JPS6159388A - Display unit - Google Patents
Display unitInfo
- Publication number
- JPS6159388A JPS6159388A JP59179418A JP17941884A JPS6159388A JP S6159388 A JPS6159388 A JP S6159388A JP 59179418 A JP59179418 A JP 59179418A JP 17941884 A JP17941884 A JP 17941884A JP S6159388 A JPS6159388 A JP S6159388A
- Authority
- JP
- Japan
- Prior art keywords
- display device
- oxide
- insulating substrate
- refractive index
- transparent insulating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims description 17
- 239000011159 matrix material Substances 0.000 claims description 10
- 239000012212 insulator Substances 0.000 claims description 6
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Chemical compound [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 claims description 4
- 239000010409 thin film Substances 0.000 claims description 3
- 229910000464 lead oxide Inorganic materials 0.000 claims description 2
- 239000000463 material Substances 0.000 claims description 2
- YEXPOXQUZXUXJW-UHFFFAOYSA-N oxolead Chemical compound [Pb]=O YEXPOXQUZXUXJW-UHFFFAOYSA-N 0.000 claims description 2
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 2
- 229910001936 tantalum oxide Inorganic materials 0.000 claims description 2
- ZCUFMDLYAMJYST-UHFFFAOYSA-N thorium dioxide Chemical compound O=[Th]=O ZCUFMDLYAMJYST-UHFFFAOYSA-N 0.000 claims description 2
- 229910003452 thorium oxide Inorganic materials 0.000 claims description 2
- 229910001928 zirconium oxide Inorganic materials 0.000 claims description 2
- 229910052761 rare earth metal Inorganic materials 0.000 claims 1
- 239000005385 borate glass Substances 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 239000005388 borosilicate glass Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- GQYHUHYESMUTHG-UHFFFAOYSA-N lithium niobate Chemical compound [Li+].[O-][Nb](=O)=O GQYHUHYESMUTHG-UHFFFAOYSA-N 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- -1 manganese-activated zinc sulfide Chemical class 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- VEALVRVVWBQVSL-UHFFFAOYSA-N strontium titanate Chemical compound [Sr+2].[O-][Ti]([O-])=O VEALVRVVWBQVSL-UHFFFAOYSA-N 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Landscapes
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は文字、図形、映像などを表示する7トリツクス
形表示装置に関し、更に具体的に述べれば、明るい環境
の下でコン1−ラス1−が高く、かつ高輝度で表示が可
能なマトリックス形表示装置に関するものである。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a 7-trix type display device for displaying characters, figures, images, etc. The present invention relates to a matrix type display device which has a high - and is capable of displaying with high brightness.
(従来例の構成とその問題点)
従来の高コントラスト・マトリックス形表示装置につい
て、発光部にエレクトロ・ルミネッセンス素子を利用し
たものを例として、第1図により説明する。(Structure of a conventional example and its problems) A conventional high-contrast matrix type display device will be explained with reference to FIG. 1, taking as an example a device using an electroluminescent element in a light emitting part.
同図において、ガラス基板1の」二に、紙面に鉛直な複
数本の透明電極2と、第1絶縁体層3、エレクトロ・ル
ミネッセンス素子を利用した発光体層4、第2絶縁体層
5とを順次積層した後、更に黒色絶縁体層6を形成した
」二に、」1記透明電極2と直交するようにアルミニウ
ムよりなる複数本の背面電極7を形成している。このよ
うに黒色絶縁体層6によって高コントラストを得ようと
すると、発光輝度が20ないし60%低下するという問
題点があった。In the figure, on the second side of a glass substrate 1, there are a plurality of transparent electrodes 2 perpendicular to the plane of the paper, a first insulating layer 3, a light emitting layer 4 using an electroluminescent element, and a second insulating layer 5. After sequentially laminating the above, a black insulating layer 6 was further formed.Secondly, a plurality of back electrodes 7 made of aluminum were formed perpendicularly to the transparent electrode 2 described in 1. When attempting to obtain high contrast using the black insulating layer 6 as described above, there is a problem in that the luminance of the emitted light decreases by 20 to 60%.
