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JPS6226757A - Inductive coupling plasma mass spectrograph - Google Patents

Inductive coupling plasma mass spectrograph

Info

Publication number
JPS6226757A
JPS6226757A JP60165277A JP16527785A JPS6226757A JP S6226757 A JPS6226757 A JP S6226757A JP 60165277 A JP60165277 A JP 60165277A JP 16527785 A JP16527785 A JP 16527785A JP S6226757 A JPS6226757 A JP S6226757A
Authority
JP
Japan
Prior art keywords
inductive coupling
coupling plasma
light
mass spectrograph
mass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP60165277A
Other languages
Japanese (ja)
Inventor
Kozo Miishi
御石 浩三
Toshiya Kubodera
窪寺 俊也
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimadzu Corp
Original Assignee
Shimadzu Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corp filed Critical Shimadzu Corp
Priority to JP60165277A priority Critical patent/JPS6226757A/en
Publication of JPS6226757A publication Critical patent/JPS6226757A/en
Pending legal-status Critical Current

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  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
  • Electron Tubes For Measurement (AREA)

Abstract

PURPOSE:To automate operation of an inductive coupling plasma mass spectrograph by controlling starting and suspension of the operation of the mass spectrograph by comparing the variation in the amount of light from inductive coupling plasma, which results from sample introduction and is detected by a photodetector which is installed in the mass spectrograph, with a predetermined level. CONSTITUTION:Ions produced in an inductive coupling plasma torch 2 are collected by a sampling nozzle 8, converged by a convergent lens system 12 and then introduced into a tetrode rod 16 to separate the ions according to mass. Then, the separated ion groups are introduced into a secondary electron duplicator tube 18 and subjected to mass spectrography. A photodiode 20 used as the photodetector is installed on the central axis of the tetrode rod 16 in order to monitor the light of inductive coupling plasma. Variation in the optical amount of the inductive coupling plasma resulting from sample introduction is detected by the photodiode 20 and the detection result is delivered to a scanning control circuit 26. Operation of this mass spectrograph is started when the detection result is the same or higher than a predetermined level and stopped when the detection result is lower than the set level. Due to the above structure, it is possible to automate measurement by positively utilizing the light from the plasma.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、誘導結合プラズマ(■CP)中からイオンを
引き出して質量スペクトルを測定する装置に関するもの
である。
DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to an apparatus for extracting ions from inductively coupled plasma (CP) and measuring a mass spectrum.

(従来技術) 近年、発光分析の光源に用いられている誘導結合プラズ
マを質量分析計のイオン源として用いて溶液中の元素分
析をイオンによって行なう試みがなされている(例えば
アナリスト(Analyst)誌、106巻、第125
5〜1267頁(19’81年)参照)。
(Prior Art) In recent years, attempts have been made to use inductively coupled plasma, which is used as a light source for optical emission spectrometry, as an ion source for a mass spectrometer to perform elemental analysis using ions in a solution (for example, in Analyst magazine). , Volume 106, No. 125
(See pages 5-1267 (19'81)).

この誘導結合プラズマ質量分析装置では、プラズマから
発生する光がバックグランドノイズとして検出され、分
析上S/N比を悪くしたり、検出限界を制限したりする
。そのため光によるバックグランドノイズをおさえる工
夫が種々なされている。
In this inductively coupled plasma mass spectrometer, light generated from plasma is detected as background noise, which deteriorates the analytical S/N ratio and limits the detection limit. Therefore, various efforts have been made to suppress background noise caused by light.

(発明が解決しようとする問題点) このような誘導結合プラズマ質量分析装置の操作におい
ては、プラズマ中へ試料が導入された後、操作者により
質量分析計の動作が開始される。その結果、操作者に負
担がかかるとともに、試料導入から測定開始までの間に
時間的余裕が必要となるため測定を迅速に行なうことが
難かしいという問題がある。
(Problems to be Solved by the Invention) In the operation of such an inductively coupled plasma mass spectrometer, after a sample is introduced into the plasma, the operator starts the operation of the mass spectrometer. As a result, there are problems in that it is a burden on the operator and it is difficult to carry out measurements quickly because a time margin is required between the introduction of the sample and the start of measurement.

