JPS63280777A - Coating composition and production thereof - Google Patents
Coating composition and production thereofInfo
- Publication number
- JPS63280777A JPS63280777A JP11584387A JP11584387A JPS63280777A JP S63280777 A JPS63280777 A JP S63280777A JP 11584387 A JP11584387 A JP 11584387A JP 11584387 A JP11584387 A JP 11584387A JP S63280777 A JPS63280777 A JP S63280777A
- Authority
- JP
- Japan
- Prior art keywords
- carbon atoms
- group
- water
- component
- alkyl group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000008199 coating composition Substances 0.000 title claims abstract description 15
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 33
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 26
- 150000001282 organosilanes Chemical class 0.000 claims abstract description 11
- 150000003755 zirconium compounds Chemical class 0.000 claims abstract description 9
- 125000003545 alkoxy group Chemical group 0.000 claims abstract description 8
- 125000002252 acyl group Chemical group 0.000 claims abstract description 7
- 125000000962 organic group Chemical group 0.000 claims abstract description 6
- 125000004432 carbon atom Chemical group C* 0.000 claims description 33
- 238000002156 mixing Methods 0.000 claims description 4
- 238000000576 coating method Methods 0.000 abstract description 38
- 239000011248 coating agent Substances 0.000 abstract description 35
- 239000000203 mixture Substances 0.000 abstract description 30
- 150000002148 esters Chemical class 0.000 abstract 2
- 230000001070 adhesive effect Effects 0.000 abstract 1
- 238000004321 preservation Methods 0.000 abstract 1
- 229910021512 zirconium (IV) hydroxide Inorganic materials 0.000 abstract 1
- 239000010408 film Substances 0.000 description 32
- 230000007062 hydrolysis Effects 0.000 description 14
- 238000006460 hydrolysis reaction Methods 0.000 description 14
- 239000003960 organic solvent Substances 0.000 description 14
- 239000003513 alkali Substances 0.000 description 12
- 238000006068 polycondensation reaction Methods 0.000 description 12
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 9
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 8
- 239000002253 acid Substances 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 8
- -1 zirconium alkoxide Chemical class 0.000 description 8
- 229910052726 zirconium Inorganic materials 0.000 description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 5
- 150000001298 alcohols Chemical class 0.000 description 5
- 239000008119 colloidal silica Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- 238000003860 storage Methods 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 4
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 4
- 238000009835 boiling Methods 0.000 description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 4
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 4
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 238000005299 abrasion Methods 0.000 description 3
- LTOATULEBMBWSO-UHFFFAOYSA-N acetic acid;2-ethoxyethanol Chemical compound CC(O)=O.CCOCCO LTOATULEBMBWSO-UHFFFAOYSA-N 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 238000009413 insulation Methods 0.000 description 3
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- REIYHFWZISXFKU-UHFFFAOYSA-N Butyl acetoacetate Chemical compound CCCCOC(=O)CC(C)=O REIYHFWZISXFKU-UHFFFAOYSA-N 0.000 description 2
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 description 2
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 235000011054 acetic acid Nutrition 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- 239000012153 distilled water Substances 0.000 description 2
- XYIBRDXRRQCHLP-UHFFFAOYSA-N ethyl acetoacetate Chemical compound CCOC(=O)CC(C)=O XYIBRDXRRQCHLP-UHFFFAOYSA-N 0.000 description 2
- 238000001879 gelation Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 2
- 239000011259 mixed solution Substances 0.000 description 2
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 239000003973 paint Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- DHGFMVMDBNLMKT-UHFFFAOYSA-N propyl 3-oxobutanoate Chemical compound CCCOC(=O)CC(C)=O DHGFMVMDBNLMKT-UHFFFAOYSA-N 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 239000008399 tap water Substances 0.000 description 2
- 235000020679 tap water Nutrition 0.000 description 2
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 2
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 2
- RTBFRGCFXZNCOE-UHFFFAOYSA-N 1-methylsulfonylpiperidin-4-one Chemical compound CS(=O)(=O)N1CCC(=O)CC1 RTBFRGCFXZNCOE-UHFFFAOYSA-N 0.000 description 1
- LBLYYCQCTBFVLH-UHFFFAOYSA-N 2-Methylbenzenesulfonic acid Chemical compound CC1=CC=CC=C1S(O)(=O)=O LBLYYCQCTBFVLH-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- BGGIUGXMWNKMCP-UHFFFAOYSA-N 2-methylpropan-2-olate;zirconium(4+) Chemical compound CC(C)(C)O[Zr](OC(C)(C)C)(OC(C)(C)C)OC(C)(C)C BGGIUGXMWNKMCP-UHFFFAOYSA-N 0.000 description 1
- HNNQYHFROJDYHQ-UHFFFAOYSA-N 3-(4-ethylcyclohexyl)propanoic acid 3-(3-ethylcyclopentyl)propanoic acid Chemical compound CCC1CCC(CCC(O)=O)C1.CCC1CCC(CCC(O)=O)CC1 HNNQYHFROJDYHQ-UHFFFAOYSA-N 0.000 description 1
- DCQBZYNUSLHVJC-UHFFFAOYSA-N 3-triethoxysilylpropane-1-thiol Chemical compound CCO[Si](OCC)(OCC)CCCS DCQBZYNUSLHVJC-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- PQCLJXVUAWLNSV-UHFFFAOYSA-N 5-Methyl-2,3-hexanedione Chemical compound CC(C)CC(=O)C(C)=O PQCLJXVUAWLNSV-UHFFFAOYSA-N 0.000 description 1
- 241000501754 Astronotus ocellatus Species 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229920000298 Cellophane Polymers 0.000 description 1
- WRQNANDWMGAFTP-UHFFFAOYSA-N Methylacetoacetic acid Chemical compound COC(=O)CC(C)=O WRQNANDWMGAFTP-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- IOVCWXUNBOPUCH-UHFFFAOYSA-N Nitrous acid Chemical compound ON=O IOVCWXUNBOPUCH-UHFFFAOYSA-N 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical compound OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 1
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- JFCQEDHGNNZCLN-UHFFFAOYSA-N anhydrous glutaric acid Natural products OC(=O)CCCC(O)=O JFCQEDHGNNZCLN-UHFFFAOYSA-N 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- BSDOQSMQCZQLDV-UHFFFAOYSA-N butan-1-olate;zirconium(4+) Chemical compound [Zr+4].CCCC[O-].CCCC[O-].CCCC[O-].CCCC[O-] BSDOQSMQCZQLDV-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000004568 cement Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- FOCAUTSVDIKZOP-UHFFFAOYSA-N chloroacetic acid Chemical compound OC(=O)CCl FOCAUTSVDIKZOP-UHFFFAOYSA-N 0.000 description 1
