JPWO2013191255A1 - Illumination apparatus, processing apparatus, and device manufacturing method - Google Patents

Abstract

An illumination device has a rectangular first surface, an inner surface, and a rectangular second surface, and an optical integrator in which light incident on the first surface is emitted from the second surface through multiple reflection on the inner surface A light guide that guides light from the light source to the optical integrator, and supplies the light integrator with a plurality of light beams arranged at predetermined intervals along the longitudinal direction of the first surface; and An image formed by forming a conjugate plane conjugate with the second surface in the short direction of the second surface and having a small refractive power in the longitudinal direction of the second surface compared to the refractive power in the short direction of the second surface. An optical system.

Description

The present invention relates to an illumination apparatus, a processing apparatus, and a device manufacturing method.
This application claims priority based on US Provisional Application No. 61 / 662,571, Jun. 21, 2012, the contents of which are incorporated herein by reference.

  In recent years, devices such as organic EL display panels and liquid crystal display panels are frequently used as display devices such as televisions. Such various devices are manufactured, for example, by forming various film patterns such as transparent thin film electrodes on a substrate such as a glass plate using an exposure process and an etching technique. As one form of manufacturing a device, a roll-to-roll manufacturing method has been proposed in which various processes such as an exposure process are performed on a transport path while transporting a film-shaped substrate (for example, Patent Document 1).

International Publication No. 2008/129819

A processing apparatus such as an exposure apparatus is expected to expand the processing range from the viewpoint of making it possible to manufacture devices efficiently. An illuminating device used in such a processing apparatus is expected to expand the irradiation range of light in a direction perpendicular to the moving direction of the workpiece.
The aspect which concerns on this invention aims at providing the illuminating device, processing apparatus, and device manufacturing method which make it possible to extend the processing range.

  An illumination device according to an aspect of the present invention includes a rectangular first surface, an inner surface, and a rectangular second surface, and light incident on the first surface is reflected by the second surface through multiple reflection on the inner surface. An optical integrator that emits light from a surface and a light guide unit that guides light from a light source to the optical integrator, and supplies a plurality of light beams arranged at predetermined intervals along the longitudinal direction of the first surface to the optical integrator. Forming a conjugate surface conjugate with the second surface with respect to the light guide portion and the short direction of the second surface, and the longitudinal direction of the second surface as compared with the refractive power with respect to the short direction of the second surface And an imaging optical system having a small refractive power.

  An illumination device according to an aspect of the present invention includes a rectangular first surface, an inner surface, and a rectangular second surface, and light incident on the first surface is reflected from the second surface by multiple reflection on the inner surface. A light integrator that emits light and a light guide unit that guides light from a light source to the light integrator, and a plurality of light beams that are arranged at predetermined intervals along the longitudinal direction of the first surface and have predetermined angle characteristics, Forming a conjugate surface conjugate with the second surface with respect to the short side direction of the second surface, and supplying the optical integrator with respect to the short direction of the second surface, and comparing the refractive power with respect to the short direction of the second surface An imaging optical system having a small refractive power in the longitudinal direction of the second surface, and the imaging optical system having a predetermined magnification other than equal magnification in the short direction of the second surface.

  A processing apparatus according to an aspect of the present invention is a processing apparatus that transfers a pattern formed on a mask pattern to a substrate having a sensitive layer, the illumination apparatus that illuminates the mask pattern, the mask pattern, and the substrate Are moved relative to each other in a direction perpendicular to the longitudinal direction of the second surface.

  In the device manufacturing method according to one aspect of the present invention, the processing apparatus continuously transfers the pattern to the substrate while relatively moving the mask pattern and the substrate, and the pattern is transferred to the device. Performing subsequent processing utilizing changes in the sensitive layer of the substrate.

  An illumination device according to an aspect of the present invention has a rectangular incident end, an inner surface, and a rectangular emission end, and guides light from a light source incident from the incident end to the emission end by multiple reflection on the inner surface. A rectangular parallelepiped-shaped optical integrator, a light source side optical system for forming light incident on an incident end of the optical integrator into a plurality of condensed light beams arranged at predetermined intervals along a longitudinal direction of the incident end, and the optical integrator An imaging optical system that forms a conjugate plane conjugate with the exit end in the short direction of the exit end, and has a smaller refractive power in the longitudinal direction of the exit end than the refractive power in the transverse direction of the exit end; Is provided.

  According to the aspect of the present invention, it is possible to provide an illuminating device, a processing apparatus, and a device manufacturing method that can expand a processing range.

It is a figure which shows an example of a device manufacturing system. It is a side view which shows the exposure apparatus by 1st Embodiment. It is a front view which shows the exposure apparatus by 1st Embodiment. It is a perspective view which shows the illuminating device by 1st Embodiment. It is the side view and front view which show the illuminating device by 1st Embodiment. It is a top view which shows the light source part by 1st Embodiment. It is a top view which shows the aperture member by 1st Embodiment. It is a figure for demonstrating the illumination method. It is a figure for demonstrating the illumination method. It is a graph for illuminance distribution. It is a side view which shows the exposure apparatus by 2nd Embodiment. It is the side view and front view which show the illuminating device by 2nd Embodiment. It is a top view which shows the aperture member by 2nd Embodiment. It is a side view which shows the exposure apparatus by 3rd Embodiment. It is a top view which shows the illuminating device by 3rd Embodiment. It is a figure for demonstrating the illumination method. It is a graph which shows an example of illumination distribution. It is a side view which shows the exposure apparatus by 4th Embodiment. It is a figure for demonstrating the illumination method. It is a graph which shows an example of illumination distribution. It is a flowchart which shows an example of a device manufacturing method.

[First Embodiment]
FIG. 1 is a diagram illustrating a configuration example of a device manufacturing system SYS (flexible display manufacturing line). Here, the flexible substrate P (sheet, film, etc.) drawn out from the supply roll FR1 is sequentially passed through n processing devices U1, U2, U3, U4, U5,. The example until it winds up to FR2 is shown.

  In FIG. 1, the XYZ orthogonal coordinate system is set so that the front surface (or back surface) of the substrate P is perpendicular to the XZ plane, and the direction (width direction) orthogonal to the transport direction (long direction) of the substrate P is Y. It shall be set in the axial direction. For example, the Z-axis direction is set to the vertical direction, and the X-axis direction and the Y-axis direction are set to the horizontal direction. For convenience of explanation, a diagram viewed from the X-axis direction (downstream of the transport direction) is a front view, a diagram viewed from the Y-axis direction (direction of the rotation center axis) is a side view, and a Z-axis direction (above the vertical direction). The view seen from above is sometimes referred to as a top view.

  The substrate P wound around the supply roll FR1 is pulled out by the nipped driving roller, and is sent to the processing device U1 while being positioned in the Y direction by the edge position controller.

  The processing device U1 is, for example, a coating device, and a photosensitive functional liquid (photoresist, photosensitive coupling material, UV curable resin liquid, etc.) is applied to the surface of the substrate P by a printing method, and the substrate P is transported in the long direction (long direction). ) Continuously or selectively. The processing device U2 is, for example, a heating device, and heats the substrate P transported from the processing device U1 to a predetermined temperature (for example, about several tens of degrees Celsius to 120 ° C.), and the photosensitive functional layer applied to the surface is formed. Stable to settle.

  The processing device U3 includes an exposure device, and irradiates, for example, ultraviolet patterning light corresponding to the circuit pattern and wiring pattern for display onto the photosensitive functional layer of the substrate P conveyed from the processing device U2. In the processing apparatus U3, the edge position controller EPC controls the center of the substrate P in the Y direction (width direction) to a fixed position, and the nipped drive roller DR1 places the substrate P in the exposure area (processing area) of the exposure apparatus. Carry in. The drive rollers DR2 and DR3 carry out the substrate P while giving a predetermined slack (play) DL to the substrate P.

  In the processing apparatus U3, the rotating drum DM holds a sheet-like mask pattern M (mask substrate), and the rotating drum DP supports the substrate P at a position facing the rotating drum DM. In the processing device U3, the illumination device IU irradiates the substrate P with light through a part of the mask pattern M held on the rotating drum DM, thereby changing the pattern formed on the mask pattern M to the rotating drum. Transfer to the substrate P supported by the DP. In the processing apparatus U3, the alignment microscope AM detects an alignment mark or the like formed in advance on the substrate P in order to relatively align (align) the exposed (transferred) pattern with the substrate P.

  The processing apparatus U3 in FIG. 1 includes a so-called proximity type exposure apparatus, and a rotary drum DM around which a mask pattern M is wound is used as a mask body, and a predetermined gap (for example, several tens μm) is provided between the mask body and the substrate P. The pattern on the mask body is transferred to the substrate P. The pattern transfer method by the processing apparatus U3 is not limited to the proximity method, and may be a contact method in which the substrate P is wound around the outer periphery of the cylindrical mask body, or an image of the mask pattern M is obtained by the projection optical system. A method of projecting onto the substrate P may be used. In addition, the rotary drum DM and the mask pattern M may be releasable or may not be releasable. For example, the mask body may be one in which the mask pattern M is formed on the surface of the rotary drum DM made of a transparent cylindrical quartz tube.

  The processing apparatus U4 is, for example, a wet processing apparatus, and performs various types of wet processing such as wet development processing and electroless plating processing on the photosensitive functional layer of the substrate P conveyed from the processing device U3. Do at least one. The processing apparatus U5 is, for example, a heat drying apparatus, and warms the substrate P transported from the processing apparatus U4, and adjusts the moisture content of the substrate P wetted by the wet process to a predetermined value.

  The substrate P that has been processed by the processing devices U1 to U5 and the like passes through the last processing device Un in the series of processes, and then is wound on the collection roll FR2 via the nipped drive roller and the edge position controller.

  The host control device CONT controls the operation of each processing device U1 to Un constituting the production line, and monitors the processing status and processing status in each processing device U1 to Un, and the substrate P between the processing devices. It also monitors the conveyance status, and performs feedback correction and feedforward correction based on the results of prior and subsequent inspections and measurements.

  The board | substrate P used by this embodiment is foil (foil) etc. which consist of metals or alloys, such as a resin film and stainless steel, for example. The material of the resin film is, for example, one of polyethylene resin, polypropylene resin, polyester resin, ethylene vinyl copolymer resin, polyvinyl chloride resin, cellulose resin, polyamide resin, polyimide resin, polycarbonate resin, polystyrene resin, and vinyl acetate resin. Or two or more.

  The substrate P may be a substrate whose thermal expansion coefficient is not remarkably large so that the deformation amount due to heat received in various processing steps can be substantially ignored. The thermal expansion coefficient may be set smaller than a threshold corresponding to the process temperature or the like, for example, by mixing an inorganic filler with a resin film. The inorganic filler may be, for example, titanium oxide, zinc oxide, alumina, silicon oxide or the like. Further, the substrate P may be a single layer of ultra-thin glass having a thickness of about 100 μm manufactured by a float process or the like, or a laminate in which the above-described resin film or foil is bonded to the ultra-thin glass. It may be. In addition, the substrate P may be a substrate whose surface is modified and activated in advance by a predetermined pretreatment, or a substrate having a fine partition structure (uneven structure) for precise patterning.

  The device manufacturing system SYS of FIG. 1 repeatedly or continuously executes various processes for manufacturing a device (display panel or the like) on the substrate P. The substrate P that has been subjected to various types of processing is divided (diced) for each device to form a plurality of devices. As for the dimension of the substrate P, for example, the dimension in the width direction (short Y-axis direction) is about 10 cm to 2 m, and the dimension in the length direction (long X-axis direction) is 10 m or more. Note that at least one of the plurality of processing apparatuses included in the above-described device manufacturing system SYS may be omitted.

