KR100625320B1 - Functional water supply device of substrate cleaning equipment - Google Patents

Abstract

The present invention relates to an apparatus for supplying functional water in which gas is dissolved in a facility for cleaning a substrate. Functional water supply device of the present invention is a liquid supply; Gas supply unit; An injector receiving liquid and gas from the liquid supply part and the gas supply part, and dissolving the gas in the liquid firstly; The gas discharged from the injector may be supplied with a functional water dissolved therein may include a contactor for promoting the dissolution of the gas. According to this invention, it can produce and supply a high concentration of functional water. In addition, since a plurality of functional water is sequentially supplied from one apparatus to clean the substrate W, the time required for the process may be shortened and the area occupied by the facility may be reduced as compared with the general case.

Description

Functional water supply device of substrate cleaning equipment {APPARATUS FOR SUPPLYING FUNCTIONAL WATER OF SUBSTRATE CLEANING EQUIPMENT}

1 is a block diagram showing a substrate cleaning facility having a functional water supply device according to a first preferred embodiment of the present invention;

2 is a block diagram showing an example of the gas supply unit shown in FIG.

3 and 4 are schematic diagrams showing a substrate cleaning apparatus having a functional water supply apparatus according to a second preferred embodiment of the present invention.

* Explanation of symbols for the main parts of the drawings

110: functional water supply device

112: liquid supply

120: gas supply unit

130: injector

140: contactor

150: storage tank

160: return member

The present invention relates to an apparatus for supplying functional water in which gas is dissolved in a facility for cleaning a substrate.

The process of cleaning the semiconductor substrate W to remove residual chemicals, small particles, contaminants, etc. generated during various manufacturing processes when the semiconductor substrate W is manufactured as an integrated circuit. This is necessary. In particular, when manufacturing a highly integrated integrated circuit, a cleaning process for removing fine contaminants adhering to the surface of the semiconductor substrate W is very important.

Recently, various functional waters (hydrogen water, oxygen water, etc.) have been used as the cleaning liquid for cleaning the substrate W. In general, there are two methods of generating a small number of water, electrolysis and gas mixing. However, the electrolysis method may cause metal contamination and particle generation because the electrode contacts ultrapure water, and the gas mixing method has a very low dissolution rate. There is a clear limitation that high concentration of dissolved hydrogen cannot be obtained.

In addition, the existing cleaning facility is provided with a plurality of devices according to the type of functional water, the substrate W is sequentially transferred to each device, the process is performed. Due to the structure described above, the time required for the process is long, and the equipment is enlarged.

An object of the present invention is to provide a functional water supply apparatus of a new type of semiconductor manufacturing equipment capable of producing and supplying a high concentration of functional water. Another object of the present invention is to provide a functional water supply apparatus of a new type of semiconductor manufacturing equipment which produces various functional water in one apparatus and can perform substrate W cleaning sequentially using these functional water. .

Functional water supply apparatus of the present invention for achieving the above technical problem is a liquid supply unit; Gas supply unit; An injector receiving liquid and gas from the liquid supply part and the gas supply part, and dissolving the gas in the liquid firstly; The gas discharged from the injector may be supplied with a functional water dissolved therein may include a contactor for promoting the dissolution of the gas.

According to an embodiment of the present invention, the injector includes a liquid inlet end into which the liquid is introduced, a gas inlet end into which gas is introduced, and a mixed outlet end from which functional water in which gas is dissolved is discharged. The functional water mixed with gas may be injected at a high pressure by the pressure difference between stages.

According to an embodiment of the invention, the contactor has an inlet and outlet and the body having an inner space; Fine apertures may comprise perforations and diaphragms installed in the interior space of the body.

According to an embodiment of the invention, the contactors are connected in series with each other.

According to an embodiment of the present invention, the functional water supply apparatus includes a storage tank storing functional water discharged from the contactors; And a return member for returning the functional water stored in the storage tank to the injector when the gas dissolution rate of the functional water stored in the storage tank is equal to or less than a predetermined concentration.

