JPS62146694A - Aluminum alloy support for planographic printing - Google Patents
Aluminum alloy support for planographic printingInfo
- Publication number
- JPS62146694A JPS62146694A JP28791285A JP28791285A JPS62146694A JP S62146694 A JPS62146694 A JP S62146694A JP 28791285 A JP28791285 A JP 28791285A JP 28791285 A JP28791285 A JP 28791285A JP S62146694 A JPS62146694 A JP S62146694A
- Authority
- JP
- Japan
- Prior art keywords
- less
- aluminum alloy
- plate
- printing
- treatment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N1/00—Printing plates or foils; Materials therefor
- B41N1/04—Printing plates or foils; Materials therefor metallic
- B41N1/08—Printing plates or foils; Materials therefor metallic for lithographic printing
Landscapes
- Printing Plates And Materials Therefor (AREA)
Abstract
Description
【発明の詳細な説明】
「発明の目的」
本発明は平版印刷用アルミニウム合金支持体の創案に係
り、粗面化処理における局部的な欠陥の少ない、かつ印
刷中に非+a11部の汚れの生じにくい平版印刷用アル
ミニウム合金支持体を&[しょうとするものでるる。Detailed Description of the Invention "Object of the Invention" The present invention relates to the invention of an aluminum alloy support for lithographic printing, which has few local defects during roughening treatment and is free from stains on non-+A11 parts during printing. It is possible to create a difficult-to-use aluminum alloy support for lithographic printing.
産業上の利用分野
粗面化処理において、局部的な欠陥の少ない、かつ印刷
中に非画像部の汚れの生じにくい平版印刷用アルミニウ
ム合金支持体。Industrial application field An aluminum alloy support for lithographic printing that has few local defects during surface roughening treatment and is less likely to cause stains in non-image areas during printing.
従来の技術
平版印刷用アルミニウム合金支持体は従来から知られて
いる。即ち一般にアルミニウムお工びアルミニウム合金
は@量で加工性に優れ、しかも表面処理性が良好でろる
から平版印刷用支持体に適し、特にJIS1050 (
純度99.5チ以上のAt)、JISIloo (@度
99.0チ以上のAll、JIS3003 (AM −
0,05〜0.2 % Cu−1,0〜1.5Mn
合金)等のアルミニウムないしアルミニウム合金(以下
単にアルミニウム合金という)が広く採用されている。BACKGROUND OF THE INVENTION Aluminum alloy supports for lithographic printing are known in the art. In other words, in general, aluminum alloys have excellent workability in terms of @ quantity, have good surface treatment properties, and are suitable for lithographic printing supports, especially JIS 1050 (
At) with a purity of 99.5 cm or higher), JISIloo (@All with a purity of 99.0 cm or higher, JIS3003 (AM -
0.05~0.2% Cu-1.0~1.5Mn
Aluminum or aluminum alloys (hereinafter simply referred to as aluminum alloys) are widely used.
これらのアルミニウム合金は例えば製@、鏝、その表面
を機械的方法、化学的方法又は開気的方法の何れか1つ
又は2つ以上を組合わせた工程によって粗面化し且つ陽
極酸化処理を行ってから、その板面に感光性組成物(一
般には感光性樹脂)を塗布、乾燥させ、所。tlPs版
に加工される。次いで、この28版に画像露光、現l:
y1水洗およびガム引き等の製版処理を施して印刷原版
を製作するが、この画像露光により前記感光性樹脂層の
露光部分と未露光部分との間に後。These aluminum alloys are manufactured by, for example, being made with a trowel, the surface of which is roughened by a process that uses one or a combination of mechanical, chemical, or open-air methods, and then anodized. After that, a photosensitive composition (generally a photosensitive resin) is applied to the surface of the board, dried, and placed. Processed into tlPs version. This 28th plate was then image exposed and developed:
y1 A printing original plate is produced by performing plate-making processes such as water washing and gumming, and this image exposure creates a gap between the exposed and unexposed areas of the photosensitive resin layer.
続現像処理における現像液に対する溶解性に差を生じ、
該現像処理により前記露光部分と未露光部分の何れか一
方が現像液中に溶解或いは脱膜し、他方は支持体たるア
ルミニウム板上に残存して画像を形成する。前記画像部
分がインキ受容性を呈し、又上述の如く感光性樹脂が溶
解脱膜した非画像部分は親水性のアルミニウム支持体表
面が露出して水受容性を呈する。This causes a difference in solubility in the developer during subsequent development,
By this development treatment, either the exposed portion or the unexposed portion is dissolved in the developer or removed, and the other portion remains on the aluminum plate serving as the support to form an image. The image area exhibits ink receptivity, and the non-image area where the photosensitive resin is dissolved and removed as described above exhibits water receptivity due to the exposed surface of the hydrophilic aluminum support.
次いで上記印刷原液の両端部を折曲げ加工して印刷機へ
のくわえ込み部を形成し、印刷機の円筒形版胴に固定せ
しめ、その版面に(8し水(水ないし水性液)を供給す
ることに工っで非画像部に該湿し水の皮膜を保持させ、
他方画像部分にはインキを供給付着させ、この画像部分
に付層されたインキをブランケット胴に転写したのち紙
面等に転与する、という工程を繰返すことによって印刷
が行われる。この印刷は支持体として用いられるアルミ
ニウム合金、止面化処理方法および支持体上に塗布され
た感光性組成物を適当に選択することにより、10万枚
にも及ぶ良好な印刷物を得ることが可能であるが、特に
アルミニウム合金、例えばJIS1050゜JISIl
oo等のAe −F’e −81系合金の場合は、粗面
化処理に電気化学的な粗面化処理が一般的に深川されて
いる。Next, both ends of the above-mentioned printing solution are bent to form a holding part for the printing machine, and fixed to the cylindrical plate cylinder of the printing machine, and water (water or aqueous liquid) is supplied to the plate surface. The film of the dampening solution is retained in the non-image area by means of
On the other hand, printing is carried out by repeating the steps of supplying and adhering ink to the image area, transferring the ink layered on the image area to a blanket cylinder, and then transferring it to a paper surface or the like. In this printing, it is possible to obtain up to 100,000 good-quality prints by appropriately selecting the aluminum alloy used as the support, the surface finishing method, and the photosensitive composition coated on the support. However, especially aluminum alloys, such as JIS1050゜JISIL
In the case of Ae-F'e-81 alloys such as Ae-F'e-81 alloys, electrochemical surface roughening treatment is generally used for surface roughening treatment.
