JPS6244534Y2 - - Google Patents
Info
- Publication number
- JPS6244534Y2 JPS6244534Y2 JP3756883U JP3756883U JPS6244534Y2 JP S6244534 Y2 JPS6244534 Y2 JP S6244534Y2 JP 3756883 U JP3756883 U JP 3756883U JP 3756883 U JP3756883 U JP 3756883U JP S6244534 Y2 JPS6244534 Y2 JP S6244534Y2
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- water
- wafers
- shaped opening
- water tank
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 235000012431 wafers Nutrition 0.000 claims description 45
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 17
- 230000007246 mechanism Effects 0.000 claims description 12
- 238000003825 pressing Methods 0.000 claims description 4
- 238000000034 method Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 1
- 239000013013 elastic material Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
Landscapes
- Sheets, Magazines, And Separation Thereof (AREA)
Description
【考案の詳細な説明】
この考案は半導体素子製造の過程において、素
子の素材となる薄く切断されたシリコン等のウエ
ハーを取扱う装置である。ウエハーはもろい性質
であつて、高価なものであるが、最近これが次第
に大形になり、取扱い中に破損する事故が発生し
ている。特にインゴツトを薄いウエハーに切り出
した後及びその表面研磨(ラツピング)した後は
濡れた状態であつて、重ねると直ちに相互間が密
着する。そしてラツピング後は表面が非常に平滑
となつて強固に付着し、分離するためにすこしで
も無理な力が加わると破損する。しかしウエハー
次工程に送るためには一枚ずつはがして、マガジ
ンの棚に差し込んでやる必要があり、従来はこれ
を人手によつて行つていた。この考案はこの濡れ
て付着状態にあるウエハーのブロツクから一枚ず
つ分離取出すための装置であつて、これによりマ
ガジンへの自動収容を可能とするものである。[Detailed Description of the Invention] This invention is an apparatus that handles thinly cut wafers of silicon or the like, which are the raw materials for semiconductor devices, in the process of manufacturing semiconductor devices. Wafers are fragile and expensive, but recently they have become larger and larger, and accidents have occurred where they have been damaged during handling. In particular, after the ingots are cut into thin wafers and after their surfaces are polished (wrapped), they are in a wet state, and when stacked, they immediately come into close contact with each other. After wrapping, the surfaces become very smooth and adhere firmly, and if even the slightest force is applied to separate them, they will break. However, in order to send the wafers to the next process, it is necessary to peel them off one by one and insert them into the magazine shelf, which conventionally was done manually. This invention is a device for separating and taking out wafers one by one from this wet and adhered block of wafers, thereby making it possible to automatically store them in a magazine.
第1図、第2図において、水槽1には前面(第
1図の左側の面)にU字形開口部2を有する側壁
3を設け、U字形の下のほぼ点線位置まで水を入
れる。複数枚のウエハーを積み重ねたウエハーブ
ロツク4は側壁3の右側に縦に入れられ、右側の
水平軸5により、これに装着されたスプリング6
の反揆力により左方向に押し付けられる。水槽1
の左側のU字形開口部の左側には右向きに真空吸
着装置7を水平に設ける。ここで吸着装置7の先
端の円錐形吸盤は弾性体で作られ、吸引孔8から
その内部を減圧にすることによつて第1枚目のウ
エハーの吸着を行う。なお吸着装置7は水平方向
移動機構(ウエハーに対する前進後退運動)9と
上下動機構10とによつて支持され、吸着装置が
ウエハーに接触する位置まで前進して停止し、減
圧吸着を行い、吸着状態をもつて吸着装置を上昇
させる。このとき吸着された1枚のウエハーのみ
の上昇を許すゲート11をウエハーの上に設け
る。そしてこのゲートはウエハーの厚さに応じて
その位置を調節可能とする。 In FIGS. 1 and 2, a water tank 1 is provided with a side wall 3 having a U-shaped opening 2 on the front surface (left side in FIG. 1), and water is filled to approximately the dotted line below the U-shape. A wafer block 4 made up of a plurality of wafers is placed vertically on the right side of the side wall 3, and a spring 6 attached to it is attached to the horizontal shaft 5 on the right side.
is pushed to the left by the repulsive force of Aquarium 1
On the left side of the U-shaped opening on the left side, a vacuum suction device 7 is horizontally provided facing right. Here, the conical suction cup at the tip of the suction device 7 is made of an elastic material, and the first wafer is suctioned by reducing the pressure inside the suction cup through the suction hole 8. The suction device 7 is supported by a horizontal movement mechanism 9 (moves forward and backward relative to the wafer) and a vertical movement mechanism 10, and the suction device advances to a position where it contacts the wafer and stops, performs vacuum suction, and performs suction. Raise the adsorption device with the condition. A gate 11 is provided above the wafer to allow only one wafer sucked at this time to rise. The position of this gate can be adjusted depending on the thickness of the wafer.