一方、プラズマ中に試料が導入されると、光の強度が変
化することが知られている。
On the other hand, it is known that when a sample is introduced into plasma, the intensity of light changes.

そこで、本発明は本来の分析上は妨害成分になるプラズ
マからの光を積極的に利用して質量分析計の測定を自動
化することを目的とするものである。
Therefore, an object of the present invention is to automate measurements by a mass spectrometer by actively utilizing light from plasma, which would normally be an interfering component in analysis.

(問題点を解決するための手段) 本発明の誘導結合プラズマ質量分析装置では、装置内で
プラズマからの光を受光できる位置に光検出器が設けら
れ、この光検出器の検出強度が設定値以上になると質量
分析計の動作を開始させ。
(Means for Solving the Problems) In the inductively coupled plasma mass spectrometer of the present invention, a photodetector is provided at a position within the device that can receive light from the plasma, and the detection intensity of this photodetector is set to a set value. When this happens, the mass spectrometer starts operating.

この光検出器の検出強度が設定値未満になると質量分析
計の動作を停止させる制御回路が設けられている。
A control circuit is provided that stops the operation of the mass spectrometer when the detection intensity of this photodetector becomes less than a set value.

(実施例) 図は本発明の誘導結合プラズマ質量分析装置の一実施例
を概略的に表わす。
(Embodiment) The figure schematically represents an embodiment of the inductively coupled plasma mass spectrometer of the present invention.

2は誘導結合プラズマを発生するトーチであり、中央の
ノズルに霧状の試料がキャリヤガス(Ar)とともに供
給され、その外側にプラズマガス(Ar)、さらにその
外側に冷却ガス(Ar)が供給される。トーチ2には高
周波コイル4が設けられている。
2 is a torch that generates inductively coupled plasma; a mist sample is supplied to the central nozzle along with carrier gas (Ar), plasma gas (Ar) is supplied to the outside of the nozzle, and cooling gas (Ar) is supplied to the outside of that. be done. The torch 2 is provided with a high frequency coil 4.

6は誘導結合プラズマの一部を採取する試料採取部で、
先端面が冷却ジャケット7となり、その冷却ジャケット
7にはサンプリングノズル8が開けられている。サンプ
リングノズル8は高温になるため、冷却ジャケット7は
冷却水9により冷却される。
6 is a sample collection section that collects a part of the inductively coupled plasma;
The tip end surface becomes a cooling jacket 7, and a sampling nozzle 8 is opened in the cooling jacket 7. Since the sampling nozzle 8 becomes hot, the cooling jacket 7 is cooled by the cooling water 9.

誘導結合プラズマは大気圧で発生し、誘導結合プラズマ
と試料採取部6の圧力差によりサンプリングノズル8を
通して試料採取を行なう、10はレンズ系部で、採取し
た試料中のイオンビームの進行方向を整えるイオン収束
レンズ系12を備えている。14は分析部で四重極ロン
ド16を有し、レンズ系12から導かれたイオンビーム
から特定のm/Z(質量と電荷の比)をもつイオンを選
別する。四重極ロッド16は互いに対峙させられ、相対
する2組のロッドにそれぞれ直流電圧と高周波電圧が重
畳して印加される。18は検出器としての二次電子増倍
管である。
Inductively coupled plasma is generated at atmospheric pressure, and a sample is collected through a sampling nozzle 8 due to the pressure difference between the inductively coupled plasma and the sample collecting section 6. 10 is a lens system section that adjusts the traveling direction of the ion beam in the collected sample. An ion focusing lens system 12 is provided. Reference numeral 14 denotes an analysis section which has a quadrupole rondo 16 and selects ions having a specific m/Z (mass to charge ratio) from the ion beam guided from the lens system 12. The quadrupole rods 16 are made to face each other, and a direct current voltage and a high frequency voltage are applied in a superimposed manner to each of the two sets of opposing rods. 18 is a secondary electron multiplier tube as a detector.