また、陰極線管では表示面に光の透過率が20ないし6
0%のフィルターを設置して、画像のコントラストを改
善している。従って、マトリックス形表示装置にこのよ
うなフィルターを設置してコントラストを改善できるが
、発光輝度を低下することは変りないという問題点があ
った。In addition, in cathode ray tubes, the light transmittance on the display surface is between 20 and 6.
A 0% filter was installed to improve image contrast. Therefore, although the contrast can be improved by installing such a filter in a matrix type display device, there is still a problem in that the luminance of the emitted light is reduced.
(発明の目的)
本発明は上記の欠点を解消するもので、明るい環境の下
で、高コントラストと高輝度が共に得られるマトリック
ス形表示装置を提供しようとするものである。(Object of the Invention) The present invention aims to eliminate the above-mentioned drawbacks and provides a matrix type display device that can obtain both high contrast and high brightness in a bright environment.
(発明の構成)
透明絶縁性基板上に、互いに直交する複数本の透明電極
と背面電極との間に絶縁体層を介して発光体層を積層し
たマトリックス形表示部を形成してなる表示装置におい
て、透明絶縁性基板内に、異なる屈折率を有する少なく
とも2種類以上の領域を構成して、マトリックス形表示
部の一方の電極に同じピッチで並行する複数本の柱状凸
レンズを形成して、この柱状凸レンズで発光体の光を収
斂し、高輝度を得るものである。また、発光体層を薄膜
エレクトロ・ルミネッセンス素子で形成することにより
収斂効果を増加するものである。(Structure of the Invention) A display device in which a matrix-type display portion is formed on a transparent insulating substrate, in which a light-emitting layer is laminated with an insulating layer interposed between a plurality of mutually orthogonal transparent electrodes and a back electrode. In this method, at least two types of regions having different refractive indexes are formed in a transparent insulating substrate, and a plurality of columnar convex lenses arranged in parallel at the same pitch are formed on one electrode of the matrix display section. A columnar convex lens converges the light from the light emitter to obtain high brightness. Furthermore, the convergence effect is increased by forming the light emitter layer with a thin film electroluminescent element.
(実施例の説明) 本発明の実施例を第2図ないし第4図により説明する。(Explanation of Examples) Embodiments of the present invention will be explained with reference to FIGS. 2 to 4.
第2図において、71〜リックス形表示装置は、低屈折
率領域8aと高屈折率領域8bとから構成された透明絶
縁性基板8の上に、紙面と平行の複数本の透明電極9と
、第1絶縁体層10、発光体層11、第2絶縁体層12
とが順次積層された後、」1記透明電極9と直交するよ
うに複数本の背面電極13が形成されたものである。In FIG. 2, the Rix type display device 71 has a plurality of transparent electrodes 9 parallel to the paper surface on a transparent insulating substrate 8 composed of a low refractive index region 8a and a high refractive index region 8b, First insulator layer 10, light emitter layer 11, second insulator layer 12
After these are sequentially laminated, a plurality of back electrodes 13 are formed so as to be orthogonal to the transparent electrode 9 described in 1.
なお、上述の透明絶縁性基板8を構成する2つの領域の
うち、低屈折率領域8aは、屈折率1.47の硼珪酸ガ
ラスであり、上述の背面電極13に同ピッチで並行する
柱状凸レンズを形成さる高屈折率領域8bは、屈折率2
.00の希元素硼酸塩ガラスである。Note that among the two regions constituting the above-mentioned transparent insulating substrate 8, the low refractive index region 8a is made of borosilicate glass with a refractive index of 1.47, and is made of columnar convex lenses parallel to the above-mentioned back electrode 13 at the same pitch. The high refractive index region 8b forming the refractive index 2
.. 00 rare element borate glass.
この透明絶縁性基板8は、硼珪酸ガラス基板の表面に写
真製版技術を利用して縞状の複数本の溝を形成し、これ
に希元素硼酸塩ガラス板を熱圧着した後、その表面を研
削加工して平面としたもので、縞のピッチは20μmで
ある。This transparent insulating substrate 8 is made by forming a plurality of striped grooves on the surface of a borosilicate glass substrate using photolithography, thermocompressing a rare element borate glass plate onto the grooves, and then grinding the surface. It is processed into a flat surface, and the pitch of the stripes is 20 μm.
