JPS63132795A - Solder flux - Google Patents
Solder fluxInfo
- Publication number
- JPS63132795A JPS63132795A JP27882086A JP27882086A JPS63132795A JP S63132795 A JPS63132795 A JP S63132795A JP 27882086 A JP27882086 A JP 27882086A JP 27882086 A JP27882086 A JP 27882086A JP S63132795 A JPS63132795 A JP S63132795A
- Authority
- JP
- Japan
- Prior art keywords
- flux
- diphenic acid
- monoester
- solder
- freon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000004907 flux Effects 0.000 title claims abstract description 28
- 229910000679 solder Inorganic materials 0.000 title abstract description 13
- GWZCCUDJHOGOSO-UHFFFAOYSA-N diphenic acid Chemical compound OC(=O)C1=CC=CC=C1C1=CC=CC=C1C(O)=O GWZCCUDJHOGOSO-UHFFFAOYSA-N 0.000 claims abstract description 12
- 238000005476 soldering Methods 0.000 claims abstract description 12
- 150000002148 esters Chemical class 0.000 claims abstract description 6
- 125000000217 alkyl group Chemical group 0.000 claims description 4
- 125000004432 carbon atom Chemical group C* 0.000 claims description 4
- 230000000694 effects Effects 0.000 abstract description 11
- 238000004140 cleaning Methods 0.000 abstract description 8
- AJDIZQLSFPQPEY-UHFFFAOYSA-N 1,1,2-Trichlorotrifluoroethane Chemical compound FC(F)(Cl)C(F)(Cl)Cl AJDIZQLSFPQPEY-UHFFFAOYSA-N 0.000 abstract description 7
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 abstract description 6
- 150000001412 amines Chemical class 0.000 abstract description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 abstract description 3
- 239000002904 solvent Substances 0.000 abstract description 2
- 239000000463 material Substances 0.000 abstract 1
- RSWGJHLUYNHPMX-UHFFFAOYSA-N Abietic-Saeure Natural products C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- KHPCPRHQVVSZAH-HUOMCSJISA-N Rosin Natural products O(C/C=C/c1ccccc1)[C@H]1[C@H](O)[C@@H](O)[C@@H](O)[C@@H](CO)O1 KHPCPRHQVVSZAH-HUOMCSJISA-N 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 238000000034 method Methods 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 239000012459 cleaning agent Substances 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 150000007524 organic acids Chemical class 0.000 description 3
- 235000005985 organic acids Nutrition 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- PAFZNILMFXTMIY-UHFFFAOYSA-N cyclohexylamine Chemical compound NC1CCCCC1 PAFZNILMFXTMIY-UHFFFAOYSA-N 0.000 description 2
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 2
- 239000012153 distilled water Substances 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- 150000007522 mineralic acids Chemical class 0.000 description 2
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical compound CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 1
- RFCAUADVODFSLZ-UHFFFAOYSA-N 1-Chloro-1,1,2,2,2-pentafluoroethane Chemical compound FC(F)(F)C(F)(F)Cl RFCAUADVODFSLZ-UHFFFAOYSA-N 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- 239000004808 2-ethylhexylester Substances 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-N Hydrogen bromide Chemical class Br CPELXLSAUQHCOX-UHFFFAOYSA-N 0.000 description 1
- 235000021355 Stearic acid Nutrition 0.000 description 1
- 239000002671 adjuvant Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 235000019270 ammonium chloride Nutrition 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 150000008280 chlorinated hydrocarbons Chemical class 0.000 description 1
- 235000019406 chloropentafluoroethane Nutrition 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 230000003670 easy-to-clean Effects 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- -1 etc. Substances 0.000 description 1
- 230000005496 eutectics Effects 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 1
- 239000002529 flux (metallurgy) Substances 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 150000003840 hydrochlorides Chemical class 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- JJWLVOIRVHMVIS-UHFFFAOYSA-N isopropylamine Chemical compound CC(C)N JJWLVOIRVHMVIS-UHFFFAOYSA-N 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- 231100000053 low toxicity Toxicity 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000013020 steam cleaning Methods 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 150000004992 toluidines Chemical class 0.000 description 1
- 230000002747 voluntary effect Effects 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
Landscapes
- Electric Connection Of Electric Components To Printed Circuits (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は、ハンダ付けを行なう際に使用するフラックス
に関する。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a flux used in soldering.
