JPS63249843A - Silver halide photographic sensitive material - Google Patents
Silver halide photographic sensitive materialInfo
- Publication number
- JPS63249843A JPS63249843A JP8542687A JP8542687A JPS63249843A JP S63249843 A JPS63249843 A JP S63249843A JP 8542687 A JP8542687 A JP 8542687A JP 8542687 A JP8542687 A JP 8542687A JP S63249843 A JPS63249843 A JP S63249843A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- styrene
- colloidal silica
- silver halide
- gloss
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000463 material Substances 0.000 title claims abstract description 19
- -1 Silver halide Chemical class 0.000 title claims description 22
- 229910052709 silver Inorganic materials 0.000 title claims description 14
- 239000004332 silver Substances 0.000 title claims description 14
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims abstract description 28
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 27
- 229920001577 copolymer Polymers 0.000 claims abstract description 20
- 239000008119 colloidal silica Substances 0.000 claims abstract description 18
- 239000006185 dispersion Substances 0.000 claims abstract description 17
- 150000003440 styrenes Chemical class 0.000 claims abstract description 10
- 150000001735 carboxylic acids Chemical class 0.000 claims abstract description 5
- 239000000084 colloidal system Substances 0.000 claims description 10
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 abstract description 3
- 238000010556 emulsion polymerization method Methods 0.000 abstract description 2
- 239000010410 layer Substances 0.000 description 37
- 150000001875 compounds Chemical class 0.000 description 21
- 108010010803 Gelatin Proteins 0.000 description 13
- 239000008273 gelatin Substances 0.000 description 13
- 229920000159 gelatin Polymers 0.000 description 13
- 235000019322 gelatine Nutrition 0.000 description 13
- 235000011852 gelatine desserts Nutrition 0.000 description 13
- 238000000034 method Methods 0.000 description 13
- 239000000839 emulsion Substances 0.000 description 11
- 239000011241 protective layer Substances 0.000 description 9
- 230000007423 decrease Effects 0.000 description 8
- 239000011230 binding agent Substances 0.000 description 6
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 6
- 230000007774 longterm Effects 0.000 description 6
- 238000012545 processing Methods 0.000 description 5
- 239000004094 surface-active agent Substances 0.000 description 5
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 125000005396 acrylic acid ester group Chemical group 0.000 description 3
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Chemical compound [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 description 3
- 229910001864 baryta Inorganic materials 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000011161 development Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Chemical group OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 3
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- 235000008733 Citrus aurantifolia Nutrition 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 235000011941 Tilia x europaea Nutrition 0.000 description 2
- SJOOOZPMQAWAOP-UHFFFAOYSA-N [Ag].BrCl Chemical compound [Ag].BrCl SJOOOZPMQAWAOP-UHFFFAOYSA-N 0.000 description 2
- ROOXNKNUYICQNP-UHFFFAOYSA-N ammonium persulfate Chemical compound [NH4+].[NH4+].[O-]S(=O)(=O)OOS([O-])(=O)=O ROOXNKNUYICQNP-UHFFFAOYSA-N 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 235000015110 jellies Nutrition 0.000 description 2
- 239000008274 jelly Substances 0.000 description 2
- 239000004816 latex Substances 0.000 description 2
- 229920000126 latex Polymers 0.000 description 2
- 239000004571 lime Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- FCTDKZOUZXYHNA-UHFFFAOYSA-N 1,4-dioxane-2,2-diol Chemical compound OC1(O)COCCO1 FCTDKZOUZXYHNA-UHFFFAOYSA-N 0.000 description 1
- VZSRBBMJRBPUNF-UHFFFAOYSA-N 2-(2,3-dihydro-1H-inden-2-ylamino)-N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]pyrimidine-5-carboxamide Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C(=O)NCCC(N1CC2=C(CC1)NN=N2)=O VZSRBBMJRBPUNF-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- HXLLCROMVONRRO-UHFFFAOYSA-N 2-butoxyethenylbenzene Chemical compound CCCCOC=CC1=CC=CC=C1 HXLLCROMVONRRO-UHFFFAOYSA-N 0.000 description 1
- SBYMUDUGTIKLCR-UHFFFAOYSA-N 2-chloroethenylbenzene Chemical compound ClC=CC1=CC=CC=C1 SBYMUDUGTIKLCR-UHFFFAOYSA-N 0.000 description 1
- XUDBVJCTLZTSDC-UHFFFAOYSA-N 2-ethenylbenzoic acid Chemical compound OC(=O)C1=CC=CC=C1C=C XUDBVJCTLZTSDC-UHFFFAOYSA-N 0.000 description 1
- FZHNODDFDJBMAS-UHFFFAOYSA-N 2-ethoxyethenylbenzene Chemical compound CCOC=CC1=CC=CC=C1 FZHNODDFDJBMAS-UHFFFAOYSA-N 0.000 description 1
- KBKNKFIRGXQLDB-UHFFFAOYSA-N 2-fluoroethenylbenzene Chemical compound FC=CC1=CC=CC=C1 KBKNKFIRGXQLDB-UHFFFAOYSA-N 0.000 description 1
- CTHJQRHPNQEPAB-UHFFFAOYSA-N 2-methoxyethenylbenzene Chemical compound COC=CC1=CC=CC=C1 CTHJQRHPNQEPAB-UHFFFAOYSA-N 0.000 description 1
- PIAOLBVUVDXHHL-UHFFFAOYSA-N 2-nitroethenylbenzene Chemical compound [O-][N+](=O)C=CC1=CC=CC=C1 PIAOLBVUVDXHHL-UHFFFAOYSA-N 0.000 description 1
- UWRZIZXBOLBCON-UHFFFAOYSA-N 2-phenylethenamine Chemical class NC=CC1=CC=CC=C1 UWRZIZXBOLBCON-UHFFFAOYSA-N 0.000 description 1
- IFSSSYDVRQSDSG-UHFFFAOYSA-N 3-ethenylaniline Chemical compound NC1=CC=CC(C=C)=C1 IFSSSYDVRQSDSG-UHFFFAOYSA-N 0.000 description 1
