing the same.

The organic electroluminescent device according to the present invention comprises a transparent electrode formed on a substrate; An insulating film formed on the transparent electrode; Barrier ribs formed on the insulating film; An organic light emitting layer formed on the transparent electrode except for the region where the insulating film is formed; A metal electrode is formed on the organic light emitting layer, and the insulating film and the partition wall are formed at the same time.

Description

Organic electroluminescent device and method of manufacturing the same {Organic Electro Luminescence Device and Method Fabricating Thereof}             

1 is a plan view showing a conventional organic electroluminescent device.

FIG. 2 is a cross-sectional view illustrating an organic electroluminescent device taken along a line "A-A '" in FIG. 1. FIG.

FIG. 3 is a cross-sectional view illustrating an organic electroluminescent device taken along a line “B-B ′” in FIG. 1.

4A to 4E are cross-sectional views illustrating a method of manufacturing the organic electroluminescent device shown in FIG. 3.

5 is a cross-sectional view showing an organic light emitting display device according to the present invention.

6A to 6E are cross-sectional views illustrating a method of manufacturing the organic electroluminescent device shown in FIG. 5.

FIG. 7 is a cross-sectional view illustrating a diffraction mask capable of simultaneously forming the insulating film and the partition wall shown in FIG. 5. FIG.

8A to 8F are cross-sectional views illustrating another method of manufacturing the organic electroluminescent device shown in FIG. 5.

<Explanation of symbols for the main parts of the drawings>

2,32 substrate 4,34 transparent electrode

6,36 insulating film 8,38 partition wall

10,40 organic light emitting layer 12,42 cathode electrode

The present invention relates to an electroluminescent device, and more particularly, to an organic electroluminescent device and a method of manufacturing the same, which can simplify the process.

Recently, various flat panel displays have been developed to reduce weight and volume, which are disadvantages of cathode ray tubes. Such flat panel displays include liquid crystal displays (hereinafter referred to as "LCD"), field emission displays (hereinafter referred to as "FED"), plasma display panels (hereinafter referred to as "PDP"). And electroluminescent devices (hereinafter referred to as "ELD"). In particular, ELD is basically formed by attaching electrodes to both sides of an EL layer including a hole transport layer, a light emitting layer, and an electron transport layer, and is attracting attention as a next-generation flat panel display because of its wide viewing angle, high opening ratio, and high color.

These ELDs are largely divided into inorganic ELDs and organic ELDs depending on the materials used. Among them, the organic ELD has the advantage of being able to be driven at a lower voltage than the inorganic ELD because when the charge is injected into the organic EL layer formed between the hole injection electrode and the electron injection electrode, electrons and holes are paired up and extinguished to emit light. . In addition, organic ELDs can form devices on flexible flexible substrates, such as plastics, and can be driven at lower voltages of 10V or less than PDPs or inorganic ELDs, and have a relatively low power consumption. This is excellent.

The ELD is divided into a passive ELD and an active ELD according to a driving method.

1 is a plan view showing an upper substrate of a general ELD. 2 and 3 are cross-sectional views illustrating ELDs cut along the lines "A-A '" and "B-B'" in FIG. 1, respectively.

1 to 3, the ELD is a transparent electrode 4 arranged in a stripe shape on the substrate 2, a bus electrode 14 formed on one side of the transparent electrode 4, and transparent. An insulating film 6 formed to cover the edge portion of the electrode 4, an organic electroluminescent layer (hereinafter referred to as "EL layer", 10) formed by laminating a hole transporting layer, a light emitting layer, and an electron transporting layer on the insulating film 6; A metal electrode 12 is provided on the EL layer 10 in the form of a strip and intersects with the transparent electrode 4. In addition, a partition 8 formed in a stripe shape between the metal electrodes 12 is provided to separate the metal electrodes 12.

The organic ELD emits electrons and holes when a driving signal is applied to the transparent electrode 4 as the anode and the metal electrode 12 as the cathode, and the electrons and holes emitted from the transparent electrode 4 and the metal electrode 12 Recombination in the EL layer 10 generates visible light. At this time, the generated visible light comes out through the transparent electrode 4 to display a predetermined image or image.

4A to 4E are cross-sectional views illustrating a method of manufacturing the ELD shown in FIG. 3.

