JPS6261137B2 - - Google Patents
Info
- Publication number
- JPS6261137B2 JPS6261137B2 JP53087946A JP8794678A JPS6261137B2 JP S6261137 B2 JPS6261137 B2 JP S6261137B2 JP 53087946 A JP53087946 A JP 53087946A JP 8794678 A JP8794678 A JP 8794678A JP S6261137 B2 JPS6261137 B2 JP S6261137B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- polyvinyl alcohol
- photosensitive
- parts
- photosensitive resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229920005989 resin Polymers 0.000 claims description 25
- 239000011347 resin Substances 0.000 claims description 25
- 229920002451 polyvinyl alcohol Polymers 0.000 claims description 22
- 239000004372 Polyvinyl alcohol Substances 0.000 claims description 21
- 239000000839 emulsion Substances 0.000 claims description 12
- 238000007650 screen-printing Methods 0.000 claims description 11
- 239000000203 mixture Substances 0.000 claims description 9
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 239000011248 coating agent Substances 0.000 claims description 5
- 238000000576 coating method Methods 0.000 claims description 5
- 239000004744 fabric Substances 0.000 claims description 5
- 229920002689 polyvinyl acetate Polymers 0.000 claims description 4
- 239000011118 polyvinyl acetate Substances 0.000 claims description 4
- 230000001678 irradiating effect Effects 0.000 claims description 2
- 239000000243 solution Substances 0.000 description 14
- 239000010410 layer Substances 0.000 description 10
- 238000000034 method Methods 0.000 description 10
- 238000007639 printing Methods 0.000 description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 229920001577 copolymer Polymers 0.000 description 6
- 238000006116 polymerization reaction Methods 0.000 description 5
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 4
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 229910001882 dioxygen Inorganic materials 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 229920002120 photoresistant polymer Polymers 0.000 description 4
- 229920002554 vinyl polymer Polymers 0.000 description 4
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- 229920006267 polyester film Polymers 0.000 description 3
- 238000007127 saponification reaction Methods 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 239000002966 varnish Substances 0.000 description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 3
- 229920000178 Acrylic resin Polymers 0.000 description 2
- IMROMDMJAWUWLK-UHFFFAOYSA-N Ethenol Chemical group OC=C IMROMDMJAWUWLK-UHFFFAOYSA-N 0.000 description 2
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 2
- DOIRQSBPFJWKBE-UHFFFAOYSA-N dibutyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 2
- 229920003132 hydroxypropyl methylcellulose phthalate Polymers 0.000 description 2
- 229940031704 hydroxypropyl methylcellulose phthalate Drugs 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- -1 silk Substances 0.000 description 2
- 235000011121 sodium hydroxide Nutrition 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 2
- FKTHNVSLHLHISI-UHFFFAOYSA-N 1,2-bis(isocyanatomethyl)benzene Chemical compound O=C=NCC1=CC=CC=C1CN=C=O FKTHNVSLHLHISI-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- CNCOEDDPFOAUMB-UHFFFAOYSA-N N-Methylolacrylamide Chemical compound OCNC(=O)C=C CNCOEDDPFOAUMB-UHFFFAOYSA-N 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 229920006243 acrylic copolymer Polymers 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000012954 diazonium Substances 0.000 description 1
- 150000001989 diazonium salts Chemical class 0.000 description 1
- SOCTUWSJJQCPFX-UHFFFAOYSA-N dichromate(2-) Chemical compound [O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O SOCTUWSJJQCPFX-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000004043 dyeing Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 230000000855 fungicidal effect Effects 0.000 description 1
- 239000000417 fungicide Substances 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- HWCKGOZZJDHMNC-UHFFFAOYSA-M tetraethylammonium bromide Chemical compound [Br-].CC[N+](CC)(CC)CC HWCKGOZZJDHMNC-UHFFFAOYSA-M 0.000 description 1
- 239000004753 textile Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Description
【発明の詳細な説明】
本発明はスクリーン印刷あるいはエツチングな
どに用いるスクリーン印刷版の製造方法に関する
ものである。さらに詳しくいえば、本発明は、耐
刷寿命が長く、かつ優れた印刷解像力を有する厚
膜のスクリーン印刷版を製造するための方法に関
するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for producing a screen printing plate used for screen printing or etching. More specifically, the present invention relates to a method for producing thick film screen printing plates having a long printing life and excellent printing resolution.