  Next, the processing apparatus U3 (exposure apparatus EX) will be described in more detail. FIG. 2 is a side view showing the exposure apparatus EX according to the present embodiment, and FIG. 3 is a front view showing the exposure apparatus EX. The exposure apparatus EX in FIG. 2 includes an illumination apparatus IU that illuminates a part of the mask pattern M, a moving apparatus 10 that moves the substrate P and the mask pattern M, and a control apparatus 11 that controls each part of the exposure apparatus EX. .

  The exposure apparatus EX in FIG. 2 is a so-called scanning exposure apparatus, and a pattern formed on the mask pattern M by scanning the substrate P with the exposure light L2 generated by the mask pattern M illuminated by the illumination light L1. Is transferred to the substrate P.

  As shown in FIGS. 2 and 3, the illuminating device IU forms an illumination area IR that is long in the Y-axis direction, and emits illumination light L1 so that the illuminance distribution in the illumination area IR is uniform. The moving device 10 has a direction (short direction, short direction) substantially perpendicular to the longitudinal direction (long axis direction, long axis, Y axis direction) of the illumination region IR so that a part of the mask pattern M sequentially passes through the illumination region IR. The mask pattern M is moved in the axial direction, the short axis, and the X-axis direction). In this way, the exposure apparatus EX generates exposure light L2 corresponding to the pattern in this area in the area of the mask pattern M that is disposed in the illumination area IR.

  Further, the moving device 10 moves the substrate P in the short direction (X-axis direction) of the illumination region IR so that the substrate P passes through the region (exposure region PR) where the exposure light L2 enters from the mask pattern M. In this way, the exposure apparatus EX scans the substrate P with the exposure light L2 in the direction (X-axis direction) perpendicular to the longitudinal direction (Y-axis direction) of the illumination region IR.

  Next, the moving device 10 will be described in more detail. 2 includes a rotary drum DM that holds the mask pattern M, a drive unit 12 that drives the rotary drum DM, a rotary drum DP that supports the substrate P, and a drive unit 13 that drives the rotary drum DP.

  The rotating drum DM is a mask holding member that holds the mask pattern M. The rotating drum DM has a cylindrical outer peripheral surface (hereinafter referred to as a cylindrical surface DMa), and holds the mask pattern M curved in a cylindrical surface along the cylindrical surface DMa. The cylindrical surface is a surface curved with a predetermined radius around a predetermined center line, and is, for example, at least a part of an outer peripheral surface of a column or a cylinder.

  The mask pattern M is a transmissive mask pattern formed in a sheet shape, for example, and includes a pattern formed of a light shielding member such as chrome. The rotating drum DM holds the mask pattern M so that it can be released (replaceable) by winding the mask pattern M around the cylindrical surface DMa, but it may hold the mask pattern M so that it cannot be released. For example, the mask pattern M is formed on the cylindrical surface DMa of the rotating drum DM such as a quartz tube or a glass pipe, and may be integrated with the rotating drum DM.

  The rotary drum DM is provided so as to be rotatable around the rotation center axis AX1, and rotates by torque supplied from the drive unit 12. The rotational position of the rotary drum DM is detected by a detection unit 14 such as an encoder, and is controlled based on the detection result by the detection unit 14. The detection unit 14 may be a part of the moving device 10 or a device different from the moving device 10.

  The rotating drum DP is a substrate holding member that holds the substrate P. The rotary drum DP has a cylindrical outer peripheral surface DPa, and supports the substrate P by the outer peripheral surface DPa. The rotary drum DP is provided so as to be rotatable around the rotation center axis AX2, and is rotated by torque supplied from the drive unit 13. The rotation center axis AX2 of the rotary drum DP is set, for example, substantially parallel to the rotation center axis AX1 of the rotary drum DM. The substrate P is transported so as to be wound around the rotating drum DP as the rotating drum DP rotates.

  The rotational position of the rotary drum DP is detected by a detection unit 15 such as an encoder, and is controlled based on the detection result by the detection unit 15. The detection unit 15 may be a part of the moving device 10 or may be a device different from the moving device 10.

  The control device 11 controls the rotational position of the rotary drum DM by controlling the drive unit 12 based on the detection result acquired from the detection unit 14. In this way, the control device 11 can control the rotational position of the mask pattern M held on the rotary drum DM. Further, the control device 11 controls the rotational position of the rotary drum DP by controlling the drive unit 13 based on the detection result acquired from the detection unit 15. Thus, the control device 11 can control the position of the substrate P that moves as the rotary drum DP rotates.

  The control device 11 controls the relative position between the mask pattern M and the substrate P by controlling the drive unit 12 and the drive unit 13, and the exposure light L2 generated in the portion of the mask pattern M that overlaps the illumination region IR. The substrate P is scanned. The scanning direction in which the substrate P is scanned by the exposure light L2 in the exposure apparatus EX is a direction (X-axis direction) substantially perpendicular to the rotation center axis AX1 (Y-axis direction).

  The drive unit 12 may be capable of moving the rotary drum DM in at least one direction of the X-axis direction, the Y-axis direction, and the Z-axis direction. In this case, the detection unit 14 may detect the position of the rotary drum DM in the direction in which the drive unit 12 moves the rotary drum DM, and the control device 11 determines the drive unit based on the detection result of the detection unit 14. 12 may be controlled to control the position of the rotating drum DM in any direction.

  Such position adjustment of the rotating drum DM may be possible in one or both of the rotation direction around the X axis and the rotation direction around the Z axis. Further, the position adjustment of the rotary drum DM may be applied to the rotary drum DP. The exposure apparatus EX can control the relative position between the rotating drum DM and the rotating drum DP by controlling the position of one or both of the rotating drum DM and the rotating drum DP. Thereby, the exposure apparatus EX can adjust the relative position between the illumination region IR and the substrate P in directions other than the scanning direction.

  Next, the lighting device IU will be described in more detail. 4 is a perspective view showing the illumination device IU according to the present embodiment, FIG. 5A is a side view showing the illumination device IU, and FIG. 5B is a front view showing the illumination device IU. 6 is a plan view showing an example of the light source unit (light guide unit, light source side optical system) 20, and FIG. 7 is a plan view showing a diaphragm member.

  The illumination device IU in FIG. 4 forms an illumination region IR having a predetermined direction (Y-axis direction) as a longitudinal direction. In the exposure apparatus EX (see FIG. 2), the illumination apparatus IU is arranged such that the longitudinal direction of the illumination area IR is substantially perpendicular to the scanning direction (X-axis direction).

  The illumination device IU includes a light source unit 20, an enlargement optical system 21, an optical integrator 22, and an imaging optical system 23. The illumination light L1 emitted from the light source unit 20 enters the optical integrator 22 through the magnifying optical system 21, exits from the optical integrator 22, and then enters the illumination region IR through the imaging optical system 23.

  The illumination light L1 for exposure is, for example, light having a wavelength of 300 nm to 400 nm, or light having a wavelength of 400 nm to 500 nm, for example, light in the ultraviolet region. Therefore, the glass material of the optical element constituting each of the light source unit 20, the magnifying optical system 21, the optical integrator 22, and the imaging optical system 23 may be quartz.

  The light source unit 20 of FIG. 6 includes a solid light source 24 (light source) and a plurality of optical fibers 25 connected to the solid light source 24. Here, a plurality of solid light sources 24 are provided in the light source unit 20, and the optical fibers 25 are provided in a one-to-one correspondence with the solid light sources 24. The solid light source 24 is, for example, a laser diode (LD) or a light emitting diode (LED). The light source unit 20 guides light from the solid light source 24 to the optical integrator 22.

  The optical fiber 25 (see FIGS. 4 and 5) guides the illumination light L1 from the solid-state light source 24 in FIG. 6 to the optical integrator 22 via the magnifying optical system 21. Each of the plurality of optical fibers 25 has an end 26 from which the illumination light L1 is emitted. The end 26 of the optical fiber 25 is along the longitudinal direction (long axis direction, long axis) of the incident end 35 of the optical integrator 22. They are arranged at a predetermined pitch (predetermined interval, distance between centers). A light source image Im1 is formed at each end 26 of the plurality of optical fibers 25, and the light source unit 20 arranges the plurality of light source images Im1 at a predetermined pitch in a direction corresponding to the longitudinal direction of the illumination region IR. Then, it is supplied to the optical integrator 22.

  The end 26 of the optical fiber 25 has a substantially circular shape, and the divergence angle of the illumination light L1 when emitted from the light source unit 20 is converged on the incident end of the optical fiber 25, and the angle characteristics (numerical aperture) of the incident light. It is determined by the diameter (φ1) of the optical fiber 25. The magnifying optical system 21 adjusts the divergence angle of the illumination light L <b> 1 when incident on the optical integrator 22. The magnifying optical system 21 is disposed in the optical path between the light source unit 20 and the optical integrator 22, and adjusts the spread angle of the illumination light L1 by magnifying the light source image Im1 formed by the light source unit 20.

  The magnifying optical system 21 shown in FIG. 5B includes a plurality of modules 27 arranged in the longitudinal direction of the illumination region IR. Each of the plurality of modules 27 is provided in a one-to-one correspondence with the optical fiber 25 of the light source unit 20, and forms an image of the end 26 on the light emission side of the optical fiber 25 in a corresponding relationship. That is, the magnifying optical system 21 forms a secondary light source image Im2 in which the light source image Im1 is enlarged. In each drawing referred to in the description, in order to make the drawing easy to see, the number of the light source units 20 and the modules 27 may be reduced as appropriate.

  Each of the plurality of modules 27 includes a lens 28 and a lens 29 that form a secondary light source image Im2, and a lens 30. The lens 30 condenses the illumination light L <b> 1 that has passed through the lens 29 so that it falls within the incident end 35 of the optical integrator 22. Each of the lens 28, the lens 29, and the lens 30 is configured by, for example, a spherical lens, but may include an aspherical lens or a free-form surface lens.

  The lens 28 and the lens 29 are, for example, telecentric optical systems, and the front focal position of the lens 28 is set at the end 26 on the light emitting side of the optical fiber 25, and the front focal position of the lens 29 is the rear focal position of the lens 28. Set to the side focus position. An image of the end 26 of the optical fiber 25 (secondary light source image Im2) is formed at the rear focal position of the lens 29. The lens 30 is disposed in the optical path between the lens 29 and the incident end 35 of the optical integrator 22. For example, the rear focal position is set at the incident end 35 of the optical integrator 22.

  In such a setting, an image (light source image) of the end 26 of the optical fiber 25 is formed (converged) at the position of the incident end 35 of the optical integrator 22, but this is not necessarily a necessary condition. The position of the incident end 35 of 22 and the position where the light source image is formed may be shifted in the optical axis direction of the lenses 28 to 30. For example, the rear focal position of the lens 30 may be shifted from the position of the incident end 35 of the optical integrator 22 in the normal direction of the incident end 35.

  The module 27 of FIG. 5 includes a diaphragm member 31 that defines the spread angle of the illumination light L1 when entering the optical integrator 22. The diaphragm member 31 is a so-called aperture diaphragm, and is disposed, for example, at or near the position of the pupil plane (secondary light source image Im2) of the magnifying optical system 21. Here, the diaphragm member 31 is disposed at a position optically conjugate with the end of the optical fiber 25 on the light emission side (solid light source 24 side).

  The diaphragm member 31 in FIG. 7 has an opening 31a through which the illumination light L1 passes. A plurality of openings 31a are arranged in the longitudinal direction (Y-axis direction) of the illumination region IR corresponding to the arrangement of the plurality of modules 27 in FIG. The opening 31a is substantially circular, and defines the divergence angle in the XZ plane and the divergence angle in the YZ plane of the illumination light L1 that has passed through the diaphragm member 31. The diaphragm member 31 can be omitted as appropriate.