- 229940106681 chloroacetic acid Drugs 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 239000004567 concrete Substances 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- OREAFAJWWJHCOT-UHFFFAOYSA-N dimethylmalonic acid Chemical compound OC(=O)C(C)(C)C(O)=O OREAFAJWWJHCOT-UHFFFAOYSA-N 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 239000002612 dispersion medium Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- ASBGGHMVAMBCOR-UHFFFAOYSA-N ethanolate;zirconium(4+) Chemical compound [Zr+4].CC[O-].CC[O-].CC[O-].CC[O-] ASBGGHMVAMBCOR-UHFFFAOYSA-N 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- SBRXLTRZCJVAPH-UHFFFAOYSA-N ethyl(trimethoxy)silane Chemical compound CC[Si](OC)(OC)OC SBRXLTRZCJVAPH-UHFFFAOYSA-N 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- MWVFCEVNXHTDNF-UHFFFAOYSA-N hexanedione Natural products CCCC(=O)C(C)=O MWVFCEVNXHTDNF-UHFFFAOYSA-N 0.000 description 1
- 235000011167 hydrochloric acid Nutrition 0.000 description 1
- FAHBNUUHRFUEAI-UHFFFAOYSA-M hydroxidooxidoaluminium Chemical compound O[Al]=O FAHBNUUHRFUEAI-UHFFFAOYSA-M 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 239000001023 inorganic pigment Substances 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 125000006606 n-butoxy group Chemical group 0.000 description 1
- 125000003506 n-propoxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- ADIIFIBMKMALKB-UHFFFAOYSA-N nonane-3,4-dione Chemical compound CCCCCC(=O)C(=O)CC ADIIFIBMKMALKB-UHFFFAOYSA-N 0.000 description 1
- GJYXGIIWJFZCLN-UHFFFAOYSA-N octane-2,4-dione Chemical compound CCCCC(=O)CC(C)=O GJYXGIIWJFZCLN-UHFFFAOYSA-N 0.000 description 1
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 239000012860 organic pigment Substances 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 239000000123 paper Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 229960005235 piperonyl butoxide Drugs 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- XPGAWFIWCWKDDL-UHFFFAOYSA-N propan-1-olate;zirconium(4+) Chemical compound [Zr+4].CCC[O-].CCC[O-].CCC[O-].CCC[O-] XPGAWFIWCWKDDL-UHFFFAOYSA-N 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- JKUYRAMKJLMYLO-UHFFFAOYSA-N tert-butyl 3-oxobutanoate Chemical compound CC(=O)CC(=O)OC(C)(C)C JKUYRAMKJLMYLO-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- LGQXXHMEBUOXRP-UHFFFAOYSA-N tributyl borate Chemical compound CCCCOB(OCCCC)OCCCC LGQXXHMEBUOXRP-UHFFFAOYSA-N 0.000 description 1
- DENFJSAFJTVPJR-UHFFFAOYSA-N triethoxy(ethyl)silane Chemical compound CCO[Si](CC)(OCC)OCC DENFJSAFJTVPJR-UHFFFAOYSA-N 0.000 description 1
- JLVRMXBDWUOWOX-UHFFFAOYSA-N triethoxy(phenylsilyl)silane Chemical compound CCO[Si](OCC)(OCC)[SiH2]C1=CC=CC=C1 JLVRMXBDWUOWOX-UHFFFAOYSA-N 0.000 description 1
- NBXZNTLFQLUFES-UHFFFAOYSA-N triethoxy(propyl)silane Chemical compound CCC[Si](OCC)(OCC)OCC NBXZNTLFQLUFES-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- JLGNHOJUQFHYEZ-UHFFFAOYSA-N trimethoxy(3,3,3-trifluoropropyl)silane Chemical compound CO[Si](OC)(OC)CCC(F)(F)F JLGNHOJUQFHYEZ-UHFFFAOYSA-N 0.000 description 1
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Paints Or Removers (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、コーティング用組成物およびその製遣方法に
関す、る。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a coating composition and a method for producing the same.
(従来の技術〕
近年、厚膜化および重ね塗りが可能で、密着性、耐水性
、耐蝕性、耐絶縁性、耐摩耗性、耐熱性、耐湿性、耐候
性、耐熱性、耐有機薬品性、耐酸性、耐アルカリ性など
に優れ、硬度の高い塗膜を形成させることのできるコー
ティング用組成物が求められている。(Conventional technology) In recent years, it has become possible to thicken the film and recoat it, and it has improved adhesion, water resistance, corrosion resistance, insulation resistance, abrasion resistance, heat resistance, moisture resistance, weather resistance, heat resistance, and organic chemical resistance. There is a need for a coating composition that has excellent acid resistance, alkali resistance, etc., and can form a coating film with high hardness.
このような要求の一部を満たすコーティング用組成物と
して、シラノールの部分的締金物にコロイド状シリカを
配合した酸性の水性組成物(特公昭’52−39691
号公報)やジルコニウムのアルコキシドなどにアルコキ
シ基を1〜4個有するシリコン化合物を配合した組成物
(特開昭57−100943号公報)が提案されている
。As a coating composition that partially satisfies these requirements, an acidic aqueous composition containing colloidal silica in a partial clamp of silanol (Japanese Patent Publication No. 52-39691) has been proposed.
A composition in which a silicon compound having 1 to 4 alkoxy groups is blended with zirconium alkoxide (Japanese Patent Application Laid-Open No. 100943/1983) has been proposed.
しかしながら、前記特公昭52−39691号公報に記
載されたコーティング用組成物は、一般的に耐アルカリ
性、保存安定性、密着性に劣り、膜厚が20μm前後の
薄膜ではピンホールが生じ、調合してからち使用が可能
となるまでの熟成時間がかかり、塗装条件が狭く、作業
性が悪く、プラスチックなどに対する濡れ性が悪く、さ
らに重ね塗りも困難である、などの問題点を有している
。However, the coating composition described in Japanese Patent Publication No. 52-39691 is generally inferior in alkali resistance, storage stability, and adhesion, and pinholes occur in thin films with a thickness of about 20 μm, making it difficult to formulate. It takes a long time to mature before it can be used again, has narrow coating conditions, is difficult to work with, has poor wettability with plastics, and is difficult to recoat. .
また、前記特開昭57−100943号公報に記載され
たコーティング用組成物は、厚膜化が達成されず、また
組成物の保存安定性に劣り、沈澱が生成しやすく、均一
なコーティング用組成物の調製が困難であるという問題
を有している。Furthermore, the coating composition described in JP-A No. 57-100943 does not achieve a thick film, has poor storage stability, tends to form precipitates, and does not provide a uniform coating composition. The problem is that it is difficult to prepare the product.
本発明は、前記従来の技術的課題を背景になされたもの
で、組成物の保存安定性が良好であり、厚膜化および重
ね塗りが可能で、密着性、耐蝕性、耐絶縁性、耐摩耗性
、耐熱性、耐湿性、耐候性、耐燃性、耐水性、耐有機薬
品性、耐酸性などに優れ、特に耐アルカリ性に優れた硬
度の高い塗膜を形成させることができるコーティング用
組成物およびその製造方法を提供することを目的とする
。The present invention has been made against the background of the above-mentioned conventional technical problems, and the composition has good storage stability, can be made into a thick film and can be coated in multiple layers, and has good adhesion, corrosion resistance, insulation resistance, and resistance. A coating composition that can form a hard coating film with excellent abrasion resistance, heat resistance, moisture resistance, weather resistance, flame resistance, water resistance, organic chemical resistance, acid resistance, etc., and especially alkali resistance. The purpose is to provide a method for producing the same.
