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KR100294577B1 - Plasma generating apparatus - Google Patents

Plasma generating apparatus Download PDF

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Publication number
KR100294577B1
KR100294577B1 KR1019980017692A KR19980017692A KR100294577B1 KR 100294577 B1 KR100294577 B1 KR 100294577B1 KR 1019980017692 A KR1019980017692 A KR 1019980017692A KR 19980017692 A KR19980017692 A KR 19980017692A KR 100294577 B1 KR100294577 B1 KR 100294577B1
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South Korea
Prior art keywords
plasma
high voltage
voltage pulse
plasma generating
rod
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KR1019980017692A
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Korean (ko)
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KR19980042982A (en
Inventor
방 욱 허
유 병 박
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허방욱
주식회사 대원팝틴폼
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
    • A61L9/00—Disinfection, sterilisation or deodorisation of air
    • A61L9/16—Disinfection, sterilisation or deodorisation of air using physical phenomena
    • A61L9/22—Ionisation
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B3/00—Hydrogen; Gaseous mixtures containing hydrogen; Separation of hydrogen from mixtures containing it; Purification of hydrogen
    • C01B3/02—Production of hydrogen or of gaseous mixtures containing a substantial proportion of hydrogen
    • C01B3/32—Production of hydrogen or of gaseous mixtures containing a substantial proportion of hydrogen by reaction of gaseous or liquid organic compounds with gasifying agents, e.g. water, carbon dioxide, air
    • C01B3/34—Production of hydrogen or of gaseous mixtures containing a substantial proportion of hydrogen by reaction of gaseous or liquid organic compounds with gasifying agents, e.g. water, carbon dioxide, air by reaction of hydrocarbons with gasifying agents
    • C01B3/342—Production of hydrogen or of gaseous mixtures containing a substantial proportion of hydrogen by reaction of gaseous or liquid organic compounds with gasifying agents, e.g. water, carbon dioxide, air by reaction of hydrocarbons with gasifying agents with the aid of electrical means, electromagnetic or mechanical vibrations, or particle radiations
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/4608—Treatment of water, waste water, or sewage by electrochemical methods using electrical discharges
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32018—Glow discharge
    • H01J37/32036—AC powered
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B2203/00—Integrated processes for the production of hydrogen or synthesis gas
    • C01B2203/08—Methods of heating or cooling
    • C01B2203/0805—Methods of heating the process for making hydrogen or synthesis gas
    • C01B2203/0861—Methods of heating the process for making hydrogen or synthesis gas by plasma

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Electromagnetism (AREA)
  • Power Engineering (AREA)
  • Environmental & Geological Engineering (AREA)
  • Veterinary Medicine (AREA)
  • Public Health (AREA)
  • Analytical Chemistry (AREA)
  • Animal Behavior & Ethology (AREA)
  • Electrochemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Water Supply & Treatment (AREA)
  • Epidemiology (AREA)
  • Mechanical Engineering (AREA)
  • Toxicology (AREA)
  • Combustion & Propulsion (AREA)
  • Inorganic Chemistry (AREA)
  • Plasma Technology (AREA)

Abstract

PURPOSE: A plasma generating apparatus is provided to generate a much amount of plasma by shaping many metal particles by a mass stick form and applying a high voltage pulse. CONSTITUTION: A high voltage pulse generator(100) generates a high voltage pulse, which has a voltage over 20KV and a frequency over 10Hz. A plasma generator(200) consists of a plasma generating stick(210) having electrodes(220, 230) at both ends, and generates plasma through charging and discharging. The plasma generating stick(210) having electrodes(220, 230) can be formed using a press. The electrodes(220, 230) are buried and fixed at both ends of the plasma generating stick(210), or are adhered to both ends of the plasma generating stick(210).

Description

플라즈마 발생 장치Plasma generator

본 발명은 플라즈마 발생 장치에 관한 것으로, 특히 무수한 금속 입자를 덩어리 봉 형태로 성형하고 고전압 펄스를 인가하여 다량의 플라즈마를 발생시키기 위한 플라즈마 발생 장치에 관한 것이다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a plasma generating apparatus, and more particularly, to a plasma generating apparatus for forming a large amount of plasma by shaping a myriad of metal particles into a lump shaped rod and applying a high voltage pulse.