Referring to FIG. 4A, a transparent electrode 4 is formed by depositing and patterning a transparent conductive material, indium-tin-oxide, or the like on a substrate 2 made of soda lime or hardened glass. Is formed.

A bus electrode (not shown) is formed by depositing chromium (Cr) or the like on the substrate 2 on which the transparent electrode 4 is formed and patterning the same. The bus electrode (not shown) is formed on one side of the transparent electrode 4 to serve to reduce the resistance component of the transparent electrode 4.

Referring to FIG. 4B, a positive photosensitive insulating material is deposited on the substrate 2 on which the transparent electrode 4 and the bus electrode are formed, and then an insulating layer 6 is formed by an exposure and development process. The insulating film 6 is formed in a lattice shape on all portions except the light emitting region.

Referring to FIG. 4C, after the negative photosensitive insulating material is deposited on the substrate 2 on which the insulating film 6 is formed, the partition wall 8 is formed by an exposure and development process. The partition 8 is formed in the non-light emitting region with a predetermined interval therebetween in a direction crossing the transparent electrode 4.

Referring to FIG. 4D, the EL layer 10 is entirely deposited on the substrate 2 on which the partition wall 8 is formed. The EL layer 10 is formed by stacking a hole transport layer, an emitting layer, and an electron transport layer.

Referring to Fig. 4E, the cathode electrode 12 is entirely deposited on the substrate 2 on which the EL layer 8 is formed. At this time, the cathode electrode 12 is collectively deposited on the entire surface of the light emitting effective surface without any particular shape, but is separated from the adjacent cathode electrode 12 by the partition 8 in a stripe shape before.

A total of four mask processes are required to form a conventional ELD. That is, in order to form the transparent electrode 4, the bus electrode 14, the insulating film 6, and the partition 8, respectively, four mask process numbers are required. In addition, each process requires a process of applying photoresist (PR), mask alignment, exposure, and development, and if the number of mask processes is large, the process and processing time are increased when patterning each layer, and productivity and yield are increased. Degrades. Therefore, studies have recently been actively conducted to simplify the process even if the number of mask processes is reduced or the same number of mask processes is used.

Accordingly, an object of the present invention relates to an organic electroluminescent device and a method of manufacturing the same, which can reduce the number of mask processes or simplify the process.

In order to achieve the above object, the organic electroluminescent device according to the present invention comprises a transparent electrode formed on a substrate; An insulating film formed on the transparent electrode; Barrier ribs formed on the insulating film; An organic light emitting layer formed on the transparent electrode except for the region where the insulating film is formed; A metal electrode is formed on the organic light emitting layer, and the insulating film and the partition wall are formed at the same time.

The insulating film and the partition wall are formed of the same photosensitive material.

In order to achieve the above object, a method of manufacturing an organic electroluminescent device according to the present invention comprises the steps of forming a transparent electrode on the substrate; Depositing a photosensitive insulating material on the substrate on which the transparent electrode is formed; Exposing and developing the photosensitive insulating material to simultaneously form a barrier rib and an insulating film.

The method of manufacturing an organic light emitting display device may include forming an organic light emitting layer on a transparent electrode except for a region where an insulating film is formed; Forming a metal electrode on the organic light emitting layer is characterized in that it comprises.

Simultaneously forming the barrier rib and the insulating layer is formed by patterning the photosensitive insulating material using a half-turn mask or a diffraction mask.

Simultaneously forming the barrier rib and the insulating layer may include exposing the photosensitive insulating material to a first mask; Secondarily exposing the first exposed photosensitive insulating material to the second mask; And developing the second exposed photosensitive insulating material.

The blocking part of the first mask is a region corresponding to the insulating film. The blocking part of the second mask is an area corresponding to the partition wall.

Other objects and features of the present invention in addition to the above object will be apparent from the description of the embodiments with reference to the accompanying drawings.

Hereinafter, exemplary embodiments of the present invention will be described with reference to FIGS. 5 to 8F.

5 is a cross-sectional view showing an organic electroluminescent device according to the present invention.