C問題点を解決するための手段〕
すなわち、本発明は、
(a)一般式Z r (OR) aまたはZr (OR
)a ・Rot((式中、Rは炭素数2〜5のアルキ
ル基を示す)で表されるジルコニウム化合物1モルに対
し、(bl一般式R’ COCHz COR” (式
中、RIは炭素数1〜5のアルキル基、R2は炭素数1
〜5のアルキル基または炭素数1〜5のアルコキシ基を
示す)で表されるβ−ジケトン類またはβ−ケトエステ
ル類(以下、単に「β−ジケトン類またはβ−ケトエス
テル類」という)0.8〜3モル、(c)一般式R3S
i (OR’)z (式中、Rコは炭素数1〜8の
有機基、R4は炭素数1〜5のアルキル基または炭素数
1〜5のアシル基を示す)で表されるオルガノシラン3
〜80モル、および(dl水(0,8+x)”” (3
+3X)モル(ここで、Xは前記(c)オルガノシラン
使用モル数を示す)を混合することを特徴とするコーテ
ィング用組成物を提供するものである。Means for Solving Problem C] That is, the present invention provides (a) general formula Z r (OR) a or Zr (OR
) a ・Rot ((In the formula, R represents an alkyl group having 2 to 5 carbon atoms) 1-5 alkyl group, R2 has 1 carbon number
~5 alkyl group or C1-5 alkoxy group) (hereinafter simply referred to as "β-diketones or β-ketoesters") 0.8 ~3 mol, (c) general formula R3S
i (OR')z (wherein R represents an organic group having 1 to 8 carbon atoms, R4 represents an alkyl group having 1 to 5 carbon atoms or an acyl group having 1 to 5 carbon atoms) 3
~80 mol, and (dl water (0,8+x)"" (3
+3X) moles (where X indicates the number of moles of the organosilane (c) used).
まず、本発明の組成物を構成用性別に詳述する。First, the composition of the present invention will be explained in detail in terms of its composition.
(a)ジルコニウム化合物
一般式Zr(OR)nまたはZr (OR)4 ・R
OHで表されるジルコニウム化合物は、水との反応によ
り加水分解し、部分加水分解物となり、また該加水分解
物が重縮合して部分的締金物を生じ、(clオルガノシ
ランの加水分解および重縮合を促進する作用をなすとと
もに、得られる塗膜の硬度、耐アルカリ性を向上させる
作用をなすものである。(a) Zirconium compound general formula Zr(OR)n or Zr(OR)4 ・R
The zirconium compound represented by OH is hydrolyzed by reaction with water to form a partial hydrolyzate, and the hydrolyzate is polycondensed to form a partial clamp. It has the effect of promoting condensation and also has the effect of improving the hardness and alkali resistance of the resulting coating film.
かかるジルコニウム化合物中のRは、炭素数2〜5のア
ルキル基、具体的にはエチル基、n−プロピル基、i−
プロピル基、n−ブチル基、5ec−7”チルM、t−
7’チル基、n−ペンチル基、i−ペンチル基などであ
る。R in such a zirconium compound is an alkyl group having 2 to 5 carbon atoms, specifically an ethyl group, an n-propyl group, an i-
Propyl group, n-butyl group, 5ec-7”thyl M, t-
These include a 7'tyl group, an n-pentyl group, an i-pentyl group, and the like.
これらのジルコニウム化合物の具体例としては、ジルコ
ニウムテトラエトキシド、ジルコニウムテトラ−n−プ
ロポキシド、ジルコニウムテトラ−1−プロポキシド、
ジルコニウムテトラ−n−ブトキシド、ジルコニウムテ
トラ−5ec−ブトキシド、ジルコニウムテトラ−t−
ブトキシド、ジルコニウムテトラ−n−ベントキシド、
ジルコニウムテトラ−1−ベントキシドなどを挙げるこ
とができる。Specific examples of these zirconium compounds include zirconium tetraethoxide, zirconium tetra-n-propoxide, zirconium tetra-1-propoxide,
Zirconium tetra-n-butoxide, zirconium tetra-5ec-butoxide, zirconium tetra-t-
butoxide, zirconium tetra-n-bentoxide,
Examples include zirconium tetra-1-bentoxide.
これらの(al成分のうち、特にジルコニウムテトシー
n−ブトキシドが好ましい。Among these (al components), zirconium tetocy n-butoxide is particularly preferred.
また、(a)成分は、1種単独でまたは2種以上を混合
して使用することもできる。Further, component (a) can be used alone or in combination of two or more.
(blβ−ジケトン類またはβ−ケトエステル類一般式
R’ C0CHz C0R2で表されるβ−ジケトン
類またはβ−ケトエステル類は、(a)ジルコニウム化
合物と錯体を形成し、該ジルコニウム化合物の加水分解
および重縮合を抑制し、沈澱の生成を防ぐ作用をなすも
のと考えられる。(blβ-diketones or β-ketoesters β-diketones or β-ketoesters represented by the general formula R' C0CHz C0R2 form a complex with (a) a zirconium compound, and are capable of hydrolysis and polymerization of the zirconium compound. It is thought that it acts to suppress condensation and prevent the formation of precipitates.
この一般式中、R1は炭素数1〜5のアルキル基、例え
ばメチル基、エチル基、n−プロピル基、1−プロピル
基、n−ブチル基、5ec−ブチル基、t−ブチル基、
n−ペンチル基などであり、R2は前記と同様の炭素数
1〜5のアルキル基のほか、炭素数1〜5のアルコキシ
基、好ましくは炭素数1〜4のアルコキシ基、例えばメ
トキシ基、エトキシ基、n−プロポキシ基、i−プロポ
キシ基、n−ブトキシ基、5ec−ブトキシ基、を−ブ
トキシ基などである。In this general formula, R1 is an alkyl group having 1 to 5 carbon atoms, such as a methyl group, ethyl group, n-propyl group, 1-propyl group, n-butyl group, 5ec-butyl group, t-butyl group,
n-pentyl group, etc., and R2 is not only the same alkyl group having 1 to 5 carbon atoms as described above, but also an alkoxy group having 1 to 5 carbon atoms, preferably an alkoxy group having 1 to 4 carbon atoms, such as a methoxy group, an ethoxy group. group, n-propoxy group, i-propoxy group, n-butoxy group, 5ec-butoxy group, -butoxy group, etc.
このβ−ジケトン類またはβ−ケトエステル類の具体例
としては、アセチルアセトン、アセト酢酸メチル、アセ
ト酢酸エチル、アセト酢酸−n−プロピル、アセト酢酸
−1−プロピル、アセト酢酸−n−ブチル、アセト酢酸
−5ec−ブチル、アセト酢酸−t−ブチル、2.4−
ヘキサン−ジオン、2.4−ヘプタン−ジオン、3.5
−へブタン−ジオン、2,4−オクタン−ジオン、2゜
4−ノナン−ジオン、5−メチル−へキサン−ジオンな
どを挙げることができる。Specific examples of the β-diketones or β-ketoesters include acetylacetone, methyl acetoacetate, ethyl acetoacetate, n-propyl acetoacetate, 1-propyl acetoacetate, n-butyl acetoacetate, and n-butyl acetoacetate. 5ec-butyl, t-butyl acetoacetate, 2.4-
Hexane-dione, 2.4-heptane-dione, 3.5
Examples include -hebutane-dione, 2,4-octane-dione, 2°4-nonane-dione, and 5-methyl-hexane-dione.