  5B, a plurality of modules 27 of the magnifying optical system 21 includes a lens array 32 in which lenses 28 are arranged in the Y-axis direction, a lens array 33 in which lenses 29 are arranged in the Y-axis direction, and a lens 30. Are configured with a lens array 34 arranged in the Y-axis direction. Thus, although the number of components can be reduced by configuring at least one type of lens of the magnifying optical system 21 with a lens array, at least one type of lens of the magnifying optical system 21 is not in the form of a lens array. Alternatively, the modules 27 may be independent components.

  The optical integrator 22 (see FIG. 4) is a rectangular parallelepiped optical member such as a rod lens. The optical integrator 22 includes a rectangular incident end (rectangular incident surface, first surface) 35, an inner surface 36 including a long side of the incident end 35, an inner surface 37 including a short side of the incident end 35, and a rectangular output end (rectangular). , A second surface) 38. The incident end 35 includes an incident region where the illumination light L <b> 1 from the light source unit 20 is incident, and the emission end 38 includes an emission region where the illumination light L <b> 1 passing through the interior of the optical integrator 22 is emitted. The optical integrator 22 guides the illumination light L1 incident on the incident end 35 to the emission end 38 by multiple reflection on the inner surface 36.

  Illumination light L1 that spreads in the short direction (short axis direction, short axis) of the incident end 35 in the optical integrator 22 is shown in FIG. 8A later, and is reflected on the inner surface 36 located at the end in the short direction. Includes a plurality of different luminous fluxes. The illumination light L1 passing through the optical integrator 22 has a uniform illuminance distribution in the short side direction of the emission end 38 by overlapping a plurality of light beams having different reflection counts at the emission end 38. Here, the illumination light L <b> 1 includes a light beam reflected by the inner surface 36, regardless of the illumination light L <b> 1 emitted from any of the plurality of modules 27.

  The illumination light L1 that spreads in the longitudinal direction of the incident end 35 in the optical integrator 22 will be shown later in FIG. 8B, and is positioned at the longitudinal end according to the position in the Y-axis direction of the emission source module 27. A part of the light beam is reflected by the inner surface 37, and the other light beam does not enter the inner surface 37. For example, the illumination light L1 from the module 27 disposed at the longitudinal end of the incident end 35 includes a light beam that is incident on and reflected from the inner surface 37, but is disposed at the longitudinal central portion of the incident end 35. The illumination light L1 from the module 27 is substantially free of the light beam incident on the inner surface 37. Here, most of the illumination light L <b> 1 from the module 27 arranged at the center of the incident end 35 in the longitudinal direction passes through the inside of the optical integrator 22 without being reflected by the inner surface 37 and is emitted from the emission end 38.

  The optical integrator 22 hardly changes the divergence angle of the illumination light L1 in each of the X-axis direction (in the XZ plane) corresponding to the short direction and the Y-axis direction (in the YZ plane) corresponding to the long direction. That is, the divergence angle in the X-axis direction of the illumination light L1 in the optical integrator 22 is almost the same when incident on the incident end 35 and when emitted from the output end 38. Further, the divergence angle in the Y-axis direction of the illumination light L1 in the optical integrator 22 is almost the same when entering the incident end 35 and when emitting from the exit end 38. The illumination light L1 emitted from the optical integrator 22 enters the imaging optical system 23.

  The imaging optical system 23 has a greater refractive power in the short direction of the exit end 38 than in the longitudinal direction of the exit end 38. The imaging optical system 23 is composed of, for example, a pair of cylindrical lenses (cylindrical lenses). For example, the generating line of the cylindrical lens of the imaging optical system 23 is set substantially parallel to the longitudinal direction of the emission end 38.

  The imaging optical system 23 has an imaging effect on a light beam on an arbitrary plane parallel to the short direction of the emission end 38 of the optical integrator 22 and perpendicular to the longitudinal direction. The imaging optical system 23 forms a conjugate surface 23 a (illumination region IR) conjugate with the emission end 38 in the short direction of the emission end 38 of the optical integrator 22. For example, when the illumination device IU is viewed from the Y-axis direction, the light beam emitted from one point (a line parallel to the Y-axis direction) of the emission end 38 is approximately one point (parallel to the Y-axis direction) on the conjugate plane 23a. Converge on top.

  The illuminating device IU having the above-described configuration is arranged such that the conjugate surface 23a (illumination region IR) is substantially at the same position as the mask pattern M (cylindrical surface DMa of the rotating drum DM). The illuminance distribution in the short direction at the emission end 38 of the optical integrator 22 is made uniform by multiple reflection on the inner surface 36, and the imaging optical system 23 optically connects the emission end 38 and the illumination region IR in the short direction. Therefore, the illuminance distribution in the short direction is uniform in the illumination region IR. In the illumination region IR, the illuminance distribution in the longitudinal direction is made uniform by the illuminance distributions originating from each of the plurality of light source units 20 being shifted in the longitudinal direction and overlapping. Therefore, the illuminating device IU can illuminate the illumination area IR with uniform brightness.

  Next, the illumination method by the illumination device IU will be described in more detail. Here, description will be made with reference to values such as dimensions and focal lengths of various members, but these values are examples and can be appropriately changed.

  The solid-state light source 24 of the light source unit 20 in FIG. 6 is, for example, a laser diode, which emits laser light having a wavelength of about 403 nm as the illumination light L1, and has an output of about 0.25 W. The light source unit 20 is provided with 83 solid light sources 24, for example, and the total output of these 83 solid light sources 24 is about 20.755W. For example, the same number (83) of optical fibers 25 as the solid light sources 24 are provided, and the diameter (φ1) is about 0.3 mm. In this example, the divergence angle (angle characteristic) of the illumination light L1 emitted from the optical fiber 25 of the light source unit 20 is about 0.2 in terms of NA (numerical aperture).

  In the following description, the value obtained by converting the spread angle of light (for example, illumination light L1) into NA is appropriately referred to as the NA conversion value for light (for example, illumination light L1). Also, the NA converted value of light (light flux) spreading in the X axis direction in the XZ plane is the NA converted value in the X axis direction, and the NA converted value of light (light flux) spreading in the Y axis direction in the YZ plane is the Y converted value. It may be called NA conversion value.

  The spread angle of the illumination light L1 when emitted from the illumination device IU, that is, the spread angle of the illumination light L1 when incident on the illumination region IR is set according to the use of the illumination device IU and the like. For example, in the exposure apparatus EX, the spread angle of the illumination light L1 at the time of emission from the illumination apparatus IU is selected according to the resolution (line width of the projection pattern) of the exposure apparatus EX. Here, it is assumed that the resolution of the exposure apparatus EX is about several μm, and the NA conversion value of the illumination light L1 when emitted from the illumination apparatus IU is set to 0.04.

  Each module 27 of the magnifying optical system 21 in FIG. 5 enlarges the light source image Im1 formed by the light source unit 20 by N times (for example, 5 times). As a result, the NA converted value of the illumination light L1 at the time of emission from the magnifying optical system 21 is 1 / N times the NA converted value (for example, 0.2) of the illumination light L1 when incident on the magnifying optical system 21 (here, 0.2 / 5 = 0.04). Such a module 27 is configured, for example, by setting the focal length (f1) of the lens 28 to about 3 mm, the focal length (f2) of the lens 29 to about 15 mm, and the focal length (f3) of the lens 30 to about 18.75 mm. ,realizable.

  8 and 9 are diagrams for explaining the illumination method. Specifically, FIG. 8A is a side view of the light beam from the light source image (secondary light source image Im2) viewed from the Y-axis direction, and FIG. 8B is the light beam from the light source image (secondary light source image Im2). FIG. 9 is a view of the light source image Im1 (secondary light source image Im2) viewed from the illumination region IR.

  The optical integrator 22 shown in FIG. 8 has, for example, a dimension in the short direction (X-axis direction) of about 2.5 mm, a length in the long direction (Y-axis direction) of about 250 mm, and a direction perpendicular to the short direction and the long direction ( The dimension in the Z-axis direction is about 125 mm. The divergence angle (angle characteristic) of the illumination light L1 when incident on the optical integrator 22 is substantially the same as the divergence angle of the illumination light L1 when emitted from the magnifying optical system 21, and is, for example, about 0.04 in terms of NA. .

  Under this condition, when viewed from the Y-axis direction, as shown in FIG. 8A, the illumination light L1 is a light beam that is reflected by the inner surface 36 of the optical integrator 22 0 times, 1 light beam, and 2 light beams. These light beams are superposed at the exit end 38.

  The NA converted value (NA converted value in the X-axis direction) of the illumination light L1 in the short direction of the emission end 38 is substantially the same when incident on the incident end 35 and when emitted from the emission end 38, for example, 0. .04 or so. Further, the NA converted value (NA converted value in the Y-axis direction) of the illumination light L1 with respect to the longitudinal direction of the emission end 38 is substantially the same when incident on the incident end 35 and when emitted from the emission end 38. It is about 0.04. As described above, in the example of FIG. 8, the divergence angle of the illumination light L1 when emitted from the optical integrator 22 is isotropic in the longitudinal direction and the transverse direction, and the illumination light when incident on the imaging optical system 23 The spread angle of L1 is isotropic in the long direction and the short direction.

  When the divergence angle of the illumination light L1 when entering the imaging optical system 23 is isotropic around the Z axis, the magnification of the imaging optical system 23 in the X axis direction (short direction) is, for example, equal Set to double. Such an imaging optical system 23 can be realized, for example, by making the focal lengths of the pair of cylindrical lenses in the XZ plane substantially the same (for example, about 15 mm).

  The divergence angle of the illumination light L1 in the short direction (NA converted value in the X-axis direction) when emitted from the imaging optical system 23 is equal to the magnification of the imaging optical system 23. Is substantially the same as the divergence angle of the illumination light L1 in the short-side direction (NA-converted value in the X-axis direction).

  The divergence angle in the longitudinal direction (NA converted value in the Y-axis direction) of the illumination light L1 at the time of emission from the imaging optical system 23 is the result of the fact that the imaging optical system 23 has almost no refractive index with respect to the YZ plane. It becomes substantially the same as the spread angle (NA converted value in the Y-axis direction) of the illumination light L1 when entering the image optical system 23 in the longitudinal direction.

  In this way, by making the divergence angle of the illumination light L1 when emitted from the imaging optical system 23 isotropic, the divergence angle of the illumination light L1 when incident on the illumination region IR can be made isotropic. . Therefore, in the exposure apparatus EX, it becomes easy to align the line width of the exposure pattern in the short side direction (X-axis direction) and the long side direction (Y-axis direction).

  Next, the illuminance distribution in the illumination area IR will be described. In the following description, an incident area in which the illumination light L1 from one of the plurality of light source images Im1 formed by the light source unit 20 in the illumination area IR is appropriately referred to as a partial illumination area. As shown in FIG. 8B, the partial illumination area IRa may be defined as an incident area where the illumination light L1 from one of the plurality of secondary light source images Im2 in the magnifying optical system 21 is incident. Here, the partial illumination region IRa is a partial region on the conjugate surface 23a (illumination region IR) where the illumination light L1 emitted from the exit-side end 26 of one optical fiber 25 shown in FIG. 5 enters. Equivalent to.

  A diaphragm member 31 (see FIGS. 5 and 7) of the magnifying optical system 21 is disposed at a position optically conjugate with the output-side end 26 of the optical fiber 25, and the aperture 31a of the diaphragm member 31 is substantially circular. Therefore, the light intensity distribution of the illumination light L1 may be considered as a Gaussian distribution at a spread angle corresponding to 0.04 in terms of NA. Therefore, the light flux from one point of the diaphragm member 31 (opening 31a) forms an illuminance distribution such as a Gaussian distribution in the focal plane of the lens 30, and the spot diameter (φ2) is spread in a range of about 1.5 mm, for example. . When the focal plane of the lens 30 is substantially the same position as the incident end 35 of the optical integrator 22, the dimension in the short direction of the incident end 35 (here, about 2.5 mm) is set to the spot diameter (φ2 = 1. 5 mm) or more, it is possible to suppress 'scratching' at the incident end 35.

