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JPS63312968A - Melting and evaporating device - Google Patents

Melting and evaporating device

Info

Publication number
JPS63312968A
JPS63312968A JP14840087A JP14840087A JPS63312968A JP S63312968 A JPS63312968 A JP S63312968A JP 14840087 A JP14840087 A JP 14840087A JP 14840087 A JP14840087 A JP 14840087A JP S63312968 A JPS63312968 A JP S63312968A
Authority
JP
Japan
Prior art keywords
container
vessel
melting
liquid level
main
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14840087A
Other languages
Japanese (ja)
Inventor
Masahiro Ono
正博 小野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP14840087A priority Critical patent/JPS63312968A/en
Publication of JPS63312968A publication Critical patent/JPS63312968A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/246Replenishment of source material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To easily monitor the liquid level of a material in a main vessel which is installed in a vacuum vessel and holds the material in a molten state via a preliminary melting vessel which supplies the material by connecting the main vessel and the preliminary melting vessel via a communicating pipe. CONSTITUTION:The material 7 which is to be melted and is housed in the main vessel 4 of the vacuum vessel 1 having an evacuation system 2 is maintained in the molten state by an electron beam 3 from an electron gun 10. The preliminary melting vessel 5 for supplying the above-mentioned material 7 to the above-mentioned main vessel 4 is disposed in the same vacuum vessel 1 of the above-mentioned melt evaporating device and the two vessels 4, 5 are connected by the communicating pipe 8 in the bottom; further, a heater 6 is disposed to the preliminary melting vessel 5 and the communicating pipe 8 to maintain the material 7 therein in the molten state. A thermocouple 9 is inserted into the above-mentioned preliminary melting vessel 5 and the liquid level in the vessel is detected from the detection temp. thereof. The liquid level of the material 7 in the main vessel 4 which is nearly the same as said vessel is thereby monitored.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は金属等の溶解・蒸発装置に係り、特に溶解容器
内に保持された被溶解・蒸発材料の液面レベルの監視を
容易に行うことができる溶解蒸発装置に関する。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to an apparatus for melting and evaporating metals, etc., and in particular, an apparatus for easily monitoring the liquid level of a material to be melted and evaporated held in a melting container. The present invention relates to a dissolution evaporation device that can be used.

[従来の技術] 例えば金属等の蒸着装置などに用いられる金属等の溶解
・蒸発装置においては、容器等に保持された被溶解・蒸
発材料の液面位置の変動は発生蒸気の空間分布の変動を
引き起し、発生蒸気の利用に影響を与える。従って、被
溶解・蒸発材料の液面位置を監視し一定に制御する必要
がある。しかし、被溶解・蒸発材料は容器内で高温に保
持されており、特に蒸気の発生する液面は数千度に達し
ているため、従来液面位置の適切な監視方法がなかった
。接触式の監視方法では温度的に接触部が溶解する可能
性が高い。
[Prior Art] For example, in a metal melting/evaporation device used in a metal vapor deposition device, fluctuations in the liquid level position of the material to be melted/evaporated held in a container etc. are caused by fluctuations in the spatial distribution of generated vapor. This will affect the utilization of the generated steam. Therefore, it is necessary to monitor and control the liquid level position of the material to be dissolved/evaporated. However, since the material to be melted and evaporated is kept at a high temperature within the container, and the liquid level where steam is generated reaches several thousand degrees, there has been no appropriate method for monitoring the liquid level position. In contact-type monitoring methods, there is a high possibility that the contact portion will melt due to temperature.

また、非接触式の監視方法では、光、音波等の発生部、
受光・受信部が液面からの高熱発生蒸気にさらされるた
め装置の保守、管理が困難となる。
In addition, in non-contact monitoring methods, the source of light, sound waves, etc.
Maintenance and management of the device becomes difficult because the light receiving section is exposed to high heat generated steam from the liquid surface.