これらの(b)成分のうち、特にアセト酢酸エチルおよ
びアセチルアセトンが好ましい。Among these components (b), ethyl acetoacetate and acetylacetone are particularly preferred.
(b)成分は、1種単独でまたは2種以上を混合して使
用することもできる。Component (b) can be used alone or in combination of two or more.
かかるtb+成分は、前記(a)成分1モルに対して0
.8〜3モル、好ましくは1〜2モル、特に好ましくは
1〜1.5モルの割合で使用され、0.8モル未満では
(a)成分の加水分解が早すぎて沈澱を生じる場合があ
り、一方3モルを超えると(a)成分の加水分解速度が
遅くなるため造膜性が悪く、さらに耐アルカリ性が悪化
しいずれも好ましくない。The amount of such tb+ component is 0 per mole of component (a).
.. It is used in a proportion of 8 to 3 mol, preferably 1 to 2 mol, particularly preferably 1 to 1.5 mol; if it is less than 0.8 mol, the hydrolysis of component (a) may be too rapid and precipitation may occur. On the other hand, if the amount exceeds 3 moles, the rate of hydrolysis of component (a) becomes slow, resulting in poor film-forming properties and further deterioration in alkali resistance, both of which are unfavorable.
(c)オルガノシラン
オルガノシランは、一般式R3S i (OR’ )
sで表され、水の存在により加水分解および重縮合を行
いオルガノポリシロキサンを生成するものである。(c) Organosilane Organosilane has the general formula R3S i (OR')
It is represented by s and undergoes hydrolysis and polycondensation in the presence of water to produce organopolysiloxane.
かかるオルガノシラン中のR3は、炭素数1〜8の有機
基であり、例えばメチル基、エチル基、n−プロピル基
、i−プロピル基などのアルキル基、そのほかγ−クロ
ロプロピル基、ビニル基、3.3.3−トリフロロプロ
ピル基、γ−グリシドキシプロビル基、T−メタクリル
オキシプロピルTE、r−メルカプトプロピル基、フェ
ニル基、3.4−エポキシシクロヘキシルエチル基など
が挙げられる。R3 in the organosilane is an organic group having 1 to 8 carbon atoms, such as an alkyl group such as a methyl group, an ethyl group, an n-propyl group, an i-propyl group, and a γ-chloropropyl group, a vinyl group, Examples include 3.3.3-trifluoropropyl group, γ-glycidoxypropyl group, T-methacryloxypropyl TE, r-mercaptopropyl group, phenyl group, and 3.4-epoxycyclohexylethyl group.
また、オルガノシラン中のR4は、前記と同様の炭素数
1〜5のアルキル基のほか、炭素数1〜5のアシル基、
好ましくは炭素数1〜4のアシル基であり、例えばメチ
ル基、エチル基、n−プロピル基、i−プロピル基、n
−ブチル基、5ec−ブチル基、t−ブチル基、アセチ
ル基などが挙げられる。In addition, R4 in the organosilane is not only an alkyl group having 1 to 5 carbon atoms as described above, but also an acyl group having 1 to 5 carbon atoms,
Preferred are acyl groups having 1 to 4 carbon atoms, such as methyl, ethyl, n-propyl, i-propyl, n
-butyl group, 5ec-butyl group, t-butyl group, acetyl group, etc.
これらのオルガノシランの具体例としては、メチルトリ
メトキシシラン、メチルトリエトキシシラン、エチルト
リメトキシシラン、エチルトリエトキシシラン、n−プ
ロピルトリメトキシシラン、n−プロピルトリエトキシ
シラン、i−プロピルトリメトキシシラン、i−プロピ
ルトリエトキシシラン、T−クロロプロピルトリメトキ
シシラン、T−クロロプロピルトリエトキシシラン、ア
リールトリメトキシシラン、ビニルトリメトキシシラン
、ビニルトリエトキシシラン、3,3.3−トリフロロ
プロピルトリメトキシシラン、3,3゜3−トリフロロ
プロピルトリエトキシシラン、T−グリシドキシプロピ
ルトリメトキシシラン、γ−グリシドキシプロビルトリ
エトキシシラン、T−メタクリルオキシプロピルトリメ
トキシシラン、T−メタクリルオキシプロピルトリエト
キシシラン、T−メルカプトプロピルトリメトキシシラ
ン、γ−メルカプトプロピルトリエトキシシラン、フェ
ニルトリメトキシシラン、フェニルトリエトキジシラン
、3.4−エポキシシクロヘキシルエチルトリメトキシ
シラン、3,4−エポキシシクロヘキシルエチルトリエ
トキシシランなどを挙げることができるが、好ましくは
メチルトリメトキシシラン、メチルトリエトキシシラン
、フェニルトリメトキシシランである。Specific examples of these organosilanes include methyltrimethoxysilane, methyltriethoxysilane, ethyltrimethoxysilane, ethyltriethoxysilane, n-propyltrimethoxysilane, n-propyltriethoxysilane, and i-propyltrimethoxysilane. , i-propyltriethoxysilane, T-chloropropyltrimethoxysilane, T-chloropropyltriethoxysilane, aryltrimethoxysilane, vinyltrimethoxysilane, vinyltriethoxysilane, 3,3.3-trifluoropropyltrimethoxy Silane, 3,3゜3-trifluoropropyltriethoxysilane, T-glycidoxypropyltrimethoxysilane, γ-glycidoxypropyltriethoxysilane, T-methacryloxypropyltrimethoxysilane, T-methacryloxypropyl Triethoxysilane, T-mercaptopropyltrimethoxysilane, γ-mercaptopropyltriethoxysilane, phenyltrimethoxysilane, phenyltriethoxydisilane, 3,4-epoxycyclohexylethyltrimethoxysilane, 3,4-epoxycyclohexylethyltriethoxy Examples include silane, preferably methyltrimethoxysilane, methyltriethoxysilane, and phenyltrimethoxysilane.
これらのオルガノシランは、1種単独で使用することも
または2種以上を併用することもできる。These organosilanes can be used alone or in combination of two or more.
(cI酸成分、前記(a)成分1モルに対して3〜80
モル、好ましくは5〜50モル、特に好ましくは10〜
40モルの割合で使用され、3モル未満ではゲルを生成
する場合があり、また硬化塗膜にクラックが発生しやす
くなり、一方80モルを超えると得られる硬化塗膜の耐
アルカリ性が低下し好ましくない。(cI acid component, 3 to 80% per mole of component (a) above
mol, preferably 5 to 50 mol, particularly preferably 10 to 50 mol
It is used in a proportion of 40 mol, and if it is less than 3 mol, it may form a gel and the cured coating film will be prone to cracking, while if it exceeds 80 mol, the alkali resistance of the resulting cured coating will decrease, so it is preferable. do not have.
(d+水
水は、(a)成分の加水分解および重縮合を生起し、高
分子量化させるためのものである。(d+Water) Water is for causing hydrolysis and polycondensation of component (a) to increase the molecular weight.