- YNGIFMKMDRDNBQ-UHFFFAOYSA-N 3-ethenylphenol Chemical class OC1=CC=CC(C=C)=C1 YNGIFMKMDRDNBQ-UHFFFAOYSA-N 0.000 description 1
- NTTBCRIVKFSAGU-UHFFFAOYSA-N 4-(2-methoxyethenyl)phenol Chemical compound COC=CC1=CC=C(O)C=C1 NTTBCRIVKFSAGU-UHFFFAOYSA-N 0.000 description 1
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 1
- FUGYGGDSWSUORM-UHFFFAOYSA-N 4-hydroxystyrene Chemical compound OC1=CC=C(C=C)C=C1 FUGYGGDSWSUORM-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- CTKINSOISVBQLD-UHFFFAOYSA-N Glycidol Chemical compound OCC1CO1 CTKINSOISVBQLD-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- 229910021607 Silver chloride Inorganic materials 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 241000270666 Testudines Species 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 150000003973 alkyl amines Chemical class 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- 229940037003 alum Drugs 0.000 description 1
- 235000011126 aluminium potassium sulphate Nutrition 0.000 description 1
- 150000001413 amino acids Chemical class 0.000 description 1
- 150000001414 amino alcohols Chemical class 0.000 description 1
- 239000000908 ammonium hydroxide Substances 0.000 description 1
- 229910001870 ammonium persulfate Inorganic materials 0.000 description 1
- 239000002280 amphoteric surfactant Substances 0.000 description 1
- 239000003945 anionic surfactant Substances 0.000 description 1
- 150000001541 aziridines Chemical class 0.000 description 1
- MPMBRWOOISTHJV-UHFFFAOYSA-N but-1-enylbenzene Chemical compound CCC=CC1=CC=CC=C1 MPMBRWOOISTHJV-UHFFFAOYSA-N 0.000 description 1
- NTXGQCSETZTARF-UHFFFAOYSA-N buta-1,3-diene;prop-2-enenitrile Chemical compound C=CC=C.C=CC#N NTXGQCSETZTARF-UHFFFAOYSA-N 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000003093 cationic surfactant Substances 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- WBYWAXJHAXSJNI-UHFFFAOYSA-N cinnamic acid Chemical class OC(=O)C=CC1=CC=CC=C1 WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000004031 devitrification Methods 0.000 description 1
- 150000002012 dioxanes Chemical class 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 239000002612 dispersion medium Substances 0.000 description 1
- AFOSIXZFDONLBT-UHFFFAOYSA-N divinyl sulfone Chemical compound C=CS(=O)(=O)C=C AFOSIXZFDONLBT-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000001804 emulsifying effect Effects 0.000 description 1
- 125000004185 ester group Chemical group 0.000 description 1
- 238000007765 extrusion coating Methods 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 229910017053 inorganic salt Inorganic materials 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 239000006224 matting agent Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- MPHUYCIKFIKENX-UHFFFAOYSA-N methyl 2-ethenylbenzoate Chemical compound COC(=O)C1=CC=CC=C1C=C MPHUYCIKFIKENX-UHFFFAOYSA-N 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- SDYRIBONPHEWCT-UHFFFAOYSA-N n,n-dimethyl-2-phenylethenamine Chemical compound CN(C)C=CC1=CC=CC=C1 SDYRIBONPHEWCT-UHFFFAOYSA-N 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- 235000011007 phosphoric acid Nutrition 0.000 description 1
- 150000003014 phosphoric acid esters Chemical class 0.000 description 1
- 150000003016 phosphoric acids Chemical group 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920006289 polycarbonate film Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 239000004848 polyfunctional curative Substances 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- GRLPQNLYRHEGIJ-UHFFFAOYSA-J potassium aluminium sulfate Chemical compound [Al+3].[K+].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O GRLPQNLYRHEGIJ-UHFFFAOYSA-J 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 239000001397 quillaja saponaria molina bark Substances 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229930182490 saponin Natural products 0.000 description 1
- 150000007949 saponins Chemical class 0.000 description 1
- ADZWSOLPGZMUMY-UHFFFAOYSA-M silver bromide Chemical compound [Ag]Br ADZWSOLPGZMUMY-UHFFFAOYSA-M 0.000 description 1
- ZUNKMNLKJXRCDM-UHFFFAOYSA-N silver bromoiodide Chemical compound [Ag].IBr ZUNKMNLKJXRCDM-UHFFFAOYSA-N 0.000 description 1
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 1
- 235000010265 sodium sulphite Nutrition 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- IIACRCGMVDHOTQ-UHFFFAOYSA-N sulfamic acid Chemical class NS(O)(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-N 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 239000011882 ultra-fine particle Substances 0.000 description 1
- 230000002485 urinary effect Effects 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- ZXAUZSQITFJWPS-UHFFFAOYSA-J zirconium(4+);disulfate Chemical compound [Zr+4].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O ZXAUZSQITFJWPS-UHFFFAOYSA-J 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
- G03C1/7614—Cover layers; Backing layers; Base or auxiliary layers characterised by means for lubricating, for rendering anti-abrasive or for preventing adhesion
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
Abstract
Description
【発明の詳細な説明】
(A)産業上の利用分野
本発明はハロゲン化銀写真感光材料に関し、特に表面光
沢の改良された写真用印画紙に関するものである。DETAILED DESCRIPTION OF THE INVENTION (A) Industrial Application Field The present invention relates to a silver halide photographic material, and more particularly to a photographic paper with improved surface gloss.