薫た、透明電極9は、透明絶縁性基板8の表面に高周波
スパッタリング法を利用して錫添加酸化インジウム膜を
形成した後、写真製版技術を利用して電極間の間隔40
μmを持つ幅160μmの綿状電極としたものである。The transparent electrodes 9 are formed by forming a tin-doped indium oxide film on the surface of the transparent insulating substrate 8 using a high frequency sputtering method, and then forming a spacing of 40 mm between the electrodes using photolithography.
It is a cotton-like electrode with a width of 160 μm and a width of 160 μm.
更に、厚さ600nmのチタン酸ストロンチウムを主成
分とする第1絶縁体層10と、厚さ400nmのマンガ
ン付活硫化亜鉛発光体層11、厚さ1100nの酸化イ
ツトリウムからなる第2絶縁体層12、高屈折率領域8
bの綿状溝と同くツチで並行する電極間の間隔40μm
を持つ幅160μmのアルミニウムからなる背面電極1
3とで薄膜エレクトロ・ルミネッセンス素子が形成され
ている。Further, a first insulating layer 10 mainly composed of strontium titanate with a thickness of 600 nm, a manganese-activated zinc sulfide luminescent layer 11 with a thickness of 400 nm, and a second insulating layer 12 consisting of yttrium oxide with a thickness of 1100 nm. , high refractive index region 8
The spacing between the parallel electrodes is 40 μm, which is the same as the cotton-like groove in b.
A back electrode 1 made of aluminum with a width of 160 μm
3 forms a thin film electroluminescent element.
このように構成した表示装置の電極9及び13に− ら
−
選択的に120 Vn−pの交流パルス電圧を印加する
ことによって、発光体層11の選択された両電極に挟ま
れた部分が発光し、文字や、図形、映像が表示できた。By selectively applying an AC pulse voltage of 120 Vn-p to the electrodes 9 and 13 of the display device configured in this manner, the portion of the luminescent layer 11 sandwiched between the selected electrodes emits light. It was possible to display text, figures, and images.
第3図及び第4図は、本発明による表示装置と従来のガ
ラス基板を用いた表示装置とについて、それぞれ環境照
度とコントラスト、印加電圧と輝度の関係を調査した結
果を示す。FIGS. 3 and 4 show the results of investigating the relationships between environmental illuminance and contrast, and between applied voltage and brightness, respectively, for a display device according to the present invention and a display device using a conventional glass substrate.
第3図において、横軸は表示装置が設置された環境照度
を、縦軸はコントラス1−をそれぞれ任意目盛を用いて
定性的に示したものである。曲線Aが本発明による表示
装置を、曲線Bが従来の表示装置をそれぞれ示し、環境
照度が明くなるに従ってコントラストが向上しているこ
とを示す。In FIG. 3, the horizontal axis represents the illuminance of the environment where the display device is installed, and the vertical axis represents the contrast 1-, qualitatively using arbitrary scales. Curve A shows the display device according to the present invention, and curve B shows the conventional display device, showing that the contrast improves as the ambient illuminance becomes brighter.
第4図は、横軸に印加電圧VO−Fを、縦軸に発光輝度
をそれぞれ任意目盛を用いて定性的に示したものである
。曲線A及びBは第3図と同様で、印加電圧が100v
を超えると本発明の表示装置の輝度が、従来の表示装置
より優れた性能を発揮することを示す。FIG. 4 qualitatively shows the applied voltage VO-F on the horizontal axis and the emission brightness on the vertical axis using arbitrary scales. Curves A and B are similar to those in Figure 3, and the applied voltage is 100V.
When the brightness exceeds , it shows that the brightness of the display device of the present invention exhibits better performance than the conventional display device.
6一
これは、透明絶縁性基板8に構成された柱状レンズが発
光体層11の光を収斂して基板8の表面から投射される
ばかりでなく、透明絶縁性基板8の表面から入射する環
境光が、低い高屈折率領域の境界面で拡散され、基板8
の表面からの反射割合を減少することによると考えられ
る。6- This is an environment in which the columnar lenses formed on the transparent insulating substrate 8 not only converge the light of the light emitting layer 11 and project it from the surface of the substrate 8, but also enter the light from the surface of the transparent insulating substrate 8. Light is diffused at the interface of the low, high refractive index region, and passes through the substrate 8.
