JPS622576B2 - - Google Patents
Info
- Publication number
- JPS622576B2 JPS622576B2 JP13083279A JP13083279A JPS622576B2 JP S622576 B2 JPS622576 B2 JP S622576B2 JP 13083279 A JP13083279 A JP 13083279A JP 13083279 A JP13083279 A JP 13083279A JP S622576 B2 JPS622576 B2 JP S622576B2
- Authority
- JP
- Japan
- Prior art keywords
- xylene
- toluic acid
- liquid
- aqueous solution
- acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- ZWLPBLYKEWSWPD-UHFFFAOYSA-N o-toluic acid Chemical compound CC1=CC=CC=C1C(O)=O ZWLPBLYKEWSWPD-UHFFFAOYSA-N 0.000 claims description 56
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical group CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 claims description 52
- 238000007254 oxidation reaction Methods 0.000 claims description 35
- 239000007788 liquid Substances 0.000 claims description 33
- 238000000034 method Methods 0.000 claims description 27
- 230000003647 oxidation Effects 0.000 claims description 18
- 238000001953 recrystallisation Methods 0.000 claims description 16
- 239000007864 aqueous solution Substances 0.000 claims description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 14
- 239000007795 chemical reaction product Substances 0.000 claims description 12
- 239000007791 liquid phase Substances 0.000 claims description 12
- 239000007789 gas Substances 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 239000000047 product Substances 0.000 claims description 6
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims description 4
- 229910001882 dioxygen Inorganic materials 0.000 claims description 4
- 238000001914 filtration Methods 0.000 claims description 4
- 229910052783 alkali metal Inorganic materials 0.000 claims description 2
- 150000001340 alkali metals Chemical class 0.000 claims description 2
- 150000004649 carbonic acid derivatives Chemical class 0.000 claims description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical class [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 claims 1
- 239000000061 acid fraction Substances 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- WNZQDUSMALZDQF-UHFFFAOYSA-N 2-benzofuran-1(3H)-one Chemical compound C1=CC=C2C(=O)OCC2=C1 WNZQDUSMALZDQF-UHFFFAOYSA-N 0.000 description 38
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 34
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 18
- 239000006227 byproduct Substances 0.000 description 17
- 239000000203 mixture Substances 0.000 description 11
- 239000005711 Benzoic acid Substances 0.000 description 9
- 235000010233 benzoic acid Nutrition 0.000 description 9
- 238000006243 chemical reaction Methods 0.000 description 8
- 239000008096 xylene Substances 0.000 description 7
- 238000004821 distillation Methods 0.000 description 6
- 238000000746 purification Methods 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- 238000010992 reflux Methods 0.000 description 5
- 239000002994 raw material Substances 0.000 description 4
- 238000000926 separation method Methods 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 238000007599 discharging Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910001385 heavy metal Inorganic materials 0.000 description 2
- 229910052748 manganese Inorganic materials 0.000 description 2
- 239000011572 manganese Substances 0.000 description 2
- GEMHFKXPOCTAIP-UHFFFAOYSA-N n,n-dimethyl-n'-phenylcarbamimidoyl chloride Chemical compound CN(C)C(Cl)=NC1=CC=CC=C1 GEMHFKXPOCTAIP-UHFFFAOYSA-N 0.000 description 2