(B)従来技術及びその間層点
写真用印画紙は、紙、バライタ紙、ポリマーをラミネー
トした紙、不透明層を設けたポリマーフィルム等からな
る不透明支持体上に、少なくとも1層の感光性乳剤層、
表面保護層、及び必要によシ、中間層、フィルタ一層、
下塗層、・クツキング層を有して成る。(B) Prior art and intervening layer point photographic paper has at least one light-sensitive emulsion layer on an opaque support consisting of paper, baryta paper, polymer laminated paper, polymer film provided with an opaque layer, etc. ,
Surface protective layer, and optional intermediate layer, filter layer,
It has an undercoat layer and a shoeing layer.
写真用印画紙は支持体上に形成された写真画像を反射光
で観察する故に、画像の反射濃度の高低によシ、画質の
良否が大きく左右される。Since the photographic image formed on the support of photographic paper is observed using reflected light, the quality of the image is greatly influenced by the reflection density of the image.
写真用印画紙の反射濃度を上げる為の1つの手段として
、従来から、写真用印画紙の表面光沢を上昇せしめる努
力がされて来ている。As one means for increasing the reflection density of photographic paper, efforts have been made to increase the surface gloss of photographic paper.
例えば支持体表面に、バライタ層、ポリマーラミネート
層等を設け、しかる後、その上に感光性乳剤層を塗布す
ることによシ写真用印画紙表面の平滑性を向上せしめる
ことによシ入射光の散乱を防ぎ、表面光沢を上昇せしめ
る方法、又は、現像処理終了後の写真用印画紙表面を鏡
面を持つ、加熱された金属板(いわゆるフェロタイプ)
に接触させて乾燥させることによシ、写真印画紙表面を
鏡面状にする、いわゆるフェロタイプかけによシ表面光
沢を上昇せしめる方法及び両方法の組合せによる方法等
が従来よく知られていた。For example, by providing a baryta layer, a polymer laminate layer, etc. on the surface of the support, and then coating a photosensitive emulsion layer thereon, the smoothness of the surface of the photographic paper can be improved. A heated metal plate (so-called ferrotype) that has a mirror finish on the surface of photographic paper after the development process is completed.
Conventionally, methods of increasing the surface gloss by so-called ferrotyping, in which the surface of photographic paper is made mirror-like by drying it in contact with paper, and a method of combining both methods are well known.
・近年、省エネ型材料として写真用印画紙モ薄物化して
おり、支持体の薄層化に伴い、支持体に塗布され念感光
乳剤履、表面保護層、その他の層において高湿時又は低
湿時のカールの増大を伴う関係上薄層化を必要とされ、
かかる時において保護層の薄層化は表面光沢の減少をも
たらす。・In recent years, photographic paper has become thinner as an energy-saving material, and with the thinning of the support, it is coated on the support, and the photosensitive emulsion layer, surface protection layer, and other layers are coated on the support at high humidity or low humidity. Due to the increase in curls, thinning is required,
At such times, thinning of the protective layer results in a decrease in surface gloss.
更に近年現像処理の迅速化が要求されておシ、そのため
にも塗層の薄層化が必要となシ表面光沢の維持向上はそ
の観点からも極めて重要な課題となっている。Furthermore, in recent years, there has been a demand for faster development processing, and for this reason, it is necessary to make the coating layer thinner, and maintenance and improvement of surface gloss has become an extremely important issue from that point of view as well.
特公昭56−24253ではゼリー強度3001以上を
有する石灰処理ゼラチンを最上層に用いる技術を開示し
ているが最上層を薄くすると、その効果は少なくなシ、
光沢の減少とそれに伴なう濃度の低下によシ写真印画紙
の商品価値の低下につながる。さらに、特願58−11
2491にゼリー強度3002以上でしかもカルシウム
含有量をI Q OOppm以下の脱塩した石灰処理オ
セインゼラチン層を最上層に用いる技術を提案している
が、感光乳剤層、表面保護層の薄層化が進むと光沢の低
下傾向となる。Japanese Patent Publication No. 56-24253 discloses a technique in which lime-treated gelatin having a jelly strength of 3001 or more is used as the top layer, but if the top layer is made thinner, the effect will be less.
The decrease in gloss and the resulting decrease in density lead to a decrease in the commercial value of photographic paper. Furthermore, patent application 58-11
In 2491, a technique is proposed in which a desalted lime-treated ossein gelatin layer with a jelly strength of 3002 or more and a calcium content of IQ OOppm or less is used as the top layer, but it is difficult to thin the light-sensitive emulsion layer and the surface protective layer. As this progresses, the gloss tends to decrease.
一方、特公昭57−10416では最上層中にコロイド
状シリカを含有し、乳剤層中にビニル重合体を含有せし
める技術があるがこれとても光沢の効果は期待できずさ
らに最上層の薄層化と伴に効果は少なくなシ、しかもコ
ロイド状7リカを最上層に入れると写真画像の白地部分
の光沢が下がシ写真印画紙としては好ましくない。On the other hand, in Japanese Patent Publication No. 57-10416, there is a technique in which colloidal silica is contained in the top layer and vinyl polymer is contained in the emulsion layer, but this technique cannot be expected to produce much gloss, and it is necessary to make the top layer thinner. However, the effect is not so great, and furthermore, when colloidal 7-liquid is added to the top layer, the white background of the photographic image becomes less glossy, making it undesirable for photographic paper.