This is thought to be due to the reduction of the reflection rate from the surface of the
なお、本実施例では、高屈折率領域8bを希元素硼酸ガ
ラスで構成したが、バリウム酸化物や鉛酸化物、タンタ
ル酸化物、トリウム酸化物、ジルコニウム酸化物などを
含むガラスであっても、その屈折率が低屈折率領域より
大きければ、本発明の表示装置に利用できる。In this example, the high refractive index region 8b is made of rare element borate glass, but even if the glass contains barium oxide, lead oxide, tantalum oxide, thorium oxide, zirconium oxide, etc. If the refractive index is greater than the low refractive index region, it can be used in the display device of the present invention.
また、本実施例では、縞状溝が形成された低屈折率領域
8aの表面に熱圧着法によって希元素硼酸ガラスを接着
した後、平面研削して高屈折率領域8bを構成したが、
CVD法によってニオブ酸リチウムやチタニアなどの高
屈折率材を接着した後、同様に平面研削しても、本発明
による表示装置が得られた。In addition, in this example, rare element borate glass was adhered to the surface of the low refractive index region 8a in which the striped grooves were formed by thermocompression bonding, and then the surface was ground to form the high refractive index region 8b.
A display device according to the present invention was also obtained by bonding a high refractive index material such as lithium niobate or titania using the CVD method and then performing surface grinding in the same manner.
(発明の効果)
以上説明したように、本発明によれば、明るい環境の下
で、高コントラストと高輝度が共に得られ、7トリツク
ス形表示装置の性能向上に著しい効果が得られた。(Effects of the Invention) As explained above, according to the present invention, both high contrast and high brightness were obtained in a bright environment, and a remarkable effect was obtained in improving the performance of a 7-trix display device.
第1図は従来のマトリックス形表示装置の断面図、第2
図は本発明によるマトリックス形表示装置の断面図、第
3図は環境照度とコンl−ラストの関係を示す特性図、
第4図は印加電圧と輝度の関係を示す特性図である。
1 ・・・ガラス基板、 2,9 ・・・透明電極、3
.10・・・第1絶縁体層、 4,11・・・発光体層
、 5,12・・・第2絶縁体層、 6 ・・・黒色絶
縁体層、 7,13・・・背面電極、8a・・・低屈折
率領域、8b・・・高屈折率領域、A・・・本発明によ
る特性曲線、 B・・・従来例の特性曲線。
特許出願人 松下電器産業株式会社
第1図
第2図
a
44減度 (竹、鍬町1
印カロ噸乞斤−(VO−P)Figure 1 is a sectional view of a conventional matrix type display device;
The figure is a sectional view of a matrix type display device according to the present invention, and FIG. 3 is a characteristic diagram showing the relationship between environmental illuminance and contrast.
FIG. 4 is a characteristic diagram showing the relationship between applied voltage and brightness. 1...Glass substrate, 2,9...Transparent electrode, 3
.. DESCRIPTION OF SYMBOLS 10... 1st insulator layer, 4, 11... Luminous body layer, 5, 12... 2nd insulator layer, 6... Black insulator layer, 7, 13... Back electrode, 8a...Low refractive index region, 8b...High refractive index region, A...Characteristic curve according to the present invention, B...Characteristic curve of conventional example. Patent Applicant Matsushita Electric Industrial Co., Ltd. Figure 1 Figure 2 a 44 reduction degree (Take, Kuwacho 1 Inkaro 噸噸行斤-(VO-P)
Claims (3)
明電極と背面電極との間に絶縁体層を介して発光体層を
積層したマトリックス形表示部を形成してなる表示装置
において、透明絶縁性基板内に、異なる屈折率を有する
少なくとも2種類以上の領域を構成して、マトリックス
形表示部の一方の電極に同じピッチで並行する複数本の
柱状凸レンズを形成したことを特徴とする表示装置。(1) In a display device in which a matrix display section is formed on a transparent insulating substrate, in which a luminescent layer is laminated with an insulator layer interposed between a plurality of mutually orthogonal transparent electrodes and a back electrode, At least two types of regions having different refractive indexes are formed in a transparent insulating substrate, and a plurality of columnar convex lenses arranged in parallel at the same pitch are formed on one electrode of the matrix display section. Display device.