発明が解決しようとする問題点
ところが近年における28版の品質同上への要望は、粗
面化処理における微視的な欠陥の生じにくい、かつ印刷
中に非画像部の汚れの少ない支持体の要求が犬となって
おり、一方においては工業的な生産性向上に対する要請
から、1つのアルミニウム合金鋳塊が数千mにお工ぶ長
尺の薄板コイルとされ、かつそれが連続的に粗面化およ
び28版としての加工処理に供されており、アルミニウ
ム合金支持体の製造処理において適切な制御に欠けるも
のは、長尺コイルの連続処理後に28版としての商品価
値および印刷性能面から不適格と判明する結果、その工
業的な経済損失は大とならざるを得ない。Problems to be Solved by the Invention However, in recent years, there has been a demand for higher quality 28 plates, as well as a need for a support that is less likely to cause microscopic defects during surface roughening treatment and less stained in non-image areas during printing. On the other hand, due to the demand for improved industrial productivity, one aluminum alloy ingot is turned into a long thin coil that is several thousand meters long, and it is continuously coated with a rough surface. If the manufacturing process of the aluminum alloy support lacks appropriate control, it will be unsuitable for commercial value and printing performance as a 28th plate after continuous processing of long coils. As a result, the industrial economic loss will inevitably be large.
ここで、粗面化処理における微視的な欠陥とは、巨視的
には均一な粗面中に散在する微視的な筋状の過エツチン
グおるいは未エツチング領域(以下単に、微小粗面欠陥
という)のことであり、この微小粗面欠陥は特に粗面化
処理を電気化学的に行なう場合、その電気化学的な処理
条件と同時に、アルミニウム合金薄板の板面における表
面処理性に起因するものでおり、従来の平版印刷用アル
ミニウム合金薄板は、必ずしも適切な表面処理性を有す
るとは言えないのが実情であった。印刷中の非@1像部
の汚れは、印刷用に湿し水に接触している支持体表面に
孔食を生じ、そこにインキが付着して印刷物に転与きれ
る現象であり(以下単にインキ汚れという)、このイン
キ汚れを防止するためには、支持体弁lI!II像部の
保水性と耐食性を向上することが重要であり、そのため
には粗面化処理、特に電気化学的粗面化処理によって従
来よりも潰れfc徂而面均一性と支持性素地の耐孔食性
および健全な陽極酸化皮膜を得る必要がある。Here, microscopic defects in surface roughening treatment are microscopic streak-like over-etched or unetched areas (hereinafter simply referred to as micro-roughened areas) scattered on a macroscopically uniform roughened surface. In particular, when surface roughening treatment is performed electrochemically, these micro-rough surface defects are caused by the electrochemical treatment conditions as well as by the surface treatment properties of the aluminum alloy thin plate. The reality is that conventional aluminum alloy thin plates for lithographic printing cannot necessarily be said to have appropriate surface treatment properties. Staining in non-@1 image areas during printing is a phenomenon in which pitting corrosion occurs on the surface of the support that is in contact with dampening water for printing, and ink adheres there and is transferred to the printed matter (hereinafter simply referred to as "stain"). (referred to as ink stain), in order to prevent this ink stain, the support valve lI! It is important to improve the water retention and corrosion resistance of the II image area, and for this purpose, surface roughening treatment, especially electrochemical roughening treatment, improves the uniformity of the surface and the resistance of the supporting substrate. It is necessary to obtain a pitting-resistant and sound anodic oxide film.
「発明の構成」
問題点を解決するための子役
本発明者らは上記した実情に基づき種々研究した結果、
支持体中に存在する単体S1 が粗面の均一性、支持
体素地の耐孔食性並びに陽極酸化皮膜の健全性に影響し
ているという知見を得、更に検討し、単体St の電
を所定以下とした場合は、上記諸性質を良好なものとす
ることを艶出し本発明を完成したものである。"Structure of the Invention" Child Actor to Solve the Problems As a result of various studies based on the above-mentioned circumstances, the inventors have found that:
We obtained the knowledge that the simple substance S1 present in the support affects the uniformity of the rough surface, the pitting corrosion resistance of the base material of the support, and the integrity of the anodic oxide film.After further investigation, we determined that the electric current of the simple substance S1 was below a certain level. In this case, the present invention has been completed by polishing to improve the above properties.
即ち不発明は、
Fe : 0.10〜1.8 wt%、Si:0.03
〜Q、 3 wt%、
を甘有し、残部がアルミニウム及び不純物からなり、し
かも単体として存在する5ittiHが0012wt
%以下であることをt¥j徴とする平版印刷用アルミ
ニウム合金支持体。That is, the non-invention is: Fe: 0.10 to 1.8 wt%, Si: 0.03
~Q, 3 wt%, with the remainder consisting of aluminum and impurities, and 5ittiH existing as a simple substance is 0012 wt.
% or less is an aluminum alloy support for lithographic printing.
作用
Fe : 0.10〜1.8 wt%r Si: 01
03〜0.30wt係含有させることにより、支持体に
必要な強度を付加するとともに、板面中に存在する金、
¥4間化合物の種類と存在状態を制御し粗面化処理性を
良好なものとする。Action Fe: 0.10-1.8 wt%r Si: 01
By containing 0.3 to 0.30 wt, the necessary strength is added to the support, and the gold present in the plate surface is
Control the type and state of presence of the compound to improve surface roughening properties.