従来、スクリーン印刷版は絹、ナイロン、テト
ロンなどの繊維あるいはステンレススチール針金
などで構成したスクリーンクロスを版枠内に挾入
張装し、該スクリーンクロス上に手工的又は機械
的に感光乳剤を塗布し乾燥したのち、写真製版法
すなわち、原画としてのポジテイブを用いて乾燥
膜上に光化学的方法によつてパターンを描き、印
刷あるいはエツチング用のスクリーンにするとい
つた方法により製造されていた。しかしながら、
この方法においては、使用される該感光乳剤中の
不揮発分含量が低く、1回の塗布で生じる膜厚が
薄いために、所要の膜厚を得るには、感光乳剤の
塗布、乾燥を複数回繰り返さねばらなず、したが
つて得られた膜厚は不均一になるのを免れない。
しかもこのような方法は、該感光乳剤は感光剤と
して重クロム酸塩やジアゾニウム塩を用い、基本
的に光架橋型反応を利用しているために、露光時
間が著しく長くなるという欠点があつた。その
上、該感光乳剤はポリビニルアルコールと酢酸ビ
ニルエマルジヨンの組合せを主体として、水溶性
と耐水性を調節しているために十分な耐水性を与
えようとすると、現像処理の際の洗いが悪くな
り、その傾向は膜厚を厚くすればするほど助長さ
れ現像後の画像エツジ部のシヤープなものが得ら
れないという欠点があり、その結果、印刷の仕上
りが悪いものや、印刷中の膜剥れが早く耐刷寿命
の短いものが多かつた。 Conventionally, screen printing plates are made by inserting a screen cloth made of fibers such as silk, nylon, Tetoron, or stainless steel wire into a plate frame, and applying a light-sensitive emulsion onto the screen cloth manually or mechanically. After drying, it was manufactured using photolithography, a method in which a pattern was drawn on the dried film using a photochemical method using a positive as an original image, and the film was used as a screen for printing or etching. however,
In this method, the non-volatile content of the emulsion used is low and the film thickness produced by one coating is thin, so in order to obtain the desired film thickness, the emulsion must be coated and dried multiple times. The process has to be repeated and the resulting film thickness is inevitably non-uniform.
Moreover, this method has the disadvantage that the exposure time is extremely long because the photosensitive emulsion uses dichromate or diazonium salt as a sensitizer and basically utilizes a photocrosslinking reaction. . Furthermore, the photosensitive emulsion is mainly composed of a combination of polyvinyl alcohol and vinyl acetate emulsion, and its water solubility and water resistance are controlled. This tendency is exacerbated as the film thickness increases, and there is a drawback that sharp edges of the image cannot be obtained after development, resulting in poor print quality and film peeling during printing. Many of them ran out quickly and had a short printing life.
そこで、これらの欠点を補うものとして近年、
紫外線重合型感光性樹脂をスクリーン印刷版に応
用する試みが数多くなされるようになつた。この
紫外線重合型感光性樹脂は従来の光架橋型のもの
に比べて光の量子効率が極めて高いため膜厚が厚
くなつてもなんら問題を生じることがなく、この
ものを用いることにより従来の数十倍もの厚さに
することが可能になり、しかも多くの紫外線重合
型感光性樹脂は現像を溶剤若しくは弱アルカリ性
水溶液で行うため溶解性が極めて良く、エツジ部
のシヤープさが際立つたものになり、かつ当然耐
水性も極めて良好になつた。 Therefore, in recent years, as a way to compensate for these shortcomings,
Many attempts have been made to apply UV-polymerized photosensitive resins to screen printing plates. This ultraviolet-polymerized photosensitive resin has an extremely high quantum efficiency of light compared to conventional photocrosslinkable resins, so it does not cause any problems even when the film thickness becomes thicker. It is now possible to make the film 10 times thicker, and since many UV-polymerized photosensitive resins are developed using solvents or weakly alkaline aqueous solutions, they have extremely good solubility, resulting in sharp edges. And of course, the water resistance was also extremely good.