かかる水としては、一般水道水、蒸留水、イオン交換水
などを用いることができる。特に、組成物を高純度にす
る場合には、蒸留水またイオン交換水が好ましく、電気
伝導度が2μS / cm以下のイオン交換水が特に好
ましい。As such water, general tap water, distilled water, ion exchange water, etc. can be used. In particular, when the composition is to be highly purified, distilled water or ion-exchanged water is preferable, and ion-exchanged water with an electrical conductivity of 2 μS/cm or less is particularly preferable.
なお、水は、(al成分の急激な加水分解および重縮合
を防ぐために、親水性有機溶媒と混合し、水を30重量
%以下含む溶液として(a)成分と(bl成分の混合液
に混合することが好ましい。In addition, water is mixed with a hydrophilic organic solvent to prevent rapid hydrolysis and polycondensation of the (al) component, and mixed into a mixed solution of the (a) component and (bl component) as a solution containing 30% by weight or less of water. It is preferable to do so.
(d)成分の使用量は、(a)成分1モルに対して(c
1成分の使用量をXモルとした場合、(0,8+x)〜
(3+3x)モル、好ましくは(1+1.2X)〜(2
+2 x)モルの範囲であり、(0,8+x)モル未満
では加水分解および重縮合が不充分となり、コーティン
グして得られる塗膜の耐アルカリ性が低下し、一方(3
+3 x)モルを超えると急激に反応が進行し、ゲル化
する場合があり好ましくない。The amount of component (d) used is (c) per mole of component (a).
When the usage amount of one component is X moles, (0,8+x) ~
(3+3x) moles, preferably (1+1.2x) to (2
+2x) mole, and if it is less than (0,8+x) mole, hydrolysis and polycondensation will be insufficient, and the alkali resistance of the coating film obtained will decrease;
If the amount exceeds +3 x) moles, the reaction may proceed rapidly and gelation may occur, which is not preferable.
水を加えると反応熱により反応混合液の液温が上昇し、
これにより10)成分の加水分解および重縮合が促進さ
れる。通常は、この反応によって常温で自然の発熱、放
熱が生起するが、重縮合を促進し、さらに高分子量化さ
せるためには、反応系を50〜80℃に加温してもよい
。また、加水分解および重縮合を抑制するためには、反
応系を30〜50℃程度に冷却してもよいし、親水性有
機溶媒をさらに反応系中に添加してもよい。When water is added, the temperature of the reaction mixture increases due to the heat of reaction.
This promotes the hydrolysis and polycondensation of component 10). Usually, natural heat generation and heat radiation occur due to this reaction at room temperature, but in order to promote polycondensation and further increase the molecular weight, the reaction system may be heated to 50 to 80°C. Further, in order to suppress hydrolysis and polycondensation, the reaction system may be cooled to about 30 to 50°C, or a hydrophilic organic solvent may be further added to the reaction system.
また、必要に応じて使用される前記(e)親水性有機溶
媒としては、アルコール類または沸点が120℃以下の
低沸点親水性有機溶剤が好適である。Moreover, as the hydrophilic organic solvent (e) used as necessary, alcohols or low-boiling hydrophilic organic solvents having a boiling point of 120° C. or lower are suitable.
かかるアルコール類としては、例えば1価アルコールま
たはアルコール誘導体を挙げることができる。Examples of such alcohols include monohydric alcohols and alcohol derivatives.
これらのアルコール類としては、例えばメタノール、エ
タノール、n−プロピルアルコール、i−プロピルアル
コール、n−ブチルアルコール、i−ブチルアルコール
、5eC−ブチルアルコール、t−ブチルアルコール、
n−ペンチルアルコール、エチレングリコールモノブチ
ルエーテル、酢酸エチレングリコールモノエチルエーテ
ルなどを挙げることができる。Examples of these alcohols include methanol, ethanol, n-propyl alcohol, i-propyl alcohol, n-butyl alcohol, i-butyl alcohol, 5eC-butyl alcohol, t-butyl alcohol,
Examples include n-pentyl alcohol, ethylene glycol monobutyl ether, and acetic acid ethylene glycol monoethyl ether.
また、沸点が120℃以下の低沸点親水性有機溶剤とし
ては、例えばアセトン、メチルエチルケトン、テトラヒ
ドロフランなどを挙げることができる。Examples of the low-boiling hydrophilic organic solvent having a boiling point of 120° C. or lower include acetone, methyl ethyl ketone, and tetrahydrofuran.
これらの親水性有機溶媒のうち、好ましくは五−プロピ
ルアルコール、5ec−ブチルアルコール、n−プロピ
ルアルコール、n−ブチルアルコール、酢酸エチレング
リコールモノエチルエーテル、メチルエチルケトンであ
り、特に好ましくはi−プロピルアルコール、メチルエ
チルケトンおよび酢酸エチレングリコールモノエチルエ
ーテルである。これらの親水性有機溶媒は、1種単独で
または2種以上を混合して使用することもできる。Among these hydrophilic organic solvents, preferred are 5-propyl alcohol, 5ec-butyl alcohol, n-propyl alcohol, n-butyl alcohol, acetic acid ethylene glycol monoethyl ether, and methyl ethyl ketone, particularly preferred are i-propyl alcohol, Methyl ethyl ketone and acetic acid ethylene glycol monoethyl ether. These hydrophilic organic solvents can be used alone or in combination of two or more.
なお、本発明においては、得られるコーティング用組成
物の透明性を維持しながら硬度を増加させるために、さ
らに(e)親水性有機溶媒に分散した金属酸化物コロイ
ドを添加してもよい。In the present invention, in order to increase the hardness of the resulting coating composition while maintaining its transparency, (e) a metal oxide colloid dispersed in a hydrophilic organic solvent may be added.
この(e)成分としては、親水性有機溶媒に分散された
コロイド状シリカが好適である。As this component (e), colloidal silica dispersed in a hydrophilic organic solvent is suitable.
この親水性有機溶媒に分散されたコロイド状シリカは、
得られる塗膜の硬度を増加させるのみならず、本発明に
よって得られる組成物の固形分を増すために使用される
もので、該成分の量によって得られる塗膜の厚さを制御
することができる。Colloidal silica dispersed in this hydrophilic organic solvent is
It is used not only to increase the hardness of the resulting coating film, but also to increase the solids content of the composition obtained by the present invention, and the thickness of the resulting coating film can be controlled by the amount of this component. can.
この親水性有機溶媒を分散媒とするコロイド状シリカと
は、高純度の無水ケイ酸を前記親水性有機溶媒に分散し
た分散液であり、通常、平均粒径が5〜30mμ、好ま
しくは10〜20mμ、固形分濃度が10〜40重量%
程度のものである。Colloidal silica using a hydrophilic organic solvent as a dispersion medium is a dispersion of high-purity silicic anhydride dispersed in the hydrophilic organic solvent, and usually has an average particle size of 5 to 30 mμ, preferably 10 to 30 mμ. 20 mμ, solid concentration 10-40% by weight
It is of a certain degree.
このような、親水性有機溶媒に分散されたコロイド状シ
リカとしては、例えば日崖化学工業■製、メタノールシ
リカゾルおよびイソプロパツールシリカゾル;触媒化成
工業側製、オスカルなどが市販されている。As such colloidal silica dispersed in a hydrophilic organic solvent, commercially available products include, for example, methanol silica sol and isopropatol silica sol manufactured by Nigaga Chemical Industry Co., Ltd., and Oscar manufactured by Catalysts and Chemicals Industry Co., Ltd.