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 2
- BTFQKIATRPGRBS-UHFFFAOYSA-N o-tolualdehyde Chemical compound CC1=CC=CC=C1C=O BTFQKIATRPGRBS-UHFFFAOYSA-N 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000000049 pigment Substances 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 238000000859 sublimation Methods 0.000 description 2
- 230000008022 sublimation Effects 0.000 description 2
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 239000003905 agrochemical Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 150000007514 bases Chemical class 0.000 description 1
- 239000003637 basic solution Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 229940079593 drug Drugs 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 239000007850 fluorescent dye Substances 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- -1 ligroin Chemical compound 0.000 description 1
- 238000000622 liquid--liquid extraction Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 230000003449 preventive effect Effects 0.000 description 1
- 238000000638 solvent extraction Methods 0.000 description 1
- 238000005292 vacuum distillation Methods 0.000 description 1
Landscapes
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Description
本発明は、高純度O−トルイル酸の製造方法に
関するものである。詳しく述べると、O−キシレ
ンを分子状酸素含有ガスにより高温、高圧下で液
相酸化して得られる酸化生成物をO−キシレンで
再結晶により精製する方法において、過分離し
たO−トルイル酸含有液を水または塩基性水溶
液で処理し、ついでこのO−トルイル酸含有液
を酸化反応に供することにより行なわれる高純度
O−トルイル酸の製造方法に関するものである。
O−トルイル酸は、螢光染料、感光色素、防錆
剤、顔料、農薬、医薬等の原料として広く利用さ
れているが、ある種の用途には、高純度のO−ト
ルイル酸が必要とされている。
O−トルイル酸の製造方法としては、O−キシ
レンをコバルト、マンガン等の重金属塩を触媒と
して高温、高圧下で空気または酸素含有ガスによ
り液相酸化する方法が知られている〔Journal of
American Society 71,1742(1949)〕。しかしな
がら、この方法では、酸化に際して多種の副生成
物が多量に生成すので、O−トルイル酸の精製が
必要である。すなわち、O−キシレンの液相酸化
により得られるO−トルイル酸には、O−フタル
酸、安息香酸等の酸性副生物、O−トルイルアル
コール、O−トルイルアルデヒド、フタリドおよ
びその他未確認の副生物が生ずる。
このような副生物を含有する粗製O−トルイル
酸の精製方法が考えられる。例えば前記粗製O−
トルイル酸を蒸留または昇華により精製すれば得
られるO−トルイル酸には沸点の近以した多量の
フタリド、O−フタル酸の他に未確認副生物が混
入するので、高純度のO−トルイル酸を得ること
は不可能である。また、溶媒再結晶法による精製
法では、選択的にO−トルイル酸をこれら副生成
物から単離、除去するのに適当な溶媒は見あたら
ない。例えば、n−ヘキサン、リグロイン、シク
ロヘキサン等のような脂肪族炭化水素では副生成
物の除去が十分でなく、一方、メタノール、エタ
ノール、イソプロパノール、プタノール等のアル
コール類、酢酸メチル、酢酸エチル等のエステル
類、アセトン、メチルエチルケトン、メチルイソ
ブチルケトン等のケトン類、ベンゼン、トルエ
ン、キシレン等の芳香族炭化水素では副生成物の
除去には有効な溶媒であるが、O−トルイル酸の
損失が大きく、また溶媒の回収には多大なエネル
ギーを消費するので、有利な方法とはいえない。
本発明者らは、前記再結晶法において溶媒とし
てO−キシレンの使用について検討を行なつたと
ころ、つぎのごとき知見を得た。すなわち、20〜
80%の変換率でO−キシレンを液相酸化して得ら
れた反応生成液から蒸留により未反応O−キシレ
ンを回収した反応生成物には、2〜10%のO−フ
タル酸およびフタリドや安息香酸、その他未確認
副生成物が不純物として混在している。この反応
生成物は単なる精留または昇華により精製しても
前記O−フタル酸およびフタリドが混入して高純
度のO−トルイル酸は得られない。しかして、こ
のような酸化反応生成物の再結晶精製溶媒として
O−キシレンを使用したところ、その精製能力に
よりO−トルイル酸は高純度で得られるが、O−
トルイル酸に対する溶解度が高く(40℃において
O−キシレン100gは32gのO−トルイル酸を溶解
し、30℃においては20gを溶解)、液の回収お
よびO−トルイル酸の損失がく、O−トルイル酸
の精製収率は非常に低いのである。このため、O
−トルイル酸の精製収率を高めるためには、なお
多量のO−トルイル酸を含有する液からO−ト
ルイル酸を分離回収する必要がある。しかるに、
この液中にはO−トルイル酸と沸点の近似した
フタリドが多量含されているので、その分離はほ
とんど不可能に近い。したがつて、再結晶法では
精製収率が低く、コスト高とならざるを得なかつ
た。
本発明は、前記のごとき方法の諸欠点を解消す
るためになされたもので、O−キシレンを分子状
酸素含有ガスにより液相酸化し、得られる酸化反
応生成物をO−キシレンで再結晶晶化し、過し
て高純度O−トルイル酸を得るとともに、液を
水または塩基性水溶液で処理して水性層と油層と
に分離し、ついで該油層を前記酸化工程に循環し
て酸化反応に供することを特徴とする高純度O−
トルイル酸の製造方法である。
つぎに、図面を参照しつつ本発明方法を詳細に
説明する。
本発明方法において、酸化工程は、従来使用さ
れている液相酸化条件のいずれも使用できる。例
えば、O−キシレン120〜180℃の温度、2〜30
Kg/cm2Gの圧力下にコバルト、マンガン等の重金
属塩を触媒として使用して空気、酸素含有ガス等
の分子状酸素含有ガスにより液相酸化することに
より行なわれる。
O−キシレンの転換率は通常20〜80%である
が、例えば20〜40%というように比較的低転換率
の場合には、O−フタル酸やフタリド副生が比較
的少ないので、第1図に示すように酸化反応工程
で得られる酸化反応生成液にO−キシレンを添加