(従来の技術)
従来よシハンダ付けを行なう際に、金属表面の酸化物皮
膜を除去し、ハンダの付着性を改善するために用いられ
るフラックスには、大別して無機系と有機系の化合物が
ある。(Conventional technology) Fluxes conventionally used to remove oxide films on metal surfaces and improve solder adhesion during soldering can be roughly divided into inorganic and organic compounds. .
無機系には塩酸、燐酸等の無機酸、塩化亜鉛、塩化アン
モニウム等の無機塩があるが、これらは腐蝕性が大きく
、ハンダ付け後の水洗処理が必要である。したがって、
水洗を行ないにくい電子部品搭載のプリント回路基板用
には問題が多い。Inorganic acids include inorganic acids such as hydrochloric acid and phosphoric acid, and inorganic salts such as zinc chloride and ammonium chloride, but these are highly corrosive and require washing with water after soldering. therefore,
There are many problems with printed circuit boards equipped with electronic components that are difficult to wash with water.
有機系には乳酸、ステアリン酸等の有機酸、ジエチルア
ミンやプロピルアミン等の各種アミンのハロゲン酸塩、
ロジン等の樹脂がある。有機酸やアミンのハロゲン酸塩
は、無機系よシは程度が低いにしても、やはシ腐蝕性が
あシ、フラックスの補助成分として少量用いる他は、一
般にハンダ付け後に洗浄する必要がある。また、この場
合の洗浄剤には、極性の高いものが要求される等の制限
が多い。ロジン系は金属酸化物を溶解する能力(以下、
フラックス活性という)が弱いという欠点があるが、腐
蝕性が低い、電気絶縁性がよい等の点で、特にプリント
回路基板へのハンダ付けに多用されている。ロジン系フ
ラックスの場合、その特性から、ハンダ付け後に洗浄が
省略される場合が多い。しかし、コンピューター、通信
機等の産業機器で高度の信頼性が要求される分野では、
やはシバ/ダ付け後に7ラツクス成分は洗浄除去されな
ければならない。Organic acids include organic acids such as lactic acid and stearic acid, halogenated salts of various amines such as diethylamine and propylamine,
There are resins such as rosin. Halogenated salts of organic acids and amines are highly corrosive, even if to a lesser extent than inorganic types, and generally require cleaning after soldering, except when used in small quantities as an auxiliary component of flux. . In addition, the cleaning agent in this case has many restrictions, such as the requirement that it be highly polar. Rosin system has the ability to dissolve metal oxides (hereinafter referred to as
Although it has the disadvantage of low flux activity (referred to as flux activity), it is often used especially for soldering to printed circuit boards because of its low corrosivity and good electrical insulation properties. In the case of rosin-based flux, cleaning is often omitted after soldering due to its characteristics. However, in fields where high reliability is required for industrial equipment such as computers and communication equipment,
The 7 lux component must be washed away after applying the shiva/da.
(発明が解決しようとする問題点)
7ラツクスの洗浄剤としては、水の他に、エタノールや
インプロパツール等のアルコール類、メチレンクロライ
ドやメチルクロロホルム等の塩素化炭化水素類、1,1
.2− )リフer a −1,2,2−トリフルオロ
エタン(以下、フロン1tsと称−i)等の弗素系炭化
水素類が使われる。(Problem to be Solved by the Invention) In addition to water, cleaning agents for 7 Lacs include alcohols such as ethanol and Impropatol, chlorinated hydrocarbons such as methylene chloride and methyl chloroform, 1,1
.. 2-) Refer a Fluorine-based hydrocarbons such as -1,2,2-trifluoroethane (hereinafter referred to as Freon 1ts-i) are used.
