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JPS6286700A - Electrodeless radio frequency plasma reactor - Google Patents

Electrodeless radio frequency plasma reactor

Info

Publication number
JPS6286700A
JPS6286700A JP60207404A JP20740485A JPS6286700A JP S6286700 A JPS6286700 A JP S6286700A JP 60207404 A JP60207404 A JP 60207404A JP 20740485 A JP20740485 A JP 20740485A JP S6286700 A JPS6286700 A JP S6286700A
Authority
JP
Japan
Prior art keywords
plasma
frequency
main
auxiliary
frequency plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60207404A
Other languages
Japanese (ja)
Other versions
JPH0724238B2 (en
Inventor
己抜 篠原
豊信 吉田
福田 健三
亀山 哲也
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nihon Koshuha Co Ltd
Original Assignee
Nihon Koshuha Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nihon Koshuha Co Ltd filed Critical Nihon Koshuha Co Ltd
Priority to JP60207404A priority Critical patent/JPH0724238B2/en
Publication of JPS6286700A publication Critical patent/JPS6286700A/en
Publication of JPH0724238B2 publication Critical patent/JPH0724238B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Plasma Technology (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 イ、発明の目的 〔産業上の利用分野〕 本発明は、純度の高い反応生成物を生成するための高周
波プラズマ反応装置に関する。
DETAILED DESCRIPTION OF THE INVENTION A. OBJECTS OF THE INVENTION [Field of Industrial Application] The present invention relates to a high-frequency plasma reactor for producing highly pure reaction products.

〔従来の技術〕[Conventional technology]

一般に、高周波プラズマは、熱ピンチ効果及び磁気ピン
チ効果がそれ程大きくないため容積が大きく、流速が比
較的小さいプラズマ炎が得られる。
Generally, high-frequency plasma has a large volume and a plasma flame with a relatively low flow rate because the thermal pinch effect and magnetic pinch effect are not so large.

これは、高周波プラズマ炎の中で反応を行わせることが
できれば、反応の場所が大きく1反応性物質のプラズマ
内の滞留時間が長くとれ、効果的なプラズマ反応が行え
ることを意味している。また、無電極であるため′1セ
極物質による汚染もなく、純度の高い物質の生成に最適
である。
This means that if the reaction can be carried out in a high-frequency plasma flame, the reaction area will be large and the residence time of one reactive substance in the plasma will be long, and an effective plasma reaction can be carried out. Furthermore, since there is no electrode, there is no contamination caused by '1 separator substances, making it ideal for producing highly pure substances.

しかし、/a気圧による逆流現象のため1反応性物質を
プラズマ炎の中心部を通過させることが容易でなく、ま
た、反応性物質をプラズマ炎に注入すると、プラズマ炎
が不安定になったり、プラズマ炎が消え易くなる欠点が
ある。
However, it is not easy to pass a reactive substance through the center of the plasma flame due to the backflow phenomenon caused by /a atmospheric pressure, and when a reactive substance is injected into the plasma flame, the plasma flame becomes unstable. The disadvantage is that the plasma flame is easily extinguished.

これらの欠点を解決するために、タングステン陰極と銅
陽極を放電用電極とした直流アークプラズマトーチを具
えた高周波fii場結合アークプラズマ反応装置が発明
された(特願昭53−104830号→特開昭55−3
2317号公報参照)。
In order to solve these drawbacks, a high-frequency FII field-coupled arc plasma reactor equipped with a DC arc plasma torch using a tungsten cathode and a copper anode as discharge electrodes was invented (Japanese Patent Application No. 104830/1983 → Showa 55-3
(See Publication No. 2317).

すなわちアークプラズマをdわば高周波プラズマ炎のタ
ネ大役とし、高周波プラズマ炎が反応性物質の導入によ
り不安定性を増しても、アークプラズマからのイオンや
エレクトロンの供給により高周波プラズマは安定に作動
・維持することがr+7能になり、またアークプラズマ
ジェットの持つ高い運動エネルギにより、反応性物質を
高周波プラズマ炎の中央部を通過させることが可能にな
った。
In other words, the arc plasma is used as the seed for the high-frequency plasma flame, and even if the high-frequency plasma flame becomes unstable due to the introduction of reactive substances, the high-frequency plasma can operate and maintain stability due to the supply of ions and electrons from the arc plasma. The high kinetic energy of the arc plasma jet has made it possible to pass reactive substances through the center of the high-frequency plasma flame.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

しかし、直流アークプラズマを発生させるための放電用
電極の腐蝕により、電極物質が不純物として、高周波プ
ラズマ中に混入する重大な欠点を持っている。また、電
極の腐蝕により、長時間の運転に酎えることができない
However, due to corrosion of the discharge electrode for generating DC arc plasma, the electrode material is mixed into the high-frequency plasma as an impurity, which is a serious drawback. Furthermore, due to corrosion of the electrodes, long-term operation cannot be achieved.

