JPWO2009081880A1 - 貼付材の貼付方法と貼付装置 - Google Patents
貼付材の貼付方法と貼付装置 Download PDFInfo
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68735—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by edge profile or support profile
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68757—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a coating or a hardness or a material
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
12 吸着面
14 保護テープ
14a テープ基材
14b 粘着剤
16 半導体ウエハ
16a 凸部
18 吸着プレート
38 多孔質部材
40 筐体
40a 外壁部
42 吸引装置
42c ポンプ
Claims (13)
- 被貼付部材の表面に、薄い貼付材を貼り付け、この貼付材の表面に多数の吸着孔を有し所定形状の吸着面を備えた吸着体を当接させ、前記吸着体前により前記貼付材を吸着し、前記貼付材表面を前記吸着体の吸着面形状に倣わせることを特徴とする貼付材の貼付方法。
- 半導体ウエハ表面及び半導体ウエハ表面の素子を保護する貼付材である保護テープを前記半導体ウエハ表面に貼付する際に、前記保護テープの熱可塑性樹脂から成る粘着剤を一旦前記半導体ウエハの表面に仮貼付した後、表面に多数の吸着孔を有し前記半導体ウエハ表面を覆うサイズもしくはそれより大きなサイズの平面状の吸着面が形成された吸着体を、前記半導体ウエハと平行に向き合う位置に配置し、前記吸着体の前記吸着面を所定の荷重で前記保護テープ表面に当接させ、前記吸着面に負圧を発生させて、前記保護テープ表面の前記吸着面に接した部分及び前記粘着剤を、前記吸着面側へ吸引して、前記保護テープを前記吸着面の平面に倣わせて貼付することを特徴とする貼付材の貼付方法。
- 前記吸着体の前記吸着面は、前記半導体ウエハ表面と互いに平行に位置する請求項2記載の貼付方法。
- 前記吸着体は、前記粘着剤の熱可塑性樹脂が軟化する温度に加温され、前記吸着体に前記保護テープを当接させて、前記粘着剤を軟化させる請求項2記載の貼付材の貼付方法。
- 多数の吸着孔を有して平面状に形成され被貼付部材の表面を覆う大きさの吸着面が形成された吸着体と、
前記吸着体を保持して前記吸着面を除く表面全体が密閉された吸着部材と、
前記吸着体内の空気を吸引して前記吸着面の吸着孔を負圧にする吸引用のポンプとを備え、
前記被貼付部材表面に前記貼付材を貼付し、前記吸着部材の前記吸着面を前記貼付材に当接させ、前記ポンプにより前記貼付材の表面を前記吸着面側へ吸引して、前記被貼付部材表面の前記貼付材を、前記吸着面の形状に倣わせることを特徴とする貼付装置。 - 前記被貼付部材表面に前記貼付材を貼付し、前記吸着部材の前記吸着面を前記貼付材に当接させた状態で、前記貼付材の外周縁部に当接して前記被貼付部材の外周縁部を囲んで前記吸着面を前記貼付材とともに密封する気密保持部材を備えた請求項5記載の貼付装置。
- 半導体ウエハの表面及び該半導体ウエハ表面の素子を保護する保護テープを、前記半導体ウエハ表面に粘着剤を介して貼付する貼付装置において、
多数の吸着孔を有して平面状に形成され前記半導体ウエハの表面を覆う大きさの吸着面が形成された吸着体と、前記吸着体の側周面を覆う側壁部が設けられ前記吸着体の前記吸着面を除く表面全体を密閉した筐体とから成る吸着プレートを備え、
前記吸着体内の空気を吸引して前記吸着面の吸着孔を負圧にする吸引用のポンプと、
前記半導体ウエハ表面に予め仮貼付された前記保護テープ表面に前記吸着面を当接させた状態で、前記半導体ウエハの外周縁部に当接するとともに、前記吸着プレートに直接又は間接的に当接して、前記吸着面に対面した前記半導体ウエハの前記外周縁部を囲んで前記吸着面を密封する気密保持部材を備え、
前記半導体ウエハ表面に前記保護テープが貼付けられ前記吸着プレートに対面した状態で、前記保護テープの表面を前記吸着面側へ吸引して、前記半導体ウエハ表面の前記保護テープを、前記吸着面の平面に倣わせることを特徴とする貼付装置。 - 前記気密保持部材は、環状の枠部材に取り付けられ、前記吸着プレートの周縁部と前記半導体ウエハに当接して前記吸着面を密封する請求項7記載の貼付装置。
- 前記気密保持部材は、前記半導体ウエハの周縁部を押圧して前記吸着面を密封する請求項7記載の貼付装置。
- 前記吸着体は、多孔質材料から成る請求項7記載の貼付装置。
- 前記吸着体は、前記吸着面を前記保護テープの前記粘着剤が軟化する温度に加熱する加熱手段を備えた請求項7記載の貼付装置。
- 前記吸着体は、異なる大きさの前記半導体ウエハに各々対応した外形を有し同心状に複数配置され、
前記吸着プレートは、異なる大きさの各半導体ウエハの各外周形状に各々対応した形状に形成され、複数の前記吸着体の側周面を覆う隔壁部を有し、前記吸着体の前記吸着面を除く表面全体を密閉した筐体を備え、
前記気密保持部材は、前記吸着面と対向する所定の位置に配置され、異なる大きさの前記半導体ウエハに各々対応した外形を有して複数設けられた請求項7記載の貼付装置。 - 前記保護テープの仮貼付を行う貼付テーブルと、前記半導体ウエハの前記保護テープを吸引する前記吸着プレートを水平方向に異なる位置に配置し、前記保護テープが仮貼付された前記半導体ウエハを、前記吸着プレートの前記吸着面と対向する位置に搬送する半導体ウエハ搬送機構を備えた請求項7記載の貼付装置。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007328623 | 2007-12-20 | ||
JP2007328623 | 2007-12-20 | ||
PCT/JP2008/073240 WO2009081880A1 (ja) | 2007-12-20 | 2008-12-19 | 貼付材の貼付方法と貼付装置 |
Publications (1)
Publication Number | Publication Date |
