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JPS626678B2 - - Google Patents

Info

Publication number
JPS626678B2
JPS626678B2 JP13369878A JP13369878A JPS626678B2 JP S626678 B2 JPS626678 B2 JP S626678B2 JP 13369878 A JP13369878 A JP 13369878A JP 13369878 A JP13369878 A JP 13369878A JP S626678 B2 JPS626678 B2 JP S626678B2
Authority
JP
Japan
Prior art keywords
cleaning solution
ion exchange
exchange resin
copper
cleaning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP13369878A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5562794A (en
Inventor
Tatsuo Ite
Hajime Inoe
Shoji Oikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP13369878A priority Critical patent/JPS5562794A/ja
Publication of JPS5562794A publication Critical patent/JPS5562794A/ja
Publication of JPS626678B2 publication Critical patent/JPS626678B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/34Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32
    • C02F2103/346Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32 from semiconductor processing, e.g. waste water from polishing of wafers

Landscapes

  • Manufacturing Of Printed Wiring (AREA)
JP13369878A 1978-11-01 1978-11-01 Method of regnerating printed circuit board surface cleanser Granted JPS5562794A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13369878A JPS5562794A (en) 1978-11-01 1978-11-01 Method of regnerating printed circuit board surface cleanser

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13369878A JPS5562794A (en) 1978-11-01 1978-11-01 Method of regnerating printed circuit board surface cleanser

Publications (2)

Publication Number Publication Date
JPS5562794A JPS5562794A (en) 1980-05-12
JPS626678B2 true JPS626678B2 (de) 1987-02-12

Family

ID=15110785

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13369878A Granted JPS5562794A (en) 1978-11-01 1978-11-01 Method of regnerating printed circuit board surface cleanser

Country Status (1)

Country Link
JP (1) JPS5562794A (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0251923A3 (de) * 1986-07-01 1990-06-06 Digital Equipment Corporation Kontinuierliche Filtrierung von Kalium-Permanganat-Lösungen
US6346195B1 (en) 1998-07-10 2002-02-12 U.S. Filter Corporation Ion exchange removal of metal ions from wastewater
US6140130A (en) * 1998-07-13 2000-10-31 Nalco Chemical Company Detection and removal of copper from wastewater streams from semiconductor and printed circuit board processing
US6398964B1 (en) * 1999-08-19 2002-06-04 Koch Microelectronic Service Company, Inc. Process for treating aqueous waste containing copper and copper CMP particles
US7488423B2 (en) 2005-08-02 2009-02-10 Siemens Water Technologies Holding Corp. System and method of slurry treatment

Also Published As

Publication number Publication date
JPS5562794A (en) 1980-05-12

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