して再結晶を行ない、これを過してケーキと
液とに分離する。この液中は、反応副生物であ
るフタリド、O−フタル酸、安息香酸の他に、O
−トルイル酸もO−キシレンの溶解度に相当する
分だけ溶解して存在する。この液に、水または
塩基性水溶液を加えて処理を行ない、分液すると
油層と水性層とに分離するので、この水性層を排
出させることによりO−フタル酸、安息香酸等の
水性副生物は分離除去される。
水または塩基性水溶液処理工程において、処理
液として水のみを用いる場合には、液重量に対
して0.3〜10倍量を数回に分離して用いるが、塩
基性水溶液を用いる方がより効果的である。塩基
性水溶液としては、アルカリ金属またはアンモニ
アの水酸化物、酸化物、アルコラート、炭酸塩等
が用いられる。その使用量は、液中に、副生物
のうちO−フタル酸を基準に決定され、O−フタ
ル酸1モルに対し1〜30モル、好ましくは1.3〜
3モルである。塩基性水溶液の過多は処理効果に
有効ではあるが、それはO−トルイル酸の損失を
もたらすので経済的ではない。塩基性水溶液の濃
度は特に限定されるべきではないが、分離の操作
効果および排液量の点から、好ましい濃度は5〜
20重量%である。
分液操作は回分式でもあるいは連続式でも行な
うことができ、回分式の場合には撹拌と静置が、
また連続式の場合には並流または向流式に通常行
なわれる液液抽出法が適用でき、接触時間は3分
間〜2時間、好ましくは10分間〜1時間である。
処理温度および圧力は、処理系内が液相を保てる
条件であればよい。塩基性溶液としてアルコラー
トを用いる場合には、接触操作の完了後に水を加
えて水性層と油層の2層に分離させる。分離した
油層は、O−キシレン、O−トルイル酸およびフ
タリドを含有しており、これは酸化工程に循環さ
れる。
一方、再結晶、過工程で分離されたケーキは
高純度のO−トルイル酸であるが、さらに必要に
より蒸留を行なつてO−キシレンおよび釡残を分
離除去するかあるいは乾燥してO−キシレンを分
離除去することもできる。
また、例えば40〜80%というような比較的高転
化率でO−キシレンを酸化してO−トルイル酸を
製造する場合には、第2図に示すように、酸化反
応工程で得られる酸化反応生成液を蒸留してO−
キシレン、粗O−トルイル酸および釡残に分離
し、粗O−トルイル酸にO−キシレンを添加して
再結晶を行ない。これを過してケーキと液と
に分離する。この液中には、反応副生物である
フタリド、O−フタル酸、安息香酸等の他に、O
−トルイル酸もO−キシレンの溶解度に相当する
分だけ溶解して存在する。この液に、水または
塩基性水溶液を加えて処理を行ない。分液すると
油層と水性層とに分離するので、この水性層を排
出させることによりO−フタル酸、安息香酸等の
水性副生物は分離除去される。しかして、水また
は塩基性水溶液処理工程における条件、例えば水
の量、塩基性化合物の種類および濃度、O−フタ
ル酸に対するモル比等は第1図の方法の場合と同
様である。また、分液操作条件についても第1図
の方法の場合と同様である。分離した油層は、O
−キシレン、O−トルイル酸およびフタリドを含
有しており、これは酸化工程へ循環される。
一方、再結晶・過工程で分離されたケーキは
高純度のO−トルイル酸であるのでそのまま使用
できるが、さらに必要によりO−キシレンを添加
して再結晶および過を行ない、分離した液は
酸化工程へ循環し、ケーキは蒸留を行なつてO−
キシレンおよび釡残を分離するかあるいは乾燥し
てO−キシレンを分離除去することもできる。
第1〜2図のいずれの方法の場合にも、酸化工
程に循環された液を新たなO−キシレンと混合
して行なう酸化反応条件はO−キシレンのみを原
料とする場合と同じ条件であり、ほぼ同様な収率
でO−トルイル酸が生成する。副生物としてはフ
タリドのみが増加するが、これは前記のようにO
−キシレンによる再結晶で充分精製できる。また
反応におけるフタリドの増加については、液中
のフタリド濃度が15%を超えるものを酸化した場
合には、この量以上には増加しないことが研究の
結果明らかとなつた。このため、液を酸化工程
へ循環使用すれば、前記数値に達した後にはフタ
リドは実質的に副生しないことになり、全体とし
てO−トルイル酸の収率は増大することになる。
したがつて、本発明方法によれば、O−キシレ
ンの酸化反応生成物は、原料であるO−キシレン
による再結晶法で高純度のO−トルイル酸を製造
でき、かつ液に分配されるO−トルイル酸は再
度酸化反応工程へ循環使用されるので、損失する
ことなく目的を達成できる。
つぎに、実施例を挙げて本発明方法をさらに詳
細に説明する。なお、下記実施例における部は、
特にことわらない限りすべて重量による。生成物
の組成はガスクロマトグラフイーにより分析し、
面積%で示した。
実施例 1
ナフテン酸コバルトの存在下で150℃の温度、
7Kg/cm2Gの圧力下にO−キシレン(純度99.2
%)を空気により液相酸化したところ、得られた
酸化反応生成物は第1表Aの組成を示した。この
酸化反応生成物を液温145〜240℃で常圧蒸留して
未反応O−キシレンを回収した。蒸留残渣を50〜
100mmHgの減圧下に還流比5で精留したところ、
得られた留出物は第1表Bの組成を示した。一
方、減圧蒸留を無還流で行なつたときは、第1表
Cの組成を示した。
減圧蒸留を無還流で行なつた留出物100部に対
し、O−キシレン100部を添加して加熱、溶解さ
せたのち、40℃に冷却して再結晶化し、過によ
り分離してO−トルイル酸ケーキ91部と液108
部とを得た。得られたO−トルイル酸ケーキに65
部のO−キシレンを添加して加熱、溶解し、40℃
に冷却して再結晶化し、過分離してO−トルイ
ル酸ケーキ63部を得た。このケーキは減圧蒸留
(第2表D)または乾燥(第2表E)によりO−
キシレンと分離され、得られた精製O−トルイル
酸の組成は、第2表に示す結果となつた。
O−トルイル酸の再結晶により得られた液
108部には、O−トルイル酸13.4%、フタル酸2.8
%およびフタリド4.9%を含んでいた。この液
に108部の水を添加して90℃で1時間撹拌し、静
置して2層に分離した。この操作を2回繰返し、
O−キシレン層104部を得た。これにはO−トル
イル酸13.1%、フタル酸1.7%およびフタリド4.8
%を含んでいた。このO−キシレン層を上記の反
応条件で再度酸化し、得られた酸化反応生成物を
無還流下に減圧蒸留したところ、得られた留出物
の組成は第3表Fに示す結果となつた。このもの
を上記のごとく再結晶化し、ケーキを減圧蒸留し
たところ、得られた精製O−トルイル酸の組成は
第3表Gに示す結果となつた。
The present invention relates to a method for producing high purity O-toluic acid. Specifically, in the method of purifying the oxidation product obtained by liquid-phase oxidation of O-xylene with molecular oxygen-containing gas at high temperature and high pressure by recrystallization with O-xylene, over-separated O-toluic acid-containing The present invention relates to a method for producing high-purity O-toluic acid, which is carried out by treating a liquid with water or a basic aqueous solution, and then subjecting this O-toluic