According to an embodiment of the present invention, the return member includes a measuring device for measuring the gas concentration of the functional water stored in the storage tank; A return line having one end connected to the storage tank and the other end connected to a supply line through which liquid is supplied from the liquid supply unit to the injector; And a return pump installed at the return line.

According to an embodiment of the present invention, the measuring device is installed in a circulation line for circulating the functional water of the storage tank. According to an embodiment of the present invention, the gas supply unit includes gas reservoirs each of which stores a plurality of gases; And a regulator for selectively adjusting at least one of the gas reservoirs to be supplied to the injector.

According to an embodiment of the present invention, the pressure gauge further includes a pressure gauge and a pressure gauge installed in a line between the contactors and the storage tank to adjust the pressure of the contactors.

According to an embodiment of the present invention, the liquid supply unit includes a supply pipe for supplying deionized water, wherein one of the plurality of gases is hydrogen, another is oxygen, another is oxygen, and another is nitrogen Can be.

Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings. However, the present invention is not limited to the embodiments described herein and may be embodied in other forms. Rather, the embodiments introduced herein are provided to ensure that the disclosed subject matter is thorough and complete, and that the spirit of the present invention to those skilled in the art will fully convey. Portions denoted by like reference numerals denote like elements throughout the specification.

1 is a block diagram showing a substrate cleaning apparatus having a functional water supply apparatus according to a first embodiment of the present invention. FIG. 2 is a diagram illustrating an example of a gas supply unit illustrated in FIG. 1.

1 and 2, the substrate cleaning facility 100 according to the present invention has a support plate 190 on which an object is placed. The object may be a substrate used for manufacturing a semiconductor device such as a silicon wafer (W) or a glass substrate. A support shaft 192 supporting the support plate 190 is coupled below the support plate 190, and the support shaft 192 may be rotated by the motor 194. On the support plate 190, a functional water supply device 110 for supplying functional water (fluid) for cleaning to the substrate W is disposed.

The functional water supply device 110 includes a liquid supply part 112, a gas supply part 120, an injector 130, a contactor 140, and an injector 170.

The gas supply part 120 is connected to the suction end 134 of the injector 130, and the liquid supply part 112 is connected to the input end 132 of the injector. The liquid (deionized water) of the liquid supply unit 112 is sucked into the injector 130 by a pressure pump and mixed with a gas supplied through the suction end 134 of the injector, and the functional water thus formed is It is supplied to the contactor 140 through the mixed discharge end (136).

The liquid supply part 112 has a supply pipe 116 for supplying a liquid from the ultrapure water source 114 to the injector 300. The supply pipe 116 is provided with a valve 118 that opens and closes the inside or regulates the flow rate of the liquid flowing therein. The supply pipe 116 may be provided with a degassing device (not shown) for removing impurities such as nitrogen or oxygen contained in the liquid. If nitrogen or oxygen is contained in the liquid, the dissolved rate of the gas to be dissolved in the liquid is substantially lowered. The degassing device is to prevent this. Reference numeral 119 is a supply pump.

The functional water supply device 110 is a plurality of functional water is produced according to the type of gas supplied to the injector 130, respectively, the first functional water, the second functional water, ... It is called nth functional number. The gas supply unit 120 includes a first gas supply pipe 122a through which the first gas is supplied from the first gas supply source 122, and a second gas supply pipe 124a through which the second gas is supplied from the second gas supply source 124. ,… And an nth gas supply pipe to which the nth gas is supplied from the nth gas supply source. The first gas supply pipe 542, the second gas supply pipe 544,. Each of the nth gas supply pipes is provided with valves 122b, 124b, and 126b for opening and closing the inner passage and adjusting a flow rate flowing therein. Each valve may be a manual valve operated manually by an operator or an electrically controllable solenoid valve. The gas supply unit 120 may include the first gas, the second gas,... And a regulator 128 that allows only selected gases of the nth gas to be supplied to the injector 130. The regulator 128 may be the above-described valve installed in each of the supply pipes 122a, 124a, and 126a when the valves 122b, 124b, and 126b are operated manually. Alternatively, as shown in FIG. 2, when the valves 122b, 124b and 126b are electrically operated, the regulator 128 may be an apparatus 128 for controlling opening and closing of the valves 122b, 124b and 126b.