裏板工程において上記含有S1 から生ずる単体S1
を0.012wt%以下に制御することにより上記
金属間化合物に含まれる以外のSi の存在状態を制
御する。なお本発明でいうところの単体S1 とは、
主に熱間圧延後および中間焼鈍後の冷却過程で析出する
薄い板状単体St のことであり、単体Si債を0.
012wt%以下とすることにより粗面化処理時の微小
粗面欠陥および印刷中のインキ汚れを適切に防止する。In the back plate process, the simple substance S1 generated from the above-mentioned contained S1
By controlling Si to 0.012 wt% or less, the presence state of Si other than that contained in the above-mentioned intermetallic compound is controlled. Note that the simple substance S1 in the present invention is
It is a thin plate-like elemental St that precipitates mainly during the cooling process after hot rolling and intermediate annealing, and it is a thin plate-like elemental St that precipitates in the cooling process after hot rolling and intermediate annealing.
By setting the amount to 0.012 wt% or less, micro-rough surface defects during surface roughening treatment and ink stains during printing can be appropriately prevented.
単体Si量が0.012wt%を越えて存在すると最終
冷間圧延中に粉砕されfc薄い板状単体St が板面
中に局部的に偏在することになり、微小粗面欠陥おLび
インキ汚れの原因となり易いので、0.012wt%以
下とすることに工りこれを防止し支持体の品質を向上さ
せる。If the amount of elemental Si exceeds 0.012 wt%, it will be crushed during the final cold rolling and fc thin plate-like elemental St will be locally unevenly distributed on the sheet surface, resulting in micro-rough surface defects and ink stains. Therefore, the content is set to 0.012 wt% or less to prevent this and improve the quality of the support.
実施例
本発明によるものについて史に仔細を説明すると、先ず
不発明合金支持体における含有成分組成は以下の如くで
ある。EXAMPLE To explain the details of the present invention in detail, first, the composition of the components contained in the non-inventive alloy support is as follows.
即ち、Fe : 0.10〜1.8 wt % 、 8
1 ; 0.03〜0.3wt% を含有させるのは、
強度を付与し、支持体使用時の取り扱いを良好とするも
ので、1)II)、線間化合物の種類と存在状態を制御
するためである。このような化合物の存在状態は、A1
mFe +AIBF@ 6るいはa−AU(F@・M
) Sl が単味で、あるいはこれらのいずれか2
つ以上が混在して均一に分布することが望ましいが、F
e が0.10wt%未満、SIが0.03wtチ未
満では工業的な均質化処理後の金属間化合物の存在量が
不足し、かつ分布状態が不均一となり、このため電気化
学的粗面化処理において不均一な粗面となり、また支持
体の強度が不足する。Feが1.8wt%、S量が0.
3wt% を越えて含有されると、p′を速時の晶出相
が粗大化するので好ましくない。従ってF@:0.10
〜1.8vtチ、 St : 0.03〜Q、3wt%
とする。That is, Fe: 0.10-1.8 wt%, 8
1; 0.03 to 0.3 wt% is contained in
This is to impart strength and improve handling during use of the support, and 1) II) to control the type and state of presence of interline compounds. The state of existence of such a compound is A1
mFe +AIBF@6 Ru or a-AU(F@・M
) Sl alone or any two of these
It is desirable that more than two types are mixed and distributed uniformly, but F
If e is less than 0.10 wt% and SI is less than 0.03 wt%, the amount of intermetallic compounds present after industrial homogenization will be insufficient and the distribution state will be non-uniform, resulting in electrochemical roughening. In the treatment, the surface becomes uneven and rough, and the strength of the support is insufficient. Fe is 1.8wt%, S amount is 0.
If the content exceeds 3 wt%, the crystallization phase of p' becomes coarse, which is not preferable. Therefore F@: 0.10
~1.8vt Chi, St: 0.03~Q, 3wt%
shall be.
これらFe 、 81の必須成分以外にTi を含有
させることができる。このTI は、鋳塊の結晶微細
化のためにAt−TS 系あるいはAU−Tl−B系
#細化剤として添加することがあるが、Ti−B系粒子
の凝集を生じると粗面化処理時に微小粗面欠陥となり易
いので、TI を含有させるm会にはAt−Ti系め
るいは高Tl/B比のAL−Ti−B系微細化剤を用い
、Tt ; 0.’06wt%以下とすることが望まし
い。In addition to these essential components of Fe and 81, Ti can be contained. This TI is sometimes added as an At-TS or AU-Tl-B type #refining agent to refine the crystals of the ingot, but if it causes agglomeration of Ti-B particles, the surface roughening process is Since micro-rough surface defects are likely to occur at times, an At-Ti-based refiner or an AL-Ti-B-based refiner with a high Tl/B ratio is used to contain TI, and Tt; 0. '06wt% or less is desirable.
その他の不純物としてB + Cu g Zn * V
+Cr 、 Mn + Mg 等が含まれる場合も
あるが、本しく、即ちBはTi と共に凝集物を生じ
易く、また単体St との共存下で粗面化処理時に倣
小柑田i欠陥となるので、B : 0.0010 wt
%以下とすることが好ましい。またCu 、 Znはそ
れぞれインキ汚れ防止のためいずれもo、o3wt%以
下とするが、特にインキ汚れに対する要求品位の高いと
きには陽極酸化皮膜の健全性を維持する必要があり、こ
のためCu : 0.020wt%以下とすることが好
ましく、■は一塊の結晶微細化を妨げる傾向があるので
0.02wt%以下、好ましくは0.015wtチ以下
とすることが望ましい。Other impurities include B + Cu g Zn * V
+Cr, Mn+Mg, etc. may be included in some cases, but the truth is that B tends to form aggregates together with Ti, and in the coexistence with elemental St, it causes imitative Kokanda i defects during surface roughening treatment. , B: 0.0010wt
% or less. In addition, Cu and Zn are set to 0 and 3 wt% or less to prevent ink stains, respectively, but especially when the quality required for ink stains is high, it is necessary to maintain the integrity of the anodic oxide film, and for this reason Cu: 0. It is preferable that the content be 0.020 wt % or less, and since (2) tends to hinder the grain refinement of a lump, it is desirable that the content be 0.02 wt % or less, preferably 0.015 wt % or less.