上記の問題を解決する手段として、第2図に示すような
特開昭53−30432に記載の方法がある。この方法
は、被溶解・蒸発材料7を保持する溶解客器4を囲む真
空容器1の外部に、該被溶解・蒸発材料を供給するため
の供給管11を設置し、供給管11を溶解容器4に連絡
させ、供給管11内の上記材料をヒータ6で溶解状態に
保ち、供給管11に不活性ガス12を導入する。溶解容
器4内の液面レベルは供給管11に導入される不活性ガ
ス12の圧力を変えることにより制御される。供給管1
1内の液面のレベルはレベル検出装置13によって検出
され、これによって、溶解容器4内の液面を間接的に監
視することができる。
As a means for solving the above problem, there is a method described in Japanese Patent Application Laid-Open No. 53-30432, as shown in FIG. In this method, a supply pipe 11 for supplying the material to be melted and evaporated is installed outside a vacuum container 1 surrounding a melting container 4 holding a material 7 to be melted and evaporated, and the supply pipe 11 is connected to the melting container. 4, the material in the supply pipe 11 is maintained in a molten state by the heater 6, and an inert gas 12 is introduced into the supply pipe 11. The liquid level in the dissolution vessel 4 is controlled by changing the pressure of the inert gas 12 introduced into the supply pipe 11. Supply pipe 1
The level of the liquid in the dissolution container 4 is detected by the level detection device 13, thereby making it possible to indirectly monitor the liquid level in the dissolution container 4.

[発明が解決しようとする問題点] 上記の従来技術においては、溶解容器4内の液面のレベ
ルと供給管11内の液面レベルとの関係は真空容器1内
の圧力と供給管11内の圧力との差に依存するので、後
者の液面レベルの検出によって前者の液面レベルを知る
には、上記圧力差を測定する必要があるという面倒な問
題があり、また圧力は温度により変化するので温度変化
のしよう乱により圧力が変化することに対し配慮する必
要がある。また真空容器外の部分の材料を溶融状態に保
つためのヒータ6が酸化する等の問題がある。
[Problems to be Solved by the Invention] In the above-mentioned prior art, the relationship between the liquid level in the melting container 4 and the liquid level in the supply pipe 11 is determined by the pressure in the vacuum container 1 and the liquid level in the supply pipe 11. Therefore, in order to know the former liquid level by detecting the latter liquid level, it is necessary to measure the above pressure difference, which is a troublesome problem. Therefore, consideration must be given to pressure changes due to disturbances caused by temperature changes. Further, there are problems such as oxidation of the heater 6 for keeping the material outside the vacuum container in a molten state.

本発明の目的は、上記の問題なしに、溶解容器内の被溶
解蒸発材料の液面レベルを監視できるようにした溶解蒸
発装置を提供することにある。
SUMMARY OF THE INVENTION An object of the present invention is to provide a melting and evaporating apparatus that allows monitoring of the liquid level of a material to be melted and evaporated in a melting container without the above-mentioned problems.

[問題点を解決するための手段] 本発明の溶解蒸発装置は、被溶解蒸発材料を溶融状態に
保持する主容器と、該主容器へ上記材料を供給するため
の予備溶解容器と、上記主容器および予備溶解容器の底
部に接続された連通管と、上記予備溶解容器および連通
管内の上記材料を溶融状態に保つためのヒータと、を同
一真空容器内に設け、上記予備溶解容器内の上記材料の
液面レベルを監視することにより上記主容器内の上記材
料の液面レベルを監視するようにしたことを特徴とする
ものである。
[Means for Solving the Problems] The melting and evaporating apparatus of the present invention comprises a main container that holds the material to be melted and evaporated in a molten state, a preliminary melting container for supplying the material to the main container, and the main container. A communication pipe connected to the bottom of the container and the pre-melting container, and a heater for keeping the material in the pre-melting container and the communication pipe in a molten state are provided in the same vacuum container, and the material in the pre-melting container is provided in the same vacuum container. The present invention is characterized in that the liquid level of the material in the main container is monitored by monitoring the liquid level of the material.