しかしながら、このような紫外線重合型感光性
樹脂においては、空気中に多量に含まれている酸
素により著しく重合阻害が起こるため、酸素が拡
散してくる感光性樹脂の表層部分が硬化しにくい
という難点がある。特にスクリーン印刷版の場合
は、ポジテイブが密着して、かつ露光時に光が入
射する側はともかく、その反対側で紗のある側は
空気中にさらされているため、酸素の硬化障害が
重大な問題となる。そこで、紗側の樹脂を十分硬
化させる目的で、多量の紫外線に露光すると、今
度は斜めの光線や紗の糸からの紫外線のハレーシ
ヨンによつて紗の間隙にある感光性樹脂が硬化し
て埋まりやすくなるといつた問題が生じる。した
がつて、十分な膜厚で、細い間隙を、シヤープな
エツジで抜こうとすると、感光性樹脂の紗側が露
光不足になり、製版時に剥れなどの事故発生の原
因となつた。 However, in such UV-polymerized photosensitive resins, polymerization is significantly inhibited by the large amount of oxygen contained in the air, so the problem is that the surface layer of the photosensitive resin, where oxygen diffuses, is difficult to cure. There is. Particularly in the case of screen printing plates, the positive is in close contact with the other side and, apart from the side where the light enters during exposure, the opposite side with the gauze is exposed to the air, so oxygen curing damage is a serious problem. It becomes a problem. Therefore, if the resin on the gauze side is exposed to a large amount of ultraviolet rays in order to sufficiently harden it, the photosensitive resin in the gaps in the gauze will harden and fill in due to the diagonal rays and the halation of the ultraviolet rays from the gauze threads. When it gets easier, problems arise. Therefore, when attempting to cut through narrow gaps with a sharp edge in a sufficiently thick film, the gauze side of the photosensitive resin becomes underexposed, causing accidents such as peeling during plate making.
本発明者らは、このような従来方法に伴う問題
点を解決すべく鋭意研究を重ねた結果、紫外線重
合型感光性樹脂層の表面に予め特定の被覆を施し
たのち、紫外線を照射することにより、その目的
を達成しうることを見出し、この知見に基づいて
本発明を完成するに至つた。 As a result of intensive research to solve the problems associated with such conventional methods, the inventors of the present invention discovered that after applying a specific coating to the surface of the ultraviolet polymerization type photosensitive resin layer in advance, irradiation with ultraviolet rays was performed. The inventors have discovered that the object can be achieved, and have completed the present invention based on this knowledge.
すなわち、本発明は、版枠内に挾入張装したス
クリーンクロス上に紫外線重合型感光性樹脂層を
設け、これにポジテイブを密着させ画像形成露光
し、次いで、現像することによりスクリーン印刷
版を製造する方法において、該感光性樹脂層の表
面に水溶性又は水分散型ポリビニルアルコール組
成物とポリ酢酸ビニルエマルジヨンとの混合物の
被覆を施したのち、紫外線を照射することを特徴
とするスクリーン印刷版の製造方法を提供するも
のである。 That is, the present invention provides a screen printing plate by providing an ultraviolet ray polymerized photosensitive resin layer on a screen cloth that is inserted into a plate frame, exposing a positive film to the film to form an image, and then developing it. In the method for manufacturing, screen printing is characterized in that the surface of the photosensitive resin layer is coated with a mixture of a water-soluble or water-dispersible polyvinyl alcohol composition and a polyvinyl acetate emulsion, and then irradiated with ultraviolet rays. The present invention provides a method for manufacturing a plate.