ネッセンス素子で形成されていることを特徴とする特許
請求の範囲第(1)項記載の表示装置。(2) The display device according to claim (1), wherein the matrix type display section is formed of a thin film electroluminescent element.
酸化物、バリウム酸化物、鉛酸化物、タンタル酸化物、
トリウム酸化物、又はジルコニウム酸化物のうち少なく
とも1種類を10%以上含むガウスで構成されているこ
とを特徴とする特許請求の範囲第(1)項記載の表示装
置。(3) The high refractive index region within the transparent insulating substrate is made of rare earth element oxide, barium oxide, lead oxide, tantalum oxide,
The display device according to claim 1, wherein the display device is made of Gaussian material containing 10% or more of at least one of thorium oxide and zirconium oxide.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59179418A JPH065469B2 (en) | 1984-08-30 | 1984-08-30 | Display device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59179418A JPH065469B2 (en) | 1984-08-30 | 1984-08-30 | Display device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6159388A true JPS6159388A (en) | 1986-03-26 |
JPH065469B2 JPH065469B2 (en) | 1994-01-19 |
Family
ID=16065518
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59179418A Expired - Lifetime JPH065469B2 (en) | 1984-08-30 | 1984-08-30 | Display device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH065469B2 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0242401A (en) * | 1988-08-02 | 1990-02-13 | Omron Tateisi Electron Co | Optical element |
JP2008037413A (en) * | 2006-07-13 | 2008-02-21 | Yazaki Corp | Attaching structure |
US7901219B2 (en) | 2002-09-30 | 2011-03-08 | Fujikura Ltd. | Connecting structure for accessory device and cable, waterproofing structure for accessory device, and mounting structure for accessory device |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59109029A (en) * | 1982-12-14 | 1984-06-23 | Sharp Corp | Liquid crystal display device for full color display |
-
1984
- 1984-08-30 JP JP59179418A patent/JPH065469B2/en not_active Expired - Lifetime
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59109029A (en) * | 1982-12-14 | 1984-06-23 | Sharp Corp | Liquid crystal display device for full color display |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0242401A (en) * | 1988-08-02 | 1990-02-13 | Omron Tateisi Electron Co | Optical element |
US7901219B2 (en) | 2002-09-30 | 2011-03-08 | Fujikura Ltd. | Connecting structure for accessory device and cable, waterproofing structure for accessory device, and mounting structure for accessory device |
JP2008037413A (en) * | 2006-07-13 | 2008-02-21 | Yazaki Corp | Attaching structure |
Also Published As
Publication number | Publication date |
---|---|
JPH065469B2 (en) | 1994-01-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS62172691A (en) | Thin film el device | |
JPS60180093A (en) | Thin film el element | |
KR950704926A (en) | SUNLIGHT VIEWABLE THIN FILM ELECTROLUMINESCENT DISPLAY HAVING DARKENED METAL ELECTRODES | |
JP2531686B2 (en) | Color display device | |
JPS6159388A (en) | Display unit | |
JPH03222287A (en) | Thin film el element | |
JPS59133584A (en) | Multicolor el display | |
JPH0334292A (en) | Dot matrix display using membtanous el element | |
JPH01109695A (en) | Self-luminescence type display device | |
JPS5955487A (en) | Field luminous display element | |
JPS59157996A (en) | El light emitting element | |
JPS6124192A (en) | Thin film electroluminescent element | |
JPS61211997A (en) | Thin film el element | |
JPH03283385A (en) | Thin film electroluminescence display device | |
JPS61267297A (en) | Double-side light emitting body | |
JPS63116393A (en) | Thin film electroluminescence device | |
KR0147547B1 (en) | Electroluminescence element | |
JPH01137595A (en) | El display device | |
JPH01144595A (en) | Thin film el element | |
JPH05182767A (en) | Thin film el element | |
JPS6095889A (en) | Thin film el element | |
JPS5991697A (en) | Thin film el element | |
JPS61249074A (en) | Thin film el element | |
JPS62237694A (en) | Thin film el device and manufacture of the same | |
JPH0322394A (en) | Thin film el device |