JPS62195709A - Production of magnetic head - Google Patents

Abstract

PURPOSE:To improve the depth accuracy of a gap by forming the gap parts of magnetic poles consisting of magnetic films to the shape which is in the direction perpendicular to a substrate. CONSTITUTION:An underlying protective film 2 is formed on the substrate 1 consisting of a magnetic or nonmagnetic material by using a thin film forming technique such as sputtering or vapor deposition. Top ends 3 of a thin film magnetic head are simultaneously formed on the right and left of the substrate 1 in the direction perpendicular to the substrate 1. A cap film is formed only to the space part of the gap films 4 by using a photolithographic method, then a magnetic film 5, inter-layer insulating film 6, conductor coil 7, inter-layer insulating 6, magnetic film 8, and protective film 9 are formed. A prescribed amt. is finally polished by machining from the top ends of the head, by which the thin film magnetic head controlled in the gap depth 10 is completed. Only the gap parts at the top ends of the magnetic film head are thus positioned on the right and left in the direction perpendicular to the substrate, by which a pair of the right and left gap parts at the top ends of the magnetic film head can be simultaneously formed. The variance in the gap depth between the head elements is thereby eliminated and the thin film head having the stable characteristics is obtd.

Description

DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to the manufacture of thin film magnetic heads, and relates to a method of manufacturing a faffi made of a magnetic film formed on a substrate.

[Summary of the invention]

According to the present invention, the Fi separation film magnetic head is formed by forming the shape of the gap portion of the magnetic trowel made of a magnetic film formed on the substrate in a direction perpendicular to the substrate surface.

This makes it possible to form the gap depth of a thin film magnetic head with high dimensional accuracy.

[Conventional technology]

Conventional thin@magnetic heads used for writing, reading, and erasing information include, for example.

The structure is as shown in the front view in Figure 2 (a), the front view in Figure 2 (b), and the vertical cross-sectional view in Figure 2 (C), where the magnetic material is made of non-magnetic material. A base protective film 2 is formed on the substrate 1.
FiIII membrane 5. Gap film 42 interlayer insulation film 6° conductor coil 7, interlayer insulation @6. @Sex @8. Safe! It is formed by sequentially stacking IWX9 using a thin film formation technique. In such a thin @magnetic head, the dimensional accuracy of the gap depth lO is a factor that influences the recording and reproducing characteristics. This gap depth lO is determined by the accuracy of the variation in flow ill when hard baking is performed on the interlayer insulation @6.

[Problem that the invention seeks to solve]

However, the above-mentioned conventional technique has a problem in that it is difficult to accurately control the flow needle of the N-shaped marginal membrane, which reduces the accuracy of the gap depth.

SUMMARY OF THE INVENTION The present invention is intended to solve these problems, and it is an object of the present invention to provide a method for manufacturing a thin film magnetic head that can form the gap depth with high accuracy.

Means for Solving Problem C] The present invention provides a thin film magnetic head having a magnetic pole made of a magnetic film formed on a substrate 1 by vapor deposition, sputtering, photolithography, etc., in which a magnetic O gap portion made of the magnetic film is provided. The gap depth accuracy is improved by forming the shape perpendicularly to the substrate.

〔Example〕

Hereinafter, one embodiment of the present invention will be described with reference to the plan view of FIG.
To explain with reference to the front view in b) and the longitudinal cross-sectional view in FIG. A magnetic film head tip 3 is formed simultaneously on the left and right sides in a direction perpendicular to the substrate 1, and a gap film is formed only in the space of the gear shape 4 using the well-known photorin method. Interlayer insulation film 6゜conductor coil 7, interlayer insulation film 6. Magnetic film 8.
The protective film 9 is completely formed. Finally, a predetermined ml of polishing is performed from the tip of the head by machining, thereby completing a thin film magnetic head with a defined gap depth l (1).

Conventionally, the manufacturing method used was to form the entire lower magnetic film, form an interlayer insulating film, and then form the upper magnetic film, in which the gap portion at the tip of the magnetic film head was located above and below the substrate in a child row. However, according to the present invention, the gap depth at the tip of the magnetic film head has a large influence on the roughness of the gap depth at the tip of the magnetic film head. By locating only the gap portions on the left and right sides perpendicular to the substrate, the gear portions at the tips of the pair of left and right magnetic film heads can be formed at the same time, and the dimensional variation of the depth of the gap portions can be The gap depth is determined by the precision of resist patterning and is completely unaffected by current flow caused by baking of the interlayer insulating film, and since each head element is formed with high precision in a continuous linear pattern, the gap depth can be reduced. There is no variation between each head element.

A film head with stable properties can be obtained.

〔Effect of the invention〕

As described above, according to the present invention, the accuracy is ±0.3 μm compared to the conventional accuracy of ±1.3 μm when the position of the tip of the interlayer insulating film that flowed during hard baking is used as the standard for the gap depth.
Improved to 5 μm. By improving the alignment accuracy, it becomes possible to simultaneously perform machining with two to three times as many heads as in the past in machining that defines the gap depth of the heads, making it possible to achieve rational ratios and improve yields.

Figure 1 (α) is a plan view of the thin film ffl air head of the present invention;
FIG. 1(b) is a front view of the thin film magnetic head of the present invention.
Figure (c) shows a longitudinal cross-sectional view of the thin film magnetic head of the present invention,
Figure 2 (c)) is a plan view of a conventional thin-film magnetic head.
Figure (b) is a front view of a conventional thin film magnetic head, and Figure 2 (C) is a front view of a conventional thin film magnetic head.
) shows a longitudinal sectional view of a conventional thin film magnetic head.

1... Board 2... Base protective film 3...Magnetic film head tip 4...'s gear smell 5...Magnetic film 6...Φ interlayer insulation film 7 * s s conductor coil 8...Magnetic film 9e...Protective film fil... Self-gap depth 11...j-Fine flow of the membrane that's all aHA person Seiko Epson Shizushiki Company Usuzukii hx entry to Confucianism head ゛c) Heijiri zuhang 1 (α) A half-view of a conventional kabayaki-senki heave Figure 2 (a-) The front view of Sodo, which has changed from the traditional style 1^　2F2! (and others) ￥1 day cc) Semi-21 diagram (C)

Claims (1)

[Claims] In a thin film magnetic head having a magnetic pole made of a magnetic film formed on a substrate by vapor deposition, sputtering, photolithography, etc., by forming the shape of the gap part of the magnetic pole made of the magnetic film in a direction perpendicular to the substrate,
A method for manufacturing a thin film magnetic head characterized by improved gap depth accuracy.