KR100552914B1 - Color resist resin composition - Google Patents

Abstract

The color resist resin composition of the present invention is prepared by (A) monomers of the following structural formulas (I), (II) and (III) copolymerized in a molar ratio of 1: 2-4: 2-8 and treated with an acid anhydride of the following structural formula (IV), and 3,000 to 6,000. 1 to 40 parts by weight of cardo binder resin having a weight average molecular weight of (B) 1 to 20 parts by weight of the acrylic photopolymerizable monomer, (C) 0.1 to 10 parts by weight of the photopolymerization initiator, (D) 1 to 40 parts by weight of the pigment, and (E) It consists of 20-80 weight part of solvents, and an additive can be added as needed.

R is a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, an allyl group, a phenyl group, a benzyl group or an ethoxy group having 1 to 8 carbon atoms, X is a halogen atom and R ₁ and R ₂ are the same as R.

Description

Color resist resin composition

Field of invention

The present invention relates to a photosensitive resin composition having excellent chemical resistance, heat resistance, developability, pattern surface smoothness, and the like. More specifically, the present invention relates to an alkaline aqueous solution developing type photoresist resin composition for color filters comprising a cardo binder resin, an acrylic photopolymerizable monomer, a photopolymerization initiator, a pigment, and a solvent.

Background of the Invention

Color resist is a mixture of pigments or dyes in a photoresist (also called color photoresist).

The color filter is used in a liquid crystal display, a view finder of a camcorder, and the like, and is manufactured by coating a thin film with a photoresist on a solid state imaging device or a transparent substrate to form fine regions colored in three or more colors. The colored thin film coating of the color filter is formed by a dyeing method, a printing method, a pigment dispersion method or an electrodeposition method.

In the dyeing method, an image having a dyeing base material such as natural photosensitive resin such as gelatin, amine-modified polyvinyl alcohol, amine-modified acrylic resin, etc. is formed on the substrate before dyeing with dyes such as direct dyes. Because it needs to be formed on the phase, every time the color is changed, it must be flameproofed, and the process is very complicated and the process time is long. In addition, although the clarity and dispersibility of commonly used dyes and resins are good, there are disadvantages in that light resistance, moisture resistance, and heat resistance, which are the most important properties as color filters, are bad.

For example, although Korean Patent Publication No. 91-4717 and Korean Patent Publication No. 94-7778 use azo compounds and azide compounds as dyes, they have disadvantages of poor heat resistance and durability compared to pigment dispersion methods.

Printing method uses ink in which pigment is dispersed in thermosetting or photocuring resin, and after printing, curing with heat or light can reduce material cost compared to other methods, but highly precise and detailed image formation This is difficult and there is a disadvantage that the thin film layer formed is not uniform.

For example, Korean Patent Publication Nos. 95-703746 and 96-11513 disclose a method of manufacturing a color filter using an inkjet method. Since the color resist composition dispersed in the nozzle is dye-like for printing delicate and accurate pigments, durability and heat resistance are inferior as in the dyeing method.

Korean Patent Publication Nos. 93-700858 and 96-29904 disclose electrodeposition methods using an electroprecipitation method. Electrodeposition methods can form precise colored nets and use pigments, so they have excellent heat and light resistance. In the future, when the pixel size becomes precise and the electrode pattern becomes fine, it is difficult to apply color filters that require high precision because colored stains due to electrical resistance appear on both ends or the thickness of the colored film becomes thick.

Pigment dispersion is a method formed by repeating a series of steps of coating, phase exposing, developing, and thermosetting a photopolymerizable composition containing a colorant on a transparent substrate provided with a black matrix. This pigment dispersion method has the advantage of improving the heat resistance and durability, which is the most important property of the color filter, and maintaining the thickness of the film uniformly. For example, Korean Patent Publication No. 92-702502, Patent Publication No. 94-5617, Patent Publication No. 95-11163, and Patent Publication No. 95-700359 have proposed a method for producing color resist using pigment dispersion.