さらに、表面にコロイド状シリカを含有し露出すると、
長期展示等で光、熱に長期間さらされることによシ、印
画紙表面のヒビ割れが発生し易い欠点が出て、商品価値
の低下につながる。Furthermore, when the surface contains and exposes colloidal silica,
Due to long-term exposure to light and heat during long-term exhibitions, the surface of photographic paper tends to crack, leading to a decline in product value.
一方、特開昭50−56931号、同53−46018
号、同58−137831号、同53−46018号、
同54−109831号、同54−76137号等には
写真感光材料に含有する共重合体水系分散物の技術が開
示されている。しかしながらこれらの先行技術に用いら
れている共重合体水系分散物は最外層に用いると減感、
カブリの増加、現像時の失透及び長期展示等で光、熱に
長期間さらされることによシ、印画紙表面のヒビ割れ、
光沢の低下が発生しやすい欠点が出て商品価値の低下に
つながる。On the other hand, JP-A-50-56931 and JP-A-53-46018
No. 58-137831, No. 53-46018,
No. 54-109831, No. 54-76137, etc. disclose techniques for aqueous copolymer dispersions contained in photographic materials. However, when the copolymer aqueous dispersions used in these prior art are used in the outermost layer, they become desensitized and
Increased fogging, devitrification during development, and cracks on the surface of photographic paper due to long-term exposure to light and heat during long-term exhibition, etc.
There are defects that tend to cause a decrease in gloss, leading to a decrease in product value.
(C)発明の目的
本発明の目的は、第1に表面光沢を上昇させ、反射濃度
の高い写真感光材料を提供することにある。第2に長期
間の展示等での画像の劣化がない写真感光材料を提供す
ることにある。(C) Purpose of the Invention The first purpose of the present invention is to provide a photographic material with increased surface gloss and high reflection density. The second objective is to provide a photographic material that does not cause image deterioration during long-term exhibition.
CD)発明の構成
本発明の目的は、支持体上に少なくとも2層以上の親水
性コロイド層を有するハロゲン化銀写真感光材料に於て
、最外層の親水性コロイド層中にスチレンおよび/また
はスチレン誘導体、アクリル酸エステル、不飽和カルボ
ン酸から実質的になる共重合体水系分散物を含有せしめ
、かつ同最外層の親水性コロイド層中にコロイド状シリ
カを含有することを特徴とする写JIc感光材料によシ
達成された。CD) Structure of the Invention The object of the present invention is to provide a silver halide photographic material having at least two or more hydrophilic colloid layers on a support, in which styrene and/or styrene is contained in the outermost hydrophilic colloid layer. A photosensitive photosensitive material containing an aqueous copolymer dispersion consisting essentially of a derivative, an acrylic ester, and an unsaturated carboxylic acid, and containing colloidal silica in the outermost hydrophilic colloid layer. This was achieved through materials.
まず本発明に用いるスチレン及び/またはスチレン湧導
体、アクリル、エステル、不飽和カルボン酸から実質的
になる共重合体水系分散物について述べる。スチレン及
び/またはスチレン誘導体は、スチレン、ならびにメチ
ルスチレン、エチルスチレン、イングロビルステレン等
のアルキルスチレン類、クロルスチレン、ブロムスチレ
ン、フルオルスチレン等のハロゲン化スチレン類、メト
キシスチレン、エトキシスチレン、ブトキシスチレン等
のアルコキシスチレン類、P−ヒドロキシスチレン、3
−メトキシ−4−ヒドロキシスチレン等のヒドロキシス
チレン類、ビニル安息香酸、ビニル安息香酸メチル等の
カルボキシスチレン及びその誘導体、ニトロスチレン、
トリニトロステレフ等のニトロ化スデレン類、m−アミ
ノスチレン、ジメチルアミノスチレン等のアミノスチレ
ン類、P−ビニルベンゼンスルホン酸エチル等のイオウ
を含むスチレン誘導体類、及び4位、β位の置換体が挙
げられる。First, an aqueous copolymer dispersion consisting essentially of styrene and/or styrene extractor, acrylic, ester, and unsaturated carboxylic acid used in the present invention will be described. Styrene and/or styrene derivatives include styrene, alkylstyrenes such as methylstyrene, ethylstyrene, and inglobylstyrene, halogenated styrenes such as chlorostyrene, bromustyrene, and fluorostyrene, methoxystyrene, ethoxystyrene, and butoxystyrene. Alkoxystyrenes such as styrene, P-hydroxystyrene, 3
- Hydroxystyrenes such as methoxy-4-hydroxystyrene, carboxystyrenes and derivatives thereof such as vinylbenzoic acid and methyl vinylbenzoate, nitrostyrene,
Nitrated suderenes such as trinitrosteref, aminostyrenes such as m-aminostyrene and dimethylaminostyrene, styrene derivatives containing sulfur such as ethyl P-vinylbenzenesulfonate, and substituted substances at the 4- and β-positions. Can be mentioned.
アクリル酸エステルのエステル残基としては例、tばメ
チル、エチル、n−7’ロピル、 1so−プロピル
、2−エチルヘキシル、テシル、等カ挙ケラレル。又1
,1.3 ) ’)ヒドロパーフルオロプロピルの如き
ハロゲン原子で置換されていても良い。Examples of the ester residue of the acrylic acid ester include tert-methyl, ethyl, n-7'-propyl, 1so-propyl, 2-ethylhexyl, tesyl, and the like. Again 1
, 1.3)') May be substituted with a halogen atom such as hydroperfluoropropyl.
不飽和カルボン酸としては、アクリル酸、メタアクリル
酸、イタコン酸、マレイン酸等が挙げられる。Examples of unsaturated carboxylic acids include acrylic acid, methacrylic acid, itaconic acid, and maleic acid.