近年、各種部品を搭載したプリント回路基板を丸ごと洗
浄する場合、搭載部品への影響が少ないこと、難燃性で
あること、毒性が低めこと、廃液の処理が簡単であるこ
と等から、フロン113を洗浄剤として使用したいとい
う要望が高い。しかし、従来の7ラツクスは、フロン1
13で洗浄しにくいという欠点がある。その中でロジン
系フラックスは、フロン113で比軟的洗浄しやすい部
類に属するが、それでも洗浄性が充分でなく、フロン1
15にアルコール類を混合したもので洗浄する等の必要
が69、使用上の制限が多い。In recent years, when cleaning printed circuit boards with various parts mounted on them, Freon 113 has been used because it has little effect on the mounted parts, is flame retardant, has low toxicity, and is easy to dispose of waste liquid. There is a strong desire to use it as a cleaning agent. However, the conventional 7lux has 1 fluorocarbon.
13, which has the disadvantage of being difficult to clean. Among them, rosin-based flux belongs to the category that is easy to clean with Freon 113, but it still does not have sufficient cleaning properties and
It is necessary to wash with a mixture of 15 and alcohol 69, and there are many restrictions on its use.
(問題点を解決するだめの手段)
本発明者らは、このような状況に鑑み、フラックス活性
が高く、70ン113単独で容易に洗浄できるハンダ付
け用フラックスを得ることを目的として、種々検討を行
なった結果、目的に適うフラックス組成物を見出し、本
発明に到達し九。(Means for solving the problem) In view of the above situation, the present inventors conducted various studies with the aim of obtaining a soldering flux that has high flux activity and can be easily cleaned using 70-113 alone. As a result, we found a flux composition suitable for the purpose and arrived at the present invention.
すなわち、本発明は、ジフェン酸モノエステルからなる
ことを特徴とするハンダ付け用フラックスである。好ま
しくハ、ジフェン酸モノエステルが炭素数5へ18のア
ルキル基のモノアルキルエステルからなる7ラツクスで
ある。さらに好ましくは、炭素数が6へ12のアルキル
基のモノアルキルエステルからなる7ラツクスである。That is, the present invention is a soldering flux characterized by being made of diphenic acid monoester. Preferably, the diphenic acid monoester is a 7-lactide monoester consisting of a monoalkyl ester of an alkyl group having 5 to 18 carbon atoms. More preferred is a 7-lux consisting of a monoalkyl ester of an alkyl group having 6 to 12 carbon atoms.
モノエステル部分のアルキル基の炭素数が5よシ小さい
時や、18よシ大きくなる時には、フロン113に対す
る洗浄性が低下する。また、ジフェン酸のジアルキルエ
ステルではフラックス活性が低くなる。When the number of carbon atoms in the alkyl group of the monoester moiety is smaller than 5 or larger than 18, the detergency against Freon 113 decreases. Furthermore, dialkyl esters of diphenic acid have low flux activity.
本発明の7ラツクスは、通常、ジフェン酸モノエステル
をインプロパツール等の一般的な有機溶剤に目的に応じ
て1〜40fi溶解することによって得られるが、これ
にエチルアミン、ジエチルアミン、トリエチルアミン、
イソプロピルアミン、シクロヘキシルアミン、アニリン
、トルイジン、モルホリン、ジェタノールアミン等の各
稲アミン、およびそれらの塩酸塩、臭化水素酸塩等、他
の公知のものを加えて7ラツクス活性を調節することも
できる。また、溶剤もメタノール、エタノール、アセト
ン、酢酸エチル、トルエン等や、これらの混合物を用い
ることも可能である。The 7Lux of the present invention is usually obtained by dissolving 1 to 40 fi of diphenic acid monoester in a general organic solvent such as Impropatool, depending on the purpose, and ethylamine, diethylamine, triethylamine,
Other known amines such as isopropylamine, cyclohexylamine, aniline, toluidine, morpholine, jetanolamine, and their hydrochlorides and hydrobromides may be added to adjust the 7-lux activity. can. Further, as the solvent, methanol, ethanol, acetone, ethyl acetate, toluene, etc., or a mixture thereof can also be used.
本発明の7ラツクスをプリント回路基板に適用するとき
は、刷毛、スプレー、浸漬塗布法等の一般的方法が可能
である。When applying the 7lux of the present invention to printed circuit boards, common methods such as brush, spray, and dip coating methods are possible.
(実施例) 以下に、実施例によって本発明の効果を示す。(Example) Below, the effects of the present invention will be illustrated by examples.
なお、実施例に示す試験は次の方法によって行なわれる
。Note that the tests shown in Examples are conducted by the following method.