The photosensitive resin composition used in the pigment dispersion method is generally composed of a binder resin, a photopolymerizable monomer, a photopolymerization initiator, an epoxy resin, a solvent, and other additives, and the dispersion of the pigment, which is the most important step in this process, serves as a kind of dispersant. It is greatly influenced by binder resin. As a binder resin used in the pigment dispersion method, for example, a photosensitive polyimide resin disclosed in Japanese Patent Application Laid-Open No. 60-237403, an acrylic polymer described in Japanese Patent Application Laid-Open Nos. 1-200353, 4-7373, 4-91173, and the like. And a photosensitive resin composed of an azide compound, a radically polymerized photosensitive resin composed of an acrylate monomer, an organic polymer binder, and a photopolymerization initiator described in Japanese Patent Laid-Open No. 1-152449, and Japanese Patent Laid-Open Publication No. 4-163552; Various types of phenol resins disclosed in Korean Patent Publication No. 92-5780, photosensitive resins composed of a crosslinking agent having an N-methylol structure, and a photoacid generator have been proposed.

However, the use of photosensitive polyimide or phenolic resins as binder resins according to the pigment dispersion method has disadvantages such as high heat resistance but low sensitivity and development with an organic solvent. In addition, conventional systems using azide compounds as photosensitizers have problems of low sensitivity, poor heat resistance, and effects of oxygen upon exposure. In order to avoid this, it is necessary to install an oxygen barrier film or expose it in an inert gas, and there are problems such as complicated process and expensive equipment. In addition, the photosensitive resin which forms the image using the acid generated by the exposure is highly sensitive and has the advantage of not being affected by oxygen when exposed. However, the heating process is required during the exposure and development, and the heating time is sensitive to the pattern formation. There is a problem that the process control is difficult because of the reaction.

To solve this problem, Japanese Patent Laid-Open Nos. 7-64281, 7-64282, 8-278630, 6-1938, 5-339356, and Korean Patent Publication No. 95-702313 disclose A patent for a method for producing a color filter using a binder resin is described. In general, a resin having a cardo group is highly sensitive and is not affected by oxygen, and is excellent in heat resistance, shrinkage resistance and transparency. However, since there is no place to react with the alkaline developing aqueous solution in the cardo-based binder resin itself, there may be a problem in that developability is deteriorated so that a residue after development remains.

This problem can be solved by treating the cardo-based binder resin with an acid anhydride to produce an alkali-soluble resin and improving developability as disclosed in Japanese Patent Laid-Open No. 4-363311. However, even after such treatment, a lot of residues remain after development, which is attributable to components that are not easily dissolved in aqueous alkali solution. Epoxy resin is added mainly to increase chemical resistance, and is a representative example that is hardly soluble in aqueous alkali solution.

Therefore, in the present invention, by using the cardo-based binder resin having a specific range of molecular weight, developability is improved, residues are drastically reduced, and chemical resistance is maintained even without adding an epoxy resin, and the pattern surface is uniform and solid photosensitive resin composition It is early to develop.

An object of the present invention is to provide a high-sensitivity photosensitive resin composition that can improve developability and greatly reduce residues.

Another object of the present invention is to provide a photosensitive resin composition in which heat resistance is improved to significantly reduce the color difference of the coating film.

Still another object of the present invention is to provide a photosensitive resin composition which is excellent in chemical resistance even without containing an epoxy resin.

Another object of the present invention is to provide a photosensitive resin composition having a uniform pattern surface.

Still another object of the present invention is to provide a pigment dispersion type photosensitive resin composition for producing a color filter of a liquid crystal display or a camera viewfinder.

The above and other objects of the present invention can be achieved by the present invention described below.

The color resist resin composition of the present invention comprises (A) 1 to 40 parts by weight of cardo binder resin, (B) 1 to 20 parts by weight of acrylic photopolymerizable monomer, (C) 0.1 to 10 parts by weight of photopolymerization initiator, (D) Pigment 1 It consists of-40 parts by weight, and 20 to 80 parts by weight of the solvent (E), and additives can be added as necessary.

The cardo-based binder resin used in the present invention is copolymerized with monomers of the following structural formulas I, II and III, and has a molar ratio of 1: 2-4: 2-8 in the copolymers of monomers I, II and III:

Wherein R is a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, an allyl group, a phenyl group, a benzyl group or an ethoxy group having 1 to 8 carbon atoms, and X is a halogen atom.