本発明に好ましく用いられるスチレンおよび/またはス
チレン誘導体とアクリル′酸エステルと不飽和カルボン
酸の比は、スチレンおよび/lたはスチレン誘導体の含
有量が10〜70重量%であシ、特に30〜60%であ
ることが好ましい。また不飽和カルボン酸の含有量は1
〜10重量%であシ特に1〜5tsであることが好まし
い。またアクリル酸エステルは任意に選ぶことができ、
更に本発明の効果を実質的に損なうことのない範囲で他
のモノマー成分を含んでいてよい。The ratio of styrene and/or styrene derivative, acrylic acid ester, and unsaturated carboxylic acid preferably used in the present invention is such that the content of styrene and/or styrene derivative is 10 to 70% by weight, particularly 30 to 70% by weight. Preferably it is 60%. In addition, the content of unsaturated carboxylic acid is 1
It is preferably from 1 to 10% by weight, particularly from 1 to 5ts. Also, the acrylic ester can be selected arbitrarily.
Furthermore, other monomer components may be contained within a range that does not substantially impair the effects of the present invention.
本発明の共重合体水系分散物は乳化重合法により製造さ
れる。これを製造するためには、還流冷却器及び攪拌機
付フラスコに乳化分散剤として例えば過硫酸アンモニウ
ム及び重合促進剤として例えば酸性亜硫酸ソーダを加え
て得られる溶液を約60℃に保持しながら攪拌中、共重
合成分モノマーを滴下させ重合させると、共重合体水系
分散物が得られる。反応に用いられる界面活性剤の添加
量は共重合成分モノマーに対して5重量%以下、特に1
重量−前後が最良である。得られる分散液中の共重合体
の粒径は、界面活性剤の使用量、攪拌条件及び重合温度
などの条件によシ変るが通常0.1μ以下のもの、特に
0.05μ以下のものが好ましい。The copolymer aqueous dispersion of the present invention is produced by an emulsion polymerization method. In order to produce this, a solution obtained by adding an emulsifying dispersant such as ammonium persulfate and a polymerization accelerator such as sodium sulfite to a flask equipped with a reflux condenser and a stirrer is mixed while stirring while maintaining the temperature at about 60°C. When the polymerization component monomer is added dropwise and polymerized, an aqueous copolymer dispersion is obtained. The amount of surfactant used in the reaction is 5% by weight or less, especially 1% by weight based on the copolymerization component monomer.
Weight - Front and back is best. The particle size of the copolymer in the resulting dispersion varies depending on conditions such as the amount of surfactant used, stirring conditions, and polymerization temperature, but it is usually 0.1μ or less, especially 0.05μ or less. preferable.
本発明の共重合体水系分散物は感光材料の乳剤層、中間
層等に用いても効果はあるが、最外層、例えば保護層に
添加したとき特に効果がある。その際ゼラチンと自由な
比率で混ざるのでゼラチンに対する添加量に特に制限は
ないが、ゼラチンに対し3〜1001量−程度、特に5
〜70重量%用いるのが好ましい。Although the copolymer aqueous dispersion of the present invention is effective when used in the emulsion layer, intermediate layer, etc. of a light-sensitive material, it is particularly effective when added to the outermost layer, such as a protective layer. At that time, since it is mixed with gelatin in a free ratio, there is no particular restriction on the amount added to gelatin, but it is about 3 to 1001 amounts to gelatin, especially 5
It is preferable to use up to 70% by weight.
次に本発明に使用される共重合体水系分散物に含有され
る代表的共重合体の組成を以下に示すが、本発明はこれ
に限定されるものではない。Next, the composition of a typical copolymer contained in the aqueous copolymer dispersion used in the present invention is shown below, but the present invention is not limited thereto.
さらに、本発明に用いるコロイド状シリカとしては主と
して、水を分散媒として、無水珪酸(シリカ)の超微粒
子(粒子径50mμ以下)を水中に分散せしめたコロイ
ド溶液であシ、更には、コロイド状シリカにアルカリ成
分として、水酸化ナトリウム、水酸化リチウム、水酸化
アンモニウムなどの無機塩やテトラメチレンアンモニウ
ムイオンの如き有機塩を安定化剤として含んだものも含
まれる。又、市販品としては、日量化学物スノーテック
ス20、スノーテックス30、スノーテックスC,スノ
ーテックスN1スノーテックスO。Further, the colloidal silica used in the present invention is mainly a colloidal solution in which ultrafine particles (particle size of 50 mμ or less) of silicic anhydride (silica) are dispersed in water using water as a dispersion medium. It also includes silica containing as an alkali component, an inorganic salt such as sodium hydroxide, lithium hydroxide, ammonium hydroxide, or an organic salt such as tetramethylene ammonium ion as a stabilizer. In addition, as commercially available products, the daily chemical substances Snowtex 20, Snowtex 30, Snowtex C, Snowtex N1, Snowtex O.
スノーテックスS、デュポン社製、ルドツクスAM1ル
ドツクスSM、ルドツクスH8等を入手することができ
る。Snowtex S, Ludotsux AM1 Ludotsux SM, Ludotsux H8, etc. manufactured by DuPont are available.
本発明において、コロイド状シリカは最外層の親水性コ
ロイド(主としてゼラチンからなる)バインダー中知含
有させて用いるが、使用量としてはバインダーに対し5
〜150重量%、好ましくは10〜100重量%を含有
させる。In the present invention, colloidal silica is used in a binder containing hydrophilic colloid (mainly gelatin) in the outermost layer.
~150% by weight, preferably 10-100% by weight.
同じくコロイド状シリカを、感光性ノ・ロゲン化銀写真
乳剤層中、中間層等に用いても効果はあるが、最外層に
例えば保護層に添加した時に、特に効果が大きい。Similarly, colloidal silica can be effective when used in photosensitive silver halide photographic emulsion layers, intermediate layers, etc., but it is especially effective when added to the outermost layer, such as a protective layer.