誘導結合プラズマは大気圧であるのに対し分析部は高真
空にする必要があるため、試料採取部6、レンズ系部1
0.及び分析部14にはそれぞれ真空排気系が設けられ
、各部の間を隔壁の小孔で連通させることにより差動排
気が行なわれている。
Inductively coupled plasma is at atmospheric pressure, but the analysis section needs to be in a high vacuum, so the sample collection section 6 and the lens system section 1 are
0. A vacuum evacuation system is provided in each of the analysis sections 14 and 14, and differential evacuation is performed by communicating between each section through small holes in the partition walls.

その結果、例えば試料採取部6は約I Torr、レン
ズ系部IOは10−’ 〜10−3Torr、分析部1
4は10−’〜10− ’ Torrというような真空
度に保たれる。
As a result, for example, the sample collection section 6 has a pressure of about I Torr, the lens system section IO has a pressure of 10-' to 10-3 Torr, and the analysis section 1
4 is maintained at a vacuum level of 10-' to 10-' Torr.

20は誘導結合プラズマの光をモニターするため四重極
ロッド16間の中心軸上に配置された光検出器としての
フォトダイオードである。
20 is a photodiode as a photodetector arranged on the central axis between the quadrupole rods 16 to monitor the light of the inductively coupled plasma.

22はフォトダイオード20の検出信号を増幅する増幅
器、24は増幅器22により増幅された検出信号を微分
する微分回路である。
22 is an amplifier that amplifies the detection signal of the photodiode 20, and 24 is a differentiation circuit that differentiates the detection signal amplified by the amplifier 22.

26は四重極ロッド16に印加する電圧を制御して走査
を行なう走査制御回路であり、28はこの走査制御回路
26の制御を受けて四重極ロッド16に直流電圧と高周
波電圧を重量して印加するR−F(高周波)1!源であ
る。走査制御回路26とR−F電源28の上記の機能は
従来の四重極質量分析計に備えられているものと同じで
あるが。
26 is a scan control circuit that performs scanning by controlling the voltage applied to the quadrupole rod 16, and 28 is a circuit that applies DC voltage and high frequency voltage to the quadrupole rod 16 under the control of this scan control circuit 26. R-F (high frequency) 1! It is the source. Although the above functions of scan control circuit 26 and R-F power supply 28 are the same as those provided in conventional quadrupole mass spectrometers.

本実施例においては走査制御回路26は微分回路24の
出力信号を入力し、その入力信号が正の一定値以上にな
るとその信号をトリガーとしてR・F電源28による走
査を開始し、またその入力信号が負の一定値以下になる
とその信号をトリガーとしてR−F電源28による走査
を停止する機能も備えている。
In this embodiment, the scan control circuit 26 inputs the output signal of the differentiating circuit 24, and when the input signal exceeds a certain positive value, the signal is used as a trigger to start scanning by the R/F power supply 28, and the input It also has a function of stopping scanning by the RF power supply 28 using the signal as a trigger when the signal becomes less than a certain negative value.

微分回路24と走査制御回路26により、本発明におい
て誘導結合プラズマからの光の変化により質量分析計の
動作を開始、又は停止させる制御回路を摺成している。
The differentiating circuit 24 and the scanning control circuit 26 form a control circuit in the present invention that starts or stops the operation of the mass spectrometer depending on changes in light from the inductively coupled plasma.