  Illumination light L1 emitted from the light source unit 20 and passing through one module 27 is illuminance in the short direction at the emission end 38 due to multiple reflection at the inner surface 36 of the optical integrator 22, as shown in FIG. Distribution is uniform. Here, the illumination light L <b> 1 that spreads in the short direction of the emission end 38 is a light beam that is reflected on the inner surface 36 by 0 times, and a light beam that is reflected by the + X side inner surface 36 or the −X side inner surface 36 once. , + X-side inner surface 36 or -X-side inner surface 36 includes a light beam whose number of reflections is two, and these five light beams are overlapped at the emission end 38.

  The light beam reflected by the inner surface 36 corresponds to the light beam from the virtual image Im3 of the light source image Im1, and the light beam incident on each point of the emission end 38 is the four light beams formed by the inner surface 36 and the light beam from the real image of the light source image Im1. This corresponds to the light beam superimposed with the light beam from the virtual image Im3. Therefore, as shown in FIG. 9, when the light source unit 20 side is viewed from one point in the illumination area IR, five light source images Im1 (real images or virtual images) are arranged in the X-axis direction.

  In the example of FIG. 9, the light source image Im1 on the Y axis is a real image, and the other light source images Im1 are virtual images Im3. 8A schematically illustrates the virtual image Im3. The virtual image Im3 is, for example, the same surface as the secondary light source image Im2 or a surface conjugate with the secondary light source image Im2 (the emission of the optical fiber 25). On the same surface as the side edge 26).

  Further, the illumination light L1 emitted from the light source unit 20 and passing through one module 27 passes through the inside of the light integrator 22 while spreading in the longitudinal direction of the incident end 35 as shown in FIG. The light enters the region IRa. The partial illumination region IRa is, for example, a substantially strip-shaped region that is long in the Y-axis direction, and is formed in a one-to-one correspondence with the real image of the light source image Im1 formed by the light source unit 20. That is, the partial illumination region IRa is formed in a one-to-one correspondence with the secondary light source image Im2 formed by each module 27 of the magnifying optical system 21.

  FIG. 10 is a graph for explaining the illuminance distribution. Specifically, FIG. 10A is a graph showing the illuminance distribution B1 of the illumination area IR (partial illumination area IRa) for each module 27, the horizontal axis indicates the position in the short direction, and the vertical axis indicates the relative value of illuminance. Show. FIG. 10B is a graph showing the illuminance distribution B2 of the illumination area IR by the plurality of partial illumination areas IRa, where the horizontal axis indicates the position in the longitudinal direction, and the vertical axis indicates the illuminance in the short direction at each position in the longitudinal direction. The relative value of the averaged value is shown.

  As shown in FIG. 10A, the illuminance distribution B1 of each partial illumination region IRa is a distribution such as a Gaussian distribution. In the illumination area IR, the partial illumination areas IRa are arranged in the Y-axis direction so that each overlaps the adjacent partial illumination area IRa. As shown in FIG. 10B, the illuminance distribution B2 of the illumination area IR is a distribution in which the illuminance distribution B1 of the partial illumination area IRa is shifted and overlapped in the Y-axis direction. Therefore, the illuminance distribution B2 of the illumination area IR becomes a so-called top hat distribution by arranging the partial illumination areas IRa at a predetermined pitch, and becomes substantially uniform illuminance except for the end in the Y-axis direction.

  The pitch in the Y-axis direction of the partial illumination region IRa is a value corresponding to the pitch in the Y-axis direction (distance between the centers of the ends 26) of the light source image Im1 (end 26 on the emission side of the optical fiber 25) formed by the light source unit 20. become. The pitch in the Y-axis direction of the partial illumination area IRa is the distance (center distance) from the center position of the partial illumination area IRa to the center position of the adjacent partial illumination area IRa, and the pitches of other elements are the same. Can be defined.

  The pitch in the Y-axis direction of the plurality of light source images Im1 formed by the light source unit 20 is set so that the illuminance distribution in the Y-axis direction on the conjugate plane 23a (illumination region IR) is uniform. The pitch in the Y-axis direction of each of the emission-side end 26, the lens 28, the lens 29, and the lens 30 of the optical fiber 25 is, for example, 3 mm.

  In order to form an illumination area IR having a desired size, the optical fiber 25 and the module 27 of the magnifying optical system 21 are arranged at a predetermined pitch in the Y-axis direction by the number corresponding to the dimension of the illumination area IR in the Y-axis direction. Can be arranged.

  In this illumination device IU, since the cylindrical lens of the imaging optical system 23 has almost no refractive power with respect to the YZ plane, the illumination light L1 is, for example, about 14 mm outward from the end of the optical integrator 22 in the Y-axis direction. Will spread. The area illuminated by the illumination light L1 spreading outside the light integrator 22 may have a non-uniform illuminance distribution with other areas, and may not be used as the illumination area IR.

  In the example of FIG. 8B, the light beam incident on one point in the illumination area IR is a light beam obtained by superimposing the light beams from the five modules 27 arranged in the Y-axis direction. Therefore, as shown in FIG. 9, when the light source unit 20 side is viewed from one point in the illumination area IR, five light source images Im1 are arranged in the Y-axis direction. A light beam corresponding to a light beam from an array of 25 light source images Im1 in five rows in the X-axis direction and five columns in the Y-axis direction at each point in the illumination region IR excluding the end in the Y-axis direction. Will be incident.

  In the present embodiment, the illuminance distribution in the short direction of the illumination region IR is made uniform by multiple reflection on the inner surface 36 of the optical integrator 22, and the illuminance distribution in the longitudinal direction of the illumination region IR is obtained from a plurality of light source images Im1. The light beams are made uniform by shifting and overlapping. Such an illuminating device IU appropriately adjusts the number of partial illumination regions IRa arranged in a predetermined direction, thereby illuminating the illumination region IR with uniform brightness while making the illumination region IR a desired length in the predetermined direction. be able to.

  In the present embodiment, since the exposure apparatus EX can make the illumination area IR in a direction orthogonal to the scanning direction a desired length, the processing range of the exposure process can be expanded. As a result, the exposure apparatus EX can efficiently process a large substrate for manufacturing a large device, a large substrate for multi-surface processing, and the like.

[Second Embodiment]
Next, a second embodiment will be described. In this embodiment, the same configuration as that of the above-described embodiment may be denoted by the same reference numeral, and the description thereof may be simplified or omitted.

  FIG. 11 is a side view showing the exposure apparatus EX according to the present embodiment. The exposure apparatus EX of FIG. 11 includes a substrate stage ST instead of the rotating drum DP shown in FIG. The substrate stage ST is a substrate support member that supports the substrate P, and supports the substrate P so as to keep it flat in the exposure region PR. The substrate stage ST supports, for example, the back surface of the substrate P in a non-contact manner with an air bearing layer.

  In the exposure apparatus EX, a diaphragm member 40 is provided in the optical path between the rotary drum DM (mask pattern M) and the substrate stage ST (substrate P). The diaphragm member 40 is a so-called field diaphragm, and defines an incident range of light on the substrate P by defining a passing range of light (exposure light) emitted from the illumination device IU and passing through the mask pattern M. Although the exposure apparatus EX can accurately define the range of the exposure region PR by the diaphragm member 40, the diaphragm member 40 may not be provided.

  12A is a side view showing the illumination device IU, FIG. 12B is a front view of the illumination device IU, and FIG. 13 is a plan view showing the diaphragm member 31.

  In the illuminating device IU of FIG. 12, the magnification at which the magnifying optical system 21 spreads the illumination light L1 in the short direction (X-axis direction) is larger than the magnification at which the magnifying optical system 21 spreads the illumination light L1 in the longitudinal direction (Y-axis direction). Is also big. In such a magnifying optical system 21, for example, the lens 28 is composed of a spherical lens and the lens 29 is composed of a cylindrical lens and a spherical lens, but the lens 29 may be composed of a toric lens.

  Since the magnification of the magnifying optical system 21 is different between the X-axis direction and the Y-axis direction, an image formed by the magnifying optical system 21 when the end 26 of the optical fiber 25 is substantially circular (secondary light source image Im2 in FIG. 13). ) Becomes an ellipse having a short axis parallel to the X-axis direction and a long axis parallel to the Y-axis direction. Assuming that the diameter of the end 26 of the optical fiber 25 is φ1, the magnification that the magnifying optical system 21 spreads the illumination light L1 in the X-axis direction is M1x, and the magnification that the magnifying optical system 21 spreads the illumination light L1 in the Y-axis direction is M1y. The minor axis of the secondary light source image Im2 is M1x × φ1, and the major axis of the secondary light source image Im2 is M1y × φ1. For example, when the diameter (φ1) of the end 26 of the optical fiber 25 is 0.3 mm, M1x is 3 times, and M1y is 5 times, the minor axis of the secondary light source image Im2 is 0.9 mm, and the secondary light source image Im2 The major axis is 1.5 mm.

  A diaphragm member 31 as shown in FIG. 13 is provided at or near the surface (pupil surface 41) on which the secondary light source image Im2 is formed by the magnifying optical system 21. The aperture member 31 is a so-called aperture stop, and has, for example, an elliptical aperture 31a substantially similar to the secondary light source image Im2. For example, the direction of the short axis of the opening 31a is set to be substantially the same as the secondary light source image Im2, and the direction of the long axis is set to be substantially the same as the secondary light source image Im2. Here, the opening 31a is formed to have substantially the same size as the secondary light source image Im2. The aperture member 31 may have an opening 31a smaller than the secondary light source image Im2, or may be omitted.

  The illumination light L1 from the secondary light source image Im2 is incident on the incident end 35 of the optical integrator 22 through the lens 30 of the magnifying optical system 21. The spread angle (angular characteristic) of the illumination light L1 at the time of incidence on the incident end 35 depends on the shape of the secondary light source image Im2 or the shape of the diaphragm member 31. Since the dimension (short axis) in the X-axis direction of the secondary light source image Im2 is smaller than the dimension (major axis) in the Y-axis direction, the spread angle of the illumination light L1 in the optical integrator 22 is the spread angle in the X-axis direction. It becomes smaller than the spread angle in the Y-axis direction. That is, the magnifying optical system 21 (also referred to as a condensing optical system) has an angular characteristic with respect to the longitudinal direction (Y direction) of the light incident end 35 toward the incident end 35 of the optical integrator 22 and an angle with respect to the short direction (X direction). It is set to be different from the characteristics. For example, in the optical integrator 22, the NA converted value in the X-axis direction of the illumination light L1 is about 0.024, and the NA converted value in the Y-axis direction of the illumination light L1 is 0.04.

  In the optical integrator 22, the illumination light L <b> 1 (see FIG. 12A) that spreads in the short direction of the incident end 35 is reflected by the inner surface 36 and guided to the emission end 38, and is emitted by the multiple reflection at the inner surface 36. Illuminance at is uniform. The divergence angle in the short direction of the illumination light L1 when exiting from the exit end 38 is substantially the same as that when entering the entrance end 35, and is, for example, 0.024 in terms of NA.

  Note that the position of the incident end 35 of the optical integrator 22 and the position where the image of the end 26 of the optical fiber 25 forms an image do not have to coincide with each other, for example, on the optical axis of the lens 30 of the magnifying optical system 21. You may shift | deviate in the predetermined range in the parallel direction.

  Further, the illumination light L1 spreading in the longitudinal direction of the incident end 35 (see FIG. 12B) passes through the inside of the optical integrator 22 without being incident on the inner surface 37, and is emitted from the emission end 38. . The divergence angle in the short direction of the illumination light L1 when exiting from the exit end 38 is substantially the same as that when entering the entrance end 35, and is, for example, 0.04 in terms of NA.