更にCr 、 Mnは電気化学的粗面化処理において溶
解し難い金属間化合物を形成しやすいので0.03wt
%以下にそれぞれ規制するのが望ましい。またMg は
0.05wt%以下、好ましくは0.03Wt係以下が
望ましい。Furthermore, Cr and Mn tend to form intermetallic compounds that are difficult to dissolve in electrochemical roughening treatment, so 0.03 wt.
It is desirable to restrict each to below %. Further, Mg is desirably 0.05 wt % or less, preferably 0.03 Wt % or less.
上記のような組成になる本発明の−P版印刷用アルミニ
ウム会金支持体の製版ならびに28版としての製版工程
について説明すると以下の90くである。The plate making process of the aluminum metal support for -P plate printing of the present invention having the composition as described above and the plate making process as a 28 plate are explained below.
即ち、上記組成の合金溶湯から得た鋳造スラグを面側し
た後、通常の460〜600℃、望ましくは520〜6
00℃の温度で1時間以上保持する均質化処理を行なう
。矢いで熱間圧延お工び冷間圧延を行なうが、熱間圧延
においては、均質化処理後に存在する金属間化合物を工
り一晴均−な分布とするため、数回以上の熱間圧延パス
と再結晶・析出をd返し、より好ましくは逆転式熱間圧
延機により個々の圧延パス後に数秒以上放置して再結晶
を行わしめ、その過程で金属間化合物の析出をうながし
、300℃以上で圧延を完了する。これにより、金属間
化合物の平均サイズを実質上1μ以下とすることができ
る。また引続く冷間圧延においては、熱間圧延後の冷却
過程で析出する薄い板状の単体si を粉砕し、微粒
化するために冷間加工度を50%以上とする。次いで中
間清純を行なうが、微粒化した単体Sl をマトリク
ス中に溶は込ませると共に加熱後の冷却過程で薄い板状
単体SLの析出を防止することが重要であり、具体的に
は、例えば連続焼鈍装置Nにおいて、Si : 0.0
3〜0.15wt%を含有する場合1i400〜600
U、Sl : 0.15wt% を越えQ、3wt%
まで含有する場合は500〜600℃に加熱し、所定の
温度に到達後、150℃/式以上の冷却速度により10
0℃以下まで冷却するもので、好ましくは500℃/s
ec以上の水冷却による急速冷却を施すことが望ましい
。これによって単体Si量を0.012wt%以下にす
ることができる。なお、甲間炉鈍を行なうだめの連続焼
鈍装置はいずれの方法を用いても差支えないが、例えば
加熱方法がアルミニウム合金自体の発9P!金利用する
磁気誘導加熱(Transverse Flux In
duction)ieatlng )方式は、アルミニ
ウム会金板表面の酸化皮膜形成量が少なく、粗面化処理
への悪影害が少ないので好ましい。引続き、支狩体とし
ての所定の強度を得るために加工度30チ以上、好まし
くは50%以上の最終冷間圧延を行ない0.1〜0.5
mの板厚とする。That is, after the casting slag obtained from the molten alloy having the above composition is side-faced, it is heated at a normal temperature of 460-600°C, preferably 520-600°C.
Homogenization treatment is performed by holding the sample at a temperature of 00° C. for 1 hour or more. Hot rolling and cold rolling are performed at the same time, but in hot rolling, in order to remove the intermetallic compounds present after homogenization treatment and achieve a uniform distribution, hot rolling is performed several times or more. The pass and recrystallization/precipitation are repeated, and more preferably recrystallization is carried out by leaving it for several seconds or more after each rolling pass in a reversing hot rolling mill. to complete rolling. This allows the average size of the intermetallic compound to be substantially 1 μm or less. Further, in the subsequent cold rolling, the degree of cold working is set to 50% or more in order to crush and atomize the thin plate-like single Si that precipitates during the cooling process after hot rolling. Next, intermediate purification is performed, but it is important to dissolve the finely divided elemental Sl into the matrix and to prevent the precipitation of thin plate-like elemental SL during the cooling process after heating. In annealing device N, Si: 0.0
1i400-600 when containing 3-0.15wt%
U, Sl: over 0.15wt% Q, 3wt%
If it contains up to 100°C, heat it to 500-600°C, and after reaching the specified temperature, cool it at a cooling rate of 150°C/equation or higher.
Cooling to below 0℃, preferably 500℃/s
It is desirable to perform rapid cooling by water cooling at ec or higher. This allows the amount of elemental Si to be 0.012 wt% or less. Note that any continuous annealing method can be used for the continuous annealing process, but for example, the heating method is 9P! Magnetic induction heating using gold (Transverse Flux In
The method is preferable because the amount of oxide film formed on the surface of the aluminum metal plate is small and there is little adverse effect on the surface roughening treatment. Subsequently, in order to obtain a specified strength as a supporting body, final cold rolling is performed to a working degree of 30 inches or more, preferably 50% or more, and 0.1 to 0.5
The plate thickness is m.
何れの製造条件下であれ、微量不純物の規制、金属間化
合物の種類と存在状態の制御、特に単体S1をo、ot
zwt%以下に制御することに工って、板面上の微小な
金属組繊の不均一領域の形成を防止すると共に、素地の
耐孔食性を向上させ、かつ健全な陽極酸化処理を得るよ
うに処理することが望まれ、それによって粗面化処理に
おける微小粗面欠陥を解消すると共に、印刷中のインキ
汚れを適切に防止することができる。Regardless of the manufacturing conditions, regulation of trace impurities, control of the type and state of existence of intermetallic compounds, and especially for simple substance S1 in o, ot
zwt% or less to prevent the formation of uneven areas of minute metal fibers on the plate surface, improve the pitting corrosion resistance of the substrate, and obtain a sound anodizing treatment. It is desired that the surface be treated with a rough surface, thereby eliminating micro-rough surface defects during the surface roughening treatment and appropriately preventing ink stains during printing.
