KR100301999B1 - Automatic Wax Mixing Liquid Dispenser - Google Patents

Abstract

The present invention relates to an automatic preparation of wax mixture solution, a supply method and an apparatus, and more particularly, a bubble continuous collector and a valve box in parallel with a volume and a weighing method so as to maintain the quality of the mixture solution and to maintain a constant liquid pressure at use points. By installing the U-trap inside and supplying the supply pipe line with a plurality of loops, it is possible to solve the inconvenience that the accuracy is lowered, the pressure difference occurs in the pipe, and the solidification occurs due to the use of a conventional flow meter in the conventional mixing process. In order to ensure the accuracy of the mixing ratio, a volumetric method and a weighing method were introduced at the same time, and the unit was always kept clean by cleaning the parts exposed to the air while the mixed liquid was in contact, and the device was always kept in a clean state. Even if bubbles occur due to A bubble collector was installed to remove bubbles, and U-traps were installed before bubbles rose to the equipment so that no bubbles would enter the equipment. In addition, the loop concept is introduced without unifying the supply pipe line, and three loops are constructed. When a problem occurs in the pipe line, only the equipment connected to the loop is stopped. The degradation was minimized. Therefore, it is to maintain the quality of the supplied wax mixture and to maintain a constant liquid pressure at the point of use.

Description

Automatic preparation supply and apparatus of mixture solution of wax

The present invention relates to an automatic preparation and supply device for a wax mixture, and more particularly, to maintain the quality of the mixture and to control the liquid pressure at the point of use (hereinafter referred to as the place where the liquid is injected or used). In order to make it constant, the volume and the weighing method are performed in parallel, and the U-trap is installed in the bubble continuous collector and the valve box, and the supply piping line is provided with a plurality of loops. The present invention relates to a U-trap and a plurality of loops for automatic preparation, supplying method and apparatus of a U-trap to solve the inconvenience that a pressure difference is generated in a pipe and a solid fixation phenomenon occurs.

The chemical mechanical polishing process for the final surface polishing in the semiconductor single crystal silicon wafer manufacturing process is performed by attaching a wafer to a polishing block (wax mounting) and using a wax that is directly attached to a polishing machine hub. There are two kinds of (Free Mounting).

This invention is the equipment for mixing the wax used in the former case more precisely, and feeding it to a grinder.

The grinder used at this time was based on the equipment registered in the US patent (R. J. Walsh 5,605, 487, 1994), but can be used for equipment using any wax bonding method.

In addition, the process used for the polishing process is a chemical having almost the same characteristics as the photoresist used in the photolithography process of the semiconductor device process.

The composition of wax or photosensitizer is "a" raw material wax resin (wax resin) should be considered when used as adhesive solids, usually transported to a high viscosity of more than 1000cps, "b" material softening point control agent softening point according to the temperature of the wax "D" material dye is used for defect observation and production line separation after wax coating.

In addition, the "D" raw material surfactant is used to control the surface of the block to be hydrophilic or lipophilic. The "D" and "bar" raw material solvents are used for fluid transfer and thin film spin coating. The preparation of silver wax requires regular cleaning of the tanks and pipes to prevent the wax from volatilizing and sticking.

The cleaning liquid was prepared to wash the wax.

Conventional technology configured as described above usually uses a conventional flow meter to measure a large number of raw materials in the mixing process, but this is a significant change in the measurement accuracy according to the flow conditions of the fluid can not obtain a satisfactory accuracy.

In addition, if the raw liquid and the mixed liquid come into contact with air because the periodic cleaning of tanks and pipes is not taken into consideration, when the volatile fluid in the contents evaporates, it solidifies on the inner wall of the tank of the equipment and the inner wall of the pipe. Continued use of.

As a method of preventing this, there is a conveying method, which is the simplest conveying method using gas, but in the case of conveying using the gas, since the gas used is dissolved due to the high pressure inside the wax, bubbles are generated at the place of use. Cannot be used.

In addition, when using the existing technology, it is difficult to effectively remove bubbles generated by the mixing method or the transfer during the initial startup due to the high viscosity.

Conventionally, since it is directly connected to the equipment from the supply pipe line, there is a high probability of entering the equipment in the event of a bubble.If a failure such as leakage of the supply line occurs by unifying the supply pipe line, all the grinders working in the supply line may be stopped. have.

In addition, as the number of equipment increases, the length of the pipe is increased, and the pressure drop phenomenon is caused by the frictional force of the pipe. Therefore, there is a problem that the difference in the pressure between the equipment occurs and the amount of fluid between the equipment is different.

