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JPS6224896Y2 - - Google Patents

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Publication number
JPS6224896Y2
JPS6224896Y2 JP1979165967U JP16596779U JPS6224896Y2 JP S6224896 Y2 JPS6224896 Y2 JP S6224896Y2 JP 1979165967 U JP1979165967 U JP 1979165967U JP 16596779 U JP16596779 U JP 16596779U JP S6224896 Y2 JPS6224896 Y2 JP S6224896Y2
Authority
JP
Japan
Prior art keywords
transparent
electrodes
display
matrix
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1979165967U
Other languages
Japanese (ja)
Other versions
JPS5682830U (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1979165967U priority Critical patent/JPS6224896Y2/ja
Publication of JPS5682830U publication Critical patent/JPS5682830U/ja
Application granted granted Critical
Publication of JPS6224896Y2 publication Critical patent/JPS6224896Y2/ja
Expired legal-status Critical Current

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  • Position Input By Displaying (AREA)

Description

【考案の詳細な説明】 本考案は各種情報処理装置に使用されるキヤラ
クター表示面、例えば各種表示器(デイスプレ
ー)の表示面上に載置され、特定の表示位置、従
つて特定のキヤラクターを摘出するために使用さ
れる透明スイツチの改良に関す。
[Detailed description of the invention] This invention is mounted on a character display surface used in various information processing devices, for example, on the display surface of various display devices, and is used to display a specific display position and therefore a specific character. Regarding improvements to transparent switches used for extraction.

この種透明スイツチは透明なスペーサをその間
に夾む上下2個の透明基板(硝子又は合成樹脂
板)上に夫々縦横に、載置される表示面の表示記
号の縦横表示ピツチに合わせて、透明なマトリツ
クス電極が蒸着されて構成され、特定の表示位置
を指で押すことにより、その位置に該当する該マ
トリツクス電極の交叉位置で直接導電的、あるい
は静電的に接続され、端部端子を介してその出力
を後続の位置検知回路に伝達する。
This type of transparent switch is a transparent switch that is placed vertically and horizontally on two transparent substrates (glass or synthetic resin plates) with transparent spacers between them, respectively, to match the vertical and horizontal display pitch of the display symbol on the display surface. It is composed of vapor-deposited matrix electrodes, and by pressing a specific display position with a finger, the intersection of the matrix electrodes corresponding to that position is directly conductively or electrostatically connected, and the display is connected via the end terminals. and transmits its output to the subsequent position sensing circuit.

第1図はこの種透明スイツチの要部を上面図イ
側断面図ロで示すもので、1は透明なガラス、或
はエポキシ樹脂板でその表示に、例えば酸化錫、
あるいは酸化インジユーム等からなる透明電極条
2が縦方向に蒸着併設され、その上に同様透明な
エポキシ樹脂膜3が電極条2を避けて、スペーサ
として設けられ、更にその上に下面に横方向に透
明電極条4を蒸着せる透明且つ可撓性の表面電極
基板5が載置されてマトリツクス電極構成として
一体化されている。
Fig. 1 shows the main parts of this type of transparent switch in a top view (a) and a side cross-sectional view (b). 1 is a transparent glass or epoxy resin plate, and the display is made of, for example, tin oxide,
Alternatively, a transparent electrode strip 2 made of indium oxide or the like is vertically vapor-deposited, and a similarly transparent epoxy resin film 3 is provided thereon as a spacer, avoiding the electrode strip 2. A transparent and flexible surface electrode substrate 5 on which transparent electrode strips 4 are deposited is placed and integrated into a matrix electrode configuration.

マトリツクス電極2,4の夫々の配列ピツチは
該透明スイツチの載置される表示板のキヤラクタ
ー6(鎖線を以て示す)の配列ピツチに等しく、
従つて各キヤラクターの中心が電極2,4の交叉
位置と一致している。
The arrangement pitch of each of the matrix electrodes 2 and 4 is equal to the arrangement pitch of the character 6 (indicated by a chain line) of the display board on which the transparent switch is mounted,
Therefore, the center of each character coincides with the intersection position of the electrodes 2 and 4.