일반적으로, 플라즈마는 고도로 전리되어 (+)이온과 (-)이온이 동일한 밀도로 존재하여 전기적으로 균형을 이루어 중성이 되어 있는 상태나 또는 그 이온들을 말하며, 방전관이나 아크주가 가장 전형적인 것이다.In general, a plasma is highly ionized, and a state in which (+) and (-) ions are present at the same density and is electrically balanced to be neutral, or ions thereof, and a discharge tube or an arc column is the most typical one.

종래의 플라즈마 발생 장치는 도 1 에 도시한 바와 같이 직류 전원이 공급되는 전원 공급부(10)에 캐패시터(20)의 양극을 연결하여 이루어진다.Conventional plasma generating apparatus is made by connecting the anode of the capacitor 20 to the power supply 10 is supplied with direct current power as shown in FIG.

이와 같이 구성되는 종래의 플라즈마 발생 장치는 직류 전원을 인가하면서 캐패시터(20)가 충방전을 하도록 하여 플라즈마를 발생하도록 하였다.In the conventional plasma generator configured as described above, the capacitor 20 is charged and discharged while applying DC power to generate plasma.

그러나 이와 같은 종래의 플라즈마 발생 장치는 원하는 많은 양의 플라즈마의 발생이 어렵다.However, such a conventional plasma generator is difficult to generate a large amount of plasma desired.

최근에는 플라즈마를 침착 뿐만 아니라 다양하게 이용하는데, 예를 들면 공기 청정 및 오폐수 처리 등이다. 따라서 많은 양의 플라즈마를 발생하는 플라즈마 발생 장치가 필요하게 되었다.In recent years, plasma is not only deposited but also variously used, for example, air cleaning and wastewater treatment. Therefore, there is a need for a plasma generator that generates a large amount of plasma.

이를 위해 본 발명은 무수한 금속 입자를 덩어리 봉 형태로 성형하고 고전압 펄스를 인가하여 충방전이 이루어지도록 하므로써 다량의 플라즈마를 발생시키기 위한 플라즈마 발생 장치를 제공함에 그 목적이 있다.To this end, an object of the present invention is to provide a plasma generating apparatus for generating a large amount of plasma by forming a myriad metal particles in the form of lumps and applying a high voltage pulse to perform charge and discharge.

상기 목적을 달성하기 위해 본 발명은 고전압 펄스를 발생하는 고전압 펄스 발생 수단과, 무수한 금속 입자가 상호 간극을 갖으며 봉 형태로 성형되어 이루어지고 양단에 전극이 형성되어 상기 고전압 펄스 발생 수단에서 인가되는 고전압 펄스에 따라 충방전이 이루어지면서 플라즈마를 발생하는 플라즈마 발생봉으로 이루어지는 것을 특징으로 하는 플라즈마 발생 장치를 제공한다.In order to achieve the above object, the present invention provides a high voltage pulse generating means for generating a high voltage pulse, a myriad of metal particles are formed in a rod shape with mutual gaps, and electrodes are formed at both ends of the high voltage pulse generating means. Provided is a plasma generating apparatus comprising a plasma generating rod for generating plasma while charging and discharging is performed according to a high voltage pulse.

제1도는 종래의 플라즈마 발생 장치의 구성도.1 is a block diagram of a conventional plasma generator.

제2도는 본 발명에 의한 플라즈마 발생 장치의 구성도.2 is a block diagram of a plasma generating apparatus according to the present invention.

제3도는 제2도의 A-A선 단면도.3 is a cross-sectional view taken along the line A-A of FIG.

제4도는 제2도의 플라즈마 발생봉의 다른 실시예를 나타낸 구조도.4 is a structural diagram showing another embodiment of the plasma generating rod of FIG.

제5도는 제4도의 B-B선 단면도.5 is a cross-sectional view taken along the line B-B in FIG.