次に本実施例の動作を説明すると、誘導結合プラズマ中
のイオンは、サンプリングノズル8で採取された後、収
束レンズ系12で収束作用をうけて四重極ロッド16の
間に導かれ、四重極ロッド16で質量分離された後、デ
ィフレクタ19で偏向されて二次電子増倍管18に達す
る。
Next, the operation of this embodiment will be described. After the ions in the inductively coupled plasma are collected by the sampling nozzle 8, they are converged by the converging lens system 12 and guided between the quadrupole rods 16. After being mass separated by the heavy pole rod 16, it is deflected by the deflector 19 and reaches the secondary electron multiplier tube 18.

一方、誘導結合プラズマからの光は直進してフォトダイ
オード20に達し、フォトダイオード20で電気信号に
変換される。光の強度変化を検出するために、フォトダ
イオード20の出力信号は増幅器22で増幅され、微分
回路24を通った後、走査制御回路26に導かれる。走
査制御回路26では、微分回路24から得られる出力信
号をトリガーとしてR−F電源28の走査を開始したり
停止したりする。
On the other hand, light from the inductively coupled plasma travels straight and reaches the photodiode 20, where it is converted into an electrical signal. In order to detect changes in light intensity, the output signal of the photodiode 20 is amplified by an amplifier 22, passes through a differentiating circuit 24, and then is guided to a scanning control circuit 26. The scan control circuit 26 uses the output signal obtained from the differentiating circuit 24 as a trigger to start or stop scanning of the RF power supply 28 .

本実施例では光検出器20が四重極ロンド16間の中心
軸上に設けられているので、プラズマの光量変化を最も
有効に検出することができる。しかし、光検出器20は
例えばレンズ系部10や試料採取部6内でプラズマから
の光の散泌3受ける位置に設けることもできる。
In this embodiment, since the photodetector 20 is provided on the central axis between the quadrupole rondos 16, changes in the amount of plasma light can be detected most effectively. However, the photodetector 20 can also be provided, for example, in the lens system section 10 or the sample collection section 6 at a position where it receives the emission 3 of light from the plasma.

(発明の効果) 本発明の誘導結合プラズマ質量分析装置は、キャリヤガ
スだけのプラズマを発生した直後から、質量分析計内に
設けた光検出器でプラズマからの光の光量をモニターす
る。試料導入に伴ない光量が変化するからこの光量の変
化をJR量分析計の走査開始信号として利用し、マスス
ペクトルの測定を自動的に始、め、また、マススペクト
ルの測定状態で試料導入を停止した場合、モニターして
いる光量変化を質量分析計の走査停止信号として用い、
マススペクトルの測定を終るように構成されたものであ
る。
(Effects of the Invention) The inductively coupled plasma mass spectrometer of the present invention monitors the amount of light from the plasma using a photodetector provided within the mass spectrometer immediately after generating plasma of only carrier gas. Since the light intensity changes as the sample is introduced, this change in light intensity is used as a scanning start signal for the JR quantity analyzer to automatically start mass spectrum measurement, and the sample can be introduced while the mass spectrum is being measured. When it stops, the monitored light intensity change is used as a scan stop signal for the mass spectrometer,
It is configured to complete mass spectrum measurements.

その結果、次のような効果を実現することができる。As a result, the following effects can be achieved.

(1)測定操作が自動化できる。(1) Measurement operations can be automated.

(2)測定が迅速化される。(2) Measurement is made faster.

(3)測定に際し、操作者にかかる負担を軽減すること
ができる。
(3) The burden placed on the operator during measurement can be reduced.

【図面の簡単な説明】[Brief explanation of the drawing]

図は本発明の一実施例を示す概略端面図である。 2・・・・・・誘導結合プラズマ用トーチ、6・・・・
・・試料採取部、 lO・・・・・・レンズ系部、 14・・・・・・分析部、 18・・・・・・二次電子増倍管、 20・・・・・・フォトダイオード、 22・・・・・・増幅器、 24・・・・・・微分回路、 26・・・・・・走査制御回路、 28・・・・・・R−F電源。
The figure is a schematic end view showing one embodiment of the present invention. 2... Torch for inductively coupled plasma, 6...
...Sample collection section, lO...Lens system section, 14...Analysis section, 18...Secondary electron multiplier, 20...Photodiode , 22...Amplifier, 24...Differential circuit, 26...Scan control circuit, 28...R-F power supply.