acid-containing liquid to an oxidation reaction. O-toluic acid is widely used as a raw material for fluorescent dyes, photosensitive pigments, rust preventives, pigments, agricultural chemicals, medicines, etc., but for certain applications, highly purified O-toluic acid is required. has been done. As a method for producing O-toluic acid, a method is known in which O-xylene is oxidized in a liquid phase with air or an oxygen-containing gas at high temperature and pressure using a heavy metal salt such as cobalt or manganese as a catalyst [Journal of
American Society 71, 1742 (1949)]. However, in this method, a large amount of various by-products are produced during oxidation, so it is necessary to purify O-toluic acid. That is, O-toluic acid obtained by liquid phase oxidation of O-xylene contains acidic byproducts such as O-phthalic acid and benzoic acid, O-toluyl alcohol, O-tolyaldehyde, phthalide, and other unidentified byproducts. arise. A method for purifying crude O-toluic acid containing such by-products is possible. For example, the crude O-
If toluic acid is purified by distillation or sublimation, the O-toluic acid obtained will contain a large amount of phthalide and O-phthalic acid, which have boiling points close to each other, as well as unidentified byproducts. It is impossible to obtain. Furthermore, in the purification method using solvent recrystallization, no solvent suitable for selectively isolating and removing O-toluic acid from these by-products has been found. For example, with aliphatic hydrocarbons such as n-hexane, ligroin, cyclohexane, etc., removal of by-products is not sufficient; on the other hand, alcohols such as methanol, ethanol, isopropanol, butanol, and esters such as methyl acetate, ethyl acetate, etc. Ketones such as acetone, methyl ethyl ketone, and methyl isobutyl ketone, and aromatic hydrocarbons such as benzene, toluene, and xylene are effective solvents for removing byproducts, but they cause a large loss of O-toluic acid, and Since a large amount of energy is consumed to recover the solvent, it is not an advantageous method. The present inventors investigated the use of O-xylene as a solvent in the recrystallization method and found the following findings. That is, 20~
The reaction product obtained by recovering unreacted O-xylene by distillation from the reaction product liquid obtained by liquid-phase oxidation of O-xylene at a conversion rate of 80% contains 2 to 10% O-phthalic acid and phthalide. Benzoic acid and other unidentified byproducts are present as impurities. Even if this reaction product is purified by simple rectification or sublimation, it will not be possible to obtain highly pure O-toluic acid due to the contamination of the O-phthalic acid and phthalide. However, when O-xylene is used as a recrystallization purification solvent for such oxidation reaction products, O-toluic acid can be obtained with high purity due to its purification ability, but O-
It has high solubility in toluic acid (100 g of O-toluic acid dissolves 32 g of O-toluic acid at 40°C, and 20 g of O-toluic acid at 30°C), making it difficult to recover the liquid and lose O-toluic acid. The purification yield is very low. For this reason, O
- In order to increase the purification yield of toluic acid, it is necessary to separate and recover O-toluic acid from a liquid containing a large amount of O-toluic acid. However,