この(e)成分の組成物におけφ割合は、本発明の組成
物の固形分100重量部に対して、固形分換算で好まし
くは5〜200重量部、特に好ましくは10〜100重
景部であり、5重量部未満では硬度の向上が不充分であ
り、一方200重量部を超えると塗膜となした場合にク
ラックが発生しやすくなる。The ratio of φ in the composition of component (e) is preferably 5 to 200 parts by weight, particularly preferably 10 to 100 parts by weight in terms of solid content, based on 100 parts by weight of solid content of the composition of the present invention. If it is less than 5 parts by weight, the improvement in hardness is insufficient, while if it exceeds 200 parts by weight, cracks are likely to occur when formed into a coating film.
なお、本発明においては、得られる組成物中にコーテイ
ング後の塗膜の硬化を促進させるために、さらに各種の
酸を組成物中に別途添加することも可能である。In the present invention, it is also possible to separately add various acids to the resulting composition in order to accelerate the curing of the coating film after coating.
かかる酸としては、例えば硝酸、塩酸などの無機酸、ま
たは酢酸、蟻酸、プロピオン酸、マレイン酸、クロロ酢
酸、クエン酸、安息香酸、ジメチルマロン酸、グルタル
酸、グリコール酸、マロン酸、トルエンスルホン酸、シ
ュウ酸などの有機酸を挙げることができるが、特に酢酸
が好ましい。Such acids include, for example, inorganic acids such as nitric acid, hydrochloric acid, or acetic acid, formic acid, propionic acid, maleic acid, chloroacetic acid, citric acid, benzoic acid, dimethylmalonic acid, glutaric acid, glycolic acid, malonic acid, toluenesulfonic acid. , oxalic acid and other organic acids, with acetic acid being particularly preferred.
さらに、本発明の組成物には、各種界面活性剤、シラン
カップリング剤、またナフテン酸、オクチル酸、亜硝酸
、亜硫酸、アルミン酸、炭酸などのアルカリ金属塩、塗
料、無機顔料、有機顔料などの添加剤を添加することも
できる。Furthermore, the composition of the present invention contains various surfactants, silane coupling agents, alkali metal salts such as naphthenic acid, octylic acid, nitrous acid, sulfurous acid, aluminic acid, carbonic acid, paints, inorganic pigments, organic pigments, etc. It is also possible to add additives.
なお、本発明の組成物に有機重合体を加えると耐候性、
耐熱性などが低下し、好ましくない。Note that adding an organic polymer to the composition of the present invention improves weather resistance,
Heat resistance etc. deteriorate, which is not preferable.
以上のような(al〜Fdl成分を含有する本発明の組
成物は、好ましくは
(イ)(a)一般式Z r (OR) 4またはZr
(OR) 4 ・ROH(式中、Rは炭素数2〜5のア
ルキル基を示す)で表されるジルコニウム化合物1モル
に対し、
(b)一般式R’ COCH2COR” (式中、R
1は炭素数1〜5のアルキル基、RZは炭素数1〜5の
アルキル基または炭素数1〜5のアルコキシ基を示す)
で表されるβ−ジケトン類またはβ−ケトエステル[0
,8〜3モルを加えた混合液に、(ロ)(d)水0.8
〜3モルを加え、次いで(ハ)(c)一般式R’ Si
(OR’ )3 (式中、R3は炭素数1〜8の
有機基、R4は炭素数1〜5のアルキル基または炭素数
1〜5のアシル基を示す)で表されるオルガノシラン3
〜80モルを加え、さらに
(ニ)(d)水を前記(clオルガノシランに対し、1
〜3倍モル加えることにより製造することができる。The composition of the present invention containing the components (al to Fdl) as described above preferably has (a) (a) general formula Z r (OR) 4 or Zr
(OR) 4 ・ROH (in the formula, R represents an alkyl group having 2 to 5 carbon atoms), (b) general formula R'COCH2COR" (in the formula, R
1 represents an alkyl group having 1 to 5 carbon atoms, RZ represents an alkyl group having 1 to 5 carbon atoms or an alkoxy group having 1 to 5 carbon atoms)
β-diketones or β-ketoesters [0
, 8 to 3 moles of (b) (d) water 0.8
~3 mol is added, then (c) (c) general formula R' Si
(OR')3 (In the formula, R3 is an organic group having 1 to 8 carbon atoms, and R4 is an alkyl group having 1 to 5 carbon atoms or an acyl group having 1 to 5 carbon atoms.)
~80 mol was added, and (d) water was added to 1
It can be produced by adding ~3 times the mole.
ここで(イ)工程では、前記(a)成分と(b)成分と
を混合し、混合液を作製するが、この場合、(al成分
と(bl成分とを混合したのち、常温で15分以上経過
させることが好ましい。(al成分と(b)成分を混合
したのち、後記(ロ)工程で(d)成分を添加するまで
の時間が15分未満であると、水分を添加したときに沈
澱が生じる場合がある。Here, in step (a), the above (a) component and (b) component are mixed to prepare a mixed solution. In this case, after mixing the (al component and (bl component), (If the time from mixing the al component and the component (b) to the addition of the component (d) in the step (b) described below is less than 15 minutes, when water is added, Precipitation may occur.
次いで(ロ)工程では、前記(イ)工程で得られた混合
液に水を加えて加水分解および重縮合するものである。Next, in step (b), water is added to the liquid mixture obtained in step (a) to perform hydrolysis and polycondensation.
ここで使用する?d+成分の割合は、前記(a+成分1
モルに対して0.8〜3モル、好ましくは1〜2モルの
割合で使用され、0.8モル未満では(a)成分の加水
分解および重縮合が不充分であり、一方3モルを超える
と(a)成分の加水分解および重縮合が進みすぎる。Use it here? The ratio of the d+ component is as described above (a+ component 1
It is used at a ratio of 0.8 to 3 mol, preferably 1 to 2 mol, with less than 0.8 mol resulting in insufficient hydrolysis and polycondensation of component (a), while more than 3 mol The hydrolysis and polycondensation of component (a) proceed too much.
なお、(ロ)工程では、(d)成分を添加したのち、常
温で15分以上攪拌することが好ましい。In addition, in step (b), it is preferable to stir at room temperature for 15 minutes or more after adding the component (d).
この攪拌時間が15分未満であると、後記(ニ)工程で
ゲルが生成する場合がある。If this stirring time is less than 15 minutes, a gel may be formed in step (d) described later.
次いで(ハ)工程では、前記(ロ)工程における反応生
成物と、(c1成分とを混合し、さらに反応させる工程
であるが、この場合も、(c1成分添加後、常温で15
分以上攪拌することが好ましい。Next, in the step (c), the reaction product in the step (b) is mixed with the (c1 component) and further reacted.
It is preferable to stir for at least 1 minute.
この攪拌時間が15分未満であると、後記(ニ)工程で
ゲルが生成する場合がある。If this stirring time is less than 15 minutes, a gel may be formed in step (d) described later.
次いで(ニ)工程では、さらに(d)成分を添加し、前
記(a)成分および(c)成分、特に(c1成分の加水
分解ならびに重縮合を生起させる。Next, in step (d), component (d) is further added to cause hydrolysis and polycondensation of component (a) and component (c), particularly component (c1).