In this embodiment, the case where three functional water is used for a process is demonstrated as an example. The first functional water, the second functional water, and the third functional water are hydrogen water, ozone water, and oxygen water, respectively. Hydrogen water is effective for removing reducing organic matter attached to the substrate W, and oxygen water and ozone water are effective for removing oxidative organic matter and particles attached to the substrate W. In this case, the liquid is deionized water, and the first gas, the second gas, and the third gas are hydrogen, ozone, and oxygen, respectively.

The gas supply unit 120 includes a main supply pipe 121 connected to the suction end 134 of the injector, and includes a first gas supply pipe 122a, a second gas supply pipe 124a, and a third gas supply pipe 126a. And, where the main supply pipe 121 is connected, a four-way valve (four-way valve) may be installed. Optionally, the first gas supply pipe 122a, the second gas supply pipe 124a, and the third gas supply pipe 126a may be directly connected to the injector 130.

In the above-described embodiment, hydrogen water, ozone water, and oxygen water are taken as functional water. However, in the present embodiment, the number and type of functional water is only one example and may be variously changed. For example, the first functional water and the second functional water may be used, the first functional water may be hydrogen water, and the second functional water may be oxygen water or ozone water.

The functional water passing through the injector 130 (priorly mixed with gas and ultrapure water) is supplied to the contactor 140. The contactor 140 serves to improve the dissolution rate of the gas by passing the liquid (functional water) mixed with the gas. The contactor 140 has a body 142 having an inlet and an outlet, and the diaphragm 144 is installed in the inner space of the body, and the minute holes 146 are perforated in the diaphragm 144. The functional water introduced into the body through the inlet 142a is expanded and moved to the through holes 146 of the diaphragms, and is discharged to the outlet 142b after the secondary mixing is stored in the storage tank 150. As the functional water passes through the minute holes of the contactor 140, the gas dissolves in the ultrafine bubble state in the ultrapure water, thereby improving the gas dissolution rate in the ultrapure water.

Functional water generated through the injector 130 and the contactor 140 and stored in the storage tank 150 is supplied to the injector 170 through the supply pipe 172. The supply pipe 172 is provided with a valve 174 for opening and closing the passage or adjusting the flow rate. The injector 170 injects the functional water supplied from the storage tank 150 onto the substrate W.

3 is a block diagram showing a substrate cleaning apparatus having a functional water supply apparatus according to a second preferred embodiment of the present invention.

The functional water supply device 110 ′ of the present invention shown in FIG. 3 includes a liquid supply part 112 and a gas supply part having the same configuration and function as the functional water supply device 110 according to the first embodiment shown in FIG. 1. 120, an injector 130, contactors 140, a storage tank 150, and an injector 170, which have been described in detail above, and thus will be omitted in the present embodiment. .

However, in the present embodiment, in order to improve the dissolution rate of the ultrapure water of the gas has the following structural features. First, although only one contactor is used in the first embodiment, in the present embodiment, two contactors 140 are connected and used in series. Second, it has a pressure adjusting unit 180 for applying the pressure of the contactor 140. The pressure regulating unit 180 includes a pressure gauge 182, a pressure regulating valve 184, and a controller 186 installed at the connection line 188 connecting the contactor 140 and the storage tank 150. . As described above, in this embodiment, when the pressure in the contactor 140 is greater than the partial pressure of the gas, the dissolution rate of the gas into ultrapure water can be improved. As such, the contactor 140 is maintained at a pressure of about 1.5 to 3 kfg / cm 2 by the pressure regulator. Third, when the gas dissolution rate (concentration) of the functional water stored in the storage tank 150 is less than or equal to a predetermined concentration, the functional water supply device 110 ′ of the present embodiment injects 130 ) And a return member 160 to pass through the contactors 140 again. The return member 160 includes a measuring device 162 for checking the gas concentration of the storage tank 150, a return line 164 connecting the storage tank and the liquid supply pipe, and a return pump 166 installed at the return line. Include. The measuring device 162 is installed in the circulation line 152 connected to the storage tank to measure the gas concentration of the functional water circulated to the circulation line 152. The circulation line is provided with a circulation pump 153.

