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JPWO2020240993A1 - - Google Patents

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Publication number
JPWO2020240993A1
JPWO2020240993A1 JP2021522649A JP2021522649A JPWO2020240993A1 JP WO2020240993 A1 JPWO2020240993 A1 JP WO2020240993A1 JP 2021522649 A JP2021522649 A JP 2021522649A JP 2021522649 A JP2021522649 A JP 2021522649A JP WO2020240993 A1 JPWO2020240993 A1 JP WO2020240993A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2021522649A
Other languages
Japanese (ja)
Other versions
JP7367761B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2020240993A1 publication Critical patent/JPWO2020240993A1/ja
Application granted granted Critical
Publication of JP7367761B2 publication Critical patent/JP7367761B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
    • C08F220/302—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety and two or more oxygen atoms in the alcohol moiety
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur, or oxygen atoms in addition to the carboxy oxygen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
    • C08F220/301—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety and one oxygen in the alcohol moiety
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2021522649A 2019-05-30 2020-03-16 樹脂組成物および樹脂膜 Active JP7367761B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019101097 2019-05-30
JP2019101097 2019-05-30
PCT/JP2020/011356 WO2020240993A1 (ja) 2019-05-30 2020-03-16 樹脂組成物および樹脂膜

Publications (2)

Publication Number Publication Date
JPWO2020240993A1 true JPWO2020240993A1 (zh) 2020-12-03
JP7367761B2 JP7367761B2 (ja) 2023-10-24

Family

ID=73551997

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021522649A Active JP7367761B2 (ja) 2019-05-30 2020-03-16 樹脂組成物および樹脂膜

Country Status (5)

Country Link
JP (1) JP7367761B2 (zh)
KR (1) KR102645527B1 (zh)
CN (2) CN113853394A (zh)
TW (1) TWI844646B (zh)
WO (1) WO2020240993A1 (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2023023113A (ja) * 2021-08-04 2023-02-16 日本化薬株式会社 硬化性高分子化合物を含む樹脂組成物

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007033517A (ja) * 2005-07-22 2007-02-08 Showa Highpolymer Co Ltd 感光性の樹脂組成物
JP2007204448A (ja) * 2006-02-03 2007-08-16 Showa Highpolymer Co Ltd ヒドロキシフェニル（メタ）アクリレート組成物及びその製造方法
JP2012067059A (ja) * 2010-09-27 2012-04-05 Showa Denko Kk 二価フェノール類モノ（メタ）アクリレートを製造する方法
WO2013015055A1 (ja) * 2011-07-25 2013-01-31 昭和電工株式会社 芳香族ジオールモノ（メタ）アクリレートの製造方法
JP2015215453A (ja) * 2014-05-09 2015-12-03 日立化成株式会社 ネガ型感光性樹脂組成物、接着シート、接着剤パターン、接着剤層付半導体ウェハ及び半導体装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4204106B2 (ja) * 1998-08-12 2009-01-07 三菱レイヨン株式会社 被覆材組成物
WO2014091818A1 (ja) 2012-12-14 2014-06-19 昭和電工株式会社 共重合体、それを含有する感光性樹脂組成物及び樹脂膜
JP6451627B2 (ja) * 2014-03-11 2019-01-16 三菱ケミカル株式会社 活性エネルギー線硬化性樹脂組成物及び自動車ヘッドランプレンズ

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007033517A (ja) * 2005-07-22 2007-02-08 Showa Highpolymer Co Ltd 感光性の樹脂組成物
JP2007204448A (ja) * 2006-02-03 2007-08-16 Showa Highpolymer Co Ltd ヒドロキシフェニル（メタ）アクリレート組成物及びその製造方法
JP2012067059A (ja) * 2010-09-27 2012-04-05 Showa Denko Kk 二価フェノール類モノ（メタ）アクリレートを製造する方法
WO2013015055A1 (ja) * 2011-07-25 2013-01-31 昭和電工株式会社 芳香族ジオールモノ（メタ）アクリレートの製造方法
JP2015215453A (ja) * 2014-05-09 2015-12-03 日立化成株式会社 ネガ型感光性樹脂組成物、接着シート、接着剤パターン、接着剤層付半導体ウェハ及び半導体装置

Also Published As

Publication number Publication date
CN113853394A (zh) 2021-12-28
WO2020240993A1 (ja) 2020-12-03
TWI844646B (zh) 2024-06-11
KR102645527B1 (ko) 2024-03-11
TW202104281A (zh) 2021-02-01
KR20210154984A (ko) 2021-12-21
JP7367761B2 (ja) 2023-10-24
CN117467065A (zh) 2024-01-30

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