The binder resin may preferably be used having a weight average molecular weight of 3,000 to 6,000. The binder resin is treated with an acid anhydride to make an alkali soluble resin. The acid anhydride is represented by the following structural formula IV:

In the above formula, R ₁ and R ₂ are a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, an allyl group, a phenyl group, a benzyl group or an ethoxy group having 1 to 8 carbon atoms. Acid anhydrides that may be preferably used include acetic anhydride, 1,2,3,6-tetrahydrophthalic anhydride, tetraphthalic anhydride, biphenyltetracarboxylic dianhydride, 3,4,9,10-perylenetetracarb Acid anhydrides and the like.

Acrylic photopolymerizable monomers used in the present invention include ethylene glycol diacrylate, triethylene glycol diacrylate, 1,4-butanediol diacrylate, 1,6-hexanediol diacrylate, neopentyl glycol diacrylate, Pentaerythritol diacrylate, pentaerythritol triacrylate, dipentaerythritol diacrylate, dipentaerythritol triacrylate, dipentaerythritol pentaacrylate, pentaerythritol hexaacrylate, bisphenol A diacrylate , Trimethylolpropane triacrylate, noblock epoxy acrylate, ethylene glycol dimethacrylate, diethylene glycol dimethacrylate, triethylene glycol dimethacrylate, propylene glycol dimethacrylate, 1,4-butanediol dimetha Acrylate, 1,6-hexadioldimethacrylate monomers, and the like. The photopolymerizable monomer is used in an amount of 1 to 20 parts by weight based on the total resin composition.

The photopolymerization initiator used in the present invention is acetophenone-based derivatives commonly used. Examples thereof include 2,2'-diethoxyacetophenone, 2,2'-dibutoxyacetophenone, and 2-hydroxy-2-methyl. Proriophenone, pt-butyltricholoacetophenol, pt-butyldichloroacetophenone, benzophenone, 4-chloroacetophenone, 4,4'-dimethylaminobenzophenone, 4,4'-dichlorobenzophenone, 3, 3'-dimethyl-2-methoxybenzophenone, 2,2'-dichloro-4-phenoxyacetophenone, 2-methyl-1- (4- (methylthio) phenyl) -2-morpholinopropane-1 -One, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butan-1-one, and the like. The photoinitiator is used in 0.1-10 weight part with respect to the whole resin composition.

As the pigment used in the present invention, inorganic pigments, such as carbon black, may be used in addition to organic pigments such as anthraquinone pigments, perylene-based condensed polycyclic pigments, phthalocyanine pigments, and azo pigments. It can be mixed and used. The pigment is used in 1 to 40 parts by weight based on the total resin composition.

In the present invention, ethylene glycol acetate, ethyl cellosolve, propylene glycol methyl ether acetate, ethyl lactate, polyethylene glycol, cyclohexanone, propylene glycol methyl ether and the like can be used alone or as a solvent. The solvent is used at 20 to 80 parts by weight based on the total resin composition.

In the present invention, additives such as dispersants, surfactants, antioxidants, etc. may be added as necessary. The dispersant may be used by internal addition to the pigment in the form of surface treatment of the pigment in advance, or may be used in an external addition to the pigment. As such, nonionic, anionic or cationic dispersants can be used, such as polyalkylene glycols and their esters, polyoxyalkylenes, polyhydric alcohol ester alkylene oxide adducts, alkoxyalkylene oxide adducts, Phonic acid esters, sulfonates, carboxylic acid esters, carboxylates, alkylamide alkylene oxide adducts, alkylamines and the like can be used. These may be added alone or in combination of two or more. The amount of the dispersant added is preferably 0 to 20 parts by weight based on 1 part by weight of the pigment. The surfactants and antioxidants are well known to those skilled in the art, and the type and dosage can be easily carried out by those skilled in the art. In the present invention, the surfactant is added 0.001 to 0.1 parts by weight, the antioxidant is added 0.001 to 0.1 parts by weight.

The photoresist resin composition composed of the above components of the present invention is applied on the glass substrate for the color filter to a suitable thickness (for example, 0.5 to 10 mu m) by a suitable method such as spin coating, roller coating or spray coating. The active line is then irradiated to form the pattern required for the color filter. As a light source used for irradiation, UV irradiation in the region of 190 nm to 450 nm, preferably 200 nm to 400 nm is used, and electron beam and X-ray irradiation are also suitable. After the actinic radiation is applied, the coating layer is treated with a developer to dissolve the unirradiated portion of the coating layer and form a pattern necessary for the color filter. By repeating this process in accordance with the required number of colors, a color filter having a desired pattern can be obtained. In addition, the image pattern obtained by the development in the above process can be heated again or cured by actinic radiation, and the crack resistance, solvent resistance and the like can be improved.