また、経済性等を追求するために芯材として安価なスク
ラップを使用し、皮材に平版印刷坂出に適したアルミニ
ウム合金を用い、いわゆるクラツド材を支持体として製
造することがあるが、その場合の皮材として本発明によ
るものを使用することができる。In addition, in order to pursue economic efficiency, cheap scrap is used as the core material, aluminum alloy suitable for lithographic printing Sakaide is used as the skin material, and so-called clad material is sometimes manufactured as the support. The material according to the present invention can be used as a skin material.
このように製版されたアルミニウム合金板は、28版と
しての加工処理と製版加工処理とを経て実際の印−り作
業に供される。即ち先ず機械的砂目立て法や篭気化学的
砂目立て法によるff1面化処理を行った後、酸または
アルカリによる化学的エツチング処理と酸洗いによる脱
スマット処理に供される。更に必要に応じて陽極酸化処
理や化成処理による酸化皮膜形成処理し、その上にアル
カリ金属シリケートや親水件セルローズなどの下塗り層
形成処理が行なわれる。続いて適宜の感光性組成物を(
洒布し、乾燥後所望サイズに裁断することによって28
版が得られる。The aluminum alloy plate thus plate-made is subjected to processing as a 28-plate and plate-making process, and then subjected to actual marking work. That is, first, the material is subjected to an FF1 surface treatment using a mechanical graining method or a chemical graining method, and then subjected to a chemical etching treatment using an acid or alkali and a desmutting treatment by pickling. Further, if necessary, an oxide film formation treatment is performed by anodizing treatment or chemical conversion treatment, and an undercoat layer formation treatment of an alkali metal silicate, hydrophilic cellulose, etc. is performed thereon. Subsequently, an appropriate photosensitive composition (
After drying and cutting to the desired size,
You can get the version.
この28版に所望+1!1+ j#!の露光を行ない、
現像、水洗、バーニング処理並びにガム引き等の製版処
理が行われる。Desired +1 for this 28th edition! 1+ j#! Perform the exposure of
Plate-making processes such as development, washing, burning, and gumming are performed.
製版された印刷原版は、爽にその両端を折曲力ロエして
印刷機へのくわえ部を形成した後、印刷機の円筒形版胴
に固定され、印刷作業に供される。After the plate-made printing original plate is bent at both ends to form a gripping portion for the printing press, it is fixed to the cylindrical plate cylinder of the printing press and used for printing work.
本発明によるものの具体的な製造例について説明すると
以下の如くである。A specific manufacturing example of the product according to the present invention will be described below.
製造例1
最終板の組成が後述する第2衣に示す会合への組成にな
るように常法によって蛎製し、微細多孔フィルターを用
いて、盪過した後、DC鋳造にて560B厚のスラブを
得、欠いで590℃、4時間保持の均質化処理を施した
後、6fi厚(C熱間圧延し、次いで冷間圧延を経て1
.5稿厚の板とした。更にこの板を空気加熱炉中で10
0C/Hrの昇温速度で520℃まで加熱し、10分間
保持して中間焼塊処理を施こした後、水付、空冷(室τ
晶まで平均1℃/secの冷均速度)および炉冷(室温
まで約5時間を要した)の3塊類の冷却速度で冷却した
。Production Example 1 A slab of 560B thickness was prepared by a conventional method so that the composition of the final plate would be as shown in the second layer described later, and after stirring using a microporous filter, a slab with a thickness of 560B was made by DC casting. After homogenizing at 590°C and holding for 4 hours, it was hot rolled to a thickness of 6fi (C), then cold rolled to a 1.
.. The board was 5 sheets thick. Furthermore, this plate was heated in an air heating furnace for 10
After heating to 520°C at a temperature increase rate of 0C/Hr and holding for 10 minutes to perform intermediate baking treatment, it was heated with water and air-cooled (room τ).
It was cooled at three cooling rates: cold uniforming rate (average cooling rate of 1° C./sec until crystallization) and furnace cooling (which took about 5 hours to reach room temperature).
このようにして得られた板の一部を(1+1)塩酸およ
び過酸化水素水に工り浴解し、濾過した残渣から重量法
で単体Sl斌を求めると共にその一部をXRD測定、T
EM観察に供した。A part of the plate thus obtained was dissolved in (1+1) hydrochloric acid and hydrogen peroxide solution, and from the filtered residue, the single Sl content was determined by gravimetric method, and part of it was subjected to XRD measurement, T
It was subjected to EM observation.
次いで、中間焼鈍され7’C3種類の板を最終冷間圧延
によって0.3日厚の板となし、XRD測定、電気化学
的な粗面化処理お工び財貨性評価に供した。Next, the intermediate annealed 7'C three types of plates were final cold rolled into plates with a thickness of 0.3 days, and subjected to XRD measurement and electrochemical roughening treatment to evaluate the quality of the finished product.
暖気化学的粗面化処理は、10チNaOH水浴液中で6
0℃、1分間の予備エツチングの後、硝酸系I11解浴
中で交流′電解を行ない、デスマット後、粗面他面を目
視お工びSEM観祭により評価すると共に、水道水流水
中に1週間浸漬してllot食件を調べた。Warm chemical roughening treatment was carried out in a 10-inch NaOH water bath solution.
After preliminary etching at 0°C for 1 minute, alternating current electrolysis was performed in a nitric acid-based I11 bath, and after desmatting, the rough surface and other surfaces were visually inspected and evaluated by SEM observation, and placed in running tap water for one week. I immersed myself in it to find out a lot of food.
次の第1表に単体St 量と最終冷延板の粗面化状態
および耐食性の評価結果を示す。Table 1 below shows the evaluation results of the amount of St2, the roughening state of the final cold-rolled sheet, and the corrosion resistance.