The present invention has been researched and created in order to solve the above problems, and the object of providing the same is to introduce the volumetric method and the weighing method in parallel to ensure the accuracy of the mixing ratio, the apparatus by cleaning the site exposed to the air from time to time while the mixed solution is in contact Is always kept clean, and even if bubbles are generated during initial equipment startup or for other reasons, the bubble continuous collector is installed, bubbles are removed, and the U-trap is placed in the valve box before the bubbles rise to the equipment. It is to provide an automatic preparation and supply device for the wax mixture solution so that the bubbles generated once are prevented from entering the equipment.

Another object of the present invention is to introduce a loop concept without unifying the supply pipe line to form three loops, if the problem occurs in the piping line, the wax mixture liquid automatic preparation configured to stop only the equipment connected to the loop To provide a supply.

Another object of the present invention is to minimize the pressure drop due to the increase in the length of the pipe to maintain the quality of the supplied wax mixture and to maintain a constant liquid pressure at the point of use (POU / Point of Use) It is to provide an automatic preparation and supply device of a wax mixture.

The object of the present invention is a plurality of drums containing the raw material and the selection valve and the pressure control valve and the pump is provided with an injection portion, the pressure tank for storing and pressurizing the cleaning liquid and the bottle containing the raw material and the selection valve and nitrogen pressure valve is connected Inlet valve and discharge valve are provided on the upper part, the vacuum generator is installed, the upper part is provided with a plurality of metering tanks that are narrow and widened to the lower part, the liquid level sensor is provided on the outer circumferential surface, and the cleaning spray and the weighing scale are installed. , A mixing tank equipped with a stirrer and a discharge valve, a cleaning spray and a circulation selection valve, a liquid level sensor, a plurality of supply tanks, a plurality of grinders, a flow meter and a pressure control valve This is accomplished by including multiple loops installed.

In particular, a circulation transfer pump and an automatic backwash filter are installed between the mixing tank and the supply tank, and a supply pump, a filter, a pressure regulating valve and a flow meter are installed between the supply tank and the loop, and the loop is provided on the supply side and the discharge side. It characterized in that the trap comprises a valve box formed.

1 is a schematic flowchart of a wax mixing solution automatic preparation and supply apparatus according to the present invention

Figure 2 is a schematic diagram of the automatic wax mixing liquid supply, supply apparatus according to the present invention

Figure 3 (a) is a schematic diagram of the raw material liquid injection of the automatic wax mixing liquid supply, supply apparatus according to the present invention

Figure 3 (b) is a schematic diagram of the dye mixture injection of the automatic preparation, supplying wax mixture according to the present invention

Figure 3 (c) is a schematic diagram relating to the mixing and transport of the wax mixture liquid preparation, supply device according to the invention

Figure 3 (d) is a schematic diagram of the wax mixture solution automatic preparation, supply of the wax mixture solution supply apparatus according to the present invention

Figure 3 (e) is a perspective view of the bubble continuous collector of the automatic wax mixing solution supply, supply apparatus according to the present invention

Figure 4 is a schematic diagram showing a loop separated into a plurality of wax mixture liquid preparation, supply apparatus according to the present invention

<Description of the symbols for the main parts of the drawings>

10: injection unit 10a, 10b: drum

11 pressure control valve 12 pump

13: selector valve 20: pressurized tank

30a, 30b, 30c: Weighing tank 31: bottle

32: nitrogen pressure valve 33: inlet valve

34: discharge valve 35: vacuum generator

40: mixing tank 41: liquid level sensor

42: washing spray 43: weighing scale

44: stirrer 45: discharge valve

50a, 50b: supply tank 51: circulation selector valve

60a, 60b, 60c: Loop 61: Polishing Machine

62: flow meter 63: pressure control valve

64: valve box 70a: circulation / transfer pump

70b: automatic backwash filter 80: feed pump

81: filter 82: flow meter

90: continuous bubble collector 91: valve

92 discharge hole 93 discharge hole

94: incoming ball

Hereinafter, exemplary embodiments of the present invention will be described with reference to the accompanying drawings.

1 is a schematic flowchart of a wax mixing solution automatic preparation and supply apparatus according to the present invention.

Hereinafter, exemplary embodiments of the present invention will be described with reference to the accompanying drawings.

According to the present invention, the present invention mainly consists of raw material liquid injection, cleaning liquid storage and pressurization, mixing and conveying, and supply of a wax mixed liquid.