一方、近年新物質、新素材の開発において超高度純度の
反応生成物が求められている。
On the other hand, in recent years, reaction products of ultra-high purity are required in the development of new substances and new materials.

本発明は、以トの点に鑑み電極物質による汚染がなく、
長時間の運転に耐えうる高周波プラズマ反応装置を提供
することを目的とする。
In view of the following points, the present invention is free from contamination due to electrode materials, and
The purpose of the present invention is to provide a high-frequency plasma reactor that can withstand long-term operation.

口、発明の構成 〔問題点を解決するための手段〕 本発明は、高周波磁場を利用して、誘導的に高周波プラ
ズマを発生させる主プラズマ反応器の上部に、主プラズ
マ発生と同原理で補助高周波プラズマ炎を発生させ、こ
れをプラズマジェットとして主プラズマ炎に重畳させる
補助プラズマトーチを設けたことを特徴とする焦電極高
周波プラズマ反応装置である。
Summary: Structure of the Invention [Means for Solving the Problems] The present invention provides an auxiliary device that uses a high-frequency magnetic field to inductively generate high-frequency plasma at the top of the main plasma reactor, based on the same principle as the main plasma generation. This is a pyroelectrode high-frequency plasma reaction device characterized by being provided with an auxiliary plasma torch that generates a high-frequency plasma flame and superimposes it on the main plasma flame as a plasma jet.

〔作 用〕[For production]

補助プラズマトーチからのプラズマジェットは、主高周
波プラズマ中にタネ火として噴出し、高周波プラズマを
重畳した一種のハイブリット形式の無電極高周波プラズ
マ反応装置であるから。
The plasma jet from the auxiliary plasma torch is ejected as seeds into the main high-frequency plasma, and the high-frequency plasma is superimposed on it, making it a kind of hybrid type electrodeless high-frequency plasma reactor.

主プラズマ炎を安定に作動・維持させる。不純物を発生
して高周波プラズマ中に混入する素因がない、従って相
まって長時間の運転に耐える。
Operates and maintains the main plasma flame stably. There is no predisposition to generate impurities and mix them into the high-frequency plasma, so it can withstand long-term operation.

〔実施例〕〔Example〕

図は本発明無電極高周波プラズマ反応装置を例示する縦
断面図である。Aは主プラズマ反応器、BはAの上部に
設けた補助高周波プラズマトーチである。
The figure is a longitudinal sectional view illustrating the electrodeless high-frequency plasma reactor of the present invention. A is the main plasma reactor, and B is an auxiliary high-frequency plasma torch installed above A.

補助プラズマ誘導用コイル1に高周波電流を流し、高周
波磁場を発生させる。注入口2より、補助プラズマガス
を石英管3内に注入すると、そのガスは、高周波磁場に
より誘導的に加熱され補助プラズマ4が発生する。この
ときプラズマが発生しやすいように管外のテスラコイル
5に電圧をかけて発生する高゛屯圧をトリガーとする。
A high frequency current is passed through the auxiliary plasma induction coil 1 to generate a high frequency magnetic field. When auxiliary plasma gas is injected into the quartz tube 3 through the injection port 2, the gas is inductively heated by the high frequency magnetic field and auxiliary plasma 4 is generated. At this time, in order to easily generate plasma, a voltage is applied to the Tesla coil 5 outside the tube, and the generated high pressure is used as a trigger.

石英管3は、冷却空間3aをもつ構造となっていて、冷
却媒体6を透すことによって石英管3゜その下部のノズ
ル7を冷却・保護するとともに、プラズマに熱ピンチ効
果及びこれに伴なう磁気ピンチ効果を生じさせエネルギ
密1■の高いプラズマとしている。
The quartz tube 3 has a structure with a cooling space 3a, and by passing a cooling medium 6 therethrough, it cools and protects the nozzle 7 at the bottom of the quartz tube 3, and also prevents a thermal pinch effect on the plasma and the accompanying heat pinch effect. This produces a magnetic pinch effect and creates a plasma with a high energy density of 1.