Since this liquid contains a large amount of phthalide, which has a boiling point similar to that of O-toluic acid, it is almost impossible to separate it. Therefore, in the recrystallization method, the purification yield is low and the cost is high. The present invention was made in order to eliminate the various drawbacks of the above-mentioned methods.O-xylene is oxidized in a liquid phase using a molecular oxygen-containing gas, and the resulting oxidation reaction product is recrystallized with O-xylene. The solution is treated with water or a basic aqueous solution to separate into an aqueous layer and an oil layer, and then the oil layer is recycled to the oxidation step to undergo an oxidation reaction. High purity O-
This is a method for producing toluic acid. Next, the method of the present invention will be explained in detail with reference to the drawings. In the method of the present invention, any conventional liquid phase oxidation conditions can be used in the oxidation step. For example, O-xylene temperature of 120-180℃, 2-30℃
This is carried out by liquid phase oxidation using a molecular oxygen-containing gas such as air or oxygen-containing gas under a pressure of Kg/cm 2 G using a heavy metal salt such as cobalt or manganese as a catalyst. The conversion rate of O-xylene is usually 20 to 80%, but when the conversion rate is relatively low, for example 20 to 40%, O-phthalic acid and phthalide by-products are relatively small, so the first As shown in the figure, O-xylene is added to the oxidation reaction product liquid obtained in the oxidation reaction step to perform recrystallization, and the liquid is separated into a cake and a liquid. In this liquid, in addition to the reaction by-products phthalide, O-phthalic acid, and benzoic acid, O
-Toluic acid also exists dissolved in an amount corresponding to the solubility of O-xylene. This liquid is treated by adding water or a basic aqueous solution and separated into an oil layer and an aqueous layer. By discharging this aqueous layer, aqueous by-products such as O-phthalic acid and benzoic acid are removed. Separated and removed. In the water or basic aqueous solution treatment process, when only water is used as the treatment liquid, 0.3 to 10 times the weight of the liquid is separated and used several times, but it is more effective to use a basic aqueous solution. It is. As the basic aqueous solution, hydroxides, oxides, alcoholates, carbonates, etc. of alkali metals or ammonia are used. The amount used is determined based on O-phthalic acid among the by-products in the liquid, and is 1 to 30 mol, preferably 1.3 to 30 mol, per 1 mol of O-phthalic acid.
It is 3 moles. Although using too much basic aqueous solution is effective for the treatment effect, it is not economical because it results in the loss of O-toluic acid. The concentration of the basic aqueous solution should not be particularly limited, but from the viewpoint of separation operation effects and drainage volume, the preferred concentration is 5 to 5.
It is 20% by weight. The liquid separation operation can be performed either batchwise or continuously. In the case of a batchwise method, stirring and standing are
Further, in the case of a continuous type, a liquid-liquid extraction method commonly carried out in a cocurrent or countercurrent type can be applied, and the contact time is 3 minutes to 2 hours, preferably 10 minutes to 1 hour.