[作用] 被溶解蒸発材料を溶解、蒸発させるための前記主容器お
よびこの主容器へ溶融状態の該材料を供給するための前
記予備溶解容器の底部を前記連通管によって接続し、同
一真空チェンバー内に設置することにより主容器と予備
溶解容器内の材料の液面レベルはほぼ同一となる。これ
を数式によって示すと次のようになる。
[Function] The bottom of the main container for melting and evaporating the material to be melted and evaporated and the bottom of the pre-melting container for supplying the material in a molten state to the main container are connected by the communication pipe, By installing the main container and the pre-melting container, the liquid level of the material in the main container and the pre-melting container will be almost the same. This can be expressed numerically as follows.

gρ(TI)hl”P+−gρ(r2)hz÷P2・・
・・・・(1)ただし、g:重力加速度 ρ(T):温度Tの時の液体の密度 h:液面の高さ P:雰囲気の圧力 であり、添字1.2はそれぞれ主容器、予備溶解容器に
対応している。
gρ(TI)hl”P+-gρ(r2)hz÷P2...
...(1) However, g: Gravitational acceleration ρ (T): Density of liquid at temperature T h: Height of liquid level P: Pressure of atmosphere, subscript 1.2 is the main container, Compatible with pre-melting containers.

上述したように、主容器と予備溶解容器を同一真空容器
内に設置することにより P、=P、      ・・・・・・(2)となる。従
って(1)式は gρ(y+)hl−g゛ρ(r2)hl   ・・・・
・・ (3)となる。
As mentioned above, by installing the main container and the preliminary melting container in the same vacuum container, P, = P, (2) is obtained. Therefore, equation (1) is gρ(y+)hl-g゛ρ(r2)hl...
... (3) becomes.

従って、ρ(TI)・ρ(T2)であれば物理的現象と
して必然的にhl −hlとなり、主容器及び予備溶解
容器内の液面は同一となる。液体の密度は温度によりて
大きくは変わらず高々数%程度変化するだけであり、従
フて温度差を考慮しても h1警h2 となる。
Therefore, if ρ(TI)·ρ(T2), the physical phenomenon will inevitably be hl - hl, and the liquid levels in the main container and the pre-melting container will be the same. The density of the liquid does not change greatly depending on the temperature, but only changes by a few percent at most, so even if the temperature difference is taken into account, the density is h1 and h2.

従って、予備溶解容器内の液面レベルを監視することに
より、主容器内の液面レベルを圧力の影習なしに、監視
することができる。
Therefore, by monitoring the liquid level in the pre-dissolution container, the liquid level in the main container can be monitored without the influence of pressure.

[実施例] 以下、本発明の一実施例を第1図により説明する。[Example] An embodiment of the present invention will be described below with reference to FIG.

第1図に示すように、排気系2によって真空に保たれた
真空容器1内に、蒸着用金属材料7を溶解・蒸発状態に
保持する主客器4と、この主客器4へ供給する金属材料
をあらかじめ溶解しておくための予備溶解容器5とを設
置し、この2つの容器の底部を連通バイブ8により接続
しである。予備溶解容器5および連通バイブ8にはヒー
タ6が設けである。主客器4内の金属材料7は蒸発させ
る必要があるため例えば高エネルギ密度、高出力の電子
銃10の電子ビーム3によって加熱され、主客器4内の
金属材料の液面及び液面近傍の温度はかなり高温となる
As shown in FIG. 1, in a vacuum container 1 kept in a vacuum by an exhaust system 2, there is a main container 4 that holds a metal material 7 for deposition in a melted/evaporated state, and a metal material supplied to the main container 4. A pre-dissolution container 5 for pre-dissolving the liquid is installed, and the bottoms of these two containers are connected by a communication vibrator 8. A heater 6 is provided in the pre-dissolution container 5 and the communication vibe 8. Since the metal material 7 in the main container 4 needs to be evaporated, it is heated, for example, by the electron beam 3 of the high-energy density, high-output electron gun 10, and the temperature of the liquid surface and the vicinity of the liquid surface of the metal material in the main container 4 is heated. becomes quite high temperature.

これに対して、予備溶解容器5内の金属材料は溶解させ
ておくだけで蒸発させる必要はないので、ヒータ6によ
って予備溶解容器5および連通管8内の金属材料はその
材料の融点以上に保持される。したがって、主容器内の
材料の液面温度よりも予備溶解容器内の材料の液面温度
は低く保たれている。
On the other hand, since the metal material in the pre-melting container 5 only needs to be melted and does not need to be evaporated, the metal material in the pre-melting container 5 and the communication pipe 8 is maintained at a temperature higher than the melting point of the material by the heater 6. be done. Therefore, the liquid surface temperature of the material in the pre-melting container is kept lower than the liquid surface temperature of the material in the main container.