なお、中間惧鈍後の単体Si の形状は、水冷材は粒
状(サイズ0.1μ以下)であり、空冷お工び炉冷材は
薄い板状(サイズ10μ前後で、数百オングストローム
厚さ)のものがほとんどであった。最終冷延、仮につい
ても測定したが、単体St 量は中間焼鈍後と変らす
、形状は大部分が粒状(サイズ0.1μ以下)を呈して
いた。The shape of Si after intermediate dulling is granular (size 0.1μ or less) for water-cooled materials, and thin plate-like shape (size around 10μ, several hundred angstroms thick) for air-cooled furnace-cooled materials. Most of them were. Measurements were also carried out on the final cold rolled and temporary samples, and the amount of simple St 2 was different from that after intermediate annealing, and the shape was mostly granular (size 0.1 μm or less).
−万、最終冷延板のX RD l5I11定では、3揮
類の板いずれにおいてもAg3 F eお工びα−AH
(FeM )Sl が検出された。- 10,000, at the final cold-rolled sheet's
(FeM)Sl was detected.
第 1 表
第1表に見るように、単体81 量が少ない杢発明例
では、粗面化性、耐食性ともに良好であるが、単体81
′量が規定値以上に存在する比較例においては、粗面
化性、耐食性ともに不勇足なレベルにある。Table 1 As shown in Table 1, the heather invention examples with a small amount of element 81 have good surface roughening properties and corrosion resistance, but the element 81
In the comparative example in which the amount of C is present in an amount greater than the specified value, both surface roughening properties and corrosion resistance are at an insufficient level.
製造例2
最終板の組成が次の第2表に示す合金Bお工びCの組成
になる工うに常法に工って浴製し、微細多孔フィルター
を用いて濾過した後、合金BについてはDC@造にて5
60m厚の、合金Cについては406m+厚のスラブを
得、合金Bについては560℃、4時間保持、合金Cに
ついては590℃、4時間保持の均質化処理を施した後
、逆転式圧延機によりいずれの合金も6゛咽厚まで熱間
圧延し、次いで冷間圧延により1、0 mmの板とした
。その後いずれの合金も磁気誘導7JO熱装+?tを用
いて連続的に中間併鈍を行なったが、合金Bについては
150℃/seeの昇温速度で、380〜550℃X5
secの保持および500℃/式以上の速度による水冷
却、合金Cについては150℃/sPeの昇温速度で5
00℃X5secの保持および500℃/就以上の速度
による水冷却の処理を行なった。いずれも引続き0、3
m厚まで最終冷間圧延し、目的の平版印刷用アルミニ
ウム合金取を製造し次。Production Example 2 The composition of the final plate is the composition of Alloy B and C shown in Table 2 below. After making a bath using the usual method and filtering it using a microporous filter, Alloy B was prepared. is 5 at DC@zo
A slab with a thickness of 60 m and 406 m + thickness for alloy C was obtained, and after homogenization treatment at 560°C for 4 hours for alloy B and 4 hours at 590°C for alloy C, it was rolled using a reverse rolling mill. Both alloys were hot rolled to a thickness of 6 mm, and then cold rolled into plates of 1.0 mm. After that, both alloys are magnetic induction 7JO heat equipment +? Intermediate annealing was carried out continuously using t, but for alloy B, the temperature was increased from 380 to 550°C x 5 at a temperature increase rate of 150°C/see.
sec and water cooling at a rate of over 500°C/sPe, for alloy C at a heating rate of 150°C/sPe.
Holding at 00°C for 5 seconds and cooling with water at a rate of at least 500°C were carried out. Both continue to be 0 and 3.
Final cold rolling to a thickness of m to produce the desired planographic printing aluminum alloy plate.
得られた合金について・凋造例1と同様のXRD測定、
単体St 量の測定を行なった。Regarding the obtained alloy, XRD measurement similar to that of Forging Example 1,
The amount of simple St was measured.
引続き、合金板に印刷用支持体としてのへ・11埋を行
ない、粗面化性および印刷適性について評価した。即ち
これらのアルミニウム合金数をパミストンと水の懸濁液
中で回転ナイロンブラシで砂目立処理しfc後、苛性ソ
ーダ20wt%水溶液でエツチング処理し、次いで水洗
し、25wt% イln酸水浴液でのr夕洸い及び再1
皮の水洗処理を経て、硝CRO,5〜2.5wt% を
含有する電解浴中で直流密度20 A/c/*”以上で
交流五解し、^究いて15wt% 硫酸の50℃水浴液
中に3分間浸漬して表面を清浄化した後、20Wtチ
硫酸を主成分とする′4解液中で浴■詰30℃の陽極化
処理を行った。Subsequently, the alloy plate was used as a printing support by filling the plate with 11 embeddings, and its surface roughening properties and printability were evaluated. That is, these aluminum alloys were grained with a rotating nylon brush in a suspension of pumice stone and water, etched with a 20 wt% caustic soda aqueous solution, then washed with water, and etched in a 25 wt% ilnic acid water bath. r evening trip and second time 1
After washing the skin with water, it was electrolyzed in an electrolytic bath containing nitric CRO, 5 to 2.5 wt%, at a DC density of 20 A/c/* or more, and then dissolved in a 50°C water bath containing 15 wt% sulfuric acid. After cleaning the surface by immersing it in water for 3 minutes,
Anodization treatment was carried out at 30° C. in a solution containing sulfuric acid as a main component.
以上のようにして得られた支持体の81而化性について
底面の1睨お↓びSEMi4%を行ない、微小粗面欠陥
を覗察すると共に、史に印刷版としての製版処理を行な
い、印刷版としての評価を行なった。Regarding the 81 metabolization properties of the support obtained in the above manner, the bottom surface was inspected for 1↓ and SEMi4% to observe micro-rough surface defects, and the plate-making process was performed as a printing plate. We conducted an evaluation as follows.