本発明は、ポリビニルアルコールが酸素ガスの
不透過性に極めて優れていることに基づくもので
ある。使用されるポリビニルアルコールは、高温
水に溶解するものであれば完全けん化のもので
も、部分けん化のものでも、さらに共重合体でも
差しつかえない。しかし、けん化度が低すぎると
酸素ガスの不透過性が低下するので望ましくない
ので、通常80%以上のけん化度のものが使用され
る。またポリビニルアルコールの重合度について
は、500〜2000の範囲のものが好適である。 The present invention is based on the fact that polyvinyl alcohol has excellent impermeability to oxygen gas. The polyvinyl alcohol used may be completely saponified, partially saponified, or a copolymer as long as it is soluble in high-temperature water. However, if the degree of saponification is too low, the impermeability to oxygen gas will decrease, which is undesirable, so a saponification degree of 80% or higher is usually used. The degree of polymerization of polyvinyl alcohol is preferably in the range of 500 to 2000.
共重合体を用いる場合、該共重合体中のビニル
アルコール単位が60モル%以上であることが必要
である。60モル%未満の場合、酸素ガスの不透過
率が低下するおそれがある。共重合体成分として
は酢酸ビニル(メタ)アクリル酸、アクリルアミ
ド、N―メチロールアクリルアミド、スチレン、
エチレン、プロピレン、無水マレイン酸、アクリ
ロニトリル、(メタ)アクリル酸エステルなどが
用いられる。 When a copolymer is used, it is necessary that the vinyl alcohol unit in the copolymer is 60 mol% or more. If it is less than 60 mol%, the opacity of oxygen gas may decrease. Copolymer components include vinyl acetate (meth)acrylic acid, acrylamide, N-methylolacrylamide, styrene,
Ethylene, propylene, maleic anhydride, acrylonitrile, (meth)acrylic acid ester, etc. are used.
本発明において感光性樹脂層の表面に施す被覆
は、前記のポリビニルアルコール又はその共重合
体と、ポリ酢酸ビニルエマルジヨンとの混合物を
用いて形成させることが必要である。ポリビニル
アルコール又はその共重合体のみでは、良好な塗
膜を形成しにくい上に、アクリル系、ウレタン
系、エポキシ系などの感光性樹脂に対しては親和
性を欠くので使用することができない。この際ポ
リ酢酸ビニルエマルジヨンの使用量は、ポリビニ
ルアルコールに対し、重量基準で10倍量以下、好
ましくは5倍量以下の範囲で選ばれる。その使用
量が前記範囲を超えると、ポリビニルアルコール
の量が少なくなり酸素ガスの遮蔽効果が弱くなる
と同時に、現像の際皮膜を洗い落すことができな
くなる。 In the present invention, the coating applied to the surface of the photosensitive resin layer must be formed using a mixture of the above-mentioned polyvinyl alcohol or its copolymer and polyvinyl acetate emulsion. Polyvinyl alcohol or its copolymer alone cannot be used because it is difficult to form a good coating film and lacks affinity for photosensitive resins such as acrylic, urethane, and epoxy resins. At this time, the amount of polyvinyl acetate emulsion to be used is selected within the range of 10 times or less, preferably 5 times or less, based on the weight of polyvinyl alcohol. If the amount used exceeds the above range, the amount of polyvinyl alcohol will be reduced and the oxygen gas shielding effect will be weakened, and at the same time, the film will not be able to be washed away during development.
また、水分散型ポリビニルアルコール組成物か
ら得られる皮膜と紫外線重合型感光性樹脂層との
熱収縮率があまりに違いすぎると、ひび割れなど
が起こりやすいので、通常公知の可塑剤を前者の
組成物に混入することが望ましい。その他、必要
に応じて、溶剤、充てん剤、防カビ剤などの添加
剤を加えてもよい。 Furthermore, if the heat shrinkage rates of the film obtained from the water-dispersed polyvinyl alcohol composition and the ultraviolet-polymerized photosensitive resin layer are too different, cracks are likely to occur, so a known plasticizer is usually added to the former composition. It is desirable to mix it. In addition, additives such as a solvent, a filler, and a fungicide may be added as necessary.