Specifically, referring to the accompanying drawings showing the configuration of the present invention, Figure 2 shows the raw material liquid injection, mixing and transfer, wax mixture liquid supply / circulation, cleaning, system and a plurality of loops, bubble continuous collector and supply piping in the valve box entering the equipment It can be seen that it is composed of a supply pipe line that constitutes a U-trap.

In other words, "a" raw material liquid (wax resin), "b" raw material liquid (softening point regulator), "multi" raw material liquid (dyeing agent), "d" raw material liquid (surfactant), "e" raw material liquid (solvent), There are a large number of "bar" raw materials (solvent, ultrapure water), etc. There are 6 types. For example, the "a", "b" and "bar" raw materials are weighed, and the "d", "d" and "d" raw materials are the volumetric weights of the weighing tanks 30a, 30b and 30c. Doing.

In the case of the "a" raw material liquid, the raw material liquid is transferred from the drums 10a and 10b to the mixing tank 40 by the pump 12, and the weighing scale 43 for measuring the mixing tank 40 is preset. When the weight is detected, the required amount is precisely injected by closing the selector valve 13 and stopping the pump 12.

In the case of "C", "D" and "E" raw materials, the weighing tanks 30a, 30b, and 30c are vacuumed (by opening the valve on the vacuum generator side) and the valve on the raw material inlet side is opened. The raw material inlet valve 33 is closed when the raw material rises from the respective bottles 31 of the liquid to the metering tanks 30a, 30b, and 30c and the liquid level reaches H (high) which is previously measured and positioned.

Then, the nitrogen pressure valve 32 and the raw material discharge valve 34 are opened to pressurize the weighing tanks 30a, 30b, and 30c with nitrogen, and discharge the liquid in the weighing tanks 30a, 30b, and 30c toward the mixing tank 40. Enter the required amount correctly.

At this time, the raw material liquid that can react can be designed for instrumentation to control the order of input.

When the liquid level in the mixing tank 40 rises above the mixer level, the mixer is driven and at the same time, the pump 12 is driven to smoothly mix.

After mixing / circulating for a predetermined time, the wax mixed liquid is automatically transferred to the preliminary supply tank among the plurality of supply tanks 50a and 50b by the circulation / transfer pump 70a. At this time, the automatic backwash filter 70b is Via.

As it is conveyed, when the liquid level in the mixing tank 40 reaches a predetermined low position (detected by the weighing scale), the driving of the circulation / feed pump 70a is stopped and the associated valves are closed.

At the same time, the discharge valve 45 is opened to discharge the remaining mixed liquid, the cleaning liquid valve is opened, the cleaning liquid is injected toward the cleaning spray 42, and the liquid is discharged through the discharge valve 45 while cleaning the inner surface of the mixing tank 40.

After supplying the cleaning liquid for a certain period of time, the ultrapure water (water removed with impurities) cleaning valve is opened, followed by the ultrapure water cleaning (rinsing) in the same way, and after the supply of the cleaning liquid is stopped, the discharge valve is opened for a certain time to remove the liquid in the mixing tank 40. After complete discharge it closes to prepare for the next mix.

In the same manner as described above, while the mixed wax liquid is filled in both the A and B supply tanks 50a and 50b, the liquid is supplied to the loop A 60a, the loop B 60b, and the loop C 60c by the supply pump 80. While being supplied, it is returned to the tank supplied by the circulation selection valve 52. At this point, the mixed liquid is automatically supplied to the polishing machine 61 by opening and closing the valve on the polishing machine 61 side.

At this time, the line supplied to the equipment in each loop constituted the valve box 64 and installed the U-trap inside. In addition, by installing a bubble continuous collector (90) for each loop was configured to remove the bubble continuously.

Here, the parallel arrangement of a plurality of supply pipes such as the loop A 60a, the loop B 60b and the loop C 60c means that several tens of grinders 61 are operated to be divided into several groups. In the last grinding period, the supply pressure difference can be minimized. Second, if there is a defect such as leakage or breakage in the supply loop pipe, it is possible to minimize the stop loss by disabling only the grinding machines connected to the loop among all the grinding machines. There are advantages to it.

In addition, it is possible to remove all bubbles generated by connecting the bubble continuous collector (90) for each loop.

When the A supply tank 50a is supplying the wax mixture and the B supply tank 50b is full of the wax mixture, the liquid level of the A supply tank 50a reaches the intermediate level. As the liquid is supplied, the wax mixing is started to wait after the mixing is completed.