ここで使用する(d)成分の割合は、(c)成分に対し
て1〜3倍モル、好ましくは1.2〜2倍モルの範囲で
あり、1倍モル未満では加水分解および重縮合が不充分
となり、コーティングして得られる塗膜の耐アルカリ性
が低下し、一方3倍モルを超えると急激に反応が進行し
、ゲル化する場合がある。The ratio of component (d) used here is 1 to 3 times the mole of component (c), preferably 1.2 to 2 times the mole, and if it is less than 1 time mole, hydrolysis and polycondensation may occur. If the amount is insufficient, the alkali resistance of the resulting coating film will decrease, while if the amount exceeds 3 times the mole, the reaction will proceed rapidly and gelation may occur.
なお、本発明の組成物の製造方法において、前記(e)
成分を配合するに際しては、本発明によって得られた組
成物に単に添加してもよいが、耐アルカリ性が低下する
場合があるので、前記(ハ)工程の後で(e)成分を添
加し、室温で15分以上混合することが好ましい。In addition, in the method for producing the composition of the present invention, the above (e)
When blending the components, they may be simply added to the composition obtained by the present invention, but since this may reduce the alkali resistance, component (e) is added after the step (c), Preferably, the mixture is mixed at room temperature for 15 minutes or more.
本発明によって得られる組成物は、必要に応じて前記親
水性有機溶媒によって固形分濃度を10〜40重量%程
度に調整し、コーティング用として使用される。The composition obtained by the present invention is used as a coating after adjusting the solid content concentration to about 10 to 40% by weight using the hydrophilic organic solvent as required.
このようにして調製された組成物は、刷毛、スプレー、
ディッピングなどの塗装手段により、ステンレス、アル
ミニウム、セメント、ガラス、プラスチック、コンクリ
ート、紙、有機塗膜、無機塗膜などの基材に、1回塗り
で厚さ1〜15μm程度の塗膜を形成することができ、
これを直ちにまたは自然乾燥後、例えば80〜300℃
程度の温度で10〜60分程度加熱することにより硬化
する。さらに、該塗膜上に重ね塗りすることもできる。The composition thus prepared can be applied by brush, spray,
Forms a coating film approximately 1 to 15 μm thick in one coat on substrates such as stainless steel, aluminum, cement, glass, plastic, concrete, paper, organic coatings, and inorganic coatings using coating methods such as dipping. It is possible,
Immediately or after natural drying, for example at 80 to 300°C.
It is cured by heating at a moderate temperature for about 10 to 60 minutes. Furthermore, it is also possible to overcoat the coating film.
以下、実施例を挙げ本発明をさらに具体的に説明するが
、以下の実施例に限定されるものではない。なお、実施
例中、部および%は、特に断らない限り重量基準である
。EXAMPLES Hereinafter, the present invention will be explained in more detail with reference to Examples, but it is not limited to the following Examples. In the examples, parts and percentages are based on weight unless otherwise specified.
また、実施例中における各種の測定方法は、下記のとお
りである。Moreover, various measurement methods in Examples are as follows.
コーティング用組成物の保存安定性は、常温で3ケ月間
放置後、組成物の状態を観察した。The storage stability of the coating composition was determined by observing the state of the composition after it was left at room temperature for 3 months.
塗膜外観は、目視および実体顕微鏡(倍率100倍)に
より観察した。The appearance of the coating film was observed visually and using a stereomicroscope (100x magnification).
硬度は、JIS K5400による鉛筆硬度に拠った
。The hardness was based on the pencil hardness according to JIS K5400.
密着性は、JIS K5400による1鶴角基盤目テ
スト後、セロテープ剥離テストに拠った。Adhesion was determined by a cellophane tape peel test after a 1-tsurukaku base test according to JIS K5400.
耐熱性は、電気炉で400℃×100時間保持し、自然
放冷し、塗膜の状態を観察した。Heat resistance was determined by holding the sample at 400°C for 100 hours in an electric furnace, allowing it to cool naturally, and observing the state of the coating film.
耐酸性■は、濃度5%の塩酸を塗膜上に1m1滴下し、
蓋付きシャーレ中で1日静置後、水洗し、塗膜の状態を
観察した。For acid resistance ■, drop 1 ml of hydrochloric acid with a concentration of 5% onto the paint film.
After standing in a petri dish with a lid for one day, it was washed with water and the state of the coating film was observed.
耐酸性■は、濃度5%の硫酸を塗膜上に1 m 1滴下
し、蓋付きシャーレ中で1日静置後、水洗し、塗膜の状
態を観察した。For acid resistance (1), sulfuric acid with a concentration of 5% was dropped onto the coating film in an area of 1 m 1, and after being allowed to stand for one day in a petri dish with a lid, the coating was washed with water and the condition of the coating film was observed.
耐アルカリ性■は、濃度1%の水酸化ナトリウム水溶液
を塗膜上に1mJ滴下し、蓋付きシャーレ中で1日静置
後、水洗して塗膜の状態を観察した。Alkali resistance (2) was determined by dropping 1 mJ of a 1% sodium hydroxide aqueous solution onto the coating film, leaving it in a petri dish with a lid for one day, washing with water, and observing the condition of the coating film.
耐アルカリ性■は、濃度lO%の水酸化ナトリウム水溶
液を塗膜上に1m1滴下し、蓋付きシャーレ中で1日静
置後、水洗して塗膜の状態を観察した。For alkali resistance (1), 1 ml of an aqueous solution of sodium hydroxide having a concentration of 10% was dropped onto the coating film, and after being allowed to stand for one day in a petri dish with a lid, the coating film was washed with water and the condition of the coating film was observed.
耐水性は、蓋付きシャーレに水道水を入れ、この中にコ
ーティングした基板を60日間漬けたのち、塗膜の状態
を観察した。Water resistance was determined by placing tap water in a petri dish with a lid, soaking the coated substrate in the water for 60 days, and then observing the state of the coating film.
耐有機薬品性は、シャーレにトルエンを入れ、この中に
コーティングした基板を常温f:60日間浸漬したのち
、塗膜の状態を観察した。To determine the organic chemical resistance, toluene was placed in a Petri dish, and the coated substrate was immersed therein at room temperature f for 60 days, and then the state of the coating film was observed.
耐湿性は、温度50℃、湿度95%下に連続100日保
持したのち、取り出して塗膜の状態を観察した。Moisture resistance was determined by maintaining the coating at a temperature of 50° C. and a humidity of 95% for 100 consecutive days, then taking it out and observing the state of the coating film.
耐候性は、JIS K5400により、ウェザ−メー
ターで4.000時間照射試験を実施し、塗膜の状態を
観察した。Weather resistance was determined by conducting an irradiation test for 4,000 hours using a weather meter according to JIS K5400, and observing the state of the coating film.
実施例1〜8および比較例1〜7
本発明の効果を調べるために、第1表に示す組成と製造
方法により、組成物A−H(実施例1〜8)を調製した
。Examples 1 to 8 and Comparative Examples 1 to 7 In order to examine the effects of the present invention, compositions A to H (Examples 1 to 8) were prepared using the compositions and manufacturing methods shown in Table 1.
