JPS63301543A - Manufacture of semiconductor element - Google Patents
Manufacture of semiconductor elementInfo
- Publication number
- JPS63301543A JPS63301543A JP62138503A JP13850387A JPS63301543A JP S63301543 A JPS63301543 A JP S63301543A JP 62138503 A JP62138503 A JP 62138503A JP 13850387 A JP13850387 A JP 13850387A JP S63301543 A JPS63301543 A JP S63301543A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor element
- element wafer
- laser beam
- wafer
- segmentation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 34
- 238000004519 manufacturing process Methods 0.000 title claims description 3
- 239000008188 pellet Substances 0.000 claims abstract description 8
- 238000000034 method Methods 0.000 claims abstract description 6
- 238000010438 heat treatment Methods 0.000 claims description 6
- 230000011218 segmentation Effects 0.000 abstract 3
- 235000012431 wafers Nutrition 0.000 description 20
- 238000009826 distribution Methods 0.000 description 8
- 238000005520 cutting process Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000003698 laser cutting Methods 0.000 description 1
- 238000004093 laser heating Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/362—Laser etching
- B23K26/364—Laser etching for making a groove or trench, e.g. for scribing a break initiation groove
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Laser Beam Processing (AREA)
- Dicing (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は半導体素子の製造方法に関し、特にレーザー光
により半導体素子フェノ・−をペレットに分割する加工
方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for manufacturing a semiconductor device, and more particularly to a processing method for dividing a semiconductor device phenol into pellets using laser light.
従来、この種の半導体素子フェノ・−のレーザー光によ
るペレット個片への分割は、レーザー光のパワーや周波
数全被切断物の回転及びストローク速さなどにより条件
をよシ最適な条件に制御して、クエハーにあてて溝を作
り切断・分割する方法で実施していた。Conventionally, when dividing this type of semiconductor element into individual pellets using a laser beam, the conditions were controlled to the optimum by controlling the power and frequency of the laser beam, the rotation of the object to be cut, the stroke speed, etc. The method used was to apply the material to a quartz to create grooves and then cut and divide it.
上述した従来のレーザー光による半導体素子クエハーの
切断はレーザー光が照射される部分の半導体素子ウェハ
ーのその部分がレーザ光のエネルギーで溶融し、半導体
素子ウェハーの回転又は往狽運動により、指定された形
状に溝が作られ、個別のペレットに分割される。しかし
ながら、レーザー光による従来の切断方法は常温の半導
体素子ウェハーを切断するため、レーザー光照射による
急激な温度上昇、或いは溶融によるペレット側面と中央
部との温度差による亀裂や反りを生じる原因となってい
た。このペレットの亀裂や反りは半導体素子の特性上、
耐電圧又は電流容量を減少させる要因のため、製品の歩
留低下を招きコスト高の一因となっていた。In the above-mentioned conventional cutting of a semiconductor element wafer using a laser beam, the part of the semiconductor element wafer that is irradiated with the laser beam is melted by the energy of the laser beam, and the semiconductor element wafer is rotated or reciprocated to create a designated area. Grooves are made in the shape and separated into individual pellets. However, conventional cutting methods using laser light cut semiconductor element wafers at room temperature, which can cause cracks and warpage due to the rapid temperature rise caused by laser light irradiation or the temperature difference between the sides and the center of the pellet due to melting. was. Cracks and warping of this pellet are due to the characteristics of semiconductor elements.
This is a factor that reduces the withstand voltage or current capacity, leading to lower product yields and contributing to higher costs.
本発明の特徴は常温の半導体素子フェノ・−を加熱する
装置を有しており、半導体素子クエハーを一定の温度ま
で上昇させ、レーザー光による溶融度の促進牛導体素子
ワエハー自身のレーザー光による熱影響を受けないよう
、温度分布の均一性をはかりながら、レーザー光で溝を
作るものである。The feature of the present invention is that it has a device that heats the semiconductor element wafer at room temperature, which raises the semiconductor element wafer to a certain temperature and promotes the degree of melting by laser light. The grooves are created using a laser beam while ensuring uniform temperature distribution to avoid any effects.
次に、本発明について図面を参照して説明する。 Next, the present invention will be explained with reference to the drawings.
第1図に本発明の一実施例を示すものでレーザー装置1
7からレーザー光1を発射し半導体素子クエハー2の切
断部A又iBに照射する。半導体索子ワエハー2は支持
台4により密着固定されてお9、駆動装rIt(図示せ
ず〕で矢印の回転方向8に一定の回転数で廻わり、レー
ザー光1により切断される。FIG. 1 shows an embodiment of the present invention, in which a laser device 1 is shown.
Laser light 1 is emitted from 7 and irradiated onto the cut portion A or iB of the semiconductor element wafer 2. The semiconductor cable wafer 2 is tightly fixed on a support 4 9 and rotated at a constant rotational speed in the rotational direction 8 indicated by the arrow by a drive device rIt (not shown), and is cut by the laser beam 1 .
を全体的に温める構造となっている。It has a structure that warms the whole body.