即ち上記支持体に下記の感光層を乾燥時の堂布量が25
2/イとなるように形成した。That is, the following photosensitive layer was applied to the above support with a dry weight of 25
2/A.
ナフトキノン−1,2−ジアジド−5−スルホニルクロ
ライドとピロガロールアセトン倒置との化合物(米国特
許第365709号明細A実施例に記載されているもの
) 0.759クレゾールノボラツク樹11旨
2.00rオイルブルー#603(オリエント化学社
m) 0.04fエチレンジクロライド
1692−メトキシエチルアセテート 1
22得られた感光性平版印刷版を遺明陽面に蟹臂させて
1mの距離からPSライト(東芝メタルハライドランプ
MU2000−2−OL型、3調の光源を有する)で3
0秒間露光を行った後、珪酸ナトリウム5 wt %
水% #Lに約1分間浸漬して現象し、水先乾燥して
印刷原版を得た。Compound of naphthoquinone-1,2-diazido-5-sulfonyl chloride and inverted pyrogallol acetone (described in Example A of US Pat. No. 365,709) 0.759 Cresol novolak tree 11 effects
2.00r Oil Blue #603 (Orient Chemical Co., Ltd.) 0.04f ethylene dichloride
1692-methoxyethyl acetate 1
22 The obtained photosensitive lithographic printing plate was placed on its side and exposed to a PS light (Toshiba metal halide lamp MU2000-2-OL type, with a 3-tone light source) from a distance of 1 m.
After 0 seconds of exposure, 5 wt% sodium silicate
It was immersed in water % #L for about 1 minute to develop and dried before drying to obtain a printing original plate.
これらの印刷原版をオフセット印刷機KORに取付け、
10万部の印刷テストを行なった。Attach these printing plates to the offset printing machine KOR,
A printing test of 100,000 copies was conducted.
以上の測定ないし複祭結果については、次の第3表に示
す通りである。The results of the above measurements or multiple tests are shown in Table 3 below.
なお、XRD測定によると、合金BについてはA1f3
Fe、合金Cについては、’VmFe、 A1.BFe
が検出された。According to XRD measurement, alloy B has A1f3
For Fe, Alloy C, 'VmFe, A1. BFe
was detected.
第 3 表
即ち、第3表から明らかなように、本発明材は単体81
猾を側脚することにより、微小粗面欠陥のない、印
刷中のインキ汚れに優れた印刷機が得られることを示し
ている。また第3衣に示す本発明1才における支持体の
強度は、常法に工って0,2%+mt力を側型したとこ
ろいずれも13 Kr / wn” 以上を有してお
り、印刷版の1■扱い性も良好なものてらった。As is clear from Table 3, that is, the material of the present invention has a single substance of 81
It has been shown that by using the side legs of the box, a printing machine that is free from micro-rough surface defects and has excellent ink stains during printing can be obtained. In addition, the strength of the support at 1 year old according to the present invention shown in No. 3 was 13 Kr/wn" or more when side-molded with 0.2% + mt force using a conventional method, and the strength of the support was 13 Kr/wn" or more, 1) It also has good handling properties.
「う0す1の効果」
以上説明したような不発)Flの半jW印刷用アルミニ
ウム合金支持体によるときは、従来材に比較し粗面化に
おける微小粗面欠陥を適切に防止し、かつ印刷通性にも
優れていることから、品質の安定した耐用性の高い製品
を提供し得るものでおって、工業的にその効果の大きい
発明である。"Effect of 0.1" When using an aluminum alloy support for semi-JW printing of F1 as explained above, compared to conventional materials, it can appropriately prevent micro-rough surface defects during surface roughening and improve printing. Since it has excellent permeability, it is possible to provide products with stable quality and high durability, and this invention is industrially very effective.
Claims (1)
かも単体として存在するSi量が0.012wt%以下
であることを特徴とする平版印刷用アルミニウム合金支
持体。[Claims] Contains Fe: 0.10 to 1.8 wt% Si: 0.03 to 0.3 wt%, the remainder consists of aluminum and impurities, and the amount of Si present as a simple substance is 0.012 wt% An aluminum alloy support for lithographic printing characterized by the following:
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP28791285A JPS62146694A (en) | 1985-12-23 | 1985-12-23 | Aluminum alloy support for planographic printing |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP28791285A JPS62146694A (en) | 1985-12-23 | 1985-12-23 | Aluminum alloy support for planographic printing |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62146694A true JPS62146694A (en) | 1987-06-30 |
JPH0528197B2 JPH0528197B2 (en) | 1993-04-23 |
Family
ID=17723332
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP28791285A Granted JPS62146694A (en) | 1985-12-23 | 1985-12-23 | Aluminum alloy support for planographic printing |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62146694A (en) |
Cited By (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62148295A (en) * | 1985-12-23 | 1987-07-02 | Furukawa Alum Co Ltd | Aluminum alloy base for planographic plate and production thereof |
JPH03177529A (en) * | 1989-12-06 | 1991-08-01 | Sky Alum Co Ltd | Aluminum alloy sheet stock for supporting body of printing form plate |
JPH06346176A (en) * | 1993-06-08 | 1994-12-20 | Kobe Steel Ltd | Aluminum sheet for printing plate and its production |
EP0695647A1 (en) | 1994-08-05 | 1996-02-07 | Fuji Photo Film Co., Ltd. | Aluminum alloy support for planographic printing plate and method for producing the same |
US5618358A (en) * | 1995-03-01 | 1997-04-08 | Davisson; Thomas | Aluminum alloy composition and methods of manufacture |
EP0770911A1 (en) | 1995-10-23 | 1997-05-02 | Fuji Photo Film Co., Ltd. | Light-sensitive sheet having aluminum alloy support and silver halide light-sensitive material using the same |
EP0942071A1 (en) * | 1998-03-09 | 1999-09-15 | Nippon Light Metal, Co. Ltd. | Process for producing aluminum alloy substrate and use thereof for lithographic printing plate |