本発明で用いる紫外線重合型感光性樹脂につい
ては、紫外線に露光した際ラジカルを発生し、ラ
ジカル重合反応により硬化する型の樹脂で、かつ
紗の上に膜を形成しうるものであれば特に制限は
なく、元の状態が液体でも固体でもさしつかえな
い。このようなものとしては、固形状感光性樹脂
凸版材などに用いられているポリアミド―多官能
ビニルモノマー系、セルロース誘導体―多官能ビ
ニルモノマー系、ポリビニルアルコール−多官能
ビニルモノマー系、不飽和二重結合を多数結合さ
せたアクリル、ウレタン、エポキシ樹脂系などの
感光性樹脂又はそれらの溶剤若しくは水の溶液、
エマルジヨン若しくはデイスパージヨンなどが挙
げられる。 Regarding the ultraviolet polymerization type photosensitive resin used in the present invention, there are particular restrictions as long as it is a type of resin that generates radicals when exposed to ultraviolet light and hardens through a radical polymerization reaction, and that can form a film on the gauze. It does not matter whether the original state is liquid or solid. Examples of such materials include polyamide-polyfunctional vinyl monomer systems used in solid photosensitive resin letterpress materials, cellulose derivatives-polyfunctional vinyl monomer systems, polyvinyl alcohol-polyfunctional vinyl monomer systems, and unsaturated double Photosensitive resins such as acrylic, urethane, and epoxy resins with a large number of bonds, or their solvent or water solutions;
Examples include emulsion and dispersion.
本発明方法によると、耐刷寿命が長く、かつ厚
みのバラツキが少ない厚膜のものから成り、その
上細線などの再現性に優れたエツジのシヤープな
スクリーン印刷版が容易に得られるため、印刷解
像力が向上し、厚膜基板や抵抗体においても高印
刷解像率及び安定な膜厚印刷によつて抵抗値のバ
ラツキを少なくし品質の優れた、安定な厚膜基板
を提供できる。また印刷においても細い線でかつ
立体感のある印刷ができ、捺染では多量の染料が
生地に転写され、濃く繊細な美しい染色が可能と
なる。 According to the method of the present invention, a screen printing plate with a thick film that has a long printing life and little variation in thickness, and has sharp edges with excellent reproducibility of fine lines etc. can be easily obtained. The resolution is improved, and even in thick film substrates and resistors, high printing resolution and stable film thickness printing can reduce variations in resistance values, making it possible to provide stable thick film substrates with excellent quality. Furthermore, in printing, it is possible to print thin lines with a three-dimensional effect, and in textile printing, a large amount of dye is transferred to the fabric, allowing for deep, delicate and beautiful dyeing.
次に実施例によつて本発明をさらに詳細に説明
する。 Next, the present invention will be explained in more detail with reference to Examples.
なお、各実施例における部及び%は、それぞれ
重量部及び重量%である。 Note that parts and % in each example are parts by weight and % by weight, respectively.
実施例 1
ポリエチレングリコール(数平均分子量=
1000)1000部とキシリレンジイソシアネート384
部を100℃で2時間反応させたのち、2―ヒドロ
キシエチルメタクリレート268部を加えて空気気
流中80℃で4時間反応させ、これにジエチレング
リコールジメタクリレート184部、ベンゾインメ
チルエーテル18部、p―メトキシフエノール1.5
部を加えてよく溶解させる。Example 1 Polyethylene glycol (number average molecular weight =
1000) 1000 parts and xylylene diisocyanate 384
After 2 hours of reaction at 100°C, 268 parts of 2-hydroxyethyl methacrylate was added and the reaction was carried out at 80°C for 4 hours in an air stream. Phenol 1.5
Add 1 part and dissolve well.