本発明に使用するコロイド状シリカを最外層の親水性コ
ロイド層中に、単独で使用あるいは多量使用で、表面光
沢の増加が期待できるが、長期展示等で光、熱に長期に
さらすことにより、簡単に印画紙表面のヒビ割れが発生
する欠点が有る。そのためにも同最外層の親水性コロイ
ド中に、スチレンおよび/またはスチレン誘導体、アク
リル酸エステル、不飽和カルボン酸からなる共重合体水
系分散物を含有せしめる事によシ、同最外層に使用する
コロイド状シリカの欠点がなくなシ、すなわち長期展示
等で光、熱に長期間さらしても印画紙表面のとと割れの
発生がなく、しかも本発明に使用するコロイド状シリカ
及びスチレンおよび/またはスチレン誘導体、アクリル
酸エステル、不飽和カルボン酸からなる共重合体水系分
散物を各々単独で使用した場合よりも表面光沢が著しく
改良されることが判明した。If the colloidal silica used in the present invention is used alone or in large amounts in the outermost hydrophilic colloid layer, an increase in surface gloss can be expected. It has the disadvantage that cracks easily occur on the surface of the photographic paper. To this end, an aqueous copolymer dispersion of styrene and/or a styrene derivative, an acrylic ester, and an unsaturated carboxylic acid is contained in the hydrophilic colloid in the outermost layer. It does not have the drawbacks of colloidal silica, that is, the surface of the photographic paper does not crack even when exposed to light and heat for long periods of time, such as during long-term exhibitions, and the colloidal silica and styrene used in the present invention and/or It has been found that the surface gloss is significantly improved compared to when an aqueous copolymer dispersion of a styrene derivative, an acrylic acid ester, and an unsaturated carboxylic acid is used alone.
さらに本発明の共重合体水系分散物の存在した系でコロ
イド状シリカを増量してもコロイド状シリカの欠点であ
る表面のとと割れはなく、表面光沢はさらに改良される
ことも判った。Furthermore, it has been found that even if the amount of colloidal silica is increased in a system in which the aqueous copolymer dispersion of the present invention is present, surface cracking, which is a drawback of colloidal silica, does not occur, and the surface gloss is further improved.
本発明において、前述の如く最外層に用いた時が最も効
果を示すが、その際、バインダーとして使用される親水
性コロイド物質としては、ゼラチン及びゼラチン誘導体
、である。またポリスチレン、ポリメタクリル酸メチル
あるいはシリカ等のマット剤を共重合体とバインダーか
らなる最上層に必要に応じて併用することも何らさしつ
かえない。In the present invention, it is most effective when used in the outermost layer as described above, and in this case, gelatin and gelatin derivatives are used as hydrophilic colloid substances as binders. Furthermore, there is nothing wrong with using a matting agent such as polystyrene, polymethyl methacrylate, or silica in the uppermost layer consisting of a copolymer and a binder, if necessary.
本発明における表面保護層は適度に硬膜剤、界面活性剤
を含んでいることが好ましい。硬膜剤の具体的な例とし
ては、ホルムアルデヒド、ゲルタールアルデヒドの如き
アルデヒド系化合物、シア七チル、ミクロベンジオンの
如きテトン化合物、ビス(2−クロミニチル尿IA)−
2−ヒドロキシ−4,6−ジクロロ−1,3,5)リア
ジン、米国特許第3635718号記載の如き反応性の
ノ・ログンを有する化合物、ジビニルスルホン、米国特
許3635718号記載の如き反応性のオレフィン化合
物、米国特許第2732316号記載の如きN−メチロ
ール化合物、米国特許第3103437号記載の如きイ
ソ7アナート類、米国特許第3017280号、同第2
983611号記載の如きアジリジン化合物類、米国特
許第3100704号記載の如きカルボジイミド系化合
物類、米国特許第3091537号記載の如きエポキシ
化合物、ムコクロム酸の如きハロゲンカルボキシアルデ
ヒド類、ジヒドロキシジオキサンの如きジオキサン誘導
体、クロム明ばん、カリ明ばん、硫酸ジルコニウムの如
き無機硬膜剤などがあシ、これらを1種又は2種以上組
合せて用いることが出来る。界面活性剤の具体的な例と
しては、サポニンなどの天然界面活性剤、アルキレンオ
キサイド系、グリセリン系、グリシドール系などのノニ
オン界面活性剤高級アルキルアミン類、第四級アンモニ
ウム塩類、ピリジン、その他の複素環類、スルホニタム
類などのカチオン界面活性剤、カルボン酸、燐酸、硫酸
エステル基、燐酸エステル基等の酸性基を含むアニオン
界面活性剤、アミノ酸類、アミノスルホン酸類、アミノ
アルコールの硫酸又は燐酸エステル類等の両性界面活性
剤などかあシ、これらを1種又は2種以上組合せて用い
ることが出来る。The surface protective layer in the present invention preferably contains an appropriate amount of a hardening agent and a surfactant. Specific examples of hardening agents include aldehyde compounds such as formaldehyde and geltaraldehyde, tetone compounds such as cya-7tyl and microbendione, and bis(2-chromityl urinary IA)-
2-Hydroxy-4,6-dichloro-1,3,5) riazine, compounds with reactive nolognes as described in U.S. Pat. No. 3,635,718, divinyl sulfone, reactive olefins as described in U.S. Pat. No. 3,635,718. compounds, N-methylol compounds as described in U.S. Pat. No. 2,732,316, iso-7 ananates as described in U.S. Pat. No. 3,103,437, U.S. Pat.