試験A(ハンダ拡がシ率)
゛ 燐脱酸銅板の表面を研磨し、清浄にした後、15
QCの電気炉中で1時間酸化処理した大きさがso×5
oxo、5龍の銅板を用意する。この上KJI8 Z
−5282に定めるH3OA1.6(7)線状ハンダを
直径5 umの棒に巻いて、その−環を切って作ったハ
ンダリング(0,249)を置く。Test A (solder expansion rate) ゛ After polishing and cleaning the surface of the phosphorus-deoxidized copper plate,
The size after 1 hour oxidation treatment in QC electric furnace is so×5
Prepare the oxo and 5 dragon copper plates. On top of this KJI8 Z
Wrap the H3OA1.6 (7) wire solder specified in -5282 around a rod with a diameter of 5 um, and place the solder ring (0,249) made by cutting the ring.
フラックス試料の約o、o s tをそのハンダリング
の中心部に置き、260CK加熱する。ハンダの拡がり
面積S<dl)をグラニメータによって測定する。拡が
シ率P(→は次の式によって求める。Place approximately o, o s t of flux sample in the center of the solder and heat to 260 CK. The solder spreading area S<dl) is measured using a granimeter. The expansion rate P (→ is determined by the following formula.
tnP−4,605+ tn(1−0,07528−’
)試験B(洗浄性試験)
多数個のスルホールを有する銅張りプリント回路基板を
テストピースとして、これにハンダフラックス試料を約
259/mR塗布し、噴流式によって共晶ハンダを25
00で銅回路面に付ける。次に、これをフロン113を
洗浄剤とする二槽式洗浄機で洗浄する。第一槽では25
cの浸漬超音波洗浄を、第二槽では15cの浸漬洗浄を
、第三漕では蒸気洗浄を各々20秒間行なう。洗浄した
テストピースは肉眼で7ラツクス残渣等の有無を観察し
た後、これに80810’Ω・傷以上の比抵抗値を有す
るイソプロパツールと蒸留水の混合液(混合容積比は7
5対25)をイオン性残渣の抽出液として、テストピー
スの表面積10(至)2当シ16wIt加え、常温で1
5分間超音波処理する。液中からテストピースを取り出
し、抽出液の比抵抗値(Ω・l)を測定する。tnP-4,605+ tn(1-0,07528-'
) Test B (cleanability test) A copper-clad printed circuit board with many through-holes was used as a test piece, a solder flux sample was applied to it at approximately 259/mR, and 25% of eutectic solder was applied using a jet method.
Attach it to the copper circuit surface with 00. Next, this is washed with a two-tank washing machine using Freon 113 as a washing agent. 25 in the first tank
In the second tank, 15c of immersion cleaning was performed, and in the third tank, steam cleaning was performed for 20 seconds each. After observing the cleaned test piece with the naked eye for the presence or absence of 7lux residue, etc., a mixture of isopropanol and distilled water having a resistivity value of 80810'Ω or more and distilled water (mixed volume ratio is 7
5 to 25) as an ionic residue extraction solution, add 16 wIt to 10 (to) 2 surface areas of the test piece, and extract 16 wIt at room temperature.
Sonicate for 5 minutes. Take out the test piece from the liquid and measure the specific resistance value (Ω·l) of the extracted liquid.
実施例1
表1に示す各徨ジフェン酸モノエステルおよび重合ロジ
ンをイソプロパツールに溶解し、濃度50重量%の溶液
とした。これらをハンダ7ラツクス試料とし、試験Aお
よび試験Bによって評価した。結果を表1に示す。Example 1 Each diphenic acid monoester and polymerized rosin shown in Table 1 were dissolved in isopropanol to form a solution with a concentration of 50% by weight. These were used as solder 7 lux samples and evaluated by Test A and Test B. The results are shown in Table 1.