The processing temperature and pressure may be such that the inside of the processing system can maintain a liquid phase. When an alcoholate is used as the basic solution, water is added after the contacting operation is completed to separate it into two layers: an aqueous layer and an oil layer. The separated oil layer contains O-xylene, O-toluic acid and phthalide, which is recycled to the oxidation step. On the other hand, the cake separated in the recrystallization and pass steps is highly pure O-toluic acid, but if necessary, it is further distilled to separate and remove O-xylene and the residue, or dried to remove O-xylene. can also be separated and removed. In addition, when producing O-toluic acid by oxidizing O-xylene at a relatively high conversion rate such as 40 to 80%, as shown in Figure 2, the oxidation reaction obtained in the oxidation reaction step Distill the product liquid to obtain O-
Separate into xylene, crude O-toluic acid and residue, and recrystallize by adding O-xylene to the crude O-toluic acid. Through this, the cake and liquid are separated. This liquid contains reaction by-products such as phthalide, O-phthalic acid, and benzoic acid, as well as O-
-Toluic acid also exists dissolved in an amount corresponding to the solubility of O-xylene. Water or a basic aqueous solution is added to this liquid for treatment. When the liquid is separated, it is separated into an oil layer and an aqueous layer, and by discharging this aqueous layer, aqueous by-products such as O-phthalic acid and benzoic acid are separated and removed. The conditions in the water or basic aqueous solution treatment step, such as the amount of water, the type and concentration of the basic compound, the molar ratio to O-phthalic acid, etc., are the same as in the method of FIG. Further, the liquid separation operation conditions are also the same as in the method shown in FIG. The separated oil layer is O
-xylene, O-toluic acid and phthalide, which are recycled to the oxidation step. On the other hand, the cake separated in the recrystallization and filtration process is highly pure O-toluic acid and can be used as is, but if necessary, O-xylene is added and recrystallization and filtration are performed, and the separated liquid is oxidized. The cake is circulated to the process and distilled to O-
O-xylene can also be separated and removed by separating xylene and bottom residue or by drying. In any of the methods shown in Figures 1 and 2, the oxidation reaction conditions in which the liquid circulated in the oxidation process is mixed with fresh O-xylene are the same as in the case where only O-xylene is used as the raw material. , O-toluic acid is produced in approximately similar yields. Only phthalide increases as a by-product, but this is due to O
-Can be sufficiently purified by recrystallization with xylene. Regarding the increase in phthalide in the reaction, research has revealed that if the phthalide concentration in the liquid exceeds 15% and is oxidized, the amount will not increase beyond this amount. Therefore, if the liquid is recycled to the oxidation step, substantially no phthalide will be produced as a by-product after the above value is reached, and the overall yield of O-toluic acid will increase. Therefore, according to the method of the present invention, high purity O-toluic acid can be produced from the oxidation reaction product of O-xylene by the recrystallization method using O-xylene as a raw material, and the O-toluic acid distributed in the liquid is - Toluic acid is recycled to the oxidation reaction process again, so the purpose can be achieved without loss. Next, the method of the present invention will be explained in more detail with reference to Examples. In addition, the parts in the following examples are:
All prices are based on weight unless otherwise noted. The composition of the product was analyzed by gas chromatography.
Expressed in area%. Example 1 A temperature of 150° C. in the presence of cobalt naphthenate,
O - xylene (purity 99.2
%) was subjected to liquid phase oxidation using air, and the resulting oxidation reaction product had the composition shown in Table 1A. This oxidation reaction product was distilled under normal pressure at a liquid temperature of 145 to 240°C to recover unreacted O-xylene. Distillation residue from 50 to
When rectified at a reflux ratio of 5 under reduced pressure of 100 mmHg,
The resulting distillate had the composition shown in Table 1B. On the other hand, when vacuum distillation was carried out without reflux, the composition shown in Table 1 C was obtained. 100 parts of O-xylene was added to 100 parts of the distillate obtained by distillation under reduced pressure without reflux, heated and dissolved, cooled to 40°C, recrystallized, separated by filtration, and O- Toluic acid cake 91 parts and liquid 108 parts
I got the part. 65 to the obtained O-toluic acid cake.
Add part of O-xylene and heat to dissolve at 40℃.
The mixture was cooled to 50°C, recrystallized, and subjected to overseparation to obtain 63 parts of O-toluic acid cake. This cake can be prepared by distillation under reduced pressure (Table 2 D) or by drying (Table 2 E).
The composition of the purified O-toluic acid obtained after separation from xylene was as shown in Table 2. Liquid obtained by recrystallization of O-toluic acid
108 parts contains 13.4% O-toluic acid and 2.8% phthalic acid.
% and 4.9% phthalide. 108 parts of water was added to this liquid, stirred at 90°C for 1 hour, and allowed to stand to separate into two layers. Repeat this operation twice,
104 parts of O-xylene layer was obtained. This includes 13.1% O-toluic acid, 1.7% phthalic acid and 4.8% phthalide.
It contained %. This O-xylene layer was oxidized again under the above reaction conditions, and the resulting oxidation reaction product was distilled under reduced pressure without reflux. The composition of the resulting distillate was as shown in Table 3 F. Ta. When this product was recrystallized as described above and the cake was distilled under reduced pressure, the composition of the purified O-toluic acid obtained was as shown in Table 3 G.
【表】【table】
【表】
よる
E乾燥による 99.0 0.6 0.2 0.2 47
[Table] Depends
Due to E drying 99.0 0.6 0.2 0.2 47
【表】
実施例 2〜8
実施例1の方法において、再結晶液の洗浄に
塩基性水溶液を用いて水層とO−キシレン層とに
いつたん分離し、O−キシレン層の20重量%の水
を用いて再洗浄して分離したところ、O−キシレ
ン層の組成は第4表のとおりであつた。[Table] Examples 2 to 8 In the method of Example 1, a basic aqueous solution was used to wash the recrystallization liquid, and the aqueous layer and O-xylene layer were separated, and 20% by weight of the O-xylene layer was When the mixture was washed again with water and separated, the composition of the O-xylene layer was as shown in Table 4.