Referring to FIG. 5, an organic light emitting display device includes a transparent electrode 34 arranged in a stripe shape on a substrate 32, an insulating layer 36 formed to cover an edge portion of the transparent electrode 34, and An organic electroluminescent layer (hereinafter referred to as an "EL layer") 40 formed by stacking a hole transporting layer, a light emitting layer, and an electron transporting layer on the insulating film 36 intersects with the transparent electrode 34 on the EL layer 40 and has a stripe shape. The metal electrode 42 is provided. In addition, a partition 38 formed in a stripe shape between the metal electrodes 42 is provided to separate the metal electrodes 42.

The organic ELD emits electrons and holes when a driving signal is applied to the transparent electrode 34 as the anode and the metal electrode 42 as the cathode, and the electrons and holes emitted from the transparent electrode 34 and the metal electrode 42 Recombination in the EL layer 40 generates visible light. At this time, the generated visible light comes out through the transparent electrode 34 to display a predetermined image or image.

The barrier rib 38 and the insulating layer 36 of the organic ELD according to the present invention may be formed of the same material at the same time, thereby reducing the number of mask processes, thereby reducing the production cost and processing time.

6A to 6E are sectional views showing the manufacturing method of the organic EL element shown in FIG.

Referring to FIG. 6A, a transparent conductive material is deposited on a substrate 32 of soda lime or hardened glass. The transparent conductive material is formed of any one of Indium-Tin-Oxide, Indium-Zinc-Oxide, and Indium-Tin-Zinc-Oxide. do. Subsequently, the transparent electrode 34 is formed by patterning the transparent conductive material in a photolithography process including an etching process. Subsequently, a bus electrode (not shown) is formed by depositing chromium (Cr) or the like on the substrate 32 on which the transparent electrode 34 is formed and then patterning the same. The bus electrode is formed on one side of the transparent electrode 34 to reduce the resistance of the transparent electrode 34.

Referring to FIG. 6B, a photosensitive insulating material 37 is deposited on the substrate 32 on which the transparent electrode 34 and the bus electrode are formed by spin coating. The halftone mask 50 is positioned on the photosensitive insulating material 37. The halftone mask 50 includes a blocking portion 50a, a semi-transmissive portion 50b and a transmissive portion 50c. The blocking part 50a is located in an area to be formed as a partition wall later, the transflective part 50b is located in an area in which an insulating film is to be formed, and the transmissive part 50c is located in another area.

Alternatively, the diffraction mask 60 is positioned on the photosensitive insulating material 37 as shown in FIG. 7. The diffraction mask 60 is composed of a blocking portion 60a, a diffraction portion 60b and a transmission portion 60c. The blocking portion 60a is located in a region where a barrier rib is to be formed later, the diffraction portion 60b is located in a region where an insulating film is to be formed, and the transmission portion 60c is located in a region other than that.

The photosensitive insulating material 37 is exposed and developed using the half-turn mask 50 or the diffraction mask 60. Since the photosensitive insulating material 37 exhibits different photosensitivity according to the energy wavelength band, the partition wall 38 having the first coating thickness is formed as shown in FIG. 6C in the region corresponding to the blocking portions 50a and 60a. In the region corresponding to the semi-transmissive portion 50b or the diffractive portion 60b, an insulating film 36 having a thickness of about 10 to 50% of the initial coating thickness is formed.

Referring to Fig. 6D, the EL layer 40 is entirely deposited on the substrate 32 on which the insulating film 36 and the partition wall 38 are formed at the same time. The EL layer 40 is formed by stacking a hole transport layer, an emitting layer, and an electron transport layer.

Referring to Fig. 6E, the cathode electrode 42 is entirely deposited on the substrate 32 on which the EL layer 40 is formed. At this time, the cathode electrode 42 is collectively deposited on the entire surface of the light emitting effective surface without any particular shape, but is separated from the adjacent cathode electrode 42 by the partition 38 in a stripe shape before.

8A to 8F are cross-sectional views showing another method for manufacturing the organic EL device according to the present invention, which simplifies the process.

Referring to FIG. 8A, a transparent conductive material is deposited on a substrate 32 made of soda lime or hardened glass. The transparent conductive material is formed of any one of Indium-Tin-Oxide, Indium-Zinc-Oxide and Indium-Tin-Zinc-Oxide. do. Subsequently, the transparent electrode 34 is formed by patterning the transparent conductive material in a photolithography process including an etching process. Subsequently, a bus electrode (not shown) is formed by depositing chromium (Cr) or the like on the substrate 32 on which the transparent electrode 34 is formed and then patterning the same. The bus electrode is formed on one side of the transparent electrode 34 to reduce the resistance of the transparent electrode 34.