  The imaging optical system 23 in FIG. 12 reduces the image of the emission end 38 of the optical integrator 22 in the lateral direction (X-axis direction) and forms it on the conjugate plane 23a (illumination region IR). The magnification M2x of the imaging optical system 23 in the X-axis direction is M1x that the magnification optical system 21 spreads the illumination light L1 in the X-axis direction, and M1y that the magnification optical system 21 spreads the illumination light L1 in the Y-axis direction. Then, it is M1x / M1y times. For example, when M1x is 3 times and M1y is 5 times, the magnification of the imaging optical system 23 in the X-axis direction is set to 0.6 times. Therefore, the NA-converted value in the short direction of the light beam incident on each point in the illumination area IR is 1 / (M1x / M1y) times as long as the light is emitted from the optical integrator 22. For example, the NA converted value in the short direction of the light beam incident on each point in the illumination region IR is 0.024 / 0.6, which is almost the same as the NA converted value in the longitudinal direction of the light beam incident on each point in the illumination region IR. It becomes the same value (0.04).

  In the present embodiment, since the imaging optical system 23 reduces the image of the emission end 38 of the optical integrator 22 in the short direction, the width of the conjugate surface 23a with respect to the width of the optical integrator 22 (dimension in the X-axis direction). Becomes narrower. For example, in the exposure apparatus EX using the mask pattern M curved in a cylindrical shape, if the width of the conjugate surface 23a is reduced, the deviation between the shape of the mask pattern M and the shape of the conjugate surface 23a can be reduced. The defocus amount can be reduced. In addition, the width of the optical integrator 22 can be made larger than the width of the illumination region IR, and the strength of the optical integrator 22 can be easily ensured. Therefore, for example, it becomes easy to extend the optical integrator 22 in the Y-axis direction, and it becomes easy to extend the illumination region IR in the Y-axis direction.

  In the illumination device IU of the present embodiment, as described in the first embodiment, the illuminance distribution of the illumination area IR is uniformized in each of the longitudinal direction and the lateral direction, and the illumination area IR is desired in a predetermined direction. It is possible to illuminate with uniform brightness while keeping the length.

[Third Embodiment]
Next, a third embodiment will be described. In this embodiment, the same configuration as that of the above-described embodiment may be denoted by the same reference numeral, and the description thereof may be simplified or omitted.

  FIG. 14 is a side view showing the exposure apparatus EX according to the present embodiment, and FIG. 15 is a top view showing the illumination apparatus IU. The illumination device IU of FIG. 14 includes a first optical system 45, a second optical system 46, and an imaging optical system 23. The first optical system 45 and the second optical system 46 respectively emit illumination light L1, and the illumination light L1 from the first optical system 45 and the second optical system 46 passes through the imaging optical system 23 and is in the illumination region IR. Is incident on.

  The first optical system 45 includes a light source unit 20a (first light guide unit), an enlargement optical system 21a, and an optical integrator 22a (first optical integrator). The light source unit 20a and the magnifying optical system 21a may have the same configuration as that of the first embodiment, for example. The illumination light L1 emitted from the light source unit 20a enters the incident end 35a of the optical integrator 22a through the magnifying optical system 21a. The glass material of the optical element that constitutes each of the light source unit 20a, the magnifying optical system 21a, and the optical integrator 22a may be, for example, quartz.

  The optical integrator 22a in FIG. 14 is a frustum-shaped member, and the side surface viewed from the Y-axis direction is substantially trapezoidal. The optical integrator 22 includes a first surface 47a that is substantially parallel to the YZ plane, a second surface 47b that is inclined non-perpendicularly (for example, about 45 °) to the first surface 47a, and a first surface that is substantially parallel to the first surface 47a. It has a third surface 47c and a fourth surface 47d substantially perpendicular to the first surface 47a.

  The light integrator 22a is arranged so that the illumination light L1 from the light source unit 20a is incident on a part of the first surface 47a, and at least a part of the incident region of the illumination light L1 from the light source unit 20a is incident on the incident end 35a. including. The incident end 35a includes at least a part of a portion overlapping the second surface 47b when viewed from the normal direction of the first surface 47a. In the optical integrator 22a of FIG. 14, the longitudinal direction of the incident end 35a is substantially parallel to the Y-axis direction, and the short direction of the incident end 35a is substantially parallel to the Z-axis direction.

  The illumination light L1 incident on the incident end 35a is reflected by the second surface 47b, the traveling direction is bent, and reflected by the inner surfaces corresponding to the first surface 47a and the third surface 47c, thereby being guided to the fourth surface 47d. . The fourth surface 47d includes an emission end 38a, and the illumination light L1 that has passed through the inside of the optical integrator 22a is emitted from the emission end 38a. In the optical integrator 22a of FIG. 14, the longitudinal direction of the emission end 38a is substantially parallel to the Y-axis direction, and the short direction of the emission end 38a is substantially parallel to the X-axis direction.

  The second optical system 46 has the same configuration as that of the first optical system 45 and is disposed symmetrically with the first optical system 45 with respect to the YZ plane when viewed from the Y-axis direction. The second optical system 46 includes the light source unit 20b (second light guide unit), the magnifying optical system 21b, and the optical integrator 22b (second optical integrator), but the description common to the first optical system 45 is simplified. Or omitted.

  The optical integrator 22a and the optical integrator 22b are disposed adjacent to the short side direction (X-axis direction) of the emission end 38a (the emission end 38b), and the third surface 47c is joined to each other. The optical integrator 22a and the optical integrator 22b are bonded with, for example, an adhesive having a refractive index of 1.46 or less, and the illumination light L1 is almost totally reflected at the inner surface corresponding to each third surface 47c.

  As shown in FIG. 15, in the light source unit 20a of the first optical system 45, the output-side end 26a of the optical fiber 25a is arranged at a substantially constant pitch Py in the longitudinal direction (Y-axis direction) of the incident end 35a. . Further, in the light source unit 20b of the second optical system 46, the output-side end 26b of the optical fiber 25b is arranged at a substantially constant pitch Py in the longitudinal direction (Y-axis direction) of the incident end 35b.

  The end 26a of the optical fiber 25a of the first optical system 45 is located at the end 26b of the optical fiber 25b of the second optical system 46 when viewed from the normal direction (X-axis direction) of the incident end 35a (incident end 35b). Both are arranged so that the positions in the Y-axis direction do not overlap. The end 26a of the optical fiber 25a of the first optical system 45 and the end 26b of the optical fiber 25b of the second optical system 46 are alternately arranged as viewed from the Y-axis direction, and one end 26a and the next end 26b are adjacent to each other. The position in the Y-axis direction is shifted by half of the pitch Py of the end 26a (pitch Py of the end 26b). That is, the amount of deviation Δy in the Y-axis direction between one end 26a and the adjacent end 26b is substantially the same as half the pitch Py (Py / 2).

  In the light source unit 20a, a light source image Im1a is formed on each of the ends 26a of the plurality of optical fibers 25a, and in the light source unit 20b, a light source image Im1b is formed on each of the ends 26b of the plurality of optical fibers 25b. Therefore, the plurality of light source images Im1a by the light source unit 20a are formed so that the positions of the plurality of light source images Im1b by the light source unit 20b in the longitudinal direction (Y-axis direction) of the incident end 35a (incident end 35b) do not overlap. .

  The illumination light L1 from the light source unit 20a shown in FIG. 14 has a uniform illuminance distribution in the short direction of the emission end 38a at the emission end 38a due to multiple reflection on the inner surface of the optical integrator 22a. In addition, the illumination light L1 from the light source unit 20b is made uniform in the illuminance distribution in the short direction of the output end 38b by the multiple reflection at the inner surface of the optical integrator 22b. The imaging optical system 23 forms a conjugate surface 23a conjugate with the surface including the emission end 38a of the optical integrator 22a and the emission end 38b of the optical integrator 22b in the short direction of the emission end 38a (emission end 38b). Therefore, the illuminance distribution of the illumination light L1 on the conjugate plane 23a (illumination region IR) is uniform in a direction corresponding to the short side direction of the emission end 38a (emission end 38b).

  Further, as described with reference to FIG. 8, the light beam from each light source image Im1a formed by the light source unit 20a propagates in the optical integrator 22a while spreading in the Y-axis direction, and enters the partial illumination region IRa. The partial illumination area IRa is arranged in the Y-axis direction so that the adjacent partial illumination area IRa partially overlaps the Y-axis direction. As described above, the plurality of light fluxes derived from the plurality of light source images Im1a are shifted in the Y axis direction and overlapped in the illumination region IR, so that the illuminance distribution in the Y axis direction of the illumination region IR becomes uniform. The illumination light L1 from the second optical system 46 propagates in the same manner, and the illuminance distribution in the Y-axis direction of the illumination region IR becomes uniform.

  Next, the spread angle of the light beam incident on each point in the illumination area IR will be described. As described with reference to FIG. 9 (FIG. 8), the light beam incident on each point in the illumination region IR is superimposed on the light beam from the real image or the virtual image of the light source image arranged in the X-axis direction and the Y-axis direction. Corresponds to the luminous flux. Therefore, the spread angle of the light beam incident on each point in the illumination region IR is determined by the distribution of the real image and the virtual image of the light source image Im1 when the light source unit 20 side is viewed from each point.

  FIG. 16 is a diagram for explaining the illumination method according to the present embodiment. FIG. 16A shows the positional relationship in the Y-axis direction of the light source image Im1 when viewed from the normal direction of the illumination region IR, and the positions of the points Q1 and Q2 of the illumination region IR referred to in the following description. FIG. Points Q1 and Q2 are points aligned in the short direction (X-axis direction) of the emission end 38a of the optical integrator 22a. Here, the position (coordinates) in the Y-axis direction is the center of the light source image Im1a by the light source unit 20a. Is almost the same.

  For example, when the diameter (φ1) of the optical fiber 25a is about 0.3 mm, the spread angle of the illumination light L1 when emitted from the optical fiber 25a of the light source unit 20a is about 0.2 in terms of NA. For example, the secondary light source formed by the magnifying optical system 21 when the magnification (M1x) in the X-axis direction of the magnifying optical system 21 is 5 times and the magnification (M1x) in the X-axis direction of the magnifying optical system 21 is 5 times. The image Im2 has a circular shape with a spot diameter (φ2) of about 1.5 mm. The illumination light L1 from such a secondary light source image Im2 has an NA converted value in the X-axis direction (in the XZ plane) of about 0.04 when incident on the optical integrator 22a, and the NA in the Y-axis direction (in the YZ plane). The converted value is about 0.04.

  FIG. 16B shows a distribution of real and virtual images of the light source image Im1a when the light source unit 20a is viewed from the point Q1 on the illumination area IR, and FIG. 16C shows a point Q2 on the illumination area IR. It is a figure which shows distribution of the real image and virtual image of light source image Im1b when the light source part 20b is seen from.

  The distribution of the real image and the virtual image of the light source image Im1 when viewed from the illumination region IR in the X-axis direction is determined by the number of reflections of the illumination light L1 on the inner surface 36 of the light integrator 22 (see FIG. 8). The number of reflections of the illumination light L1 on the inner surface 36 includes the spread angle in the X-axis direction of the illumination light L1 when incident on the optical integrator 22, the interval between the two inner surfaces 36 in the X-axis direction, and the dimension of the optical integrator 22 in the Z-axis direction. Depends on etc.

Here, the diameter of the optical fiber 25 is φ1, the magnification with respect to the XZ plane from the end 26 of the optical fiber 25 to the surface (pupil plane) where the secondary light source image Im2 is formed in the magnifying optical system 21 is β1, and the magnifying optical system 21 If the focal length f3 of the lens 30 with respect to the XZ plane and the magnification with respect to the XZ plane of the imaging optical system 23 are β2, the light flux incident on each point (for example, the points Q1 and Q2) in the illumination region IR in the X-axis direction. A value (NAx) obtained by converting the divergence angle by NA is expressed by the following formula (1).
NAx = (φ1 × β1 × 0.5 / f3) × 1 / β2 (1)

  In Expression (1), for example, the diameter (φ1) of the optical fiber 25 is 0.3 mm, the magnification (β1) in the X-axis direction of the magnifying optical system 21 is five times, and the focal length (f3) of the lens 30 of the magnifying optical system 21 ) Is 18.75 mm, and the magnification (β2) in the X-axis direction of the imaging optical system 23 is 1. The NAx is 0.04.