さらに補助プラズマ4は、補助プラズマガスの注入圧と
、ノズル7とによって流速紮[祷められ、主プラズマ用
石英管10内にプラズマジェットどなって噴出する。
Furthermore, the flow rate of the auxiliary plasma 4 is controlled by the injection pressure of the auxiliary plasma gas and the nozzle 7, and the auxiliary plasma 4 is ejected into the main plasma quartz tube 10 as a plasma jet.

注入口11より注入され、主プラズマ誘導用コイル12
によって生じた高周波磁場により加熱された主プラズマ
ガスは、タネ大役である補助プラズマ4によって点火さ
れ、主高周波プラズマ炎(主プラズマ)13となる。
Injected from the injection port 11, the main plasma induction coil 12
The main plasma gas heated by the high frequency magnetic field generated by the above is ignited by the auxiliary plasma 4, which serves as a seed, and becomes the main high frequency plasma flame (main plasma) 13.

石英管lOは冷却空間10aをもつ構造になっていて、
冷却媒体14を流すことによって管面を冷却・保護する
とともに、プラズマ13の外周部を冷却するように流さ
れた冷却ガス15とによって、熱ピンチ効果及びこれに
伴なう磁気ピンチ効果により高エネルギ密度のFプラズ
マとしている。
The quartz tube lO has a structure with a cooling space 10a,
The cooling medium 14 cools and protects the tube surface, and the cooling gas 15 flows to cool the outer periphery of the plasma 13. Due to the thermal pinch effect and accompanying magnetic pinch effect, high energy is generated. It is a high-density F plasma.

一方、注入口11より注入された反応性物質は、補助プ
ラズマ4のもつ運動エネルギにより主プラズマ13の中
央部に突入し通過する。
On the other hand, the reactive substance injected from the injection port 11 enters and passes through the center of the main plasma 13 due to the kinetic energy of the auxiliary plasma 4.

実験例 内fi20mmφの石英管3を用いて、アルゴンガスを
プラズマガスとし、補助プラズマ誘導用コイル1に27
 MHz・2.5 kWの高周波電力を印加し補助プラ
ズマ4を発生させ、これをタネ大役として、内径60m
mφの石英管IOを用いて、主プラズマ誘導用コイル1
2に4MHz・35kWの高周波電力を印加し、主プラ
ズマ13を点火し、かつ注入口11からの反応性物質の
注入に対して安定した主プラズマ13を維持し、安定し
たプラズマ反応装置として十分に使用可能なことを確認
した。
In the experimental example, using a quartz tube 3 with a fi of 20 mmφ, argon gas was used as the plasma gas, and the coil 1 for auxiliary plasma induction was
A high-frequency power of MHz/2.5 kW is applied to generate auxiliary plasma 4, and this serves as a seed to generate an inner diameter of 60 m.
Main plasma induction coil 1 using mφ quartz tube IO
A high frequency power of 4 MHz and 35 kW is applied to the main plasma 13 to ignite the main plasma 13, and the main plasma 13 is maintained stable against the injection of reactive substances from the injection port 11. Confirmed that it is available.

ハ、発明の効果 本発明は、主プラズマ13に補助プラズマ4を重畳する
、いわゆる高周波プラズマ−高周波プラズマのハイブリ
ッド方式であり。
C. Effects of the Invention The present invention is a so-called high-frequency plasma-high-frequency plasma hybrid system in which the auxiliary plasma 4 is superimposed on the main plasma 13.

(1)補助プラズマ4をタネ大役とするため、安定に点
火し、かつ反応性物質を注入しても主プラズマ13を安
定に作動・維持することができる。
(1) Since the auxiliary plasma 4 is used as a seed, it is possible to ignite it stably and to stably operate and maintain the main plasma 13 even when a reactive substance is injected.

(2)補助プラズマ4をプラズマジェットとすることに
より、これがもつ運動エネルギにより反応性物質を主プ
ラズマ13の中央部を通過させることができる。
(2) By using the auxiliary plasma 4 as a plasma jet, the kinetic energy of the auxiliary plasma 4 allows the reactive substance to pass through the center of the main plasma 13.

長所を保有し、かつ高周波プラズマの固有の(1)反応
の場所が大きくとれる。
(1) A large area can be taken up for the reaction, which is unique to high-frequency plasma.

(2)反応性物質のプラズマ内の滞留時間が長くとれる
(2) The residence time of reactive substances in the plasma can be increased.

長所を保有している。Possesses advantages.

さらに無電極高周波プラズマ反応装置であるため、電極
の114f+!に起因する前記の欠点を解決し次の効果
を合せもっている。
Furthermore, since it is an electrodeless high-frequency plasma reactor, the number of electrodes is 114f+! This solves the above-mentioned drawbacks caused by the problem and also has the following effects.