このようにして得られた感光性ワニス60部に、
300メツシユ以上の微粒状に粉砕したヒドロキシ
プロピルメチルセルロースフタレート40部を加え
てヘンシエルミキサーでよく混合して湿つた粒状
とする。これをエクストルーダーで120℃で混練
してTダイスより厚さ350μのシート状に押出
し、厚さ25μのポリエステルフイルムにラミネー
トした。 To 60 parts of the photosensitive varnish thus obtained,
Add 40 parts of hydroxypropyl methylcellulose phthalate, which has been ground into fine particles of 300 mesh or more, and mix well with a Henschel mixer to form wet granules. This was kneaded at 120°C using an extruder, extruded from a T-die into a 350μ thick sheet, and laminated onto a 25μ thick polyester film.
一方、上記感光性ワニスとヒドロキシプロピル
メチルセルロースフタレートのブレンド物20部を
酢酸エチル80部に溶解した感光液を調製し、これ
をポリエステルフイルムにラミネートした樹脂面
に刷毛で塗り、酢酸エチルが乾かないうちに枠に
貼つた100メツシユのポリエステル紗を押しつ
け、さらに紗の上から同じ感光液を刷毛塗りし
て、40℃で30分間乾燥させた。この段階では紗の
繊維は感光液の乾燥膜で包み込まれ、しかも紗の
凹凸は十分残されていた。この樹脂版から25μの
ポリエステルフイルムを除去した。 On the other hand, a photosensitive solution was prepared by dissolving 20 parts of the blend of the above photosensitive varnish and hydroxypropyl methyl cellulose phthalate in 80 parts of ethyl acetate, and this was applied with a brush to the resin surface laminated to a polyester film, while the ethyl acetate did not dry. A 100-mesh polyester gauze attached to the frame was pressed onto the frame, and the same photosensitive solution was applied with a brush over the gauze and dried at 40°C for 30 minutes. At this stage, the gauze fibers were wrapped in a dry film of photosensitive liquid, and the unevenness of the gauze was still sufficiently intact. A 25μ polyester film was removed from this resin plate.
一方、20%ポリビニルアルコール溶液(デンカ
ポバールK―05,電気化学工業製品)50部、ジブ
チルフタレート15PHR含有する50%酢酸ビニル
エマルジヨン(ビニゾール595,大同化成工業製
品)50部及び水100部をよく混合して得られた溶
液(以下、ポリビニルアルコール溶液と略称す
る)を樹脂の両面に刷毛で塗布し、乾燥させた。
得られた膜厚は10μであつた。次いでポジテイブ
(リスフイルム使用、花柄)を密着させ、ポジテ
イブから1mの距離より2KW超高圧水銀灯で1
分30秒間照射し、ポジテイブを除去後0.2%カセ
イソーダ水溶液を5Kg/cm2の圧力で80秒間噴射し
てポリビニルアルコール層と未露光部分の感光性
樹脂層及び感光液剤層を除去した。この版を水洗
乾燥したのち、さらに丈夫にするために前述の露
光条件で再照射した。このようにして得られた版
を用いてアクリル板上にプラスチツク用スクリー
ンインキで印刷したところ、今までに得られなか
つたインキ層厚が300μもあるレリーフ感にあふ
れたデイスプレーが得られた。 Meanwhile, 50 parts of 20% polyvinyl alcohol solution (Denka Poval K-05, Denki Kagaku Kogyo product), 50 parts of 50% vinyl acetate emulsion containing 15 PHR of dibutyl phthalate (Vinizol 595, Daido Kasei product), and 100 parts of water were mixed well. The solution obtained by mixing (hereinafter abbreviated as polyvinyl alcohol solution) was applied to both sides of the resin with a brush and dried.
The obtained film thickness was 10μ. Next, a positive film (using lithium film, floral pattern) was placed in close contact with the film, and a 2KW ultra-high pressure mercury lamp was used from a distance of 1 meter from the positive film.