【表】
実施例 9
実施例4に準じて得られた洗浄O−キシレンの
組成値は、O−キシレン73.0%、O−トルイル酸
13.7%、フタル酸1.2%、フタリド4.7%、O−ト
ルイルアルデヒド1.6%、安息香酸0.6%およびそ
の他5.2%であつた。これの1725部を、ナフテン
酸コバルトを触媒として140℃の温度、6Kg/cm2
の圧力下に空気により液相酸化し、酸化反応生成
物1902部を得た。これから未反応O−キシレンを
回収したのち、100mmHgの減圧下に無還流で蒸留
し、留出物1032部を得た。これに回収した未反応
O−キシレン642部と新しいO−キシレン102部と
を加え、90℃に加熱して溶解させたのち40℃まで
冷却し、過分離した。得られたケーキにはさら
に新しいO−キシレン656部を加えて同様に再結
晶を繰返してケーキ755部を得た。このケーキを
常圧蒸留によりO−キシレン201部を回収したの
ち100mmHgの減圧下で蒸留して留出物540部を得
た。この精製されたO−トルイル酸の分析値は、
O−トルイル酸98.60%、O−フタル酸0.44%、
フタリド0.43%、安息香酸0.38%およびその他
0.15%であつた。
1回目の液と2回目の液1624部は、20%水
酸化ナトリウム水溶液140部と45℃の温度で30分
間接触撹拌したのち静置し、2層分離して水層
191部を排出させた。O−キシレン層には400部の
水を加え、同様に撹拌静置してO−キシレン層
1503部を得た。このものの分析値は、O−キシレ
ン78.7%、O−トルイル酸7.6%、フタル酸1.6
%、フタリド4.7%、O−トルイルアルデヒド1.9
%、安息香酸0.4%およびその他5.1%であり、酸
化原料として使用できた。[Table] Example 9 The composition values of the cleaning O-xylene obtained according to Example 4 were O-xylene 73.0%, O-toluic acid
13.7%, phthalic acid 1.2%, phthalide 4.7%, O-tolylaldehyde 1.6%, benzoic acid 0.6% and others 5.2%. 1,725 parts of this was heated to 6 kg/cm 2 at a temperature of 140°C using cobalt naphthenate as a catalyst.
Liquid phase oxidation was carried out with air under a pressure of 1,902 parts of an oxidation reaction product. After recovering unreacted O-xylene, it was distilled under reduced pressure of 100 mmHg without reflux to obtain 1032 parts of distillate. 642 parts of recovered unreacted O-xylene and 102 parts of fresh O-xylene were added thereto, heated to 90°C to dissolve, cooled to 40°C, and over-separated. To the resulting cake, 656 parts of fresh O-xylene was further added and recrystallization was repeated in the same manner to obtain 755 parts of a cake. After recovering 201 parts of O-xylene from this cake by atmospheric distillation, it was distilled under reduced pressure of 100 mmHg to obtain 540 parts of distillate. The analytical value of this purified O-toluic acid is
O-toluic acid 98.60%, O-phthalic acid 0.44%,
Phthalide 0.43%, benzoic acid 0.38% and others
It was 0.15%. 1,624 parts of the first solution and the second solution were brought into contact with 140 parts of a 20% aqueous sodium hydroxide solution at a temperature of 45°C for 30 minutes, then left to stand, and the two layers were separated to form an aqueous layer.
191 copies were released. Add 400 parts of water to the O-xylene layer, stir and let stand to form the O-xylene layer.
Obtained 1503 copies. The analysis values for this product are O-xylene 78.7%, O-toluic acid 7.6%, phthalic acid 1.6%.
%, phthalide 4.7%, O-tolylaldehyde 1.9
%, benzoic acid 0.4% and others 5.1%, which could be used as oxidation raw materials.
第1図および第2図は、本発明による高純度O
−トルイル酸の製造工程の一例を示すブロツクダ
イヤグラムである。
1 and 2 show high purity O according to the present invention.
- It is a block diagram showing an example of the manufacturing process of toluic acid.