The color resist of this invention is a resin composition developed in aqueous alkali solution. The color resist resin composition of this invention is a composition used in order to form the pattern of a color filter, and a protective film is apply | coated on the pattern surface. This protective film composition removes the pigment from the component of a color resist resin composition. The protective film composition for color filters is also a resin composition developed in aqueous alkali solution.

The invention can be better understood by the following examples, which are intended for the purpose of illustration of the invention and are not intended to limit the scope of protection defined by the appended claims.

Example

Example 1

Each component and content used for the color resist resin composition of Example 1 are as follows.

(A) Cardo binder resin

I: 9,9'-bis (4-hydroxyphenyl) fluorene

II: epichlorohydrin

III: acrylic acid

After copolymerizing at a molar ratio of I: II: III = 1: 2: 2, 110 g of 1,2,3,6-tetrahydrophthalic anhydride was added thereto and reacted at 120 ° C. for 1 hour to prepare a binder resin. The molecular weight of the copolymer was 4,000.

The photopolymerization initiator was dissolved in the solvent and stirred at room temperature for 2 hours. The photopolymerizable monomer and the binder resin were added and stirred at room temperature for 2 hours, and then pigments and other additives were added and stirred at room temperature for 1 hour. Filtration was carried out three times to remove impurities, to prepare a color resist resin composition according to the present invention.

Example 2

Except that the molecular weight of the binder resin is 6,000, a resin composition was prepared in the same manner as in Example 1.

Comparative Example 1

A resin composition was prepared in the same manner as in Example 1, except that the molecular weight of the binder resin was 2,000.

Comparative Example 2

A resin composition was prepared in the same manner as in Example 1, except that the binder resin had a molecular weight of 10,000.

Comparative Example 3

A resin composition was prepared in the same manner as in Example 1, except that the binder resin had a molecular weight of 2,000 and an epoxy resin (phenolic noblock type epoxy resin, EPPN-201, manufactured by Nippon Kayaku) was added.

Patterning Assessment:

A colored thin film was formed from the resin composition prepared according to Example 1 and Comparative Examples 1 to 3, and the developability, pattern surface smoothness, heat resistance, chemical resistance, and pattern resistance were measured as follows. Shown in

(1) developability

The photosensitive resin composition was applied to a glass substrate having a chromium coated thickness of 1 mm to a thickness of 1 to 2 μm, and dried in a hot air circulation drying furnace at a temperature of 80 ° C. for 1 minute and 30 seconds to obtain a coating film. Subsequently, a photomask was placed on the coating film, followed by exposure using a high pressure mercury lamp having a wavelength of 365 nm, followed by development for 80 seconds at 30 ° C. and 1 atmosphere using a 1% KOH aqueous solution. After development, the resultant was dried in a hot air circulation drying furnace at 220 ° C. for 40 minutes to obtain a pattern, and the residue and the patternability were evaluated through an optical microscope and an electron microscope.

○ Excellent developability: No residue is left on the pattern.

△ Good developability: Some residue remains on the pattern.

X Poor developability: Many residues remain on a pattern.

(2) pattern surface smoothness

The photosensitive resin composition was applied to a glass substrate having a thickness of 1 mm coated with chromium at a thickness of 1 to 2 μm, and dried in a hot air circulation drying furnace at 80 ° C. for 1 minute and 30 seconds to obtain a coating film. Subsequently, a photomask was placed on the coating film and exposed using a high-pressure mercury lamp having a wavelength of 365 nm, and then developed for 30 seconds at 30 ° C. and 1 atmosphere using a 1% aqueous KOH solution. After development, a pattern was obtained by drying for 40 minutes at a temperature of 220 ° C. in a hot air circulation drying furnace, and the shape of the pattern having a size of 100 μm was observed using P-10 from TENCO.