After removing the positive, a 0.2% caustic soda aqueous solution was sprayed at a pressure of 5 kg/cm 2 for 80 seconds to remove the polyvinyl alcohol layer and the unexposed portions of the photosensitive resin layer and photosensitive liquid layer. After washing and drying this plate, it was re-irradiated under the above-mentioned exposure conditions to make it even more durable. When the plate thus obtained was used to print on an acrylic plate with screen ink for plastics, a display with an ink layer thickness of 300 μm, which had never been achieved before, was obtained with a relief effect.
比較例 1
実施例1におけるポリビニルアルコール溶液の
塗布を省略して、他は全く実施例1と同じ条件で
製版したところ、紗側の感光膜が酸素障害のため
十分に硬化せず、現像工程中に感光膜の一部(露
光部分)が紗からはがれおちた。Comparative Example 1 When a plate was made under the same conditions as in Example 1 except that the application of the polyvinyl alcohol solution in Example 1 was omitted, the photoresist film on the gauze side was not sufficiently cured due to oxygen damage, and during the development process. A part of the photosensitive film (exposed area) peeled off from the gauze.
実施例 2
メタクリル酸メチル30部、スチレン30部、アク
リル酸ブチル15部、アクリル酸25部より得られた
アクリル共重合体の50%酢酸ブチル溶液200部に
テトラエチルアンモニウムブロマイド0.4部を触
媒としてメタクリル酸グリシジル30部を130℃で
反応させて酸価34のワニスを得た。これにベンゾ
インエチルエーテル2部を溶解して、さらにトル
オール30部で希釈して感光液とした。Example 2 Methacrylic acid was added to 200 parts of a 50% butyl acetate solution of an acrylic copolymer obtained from 30 parts of methyl methacrylate, 30 parts of styrene, 15 parts of butyl acrylate, and 25 parts of acrylic acid using 0.4 part of tetraethylammonium bromide as a catalyst. A varnish with an acid value of 34 was obtained by reacting 30 parts of glycidyl at 130°C. 2 parts of benzoin ethyl ether was dissolved in this, and the solution was further diluted with 30 parts of toluene to obtain a photosensitive solution.
この感光液を金枠に貼りつけた200メツシユの
ポリエステルスクリーンにボールスキージを用い
て塗布し、80℃で15分間加熱乾燥した。次いで、
実施例1で用いたポリビニルアルコール溶液を両
面に刷毛塗りして、60℃で10分間乾燥した。 This photosensitive solution was applied using a ball squeegee to a 200-mesh polyester screen attached to a metal frame, and then heated and dried at 80°C for 15 minutes. Then,
The polyvinyl alcohol solution used in Example 1 was brushed onto both sides and dried at 60°C for 10 minutes.
次に、電気回路用ポジテイブを密着させ、
3KWの高圧水銀灯で50cmの距離から15秒間照射
し、ポジテイブを除去後0.2%カセイソーダ水溶
液を35℃3.5Kg/cm2圧で噴霧し、ポリビニルアル
コール層と未照射部分を溶解除去し、水洗乾燥
後、同じランプで1分間再照射した。このように
して得られた版を用いて電気回路を印刷したとこ
ろ、従来のスクリーン版に比べて極めてシヤープ
で鮮明な刷り上がりが得られた。 Next, attach the positive for the electric circuit,
After irradiating with a 3KW high-pressure mercury lamp from a distance of 50cm for 15 seconds to remove the positive, spray a 0.2% caustic soda aqueous solution at 35℃ at 3.5Kg/cm 2 pressure to dissolve and remove the polyvinyl alcohol layer and unirradiated areas, wash with water, and dry. , re-irradiated with the same lamp for 1 minute. When electrical circuits were printed using the plate thus obtained, the resulting print was extremely sharp and clear compared to conventional screen plates.