主客器4と予備溶解容器5とが同一真空容器1内におい
て連通バイブ8で連絡されているので、同容器4.5内
の溶融金属材料の液面レベルは同じになる。(尤も、主
客器4内の金属材料の温度と予備溶解容器5内の金属材
料の温度とは前記のように差があるので、液面レベルに
も該温度差に応じた若干の差があるが、それは任かであ
り、液面レベルはほぼ同じになる。)従って、予備溶解
容器5内に挿入した熱電対9の温度変化から、予備溶解
容器5内の、従って主客器4内の液面レベルを検知する
ことができる。この場合、前述のように、予備溶解容器
5内の材料の温度は主容器内のそれよりも低く保たれて
いるので、熱電対9の損傷の恐れはない。また、ヒータ
6は真空容器1内にあるので酸化の恐れはない。
Since the main melting device 4 and the pre-melting container 5 are connected by the communication vibrator 8 in the same vacuum container 1, the liquid level of the molten metal material in the same vacuum container 4.5 becomes the same. (Of course, since there is a difference between the temperature of the metal material in the main melting vessel 4 and the temperature of the metal material in the pre-melting container 5 as described above, there is also a slight difference in the liquid level depending on the temperature difference. However, this is up to you, and the liquid level will be almost the same.) Therefore, from the temperature change of the thermocouple 9 inserted in the pre-melting container 5, the liquid level in the pre-melting container 5 and therefore in the main container 4 surface level can be detected. In this case, as mentioned above, the temperature of the material in the pre-melting container 5 is kept lower than that in the main container, so there is no risk of damage to the thermocouple 9. Furthermore, since the heater 6 is located inside the vacuum container 1, there is no fear of oxidation.

[発明の効果] 本発明によれば、連通管で連絡された主容器および予備
溶解容器が同一真空容器内にあるので、両容器内の溶融
材料の液面レベルは同じになり、圧力差の問題なしに、
予備溶解容器内の液面レベルを監視することにより主容
器内の液面レベルを容易に監視することができる。また
予備溶解容器および連通管内の材料を溶融状態に保つた
めのヒータは真空容器内にあるため酸化の恐れがない。
[Effects of the Invention] According to the present invention, since the main container and the pre-melting container are in the same vacuum container and are connected by a communication pipe, the liquid level of the molten material in both containers becomes the same, and the pressure difference is reduced. without any problems,
By monitoring the liquid level in the pre-dissolution container, the liquid level in the main container can be easily monitored. Further, since the heater for keeping the materials in the pre-melting container and the communication tube in a molten state is located inside the vacuum container, there is no risk of oxidation.

また、主容器内の材料の温度に比べて予備溶解容器内の
材料の温度を低く保つことによって、予備溶解容器内の
液面レベルを検出する検出器の損傷や保守・管理の問題
を軽減することができる。
Additionally, by keeping the temperature of the material in the pre-melting vessel lower than the temperature of the material in the main vessel, damage to the detector that detects the liquid level in the pre-melting vessel and maintenance problems are reduced. be able to.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の一実施例である溶解蒸発装置の断面図
、第2図は公知例の溶解蒸発装置の断面図である。 1・・・真空容器    2・・・排気系3・・・電子
ビーム 4・・・溶解・蒸発用の主容器 5・・・予備溶解容器  6・・・ヒータ7・・・被溶
解・蒸発材料 8・・・連通バイブ   9・・・熱電対10・・・電
子銃    11・・・供給管12・・・不活性ガス 
 13・・・レベル検出装置第1図 1−真空容器 4−主容器 5−子漏り容Ng4 6−ヒルター 7−8器内の材爬
FIG. 1 is a cross-sectional view of a melting evaporator according to an embodiment of the present invention, and FIG. 2 is a cross-sectional view of a known melting evaporator. 1... Vacuum container 2... Exhaust system 3... Electron beam 4... Main container for melting/evaporation 5... Preliminary melting container 6... Heater 7... Material to be melted/evaporated 8... Communication vibrator 9... Thermocouple 10... Electron gun 11... Supply pipe 12... Inert gas
13...Level detection device Fig. 1 1-Vacuum container 4-Main container 5-Leakage volume Ng4 6-Hilter 7-8 Material in the container