また、本発明の効果を比較するために、組成物I〜0(
比較例1〜7)を、第1表に示す組成および製造方法に
従って、前記組成物A−Hと同様にして調製した。In addition, in order to compare the effects of the present invention, compositions I to 0 (
Comparative Examples 1 to 7) were prepared in the same manner as compositions A to H according to the compositions and manufacturing methods shown in Table 1.
結果を第1表に併せて示す。The results are also shown in Table 1.
試験例1〜10および比較試験例1〜2次に、前記のよ
うにして得られた組成物に、さらに第2表に示す配合剤
を加えて組成物を調製し、次いで寸法が1100X10
0X2のアルミニウム製プレート(JIS H400
0、A2024)に、組成物をそれぞれスプレーし、1
50℃で30分間加熱乾燥した。このようにして得られ
た試験片を用い、各種のテストを行った結果を第2表に
あわせて示す。Test Examples 1 to 10 and Comparative Test Examples 1 to 2 Next, the ingredients shown in Table 2 were further added to the composition obtained as described above to prepare a composition.
0x2 aluminum plate (JIS H400
0, A2024), spray the composition on each,
It was dried by heating at 50° C. for 30 minutes. Using the thus obtained test pieces, various tests were conducted and the results are shown in Table 2.
ただし、メタノールシリカゾルを用いた試験例において
、該シリカゾルは組成物製造時の(ハ)工程の後で添加
し、室温で30分間攪拌することにより混合したもので
ある。However, in the test example using methanol silica sol, the silica sol was added after step (c) in producing the composition and mixed by stirring at room temperature for 30 minutes.
本発明によって得られたコーティング用組成物は、保存
安定性が良好であり、厚膜化および重ね塗りが可能で、
密着性、耐蝕性、耐絶縁性、耐摩耗性、耐熱性、耐湿性
、耐候性、耐燃性、耐水性、耐有機薬品性、耐酸性など
を大幅に改善することができ、特に耐アルカリ性に著し
く優れた硬度の高い塗膜を形成することができるコーテ
ィング用組成物およびその製造方法を提供することがで
きる。The coating composition obtained by the present invention has good storage stability, can be formed into a thick film and can be coated in multiple layers,
Adhesion, corrosion resistance, insulation resistance, abrasion resistance, heat resistance, moisture resistance, weather resistance, flame resistance, water resistance, organic chemical resistance, acid resistance, etc. can be significantly improved, especially alkali resistance. A coating composition capable of forming a coating film with extremely high hardness and a method for producing the same can be provided.
Claims (2)
)_4・ROH(式中、Rは炭素数2〜5のアルキル基
を示す)で表されるジルコニウム化合物1モルに対し、
(b)一般式R^1COCH_2COR^2(式中、R
^1は炭素数1〜5のアルキル基、R^2は炭素数1〜
5のアルキル基または炭素数1〜5のアルコキシ基を示
す)で表されるβ−ジケトン類またはβ−ケトエステル
類0.8〜3モル、 (c)一般式R^3Si(OR^4)_3(式中、R^
3は炭素数1〜8の有機基、R^4は炭素数1〜5のア
ルキル基または炭素数1〜5のアシル基を示す)で表さ
れるオルガノシラン3〜80モル、および(d)水(0
.8+x)〜(3+3x)モル(ここで、xは前記(c
)オルガノシラン使用モル数を示す)を混合することを
特徴とするコーティング用組成物。(1) (a) General formula Zr(OR)_4 or Zr(OR
)_4・ROH (in the formula, R represents an alkyl group having 2 to 5 carbon atoms) per mol of zirconium compound,
(b) General formula R^1COCH_2COR^2 (wherein, R
^1 is an alkyl group having 1 to 5 carbon atoms, and R^2 is an alkyl group having 1 to 5 carbon atoms.
5 alkyl group or alkoxy group having 1 to 5 carbon atoms) 0.8 to 3 mol of β-diketones or β-ketoesters, (c) General formula R^3Si(OR^4)_3 (In the formula, R^
3 represents an organic group having 1 to 8 carbon atoms, R^4 represents an alkyl group having 1 to 5 carbon atoms or an acyl group having 1 to 5 carbon atoms, and 3 to 80 mol of an organosilane, and (d) Water (0
.. 8+x) to (3+3x) moles (where x is the above (c
) A coating composition characterized by mixing organosilane (indicates the number of moles used).
(OR)_4・ROH(式中、Rは炭素数2〜5のアル
キル基を示す)で表されるジルコニウム化合物1モルに
対し、 (b)一般式R^1COCH_2COR^2(式中、R
^1は炭素数1〜5のアルキル基、R^2は炭素数1〜
5のアルキル基または炭素数1〜5のアルコキシ基を示
す)で表されるβ−ジケトン類またはβ−ケトエステル
類0.8〜3モルを加えた混合液に、(ロ)(d)水0
.8〜3モルを加え、次いで(ハ)(c)一般式R^3
Si(OR^4)_3(式中、R^3は炭素数1〜8の
有機基、R^4は炭素数1〜5のアルキル基または炭素
数1〜5のアシル基を示す)で表されるオルガノシラン
3〜80モルを加え、さらに (ニ)(d)水を前記(c)オルガノシランに対し、1
〜3倍モル加えることを特徴とするコーティング用組成
物の製造方法。(2) (a) (a) General formula Zr(OR)_4 or Zr
(b) General formula R^1COCH_2COR^2 (in the formula, R
^1 is an alkyl group having 1 to 5 carbon atoms, and R^2 is an alkyl group having 1 to 5 carbon atoms.
5 alkyl group or alkoxy group having 1 to 5 carbon atoms) to which 0.8 to 3 moles of β-diketones or β-ketoesters are added, and (b) (d) 0 of water is added.
.. Add 8 to 3 mol, then (c) (c) general formula R^3
Si(OR^4)_3 (wherein R^3 is an organic group having 1 to 8 carbon atoms, R^4 is an alkyl group having 1 to 5 carbon atoms or an acyl group having 1 to 5 carbon atoms) Add 3 to 80 mol of organosilane, and further add (d) water to the organosilane (c) in an amount of 1
A method for producing a coating composition, which comprises adding up to 3 times the mole amount.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11584387A JPH0819331B2 (en) | 1987-05-14 | 1987-05-14 | Coating composition and method for producing the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11584387A JPH0819331B2 (en) | 1987-05-14 | 1987-05-14 | Coating composition and method for producing the same |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS63280777A true JPS63280777A (en) | 1988-11-17 |
JPH0819331B2 JPH0819331B2 (en) | 1996-02-28 |
Family
ID=14672502
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11584387A Expired - Lifetime JPH0819331B2 (en) | 1987-05-14 | 1987-05-14 | Coating composition and method for producing the same |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0819331B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007327071A (en) * | 2007-08-23 | 2007-12-20 | Kawasaki Heavy Ind Ltd | Method for producing hydrophilic coating composition |
-
1987
- 1987-05-14 JP JP11584387A patent/JPH0819331B2/en not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007327071A (en) * | 2007-08-23 | 2007-12-20 | Kawasaki Heavy Ind Ltd | Method for producing hydrophilic coating composition |
Also Published As
Publication number | Publication date |
---|---|
JPH0819331B2 (en) | 1996-02-28 |
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