比較例 2
実施例2におけるポリビニルアルコール溶液の
塗布を省略して、他は全く実施例2と同じ条件で
製版したところ、感光膜全体が硬化不足で現像工
程中にボロボロになり、画像が形成されなかつ
た。Comparative Example 2 When a plate was made under the same conditions as in Example 2 except that the application of the polyvinyl alcohol solution in Example 2 was omitted, the entire photoresist film was insufficiently cured and fell apart during the development process, resulting in no image being formed. Nakatsuta.
比較例 3
実施例2におけるポリビニルアルコール溶液の
代わりに重合度1700、けん化度90%のポリビニル
アルコールの5重量%水溶液を用いること以外は
全く実施例2と同様にして製版したところ、ポリ
ビニルアルコール溶液が均一に塗布されず、一部
にむらを生じ、ポリビニルアルコールで被覆され
ていない感光膜表面が硬化不足となり、完全な画
像形成がなされなかつた。Comparative Example 3 Plate making was carried out in the same manner as in Example 2 except that a 5% by weight aqueous solution of polyvinyl alcohol with a degree of polymerization of 1700 and a degree of saponification of 90% was used instead of the polyvinyl alcohol solution in Example 2. The photoresist film was not coated uniformly, causing some unevenness, and the surface of the photoresist film that was not coated with polyvinyl alcohol was insufficiently cured, resulting in incomplete image formation.
Claims (1)
紫外線重合型感光性樹脂層を設け、これにポジテ
イブを密着させて画像形成露光し、次いで現像す
ることによりスクリーン印刷版を製造する方法に
おいて、該感光性樹脂層の表面に水溶性又は水分
散型ポリビニルアルコール組成物とポリ酢酸ビニ
ルエマルジヨンとの混合物の複覆を施したのち、
紫外線を照射することを特徴とするスクリーン印
刷版の製造方法。1. A method of manufacturing a screen printing plate by providing an ultraviolet polymerizable photosensitive resin layer on a screen cloth inserted and stretched in a plate frame, exposing a positive film to form an image by closely contacting the layer, and then developing the layer. After applying a double coating of a mixture of a water-soluble or water-dispersible polyvinyl alcohol composition and a polyvinyl acetate emulsion to the surface of the photosensitive resin layer,
A method for producing a screen printing plate, characterized by irradiating it with ultraviolet rays.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8794678A JPS5515155A (en) | 1978-07-19 | 1978-07-19 | Production of screen printing plate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8794678A JPS5515155A (en) | 1978-07-19 | 1978-07-19 | Production of screen printing plate |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5515155A JPS5515155A (en) | 1980-02-02 |
JPS6261137B2 true JPS6261137B2 (en) | 1987-12-19 |
Family
ID=13929047
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8794678A Granted JPS5515155A (en) | 1978-07-19 | 1978-07-19 | Production of screen printing plate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5515155A (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4663275A (en) * | 1984-09-04 | 1987-05-05 | General Electric Company | Photolithographic method and combination including barrier layer |
JP2812728B2 (en) * | 1989-08-11 | 1998-10-22 | 村上スクリーン株式会社 | Manufacturing method of screen printing plate |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5149803A (en) * | 1974-10-28 | 1976-04-30 | Unitika Ltd | KANKOSEIJUSHISOSEIBUTSUNO NENCHAKUSEIBOSHIHOHO |
JPS5224703A (en) * | 1975-07-03 | 1977-02-24 | Eastman Kodak Co | Lithographic printing plate and oxygen cuttinggoff wall |
-
1978
- 1978-07-19 JP JP8794678A patent/JPS5515155A/en active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5149803A (en) * | 1974-10-28 | 1976-04-30 | Unitika Ltd | KANKOSEIJUSHISOSEIBUTSUNO NENCHAKUSEIBOSHIHOHO |
JPS5224703A (en) * | 1975-07-03 | 1977-02-24 | Eastman Kodak Co | Lithographic printing plate and oxygen cuttinggoff wall |
Also Published As
Publication number | Publication date |
---|---|
JPS5515155A (en) | 1980-02-02 |
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