Claims (1)
相酸化し、得られる酸化反応生成物をO−キシレ
ンで再結晶化し、過して高純度O−トルイル酸
を得るとともに、液を水または塩基性水溶液で
処理して水性層と油層とに分離し、ついで該油層
を前記酸化工程に循環して酸化反応に供すること
を特徴とするO−トルイル酸の製造方法。 2 塩基性水溶液はアルカリ金属またはアンモニ
アの水酸化物、酸化物、アルコラートおよび炭酸
塩よりなる群から選ばれた少なくとも1種の化合
物の水溶液である特許請求の範囲第1項に記載の
方法。 3 液相酸化生成物は蒸留し、O−トルイル酸留
分をO−キシレンで再結晶により精製し、その
液を水または塩基性水溶液で処理してなる特許請
求の範囲第1項または第2項に記載の方法。 4 O−キシレンによる再結晶が繰返し行なわれ
てなる特許請求の範囲第1項ないし第3項のいず
れか一つに記載の方法。[Claims] 1 O-xylene is oxidized in a liquid phase with a molecular oxygen-containing gas, the resulting oxidation reaction product is recrystallized with O-xylene, and high-purity O-toluic acid is obtained through filtration, A method for producing O-toluic acid, which comprises treating a liquid with water or a basic aqueous solution to separate it into an aqueous layer and an oil layer, and then circulating the oil layer to the oxidation step and subjecting it to an oxidation reaction. 2. The method according to claim 1, wherein the basic aqueous solution is an aqueous solution of at least one compound selected from the group consisting of alkali metal or ammonia hydroxides, oxides, alcoholates, and carbonates. 3. The liquid phase oxidation product is distilled, the O-toluic acid fraction is purified by recrystallization with O-xylene, and the liquid is treated with water or a basic aqueous solution. The method described in section. 4. The method according to any one of claims 1 to 3, wherein recrystallization with O-xylene is repeatedly performed.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13083279A JPS5655341A (en) | 1979-10-12 | 1979-10-12 | Preparation of high-purity o-toluic acid |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13083279A JPS5655341A (en) | 1979-10-12 | 1979-10-12 | Preparation of high-purity o-toluic acid |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5655341A JPS5655341A (en) | 1981-05-15 |
JPS622576B2 true JPS622576B2 (en) | 1987-01-20 |
Family
ID=15043733
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13083279A Granted JPS5655341A (en) | 1979-10-12 | 1979-10-12 | Preparation of high-purity o-toluic acid |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5655341A (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2676910B2 (en) * | 1989-05-17 | 1997-11-17 | 三菱瓦斯化学株式会社 | Method for producing high-purity 0-toluic acid |
US6242643B1 (en) * | 1996-05-17 | 2001-06-05 | Toray Industries, Inc. | Method for preparing aromatic carboxylic acids, aromatic aldehydes, and aromatic alcohols |
-
1979
- 1979-10-12 JP JP13083279A patent/JPS5655341A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5655341A (en) | 1981-05-15 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP0476009B1 (en) | Extraction process for removal of impurities from terephthalic acid filtrate | |
EP2292581B1 (en) | Extraction process for removal of impurities from mother liquor in the synthesis of terephthalic acid | |
KR100449282B1 (en) | A method for preparing aromatic carboxylic acids, aromatic aldehydes, and aromatic alcohols | |
KR100390560B1 (en) | Method for recycling catalyst in a reaction involving direct oxidation of cyclohexane to adipic acid | |
KR100658555B1 (en) | Process for Producing Pure Terephthalic Acid with Improved Recovery of Precursors, Solvent and Methyl Acetate | |
EP1104396B1 (en) | Method for recovering methyl acetate and residual acetic acid in the production of pure terephthalic acid | |
US3819659A (en) | Trimellitic acid anhydride recovery from liquid phase oxidation of pseudocumene | |
JPS622576B2 (en) | ||
US3726917A (en) | Process for preparing adipic acid | |
EP0132450B1 (en) | Method of purifying methacrylic acid | |
JP3570760B2 (en) | Method for producing 2-t-butylhydroquinone | |
JPS61106535A (en) | Recovery of benzoic acid | |
JP2697054B2 (en) | Method for producing p-hydroxybenzaldehyde | |
JPH03181440A (en) | Purification of acrylic acid by distillation | |
JP2002128729A (en) | Method for producing high-purity 4,4'- biphenyldicarboxylic acid | |
JPH01502821A (en) | Method for recovering succinic acid from a mixture of carboxylic acids other than succinic acid and succinic acid | |
JP2874281B2 (en) | Method for separating and purifying biphenyl-4,4'-diol | |
JPS63135350A (en) | Extraction separation of carboxylic acid from aqueous solution of carboxylic acid | |
JPH043370B2 (en) | ||
JPH0764777B2 (en) | Purification method of para-hydroxybenzaldehyde | |
JPH09301918A (en) | Production of aromatic carboxylic acid | |
JP2005187414A (en) | Method for producing 2-methyl-1,4-naphthoquinone | |
JPS608292A (en) | Production of cystamine salt | |
JPH0466465B2 (en) | ||
JPS62153242A (en) | Prification of methacrylic acid |