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JPWO2009081880A1 true JPWO2009081880A1 (ja) | 2011-05-06 |
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Application Number | Title | Priority Date | Filing Date |
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JP2009547085A Ceased JPWO2009081880A1 (ja) | 2007-12-20 | 2008-12-19 | 貼付材の貼付方法と貼付装置 |
Country Status (4)
Country | Link |
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JP (1) | JPWO2009081880A1 (ja) |
KR (1) | KR20100118558A (ja) |
CN (1) | CN101809718A (ja) |
WO (1) | WO2009081880A1 (ja) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104221131B (zh) * | 2012-09-07 | 2016-12-21 | 富士电机株式会社 | 半导体元件的制造方法 |
JP2016102048A (ja) * | 2014-11-13 | 2016-06-02 | 三星ダイヤモンド工業株式会社 | スクライブ方法並びにスクライブ装置 |
DE102014227005B4 (de) | 2014-12-29 | 2023-09-07 | Disco Corporation | Verfahren zum Aufteilen eines Wafers in Chips |
JP6576786B2 (ja) * | 2015-10-19 | 2019-09-18 | 株式会社ディスコ | ウエーハの研削方法 |
KR102499977B1 (ko) | 2016-07-13 | 2023-02-15 | 삼성전자주식회사 | 접착 테이프 부착 장치 및 이를 이용한 반도체 패키지의 제조 방법 |
DE102018214337A1 (de) * | 2018-08-24 | 2020-02-27 | Disco Corporation | Verfahren zum Bearbeiten eines Substrats |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004186522A (ja) * | 2002-12-05 | 2004-07-02 | Renesas Technology Corp | 半導体装置の製造方法 |
JP2005340311A (ja) * | 2004-05-25 | 2005-12-08 | Tsubaki Seiko:Kk | テープ接着装置およびテープ接着方法 |
WO2006040848A1 (ja) * | 2004-10-13 | 2006-04-20 | Tsubaki Seiko Inc. | テープ接着装置およびテープ接着方法 |
JP2006222231A (ja) * | 2005-02-09 | 2006-08-24 | Tsubaki Seiko:Kk | テープ接着装置およびテープ接着方法 |
JP2007258210A (ja) * | 2006-03-20 | 2007-10-04 | Nitto Denko Corp | 基板貼合せ方法およびこれを用いた装置 |
-
2008
- 2008-12-19 KR KR1020107007969A patent/KR20100118558A/ko not_active Application Discontinuation
- 2008-12-19 CN CN200880109523A patent/CN101809718A/zh active Pending
- 2008-12-19 WO PCT/JP2008/073240 patent/WO2009081880A1/ja active Application Filing
- 2008-12-19 JP JP2009547085A patent/JPWO2009081880A1/ja not_active Ceased
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004186522A (ja) * | 2002-12-05 | 2004-07-02 | Renesas Technology Corp | 半導体装置の製造方法 |
JP2005340311A (ja) * | 2004-05-25 | 2005-12-08 | Tsubaki Seiko:Kk | テープ接着装置およびテープ接着方法 |
WO2006040848A1 (ja) * | 2004-10-13 | 2006-04-20 | Tsubaki Seiko Inc. | テープ接着装置およびテープ接着方法 |
JP2006222231A (ja) * | 2005-02-09 | 2006-08-24 | Tsubaki Seiko:Kk | テープ接着装置およびテープ接着方法 |
JP2007258210A (ja) * | 2006-03-20 | 2007-10-04 | Nitto Denko Corp | 基板貼合せ方法およびこれを用いた装置 |
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Publication number | Publication date |
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CN101809718A (zh) | 2010-08-18 |
WO2009081880A1 (ja) | 2009-07-02 |
KR20100118558A (ko) | 2010-11-05 |
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