以上の構造において、ウエハーは下部が常時水
に浸つているので、ウエハー相互間は毛細管現象
によつて水を吸い上げてよく濡れた状態となり、
ウエハーは横方向には滑動可能である。そこで第
1枚目のウエハーを吸着装置7によつて保持し
て、これを正確に積み重ね方向に対して直角方
向、すなわち上方向の運動だけを与えると、ウエ
ハーブロツクの第2枚目以下はゲート11に当つ
て移動出来ず、第1枚目だけを常に事故なく分離
取出すことができる。 In the above structure, the lower part of the wafer is constantly immersed in water, so the wafers absorb water through capillary action and become well wet.
The wafer is laterally slidable. Therefore, if the first wafer is held by the suction device 7 and is only moved in the direction perpendicular to the stacking direction, that is, in the upward direction, the second and subsequent wafer blocks will be moved at the gate. 11 and cannot be moved, and only the first sheet can be separated and taken out without any accident.
なお水槽の右側の水平軸5の左先端の押し板1
2に孔をあけて、ここに光学検出器のセンサー1
3を取付けて置けば、ウエハーの取出しが完了し
て、ウエハーがなくなつた状態が検知出来るの
で、これによつて装置を停止させる。 Note that the push plate 1 on the left tip of the horizontal shaft 5 on the right side of the aquarium
Drill a hole in 2 and insert the optical detector sensor 1 here.
If 3 is attached, the removal of the wafer is completed and the state in which no wafer is left can be detected, thereby stopping the apparatus.
またウエハー1枚の分離が行われた後、吸着装
置を水平に回転して、水平に置かれたカセツトの
棚に一枚ずつ送り込むことができる。なおその機
構は一般に使用されている搬送機構を連結するこ
とによつて可能である。そこでこの考案はウエハ
ーをカセツトに収容する装置に使うことができ
る。また前記説明において吸着装置の移動機構は
一般に広く使用されているレバー運動機構ねじ駆
動による運動機構、シリンダピストンによる運動
機構等適宜に使用することができる。 Furthermore, after one wafer has been separated, the suction device can be rotated horizontally to feed the wafers one by one onto a shelf in a horizontally placed cassette. Note that this mechanism is possible by connecting commonly used conveyance mechanisms. Therefore, this invention can be used in an apparatus for storing wafers in a cassette. In the above description, the moving mechanism of the suction device may be any widely used lever movement mechanism, screw drive movement mechanism, cylinder piston movement mechanism, or the like, as appropriate.
上記説明においては、ウエハーを縦に装着した
が、水平に積み重ねて取付けることも可能であ
る。このときには第3図第4図に示すように、水
槽13は立てられて、U字形開口部を有する側壁
は上部に水平に取付けて、ウエハーブロツクは上
部の板16に軸17によつて常時押し付けられ
る。そして吸着装置は第3図において、上下動並
びに左右動を可能として、横積みに置かれたウエ
ハーの最上部の1枚を吸着し、ゲート11によつ
て2枚目以下を残して第1枚目を図を右方向に取
出す。なおこのときには、ウエハーブロツク41
4を常に水に浸ける必要があり、ノズル15より
ウエハーに向つて水を噴射する。 In the above description, the wafers are mounted vertically, but it is also possible to stack them horizontally. At this time, as shown in FIGS. 3 and 4, the water tank 13 is erected, the side wall with the U-shaped opening is horizontally attached to the upper part, and the wafer block is constantly pressed against the upper plate 16 by the shaft 17. It will be done. As shown in FIG. 3, the suction device is capable of vertical and horizontal movement, and suctions the topmost wafer of the horizontally stacked wafers. Take out the eyes to the right of the diagram. Note that at this time, the wafer block 41
4 must be constantly immersed in water, and water is sprayed from a nozzle 15 toward the wafer.