指先7を以て交叉位置を押せば電極2,4の該
当交叉位置で電気的接触をなし、特定のA、B端
子間が導通状態となる。指先7を離せば表面の可
撓性透明基板5は自己の復元力により旧に復し、
電気的接触は解放される。
If the crossing position is pressed with the fingertip 7, electrical contact will be made at the corresponding crossing position of the electrodes 2 and 4, and the specific A and B terminals will be in a conductive state. When the fingertip 7 is released, the flexible transparent substrate 5 on the surface returns to its original state due to its own restoring force.
Electrical contact is released.

図より明らかに、交叉位置によつて端子A、B
間の電気回路長即ちパス長が異り、当然そのパス
抵抗値も異なつてくる。然して電気回路長を形成
する透明電極2,4は透明度をよくするため数ミ
クロン厚さの酸化錫、或いは酸化インジユームの
蒸着膜である故、その比抵抗もかなり大きく、交
叉位置によるパス抵抗値の相異は、後続の交叉位
置検出回路に影響を及ぼすこととなる。
It is clear from the figure that depending on the crossing position, terminals A and B
The electrical circuit lengths, that is, the path lengths between the two are different, and naturally the path resistance values are also different. However, since the transparent electrodes 2 and 4 that form the electric circuit length are made of a vapor-deposited film of tin oxide or indium oxide several microns thick to improve transparency, their specific resistance is also quite large, and the path resistance value depends on the intersection position. The difference will affect the subsequent crossover position detection circuit.

このため、後続検出回路で該透明スイツチのパ
ス抵抗の低い部分を補う補正抵抗を挿入する等の
手段が講じられていた。
For this reason, measures have been taken such as inserting a correction resistor in the subsequent detection circuit to compensate for the low pass resistance portion of the transparent switch.

然してマトリツクス電極2,4の配設数が増加
し、従つて選択キヤラクター6の数が大きくなる
程パス抵抗値の異る回路数も増える故に、パス抵
抗値の相異も数十倍に達することもあり、検出回
路内における抵抗補正手段も複雑化する。
However, as the number of matrix electrodes 2 and 4 increases and the number of selected characters 6 increases, the number of circuits with different path resistance values also increases, and the difference in path resistance values can reach several tens of times. This also complicates the resistance correction means within the detection circuit.

本考案はこの欠点を防止するため、先づ透明ス
イツチ内においてパス抵抗値を均一化せんとする
にある。
In order to prevent this drawback, the present invention first attempts to equalize the path resistance values within the transparent switch.

この目的は、それぞれ透明絶縁基板に縦横に配
設される上下の透明なマトリツクス電極の各々の
基部に、互いに形状の異なる切欠部を設けて部分
的に抵抗値の増大を図り、これによつて選択交叉
位置に関係なく略均一なパス抵抗を形成させる構
造となすことによつて達成される。
This objective is achieved by providing differently shaped notches at the base of upper and lower transparent matrix electrodes arranged vertically and horizontally on a transparent insulating substrate, thereby partially increasing the resistance value, thereby forming a structure that forms a substantially uniform path resistance regardless of the selected crossover position.

マトリツクス電極パターンは従来に比して複雑
となるがマスクを使用する蒸着工程には変りなく
所定形状のマスクを作成するだけでよい。第2図
は本考案に使用されるマトリツクス透明電極パタ
ーンの一例を示すもので縦電極B0,B1,B2……
横電極A0,A1,A2……夫々の交叉位置は選択キ
ヤラクター6上に設けられる。各電極の適当位置
に切欠部8を設け、電極パス路に高さh、長さ
の狭少部9を設けて、パス通路の抵抗値を高めて
いる。その度合は、厚さ一様な蒸着電極の場合、
長さに正比例し、高さhに反比例する。従つて
電極A0,A1,A2……,B0,B1,B2……と順次長
さを小さく、高さhを大きくすることによつて
A0,B0間、A1,B1間、A0,B1間、A1,B0間……
夫々のパス抵抗値を略等しくすることができる。
Although the matrix electrode pattern is more complicated than in the past, the vapor deposition process using a mask remains unchanged, and it is only necessary to create a mask with a predetermined shape. Figure 2 shows an example of the matrix transparent electrode pattern used in the present invention, with vertical electrodes B 0 , B 1 , B 2 . . .
The crossing positions of the horizontal electrodes A 0 , A 1 , A 2 . . . are provided on the selected character 6. A notch 8 is provided at an appropriate position in each electrode, and a narrow portion 9 with a height h and a length is provided in the electrode path to increase the resistance value of the path. The degree of this is, in the case of a deposited electrode with a uniform thickness,
It is directly proportional to the length and inversely proportional to the height h. Therefore, by sequentially decreasing the length and increasing the height h of the electrodes A 0 , A 1 , A 2 ..., B 0 , B 1 , B 2 ...
Between A 0 and B 0 , between A 1 and B 1 , between A 0 and B 1 , between A 1 and B 0 ...
The respective path resistance values can be made substantially equal.