○: roughness of pattern surface is less than 60 °

(Triangle | delta): Roughness of a pattern surface is 60-80 GPa

X: roughness of the pattern surface is 80 kPa or more

(3) heat resistance

The photosensitive resin composition was applied to a glass substrate having a thickness of 1 mm coated with chromium to a thickness of 1 to 2 μm, dried in a hot air circulation drying furnace at 80 ° C. for 1 minute and 30 seconds, and then ultrahigh pressure mercury having a wavelength of 365 nm. It was irradiated with a lamp and then heated in a hot air circulation drying furnace at 220 ° C. for 40 minutes to obtain a coating film. This was again heated in a hot air circulation drying furnace at a temperature of 250 ° C. for 1 hour, followed by heat treatment, and the color difference (ΔΕ) of the coating film was measured to evaluate heat resistance.

○: color difference (ΔΕ) is 3 or less

Δ: color difference ΔΕ is 3 to 5

×: color difference (ΔΕ) is 5 or more

(4) chemical resistance

A photosensitive resin composition was applied on a glass substrate having a thickness of 1 mm coated with chromium to a thickness of 1 to 2 μm, and dried in a hot air circulation drying furnace for 80 minutes at 1 minute 30 seconds to obtain a coating film. Subsequently, irradiated with an ultra-high pressure mercury lamp having a wavelength of 365 nm, developing at 30 ° C. and atmospheric pressure for 80 seconds using a 1% KOH aqueous solution, and drying at 220 ° C. for 40 minutes in a hot air circulating drying furnace. Obtained. This pattern was immersed in 5% aqueous HCl, aqueous NaOH solution, xylene, NMP, IPA and acetone solution for 30 minutes, and the sample and color difference (ΔΕ) before immersion were observed.

○: 3 or less color difference

△: color difference is 3 to 5

×: color difference is 5 or more

(5) patternability

The photosensitive resin composition was apply | coated in the thickness of 1-2 micrometers on the glass substrate of thickness 1mm, and it dried in 80 degreeC for 1 minute and 30 second in a hot air circulation drying furnace, and obtained the coating film. Subsequently, it was irradiated with an ultra-high pressure mercury lamp having a wavelength of 365 nm, and developed for 1 second at 80 ° C. under 30 ° C. and atmospheric pressure using a 1% KOH aqueous solution. Obtained. The edge of the pattern was observed using the optical microscope and SEM.

○: 2 μm or less of deviation of edge pattern bending

(Triangle | delta): 2-4 micrometers of deviation of edge pattern bending

X: 4 micrometers or more of deviation of edge pattern bending

The color resist resin composition of the present invention is not affected by oxygen upon exposure, and is excellent in developability, thereby greatly reducing residues, and having good heat resistance, and having excellent chemical resistance without deterioration without containing epoxy resin. Has the effect of the invention. In addition, when the pattern is formed using the resin composition of the present invention, the surface shows uniform and solid pattern characteristics.

Simple modifications or changes of the present invention can be easily carried out by those skilled in the art, and all such modifications or changes can be seen to be included in the scope of the present invention.

Claims (4)

(A) 1 to 40 parts by weight of a cardo-based binder resin having monomers of the following structural formulas I, II and III copolymerized in a molar ratio of 1: 2-4: 2-8, and having a weight average molecular weight of 3,000 to 6,000; (B) 1 to 20 parts by weight of the acrylic photopolymerizable monomer; (C) 0.1 to 10 parts by weight of the photopolymerization initiator; (D) 1-40 weight part of pigments; (E) 20 to 80 parts by weight of the solvent; (F) 0.001-0.1 parts by weight of surfactant; And (G) 0.001-0.1 parts by weight of antioxidant; A color resist resin composition comprising: R is a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, an allyl group, a phenyl group, a benzyl group or an ethoxy group having 1 to 8 carbon atoms, and X is a halogen atom. The color resist resin composition according to claim 1, wherein the binder resin is treated with an acid anhydride represented by the following structural formula (IV) to make the binder resin an alkali-soluble resin: Wherein R ₁ and R ₂ are hydrogen atoms, alkyl groups having 1 to 10 carbon atoms, allyl groups, phenyl groups, benzyl groups or ethoxy groups having 1 to 8 carbon atoms. A color filter prepared by curing the color resist resin composition of claim 1 on a glass substrate. The color filter according to claim 3, wherein a protective film is formed on the surface of the color filter by applying a protective film resin composition.