第1図は本考案の一実施例を示す正面図、第2
図はU字形開口部を有する側板を示す第1図−
断面図、第3図は他の実施例を示す正面図、第
4図はその上面図を示す第3図の−断面図。
1……水槽、2……U字形開口部、3……側
壁、5……ウエハー押し付け軸、7……吸着装
置、8……吸引孔、9,10……移動機構、11
……ゲート、13……たて形水槽、15……噴水
孔、16……ゲート。
Figure 1 is a front view showing one embodiment of the present invention;
Figure 1 shows a side plate with a U-shaped opening.
3 is a front view showing another embodiment, and FIG. 4 is a cross-sectional view taken from FIG. 3 showing a top view thereof. DESCRIPTION OF SYMBOLS 1... Water tank, 2... U-shaped opening, 3... Side wall, 5... Wafer pressing shaft, 7... Adsorption device, 8... Suction hole, 9, 10... Moving mechanism, 11
...gate, 13...vertical aquarium, 15...fountain hole, 16...gate.
Claims (1)
み重ねて収容する水槽と、ウエハーを上記U字
形開口を有する面に押し付けるウエハー押し付
け機構と、開口部において1枚目のウエハーを
吸着状態において積み重ね方向に対して直角に
移動可能とする吸着装置並びにその移動機構
と、ウエハーの第2枚目以下の移動を抑制する
ゲートと、ウエハーブロツクを常に水に浸けた
状態とする手段とからなるウエハー取扱装置。 (2) 請求の範囲第1項において、水槽を水平と
し、U字形開口を有する面を側壁として、ウエ
ハーを縦に装着し、その下部を水槽内の水に浸
した状態とするウエハー取扱装置。 (3) 請求の範囲第1項において、水槽を垂直に立
てて、U字形開口を有する面を上部に位置させ
てウエハーを横積にして装着し、ウエハーブロ
ツクに対して噴水孔を設けて水に浸けた状態と
するウエハー取扱装置。[Claims for Utility Model Registration] (1) A water tank having a U-shaped opening on one side and accommodating wafers in a stacked manner, a wafer pressing mechanism for pressing the wafers against the surface having the U-shaped opening, and a wafer pressing mechanism in the opening. A suction device and its movement mechanism that can move the first wafer in a suctioned state at right angles to the stacking direction, a gate that suppresses the movement of the second and subsequent wafers, and a wafer block that is constantly immersed in water. wafer handling equipment comprising means for bringing the wafer into a (2) The wafer handling device according to claim 1, wherein the water tank is horizontal, the side wall having a U-shaped opening is used as a side wall, and the wafer is mounted vertically, the lower part of which is immersed in water in the water tank. (3) In claim 1, the water tank is set vertically and the wafers are stacked horizontally with the surface with the U-shaped opening at the top, and a water fountain hole is provided to the wafer block to provide water. Wafer handling equipment that is immersed in water.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3756883U JPS59145034U (en) | 1983-03-17 | 1983-03-17 | Wafer handling equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3756883U JPS59145034U (en) | 1983-03-17 | 1983-03-17 | Wafer handling equipment |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59145034U JPS59145034U (en) | 1984-09-28 |
JPS6244534Y2 true JPS6244534Y2 (en) | 1987-11-25 |
Family
ID=30168254
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3756883U Granted JPS59145034U (en) | 1983-03-17 | 1983-03-17 | Wafer handling equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59145034U (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011061120A (en) * | 2009-09-14 | 2011-03-24 | Sumitomo Metal Fine Technology Co Ltd | Method of carrying wafer and wafer carrying device |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102006021647A1 (en) * | 2005-11-09 | 2007-11-15 | Coenen, Wolfgang, Dipl.-Ing. | Method for separating disc-shaped substrates using adhesion forces |
-
1983
- 1983-03-17 JP JP3756883U patent/JPS59145034U/en active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011061120A (en) * | 2009-09-14 | 2011-03-24 | Sumitomo Metal Fine Technology Co Ltd | Method of carrying wafer and wafer carrying device |
Also Published As
Publication number | Publication date |
---|---|
JPS59145034U (en) | 1984-09-28 |
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