Further, the distribution in the Y-axis direction of the real image and the virtual image of the light source image Im1 when viewed from the illumination region IR is the position of the light source image Im1 (the end 26 of the optical fiber 25) formed by the light source unit 20 in the Y-axis direction, light It is determined by the divergence angle of the illumination light L1 when entering the integrator 22, the dimension of the optical integrator 22 in the Z-axis direction, and the like. Here, the pitch in the Y-axis direction of the light source image Im1 formed by the light source unit 20 is Py, the NA-converted value in the Y-axis direction of the illumination light L1 when emitted from the optical fiber 25 is NAy0, and the end 26 of the optical fiber 25 is enlarged. The magnification with respect to the YZ plane to the plane (pupil plane) on which the secondary light source image Im2 is formed in the optical system 21 is β3, the focal length with respect to the YZ plane of the lens 30 of the magnifying optical system 21 is f4, and the incident end 35 of the optical integrator 22. When the optical path length from the illumination area IR to Lz is Lz, the NA converted value (NAy1) in the Y-axis direction of the light beam incident on the point Q1 on the illumination area IR from the first optical system 45 (light source unit 20a) is It is represented by Formula (2).
NAy1 = (Py × 2 + NAy0 / β3 × f4) / Lz (2)

  In the expression (2), the pitch (Py) of the end 26 of the optical fiber 25 is 3 mm, the NA conversion value (NAy0) of the illumination light L1 at the time of emission from the end 26 of the optical fiber is 0.2, and Y of the magnifying optical system 21 The axial magnification (β3) is 5 times, the focal length (f4) of the lens 30 of the magnifying optical system 21 is 18.75 mm, and the optical path length (Lz) from the incident end 35 of the optical integrator 22 to the illumination region IR is 187. If it is 5 mm, NAy1 is 0.036, which is different from NAx (0.04).

  As described above, the light flux incident on each point on the illumination region IR has different spread angles in the X-axis direction and the Y-axis direction because the factors that define the spread angle are different in the X-axis direction and the Y-axis direction. There can be. The anisotropy of the divergence angle is allowed as appropriate according to the use of the lighting device IU. In the present embodiment, the light source image Im1a and the light source image are formed by the light source unit 20a and the light source unit 20b as shown in FIG. By shifting the position of Im1b in the Y-axis direction, the spread angle of the light beam incident on each point on the illumination area IR is made isotropic in the X-axis direction and the Y-axis direction.

Specifically, as shown in FIGS. 16B and 16C, the real image and the virtual image of the light source image when the light source unit 20b is viewed from the point Q2 are the light sources when the light source unit 20a is viewed from the point Q1. The positions of the real image and virtual image of the image are shifted from each other in the Y-axis direction. Here, since the light source image Im1a by the light source unit 20a and the light source image Im1b by the light source unit 20b are displaced in the Y-axis direction by a half of the pitch Py, the real image and the virtual image of the light source image Im1 viewed from the illumination region IR. The position is also shifted in the Y-axis direction by half the pitch (Py) in the Y-axis direction of the light source image Im1. Therefore, the NA converted value (NAy2) in the Y-axis direction of the light beam incident on the point Q2 on the illumination area IR from the second optical system 46 (light source unit 20b) is expressed by the following formula (3).
NAy2 = (Py × 2 + Py × 0.5) / Lz (3)

  In Expression (3), if the pitch (Py) is 3 mm and the optical path length (Lz) from the incident end 35 of the optical integrator 22 to the illumination region IR is 187.5 mm, NAy2 is 0.04. Here, the point on the substrate P is illuminated with the light beam from the first optical system 45 at the position of the point Q1, and the NAy1 of this light beam is 0.036. Further, this point on the substrate P is illuminated with a light beam from the second optical system 46 at the position of the point Q2 as the substrate P moves in the X-axis direction, and NAy1 of this light beam is 0.04. Therefore, the maximum value of the spread angle in the Y-axis direction of the light beam incident on the point on the substrate P is 0.04 in terms of NA, which is substantially the same as the NA-converted value in the X-axis direction (NAx = 0.04). become.

  Further, a point where the position (coordinates) in the Y-axis direction is substantially the same as the center of the light source image Im1b by the light source unit 20b is selected as the point Q2, and a point whose position in the X-axis direction is shifted from this point Q2 is defined as Q1. Assuming that In this case, the point on the substrate P has an NA-converted value in the Y-axis direction of 0.04 when illuminated with the light beam from the first optical system 45 at the point Q1, and from the second optical system 46 at the point Q2. The NA converted value in the Y-axis direction when illuminated with a light beam is 0.036. Therefore, the maximum value of the spread angle in the Y-axis direction of the light beam incident on the point on the substrate P is 0.04 in terms of NA, which is substantially the same as the NA-converted value in the X-axis direction (NAx = 0.04). become.

  As described above, the shift amount (Δy) between the position in the longitudinal direction of the plurality of light source images Im1a by the light source unit 20a and the position in the longitudinal direction of the plurality of light source images Im1b by the light source unit 20b passes through the imaging optical system 23. Thus, the spread angle of the light beam incident on each point on the conjugate plane 23a is set to be isotropic in the longitudinal direction and the lateral direction.

  FIG. 17 is a graph illustrating an example of an illuminance distribution obtained by simulation based on the configuration of the illumination device IU of the present embodiment. FIG. 17A shows the illuminance distribution in the short direction, where the vertical axis is the illuminance (number of light rays per unit area) and the horizontal axis is the position in the short direction (X-axis direction). FIG. 17B shows the illuminance distribution in the longitudinal direction, where the vertical axis represents the integrated value of the illuminance in the lateral direction at each position in the longitudinal direction, and the horizontal axis represents the position in the longitudinal direction (Y-axis direction). As shown in FIG. 17, uniform illuminance can be obtained in each of the short side direction and the long side direction.

  In the exposure apparatus EX, the exposure amount at each position in the Y-axis direction on the substrate P is an amount corresponding to the integrated value of illuminance in the X-axis direction (scanning direction). Therefore, the illuminance distribution in the X-axis direction may be less uniform than the illuminance distribution in the Y-axis direction. Further, in order to make the illuminance distribution in the Y-axis direction uniform, variations in the output of the plurality of solid state light sources 24 may be reduced. For example, in order to keep the variation in the illuminance distribution within ± 3%, the variation in the output of the plurality of solid state light sources 24 may be kept within ± 3%.

  In order to make the outputs of the plurality of solid light sources 24 uniform, the power supplied to each solid light source 24 may be adjusted. For example, among the plurality of solid state light sources 24, the driving unit of the solid state light source 24 is configured to supply power larger than the predetermined power to the solid state light source 24 whose output with respect to the predetermined power is smaller than the average output. (Drive circuit) may be configured.

  In order to make the outputs of the plurality of solid light sources 24 uniform, a filter that adjusts the amount of light from each solid light source 24 may be used. For example, an optical filter that absorbs a part of the light emitted from the solid light source 24 is used for the solid light source 24 that has an output with respect to predetermined power larger than the average output among the plurality of solid light sources 24. It may be provided. This filter can also be used to suppress variations in optical characteristics among the plurality of modules 27. Such a filter may have a fixed or variable transmittance.

  Here, the parallelism of chief rays in the illumination region IR will be described. Note that in the X-axis direction, even if the chief ray inclination with respect to the illumination region IR changes, it is averaged by scanning exposure, so that the influence of the chief ray change is small. The variation in the chief ray tilt due to the difference in image height in the Y-axis direction is estimated to be within ± 4 milliradians in the above numerical example. Further, when the NA converted value of the light beam incident on each point in the illumination area IR is 0.03 and the line width of the exposure pattern is 10 μm, the error of the line width is set to ± 4% (± 0.4 μm). In this case, the defocus amount may be within a range of about ± 13 μm. Under such conditions, the amount of positional deviation in the Y-axis direction of the transfer pattern on the substrate P due to variations in the chief ray inclination is estimated to be about 0.05 μm. With this amount of misalignment, the error is about 0.5% with respect to the line width of 10 μm, and the influence on the exposure accuracy is small.

In addition, while using the specifications of the illumination device IU described in the present embodiment, the illumination area IR by the illumination device IU is 5 mm in the X-axis direction (scanning direction) and 250 mm in the Y-axis direction (non-scanning direction). The loss of light amount until the illumination light L1 is emitted from the solid-state light source 24 and incident on the magnification optical system 21 is 20%, and the light amount until the illumination light L1 is incident on the magnification optical system 21 and emitted from the imaging optical system 23 If the loss is 20%, the illuminance in the illumination region IR is estimated to be 2112 mW / cm ² .

  In the present embodiment, the illuminating device IU isotropically determines the divergence angle of the light beam incident on each point in the illumination area IR because the positions of the light source images formed by the light source unit 20a and the light source unit 20b in the Y-axis direction do not overlap. Can be done. Further, the pitch of the light source image when viewed from the short direction of the emission end 38 of the optical integrator 22 can be reduced as compared with the case where there is one light source unit, and the exposure amount distribution in the Y-axis direction can be reduced. Uniformity can be improved. Further, for example, the pitch of the light source images formed by each light source unit can be increased while maintaining the pitch of the light source images as viewed from the short side of the emission end 38 of the optical integrator 22. Thereby, for example, miniaturization of the structure of the light source unit can be avoided.

  14 folds the optical path in the first optical system 45 and the second optical system 46 in a direction intersecting (orthogonal) with the normal direction (Z-axis direction) of the illumination region IR. It can be made compact, for example, and can be easily stored inside the rotating drum DM. The lighting device IU of FIG. 14 can reduce the number of parts because the optical path is bent using the second surface 47b of the optical integrator 22, but the optical path can be bent using a folding mirror or the like different from the optical integrator 22. May be.

[Fourth Embodiment]
Next, a fourth embodiment will be described. In this embodiment, the same configuration as that of the above-described embodiment may be denoted by the same reference numeral, and the description thereof may be simplified or omitted.

  FIG. 18 is a side view showing the exposure apparatus EX according to the present embodiment. In the exposure apparatus EX of FIG. 18, the illumination apparatus IU uses the imaging optical system to generate illumination light L1 from the two optical systems of the first optical system 45 and the second optical system 46 as described in the third embodiment. Illuminate the illumination area IR via 23.

  The first optical system 45 includes a light source unit 20a, an enlargement optical system 21a that spreads the illumination light L1 from the light source unit 20a, and an optical integrator 49a (optical integrator 22). As described in the second embodiment, the magnification of the magnifying optical system 21a is such that the magnification with respect to the longitudinal direction (Y-axis direction) of the incident end 35a of the optical integrator 49a is the short direction (X-axis direction) perpendicular to the longitudinal direction. Greater than the magnification. The illumination light L1 from the magnifying optical system 21a enters the incident end 35a of the optical integrator 49a, passes through the inside of the optical integrator 49a, and the illuminance distribution in the short direction of the emitting end 38a is made uniform at the emitting end 38a. .

  The optical integrator 22a shown in FIG. 14 is configured to bend the optical path of the illumination light L1 from the magnifying optical system 21a by one diffraction, but the optical integrator 249a in FIG. 18 changes the optical path of the illumination light L1 from the magnifying optical system 21a. It is the structure bent twice. The optical integrator 22a shown in FIG. 18 has a structure in which two optical integrators 22a shown in FIG. 14 are used and the optical integrators 22a are connected so as to be orthogonal to each other. As described above, the optical integrator 22 may fold the optical path of the illumination light L1 once, twice, three times or more, and bend the optical path of the illumination light L1 like the optical integrator 22 of FIG. It does not have to be.