Claims (1)

【特許請求の範囲】[Claims] (1)誘導結合プラズマをイオン源として、その誘導結
合プラズマ中のイオンを質量分析計で検出する装置にお
いて、 装置内で前記誘導結合プラズマからの光を受光できる位
置に光検出器を設けるとともに、 この光検出器の検出強度が設定値以上になると前記質量
分析計の動作を開始させ、この光検出器の検出強度が設
定値未満になると前記質量分析計の動作を停止させる制
御回路を設けたことを特徴とする誘導結合プラズマ質量
分析装置。
(1) In an apparatus that uses inductively coupled plasma as an ion source and detects ions in the inductively coupled plasma with a mass spectrometer, a photodetector is provided in the apparatus at a position where it can receive light from the inductively coupled plasma, and A control circuit is provided that starts the operation of the mass spectrometer when the detection intensity of the photodetector exceeds a set value, and stops the operation of the mass spectrometer when the detection intensity of the photodetector becomes less than the set value. An inductively coupled plasma mass spectrometer characterized by:
JP60165277A 1985-07-25 1985-07-25 Inductive coupling plasma mass spectrograph Pending JPS6226757A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60165277A JPS6226757A (en) 1985-07-25 1985-07-25 Inductive coupling plasma mass spectrograph

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60165277A JPS6226757A (en) 1985-07-25 1985-07-25 Inductive coupling plasma mass spectrograph

Publications (1)

Publication Number Publication Date
JPS6226757A true JPS6226757A (en) 1987-02-04

Family

ID=15809271

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60165277A Pending JPS6226757A (en) 1985-07-25 1985-07-25 Inductive coupling plasma mass spectrograph

Country Status (1)

Country Link
JP (1) JPS6226757A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS646352A (en) * 1987-06-29 1989-01-10 Yokogawa Electric Corp High-frequency inductive coupling plasma mass spectrometer
JPH01130253U (en) * 1988-02-29 1989-09-05
DE3937547A1 (en) * 1988-11-11 1990-05-17 Hitachi Ltd PLASMA MASS SPECTROMETER
EP0395202A2 (en) * 1989-03-07 1990-10-31 Canon Kabushiki Kaisha Output apparatus
JPH03105841A (en) * 1989-09-20 1991-05-02 Hitachi Ltd Mass spectrometry and its device
US5051584A (en) * 1989-01-30 1991-09-24 Vg Instruments Group Limited Plasma mass spectrometer
US5495107A (en) * 1994-04-06 1996-02-27 Thermo Jarrell Ash Corporation Analysis
GB2587055A (en) * 2019-05-31 2021-03-17 Micromass Ltd Ion guide

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS646352A (en) * 1987-06-29 1989-01-10 Yokogawa Electric Corp High-frequency inductive coupling plasma mass spectrometer
JPH01130253U (en) * 1988-02-29 1989-09-05
DE3937547A1 (en) * 1988-11-11 1990-05-17 Hitachi Ltd PLASMA MASS SPECTROMETER
US5051584A (en) * 1989-01-30 1991-09-24 Vg Instruments Group Limited Plasma mass spectrometer
EP0395202A2 (en) * 1989-03-07 1990-10-31 Canon Kabushiki Kaisha Output apparatus
JPH03105841A (en) * 1989-09-20 1991-05-02 Hitachi Ltd Mass spectrometry and its device
US5495107A (en) * 1994-04-06 1996-02-27 Thermo Jarrell Ash Corporation Analysis
GB2587055A (en) * 2019-05-31 2021-03-17 Micromass Ltd Ion guide
GB2587055B (en) * 2019-05-31 2021-12-01 Micromass Ltd Ion guide
US12112935B2 (en) 2019-05-31 2024-10-08 Micromass Uk Limited Ion guide

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