When the liquid level reaches the low level in succession, the supply is switched to the A supply tank 50a, and the discharge valve 45 is opened, and the discharge / cleaning / rinsing process is performed by the same procedure / method as the mixing tank 40 described above. When the preparation is completed, the mixed liquid is transferred to the A supply tank 50a as described above, and the mixed tank 40 is discharged / washed / rinsed as described above and becomes a standby state.

Referring to the accompanying drawings, the process of the present invention, Figure 3 (a) is a schematic diagram of the raw material liquid injection of the automatic mixing, supplying method and apparatus of the wax mixture according to the present invention, the overall configuration is a plurality of drum (10a, 10b), a plurality of pumps 12, respective selection valves 13 and pressure control valves 11, and as shown in the drawing, the plurality of drums 10a, 10b on the left side are " a " Wax resin) is stored, and when CDA (Clean Dry Air) is supplied from the outside, it passes through the pressure regulating valve 11 and moves to the pump 12.

At this time, the pump 12 transfers the raw material from the selection valve 13 to the mixing tank 40 at a constant pressure.

In addition, the drum (10a, 10b) is provided with a plurality of discharge holes as shown on the right side is stored the "I" raw material (softening point regulator), as described above, the pressure control valve 11, the selection valve 13 and the pump By means of (12) "B" raw material (softening point regulator) is transferred to the mixing tank (40).

Here, the generated gas is discharged to one of the plurality of discharge holes. Each pipe is flushed with water.

Figure 3 (b) is a schematic diagram of the dyeing agent injection according to the present invention, the pressure tank 20 for storing and pressing the cleaning liquid, and the plurality of metering tanks 30a, 30b, the upper portion is narrow in width and widened to the lower portion, 30c), a plurality of bottles 31 filled with a raw material liquid, and a cleaning spray 42 are provided on the inside, and a plurality of weighing scales 43 are provided on the outer circumferential surface, and the raw materials are rotated by the stirrer 44. It consists of a mixing tank 40 for mixing.

For reference, in order to avoid congestion in the drawings, the capital letters are shown to be connected to each other. These are the gases generated from the bottles A, B, C, D, H, and K: 31, respectively, and E: " E) raw material is introduced into the bottle 31 and the mixing tank 40, G: the cleaning liquid is transferred from the pressure tank 20 to the mixing tank 40, I: Clean Dry Air (CDA) from the outside Drawing into the pressurized tank 20 is shown.

In other words, the raw material from each bottle 31 (herein "d", "d", "d" raw material) is each of the weighing tanks 30a, 30b, 30c: "controlled by the vacuum generator 35". , "La" and "e" tanks are transferred to the mixing tank 40 equipped with the cleaning spray 42 and the weighing scale 43.

At this time, nitrogen is introduced into the respective measuring tanks 30a, 30b, and 30c from the outside.

The above-described weighing scale 43 is for detecting the liquid level of the mixing tank 40, and a plurality of weighing scales 43 are installed on the outer circumferential surface to prevent concentrated distribution.

Figure 3 (c) is a schematic diagram of the mixing and conveying according to the present invention, the uppercase letters A, B, C, D, H, K: the gas generated in the bottle 31 is discharged as described above in Figure 3 (b) E: "e" raw material is introduced into the bottle 31 and the mixing tank 40, F, G: the cleaning liquid is transferred from the weighing tank (30a, 30b, 30c) to the mixing tank 40 , I: CDA (Clean Dry Air) is introduced into the weighing tanks (30a, 30b, 30c) from the outside and consists of a plurality of circulation / transfer pump (70a) and automatic backwash filter (70b), the mixing tank ( The raw material liquid sent to 40 is mixed and transferred to the plurality of supply tanks 50a and 50b through the automatic backwash filter 70b by the plurality of circulation / feed pumps 70a.

Figure 3 (d) is a schematic diagram of the wax mixture solution supply according to the present invention, a plurality of supply tank (50a, 50b), a plurality of supply pump 80, a plurality of filters 81 and a plurality of pressure control valve (82) ) And a plurality of loops 60a, 60b, 60c.

The raw material liquid is supplied to the supply tanks 50a and 50b from the above-mentioned automatic backwash filter 70b, and is supplied by the supply pump 80 to the respective loops 60a, 60b and 60c via the filter 81.

At this time, each of the supply tanks 50a and 50b was supplied with a cleaning liquid to enable cleaning, and a plurality of supply tanks 50a and 50b are not used at the same time, and the liquid level is provided by the liquid level sensor 53 provided in each. Sensing and complementing each other so that the operation does not stop.

In addition, a plurality of loops (60a, 60b, 60c) is divided into a flow meter 83 is connected to the supply tank (50a, 50b) so as to determine and replenish the amount of raw material liquid sent to the grinder 61 A plurality of grinders 61 are installed separately therefrom.