  The second optical system 46 has the same configuration as the first optical system 45, and includes a light source unit 20b, an enlarging optical system 21b, and an optical integrator 49b (optical integrator 22). The illumination light L1 from the light source unit 20b is spread by the magnifying optical system 21b and then enters the incident end 35b of the optical integrator 49b. At the exit end 38b, the illuminance distribution in the short direction of the exit end 38b is made uniform. The

  The imaging optical system 23 converts the image of the surface including the emission end 38a of the optical integrator 49a and the emission end 38b of the optical integrator 49b into a short side perpendicular to the longitudinal direction (Y-axis direction) of the emission end 38a (emission end 38b). It is reduced in the direction (X-axis direction) and formed on the conjugate plane 23a (illumination region IR). The magnification with respect to the X-axis direction and the magnification with respect to the Y-axis direction of the magnifying optical system 21a and the magnification with respect to the X-axis direction of the imaging optical system 23 are the illumination emitted from the imaging optical system 23 as described in the second embodiment. The spread angle of the light L1 is set to be isotropic.

  FIG. 19 is a diagram for explaining an illumination method. FIG. 19A shows the positional relationship in the Y-axis direction of the light source image Im1 when viewed from the normal direction of the illumination area IR and the positions of the points Q1 and Q2 of the illumination area IR referred to in the following description. FIG. A point Q1 and a point Q2 are points aligned in the short direction (X-axis direction) of the emission end 38 of the optical integrator 22. Here, the position (coordinates) in the Y-axis direction is the center of the light source image Im1a by the light source unit 20a. Is almost the same. The amount of deviation (Δy) between the position of the light source image Im1a in the Y-axis direction by the light source unit 20a and the position of the light source image Im1b in the Y-axis direction by the light source unit 20b is the pitch Py of the light source image Im1b (light source image Im1a). Is approximately half (Py / 2).

  FIG. 19B is a diagram showing the distribution of the real image and the virtual image of the light source image Im1a when the light source unit 20a is viewed from the point Q1 on the illumination area IR, and FIG. 19C is the point Q2 on the illumination area IR. It is a figure which shows distribution of the real image and virtual image of light source image Im1b when the light source part 20b is seen from. The example of FIG. 19B is different from the example of FIG. 9 in the optical path length (described later) from the incident end 35a to the emission end 38a in the optical integrator 49a, and the light source image Im1a has seven rows in the X-axis direction. It is arranged in 7 rows in the axial direction. Further, as shown in FIG. 19C, the distribution of the light source image Im1b by the light source unit 20b is a distribution obtained by shifting the distribution of the light source image Im1a by the light source unit 20a by half the pitch Py in the Y-axis direction.

  The NA converted value (NAx) in the X-axis direction of the light beam incident on each point (for example, the point Q1 and the point Q2) in the illumination region IR is expressed by the equation (1) described in the third embodiment. In Expression (1), for example, the diameter (φ1) of the optical fiber 25 is 0.3 mm, the magnification (β1) in the X-axis direction of the magnifying optical system 21 is three times, and the focal length (f3) of the lens 30 of the magnifying optical system 21 ) Is 18.75 mm, and the magnification (β2) in the X-axis direction of the imaging optical system 23 is 0.6, NAx is 0.04.

In the first optical system 45, the pitch in the Y-axis direction of the light source image Im1 formed by the light source unit 20a is Py, the NA-converted value in the Y-axis direction of the illumination light L1 when emitted from the optical fiber 25a is NAy0, and the optical fiber. The magnification with respect to the YZ plane from the end 26a of 25a to the plane (pupil plane) on which the secondary light source image Im2 is formed in the magnifying optical system 21a is β3, the focal length with respect to the YZ plane of the lens 30 of the magnifying optical system 21a is f4, light Assuming that the optical path length from the incident end 35a of the integrator 49a to the illumination region IR is Lz, the NA converted value in the Y-axis direction of the light beam incident on the point Q1 on the illumination region IR from the first optical system 45 (the light source unit 20a) ( NAy1) is represented by the following formula (4).
NAy1 = (Py × 3 + NAy0 / β3 × f4) / Lz (4)

  In Expression (4), the pitch (Py) of the end 26 of the optical fiber 25 is 3 mm, the NA converted value (NAy0) of the illumination light L1 at the time of emission from the end 26 of the optical fiber is 0.2, and Y of the magnifying optical system 21 The axial magnification (β3) is 5 times, the focal length (f4) of the lens 30 of the magnifying optical system 21 is 18.75 mm, and the optical path length (Lz) from the incident end 35 of the optical integrator 22 to the illumination region IR is 262. If it is 5 mm, NAy1 is about 0.037.

The NA-converted value (NAy2) in the Y-axis direction of the light beam incident on the point Q2 on the illumination area IR from the second optical system 46 (light source unit 20b) indicates that the distribution of the light source image Im1b viewed from the illumination area IR is the light source image Im1a. And the following equation (5).
NAy2 = (Py × 3 + Py × 0.5) /Lz=0.04 (5)

  In Expression (3), since the number of light source images arranged in the Y-axis direction when viewed from the illumination area IR is 5, the coefficient multiplied by the pitch Py is 5/2 (that is, 2.5). . In Expression (5), since the number of light source images arranged in the Y-axis direction is 7, the coefficient multiplied by the pitch Py is 7/2 (that is, 3.5).

  In Expression (5), if the pitch (Py) is 3 mm and the optical path length (Lz) from the incident end 35a of the optical integrator 49a to the illumination region IR is 262.5 mm, NAy2 is 0.04. Here, the point on the substrate P is illuminated with the light beam from the first optical system 45 at the position of the point Q1, and the NAy1 of this light beam is about 0.037. Further, this point on the substrate P is illuminated with a light beam from the second optical system 46 at the position of the point Q2 as the substrate P moves in the X-axis direction, and NAy1 of this light beam is 0.04. Therefore, the maximum value of the spread angle in the Y-axis direction of the light beam incident on the point on the substrate P is 0.04 in terms of NA, which is substantially the same as the NA-converted value in the X-axis direction (NAx = 0.04). become.

  As described above, the amount of deviation between the position in the longitudinal direction of the plurality of light source images Im1a by the light source unit 20a and the position in the longitudinal direction of the plurality of light source images Im1b by the light source unit 20b is determined via the imaging optical system 23. The spread angle of the light beam incident on each point on 23a is set to be isotropic in the longitudinal direction and the lateral direction.

  FIG. 20 is a graph illustrating an example of an illuminance distribution obtained by simulation based on the configuration of the illumination device IU of the present embodiment. FIG. 20A shows the illuminance distribution in the short direction, where the vertical axis is the illuminance (number of rays per unit area) and the horizontal axis is the position in the short direction (X-axis direction). FIG. 20B shows the illuminance distribution in the longitudinal direction, where the vertical axis represents the integrated value of the illuminance in the lateral direction at each position in the longitudinal direction, and the horizontal axis represents the position in the longitudinal direction (Y-axis direction). As shown in FIG. 20, uniform illuminance can be obtained in each of the lateral direction and the longitudinal direction.

  Here, the parallelism of chief rays in the illumination region IR will be described. Note that in the X-axis direction, even if the chief ray inclination with respect to the illumination region IR changes, it is averaged by scanning exposure, so that the influence of the chief ray change is small. The variation in the chief ray inclination due to the difference in image height in the Y-axis direction is estimated to be within ± 3 milliradians in the above numerical example. Further, when the spread angle of the light beam incident on each point in the illumination area IR is 0.03 in terms of NA and the line width of the exposure pattern is 10 μm, the error of the line width is ± 4% (± 4 μm). In order to reduce the defocus amount, the defocus amount should be within a range of about ± 13 μm. Under such conditions, the amount of positional deviation in the Y-axis direction of the transfer pattern on the substrate P due to variations in the chief ray inclination is estimated to be about 0.04 μm. With this amount of misalignment, the error is about 0.4% with respect to the line width of 10 μm, and the influence on the exposure accuracy is small.

In addition, while using the specifications of the illumination device IU described in the present embodiment, the illumination area IR by the illumination device IU is 5 mm in the X-axis direction (scanning direction) and 250 mm in the Y-axis direction (non-scanning direction). The loss of light amount until the illumination light L1 is emitted from the solid-state light source 24 and incident on the magnification optical system 21 is 20%, and the light amount until the illumination light L1 is incident on the magnification optical system 21 and emitted from the imaging optical system 23 If the loss is 20%, the illuminance in the illumination region IR is estimated to be 3520 mW / cm ² .

  In the present embodiment, the illuminating device IU isotropically determines the divergence angle of the light beam incident on each point in the illumination area IR because the positions of the light source images formed by the light source unit 20a and the light source unit 20b in the Y-axis direction do not overlap. Can be done.

  By the way, as the illumination region IR is elongated in the Y-axis direction, the optical integrator becomes elongated in the Y-axis direction, and the strength may be insufficient. In this embodiment, since the optical integrator 49a and the optical integrator 49b are bonded together, it is easy to ensure the strength, and the imaging optical system 23 reduces the image of the emission end 38a (emission end 38b) in the short direction. Therefore, it is easy to elongate the illumination area IR in the Y-axis direction.

  The technical scope of the present invention is not limited to the above embodiment. For example, one or more of the elements described in the above embodiments may be omitted. The elements described in the above embodiments can be combined as appropriate.

  In each of the above embodiments, the cylindrical mask pattern M is used. For example, a so-called endless belt-like mask pattern M may be used, or a planar mask pattern M may be used. The form of the mask holding member can be appropriately changed according to the form of the mask pattern M.

  In any of the above-described embodiments, the substrate support member that supports the substrate P may be the rotary drum DP described in the first embodiment or the substrate stage ST described in the second embodiment. .

  In each of the above-described embodiments, the light source unit 20 may include a collimator that collimates the illumination light L1 from the solid light source 24. For example, the collimator is disposed between the solid light source 24 and the optical fiber 25, and the front focal position thereof is set to the solid light source 24.

  The light source unit 20 includes an input lens that condenses (converges) the illumination light L1 from the solid light source 24 at the light incident side end of the optical fiber 25 between the solid light source 24 and the optical fiber 25. Also good. This input lens is disposed between the collimator and the optical fiber 25, for example. The front focal position of the input lens is set to, for example, the rear focal position of the collimator, and the rear focal position of the input lens is set to, for example, the light incident side end of the optical fiber 25. Such an input lens can be used to adjust the spread angle (NA) of the illumination light L1 in accordance with the ratio between the focal length and the focal length of the collimator.

  By the way, when the laser diode is observed in the far field, the light spreading angle (orientation characteristic) may have anisotropy. In this case, one or both of the collimator and the input lens can be used to isotropically correct the divergence angle of the illumination light L1 when incident on the optical fiber 25 by providing anisotropy to the focal length. .

  Note that the illumination device IU may not include the magnifying optical system 21. In this case, the light source unit 20 may be composed of, for example, a plurality of LEDs arranged at the incident end 35 of the optical integrator 22. The light source unit 20 may include a lamp light source instead of the solid light source 24, and may be configured to branch light from one lamp light source into a plurality of optical fibers 25 and guide the light to the optical integrator 22.

  The optical integrator 22 may not be a dense prismatic prismatic (flat plate) rod, and may be an optical member (a kaleidoscope) in which four mirrors are combined in a frame shape, for example. In this optical member, a dielectric may be disposed in at least a part of the optical path surrounded by the mirror, or the dielectric may not be disposed in the optical path. That is, the optical integrator 22 may have a gap in a part thereof.