<도면의 주요부분에 대한 부호의 설명><Description of the symbols for the main parts of the drawings>

100 : 고전압 펄스 발생부 200 : 플라즈마 발생부100: high voltage pulse generator 200: plasma generator

210 : 플라즈마 발생봉 220, 230 : 전극210: plasma generating rod 220, 230: electrode

240 : 절연관240: insulated tube

이하 첨부한 도면을 참조하여 본 발명의 실시예를 상세히 설명한다.Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.

본 발명에 의한 플라즈마 발생 장치는 도 2 에 도시한 바와 같이 고전압의 펄스를 발생하는 고전압 펄스 발생부(100)와, 플라즈마 발생봉(210)으로 이루어져 내부에서 충방전되어 플라즈마를 발생하는 플라즈마 발생부(200)로 이루어진다.As shown in FIG. 2, the plasma generator includes a high voltage pulse generator 100 generating a high voltage pulse and a plasma generator rod 210 to charge and discharge the plasma to generate a plasma. It consists of 200.

상기 고전압 펄스 발생부(100)는 고전압 펄스, 즉 10㎐ 이상의 주파수를 갖고 20KV 이상의 전압으로 이루어진 고전압 펄스를 발생하여 플라즈마 발생부(200)로 출력한다.The high voltage pulse generator 100 generates a high voltage pulse, that is, a high voltage pulse having a frequency of 10 Hz or more and a voltage of 20 KV or more and outputting the generated voltage to the plasma generator 200.

상기 플라즈마 발생부(200)는 도 2 및 도 3 에 도시한 바와 같이 간극이 있는 무수한 금속 입자가 상호 간극을 갖으며 덩어리 봉 형태로 성형되어 이루어지고 양단에 전극(220, 230)이 형성되어 상기 고전압 펄스 발생 수단(100)에서 인가되는 고전압 펄스에 따라 충방전이 이루어지면서 플라즈마를 발생하는 플라즈마 발생봉(210)으로 이루어진다.As shown in FIGS. 2 and 3, the plasma generating unit 200 is formed by forming a plurality of metal particles having a gap therebetween and forming a lump rod, and electrodes 220 and 230 are formed at both ends thereof. Charge and discharge is made in accordance with the high voltage pulse applied from the high voltage pulse generating means 100 is made of a plasma generating rod 210 for generating a plasma.

여기서, 상기 플라즈마 발생봉(210)의 양단에 전극(220, 230)이 매입 고정되어 형성되거나, 플라즈마 발생봉(210)의 양단부에 전극(220, 230)이 부착될 수도 있다.Here, the electrodes 220 and 230 may be embedded and fixed to both ends of the plasma generating rod 210, or the electrodes 220 and 230 may be attached to both ends of the plasma generating rod 210.

상기 플라즈마 발생봉(210)은 프레스를 이용하여 만들어진다.The plasma generating rod 210 is made using a press.

또한, 상기 플라즈마 발생봉(210)은 도 4 및 도 5 에 도시한 바와 같이 절연관(240)의 내측에 결합되어 형성되어 금속 입자 사이에 적당한 간극이 형성되도록 한다.In addition, the plasma generating rod 210 is formed to be coupled to the inside of the insulating tube 240, as shown in Figure 4 and 5 to form a suitable gap between the metal particles.

이와 같이 이루어지는 본 발명에 의한 플라즈마 발생 장치의 동작을 설명한다.The operation of the plasma generating apparatus according to the present invention thus achieved will be described.

상기 고전압 펄스 발생부(100)에서 고전압 펄스, 즉 10㎐ 이상의 주파수를 갖고 20KV 이상의 전압으로 이루어진 고전압 펄스를 발생하여 상기 플라즈마 발생봉(210)의 양전극(220, 230)을 통해 플라즈마 발생봉(210)으로 인가한다.The high voltage pulse generator 100 generates a high voltage pulse, that is, a high voltage pulse having a frequency of 10 kHz or more and consisting of a voltage of 20 KV or more, through the positive electrodes 220 and 230 of the plasma generating rod 210. ) Is applied.