aziridine compounds as described in US Pat. No. 3,100,704, epoxy compounds as described in US Pat. No. 3,091,537, halogen carboxaldehydes such as mucochromic acid, dioxane derivatives such as dihydroxydioxane, chromium Inorganic hardeners such as alum, potash alum, and zirconium sulfate may be used alone or in combination of two or more. Specific examples of surfactants include natural surfactants such as saponin, nonionic surfactants such as alkylene oxide, glycerin, and glycidol, higher alkylamines, quaternary ammonium salts, pyridine, and other complexes. Cationic surfactants such as rings and sulfonitams, anionic surfactants containing acidic groups such as carboxylic acids, phosphoric acids, sulfuric acid ester groups, and phosphoric ester groups, amino acids, aminosulfonic acids, and sulfuric acid or phosphoric acid esters of amino alcohols. These amphoteric surfactants can be used alone or in combination of two or more.
本発明の実施に用いられるノ・ロゲン化銀乳剤は公知、
慣用の方法により調製することが出来るハロゲン化銀の
生成・分散方法、ハロゲン化銀組成(例えば、塩化銀、
臭化銀、沃臭化銀、塩臭化銀など)、ハロゲン化銀粒子
のサイズや晶癖、ノ・ロゲン化釧とゼラチンの比率、ハ
ロゲン化銀乳剤の pHやPAg、化学増感剤の枝類や
量、その他の添加剤の種類や量、ゼラチン、その他のバ
インダーの種類や量などによシ制限されるものではない
。Silver halogenide emulsions used in the practice of the present invention are known,
Methods for producing and dispersing silver halide that can be prepared by conventional methods, silver halide composition (for example, silver chloride,
(silver bromide, silver iodobromide, silver chlorobromide, etc.), the size and crystal habit of silver halide grains, the ratio of silver halide grains to gelatin, the pH and PAg of silver halide emulsions, and the use of chemical sensitizers. There are no limitations on the types and amounts of branches, the types and amounts of other additives, the types and amounts of gelatin and other binders, etc.
本発明のハロゲン化銀写真材料に用いられる支持体とし
ては、バライタまたはポリオレフィン樹脂をラミネート
した紙、または透明フィルムに染料が酸化チタンの如き
顔料を加えることにより、不透明にしたフィルム及びセ
ルロースアセテートフィルム、ポリスチレンフィルム、
ポリエチレンテレフタレートフィルム、ポリカーボネー
トフィルムなどの%種フィルム類が挙げられる。Supports used in the silver halide photographic material of the present invention include paper laminated with baryta or polyolefin resin, a transparent film made opaque by adding a pigment such as titanium oxide, and a cellulose acetate film. polystyrene film,
Examples include polyethylene terephthalate film, polycarbonate film, and other types of films.
(E)実施例
以下に本発明を実施例をもって詳細に説明するが、本発
明はこ九らの態様に限定されるものでない。(E) Examples The present invention will be explained in detail with examples below, but the present invention is not limited to these embodiments.
実施例1
通常の方法で調整された塩臭化銀乳剤(Br:C2=6
0:40)をコロナ放電加工したポリエチレンラミネー
ト紙(光沢画)支持体上に銀として1.4 f/R、ゼ
ラチン4 t/rr?となる様に、表面保護層にゼラチ
ン1.!M/m”となる様にスライドホッパー型押し出
し塗布機によシ同時塗布した。Example 1 Silver chlorobromide emulsion (Br:C2=6
0:40) as silver on corona discharge machined polyethylene laminated paper (glossy) support, 1.4 f/R, gelatin 4 t/rr? Add 1. gelatin to the surface protective layer so that ! Coating was carried out simultaneously using a slide hopper type extrusion coating machine so that the coating amount was M/m''.
但し表面保護層のバインダーとして例示化合物の割合(
重量)が0.15%(試料1.2.4.6.とする)及
び30%(試料3.5.7とする)になるようにし塗布
、乾燥した。次にこれらの試料とは別にアクリロニトリ
ル・ブタジェン系ラテックス(化合物F;ブタジェン/
アクリロニトリル=30/70)、アクリレート系ラテ
ックス(化合物G;n−ブチルアクリレート)、コロイ
ダルシリカ〔化合物)1)を用い前述と同様、化合物の
割合(重量)が15%(試料8.10.12.とする)
及び30チ(試料9.11.13とする)になる様にし
た。However, the proportion of the exemplified compound as a binder in the surface protective layer (
The samples were coated and dried so that the weight) was 0.15% (sample 1.2.4.6.) and 30% (sample 3.5.7). Next, apart from these samples, acrylonitrile-butadiene latex (compound F; butadiene/
Acrylonitrile = 30/70), acrylate latex (compound G; n-butyl acrylate), and colloidal silica (compound) 1) were used, and the proportion (weight) of the compound was 15% (sample 8.10.12. )
and 30 inches (referred to as sample 9.11.13).
更に化合物A1C,E、と化合物F−Hを組合せで各々
の化合物の割合(重量)が15%になる様に塗布した(
試料14〜22)。Furthermore, compounds A1C, E, and compounds F-H were applied in combination so that the proportion (weight) of each compound was 15% (
Samples 14-22).