  The exposure apparatus EX may be a multi-lens or microlens array projection exposure apparatus. In this case, the above-described illumination apparatus IU is applied to at least one of a plurality of illumination optical systems. it can. In the above-described embodiment, the illumination device IU is applied to the exposure apparatus EX. However, the illumination device IU can be applied to, for example, an annealing apparatus.

  For example, an annealing apparatus using ultraviolet rays is a width direction orthogonal to the feeding direction while continuously feeding a large glass substrate for manufacturing a liquid crystal display device or a long flexible substrate for manufacturing a solar cell panel. This is an apparatus for irradiating a thin slit-shaped ultraviolet illumination to perform treatments such as curing of the ultraviolet curable resin layer and crystallization (orientation) of the semiconductor layer. The illumination device according to each of the above-described embodiments can be applied to, for example, such an annealing device, can improve the illuminance uniformity of slit-shaped illumination light irradiated on the substrate, and can provide an irradiation angle characteristic in a desired state. (Isotropic or anisotropic NA) can be adjusted.

  Note that the dimension (width) in the short direction of the slit-shaped irradiation region formed on the substrate may be increased. In that case, the imaging optical system 23 shown in FIGS. 2 to 5, 11, 14, and 18 is an enlargement system in which the imaging magnification in the short direction of the exit end of the optical integrator 22 is equal to or greater than 1. Is set as follows. In that case, in order to make the angle characteristic (NA) of the light irradiated on the substrate isotropic, a plurality of two formed on the pupil plane 41 (position of the diaphragm member 31) shown in FIG. Each of the next light source images Im2 may have an elliptical shape having a short axis parallel to the Y-axis direction and a long axis parallel to the X-axis direction.

  It is assumed that one or both of the incident end 35 and the emission end 38 of the optical integrator 22 are not rectangular. For example, one or both of the incident end 35 and the emission end 38 of the optical integrator 22 have a pair of first sides parallel to each other, and a line connecting the ends of the pair of first sides is perpendicular to the first side. It does not have to be. This line may be a straight line, a broken line, or a curved line. That is, one or both of the incident end 35 and the emission end 38 may have a rectangular shape (rectangular shape) obtained by rounding at least one corner of the rectangle, or a shape obtained by rounding at least one of the trapezoidal corners. (Trapezoidal shape) may be used. When one or both of the incident end 35 and the emission end 38 have a shape other than a rectangle, the pair of first sides may be set substantially parallel to the longitudinal direction of the illumination region IR. In this case, the longitudinal direction of the incident end 35 and the longitudinal direction of the exit end 38 are set in a direction parallel to the first side.

  Note that at least some of the illumination light L1 from the plurality of modules 27 may enter the inner surface 37 of the optical integrator 22 or may not enter the inner surface 37. For example, the plurality of modules 27 are arranged so as to avoid the end in the longitudinal direction at the incident end 35 of the optical integrator 22 so that the illumination light L1 from the magnifying optical system 21 (the plurality of modules 27) does not enter the inner surface 37. It may be. The illumination light L1 reflected by the inner surface 37 may be used for illumination or may not be used for illumination.

  11 and 14, in the configuration in which the image of the emission end 38 of the optical integrator 22 is reduced in the short direction (X-axis direction), the magnification at which the magnifying optical system 21 enlarges the light source image Im1 is different. May be isotropic or isotropic. For example, as shown in FIG. 2, the magnifying optical system 21 isotropically enlarges the light source image Im1, and the diaphragm member 31 having an elliptical opening 31a as shown in FIG. 13 changes the divergence angle of the illumination light L1 anisotropically. You may do it. Thereby, the divergence angle of the illumination light L1 when entering the illumination region IR may be adjusted isotropically or anisotropically.

[Device manufacturing method]
Next, a device manufacturing method will be described. FIG. 21 is a flowchart showing the device manufacturing method of this embodiment.

  In the device manufacturing method shown in FIG. 21, the function / performance design of a device such as a liquid crystal display panel or an organic EL display panel is first performed (step 201). Next, a mask pattern M is manufactured based on the device design (step 202). In addition, a substrate such as a transparent film or sheet, which is a base material of the device, or an ultrathin metal foil is prepared by purchasing or manufacturing (step 203).

  Next, the prepared substrate is put into a roll-type or patch-type production line, and the TFT backplane layers such as electrodes, wiring, insulating film, and semiconductor film constituting the device on the substrate, and organic EL light emission that becomes the pixel portion A layer is formed (step 204). Step 204 typically includes a step of forming a resist pattern on a film on the substrate and a step of etching the film using the resist pattern as a mask. For forming the resist pattern, a step of uniformly forming a resist film on the substrate surface, a step of exposing the resist film of the substrate with exposure light patterned through the mask pattern M according to each of the above embodiments, A step of developing the resist film on which the latent image of the mask pattern is formed by the exposure is performed.

  In the case of flexible device manufacturing using printing technology together, a process of forming a functional photosensitive layer (photosensitive silane coupling material, etc.) on the substrate surface by a coating method, via the mask pattern M according to each of the above embodiments The step of irradiating the functional photosensitive layer with patterned exposure light to form a hydrophilic portion and a water-repellent portion according to the pattern shape on the functional photosensitive layer, the hydrophilicity of the functional photosensitive layer A step of applying a plating base solution or the like to a high portion and depositing and forming a metallic pattern by electroless plating is performed.

  Then, depending on the device to be manufactured, for example, the substrate is diced or cut, or another substrate manufactured in a separate process, for example, a sheet-like color filter having a sealing function or a thin glass substrate is attached. The combining process is performed to assemble the device (step 205). Next, post-processing such as inspection is performed on the device (step 206). A device can be manufactured as described above.

EX ... exposure device, IU ... illumination device, L1 ... illumination light, L2 ... exposure light, M ... mask pattern, P ... substrate, U3 ... processing device, 10. ..Moving device, 11 ... control device, 20 ... light source, 21 ... magnifying optical system, 22 ... light integrator, 23 ... imaging optical system, 23a ... conjugate surface, 24 ... Solid light source, 25 ... Optical fiber, 32 to 34 ... Lens array, 35 ... Incident end, 36, 37 ... Inner surface, 38 ... Outlet end

Claims (19)

An optical integrator having a rectangular first surface, an inner surface, and a rectangular second surface, wherein light incident on the first surface is emitted from the second surface via multiple reflection on the inner surface;
A light guide for guiding light from a light source to the optical integrator, and supplying the light integrator with a plurality of light beams arranged at predetermined intervals along the longitudinal direction of the first surface;
An image formed by forming a conjugate plane conjugate with the second surface in the short direction of the second surface and having a small refractive power in the longitudinal direction of the second surface compared to the refractive power in the short direction of the second surface. And an optical device. A plurality of regions corresponding to the plurality of light beams in the conjugate plane are arranged in a longitudinal direction of the second surface,
The predetermined interval is set so that the illumination distribution in the longitudinal direction of the second surface in the conjugate plane is uniform because the plurality of regions partially overlap each other. Lighting device. The light guide unit includes a plurality of optical fibers that guide light from the solid light source as the light source to the optical integrator,
The illuminating device according to claim 1, wherein a plurality of emission ends of the plurality of optical fibers are arranged in a longitudinal direction of the first surface. The illuminating device according to claim 1, further comprising a magnifying optical system disposed between the light guide unit and the optical integrator. The illumination device according to claim 4, wherein the magnifying optical system includes a lens array having a plurality of lens elements arranged in a longitudinal direction of the first surface. The illumination device according to claim 4 or 5, wherein an enlargement magnification of the enlargement optical system is set so that light emitted from the imaging optical system isotropically spreads. The magnification of the magnifying optical system that extends in the short direction of the first surface is set smaller than the magnification that extends in the longitudinal direction of the first surface,
The illuminating device according to claim 6, wherein the imaging optical system forms an image of the second surface, which is reduced in a short direction of the second surface, on the conjugate surface. The optical integrator has a first optical integrator and a second optical integrator,
The light guide unit includes a first light guide unit and a second light guide unit that supply the plurality of light beams to the first optical integrator and the second optical integrator, respectively.
The plurality of light beams from the first light guide part do not overlap each other in the longitudinal direction of the first surface,
The plurality of light beams from the second light guide portion do not overlap each other in the longitudinal direction of the first surface,
The conjugate plane formed by the imaging optical system is conjugate with a plane including the exit surface of the first optical integrator and the exit surface of the second optical integrator with respect to the short direction of the second surface.
The illuminating device as described in any one of Claims 1-7. The amount of deviation between the position of the plurality of light beams from the first light guide unit and the position of the plurality of light beams from the second light guide unit in the longitudinal direction of the first surface is the imaging optical system. The divergence angle of light incident on each point on the conjugate plane via is set to be isotropic in the longitudinal direction of the second surface and the lateral direction of the second surface. Item 9. The lighting device according to Item 8. The lighting device according to claim 8, wherein the first optical integrator and the second optical integrator are disposed adjacent to each other in the short direction of the second surface and are joined to each other. The imaging optical system forms an image of a surface including an emission surface of the first optical integrator and an emission surface of the second optical integrator on the conjugate surface by reducing the image in the lateral direction of the second surface. Item 11. The lighting device according to Item 10. A first magnifying optical system disposed between the first light guide and the first optical integrator;
A second magnifying optical system disposed between the second light guide and the second optical integrator,
The illumination device according to claim 11, wherein the magnification of the first magnifying optical system and the magnification of the second magnifying optical system are set so that light emitted from the imaging optical system spreads isotropically. An optical integrator having a rectangular first surface, an inner surface, and a rectangular second surface, wherein light incident on the first surface is emitted from the second surface by multiple reflection on the inner surface;
A light guide unit that guides light from a light source to the optical integrator, and supplies a plurality of light beams arranged at predetermined intervals along the longitudinal direction of the first surface and having predetermined angular characteristics to the optical integrator; The light guide;
An image formed by forming a conjugate plane conjugate with the second surface in the short direction of the second surface and having a small refractive power in the longitudinal direction of the second surface compared to the refractive power in the short direction of the second surface. And an imaging optical system having a predetermined magnification other than equal magnification in the lateral direction of the second surface. An optical system that makes the angular characteristics related to the longitudinal direction of the first surface and the angular characteristics related to the lateral direction of the first surface of the plurality of light beams traveling from the plurality of light guides to the optical integrator different from each other. In addition,
The lighting device according to claim 13. The optical system is set such that a ratio of an angular characteristic related to the longitudinal direction of the first surface and an angular characteristic related to the lateral direction of the first surface corresponds to the predetermined magnification of the imaging optical system;
The lighting device according to claim 14. A processing apparatus for transferring a pattern formed in a mask pattern onto a substrate having a sensitive layer,
The illumination device according to any one of claims 1 to 15, which illuminates the mask pattern;
A processing apparatus comprising: a moving device that relatively moves the mask pattern and the substrate in a direction perpendicular to a longitudinal direction of the second surface. The processing apparatus according to claim 16, wherein the moving device includes a mask holding member that holds the mask pattern and is rotatable around a center line parallel to a longitudinal direction of the second surface. The processing apparatus according to claim 16 or 17, continuously transferring the pattern to the substrate while relatively moving the mask pattern and the substrate;
Performing a subsequent process using a change in the sensitive layer of the substrate to which the pattern has been transferred. A rectangular parallelepiped optical integrator having a rectangular incident end, an inner surface, and a rectangular output end, and guiding light from the light source incident from the incident end to the output end by multiple reflection on the inner surface;
A light source side optical system for forming light incident on an incident end of the optical integrator into a plurality of condensed light beams arranged at predetermined intervals along a longitudinal direction of the incident end;
Imaging optics that forms a conjugate plane conjugate with the exit end in the lateral direction of the exit end of the optical integrator and has a smaller refractive power in the longitudinal direction of the exit end than in the lateral direction of the exit end And a lighting device.

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