第3図は半導体素子ウェハー2のレーザー光1照射によ
る温度分布で切断部A又はBは高温度になるが、本発明
によれば、実線Cの如く温度差が少なく、従来技術の温
度分布点線Eと比較すると、半導体素子に与える影響が
少ない。FIG. 3 shows the temperature distribution of the semiconductor element wafer 2 due to irradiation with one laser beam, and the temperature at the cutting part A or B is high, but according to the present invention, the temperature difference is small as shown by the solid line C, and the temperature distribution of the conventional technology is shown by the dotted line. Compared to E, it has less influence on semiconductor elements.
第4図は本発明の他の実施例の部分拡大図である。支持
台4に内蔵される発熱体6は個々に分P、セされている
八これは半導体素子クエハー2全分割する場合、往復運
動つまり直線運動で可能なように発熱体6を分離するこ
とによって牛導体素子りエハー2の温度分布を調整でき
最良の条件で切断できる利点がある。FIG. 4 is a partially enlarged view of another embodiment of the present invention. The heating elements 6 built into the support base 4 are individually set to 8. When the semiconductor element wafer 2 is completely divided, the heating elements 6 are separated so that reciprocating movement, that is, linear movement is possible. There is an advantage that the temperature distribution of the conductor element wire wafer 2 can be adjusted and cutting can be performed under the best conditions.
以上説明したように本発明は半導体素子ワエノ・−2を
加熱することによ勺レーザー光1の溶融切断後の半導体
索子ワエハー2の亀裂、及び反りが回避できる。このた
め半導体素子の電気的特性の耐電圧、及びレーザー力ッ
テング工程の歩留が向上し、原価低減をはかることがで
きる。As explained above, in the present invention, by heating the semiconductor element wafer 2, cracks and warping of the semiconductor wafer 2 after being melted and cut by the laser beam 1 can be avoided. Therefore, the withstand voltage of the electrical characteristics of the semiconductor element and the yield rate of the laser heating process are improved, and the cost can be reduced.
第1図は本発明の一実施例によるレーザーカットの部分
断面図で、第2図は第1図の半導体素子ワエハーを加熱
する部分の拡大断面図である。第3図は本発明および従
来の半導体ワエハーのレーザ光による温度分布を示すグ
ラフである。第4図は本発明の他の実施例を示めす部分
断面図である。
1・・・・・・レーザ光、2・・・・・・半導体索子ワ
エハー、3・・・・・・発熱体、4・・・・・・支持台
、5・・・・・・逃げ溝、6・・・・・・発熱体、7・
・・・・・レーザー装置、8・・・・・・回転方向、A
・・・・・・切断部、B・・・・・・切断部、C・・・
・・・本考案の半導体素子ウェハーの温度分布、E・・
・・・・従来技術の半導体素子ワエハーの温度分布、D
・・・・・・半導体素子ワエハーの温度分布。
第1図 第2図FIG. 1 is a partial sectional view of laser cutting according to an embodiment of the present invention, and FIG. 2 is an enlarged sectional view of a portion of FIG. 1 that heats the semiconductor element wafer. FIG. 3 is a graph showing the temperature distribution of the semiconductor wafer of the present invention and the conventional semiconductor wafer due to laser light. FIG. 4 is a partial sectional view showing another embodiment of the present invention. 1...Laser light, 2...Semiconductor cable wafer, 3...Heating element, 4...Support stand, 5...Escape Groove, 6... Heating element, 7.
...Laser device, 8...Rotation direction, A
... Cutting part, B ... Cutting part, C...
...Temperature distribution of the semiconductor element wafer of the present invention, E...
...Temperature distribution of conventional semiconductor device wafer, D
...Temperature distribution of semiconductor device wafer. Figure 1 Figure 2
Claims (1)
レーザー光により溝を形成し、もつて複数のペレットに
分割することを特徴とする半導体素子の製造方法。A method for manufacturing a semiconductor device, which comprises forming grooves using a laser beam while heating a semiconductor device wafer having a PN junction, and dividing the semiconductor device wafer into a plurality of pellets.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62138503A JPS63301543A (en) | 1987-06-01 | 1987-06-01 | Manufacture of semiconductor element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62138503A JPS63301543A (en) | 1987-06-01 | 1987-06-01 | Manufacture of semiconductor element |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63301543A true JPS63301543A (en) | 1988-12-08 |
Family
ID=15223649
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62138503A Pending JPS63301543A (en) | 1987-06-01 | 1987-06-01 | Manufacture of semiconductor element |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63301543A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002184722A (en) * | 2000-12-12 | 2002-06-28 | Sony Corp | Method of manufacturing semiconductor device |
JP2009525601A (en) * | 2006-02-02 | 2009-07-09 | エグシル テクノロジー リミテッド | Wafer piece cutting support |
-
1987
- 1987-06-01 JP JP62138503A patent/JPS63301543A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002184722A (en) * | 2000-12-12 | 2002-06-28 | Sony Corp | Method of manufacturing semiconductor device |
JP2009525601A (en) * | 2006-02-02 | 2009-07-09 | エグシル テクノロジー リミテッド | Wafer piece cutting support |
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