EP1219464A2 (en) | 2000-12-20 | 2002-07-03 | Fuji Photo Film Co., Ltd. | Lithographic printing plate precursor |
US6670099B2 (en) * | 2000-09-06 | 2003-12-30 | Fuji Photo Film Co., Ltd. | Support for lithographic printing plate and method of manufacturing the same |
EP1625944A1 (en) | 2004-08-13 | 2006-02-15 | Fuji Photo Film Co., Ltd. | Method of manufacturing lithographic printing plate support |
EP1712368A1 (en) | 2005-04-13 | 2006-10-18 | Fuji Photo Film Co., Ltd. | Method of manufacturing a support for a lithographic printing plate |
WO2010038812A1 (en) | 2008-09-30 | 2010-04-08 | 富士フイルム株式会社 | Electrolytic treatment method and electrolytic treatment device |
WO2010150810A1 (en) | 2009-06-26 | 2010-12-29 | 富士フイルム株式会社 | Light reflecting substrate and process for manufacture thereof |
WO2011078010A1 (en) | 2009-12-25 | 2011-06-30 | 富士フイルム株式会社 | Insulated substrate, process for production of insulated substrate, process for formation of wiring line, wiring substrate, and light-emitting element |
JP2011140708A (en) * | 2009-12-11 | 2011-07-21 | Sumitomo Light Metal Ind Ltd | Aluminum alloy sheet material for lithium ion battery case |
EP2426227A1 (en) * | 2010-09-03 | 2012-03-07 | Fujifilm Corporation | Aluminum alloy sheet forlithographic printing plate, and manufacturing method thereof |
WO2013008314A1 (en) * | 2011-07-12 | 2013-01-17 | 住友軽金属工業株式会社 | Aluminum alloy plate material for lithium ion battery cases |
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JPS5311603A (en) * | 1976-07-20 | 1978-02-02 | Nippon Keikinzoku Sougou Kenki | Method of producing aluminium alloy surface roughened plate for offset printing plate |
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---|---|---|---|---|
JPS5311603A (en) * | 1976-07-20 | 1978-02-02 | Nippon Keikinzoku Sougou Kenki | Method of producing aluminium alloy surface roughened plate for offset printing plate |
JPS5842745A (en) * | 1981-09-03 | 1983-03-12 | Furukawa Alum Co Ltd | Aluminum alloy plate for printing and its manufacture |
JPS5842493A (en) * | 1981-09-07 | 1983-03-11 | Furukawa Alum Co Ltd | Manufacture of aluminum alloy plate for offset printing |
JPS58221254A (en) * | 1982-06-18 | 1983-12-22 | Furukawa Alum Co Ltd | Aluminum blank for offset printing |
JPS5967349A (en) * | 1982-10-12 | 1984-04-17 | Kobe Steel Ltd | Aluminum strip for photosensitive lithographic printing plate |
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JPH0528198B2 (en) * | 1985-12-23 | 1993-04-23 | Furukawa Aruminiumu Kogyo Kk | |
JPS62148295A (en) * | 1985-12-23 | 1987-07-02 | Furukawa Alum Co Ltd | Aluminum alloy base for planographic plate and production thereof |
JPH03177529A (en) * | 1989-12-06 | 1991-08-01 | Sky Alum Co Ltd | Aluminum alloy sheet stock for supporting body of printing form plate |
JPH06346176A (en) * | 1993-06-08 | 1994-12-20 | Kobe Steel Ltd | Aluminum sheet for printing plate and its production |
EP0695647A1 (en) | 1994-08-05 | 1996-02-07 | Fuji Photo Film Co., Ltd. | Aluminum alloy support for planographic printing plate and method for producing the same |
US5618358A (en) * | 1995-03-01 | 1997-04-08 | Davisson; Thomas | Aluminum alloy composition and methods of manufacture |
EP0770911A1 (en) | 1995-10-23 | 1997-05-02 | Fuji Photo Film Co., Ltd. | Light-sensitive sheet having aluminum alloy support and silver halide light-sensitive material using the same |
EP0942071A1 (en) * | 1998-03-09 | 1999-09-15 | Nippon Light Metal, Co. Ltd. | Process for producing aluminum alloy substrate and use thereof for lithographic printing plate |
US6670099B2 (en) * | 2000-09-06 | 2003-12-30 | Fuji Photo Film Co., Ltd. | Support for lithographic printing plate and method of manufacturing the same |
EP1219464A2 (en) | 2000-12-20 | 2002-07-03 | Fuji Photo Film Co., Ltd. | Lithographic printing plate precursor |
EP1625944A1 (en) | 2004-08-13 | 2006-02-15 | Fuji Photo Film Co., Ltd. | Method of manufacturing lithographic printing plate support |
EP1712368A1 (en) | 2005-04-13 | 2006-10-18 | Fuji Photo Film Co., Ltd. | Method of manufacturing a support for a lithographic printing plate |
WO2010038812A1 (en) | 2008-09-30 | 2010-04-08 | 富士フイルム株式会社 | Electrolytic treatment method and electrolytic treatment device |
WO2010150810A1 (en) | 2009-06-26 | 2010-12-29 | 富士フイルム株式会社 | Light reflecting substrate and process for manufacture thereof |
JP2011140708A (en) * | 2009-12-11 | 2011-07-21 | Sumitomo Light Metal Ind Ltd | Aluminum alloy sheet material for lithium ion battery case |
WO2011078010A1 (en) | 2009-12-25 | 2011-06-30 | 富士フイルム株式会社 | Insulated substrate, process for production of insulated substrate, process for formation of wiring line, wiring substrate, and light-emitting element |
EP2426227A1 (en) * | 2010-09-03 | 2012-03-07 | Fujifilm Corporation | Aluminum alloy sheet forlithographic printing plate, and manufacturing method thereof |
WO2013008314A1 (en) * | 2011-07-12 | 2013-01-17 | 住友軽金属工業株式会社 | Aluminum alloy plate material for lithium ion battery cases |
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