이때, 상기 플라즈마 발생봉(210)의 금속 입자는 서로 간에 수많은 간극이 형성되어 있게 됨에 따라 플라즈마 발생봉(210)으로 인가되는 고전압 펄스에 의해 플라즈마 발생봉(210)의 금속입자가 대전되고 금속입자 사이에 존재하는 공기가 유전체의 역할을 하여 수많은 캐패시터가 형성되며, 인가되는 고전압 펄스에 따라 캐패시터의 충방전이 이루어져 플라즈마가 발생되게 된다.In this case, as the metal particles of the plasma generating rod 210 have a large number of gaps formed therebetween, the metal particles of the plasma generating rod 210 are charged by the high voltage pulse applied to the plasma generating rod 210 and the metal particles are charged. The air present in between serves as a dielectric to form a large number of capacitors, and the charge and discharge of the capacitor is generated according to the high voltage pulse applied to generate a plasma.

여기서, 상기 금속입자의 크기(dm)는 100-300㎛이고, 금속 입자의 간극(△m)은 △m ≥dm이다.Here, the size (dm) of the metal particles is 100-300㎛, the gap (△ m) of the metal particles is △ m ≥dm.

물론, 상기 절연판(240)은 플라즈마의 방전이 잘 이루어질 수 있는 재질(예: 석영)로 구성되어 있게 된다.Of course, the insulating plate 240 is made of a material (for example, quartz) that can be discharged well plasma.

한편, 상기 플라즈마가 발생되면서 동시에 자외선이 발생되게 되고 이에 따라 오존이 발생되므로, 오폐수를 용이하게 정화 및 살균할 수 있다.Meanwhile, since the plasma is generated and ultraviolet rays are generated at the same time, and thus ozone is generated, the waste water can be easily purified and sterilized.

이상에서 설명한 바와 같이 본 발명에 의한 플라즈마 발생 장치는 간단하여 소형으로 제조가 가능하므로 설비 면적이 줄어들게 되어 다양한 장치에 적용할 수 있다.As described above, since the plasma generating apparatus according to the present invention is simple and can be manufactured in a small size, the facility area is reduced, and thus it can be applied to various apparatuses.

Claims (4)

고전압 펄스를 발생하는 고전압 펄스 발생 수단(100)과; 무수한 금속 입자가 상호 간극을 갖으며 봉 형태로 성형되어 이루어지고 양단에 전극(220, 230)이 형성되어 상기 고전압 펄스 발생 수단(100)에서 인가되는 고전압 펄스에 따라 충방전이 이루어지면서 플라즈마를 발생하는 플라즈마 발생봉(210)으로 이루어지는 것을 특징으로 하는 플라즈마 발생 장치.High voltage pulse generating means (100) for generating a high voltage pulse; Countless metal particles are formed in a rod shape with mutual gaps, and electrodes 220 and 230 are formed at both ends to generate plasma while charging and discharging are performed according to a high voltage pulse applied from the high voltage pulse generating means 100. Plasma generating device comprising a plasma generating rod (210). 제1항에 있어서, 상기 고전압 펄스 발생 수단(100)은 10㎐ 이상의 주파수를 갖고 20KV 이상의 전압으로 이루어진 고전압 펄스를 발생함을 특징으로 하는 플라즈마 발생 장치.The plasma generating apparatus of claim 1, wherein the high voltage pulse generating means (100) generates a high voltage pulse having a frequency of 10 Hz or more and a voltage of 20 KV or more. 제1항에 있어서, 상기 플라즈마 발생봉(210)의 양단에 상기 전극(220, 230)이 매입 고정되어 형성됨을 특징으로 하는 플라즈마 발생 장치.The plasma generating apparatus of claim 1, wherein the electrodes (220, 230) are fixedly formed at both ends of the plasma generating rod (210). 제1항에 있어서, 상기 플라즈마 발생봉(210)은 절연관(240)의 내측에 결합되어 형성됨을 특징으로 하는 플라즈마 발생 장치.The plasma generator of claim 1, wherein the plasma generating rod (210) is coupled to an inner side of the insulating tube (240).
KR1019980017692A 1998-05-15 1998-05-15 Plasma generating apparatus KR100294577B1 (en)

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KR100294577B1 true KR100294577B1 (en) 2001-10-25

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