各々1〜22の試料の白地部及び黒地部の表面光沢度及
び最大反射濃度(Dmax )を第1表に示した。これ
らの値の内、白地部の光沢の値は各々の試料を未露光の
状態で通常の写真処理を行ない又、黒地部の光沢の値は
各々の試料を適度な光で露光を行ない通常の写真処理を
行い、Dmaxは通常のセンシトメトリー及び写真処理
を行って自然放置し乾燥された後に測定された値である
。ここでの表面光沢度の値は日本気色工業製のVG−I
DQ光沢光沢上〕入射角60’ 受光角60° で測
定したものである。同時にこれらのD maxを同じ第
1表に示した。ここでの反射濃度の測定値はJI8−に
7611に記載の方法によるものである。Table 1 shows the surface glossiness and maximum reflection density (Dmax) of the white background and black background of samples 1 to 22, respectively. Among these values, the gloss value of the white background area is determined by performing normal photographic processing on each sample in an unexposed state, and the gloss value of the black background area is determined by exposing each sample to appropriate light and performing normal photographic processing. Photographic processing was performed, and Dmax was a value measured after normal sensitometry and photographic processing were performed and the film was left to dry naturally. The surface gloss value here is VG-I manufactured by Nippon Kishoku Kogyo.
DQ Gloss Gloss] Measured at an incident angle of 60' and a light receiving angle of 60°. At the same time, their D max are shown in the same Table 1. The measured value of reflection density here is based on the method described in JI8-7611.
次に現像された試料を室外(太陽光線が直接当たるyp
tr>に放置し約1ケ月後に放置していない試料と表面
状態を比較し、これを耐候性とし変化がほとんどないも
のに○印、変化あるものに(具体的には感光材料の表面
が亀の甲状にヒビ割れを発生したもの)X印を付は同様
に第1表に示した。Next, the developed sample was placed outdoors (yp where sunlight is directly exposed).
After about one month, the surface condition was compared with that of a sample that had not been left for a month. Those with almost no change were marked with a circle, and those with changes were marked with a circle (specifically, the surface of the photosensitive material was a turtle shell). Items marked with an X are also shown in Table 1.
(以下余白)
第1表
第1表から明らかな様に本発明の化合物(A、C,B)
とコロイダルシリカ(化合物)1)を組合せた系(試料
20〜22)は共重合体物、コロイド状シリカを含まな
いもの(試料1)及び他の化合物(A−H)及び化合物
の組合せたもの(試料2〜19)に比較して、黒地部の
表面光沢、Dmaz耐光性のいずれも優れていることは
明瞭である。(Hereinafter in the margin) Table 1 As is clear from Table 1, the compounds of the present invention (A, C, B)
and colloidal silica (compound) 1) (samples 20 to 22) are copolymers, those that do not contain colloidal silica (sample 1), and combinations of other compounds (A-H) and compounds. It is clear that both the surface gloss of the black background part and the Dmaz light resistance are superior to those of (Samples 2 to 19).
実施例−2
実施例−1と同様の方法で調整して得られたゼラチン−
ハロゲン化銀乳剤に、表面保護層のバインダーとして1
例示化合物(A、 C,F)の割合(重量)を30%、
さらに化合物F及びHの割合(重量)を30チロ0%で
組合せた試料(23−32)化合物なしの試料(33)
を表2に示す。Example-2 Gelatin prepared by the same method as Example-1
1 as a binder for the surface protective layer in the silver halide emulsion.
The proportion (weight) of the exemplary compounds (A, C, F) is 30%,
Furthermore, a sample (23-32) in which the ratio (weight) of compounds F and H was combined at 30% and 0%, and a sample without the compound (33)
are shown in Table 2.
実施例−1と同様の方法で各試料の表面光沢度の白地部
光沢、黒地部光沢、最大反射濃度(Dmax)及び耐光
性の直を第2表に示す。Table 2 shows the white background gloss, black background gloss, maximum reflection density (Dmax), and light resistance of each sample using the same method as in Example-1.
第2表
第2表から明らかなように、本発明の化合物(A、C)
の存在する系で化合物Hコロイド状シリカを増した試料
(25,26,29,30)は黒地部の表面光沢、Dm
ax、耐光性とも優れていることが判る。Table 2 As is clear from Table 2, the compounds (A, C) of the present invention
Samples (25, 26, 29, 30) in which compound H colloidal silica was increased in the presence of
It can be seen that both ax and light resistance are excellent.
Claims (1)
するハロゲン化銀写真感光材料に於て、最外層の親水性
コロイド層中にスチレンおよび/またはスチレン誘導体
、アクリル酸エステルおよび不飽和カルボン酸から実質
的になる共重合体水系分散物を含有せしめかつ同最外層
の親水性コロイド層中にコロイド状シリカを含有するこ
とを特徴とする写真感光材料。In a silver halide photographic light-sensitive material having at least two or more hydrophilic colloid layers on a support, the outermost hydrophilic colloid layer contains styrene and/or styrene derivatives, acrylic esters, and unsaturated carboxylic acids. What is claimed is: 1. A photographic light-sensitive material, which contains an aqueous copolymer dispersion consisting essentially of an aqueous copolymer dispersion, and further contains colloidal silica in a hydrophilic colloid layer as the outermost layer.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8542687A JPS63249843A (en) | 1987-04-06 | 1987-04-06 | Silver halide photographic sensitive material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8542687A JPS63249843A (en) | 1987-04-06 | 1987-04-06 | Silver halide photographic sensitive material |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63249843A true JPS63249843A (en) | 1988-10-17 |
Family
ID=13858503
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8542687A Pending JPS63249843A (en) | 1987-04-06 | 1987-04-06 | Silver halide photographic sensitive material |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63249843A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02259636A (en) * | 1989-03-30 | 1990-10-22 | Mitsubishi Paper Mills Ltd | Silver halide photographic sensitive material for photomechanical process ensuring superior reducibility |
-
1987
- 1987-04-06 JP JP8542687A patent/JPS63249843A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02259636A (en) * | 1989-03-30 | 1990-10-22 | Mitsubishi Paper Mills Ltd | Silver halide photographic sensitive material for photomechanical process ensuring superior reducibility |
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