(1)電極物質による汚染がない超高度純度の反応生成
物を得ることができる。これは上記の保有する効果と相
乗して化合物合成、微粉体製造、非晶質体製造等の新物
質、新素材の開発・改良に非常に有効である。
(1) Ultra-high purity reaction products without contamination by electrode materials can be obtained. This, in combination with the above-mentioned effects, is extremely effective for the development and improvement of new substances and materials for compound synthesis, fine powder production, amorphous material production, etc.

(2)長時間の運転に耐えることができる。(2) Can withstand long-term operation.

【図面の簡単な説明】[Brief explanation of drawings]

初回は本発明の実施例を示す断面図である。 A・・・主プラズマ反応器、B・・・補助プラズマトー
チ、1拳12・・・プラズマ誘導用コイル、2・・・補
助プラズマガス注入目、11・・・主プラズマガス及び
反応性物質注入口、3・10・・・石英管、4・・・補
助プラズマ、5・・・テスラコイル、6−14・・・冷
却媒体、7・・・ノズル、13・・・主プラズマ、15
・・・冷却ガス。
The first time is a sectional view showing an embodiment of the present invention. A... Main plasma reactor, B... Auxiliary plasma torch, 1 fist 12... Coil for plasma induction, 2... Auxiliary plasma gas injection point, 11... Main plasma gas and reactive substance Note Inlet, 3.10...Quartz tube, 4...Auxiliary plasma, 5...Tesla coil, 6-14...Cooling medium, 7...Nozzle, 13...Main plasma, 15
...cooling gas.

Claims (1)

【特許請求の範囲】[Claims] (1)高周波磁場を利用して、誘導的に高周波プラズマ
を発生させる主プラズマ反応器の上部に、主プラズマ発
生と同原理で補助高周波プラズマ炎を発生させ、これを
プラズマジェットとして主プラズマ炎に重畳させる補助
プラズマトーチを設けたことを特徴とする無電極高周波
プラズマ反応装置。
(1) Generate high-frequency plasma inductively using a high-frequency magnetic field An auxiliary high-frequency plasma flame is generated on the top of the main plasma reactor using the same principle as the main plasma generation, and this is used as a plasma jet to generate the main plasma flame. An electrodeless high-frequency plasma reaction device characterized by being provided with a superimposed auxiliary plasma torch.
JP60207404A 1985-09-19 1985-09-19 Electrodeless high frequency plasma reactor Expired - Lifetime JPH0724238B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60207404A JPH0724238B2 (en) 1985-09-19 1985-09-19 Electrodeless high frequency plasma reactor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60207404A JPH0724238B2 (en) 1985-09-19 1985-09-19 Electrodeless high frequency plasma reactor

Publications (2)

Publication Number Publication Date
JPS6286700A true JPS6286700A (en) 1987-04-21
JPH0724238B2 JPH0724238B2 (en) 1995-03-15

Family

ID=16539176

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60207404A Expired - Lifetime JPH0724238B2 (en) 1985-09-19 1985-09-19 Electrodeless high frequency plasma reactor

Country Status (1)

Country Link
JP (1) JPH0724238B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01294400A (en) * 1988-05-20 1989-11-28 Jeol Ltd Induced plasma producing device
WO2010082561A1 (en) * 2009-01-13 2010-07-22 リバーベル株式会社 Apparatus and method for producing plasma
JPWO2013099934A1 (en) * 2011-12-28 2015-05-11 イマジニアリング株式会社 Plasma generator

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5532317A (en) * 1978-08-28 1980-03-07 Asahi Chemical Ind High frequency magnetic field coupling arc plasma reactor

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5532317A (en) * 1978-08-28 1980-03-07 Asahi Chemical Ind High frequency magnetic field coupling arc plasma reactor

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01294400A (en) * 1988-05-20 1989-11-28 Jeol Ltd Induced plasma producing device
WO2010082561A1 (en) * 2009-01-13 2010-07-22 リバーベル株式会社 Apparatus and method for producing plasma
JPWO2010082561A1 (en) * 2009-01-13 2012-07-05 リバーベル株式会社 Plasma generating apparatus and method
JP5891341B2 (en) * 2009-01-13 2016-03-23 ヘルスセンシング株式会社 Plasma generating apparatus and method
JPWO2013099934A1 (en) * 2011-12-28 2015-05-11 イマジニアリング株式会社 Plasma generator

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JPH0724238B2 (en) 1995-03-15

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