Referring to FIG. 8B, a photosensitive insulating material 37 is formed on the substrate 32 on which the bus electrode and the transparent electrode 34 are formed. The first mask 70 is positioned on the photosensitive insulating material 37. The blocking part 70a of the first mask 70 is located in an area where an insulating material is to be formed later, and the transmission part 70b is located in another area. The photosensitive insulating material 37 is first exposed using the first mask 70 and UV light.

Referring to FIG. 8C, a second mask 72 is positioned on the first exposed photosensitive insulating material 37b. The blocking portion 72a of the second mask 72 is located in the region where the partition wall will be formed later, and the transmissive portion 72b is located in the other region. That is, the blocking portion 72a is positioned on the unexposed photosensitive insulating material 37a, and the transmissive portion 72b is positioned on the first exposed photosensitive insulating material 37b. By using the second mask 72 and UV light, the first exposed photosensitive insulating material is secondly exposed. By developing the secondary exposed photosensitive insulating material, the partition 38 and the insulating film 36 are simultaneously formed as shown in FIG. 8D.

Referring to Fig. 8E, the EL layer 40 is entirely deposited on the substrate 32 on which the insulating film 36 and the partition wall 38 are formed at the same time. The EL layer 40 is formed by stacking a hole transport layer, an emitting layer, and an electron transport layer.

Referring to Fig. 8F, the cathode electrode 42 is entirely deposited on the substrate 32 on which the EL layer 40 is formed. At this time, the cathode electrode 42 is collectively deposited on the entire surface of the light emitting effective surface without any particular shape, but is separated from the adjacent cathode electrode 42 by the partition 38 in a stripe shape before.

As described above, the organic electroluminescent device and the manufacturing method thereof according to the present invention simultaneously form an insulating film and a partition wall. That is, in the first embodiment of the present invention, the manufacturing process time can be reduced by reducing the number of conventional mask processes to three. In addition, in the second embodiment of the present invention, even if the number of mask processes is used four times, the exposure is performed using the first mask, followed by the exposure using the second mask, followed by development at the same time. It can reduce the cost of materials including developer, and reduce the investment of photo line and exposure equipment by 25%. Accordingly, the cost of the manufacturing panel can be reduced. In addition, by forming the insulating film and the partition wall from the same material, the matching stability at the interface between the insulating film and the partition wall can be improved.

Those skilled in the art will appreciate that various changes and modifications can be made without departing from the technical spirit of the present invention. Therefore, the technical scope of the present invention should not be limited to the contents described in the detailed description of the specification but should be defined by the claims.

Claims (8)

A transparent electrode formed on the substrate; An insulating film formed on the transparent electrode; Barrier ribs formed on the insulating film; An organic light emitting layer formed on the transparent electrode except for the region where the insulating layer is formed; It includes a metal electrode formed on the organic light emitting layer, And the insulating film and the partition wall are simultaneously formed. The method of claim 1, And the insulating film and the partition wall are formed of the same photosensitive material. Forming a transparent electrode on the substrate; Depositing a photosensitive insulating material on the substrate on which the transparent electrode is formed; Exposing and developing the photosensitive insulating material to simultaneously form a barrier rib and an insulating film. The method of claim 3, wherein Forming an organic light emitting layer on the transparent electrode except for the region where the insulating film is formed; The method of manufacturing an organic electroluminescent device comprising the step of forming a metal electrode on the organic light emitting layer. The method of claim 3, wherein Simultaneously forming the barrier rib and the insulating layer The photosensitive insulating material is formed by patterning by using a half-turn mask or a diffraction mask manufacturing method of an organic electroluminescent device. The method of claim 3, wherein Simultaneously forming the barrier rib and the insulating layer Firstly exposing the photosensitive insulating material with a first mask; Secondarily exposing the first exposed photosensitive insulating material to a second mask; And developing the second exposed photosensitive insulating material. The method of claim 6, The blocking portion of the first mask is a method of manufacturing an organic electroluminescent device, characterized in that the region corresponding to the insulating film. The method of claim 6, The blocking portion of the second mask is a method of manufacturing an organic electroluminescent device, characterized in that the area corresponding to the partition wall.

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