Each of the loops 60a, 60b, and 60c is provided with a plurality of grinders 61, and a pipe box connected to each grinder 61 has a bubble continuous collector 90 (not shown) and a valve box formed with a U-trap. 64 (not shown) is installed to detect and remove bubbles generated in the pipe.

Figure 3 (e) is a perspective view of the bubble continuous collector described above, according to which a cylinder is formed on the top of the rectangular bottom plate and is provided with a discharge hole 93 and the inlet hole 94 to face the outer side, at the top of the cylinder The valve 91 and the air discharge hole 92 formed with the bubble continuous collector 90 is to remove the bubbles generated.

Figure 4 is a schematic diagram showing a plurality of separate loops of the wax mixing solution automatic preparation, supply apparatus according to the present invention, it can be seen that each loop is separated by showing the different types of lines as shown in the figure, A continuous bubble collector 90 is installed in the loops 60a, 60b, and 60c to detect and remove bubbles generated in each loop, and in case of a failure, stop the operation as a whole instead of stopping the entire operation, thereby improving work efficiency. To raise.

The present invention configured as described above provides automatic preparation of the wax mixture solution, as described above in the feed device, feed and mix the raw material solution, supply / circulate the wax mixture solution, rinsing, system and a plurality of loops, bubble continuous collectors and feed pipes into the equipment. By carrying out the supply piping line consisting of U-traps in the valve box, it is possible to achieve a high degree of mixing ratio as well as to achieve a high degree of repetition by automation by the volumetric and weight weighing methods described above. All parts of the device can be kept clean at all times to solve the problems of the prior art. In addition, there is an effect that can ensure the continuity of the wax quality by suppressing the foaming of the feeder.

Claims (5)

1. A wax mixing and feeding device used to bond a silicon wafer to a semiconductor polishing block, A plurality of drums (10a, 10b) containing the raw material is connected to the upper side of the mixing tank 40, the selection valve 13 and the pressure control valve 11 and on the pipeline close to the drum (10a, 10b) and The injection unit 10 is provided with a pump 12, The upper middle side of the mixing tank 40 is connected to the lower side of the plurality of metering tanks (30a, 30b, 30c) formed in a narrow and wider bottom, respectively, the mixing tank (30a, 30b, 30c) and the mixing tank Each conduit connecting the 40 is provided with a discharge valve 34, Each of the pipes communicating and connecting the mixing tank 40 and the measuring tanks 30a, 30b, and 30c is installed with a plurality of bottles 31 containing raw materials connected to respective pipes having an inlet valve 33. , The upper side of each of the metering tank (30a, 30b, 30c) is provided with a branch line connected to the nitrogen pressure valve 32 and the vacuum generator 35 is installed, The upper part of the upper side of the mixing tank 40 is connected to the upper portion of the plurality of supply tags (50a, 50b) are provided, the circulation selector valve 52 is installed in the pipeline, A plurality of loops (60a, 60b, 60c) having a plurality of grinders 61 at the end of the supply tank (50a, 50b) is provided with a flow meter 62 and a pressure regulating valve (63) at the middle thereof. Installed and connected, The mixing tank 40 has a liquid level sensor 41 and the weighing scale 43 is installed on the outer circumferential surface thereof, and a cleaning spray 42 and an agitator 44 are installed therein. Bar provided with the provided pipe, One side of the metering tank (30a, 30b, 30c) is provided with a pressurized tank (20) for storing and pressurizing the cleaning liquid, the wax mixed liquid automatic preparation, supply device. According to claim 1, wherein the mixing tank 40 and the supply tank (50a, 50b) between the circulating / transfer pump 70a and the automatic backwash filter (70b) comprising the automatic preparation and supply of the wax mixture liquid According to claim 1, wherein between the supply tank (50a, 50b) and the loop (60a, 60b, 60c) is provided with a supply pump 80, a filter 81, a pressure regulating valve (63) and a flow meter (82) Automatic Wax Mixing Liquid Preparation The method of claim 1, wherein the loop (60a, 60b, 60c) is a wax mixture liquid automatic preparation, supply device comprising a valve box 64 having a U-trap is formed on the supply side and the discharge side The pipes installed in the loops 60a, 60b, and 60c are provided with discharge holes 93 and inlet holes 94 so as to face cylindrical shapes, and a valve 91 and an air discharge hole are formed at the upper end. Automatic preparation and supply of the wax mixture liquid containing the bubble continuous collector 90 in which 92 was formed.