As shown in FIG. 4, if the functional number stored in the storage tank 150 is less than or equal to a predetermined concentration, the functional water stored in the storage tank 150 is supplied to the injector 130 through the return line 164 to have a high concentration. The functional number of is made (the flow of the functional water is indicated by an arrow in FIG. 4). At this time, the liquid supply from the liquid supply unit 112 to the injector is stopped (block 118), and the gas supply from the gas supply unit 120 to the injector 130 continues.

The gas supply unit of the present invention may be supplied with hydrogen, ozone and oxygen according to time, and accordingly, hydrogen water, ozone water and oxygen water may be generated and supplied to the substrate. In this embodiment, the functional water is sequentially hydrogen water, ozone water , And oxygen water. However, the sequence of functional water produced during the process may be reversed. In addition, the type and number of functional water used is only one example, and other types of functional water and two or four or more functional water may be sequentially used in the process.

On the other hand, the present invention is a functional water supply device consisting of the above configuration can be variously modified and can take various forms. It is to be understood that the invention is not to be limited to the specific forms referred to in the foregoing description, but rather includes all modifications, equivalents and substitutions that fall within the spirit and scope of the invention as defined by the appended claims. It must be understood.

In the above, the functional water supply apparatus according to the present invention has been shown in the configuration and operation according to the above description and drawings, but this is just described for example, various changes and modifications can be made within the scope without departing from the technical spirit of the present invention. Of course.

As described above, according to the present invention, high concentration of functional water can be produced and supplied. In addition, since a plurality of functional water is sequentially supplied from one apparatus to clean the substrate W, the time required for the process may be shortened and the area occupied by the facility may be reduced as compared with the general case.

Claims (10)

delete In the apparatus for supplying the functional water dissolved gas in the substrate cleaning equipment, Liquid supply; Gas supply unit; An injector receiving liquid and gas from the liquid supply part and the gas supply part, and dissolving the gas in the liquid firstly; And Wherein the discharged from the injector includes a contactor for supplying the dissolved functional water to promote the dissolution of the gas, The injector, A liquid inlet end into which the liquid is introduced, a gas inlet end into which the gas is introduced, and a mixed outlet end into which the functional water in which the gas is dissolved flows out; Water is sprayed at high pressure, The contactor, A body having an inlet and an outlet and an inner space; And Including fine pores perforated and installed in the inner space of the body, the liquid dissolved by densely dispersing the gas dissolved in the functional water into the fine particles bubbles in the process of dispersing the functional water into the holes of the diaphragm The functional water supply apparatus of the board | substrate washing | cleaning installation characterized by the above-mentioned. delete The method of claim 2, And said contactors are connected in series with each other. The method of claim 2, The functional water supply device A storage tank storing functional water discharged from the contactors; And And a return member for returning the functional water stored in the storage tank to the injector if the gas dissolution rate of the functional water stored in the storage tank is equal to or less than a predetermined concentration. The method of claim 5, The return member is A measuring device for measuring a gas concentration of the functional water stored in the storage tank; A return line having one end connected to the storage tank and the other end connected to a supply line through which liquid is supplied from the liquid supply unit to the injector; And And a return pump installed on the return line. The method of claim 6, The measuring device is a functional water supply device of the substrate cleaning equipment, characterized in that installed in the circulation line for circulating the functional water of the storage tank. The method of claim 2, The gas supply unit Gas reservoirs each having a plurality of gases stored therein; And a regulator for selectively adjusting at least one of the gas reservoirs to be supplied to the injector. The method of claim 2, And a pressure gauge and a pressure control valve installed in a line between the contactors and the storage tank to adjust the pressure of the contactors. The method of claim 8, The liquid supply unit includes a supply pipe for supplying deionized water, Any one of said plurality of gases is hydrogen, another is oxygen, another is oxygen, and another is nitrogen.

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