表 1
実施例2
ジフェン酸モノ−2−エチルヘキシルエステル、ジフェ
ン酸モノラウリルエステル、ジフェン酸モノ−n−ヘキ
シルエステルおよび重合ロジンに、表2に示す補助剤を
各々のtoiit−混合したものをインプロパツールに
溶解し、濃度30重量−の溶液とした。これらを7ラツ
クス試料として、試験Aおよび試験Bによって評価した
。結果を表2JC示す。Table 1 Example 2 A mixture of diphenic acid mono-2-ethylhexyl ester, diphenic acid monolauryl ester, diphenic acid mono-n-hexyl ester, and polymerized rosin with each of the adjuvants shown in Table 2 was prepared by improvisation. It was dissolved in a tool to form a solution with a concentration of 30% by weight. These were evaluated as 7 lux samples by Test A and Test B. The results are shown in Table 2JC.
表 2
(発明の効果)
実施例の試験結果のうち、洗浄後のプリント回路基板を
イングロパノールと水の混液で処理した抽出液の比抵抗
値は、その値が大きいほど、プリント回路基板に残存す
るイオン性の残渣量が少ないことを示す。したがって、
このことはフロン115によるフラックスの洗浄性が高
いことを意味する。また、ハンダ拡がシ率は、その値が
大きいほど、フラックス活性が高く、ハンダ付け性がよ
いことを示す。Table 2 (Effects of the invention) Among the test results of the examples, the higher the specific resistance value of the extract obtained by treating the printed circuit board after cleaning with a mixture of ingropanol and water, the more the printed circuit board becomes This indicates that the amount of ionic residue remaining is small. therefore,
This means that the flux can be easily cleaned by Freon 115. Further, the larger the value of the solder spread rate, the higher the flux activity and the better the solderability.
実施例の結果から明らかなように、本発明のフラックス
は、ハンダ付け性とフロン113による洗浄性が優れて
おり、産業上極めて有用なものである。とシわけ、電子
部品を銅張りプリント回路基板へハンダ付けする際に利
用価値が高い。As is clear from the results of the Examples, the flux of the present invention has excellent solderability and cleanability with Freon 113, and is extremely useful industrially. In particular, it is highly useful when soldering electronic components to copper-clad printed circuit boards.
(参考文献)
特開昭47−79175、同49−97750、同a9
−z26545、同50−20957、同5G−209
58、同5G−80985、同51−44575、同5
2−152)1146、同56.−54798、同56
−54799、同56−109298、同56−109
299、同59−手続ネ市正書 (自発)
昭和62年1月29日(References) JP-A-47-79175, JP-A-49-97750, JP-A-9
-z26545, 50-20957, 5G-209
58, 5G-80985, 51-44575, 5
2-152) 1146, 56. -54798, 56
-54799, 56-109298, 56-109
299, 59-Procedure Ne City Official Book (Voluntary) January 29, 1988
Claims (2)
るハンダ付け用フラックス。(1) A soldering flux characterized by comprising diphenic acid monoester.
キル基のモノアルキルエステルである特許請求の範囲第
1項記載のハンダ付け用フラックス。(2) The soldering flux according to claim 1, wherein the diphenic acid monoester is a monoalkyl ester of an alkyl group having 3 to 18 carbon atoms.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP27882086A JPS63132795A (en) | 1986-11-25 | 1986-11-25 | Solder flux |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP27882086A JPS63132795A (en) | 1986-11-25 | 1986-11-25 | Solder flux |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63132795A true JPS63132795A (en) | 1988-06-04 |
Family
ID=17602605
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP27882086A Pending JPS63132795A (en) | 1986-11-25 | 1986-11-25 | Solder flux |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63132795A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6077725A (en) * | 1992-09-03 | 2000-06-20 | Lucent Technologies Inc | Method for assembling multichip modules |
US6727098B2 (en) * | 2001-06-21 | 2004-04-27 | Kanazawa University | Biaryl-type compounds, CD color fixing agent and method for determination of absolute configuration |
-
1986
- 1986-11-25 JP JP27882086A patent/JPS63132795A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6077725A (en) * | 1992-09-03 | 2000-06-20 | Lucent Technologies Inc | Method for assembling multichip modules |
US6727098B2 (en) * | 2001-06-21 | 2004-04-27 | Kanazawa University | Biaryl-type compounds, CD color fixing agent and method for determination of absolute configuration |
US7125725B2 (en) | 2001-06-21 | 2006-10-24 | Kanazawa University | Biaryl-type compounds, CD color fixing agent and method for determination of absolute configuration |
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