従つてキヤラクターの数が増えても狭少部9の
形状種類もそれ程増大させる必要はない。
Therefore, even if the number of characters increases, there is no need to increase the number of shapes of the narrow portion 9 so much.

以上説明したように本考案によれば、絶縁スペ
ーサを夾んで透明絶縁基板に縦横に配設される上
下の透明なマトリツクス電極を有する透明スイツ
チにおいて、上下マトリツクス電極の各交叉位置
におけるパス抵抗を均一にすることが出来るの
で、後続の位置検出回路に特別な補正手段を設け
る必要がなくなり、経済的価値と相まつて、その
実用的効果は著しい。
As explained above, according to the present invention, in a transparent switch having upper and lower transparent matrix electrodes arranged vertically and horizontally on a transparent insulating substrate including insulating spacers, the path resistance at each crossing position of the upper and lower matrix electrodes can be made uniform. Therefore, there is no need to provide a special correction means in the subsequent position detection circuit, and its practical effects, together with its economical value, are significant.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は一般的な透明スイツチの一例を上面図
イ及び側断面図ロで示し、第2図は本考案による
透明スイツチに使用されるマトリツクスパターン
の一例を示す。 図において、1,5は透明基板、2,4は夫々
基板上に蒸着されたマトリツクス電極、3はスペ
ーサ、6は選択キヤラクター、8は切欠部、9は
マトリツクス電極上の狭少部を示す。
FIG. 1 shows an example of a general transparent switch in top view A and side sectional view B, and FIG. 2 shows an example of a matrix pattern used in the transparent switch according to the present invention. In the figure, 1 and 5 are transparent substrates, 2 and 4 are matrix electrodes deposited on the substrates, 3 is a spacer, 6 is a selective character, 8 is a notch, and 9 is a narrow portion on the matrix electrode.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 表示面上に載置された表示位置を摘出するため
の透明スイツチにおいて、絶縁スペーサを夾んで
それぞれ透明絶縁基板に縦横に配設される上下の
透明なマトリクス電極の各々の基部に、切欠部よ
りなる高抵抗部を設けて、該上下マトリクス電極
の各交叉位置におけるパス抵抗を均一化したこと
を特徴とする透明スイツチ。
In a transparent switch for extracting a display position placed on a display surface, a notch is inserted into the base of each of the upper and lower transparent matrix electrodes, which are arranged vertically and horizontally on a transparent insulating substrate, including insulating spacers. 1. A transparent switch characterized in that a high resistance portion is provided to equalize the path resistance at each intersection position of the upper and lower matrix electrodes.
JP1979165967U 1979-11-30 1979-11-30 Expired JPS6224896Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1979165967U JPS6224896Y2 (en) 1979-11-30 1979-11-30

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1979165967U JPS6224896Y2 (en) 1979-11-30 1979-11-30

Publications (2)

Publication Number Publication Date
JPS5682830U JPS5682830U (en) 1981-07-04
JPS6224896Y2 true JPS6224896Y2 (en) 1987-06-25

Family

ID=29676868

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1979165967U Expired JPS6224896Y2 (en) 1979-11-30 1979-11-30

Country Status (1)

Country Link
JP (1) JPS6224896Y2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59108934U (en) * 1983-01-13 1984-07-23 セイコーインスツルメンツ株式会社 input panel
JP5876257B2 (en) * 2011-09-28 2016-03-02 住友理工株式会社 Capacitive sensor device

Also Published As

Publication number Publication date
JPS5682830U (en) 1981-07-04

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