Claims (1)

【特許請求の範囲】[Claims] 被溶解蒸発材料を溶融状態に保持する主容器と、該主容
器へ上記材料を供給するための予備溶解容器と、上記主
容器および予備溶解容器の底部に接続された連通管と、
上記予備溶解容器および連通管内の上記材料を溶融状態
に保つためのヒータと、を同一真空容器内に設け、上記
予備溶解容器内の上記材料の液面レベルを監視すること
により上記主容器内の上記材料の液面レベルを監視する
ようにしたことを特徴とする溶解蒸発装置。
a main container that holds the material to be melted and evaporated in a molten state, a pre-melting container for supplying the material to the main container, and a communication pipe connected to the bottoms of the main container and the pre-melting container;
The pre-melting container and a heater for keeping the material in the communication pipe in a molten state are provided in the same vacuum container, and by monitoring the liquid level of the material in the pre-melting container, A dissolution evaporation device characterized in that the liquid level of the above-mentioned material is monitored.
JP14840087A 1987-06-15 1987-06-15 Melting and evaporating device Pending JPS63312968A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14840087A JPS63312968A (en) 1987-06-15 1987-06-15 Melting and evaporating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14840087A JPS63312968A (en) 1987-06-15 1987-06-15 Melting and evaporating device

Publications (1)

Publication Number Publication Date
JPS63312968A true JPS63312968A (en) 1988-12-21

Family

ID=15451937

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14840087A Pending JPS63312968A (en) 1987-06-15 1987-06-15 Melting and evaporating device

Country Status (1)

Country Link
JP (1) JPS63312968A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
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WO2000008226A3 (en) * 1998-08-03 2000-12-07 Coca Cola Co Vapor deposition system
US6223683B1 (en) 1997-03-14 2001-05-01 The Coca-Cola Company Hollow plastic containers with an external very thin coating of low permeability to gases and vapors through plasma-assisted deposition of inorganic substances and method and system for making the coating
US6599584B2 (en) 2001-04-27 2003-07-29 The Coca-Cola Company Barrier coated plastic containers and coating methods therefor
US6720052B1 (en) 2000-08-24 2004-04-13 The Coca-Cola Company Multilayer polymeric/inorganic oxide structure with top coat for enhanced gas or vapor barrier and method for making same
US6740378B1 (en) 2000-08-24 2004-05-25 The Coca-Cola Company Multilayer polymeric/zero valent material structure for enhanced gas or vapor barrier and uv barrier and method for making same
JP2008500454A (en) * 2004-05-27 2008-01-10 ズィードラーベ インコーポレイテッド Vacuum deposition method and apparatus by evaporation of metal and alloy

Cited By (13)

* Cited by examiner, † Cited by third party
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US6599569B1 (en) 1997-03-14 2003-07-29 The Coca-Cola Company Plastic containers with an external gas barrier coating, method and system for coating containers using vapor deposition, method for recycling coated containers, and method for packaging a beverage
US6223683B1 (en) 1997-03-14 2001-05-01 The Coca-Cola Company Hollow plastic containers with an external very thin coating of low permeability to gases and vapors through plasma-assisted deposition of inorganic substances and method and system for making the coating
US6279505B1 (en) 1997-03-14 2001-08-28 The Coca-Cola Company Plastic containers with an external gas barrier coating
US6548123B1 (en) 1997-03-14 2003-04-15 The Coca-Cola Company Method for coating a plastic container with vacuum vapor deposition
US6251233B1 (en) 1998-08-03 2001-06-26 The Coca-Cola Company Plasma-enhanced vacuum vapor deposition system including systems for evaporation of a solid, producing an electric arc discharge and measuring ionization and evaporation
US6447837B2 (en) 1998-08-03 2002-09-10 The Coca-Cola Company Methods for measuring the degree of ionization and the rate of evaporation in a vapor deposition coating system
WO2000008226A3 (en) * 1998-08-03 2000-12-07 Coca Cola Co Vapor deposition system
US6720052B1 (en) 2000-08-24 2004-04-13 The Coca-Cola Company Multilayer polymeric/inorganic oxide structure with top coat for enhanced gas or vapor barrier and method for making same
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